CN201207835Y - Insemination pot - Google Patents

Insemination pot Download PDF

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Publication number
CN201207835Y
CN201207835Y CNU2008200076602U CN200820007660U CN201207835Y CN 201207835 Y CN201207835 Y CN 201207835Y CN U2008200076602 U CNU2008200076602 U CN U2008200076602U CN 200820007660 U CN200820007660 U CN 200820007660U CN 201207835 Y CN201207835 Y CN 201207835Y
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China
Prior art keywords
internal layer
described internal
planting
basin
skirt section
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Expired - Fee Related
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CNU2008200076602U
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Chinese (zh)
Inventor
张景复
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Individual
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Individual
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Priority to CNU2008200076602U priority Critical patent/CN201207835Y/en
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Expired - Fee Related legal-status Critical Current

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  • Cultivation Receptacles Or Flower-Pots, Or Pots For Seedlings (AREA)

Abstract

A planting basin comprises an inner layer and a skirt portion, and is characterized in that a plurality of pores are formed on the lateral wall surface of the inner layer in a regular arrangement or an irregular dispersion manner and pass into a space between the skirt portion and the inner layer, the pores, and a plurality of drain holes are arranged on the bottom surface of the inner layer; and the skirt portion surrounds the outer periphery of the inner layer, a space is arranged between the main body of the skirt portion and the inner layer, the bottom edge of the skirt portion is relatively higher than the bottom surface of the inner layer, and a plurality of vent notches are formed at the bottom edge of the skirt portion. The planting basin has draining, ventilating, moisturizing, and heating insulating functions.

