CN201188091Y - Low temperature device for film non-contact heat expansion measurement - Google Patents

Low temperature device for film non-contact heat expansion measurement Download PDF

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Publication number
CN201188091Y
CN201188091Y CNU2008200123054U CN200820012305U CN201188091Y CN 201188091 Y CN201188091 Y CN 201188091Y CN U2008200123054 U CNU2008200123054 U CN U2008200123054U CN 200820012305 U CN200820012305 U CN 200820012305U CN 201188091 Y CN201188091 Y CN 201188091Y
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China
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liquid nitrogen
vacuum
thermal expansion
low temperature
well heater
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Expired - Fee Related
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CNU2008200123054U
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Chinese (zh)
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王宝全
陈新贵
何冠虎
郭敬东
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Institute of Metal Research of CAS
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Institute of Metal Research of CAS
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Abstract

The utility model relates to a technology used for thin film non-contact heat expansion measuring, in particular to a low energy consumption cryogenic device used for thin film non-contact heat expansion measuring (130-250 below zero). The device is provided with a low-temperature-high-temperature furnace system and a sample holder system, wherein, the low temperature-high temperature furnace system adopts a two-stage vacuum double-layer structure, a heating device positioned in the low temperature-high temperature furnace system adopts a cone-shaped-groove-shaped structure, and the sample holder system positioned in the heater adopts an elastic gripping structure. The device utilizes the non-contact method to measure the low energy consumption of thin film heat expansion, the temperature range is expanded to low temperature, the cryogenic device enables the temperature of the sample to reduce to 130 below zero within 1.5 hours, and the consumed liquid nitrogen is 5 liters.

Description

A kind of Cryo Equipment that is used for film noncontact thermal expansion measurement
Technical field
The utility model relates to and is used for film noncontact thermal expansion measurement technology, is specially a kind of low energy consumption Cryo Equipment (130 ℃~250 ℃) that is used for film noncontact thermal expansion measurement.
Background technology
Membraneous material is widely used in fields such as microelectronics and space flight, and for example existing metallic film is made electrode in the computer chip architecture, superpolymer is arranged as dielectric layer again.The thermal expansivity of these two kinds of films differs greatly, and generally will add the low bulk material in polymer film and reduce its expansion coefficient, makes it to be complementary with the expansion coefficient of metallic film, and their expansion coefficient needs accurately to measure undoubtedly.Along with the raising of chip integration and the quickening of arithmetic speed, the matching problem of thermal expansivity is particularly outstanding, and the environment for use of these films should have wider temperature range, not only will use more than room temperature, and the thermal expansivity that is lower than room temperature also has urgent demand.
The pertinent literature of measuring the macromolecule membrane thermal expansion has: [Miyagawa T, Fukushima T, Oyama T, Iijima T, Tomoi M.Photosensitive fluorinated polyimides with a low dielectric constantbased on reaction development patterning.J.Polymer Sci.Part A:Polymer Chemistry2003; 41 (6): 861-11.] and [Lu SX, Cebe P, Capel M.Thermal stability and thermalexpansion studies of PEEK and relative polyimides.Polymer 1996; 37 (14): 2999-11.]; With thermomechanical analysis (TMA method), do not see the result who demarcates with the canonical reference sample yet.
The pertinent literature of low temperature thermal expansion has: [Wang ZD, Lu JJ, Li Y, Fu SY, Jiang SQ, Zhao XX.Low temperature properties of PI/SiO 2Composite films Materials Sci.﹠amp; Eng.B2005; 123:216-6.] and [Wang Zhengdao, Zhao Xinxin, Jiang Shaoqing, Lu Jianjun, thin film low temperature thermal expansivity method of measuring, cryogenic engineering, 2005, the 5 phases, 56-58].Though also adopt non-contact method to measure thermal expansion, do not see the result who demarcates with the canonical reference sample.
