CN201251664Y

CN201251664Y - Color film substrate

Info

Publication number: CN201251664Y
Application number: CNU2008200591707U
Authority: CN
Inventors: 田广彦
Original assignee: SVA Group Co Ltd
Current assignee: SVA Group Co Ltd
Priority date: 2008-05-30
Filing date: 2008-05-30
Publication date: 2009-06-03
Anticipated expiration: 2018-05-30

Abstract

The utility model relates to a color film substrate, which comprises a substrate, a black matrix, a plurality of pigment layers and a transparent conducting film, wherein the black matrix forms on the substrate and defines a plurality of sub-pixel areas, the black matrix is a light blocking layer including conducting materials, each pigment layer forms in one sub-pixel area, the transparent conducting film covers on the black matrix and the pigment layers, and the conducting materials of the black matrix which are not covered by the pigment layers expose to electrically connect with the transparent conducting film. The color film substrate of the utility model can reduce the signal delay of a common electrode, and improves the liquid crystal display effect.

Description

Color membrane substrates

Technical field

The utility model relates to a kind of color membrane substrates, particularly relates to a kind of color membrane substrates that is used for liquid crystal indicator.

Background technology

LCD (LCD) is a kind of flat-panel screens that is widely used at present, compares with other display modes, has advantages such as low-power consumption, external form be thin, in light weight, radiationless.Generally speaking, LCD includes array infrabasal plate, color film (CF) upper substrate and is filled in liquid crystal layer between the upper and lower base plate; Color film upper substrate comprise black matrix (Black Matrix, BM), R/G/B uvea and as the transparent conductive film of common electrode; The yawing moment that common electrode on the color film upper substrate and the electric field intensity between the pixel electrode on the array infrabasal plate are being modulated liquid crystal molecule.

A kind of manufacturing process synoptic diagram of color film upper substrate such as Fig. 1, Fig. 2 and shown in Figure 3: be glass substrate often at first at substrate 10) go up deposition layer of metal layer 111 (as chromium, aluminium), utilize photoetching process to form black matrix 11 patterns, please refer to Fig. 1; To reflection of light, on metal level 111, carrying out antireflection processing (as oxidation processes), form oxide layer 112 for fear of metal material usually; Utilize photoetching process on black matrix 12, to form R, G, B uvea 121,122,123 patterns successively, please refer to Fig. 2, mix, can keep certain clearance (as 10 μ m) between the different uveas for fear of uvea; Deposition layer of transparent conductive film 13 (as tin indium oxides) please refer to Fig. 3 as common electrode on whole base plate 10 at last.Common electrode on the color film upper substrate is connected with array infrabasal plate electricity outside the viewing area of LCD, and electrical signal is applied to the common electrode of color film upper substrate by the junction.

In the manufacturing of LCD, if crossing conference, the signal delay of the common electrode of color film upper substrate produces the unequal problem of demonstration, influence the display effect of LCD.For the signal delay of the common electrode that reduces color film upper substrate, the common practice is the thickness that increases transparent conductive film on the color film upper substrate, and this can cause the increase of film formation time and the decline of transmitance again.The multiple-domain vertical orientating type TFT-LCD that opening is especially arranged for common electrode on the color film upper substrate, the connectedness meeting variation of common electrode, signal delay can be more serious.

The utility model content

Technical problem to be solved in the utility model provides a kind of color membrane substrates, can reduce the signal delay of common electrode on the color membrane substrates under the prerequisite that does not increase the electrically conducting transparent film thickness.

For addressing the above problem, the utility model provides a kind of color membrane substrates, comprises a substrate; One black matrix is formed on this substrate, defines a plurality of subpixel area, and this black matrix is the light blocking layer that contains conductive material; A plurality of uveas, each uvea are formed in the subpixel area; One nesa coating covers black matrix and uvea top; The conductive material of the wherein said black matrix that is not covered by uvea exposes out with this nesa coating electricity and is connected.

In the above-mentioned color membrane substrates, the conductive material in the wherein said black matrix is the chromium metal, and black matrix is the composite bed of chromium metal level and chromium oxide.

In the above-mentioned color membrane substrates, the conductive material in the wherein said black matrix is an aluminum metal, and described black matrix is the composite bed of aluminum metal and organic photoresist layer.

In the above-mentioned color membrane substrates, wherein said uvea is R, G, B uvea.

In the above-mentioned color membrane substrates, wherein said nesa coating is tin indium oxide or indium zinc oxide.

Color membrane substrates of the present utility model, because carrying out electricity with the conductive material among the BM, the common electrode on the color membrane substrates is connected, formed relation in parallel, reduced the interconnected resistance R on the common electrode, and be proportional to total capacitance C on the common electrode and the product of all-in resistance R at the time coefficient τ of the signal delay on the common electrode, that is:

τ∝R*C

Remain unchanged according to the capacitor C between common electrode of the present utility model and other metal levels, so the time coefficient τ that reduces to reduce signal delay on the common electrode of resistance R, the signal delay on the common electrode just can be reduced.

