CN201362650Y - Zinc oxide matte transparent glass with conductive coating - Google Patents
Zinc oxide matte transparent glass with conductive coating Download PDFInfo
- Publication number
- CN201362650Y CN201362650Y CNU200920035730XU CN200920035730U CN201362650Y CN 201362650 Y CN201362650 Y CN 201362650Y CN U200920035730X U CNU200920035730X U CN U200920035730XU CN 200920035730 U CN200920035730 U CN 200920035730U CN 201362650 Y CN201362650 Y CN 201362650Y
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- intermediate frequency
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- power supply
- frequency power
- sputtering target
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
A manufacturing device for zinc oxide matte transparent glass with conductive coating adopts the horizontal substrate moving method and consists of ten independent modules which are in series connection. The device is provided with three direct current sputtering power supplies and twelve intermediate frequency sputtering power supplies, the power supplies can take the place of each other; plasma source generating devices are added to the front and back locking chambers and the buffer chamber of a sputtering coating chamber, and the plasmas generated by the plasma source not only can carry out a bombardment treatment on the glass substrate, so as to form a matte on the surface of the glass, but also can carry out a bombardment treatment on a sputtered and coated ZnO surface, so as to form a ZnO matte transparent conductive glass; vacuum locks are mounted between the sputtering chambers, so as to avoid blow-by and reduce the power consumption by opening the vacuum system of each chamber as required; with heating devices arranged on the advancing film and the front locking chamber, and anhydrous cooling sleeved on the transmission roller, the fluoro-rubber wheel can bear the temperature of 2000 DEG C.
Description
Technical field
ZnO matte conductive glass is a critical material of realizing BIPV, is the important prerequisite that improves silicon film solar photovoltaic cell turnover ratio.ZnO matte transparent conducting glass and preparation production line thereof belong to thin film solar photovoltaic cell field.
Background technology
The method that sputtering technology prepares the textured ZnO transparent conductive film has two: one, and with the ZnO film of sputtering technology at light-plated sliding surface on glass, off-line forms matte with the method for acid corrosion then earlier; The 2nd, at high substrate temperature and high sputtering pressure environment deposit ZnO film, shortcoming is that the matte pattern instability and the depositing time that produce are oversize.Up to the present, also do not have a kind of integrated continuous production textured ZnO transparent conductive coated glass production line, and be on coating film production line, to prepare the matte transparent conductive coated glass with the plasma bombardment method.Owing to there is not vacuum lock, when only needing the work of small portion sputtering chamber, just need start the vacuum system of whole production line between present each sputtering chamber of sputter coating production line, waste electric power improves production cost.
Summary of the invention
Technical problem: the purpose of this utility model is to have proposed a kind of zinc oxide (ZnO) suede transparent conductive coated glass production equipment.
Technical scheme: zinc oxide (ZnO) suede transparent conductive coated glass production equipment of the present utility model adopts horizontal substrate move mode, this production line connects in the following order: on glass, the sheet chamber of advancing, primary heater, secondary heater, first plasma source, preceding lock chamber, preceding surge chamber, first vacuum lock, the first intermediate frequency power supply sputtering target, the second intermediate frequency power supply sputtering target, the 3rd intermediate frequency power supply sputtering target, the 4th intermediate frequency power supply sputtering target, second vacuum lock, first insulated chamber, the 3rd vacuum lock, the 5th intermediate frequency power supply sputtering target, the 6th intermediate frequency power supply sputtering target, the 7th intermediate frequency power supply sputtering target, the 8th intermediate frequency power supply sputtering target, the 4th vacuum lock, second insulated chamber, the 5th vacuum lock, first direct supply, second direct supply, the 3rd direct supply, the 6th vacuum lock, the 3rd insulated chamber, the 7th vacuum lock, the 9th intermediate frequency power supply sputtering target, the tenth intermediate frequency power supply sputtering target, the 11 intermediate frequency power supply sputtering target, the 12 intermediate frequency power supply sputtering target, the 8th vacuum lock, second plasma source, back lock chamber, back slice chamber is provided with shielded partitions between every adjacent two intermediate frequency power supply sputtering targets.
Can exchange between first direct supply, second direct supply, the 3rd direct supply; Establish heating unit in advance sheet chamber and preceding lock chamber, temperature≤200 ℃.
Beneficial effect: advantage of the present utility model is to remove steam advancing sheet and preceding lock chamber increase heating unit, guarantees that sedimentary rete is firm; Using plasma source bombardment preparation textured ZnO transparent conductive coated glass device, form textured ZnO transparent conductive coated glass with the plasma bombardment ZnO film, do not adopt acid corrosion ZnO film face to form suede structure, can online integrated continuous production ZnO matte transparent conductive coated glass, avoided spent acid to contaminated water source.Between each sputtering chamber of production line, add vacuum lock, avoid collaborating between the different sputtering chambers and opening as required vacuum system, guarantee quality product, reduce power consumption.
