CN201279590Y - Metal ceramics plasma nano-material preparation device - Google Patents
Metal ceramics plasma nano-material preparation device Download PDFInfo
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- CN201279590Y CN201279590Y CNU2009201356520U CN200920135652U CN201279590Y CN 201279590 Y CN201279590 Y CN 201279590Y CN U2009201356520 U CNU2009201356520 U CN U2009201356520U CN 200920135652 U CN200920135652 U CN 200920135652U CN 201279590 Y CN201279590 Y CN 201279590Y
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Abstract
The utility model relates to a metal ceramic plasma nano-meter material preparing device, which comprises a machine body, a feeding system, a gas cycling system, a powder collecting device, an exhausting pipe and a control computer, wherein, the machine body comprises a cathode, an anode, a gas nozzle and an electric motor; the feeding system comprises a screw rod which is connected with the electric motor, an electrode lifting rod which is connected with the anode and an electrode clip which is used for fixing the anode; the gas cycling system comprises a vacuum chamber, a vacuum pup, a communication pipe and a gas pipe, which are connected with the vacuum chamber, and the gas cycling system is also provided with a gas pump; the powder collecting device comprises a powder collector and a powder storage bottle, wherein, a gas circuit between the powder collector and the powder storage bottle is controlled by a ball valve to be opened and closed; and the exhausting pipe is communicated with the gas pump and the powder collecting device. The preparing device has the advantages of novel structure, advanced control, beautiful appearance, reasonable technology, high powder yield, high efficiency and low price.
Description
Technical field
The utility model relates to the materials processing technology field, is specifically related to a kind of nano material preparation device.
Background technology
At present, the conventional method of preparation metal nano catalyst is " evaporation-condensation " method, and its evaporation source is molybdenum boat or tungsten boat, is heated by resistive evaporated metal, and its shortcoming is that output is low, only is suitable for preparing the low-melting-point metal nanocatalyst; The method of employing " induction-laser " associating heating evaporation metal is also arranged, and shortcoming is the equipment investment costliness, preparation nano powder cost height.In the prior art, the method heating evaporation metal that adopts electric arc is arranged also.For example: Chinese utility model patent " high melting point nm metal catalyzer the preparation facilities " (patent No.: 94219612.0), structure as shown in Figure 1, mainly comprise drum type brake vacuum chamber 10, its top is connected to feeder 9, rotatable disc water-cooled copper anode 2, negative electrode 1 and disk anode face angle at 45, the opposite side of the round platform of its vacuum chamber 10 is shaped on powder pumping pipe road 3.It stretches into the interior corresponding anode disc sky of vacuum chamber and leaves horn mouth, the powder pumping pipe road other end communicates with cylinder type powder collector 6, the stainless pipe formula powder-scraper 4 of inflatable band mesh is equipped with at the place suitable for reading of powder collector 6, and when blow in the collar extension place, powder-scraper 4 can be scraped the powder on the wall in the pollen storage bottle 8.A side corresponding with powder pumping pipe road 3 interfaces on powder collector 6 tops has airduct 11, and airduct 11 is equipped with multilayer stainless steel screen pack 5 with powder collector 6 joints, and the other end of airduct 11 is connected with vacuum chamber 10 bottoms through circulating pump 7, forms the exhausting circulatory system.
In this patent, make negative electrode 2 with copper coin, and the angle between the anode 1 is 45 ° of degree, during operation, with the starting the arc between manual adjustments negative electrode and the anode, electric arc is difficult for stable.The metal material of system nano powder has destroyed the atmosphere in the vacuum chamber 10 by 9 mouthfuls of addings of feeder when reinforced, be difficult to realize continuous powder process.The tubular type powder-scraper can not be wiped powder off fully, has quite a few can be deposited on the screen pack 5.Powder collector 6 be in static position and nano powder itself since surface area big, quality is little, be difficult for falling in the powder collector 6.The reaction internal ambience destroys easily when changing pollen storage bottle 8; Owing to manually adjust electric arc, it is reinforced to open 9 mouthfuls of feeders, need stop powder process when getting powder and must scrape powder by additionaling power, is difficult to realize continuous production in enormous quantities; Use general electric arc heated evaporated metal, energy density is low, temperature is low, make refractory metal, ceramic nano material efficiency low, yield poorly.
Summary of the invention
The purpose of this utility model is to overcome the shortcoming in the existing preparation refractory metal catalyst technology, propose a kind of automatic starting the arc that shows by computer control, automatically stabilising arc, auto feed, receive the cermet plasma nano material preparation device of powder automatically, solve effectively in the metal-ceramic nano preparation yield poorly, efficient is low, cost is high problem.
