CN201309832Y - Dry process tail gas recovery silicon tetrachloride elution column in production of polysilicon - Google Patents
Dry process tail gas recovery silicon tetrachloride elution column in production of polysilicon Download PDFInfo
- Publication number
- CN201309832Y CN201309832Y CNU2008202233241U CN200820223324U CN201309832Y CN 201309832 Y CN201309832 Y CN 201309832Y CN U2008202233241 U CNU2008202233241 U CN U2008202233241U CN 200820223324 U CN200820223324 U CN 200820223324U CN 201309832 Y CN201309832 Y CN 201309832Y
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- CN
- China
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- liquid
- elution column
- production
- shower
- silicon tetrachloride
- Prior art date
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Abstract
A dry process tail gas recovery silicon tetrachloride elution column in production of polysilicon comprises a gas inlet and a gas outlet, wherein a liquid outlet is arranged on the bottom of the elution column, multiple layers of spray pipes are arranged on the inner upper portion of the elution column, a plurality of nozzles are installed on the spray pipes, a pall ring is arranged below the nozzles, the spray pipes are penetrated out of the elution column, and are connected with the outlet end of a liquid pump through round pipes, and the liquid outlet of the elution column is connected with the water inlet end of the liquid pump through a round pipe. The elution column adopts the liquid pump 8 to forcefully circulate tetrachloride liquid, which accelerates the full exchange of gas and liquid in high quality, and increases the absorption efficiency by 50-70%. Compared with a commonly-used bubbling elution method device, the volume is reduced nearly a half, which provides beneficial conditions for fully utilizing production places.
Description
Technical field
The utility model belongs to support equipment, i.e. production of polysilicon dry method tail gas recycle silicon tetrachloride eluting column in the polysilicon production process of chemical industry.
Background technology
In polysilicon production process, the tail gas that reduction furnace is discharged, contain higher silicon tetrachloride, and silicon tetrachloride is the main raw material of synthesizing organo-silicon, if the tail gas of production of polysilicon dry method is directly drained, then is a kind of waste, therefore in chemical industry, adopted the method for tail gas recycle silicon tetrachloride, commonly used is the bubbling drip-rinsing process now, but this method still exists the big and lower deficiency of the rate of recovery of equipment, so need be improved.
The utility model content
The purpose of this utility model provides a kind of organic efficiency height and the little production of polysilicon dry method tail gas recycle silicon tetrachloride eluting column of equipment.
The technical solution of the utility model as shown in Figure 1, eluting column 1 top is provided with air outlet 2, lower side is provided with inlet mouth 3, the bottom is provided with liquid outlet 4, is provided with multilayer shower 5 in the inner and upper of eluting column 1, is equipped with spiral nozzle 6 on the shower 5, shower nozzle 6 belows of each layer shower 5, be provided with Pall ring 7, each shower 5 stretches out eluting column 1 and is connected with pipe with liquid pump 8 exit end, and the entrance end of liquid pump 8 is connected with liquid outlet 4 usefulness pipes.
The utility model adopts liquid pump 8 to make silicon tetrachloride liquid carry out pump circulation in tower, promotes the gas-liquid high-quality fully to exchange, and can make like this under the situation of the height of tower and reduced, and assimilated efficiency has but improved 50～70%.
Description of drawings
Fig. 1 production of polysilicon dry method tail gas recycle silicon tetrachloride eluting column structural representation;
Among the figure: 1-eluting column, 2-air outlet, 3-inlet mouth, 4-liquid outlet, 5-shower, 6-shower nozzle, 7-Pall ring, 8-liquid pump.
Embodiment
The utility model is pressed such scheme and is implemented, shower 2 is provided with 3～5 layers, be equipped with 4～6 in spiral cross shower nozzle on the every shower, the number that shower nozzle is installed is that the internal diameter according to tower decides, each shower below is provided with the Bauer circular layer, and about 250 millimeters of bed thickness makes gas and liquid that sufficient contact surface be arranged, reach the purpose that the gas-liquid high-quality fully exchanges, assimilated efficiency just can improve greatly like this.
About 5 meters of the utility model tower height, about 0.8 meter of diameter, the equipment that existing commonly used bubbling drip-rinsing process uses dwindled near half, provide favourable condition for making full use of production site.
Claims (1)
1. production of polysilicon dry method tail gas recycle silicon tetrachloride eluting column, by air outlet (2), inlet mouth (3), liquid outlet (4), shower (5), shower nozzle (6), Pall ring (7), liquid pump (8) is formed, it is characterized in that being provided with air outlet (2) at the top of eluting column (1), lower side is provided with inlet mouth (3), the bottom is provided with liquid outlet (4), eluting column (1) inner and upper is provided with multilayer shower (5), be equipped with shower nozzle (6) on the shower (5), shower nozzle (6) below of each layer shower (5) is provided with Pall ring (7), shower (5) stretches out eluting column (1) and is connected with liquid pump (8) exit end pipe, and the entrance end of liquid pump (8) is connected with liquid outlet (4) pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008202233241U CN201309832Y (en) | 2008-12-11 | 2008-12-11 | Dry process tail gas recovery silicon tetrachloride elution column in production of polysilicon |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008202233241U CN201309832Y (en) | 2008-12-11 | 2008-12-11 | Dry process tail gas recovery silicon tetrachloride elution column in production of polysilicon |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201309832Y true CN201309832Y (en) | 2009-09-16 |
Family
ID=41107084
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU2008202233241U Expired - Fee Related CN201309832Y (en) | 2008-12-11 | 2008-12-11 | Dry process tail gas recovery silicon tetrachloride elution column in production of polysilicon |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201309832Y (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103193235A (en) * | 2013-04-03 | 2013-07-10 | 河北科技大学 | Device for hydrolyzing silicon tetrachloride |
-
2008
- 2008-12-11 CN CNU2008202233241U patent/CN201309832Y/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103193235A (en) * | 2013-04-03 | 2013-07-10 | 河北科技大学 | Device for hydrolyzing silicon tetrachloride |
| CN103193235B (en) * | 2013-04-03 | 2014-11-19 | 河北科技大学 | Device for hydrolyzing silicon tetrachloride |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090916 Termination date: 20151211 |
|
| EXPY | Termination of patent right or utility model |