This textured ZnO transparent conductive coated glass production line, on this production line, for the temperature that makes sputtering chamber can reach 200 ℃, advancing that sheet chamber and preceding lock chamber add heater element, water flowing cooling on the delivery roll of transmission glass, sliding on metallic roll for preventing glass, suit does not have the fluorine-containing rubber wheel that water cooling just can be heat-resisting 200 ℃ on delivery roll.Production line mainly utilizes four sputtering chambers, comprise successively to a left side from the right side of Fig. 1: on glass, the sheet chamber of advancing, preceding lock chamber, preceding surge chamber, sputtering chamber 1-4, wherein between each sputtering chamber insulated chamber is arranged, back surge chamber, back lock chamber, slice chamber, back, unload the textured ZnO transparent conductive coated glass product.Between each sputtering chamber, add vacuum lock, avoid collaborating and open vacuum system as required, reduce power consumption.
Description of drawings
Fig. 1 is textured ZnO transparent conductive coated glass production line equipment figure.
Have among the above figure: on glass 1, the sheet chamber 2 of advancing, primary heater 31, secondary heater 32, preceding lock chamber 4, first plasma source 51, second plasma source 52, preceding surge chamber 6, vacuum lock 7, the first intermediate frequency power supply sputtering target 801, the second intermediate frequency power supply sputtering target 802, the 3rd intermediate frequency power supply sputtering target 803, the 4th intermediate frequency power supply sputtering target 804, the 5th intermediate frequency power supply sputtering target 805, the 6th intermediate frequency power supply sputtering target 806, the 7th intermediate frequency power supply sputtering target 807, the 8th intermediate frequency power supply sputtering target 808, the 9th intermediate frequency power supply sputtering target 809, the tenth intermediate frequency power supply sputtering target 810, the 11 intermediate frequency power supply sputtering target 811, the 12 intermediate frequency power supply sputtering target 812, shielded partitions 9, first insulated chamber 101, second insulated chamber 102, the 3rd insulated chamber 103, shielded partitions 11, first direct supply 121, second direct supply 122, the 3rd direct supply 123, back lock chamber 13, back slice chamber 14.
Embodiment
The utility model is by (being installed in processing in early stage, post-processed place at sputter plating ZnO film forward and backward lock chamber and surge chamber installation plasma source, utilize plasma body that glass substrate and the rete that is coated with are bombarded processing, obtain well behaved ZnO matte transparent conducting glass.
Advance sheet and preceding lock chamber increase heating unit, removing the steam of glass surface; Plasma source is installed in the front and back lock chamber and the surge chamber of production line, at first glass substrate is carried out the pre-treatment bombardment with plasma body before sputter coating, forms matte at glass surface; And then sputter plating transition layer and ZnO film; Use plasma bombardment ZnO film face at last again, form ZnO matte transparent conducting glass.
The utility model is specifically related to a kind of textured ZnO transparent conductive coated glass production line, and forward and backward lock chamber and surge chamber in the magnetron sputtering plating chamber increase the plasma body source generating device; The plasma body that produces with plasma source at first carries out preceding bombardment processing to glass substrate, forms matte at glass surface; At sputtering sedimentation transition layer on glass; On transition layer, deposit ZnO film; With plasma bombardment ZnO film face, form textured ZnO transparent conductive coated glass.This invention belongs to glass processing, thin film solar photovoltaic cell and BIPV assembly production unit field.
Advancing sheet and preceding lock chamber increase heating unit, remove steam; In forward and backward lock chamber and surge chamber plasma source is installed, glass substrate is carried out the pre-treatment bombardment, form matte at glass surface with plasma body; Transition layer and ZnO film are plated in sputter then; Use plasma bombardment ZnO film face at last again, form ZnO matte transparent conducting glass.Between each sputtering chamber, add vacuum lock, avoid collaborating and open vacuum system as required, reduce power consumption.
This production line connects in the following order: on glass 1, the sheet chamber 2 of advancing, primary heater 31, secondary heater 32, first plasma source 51, preceding lock chamber 4, preceding surge chamber 6, first vacuum lock 71, the first intermediate frequency power supply sputtering target 801, the second intermediate frequency power supply sputtering target 802, the 3rd intermediate frequency power supply sputtering target 803, the 4th intermediate frequency power supply sputtering target 804, second vacuum lock 72, first insulated chamber 101, the 3rd vacuum lock 73, the 5th intermediate frequency power supply sputtering target 805, the 6th intermediate frequency power supply sputtering target 806, the 7th intermediate frequency power supply sputtering target 807, the 8th intermediate frequency power supply sputtering target 808, the 4th vacuum lock 74, second insulated chamber 102, the 5th vacuum lock 75, first direct supply 121, second direct supply 122, the 3rd direct supply 123, the 6th vacuum lock 76, the 3rd insulated chamber 103, the 7th vacuum lock 77, the 9th intermediate frequency power supply sputtering target 809, the tenth intermediate frequency power supply sputtering target 810, the 11 intermediate frequency power supply sputtering target 811, the 12 intermediate frequency power supply sputtering target 812, the 8th vacuum lock 78, second plasma source 52, back lock chamber 13, back slice chamber 14 is provided with shielded partitions 9 between every adjacent two intermediate frequency power supply sputtering targets.Establish heating unit in advance sheet chamber 2 and preceding lock chamber 4, temperature≤200 ℃.
