CN201323188Y - Exhaust device - Google Patents

Exhaust device Download PDF

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Publication number
CN201323188Y
CN201323188Y CNU2008201583498U CN200820158349U CN201323188Y CN 201323188 Y CN201323188 Y CN 201323188Y CN U2008201583498 U CNU2008201583498 U CN U2008201583498U CN 200820158349 U CN200820158349 U CN 200820158349U CN 201323188 Y CN201323188 Y CN 201323188Y
Authority
CN
China
Prior art keywords
reaction chamber
exhaust hood
utility
exhausting device
air exhausting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CNU2008201583498U
Other languages
Chinese (zh)
Inventor
宋英华
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Manufacturing International Beijing Corp
Original Assignee
Semiconductor Manufacturing International Shanghai Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Manufacturing International Shanghai Corp filed Critical Semiconductor Manufacturing International Shanghai Corp
Priority to CNU2008201583498U priority Critical patent/CN201323188Y/en
Application granted granted Critical
Publication of CN201323188Y publication Critical patent/CN201323188Y/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Devices For Use In Laboratory Experiments (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

The utility model provides an exhaust device which is used for pumping toxic and harmful substances in a reaction cavity. The exhaust device comprises an exhaust hood and a vacuum pump; the exhaust hood covers the reaction cavity; and the vacuum pump is connected with the exhaust hood. The exhaust device provided by the utility model can be used for conducting exhaust treatment when equipment maintainers maintain a reaction cavity of processing equipment, thereby exhausting the toxic and harmful substances in the reaction cavity, preventing the toxic and harmful substances from spreading to the air and influencing the cleanliness of a clean room, and ensuring the personal safety of the equipment maintainers.