We have obtained patent early stage: Chinese invention patent, a kind of non-contact measurement method of thermal expansivity and device, application number: 96115325.3, publication number CN1152124A, temperature range is a room temperature to 250 ℃, and delivered paper: [He GH., Wang BQ, Guo XN, Yang F, Guo JD, Zhou BL.Investigationof thermal expansion of brass strip H62 after high current density electropulsing by CCDtechnique.Mater.Sci.﹠amp; Eng.A 2000; 292:183-6.] and [Wang H, Zhang YY, He GH, Wang BQ, Zhou BL.A contactless CCD dilatometer for foil materials.Int.J.Thermophysics, 1999; 20:743-11.], confirm its availability.Temperature range be expanded to low temperature, be not to extend toward the low temperature direction simply, needs to solve series of technical.Document [Xin-gui Chen, Jing-Dong Guo, Bing Zheng, Yuan-Qing Li, Shao-Yun Fu, 200 ℃ of Guan-Hu He.Investigationofthermal expansion of PI/SiO2 nano-compositr films by CCD imaging technique from-120 to, Composites Science and Technology, 67 (2007), 3006-3013] be the usefulness CCD PI/SiO2 film thermal expansion measurement result that we deliver, do not see the method with the thermal expansion of noncontact CCD method MEASUREMENTS OF THIN in addition, simply introduced the content of low-temperature measurement, some ins and outs do not relate to.
The utility model content
The purpose of this utility model is to provide a kind of Cryo Equipment that is used for film noncontact thermal expansion measurement, and the low energy consumption with the thermal expansion of non-contact method MEASUREMENTS OF THIN expands to low temperature with temperature range.
The technical solution of the utility model is:
A kind of Cryo Equipment that is used for film noncontact thermal expansion measurement, be provided with low temperature-high temperature furnace system, specimen mounting system, low temperature-high temperature furnace system adopts the two-stage vacuum double-decker, place the well heater of low temperature-high temperature furnace system to adopt tapered-slot type structure, place the specimen mounting system of well heater to adopt the resilient clamp structure.
Described two-stage vacuum double-decker is that the vacuum furnace chamber of low temperature-high temperature furnace system is two vacuum clip laminar structures, is vacuum pumpin layer between the interlayer of vacuum drying oven cavity outer wall and vacuum drying oven cavity wall, and the inside of vacuum drying oven cavity wall is vacuum.
Described vacuum drying oven cavity outer wall is furnished with the interlayer air extractor, vacuum drying oven cavity outer wall peripheral hardware has the vacuum furnace chamber protuberance of bleeding point, in the bleeding point in this vacuum furnace chamber protuberance O-ring seal is installed, the compression leg that has internal thread, thin axle one end of interlayer air extractor and compression leg are by being threaded, the thin axle other end is installed handle, the thin axle outside is provided with pedestal, pedestal one end inwall is and the corresponding fit structure of vacuum furnace chamber protuberance, this end is pressed by nut and is provided with seat ring, O-ring seal, the pedestal other end is equipped with gland, be provided with pressure ring in the cavity between pedestal and the thin axle in it, O-ring seal is communicated with exhaust tube on this cavity.
Described well heater arranged outside liquid nitrogen container, liquid nitrogen container is a double-decker, internal layer is the liquid nitrogen layer, skin is an air layer, air layer arranged outside insulation material, and skin is provided with bleeding point, the liquid nitrogen layer is provided with liquid nitrogen and imports and exports, liquid nitrogen is imported and exported by corrugated tube and is connected with liquid nitrogen turnover pipe, liquid nitrogen turnover pipe arranged outside heat-preservation cotton, liquid nitrogen turnover pipe and the sealing of vacuum furnace chamber.
Described tapered-the well heater cylindrical tapering of slot type structure closely contacts with the liquid nitrogen container inwall of same tapering, the well heater cylindrical is evenly equipped with the straight flute that parallels to the axis, in the continuous embedded groove of nickel filament, in-out end all places an end, the own thermal expansion of directly-wound nickel filament or coldly be contracted in the rectilinear direction segmentation and carry out.
Described specimen mounting system is provided with and pushes away seat, spring, ball, piezoid, sample is held between two piezoids, one piezoid is abutted against in a stationary end, and another piezoid leans by the ball that can move back and forth, and the ball opposite side is provided with spring, pushes away the thrust structure that seat forms.
The beneficial effects of the utility model are:
The utility model is used for the low energy consumption Cryo Equipment of film noncontact thermal expansion measurement, be provided with low temperature-high temperature furnace system, specimen mounting system, low temperature-high temperature furnace system adopts the two-stage vacuum double-decker, place the well heater of low temperature-high temperature furnace system to adopt tapered-slot type structure, place the specimen mounting system of well heater to adopt the resilient clamp structure.Cryo Equipment made sample be reduced to-130 ℃ in 1.5 hours, consumed 5 liters of liquid nitrogen.