The zinc oxide (ZnO) suede transparent conductive coated glass production equipment adopts horizontal substrate move mode, is formed by ten standalone module series combinations, and three dc sputtering powers and 12 intermediate frequency shielding power supplies are housed, and can exchange between the power supply; Forward and backward lock chamber and surge chamber in the sputter coating chamber increase the plasma body source generating device, and the plasma body that this plasma body source produces can bombard processing to glass substrate, forms matte at glass surface; Also can bombard processing, form ZnO matte transparent conducting glass the ZnO film face that sputter is coated with;
Water flowing is cooled off, is slided on metallic roll for preventing glass on the delivery roll of transmission glass, and suit does not have the fluorine-containing rubber wheel that water cooling can be heat-resisting 200 ℃ on delivery roll.
This production line control system adopts PC+PLC control and monitoring automatically, storage inside kinds of processes working procedure;
Transmission adopted advanced person's variable-frequency control technique, by PLC can be continuously, speed governing stably.
Claims (3)
1, a kind of zinc oxide (ZnO) suede transparent conductive coated glass production equipment, it is characterized in that production line adopts horizontal substrate move mode, this production line connects in the following order: on glass (1), the sheet chamber (2) of advancing, primary heater (31), secondary heater (32), first plasma source (51), preceding lock chamber (4), preceding surge chamber (6), first vacuum lock (71), the first intermediate frequency power supply sputtering target (801), the second intermediate frequency power supply sputtering target (802), the 3rd intermediate frequency power supply sputtering target (803), the 4th intermediate frequency power supply sputtering target (804), second vacuum lock (72), first insulated chamber (101), the 3rd vacuum lock (73), the 5th intermediate frequency power supply sputtering target (805), the 6th intermediate frequency power supply sputtering target (806), the 7th intermediate frequency power supply sputtering target (807), the 8th intermediate frequency power supply sputtering target (808), the 4th vacuum lock (74), second insulated chamber (102), the 5th vacuum lock (75), first direct supply (121), second direct supply (122), the 3rd direct supply (123), the 6th vacuum lock (76), the 3rd insulated chamber (103), the 7th vacuum lock (77), the 9th intermediate frequency power supply sputtering target (809), the tenth intermediate frequency power supply sputtering target (810), the 11 intermediate frequency power supply sputtering target (811), the 12 intermediate frequency power supply sputtering target (812), the 8th vacuum lock (78), second plasma source (52), back lock chamber (13), back slice chamber (14) is provided with shielded partitions (9) between every adjacent two intermediate frequency power supply sputtering targets.
2. zinc oxide (ZnO) suede transparent conductive coated glass production equipment according to claim 1 is characterized in that first direct supply (121), second direct supply (122), the 3rd direct supply can exchange between (123).
3, zinc oxide (ZnO) suede transparent conductive coated glass production equipment according to claim 1 is characterized in that establishing heating unit in advance sheet chamber (2) and preceding lock chamber (4), temperature≤200 ℃.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU200920035730XU CN201362650Y (en) | 2009-03-18 | 2009-03-18 | Zinc oxide matte transparent glass with conductive coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU200920035730XU CN201362650Y (en) | 2009-03-18 | 2009-03-18 | Zinc oxide matte transparent glass with conductive coating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201362650Y true CN201362650Y (en) | 2009-12-16 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU200920035730XU Expired - Fee Related CN201362650Y (en) | 2009-03-18 | 2009-03-18 | Zinc oxide matte transparent glass with conductive coating |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2505888C1 (en) * | 2012-07-31 | 2014-01-27 | Федеральное государственное бюджетное учреждение науки Физико-технический институт им. А.Ф. Иоффе Российской академии наук | Method of producing layer of transparent conducting oxide on glass substrate |
-
2009
- 2009-03-18 CN CNU200920035730XU patent/CN201362650Y/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2505888C1 (en) * | 2012-07-31 | 2014-01-27 | Федеральное государственное бюджетное учреждение науки Физико-технический институт им. А.Ф. Иоффе Российской академии наук | Method of producing layer of transparent conducting oxide on glass substrate |
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| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20091216 Termination date: 20180318 |
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| CF01 | Termination of patent right due to non-payment of annual fee |