Description

Air exhausting device
Technical field
The utility model relates to a kind of air exhausting device, relates in particular to a kind of air exhausting device that is used for the poisonous and harmful substance in the abstraction reaction chamber.
Background technology
Make the field at integrated circuit, many process apparatus all are provided with reaction chamber (chamber), for certain some processing procedure, have some poisonous and hazardous materials in the reaction chamber, carry out process apparatus when safeguarding the equipment personnel, need open reaction chamber, carry out the work such as cleaning in the reaction chamber.At this moment, these poisonous and harmful substances will be diffused in reaction chamber the air, have a strong impact on the cleanliness factor of clean room, if these pollutants drop on the wafer, then can influence the rate of finished products of wafer, simultaneously, these venomous injurant confrontation plant maintenances personnel's health of human body has caused great threat.
Be equipped with vacuum system (House Vacuum System) in the clean room of semiconductor manufacturing factory, the vacuum source that it provides processing procedure district, clean room and return air district cleaning to draw micro dust particle generally comprises vacuum pump and is connected to flexible pipe on the vacuum pump.
In semiconductor manufacturing factory, all need to carry out the regular maintenance of process apparatus every day, the air exhausting device that uses when therefore how to utilize the vacuum pump of existing vacuum system to provide a kind of reaction chamber to safeguard has become urgent problem.
The utility model content
The purpose of this utility model provides a kind of air exhausting device, when safeguarding in order to the reaction chamber that solves process apparatus, poisonous and harmful substance in the reaction chamber influences the problem of the cleanliness factor in the clean room, prevents that venomous injurant confrontation plant maintenance personnel's health of human body from threatening.
In view of this, the utility model proposes a kind of air exhausting device, be used for the poisonous and harmful substance in the abstraction reaction chamber, comprising: exhaust hood is located on the described reaction chamber; And vacuum pump, be connected with described exhaust hood.
Optionally, described exhaust hood bottom has exhaust outlet, and described exhaust outlet is communicated with described vacuum pump by a flexible pipe.
Optionally, described exhaust hood is a cuboid.
Optionally, described reaction chamber has opening, and described exhaust hood covers 70% aperture area of described reaction chamber.
Optionally, the material of described exhaust hood is a polyvinyl chloride.
The utility model proposes a kind of air exhausting device, carrying out air draft when the plant maintenance personnel safeguard the reaction chamber of process apparatus handles, poisonous and harmful substance in the reaction chamber can be drained, prevent the environment of the poisonous and harmful substance pollution clean room in the reaction chamber, support equipment attendant's personal safety.
Description of drawings
The structural representation of the air exhausting device that Figure 1A is provided for the utility model one embodiment;
The use schematic diagram of the air exhausting device that Figure 1B is provided for the utility model one embodiment.
Embodiment
Below in conjunction with the drawings and specific embodiments the air exhausting device that the utility model proposes is described in further detail.
Please refer to Figure 1A, the structural representation of the air exhausting device that it is provided for the utility model one embodiment, described air exhausting device 100 is used for the poisonous and harmful substance in the abstraction reaction chamber 200, described reaction chamber 200 has opening, described air exhausting device 100 comprises: vacuum pump 110 and exhaust hood 120, wherein, exhaust hood 120 is the open containers shape, can be located on the described reaction chamber 200, exhaust hood 120 also has an exhaust outlet 121, be arranged at the bottom of exhaust hood 120, exhaust outlet 121 is communicated with by flexible pipe 130 with vacuum pump 110.
Wherein, vacuum pump 110 is a known technology, for clear, is not described in detail its function and structure, because they can make the utility model because unnecessary details and confusion.
In the utility model one embodiment, described exhaust hood 120 can be located on the reaction chamber 200, is preferably cuboid, be convenient to processing and fabricating, in other embodiment of the utility model, also can be in conjunction with actual needs, described exhaust hood is set to be covered with other shape of reaction chamber, as cylindrical etc.
Please continue with reference to Figure 1B, the use schematic diagram of the air exhausting device that it provides for the utility model one embodiment, when the equipment personnel need carry out the regular maintenance of process apparatus, after opening the lid of reaction chamber 200, exhaust hood 120 is located on the opening of reaction chamber 200, and exhaust hood 120 is connected to vacuum pump 110 places at once by flexible pipe 130.Wherein, exhaust hood 120 can cover the major part of reaction chamber 200 aperture areas, is preferably 70% the aperture area that exhaust hood 120 covers reaction chamber 200.After can guaranteeing like this to open the running power supply of vacuum pump 110, vacuum pump 110 is taken the poisonous and harmful substance in the reaction chamber away, at this moment, the plant maintenance personnel can stretch into hand in the reaction chamber 200 via the opening portion of the reaction chamber 200 that is not covered by exhaust hood 120, carry out the regular maintenance of process apparatus, as work such as cleanings.So, can prevent that the poisonous and harmful substance in the reaction chamber 200 is diffused in the air, influence the cleanliness factor in the clean room, and can prevent the personal safety that the poisonous and harmful substance in the reaction chamber threatens the plant maintenance personnel.
In the utility model one embodiment, the material of exhaust hood 120 is polyvinyl chloride (PVC), and it can not produce the dust pollution process apparatus, acid and alkali-resistance, anticorrosive, and the hardness height can be avoided the scratch process apparatus again, and is easy to processing.
In sum, the utility model provides a kind of air exhausting device, is used for the poisonous and harmful substance in the abstraction reaction chamber, and described air exhausting device comprises: exhaust hood and vacuum pump, described exhaust hood is located on the described reaction chamber, and described vacuum pump is connected with described exhaust hood.The air exhausting device that the utility model provides, carrying out air draft when the plant maintenance personnel safeguard the reaction chamber of process apparatus handles, poisonous and harmful substance in the reaction chamber can be drained, prevent that the poisonous and harmful substance in the reaction chamber from polluting clean room environment, support equipment attendant's personal safety.
Obviously, those skilled in the art can carry out various changes and modification to the utility model and not break away from spirit and scope of the present utility model.Like this, if of the present utility model these are revised and modification belongs within the scope of the utility model claim and equivalent technologies thereof, then the utility model also is intended to comprise these changes and modification interior.