Description of drawings
Fig. 1 is the utility model complete machine synoptic diagram.
Fig. 2 a-Fig. 2 c is the utility model liquid nitrogen container synoptic diagram; Wherein, Fig. 2 a is a front view; Fig. 2 b is a side view; Fig. 2 c is the soft multistage corrugated stainless steel tubing and the liquid nitrogen turnover partial graph that has insulation material that the utility model is carried liquid nitrogen.
Fig. 3 is the utility model interlayer air extractor synoptic diagram.
Fig. 4 a-Fig. 4 b is the utility model well heater and specimen mounting system schematic.Wherein, Fig. 4 a is a front view; Fig. 4 b is a side view.
Fig. 5 is the thermal expansion experiment test result of embodiment 1 fine copper film.
Fig. 6 is the thermal expansion experiment test result of embodiment 2 pure nickel films.
Fig. 7 is the thermal expansion experiment test result of embodiment 3 pyrolysis BN.
Among the figure, 1. Halogen lamp LED; 2. catoptron; 3. frosted glass; 4. lens combination; 5. temperature control equipment (K type temperature-control heat couple); 6. sample; 7. low temperature-high temperature furnace system (130 ℃~250 ℃); 8. first order imaging lens group (enlargement factor 1: 1); 9. diaphragm; 10.CCD device (TCD1705D of Toshiba Semiconductor company); 11. second level imaging lens group (enlargement factor 30: 1); 12. quartz glass; 13. temperature measuring equipment (T type temperature thermocouple); 14. liquid nitrogen container; 15. vacuum furnace chamber; 16. vacuum pumpin layer; 17. quartz glass; 18. interlayer air extractor; 19. vacuum drying oven cavity wall; 20. vacuum drying oven cavity outer wall; 21. compression leg; 22. vacuum furnace chamber protuberance; 23.O RunddichtringO; 24. specimen mounting system; A. high stable power supply; B.CCD driver and acquisition system; C. optical amplification system;
701. well heater; 702. nickel filament (Ni-Cr silk);
1401. bleeding point; 1402. it is outer; 1403. insulation material 1404. liquid nitrogen are imported and exported; 1405. corrugated tube; 1406. heat-preservation cotton; 1407. nut; 1408. silicon rubber loop; 1409. liquid nitrogen turnover pipe;
1801. pedestal; 1802. thin axle; 1803. pressure ring; 1804. pressure ring; 1805. gland; 1806. bulb handle; 1807.O RunddichtringO; 1808. exhaust tube; 1809.O RunddichtringO; 1810. nut; 1811. seat ring;
2401. push away seat; 2402. spring; 2403. ball; 2404. piezoid.
Embodiment
As shown in Figure 1, the utility model complete machine synoptic diagram, high stable power supply A, CCD driver and acquisition system B and optical amplification system C three parts and patent (Chinese invention patent in early stage among the figure, a kind of non-contact measurement method of thermal expansivity and device, application number: 96115325.3, publication number CN1152124A) similar, do not intend remaking careful description at this.
High stable power supply A selects for use Halogen lamp LED 1 to be lighting source, and its rated voltage is 24V, and the maximum voltage of stabilized voltage supply is 30V full scale electric current 10A.The light that Halogen lamp LED 1 produces is radiated on the frosted glass 3 through catoptron 2, and frosted glass 3 is positioned at the focal position of focus lens group 4, forms parallel beam;
CCD driver and acquisition system B see above-mentioned patent;
Optical amplification system C, adopt two stage optical to amplify light path, first order imaging lens group 8 was by imaging in 1: 1, second level imaging lens group 11 was by imaging in 30: 1, one diaphragm 9 is set between first order imaging lens group 8 and second level imaging lens group 11, CCD device 10 is set after the second level imaging lens group 11.