For achieving the above object, the technical solution of the utility model is:
A kind of cermet plasma nano material preparation device comprises
One body comprises a negative electrode, an anode, a gas nozzle and a motor;
One charging system comprises the electrode holder of the screw rod that is connected with described motor, the rise fall of electrodes bar that is connected with described anode and fixing described anode;
One gas-circulating system comprises the cross over pipe and the tracheae of vacuum chamber, vavuum pump, connection vacuum chamber also being provided with an air pump in the described gas-circulating system;
One receives the powder device, comprises powder collector, a pollen storage bottle, controls its gas circuit opening and closing by a ball valve between described powder collector and the pollen storage bottle;
One blast pipe is communicated with described air pump and receives the powder device; And
One control computer.
Described cermet plasma nano material preparation device, wherein said vacuum chamber is a double-decker, middle water flowing cooling.
Described cermet plasma nano material preparation device wherein further is provided with first-class pressure pipe between pollen storage bottle and powder collector.
Described cermet plasma nano material preparation device, wherein said powder collector and pollen storage bottle are for flexibly connecting.
The utility model compared with prior art has novel structure, and control is advanced, and good looking appearance, technology are rationally, powder process output height, efficient height and price be than low.The cermet powder degree that present technique makes is below 100nm, and metal alloy, nitride, oxide ceramics, carbide ceramics granularity are below 50nm, and epigranular, purity height, is fit to scientific research and industrial production in batches.
Description of drawings
Fig. 1 is the structural representation of nano material preparation device in the prior art;
Fig. 2 is the structural representation of metal-ceramic nano material preparation device of the present invention.
The figure number explanation:
34 vavuum pumps, 16 connecting tubes, 23 air pumps
37 negative electrodes, 17 blast pipes, 24 control computers
38 gas nozzles, 18 powder collectors, 26 electrode holders
39 vacuum chambers, 19 ball valves, 27 anodes
31 motor, 20 pollen storage bottles, 28 rise fall of electrodes bars
22 tracheaes
The specific embodiment
Below in conjunction with accompanying drawing,, describe in detail but do not limit the utility model by description to the utility model better embodiment.
As shown in Figure 2, Fig. 2 is a cermet material plasma nano material preparation device schematic diagram of the present utility model, described cermet material plasma nano material preparation device is made up of body, charging system, gas-circulating system, receipts powder device and control system, wherein body comprises a negative electrode 37 and anode 27, one gas nozzle 38 and a motor 31, charging system comprises the electrode holder 26 of a screw rod that is connected with motor 29, the rise fall of electrodes bar 28 that is connected with anode 27 and fixed anode; Gas-circulating system comprises vacuum chamber 39, vavuum pump 34, connects the cross over pipe 16 and the tracheae 22 of vacuum chamber 39, and air pump 23 is arranged in the gas-circulating system, is communicated with receipts powder device by blast pipe 17; Receive the powder device comprise a powder collector 18, a pollen storage bottle 20 and be arranged on pollen storage bottle 20 with powder collector 18 between etc. pressure pipe 21, pass through a ball valve between powder collector 18 and the pollen storage bottle 20 and control gas circuit opening and closing between them.Control system comprises a control computer 24, and communication is connected with gas-circulating system with body for it, controls the operation of whole device.
When anode 27 losses behind certain size, 31 counter-rotatings of control computer 24 control motor make screw rod 29 drive elevating levers 28, electrode holder 26 rises to specified altitude with anode 27, open air valve simultaneously, open the latch segment on the electrode holder 26, start reduction box, cantilever is descended, start the feed collet rotation then, the charge bar that promotes in the material cabin enters in the electrode holder 26, and the counter-rotating of the gear of reduction box, elevating lever 28 rise, close gas check valve, finish charging process.
Receive the powder device and in striking, open air pump 23, vacuum chamber 39 interior gases are entered in the powder collector 18 by connecting tube 16, carry out the gas powder and separate.Nano powder falls into pollen storage bottle 20 by ball valve 19 after separating, separated gas is sent into vacuum chamber 39 again by blast pipe 17, air pump 23, tracheae 22, forms gas-circulating system.
First-class pressure pipe 21 is installed between powder collector 18 and the pollen storage bottle 20; make the nano powder that makes be easy to fall into pollen storage bottle 20; after nano powder is filled pollen storage bottle 20; close ball valve 19, the button of opening on the pollen storage bottle 20 is pulled, and takes the powder bottle of filling away; change empty pollen storage bottle 20; open ball valve 19 again, nano powder promptly falls into empty pollen storage bottle 20, need not shut down in the whole process of getting, transport and store powder bottle 20.