Description of drawings

Fig. 1 is for being formed with the structural representation of the color membrane substrates of deceiving matrix in the prior art, wherein Fig. 1 b is the schematic cross-section along Fig. 1 a section line A-A '.

Fig. 2 a is the structural representation that forms the color membrane substrates behind R, G, the B in the prior art, and Fig. 2 b is the schematic cross-section along Fig. 2 a section line A-A '.

Fig. 3 a is the structural representation of the color membrane substrates behind the formation nesa coating in the prior art, and Fig. 3 b is the schematic cross-section along Fig. 3 a section line A-A '.

Fig. 4～Fig. 8 be color membrane substrates of the present utility model manufacturing process flow in the cross section structure synoptic diagram.

Among the figure:

10, substrate 11, black matrix 111: metal level

112: oxide layer or organic photoresist layer

12, uvea 121, R uvea 122, G uvea 123, B uvea

13, electrically conducting transparent (approaching) film

Embodiment

The utility model is described in further detail below in conjunction with accompanying drawing and exemplary embodiments.

Fig. 4～Fig. 8 is the cross section structure synoptic diagram of color membrane substrates of the present utility model in manufacturing process flow.

Please refer to Fig. 4, substrate 10 at first is provided, this substrate 10 is the insulation transparent substrate, as glass, plastic substrate, is defined as color membrane substrates, is commonly referred to upper substrate.Depositing metal layers 111 on substrate 10, as chromium metal or aluminum metal layer.

Then, please refer to Fig. 5, metal level 111 is carried out antireflection to be handled, as cover the organic photoresist layer of one deck to the oxidation processes of chromium metal or on aluminum metal layer, form the composite bed of chromium metal level and oxide layer 112 or aluminum metal layer 111 and organic photoresist layer 112, the material of organic photoresist layer can be negative photoresist and mixes carbon black, and thickness is about 1-2 μ m, and the thickness of chromium metal is about 1000-3000A.

Then form black matrix (BM) 11 patterns by photoetching process, define a plurality of subpixel area, the uvea that continues and make in order to separation is to increase color contrast.

Then, please refer to Fig. 6, the color film that will comprise red (R), green (G), blue (B) by photoetching process is formed at sub-pixel area, utilize spin-coating method to form red pixel in sub-pixel area, mode by exposure imaging forms R uvea 121 patterns in the predetermined subpixel area that forms red pixel again, and remove the red pixel of other subpixel area, repeat above-mentioned steps, can get G uvea 122, B uvea 123 patterns, the thickness of uvea 12 forms the uveal order of different colours and includes but not limited to said sequence approximately between 1～2.5 millimeter.

Then, please refer to Fig. 7, utilize the photoetching process etched portions or, aluminum metal or chromium exposed metal/bare metal are come out all not by the BM material of R, G, B uvea 121,122,123 pattern covers; As exposing the conductive material chromium metal among the BM, the BM material that also can utilize R, G, B uvea pattern not to be covered during etching with the oxide layer 112 on the wet etching chromium metal level by uvea as mask (mask) etching.

At last, please refer to Fig. 8.Deposit transparent conductive film 13 on whole base plate 10 forms common electrode, and to make this layer nesa coating 13 be that metal level 111 electricity are connected with conductive material among the BM.The material of this nesa coating 13 can be tin indium oxide (ITO), indium zinc oxide (IZO) etc., and thickness is about 500-2000A.

With 47 inches full HD TV is that example illustrates the beneficial effects of the utility model, and its resolution is 1920 * 3 * 1080, and the chromium metal layer thickness is 3000A on the color membrane substrates, and the thickness of common electrode ITO is 1500A:

Prior art is meant that general common electrode does not have situation about being connected with BM conductive material electricity.

From above table, as can be seen, common electrode and conductive material among the BM are carried out electricity be connected, can effectively reduce signal delay, improve the display effect of LCD.

Though the utility model discloses as above with preferred embodiment; right its is not in order to limit the utility model; any those skilled in the art; in not breaking away from spirit and scope of the present utility model; when doing a little modification and perfect, therefore protection domain of the present utility model is worked as with being as the criterion that claims were defined.

Claims

1, a kind of color membrane substrates comprises

One substrate;

One black matrix is formed on this substrate, defines a plurality of subpixel area, and this black matrix is the light blocking layer that contains conductive material;

A plurality of uveas, each uvea are formed in the subpixel area;

One nesa coating covers black matrix and uvea top;

The conductive material that it is characterized in that the described black matrix that is not covered by uvea exposes out with this nesa coating electricity and is connected.

2, color membrane substrates according to claim 1 is characterized in that the conductive material in the described black matrix is the chromium metal, and black matrix is the composite bed of chromium metal level and chromium oxide.

3, color membrane substrates according to claim 1 is characterized in that the conductive material in the described black matrix is an aluminum metal, and described black matrix is the composite bed of aluminum metal and organic photoresist layer.

4, color membrane substrates according to claim 1 is characterized in that described uvea is R, G, B uvea.

5, color membrane substrates according to claim 1 is characterized in that described nesa coating is tin indium oxide or indium zinc oxide.