CN201323188Y - Exhaust device - Google Patents
Exhaust device Download PDFInfo
- Publication number
- CN201323188Y CN201323188Y CNU2008201583498U CN200820158349U CN201323188Y CN 201323188 Y CN201323188 Y CN 201323188Y CN U2008201583498 U CNU2008201583498 U CN U2008201583498U CN 200820158349 U CN200820158349 U CN 200820158349U CN 201323188 Y CN201323188 Y CN 201323188Y
- Authority
- CN
- China
- Prior art keywords
- reaction chamber
- exhaust hood
- utility
- exhausting device
- air exhausting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Prevention Of Fouling (AREA)
- Devices For Use In Laboratory Experiments (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNU2008201583498U CN201323188Y (en) | 2008-12-30 | 2008-12-30 | Exhaust device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNU2008201583498U CN201323188Y (en) | 2008-12-30 | 2008-12-30 | Exhaust device |
Publications (1)
Publication Number | Publication Date |
---|---|
CN201323188Y true CN201323188Y (en) | 2009-10-07 |
Family
ID=41160563
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNU2008201583498U Expired - Lifetime CN201323188Y (en) | 2008-12-30 | 2008-12-30 | Exhaust device |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN201323188Y (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106558512A (en) * | 2015-10-22 | 2017-04-05 | 安徽超元半导体有限公司 | A kind of prober air exhausting device |
CN106876304A (en) * | 2017-02-24 | 2017-06-20 | 成都京东方光电科技有限公司 | A kind of wet etching gas extraction system and Wet-method etching device |
CN112427435A (en) * | 2020-11-20 | 2021-03-02 | 北京北方华创微电子装备有限公司 | Maintenance device for semiconductor equipment |
CN113394132A (en) * | 2021-04-29 | 2021-09-14 | 北京北方华创微电子装备有限公司 | Wafer cleaning equipment and control method thereof |
CN113578858A (en) * | 2021-08-02 | 2021-11-02 | 西安奕斯伟硅片技术有限公司 | Cleaning device and cleaning method |
-
2008
- 2008-12-30 CN CNU2008201583498U patent/CN201323188Y/en not_active Expired - Lifetime
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106558512A (en) * | 2015-10-22 | 2017-04-05 | 安徽超元半导体有限公司 | A kind of prober air exhausting device |
CN106876304A (en) * | 2017-02-24 | 2017-06-20 | 成都京东方光电科技有限公司 | A kind of wet etching gas extraction system and Wet-method etching device |
CN106876304B (en) * | 2017-02-24 | 2019-09-10 | 成都京东方光电科技有限公司 | A kind of wet etching exhaust system and Wet-method etching device |
CN112427435A (en) * | 2020-11-20 | 2021-03-02 | 北京北方华创微电子装备有限公司 | Maintenance device for semiconductor equipment |
CN113394132A (en) * | 2021-04-29 | 2021-09-14 | 北京北方华创微电子装备有限公司 | Wafer cleaning equipment and control method thereof |
CN113578858A (en) * | 2021-08-02 | 2021-11-02 | 西安奕斯伟硅片技术有限公司 | Cleaning device and cleaning method |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Free format text: FORMER OWNER: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION Effective date: 20130219 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 201203 PUDONG NEW AREA, SHANGHAI TO: 100176 DAXING, BEIJING |
|
TR01 | Transfer of patent right |
Effective date of registration: 20130219 Address after: 100176 No. 18, Wenchang Avenue, Beijing economic and Technological Development Zone Patentee after: Semiconductor Manufacturing International (Beijing) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
|
CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20091007 |