In the utility model, the Cryo Equipment that is used for film noncontact thermal expansion measurement is provided with low temperature-high temperature furnace system 7, specimen mounting system 24, low temperature-high temperature furnace system 7 adopts the two-stage vacuum double-decker, place the well heater 701 of low temperature-high temperature furnace system 7 to adopt tapered-slot type structure, place the specimen mounting system 24 of well heater 701 to adopt the resilient clamp structure.Cryo Equipment made sample be reduced to-130 ℃ in 1.5 hours, consumed 5 liters of liquid nitrogen.
This structure specifically comprises and being arranged in the vacuum furnace chamber 15: temperature control equipment (K type thermopair) 5, sample 6, well heater 701, temperature measuring equipment (T type thermopair) 13, liquid nitrogen container 14; Sample 6 is positioned in the well heater 701, temperature control equipment (K type thermopair) 5 and temperature measuring equipment (T type thermopair) 13 are set respectively in the well heater 701, well heater 701 arranged outside are equipped with the liquid nitrogen container 14 of liquid nitrogen, liquid nitrogen container 14 is provided with vacuum pumping opening, vacuum furnace chamber 15 is two vacuum clip laminar structures, be vacuum pumpin layer 16 between the interlayer of vacuum furnace chamber 15 outer walls and vacuum furnace chamber 15 inwalls, pars intramuralis also is a vacuum in the vacuum furnace chamber 15, forms the two-stage vacuum double-decker.In vacuum furnace chamber 15 and high stable power supply A, the corresponding both sides of optical amplification system C quartz glass 12, quartz glass 17 are set respectively.
Below two key technical problems are elaborated:
The emergent light window (quartz glass 12 among Fig. 1) that the incidence window (quartz glass 17 among Fig. 1) that 1. must make incident Halogen lamp LED collimated light source and CCD survey is dewfall not, just can finish CCD and survey, otherwise can make the detection image dsitortion.
2. thermal expansion will be measured temperature variant elongation of sample or amount of contraction, and sample should be cooled to-130 ℃ within a short period of time, heats up again thereupon, and the centre has only a narrow space to settle well heater.Must design the well heater and the specimen mounting system of a special construction, provide measurement embodiment at last.
First problem is described now, shown in Fig. 2 a-Fig. 2 c, be arranged at the liquid nitrogen container 14 that well heater 701 arranged outside are equipped with liquid nitrogen and comprise bleeding point 1401, outer 1402, insulation material 1403, liquid nitrogen imports and exports 1404, corrugated tube 1405, heat-preservation cotton 1406, nut 1407 silicon rubber loops 1408, liquid nitrogen turnover pipe 1409, liquid nitrogen container 14 is a double-decker, internal layer is the liquid nitrogen layer, outer 1402 is air layer, air layer arranged outside insulation material 1403, outer 1402 are provided with bleeding point 1401, the liquid nitrogen layer is provided with liquid nitrogen and imports and exports 1404, liquid nitrogen import and export 1404 are connected by corrugated tube 1405 and liquid nitrogen turnover pipe 1409, liquid nitrogen turnover pipe 1409 arranged outside heat-preservation cotton 1406, liquid nitrogen turnover pipe 1409 is by low temperature resistant silicon rubber loop 1408 and the sealing of vacuum furnace chamber, by nut 1407 and the locking of vacuum furnace chamber.
Liquid nitrogen container synoptic diagram shown in Fig. 2 a-Fig. 2 b, liquid nitrogen container 14 is the double-deck all steel weldment structures of a cover, internal layer is the liquid nitrogen layer, the liquid nitrogen layer is provided with liquid nitrogen and imports and exports 1404, outer 1402 is air layers, vacuum furnace chamber (vacuum furnace chamber 15 among Fig. 1) is when vacuumizing, this air layer also thereupon the bleeding point 1401 by wherein be evacuated down to 10 -1Pa, air layer arranged outside insulation material 1403 plays insulation effect, saves the consumption of liquid nitrogen.Fig. 2 c is the liquid nitrogen turnover partial graph of carrying the soft multistage corrugated stainless steel tubing of liquid nitrogen and having insulation material, stainless corrugated tube 1,405 one ends of soft multistage are welded to liquid nitrogen turnover pipe 1409, and corrugated tube 1405 other ends are welded to the feed liquor and the liquid outlet (being that liquid nitrogen imports and exports 1404 among Fig. 2 c) of liquid nitrogen container internal layer.Liquid nitrogen turnover pipe 1409 arranged outside heat-preservation cotton 1406, liquid nitrogen turnover part entire card is connected on vacuum drying oven cavity outer wall and the vacuum drying oven cavity wall, plays the vacuum seal effect by low temperature resistant silicon rubber loop (silicon rubber loop 1408 among Fig. 2 c) and nut (nut 1407 among Fig. 2 c).This structure can reduce liquid nitrogen consumption, easy installation and removal, and advantage is to make vacuum drying oven cavity wall temperature be unlikely to fall too lowly.