Description

The basin of planting
Technical field
The utility model relates to a kind of basin of planting, specifically, be a kind of for example plant orchid required have sluicing, breathe freely, preserve moisture, the basin structure of planting of heat insulation effect.
Background technology
As everyone knows, want to cultivate well-grown plant, preferably can be with reference to environment (that is the optimal growing environment) condition of the Proterozoic of this plant, simulate the environment of suitable this plant growing as far as possible, in the middle of existing culture technique, mainly utilize the characteristic of cultivation mediums such as natural sand loam, compost, peat moss, river sand, sphagna, letterwood bits, letterwood piece, cocoa husk, nacrite, vermiculite, foamed burnt stone, bark, after being allocated, build the soil condition of suitable this plant growing.
For example, orchid is primary between mountain forest, the environment that majority is grown thickly and mixed at the pin broad leaved forest, because the pin broad leaved forest mixes the sun that covers that forms, air humidity is reasonable, the ventilation situation not by force also not a little less than, the air that often contains certain humidity is flowing, in addition, orchid root has been the gas fleshy root, need have ventilative, the strong environment that sluices, and the method place of therefore general artificial cultivation orchid is many plants orchid in the middle of flowerpot, the letterwood bits that cooperate special ratios again are as cultivation medium, in the hope of building the soil condition that is fit to the orchid growth.
Now see also Fig. 1, Fig. 1 is the appearance assumption diagram of the existing basin of planting.As shown in Figure 1, the existing basin structure of planting, only be provided with a spilled water hole A mostly in the bottom surface of the whole basin of planting, discharge for unnecessary water, not only easy ponding causes plants the butt rot of planting, and gas permeability is poor, relatively the humidity of soil is too high, for orchid, may whenever water a water all can make orchid once sick, the position of basin of planting of usefulness on the other hand for splendid attire soil, except described bleeder port A, there is no other space and stretch for planting the root of planting, cause seriously the growth quality of planting being planted in influence.
Therefore the existing basin of planting exists above-mentioned all inconvenience and problem.
Summary of the invention
The purpose of this utility model is to provide a kind of and has preferable sluicing, breathes freely, preserves moisture, the basin structure of planting of heat insulation effect.
The technical scheme that the utility model addresses the above problem is:
A kind of basin of planting comprises an internal layer and a skirt section, it is characterized in that:
The wall of described internal layer is provided with some perforation, and penetrate into the gap between described skirt section and the described internal layer, described perforation can be adopted the mode of regularly arranged or irregular dispersion, be laid in the side wall surface of described internal layer, and the bottom surface of described internal layer is provided with a plurality of spilled water holes;
Described skirt section is trapped among the outer ring of described internal layer relatively, and is provided with a space between the main body in described skirt section and the described internal layer, and the root edge in described skirt section is to exceed described internal layer bottom surface relatively, and the root edge in described skirt section is provided with some ventilation breach.
The basin of planting of the present utility model can also be further achieved by the following technical measures.
The aforesaid basin of planting, the wall of wherein said internal layer is provided with some perforation and penetrates into gap between described skirt section and the described internal layer.
The aforesaid basin of planting, wherein said skirt section are one-body molded with described internal layer.
The aforesaid basin of planting, wherein said skirt section are the outer rings that is set in described internal layer in external mode.
The aforesaid basin of planting, wherein said skirt section and described internal layer or be that described skirt section is to be that material is made with mixed with resin jade powder at least.
The aforesaid basin of planting, wherein said skirt section and described internal layer or be that described skirt section is to form with jade material carving system at least.
The aforesaid basin of planting, each spilled water hole of wherein said internal layer is to be arranged on regularly on the bottom surface of described internal layer.
The aforesaid basin of planting, each spilled water hole of wherein said internal layer is to be arranged on brokenly on the bottom surface of described internal layer.
The aforesaid basin of planting, the perforation of wherein said internal layer are to be arranged on regularly on the wall of described internal layer.
The aforesaid basin of planting, the perforation of wherein said internal layer are to be arranged on brokenly on the wall of described internal layer.
After adopting technique scheme, the basin of planting of the present utility model has the following advantages:
1. utilize a plurality of spilled water holes of described internal layer bottom surface, promote the sluicing function of Pot for cultivating plant;
2. utilize the spilled water hole holder height of described skirt section root edge with described internal layer bottom surface, and utilize the breach of described skirt section root edge, pass in and out the high space of holder, described internal layer bottom surface for air, the space of circulation convection current between described skirt section and described internal layer is so can promote the airing function of the basin of planting greatly;
3. the space between described skirt section and the described internal layer has the effect of storage humidity, so have preferable moistening effect;
4. the space between described skirt section and the described internal layer has and reduces the conduction of heat of planting between basin outside and the soil, so have preferable effect of heat insulation;
5. the set perforation of described internal layer wall, except the effect that the circulation of air convection current is provided, still can for the plant of planting for example planting of orchid plant root and be stretched over space between described skirt section and the described internal layer, making planting of orchid plant the root free shuttling twines therebetween, so have preferable extending space, and by twining staggered root, can fully absorb nutrition parts such as fertilizer, nutrition part more can not run off, cause serikes such as orchid to be grown healthyly, fine, and via the root that described perforation stretches out, can be covered by described skirt section, it is whole potted plant attractive in appearance to be unlikely influence.
Description of drawings
Fig. 1 is the appearance assumption diagram of the existing basin of planting;
Fig. 2 is the plant appearance assumption diagram of basin of the utility model;
Fig. 3 is the plant structure cutaway view of basin of the utility model;
Fig. 4 is the plant user mode schematic diagram of basin of the utility model.
Embodiment
Below in conjunction with embodiment and accompanying drawing thereof the utility model is illustrated further.
See also Fig. 2 and Fig. 3, Fig. 2 is the plant appearance assumption diagram of basin of the utility model.Fig. 3 is the plant structure cutaway view of basin of the utility model.As shown in the figure, the described basin 10 of planting includes an internal layer 11 and skirt section 12, wherein said internal layer 11 main splendid attire medium or the soil of supplying, its bottom surface is provided with a plurality of spilled water holes 111, discharge for unnecessary water, avoid causing medium or soil ponding, when implementing, each described spilled water hole 111 is to adopt the mode of regularly arranged or irregular dispersion to be arranged on the bottom surface of described internal layer 11.
Described skirt section 12 is the outer rings that are trapped among described internal layer 11 relatively, has a space 13 between the main body in described skirt section 12 and the described internal layer 11, make air be circulated convection current therebetween, the root edge in described skirt section 12 is to exceed described internal layer 11 bottom surfaces relatively, and be able to spilled water hole 111 holders of described internal layer 11 bottom surfaces high, described skirt section 12 and be provided with some ventilation breach 121 at its root edge passes in and out the high space of holder, described internal layer 11 bottom surfaces for air.
The described skirt section 12 of the described basin 10 of planting can be one-body molded with described internal layer 11, or described skirt section 12 is set in the outer ring of described internal layer 11 in external mode.
The utility model can be further be provided with some perforation 112 at the wall of described internal layer 11, penetrate into 13 places, space between described skirt section 12 and the described internal layer 11, and described perforation 112 can be adopted the mode of regularly arranged or irregular dispersion, be arranged on the side wall surface of described internal layer 11, setting by described perforation 112, not only can make air free flow convection current therebetween, and can for the institute serike for example planting of orchid plant the root free shuttling and twine, and plant root by staggered the planting of described winding, can fully absorb for example nutrition such as fertilizer, nutrition more can not run off, and then make serike such as orchid grow healthyly, fine.
Described integral body is planted basin 10 when reality is used, can utilize the sluicing function of the described basin 10 of planting of a plurality of spilled water holes 111 liftings of described internal layer 11 bottom surfaces, and utilize described skirt section 12 root edges, spilled water hole 111 holders of described internal layer 11 bottom surfaces are high, cooperate the ventilation breach 121 that utilizes described skirt section 12 root edges, pass in and out the high space of holder, described internal layer 11 bottom surfaces for air, and then promote the airing function of the described basin 10 of planting greatly, as for the space between described skirt section and the described internal layer, has the effect of storage humidity, so have preferable moistening effect.
What deserves to be mentioned is, space 13 between described skirt section 12 and the described internal layer 11, has the described conduction of heat of planting between basin 10 outsides and the soil of reduction, therefore has preferable effect of heat insulation, the perforation 112 of especially described internal layer 11 walls can for the institute serike for example planting of orchid etc. plant root and extend to space 13 between described skirt section 12 and the described internal layer 11, allow the institute serike for example planting of orchid etc. plant the root free shuttling and twine, so can provide and have preferable extending space, because, the basin 10 of planting of the present utility model has preferable sluicing, airing function, and have concurrently and preserve moisture, heat insulation effect so be fit to use for plants such as plantation orchids very much.
See also Fig. 4 again, Fig. 4 is the plant user mode schematic diagram of basin of the utility model.When the described basin 10 of planting uses for plantation orchid 20, only need in principle to cooperate suitable cultivation medium 30, just can allow the root of orchid 20, have splendid gas permeability and suitable moisture retention, effectively subduction harm that orchid is caused because of watering improper.In addition, the described basin 10 of planting can also allow the root of orchid 20, obtains more extending space, as for stretching out the root of described internal layer 11 outer rings via described perforation 112, then can be covered by described skirt section 12, can not influence whole potted plant attractive in appearance fully.
The plant described skirt section 12 of basin 10 of the utility model is can be one-body molded with plastic material with described internal layer 11, or in external mode, use the outer ring that described skirt section 12 is set in described internal layer 11.
In the utility model is planted another embodiment of basin 10, the described skirt section 12 of the described basin 10 of planting and described internal layer 11 both or be described skirt section 12 at least, be to be that material is made with mixed with resin jade powder, in order to represent the noble sense of worth of the described basin 10 of planting, the noble plants such as for example orchid that collocation is planted show elegant and poised daring outward appearance.
In another embodiment of the basin 10 of planting of the present utility model, the described skirt section 12 of the described basin 10 of planting and described internal layer 11 both or be described skirt section 12 at least, be to form with jade material carving system, the noble sense of worth that is similarly represented the described basin 10 of planting, the noble plants such as for example orchid that collocation is planted show elegant and poised daring outward appearance.
Above embodiment is only for the usefulness that the utility model is described, but not to restriction of the present utility model, person skilled in the relevant technique under the situation that does not break away from spirit and scope of the present utility model, can also be made various conversion or variation.Therefore, all technical schemes that are equal to also should belong to category of the present utility model, should be limited by each claim.