Claims (5)

1, a kind of air exhausting device is used for the poisonous and harmful substance in the abstraction reaction chamber, it is characterized in that, comprising:
Exhaust hood is located on the described reaction chamber; And vacuum pump, be connected with described exhaust hood.
2, air exhausting device as claimed in claim 1 is characterized in that, described exhaust hood bottom has exhaust outlet, and described exhaust outlet is communicated with described vacuum pump by a flexible pipe.
3, air exhausting device as claimed in claim 1 is characterized in that, described exhaust hood is a cuboid.
4, air exhausting device as claimed in claim 1 is characterized in that, described reaction chamber has opening, and described exhaust hood covers 70% aperture area of described reaction chamber.
5, air exhausting device as claimed in claim 1 is characterized in that, the material of described exhaust hood is a polyvinyl chloride.
CNU2008201583498U 2008-12-30 2008-12-30 Exhaust device Expired - Lifetime CN201323188Y (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNU2008201583498U CN201323188Y (en) 2008-12-30 2008-12-30 Exhaust device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNU2008201583498U CN201323188Y (en) 2008-12-30 2008-12-30 Exhaust device

Publications (1)

Publication Number Publication Date
CN201323188Y true CN201323188Y (en) 2009-10-07

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Family Applications (1)

Application Number Title Priority Date Filing Date
CNU2008201583498U Expired - Lifetime CN201323188Y (en) 2008-12-30 2008-12-30 Exhaust device

Country Status (1)

Country Link
CN (1) CN201323188Y (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106558512A (en) * 2015-10-22 2017-04-05 安徽超元半导体有限公司 A kind of prober air exhausting device
CN106876304A (en) * 2017-02-24 2017-06-20 成都京东方光电科技有限公司 A kind of wet etching gas extraction system and Wet-method etching device
CN112427435A (en) * 2020-11-20 2021-03-02 北京北方华创微电子装备有限公司 Maintenance device for semiconductor equipment
CN113394132A (en) * 2021-04-29 2021-09-14 北京北方华创微电子装备有限公司 Wafer cleaning equipment and control method thereof
CN113578858A (en) * 2021-08-02 2021-11-02 西安奕斯伟硅片技术有限公司 Cleaning device and cleaning method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106558512A (en) * 2015-10-22 2017-04-05 安徽超元半导体有限公司 A kind of prober air exhausting device
CN106876304A (en) * 2017-02-24 2017-06-20 成都京东方光电科技有限公司 A kind of wet etching gas extraction system and Wet-method etching device
CN106876304B (en) * 2017-02-24 2019-09-10 成都京东方光电科技有限公司 A kind of wet etching exhaust system and Wet-method etching device
CN112427435A (en) * 2020-11-20 2021-03-02 北京北方华创微电子装备有限公司 Maintenance device for semiconductor equipment
CN113394132A (en) * 2021-04-29 2021-09-14 北京北方华创微电子装备有限公司 Wafer cleaning equipment and control method thereof
CN113578858A (en) * 2021-08-02 2021-11-02 西安奕斯伟硅片技术有限公司 Cleaning device and cleaning method

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Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
ASS Succession or assignment of patent right

Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING

Free format text: FORMER OWNER: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION

Effective date: 20130219

C41 Transfer of patent application or patent right or utility model
COR Change of bibliographic data

Free format text: CORRECT: ADDRESS; FROM: 201203 PUDONG NEW AREA, SHANGHAI TO: 100176 DAXING, BEIJING

TR01 Transfer of patent right

Effective date of registration: 20130219

Address after: 100176 No. 18, Wenchang Avenue, Beijing economic and Technological Development Zone

Patentee after: Semiconductor Manufacturing International (Beijing) Corporation

Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18

Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation

CX01 Expiry of patent term
CX01 Expiry of patent term

Granted publication date: 20091007