Make window not second means of dewfall be to make vacuum furnace chamber interlayer keep vacuum (vacuum pumpin layer 16 among Fig. 1), further insulation, make not dewfall of window, if adopt while testing the way that vacuumizes, vacuum can guarantee, but the vibration of exhaust tube can have a strong impact on the image that CCD surveys, and can't test.Therefore, designed a cover interlayer air extractor 18 (Fig. 3), interlayer air extractor 18 comprises pedestal 1801, thin axle 1802, pressure ring 1803, pressure ring 1804, gland 1805, bulb handle 1806, O RunddichtringO 1807, exhaust tube 1808, O RunddichtringO 1809, nut 1810, seat ring 1811.Form vacuum pumpin layer 16 between vacuum drying oven cavity wall 19, the vacuum drying oven cavity outer wall 20, vacuum drying oven cavity outer wall 20 peripheral hardwares have the vacuum furnace chamber protuberance 22 of bleeding point, O RunddichtringO 23 is installed in the bleeding point in this vacuum furnace chamber protuberance 22, is had the compression leg 21 of internal thread.Thin axle 1,802 one ends of interlayer air extractor and compression leg 21 are by being threaded, thin axle 1802 other ends are installed bulb handle 1806, thin axle 1802 outsides are provided with pedestal 1801, pedestal 1,801 one end inwalls are and vacuum furnace chamber protuberance 22 corresponding fit structures, this end is pressed by nut 1810 and is provided with seat ring 1811, O RunddichtringO 1809, pedestal 1801 other ends are equipped with gland 1805, be provided with pressure ring 1803, pressure ring 1804, O RunddichtringO 1807 in the cavity between pedestal 1801 and the thin axle 1802 in it, be communicated with exhaust tube 1808 on this cavity.Its principle of bleeding is:
When bleeding, the right part air extractor is connected with the vacuum pumpin layer 16 of left part vacuum furnace chamber, and after O RunddichtringO 1809 sealed with vacuum furnace chamber protuberance 22, the screw thread of thin axle 1802 heads and compression leg 21 internal threads on the vacuum pumpin layer 16 were connected to form confined space.Bulb handle 1806 is twitched to the right, and compression leg 21 is moved to right to exposing exhaust tube 1808, bleeds by exhaust tube 1808, makes the vacuum pumpin layer 16 of vacuum furnace chamber be evacuated to 1Pa (mechanical pump is bled).Bleed and finish, thin axle 1802 makes compression leg 21 press to O RunddichtringO 1807 left, venting this moment, compression leg 21 under atmospheric pressure, make the vacuum pumpin layer 16 of vacuum furnace chamber keep vacuum, turn bulb handle 1806 simultaneously and make thin axle 1802 leave compression leg 21, unload interlayer air extractor 18, vacuum pumpin layer 16 can keep vacuum half a year.
Above whole technique measure is two vacuum clip laminar low energy consumption Cryo Equipments.When second key problem in technology solves, about 1.5 hours, can make sample be reduced to-150 ℃, consume 5 liters of liquid nitrogen, and guarantee quartz window dewfall not fully, thermal expansion is tested from-130 ℃.