The utility model uses at a high speed, the plasma arc of high temperature gasifies fast raw material, the arc energy density of generation is more than ten times of general electric arc, temperature is high more than five times.Refractory metal, ceramic nano powder yield height, the efficient height made.Whole device adopts computer control, automaticity height, simple to operate, and each staff can operate many machines.
More than detailed description of the present utility model is not limited the utility model, those skilled in the art can make various changes and distortion to the utility model, only otherwise break away from spirit of the present utility model, all should belong to scope of the present utility model.
Claims (4)
1, a kind of cermet plasma nano material preparation device, it is characterized in that: this preparation facilities comprises a body, comprises a negative electrode, an anode, a gas nozzle and a motor;
One charging system comprises the electrode holder of the screw rod that is connected with described motor, the rise fall of electrodes bar that is connected with described anode and fixing described anode;
One gas-circulating system comprises the cross over pipe and the tracheae of vacuum chamber, vavuum pump, connection vacuum chamber also being provided with an air pump in the described gas-circulating system;
One receives the powder device, comprises a powder collector, a pollen storage bottle, controls its gas circuit opening and closing by a ball valve between described powder collector and the pollen storage bottle;
One blast pipe is communicated with described air pump and receives the powder device; And
One control computer;
Communication is connected wherein said control computer with gas-circulating system with body, and described charging system is connected with the vacuum chamber of gas-circulating system by screw rod.
2, the described cermet plasma of claim 1 nano material preparation device, it is characterized in that: described vacuum chamber is a double-decker, middle water flowing cooling.
3, the described cermet plasma of claim 1 nano material preparation device is characterized in that: first-class pressure pipe is set between pollen storage bottle and powder collector.
4, the described cermet plasma of claim 1 nano material preparation device is characterized in that: described powder collector and pollen storage bottle are for flexibly connecting.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2009201356520U CN201279590Y (en) | 2009-03-16 | 2009-03-16 | Metal ceramics plasma nano-material preparation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2009201356520U CN201279590Y (en) | 2009-03-16 | 2009-03-16 | Metal ceramics plasma nano-material preparation device |
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| Publication Number | Publication Date |
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| CN201279590Y true CN201279590Y (en) | 2009-07-29 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU2009201356520U Expired - Fee Related CN201279590Y (en) | 2009-03-16 | 2009-03-16 | Metal ceramics plasma nano-material preparation device |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102847950A (en) * | 2011-06-29 | 2013-01-02 | 王志平 | High-frequency plasma multifunctional powder production equipment |
| CN107686124A (en) * | 2017-09-04 | 2018-02-13 | 大同万物生科技有限公司 | Argon-arc plasma field nano particle of spherical structure and preparation method and application |
| CN109396456A (en) * | 2018-12-28 | 2019-03-01 | 西安赛隆金属材料有限责任公司 | A kind of preparation facilities and method at globular tungsten powder end |
| CN111168077A (en) * | 2020-01-03 | 2020-05-19 | 广东工业大学 | Preparation system and preparation method of nano alloy material |
| CN111168076A (en) * | 2020-01-03 | 2020-05-19 | 广东工业大学 | Preparation system and preparation method for nano conductor or semiconductor material with controllable size |
-
2009
- 2009-03-16 CN CNU2009201356520U patent/CN201279590Y/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102847950A (en) * | 2011-06-29 | 2013-01-02 | 王志平 | High-frequency plasma multifunctional powder production equipment |
| CN107686124A (en) * | 2017-09-04 | 2018-02-13 | 大同万物生科技有限公司 | Argon-arc plasma field nano particle of spherical structure and preparation method and application |
| CN109396456A (en) * | 2018-12-28 | 2019-03-01 | 西安赛隆金属材料有限责任公司 | A kind of preparation facilities and method at globular tungsten powder end |
| CN109396456B (en) * | 2018-12-28 | 2024-02-13 | 西安赛隆金属材料有限责任公司 | Preparation device and method of spherical tungsten powder |
| CN111168077A (en) * | 2020-01-03 | 2020-05-19 | 广东工业大学 | Preparation system and preparation method of nano alloy material |
| CN111168076A (en) * | 2020-01-03 | 2020-05-19 | 广东工业大学 | Preparation system and preparation method for nano conductor or semiconductor material with controllable size |
| CN111168076B (en) * | 2020-01-03 | 2020-10-27 | 广东工业大学 | Preparation system and preparation method for nano conductor or semiconductor material with controllable size |
| WO2021136059A1 (en) * | 2020-01-03 | 2021-07-08 | 广东工业大学 | Preparation system and method capable of controlling size of nano-conductor/semiconductor material |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090729 Termination date: 20100316 |