Claims (9)

1, a kind of basin of planting comprises an internal layer and a skirt section, it is characterized in that:
The wall of described internal layer is provided with some perforation, and penetrate into the gap between described skirt section and the described internal layer, described perforation can be adopted the mode of regularly arranged or irregular dispersion, be laid in the side wall surface of described internal layer, and the bottom surface of described internal layer is provided with a plurality of spilled water holes;
Described skirt section is trapped among the outer ring of described internal layer relatively, and is provided with a space between the main body in described skirt section and the described internal layer, and the root edge in described skirt section is to exceed described internal layer bottom surface relatively, and the root edge in described skirt section is provided with some ventilation breach.
2, the basin of planting according to claim 1 is characterized in that: the wall of described internal layer is provided with some perforation and penetrates into gap between described skirt section and the described internal layer.
3, the basin of planting as claimed in claim 1 or 2, it is characterized in that: described skirt section is one-body molded with described internal layer.
4, the basin of planting as claimed in claim 1 or 2, it is characterized in that: described skirt section is the outer ring that is set in described internal layer in external mode.
5, the basin of planting as claimed in claim 1 or 2 is characterized in that: described skirt section and described internal layer or be that described skirt section is to form with jade material carving system at least.
6, the basin of planting as claimed in claim 1 or 2, it is characterized in that: each spilled water hole of described internal layer is to be arranged on regularly on the bottom surface of described internal layer.
7, the basin of planting as claimed in claim 1 or 2, it is characterized in that: each spilled water hole of described internal layer is to be arranged on brokenly on the bottom surface of described internal layer.
8, the basin of planting as described in asking 1 or 2 as the right model, it is characterized in that: the perforation of described internal layer is to be arranged on regularly on the wall of described internal layer.
9, the basin of planting as claimed in claim 1 or 2, it is characterized in that: the perforation of described internal layer is to be arranged on brokenly on the wall of described internal layer.
CNU2008200076602U 2008-03-27 2008-03-27 Insemination pot Expired - Fee Related CN201207835Y (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNU2008200076602U CN201207835Y (en) 2008-03-27 2008-03-27 Insemination pot

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNU2008200076602U CN201207835Y (en) 2008-03-27 2008-03-27 Insemination pot

Publications (1)

Publication Number Publication Date
CN201207835Y true CN201207835Y (en) 2009-03-18

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Family Applications (1)

Application Number Title Priority Date Filing Date
CNU2008200076602U Expired - Fee Related CN201207835Y (en) 2008-03-27 2008-03-27 Insemination pot

Country Status (1)

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CN (1) CN201207835Y (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105075702A (en) * 2014-05-07 2015-11-25 林兆钧 Orchid planting pot

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105075702A (en) * 2014-05-07 2015-11-25 林兆钧 Orchid planting pot

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GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20090318

Termination date: 20140327