Second problem is described now, find out from Fig. 1-Fig. 2, the circular ring type that well heater 701 spaces have only 5mm is installed, adopt the column type well heater, liquid nitrogen container 14 inwalls are closely contacted fully with well heater 701, when liquid nitrogen container 14 was full of liquid nitrogen fully, specimen temperature also can only be reduced to (by radiation heat transfer and part contact heat-exchanging) about-50 ℃ with interior at 3 hours.Therefore, designed the well heater 701 of a tapered-slot type structure, well heater 701 cylindrical taperings 0.5 degree can fully closely contact with liquid nitrogen container 14 inwalls of same tapering.Per 15 degree of well heater 701 cylindricals mill out a straight flute that parallels to the axis (width 3mm, the big about deeply 4.5mm of nose circle, the about deeply 2.0mm of little nose circle).The nickel filament 702 (seeing Fig. 4 a-Fig. 4 b) of parcel glass fibre, about continuously in the embedded groove, in-out end all places an end, be convenient to connect direct supply heating and temperature control, the own thermal expansion of left and right sides directly-wound heater strip (nickel filament) or coldly be contracted in the rectilinear direction segmentation and carry out, the thermal expansion amount of every section raw silk rings only is that 1/20 (totally 20 sections raw silk rings) of silk overall expansion amount can freely stretch fully.
Carry out the film thermal expansion, the specimen mounting system also is one of key, adopted screw thread-jackscrew structure [referring to document: He GH. in the past, Wang BQ, Guo XN, Yang F, Guo JD, Zhou BL.Investigation ofthermal expansion of brass strip H62 after high current density electropulsing by CCDtechnique.Mater.Sci.﹠amp; Eng.A 2000; 292:183-6.] may cause that sample is loosening under the low temperature, now adopt resilient clamp structure (seeing Fig. 4 a-Fig. 4 b), specimen mounting system 24 comprises and pushes away seat 2401, spring 2402, ball 2403, piezoid 2404, sample 6 is held between two piezoids 2404, one piezoid is abutted against in a stationary end, another piezoid leans by the ball 2403 that can move back and forth, and ball 2403 opposite sides are provided with spring 2402, push away the thrust structure that seat 2401 forms.Push away seat 2401 by the position of fine thread by spring 2402 control balls 2403, when ball 2403 rigidly connects when touching piezoid 2404, turn the screw thread half-turn, promptly 0.25mm stops, keep sample upright, specimen mounting can free expansion in-130 ℃~250 ℃ scopes like this.Temperature thermocouple is also different with the document, places specimen mounting system 24 belows.
Embodiment 1
As shown in Figure 5, the thermal expansion experiment test result of embodiment 1 fine copper film. fine copper film purity 99.999%, the about 55 μ m of thickness, the TPRC recommending data draws from document: Y S.Touloukian, R. K.Kirby, R.E.Taylor, P.D.Desai.Thermophysical Properties of Matter, Vol.12:ThermalExpansion, Metallic Elements and Alloys (New York, Plenum, 1976), p.77.
By embodiment 1 as can be seen: institute's calorimetric expands and the maximum relative deviation of TPRC fine copper film recommendation is not more than ± and 5%.
Embodiment 2
As shown in Figure 6, the thermal expansion experiment test result of embodiment 2 pure nickel films. pure nickel film purity 99.5%, the about 44 μ m of thickness, the TPRC recommending data draws from document: Y.S.Touloukian, R.K.Kirby, R.E.Taylor, P.D.Desai.Thermophysical Properties of Matter, Vol.12:Thermal Expansion, MetallicElements and Alloys (New York, Plenum, 1976), p.225.
By embodiment 2 as can be seen: institute's calorimetric expands and the maximum relative deviation of TPRC pure nickel film recommendation is not more than ± and 6%.
Embodiment 3
As shown in Figure 7, the thermal expansion experiment test result of embodiment 3 pyrolysis BN.The institute calorimetric expand be pyrolysis BN A to thermal expansion, by embodiment 3 as can be seen: the relative root-mean-square-deviation of data is not more than ± 5%.

Claims (6)

1, a kind of Cryo Equipment that is used for film noncontact thermal expansion measurement, be provided with low temperature-high temperature furnace system, specimen mounting system, it is characterized in that: low temperature-high temperature furnace system adopts the two-stage vacuum double-decker, place the well heater of low temperature-high temperature furnace system to adopt tapered-slot type structure, place the specimen mounting system of well heater to adopt the resilient clamp structure.
2, according to the described Cryo Equipment that is used for film noncontact thermal expansion measurement of claim 1, it is characterized in that: described two-stage vacuum double-decker is that the vacuum furnace chamber of low temperature-high temperature furnace system is two vacuum clip laminar structures, be vacuum pumpin layer between the interlayer of vacuum drying oven cavity outer wall and vacuum drying oven cavity wall, the inside of vacuum drying oven cavity wall is vacuum.
3, according to the described Cryo Equipment that is used for film noncontact thermal expansion measurement of claim 2, it is characterized in that: described vacuum drying oven cavity outer wall is furnished with the interlayer air extractor, vacuum drying oven cavity outer wall peripheral hardware has the vacuum furnace chamber protuberance of bleeding point, in the bleeding point in this vacuum furnace chamber protuberance O-ring seal is installed, the compression leg that has internal thread, thin axle one end of interlayer air extractor and compression leg are by being threaded, the thin axle other end is installed handle, the thin axle outside is provided with pedestal, pedestal one end inwall is and the corresponding fit structure of vacuum furnace chamber protuberance, this end is pressed by nut and is provided with seat ring, O-ring seal, the pedestal other end is equipped with gland, be provided with pressure ring in the cavity between pedestal and the thin axle in it, O-ring seal is communicated with exhaust tube on this cavity.
4, according to the described Cryo Equipment that is used for film noncontact thermal expansion measurement of claim 1, it is characterized in that: described well heater arranged outside liquid nitrogen container, liquid nitrogen container is a double-decker, and internal layer is the liquid nitrogen layer, and skin is an air layer, air layer arranged outside insulation material, skin is provided with bleeding point, and the liquid nitrogen layer is provided with liquid nitrogen and imports and exports, and liquid nitrogen is imported and exported by corrugated tube and is connected with liquid nitrogen turnover pipe, liquid nitrogen turnover pipe arranged outside heat-preservation cotton, liquid nitrogen turnover pipe and the sealing of vacuum furnace chamber.
5, according to the described Cryo Equipment that is used for film noncontact thermal expansion measurement of claim 1, it is characterized in that: described tapered-the well heater cylindrical tapering of slot type structure closely contacts with the liquid nitrogen container inwall of same tapering, the well heater cylindrical is evenly equipped with the straight flute that parallels to the axis, in the continuous embedded groove of nickel filament, in-out end all places an end, the own thermal expansion of directly-wound nickel filament or coldly be contracted in the rectilinear direction segmentation and carry out.
6, according to the described Cryo Equipment that is used for film noncontact thermal expansion measurement of claim 1, it is characterized in that: described specimen mounting system is provided with and pushes away seat, spring, ball, piezoid, sample is held between two piezoids, one piezoid is abutted against in a stationary end, another piezoid leans by the ball that can move back and forth, and the ball opposite side is provided with spring, pushes away the thrust structure that seat forms.
CNU2008200123054U 2008-04-23 2008-04-23 Low temperature device for film non-contact heat expansion measurement Expired - Fee Related CN201188091Y (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103149236A (en) * 2013-01-31 2013-06-12 中国科学院上海技术物理研究所 Low-temperature material linear expansion coefficient measuring method and low-temperature material linear expansion coefficient measuring device
CN107219030A (en) * 2016-03-21 2017-09-29 中国科学院深圳先进技术研究院 Membrane stress tester and its method of testing
CN110174432A (en) * 2019-06-26 2019-08-27 重庆理工大学 The thermophoresis experimental provision of Electronic Packaging microbonding point
CN112213353A (en) * 2020-09-09 2021-01-12 中国科学院金属研究所 Method for testing linear expansion coefficient

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103149236A (en) * 2013-01-31 2013-06-12 中国科学院上海技术物理研究所 Low-temperature material linear expansion coefficient measuring method and low-temperature material linear expansion coefficient measuring device
CN103149236B (en) * 2013-01-31 2015-01-07 中国科学院上海技术物理研究所 Low-temperature material linear expansion coefficient measuring method and low-temperature material linear expansion coefficient measuring device
CN107219030A (en) * 2016-03-21 2017-09-29 中国科学院深圳先进技术研究院 Membrane stress tester and its method of testing
CN110174432A (en) * 2019-06-26 2019-08-27 重庆理工大学 The thermophoresis experimental provision of Electronic Packaging microbonding point
CN112213353A (en) * 2020-09-09 2021-01-12 中国科学院金属研究所 Method for testing linear expansion coefficient
CN112213353B (en) * 2020-09-09 2021-10-22 中国科学院金属研究所 Method for testing linear expansion coefficient

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