CN201063336Y

CN201063336Y - Commutation loop for mechanical type crystal fixed device

Info

Publication number: CN201063336Y
Application number: CNU2007201471002U
Authority: CN
Inventors: 陈庆安
Original assignee: ZHISHENG INDUSTRY Co Ltd
Current assignee: ZHISHENG INDUSTRY Co Ltd; C Sun Manufacturing Ltd
Priority date: 2007-06-18
Filing date: 2007-06-18
Publication date: 2008-05-21
Anticipated expiration: 2017-06-18

Abstract

The utility model discloses a rectifying ring for a mechanical wafer fixing device, which mainly comprises a rectifying ring body, wherein, the rectifying ring body is provided with a clamp, which can be matched with a bearing disk to clamp a wafer, the rectifying ring body is radially provided with a notch for the wafer placing in or taking out; the periphery of the rectifying ring body is provided with a plurality of through holes for air flow passing through; the rectifying ring is radially and uniformly provided with a plurality of through holes, so that the air flow can pass through the through holes without affecting distribution of the air flow, and the wafer can receive uniform heat radiation effect, thereby reducing the loss of damage of part of the wafer caused by poor effect of heat radiation.

Description

A kind of mechanical wafer fixture collector ring

Technical field

The utility model relates to a kind of mechanical wafer fixture collector ring, relates in particular to a kind of gas communication that helps, and makes more homogeneous mechanical formula wafer mounting apparatus collector ring of distribution of gas.

Background technology

Wafer is in etched process, need wafer to be fixed on the processing apparatus with anchor clamps, simultaneously, because of the temperature that processing environment produces higher, and higher process temperatures can make wafer change, so process temperatures need have certain restriction can not be too high, the mode of control temperature mainly absorbs heat by air-flow and heat is taken away.

See also number of patent application and be 87212441 TaiWan, China patent, " wafer jig of dry-etching machine ", and the patent No. is 610664 United States Patent (USP), " Clamp for affixing a wafer in an etchingchamber ", its also have anchor clamps with fixing wafer in processing apparatus, and need utilize air-flow cooling with the control process temperatures, this technical scheme mainly be with the wafer bearing in processing apparatus, and by axially being blown into air-flow to reach cool effect;

Yet, though its anchor clamps of above-mentioned processing apparatus can reach the fixedly effect of wafer, yet but can the heat radiation on the wafer be counteracted, these anchor clamps do not provide the design of air-flow conducting on the wafer periphery structure, so then gas is when circulation, be subject to the influence of anchor clamps, make the at random and skewness of airflow direction, for the effect of wafer heat radiation, also not good, therefore there is the wafer segment zone to take place easily because of the higher and rotten situation of heat, so just can influence the quality of wafer and the yield of product, for production also is invisible cost loss, so as a complete unit, the necessity that is improved is arranged.

The utility model content

The purpose of this utility model is to provide a kind of mechanical wafer fixture collector ring, and the anchor clamps that are intended to solve existing silicon wafer process equipment hinder airflow easily, cause air-flow inhomogeneous, and radiating effect is clear, the problem of product quality and yield decline.

The utility model is to realize like this, a kind of mechanical wafer fixture collector ring, it mainly comprises a rectification ring body, this rectification ring body is provided with folder and can cooperates carrier with the clamping wafer, this rectification ring body radially is provided with fluting and inserts and take out for wafer, and external week of collector ring is provided with a plurality of through holes, but this through hole air feed stream passes through, because of the collector ring axon to evenly being equipped with a plurality of through holes, therefore but air feed stream evenly passes through, can not influence the distribution of air-flow, so can make wafer obtain average radiating effect, and reduce the wafer segment zone, so the utility model is quite to have practicality and progressive in fact because of the unclear deficiency of damaging of radiating effect, worth industrial circle is promoted, and makes society know.

Description of drawings

Fig. 1 is the mechanical wafer fixture collector ring stereoscopic figure that the utility model provides;

Fig. 2 is the mechanical wafer fixture collector ring through hole partial schematic sectional view that the utility model provides;

Fig. 3 is the mechanical wafer fixture collector ring folder installing schematic diagram that the utility model provides;

Fig. 4 is the mechanical wafer fixture collector ring clamping wafer schematic diagram that the utility model provides.

Embodiment

In order to make the purpose of this utility model, technical scheme and advantage clearer,, the utility model is further elaborated below in conjunction with drawings and Examples.Should be appreciated that specific embodiment described herein only in order to explanation the utility model, and be not used in qualification the utility model.

The utility model relates to a kind of mechanical wafer fixture collector ring, see also Fig. 1 to Fig. 4, this mechanical wafer fixture collector ring mainly comprises the rectification ring body 10 of processing apparatus, this rectification ring body 10 can be controlled lifting as power by cylinder 11, and cooperates carrier 12 (as shown in Figure 4) and reach the fixedly effect of wafer 20;

It is one circular that this rectification ring body 10 generally is, and offers the fluting 13 of one group of symmetry on its radial surface, and this fluting 13 can insert and take out for wafer 20;

These rectification ring body 10 axial upper surfaces evenly are provided with plurality of fixed hole 14 near the position in the center of circle, and this fixing hole 14 utilizes this folder 15 to grip with 12 pairs of wafers 20 of carrier for 15 groups of usefulness of setting the position of folder;

These rectification ring body 10 axial surfaces are provided with a plurality of through holes 16 symmetrically away from the position in the center of circle, this through hole 16 runs through upper surface and the lower surface by this rectification ring body 10, but and this through hole 16 supplied gas circulation, and this through hole can be microscler or square opening or circular port, and not as limit.

The utility model in use, please cooperate and consult Fig. 3 and Fig. 4, this rectification ring body 10 is installed corresponding folder 15 on each fixing hole 14, can adjust the position of rectification ring body 10 by the control of cylinder 11, and utilizes the wafer 20 on these folder 15 clamping carriers 12; At this moment, because of rectification ring body 10 axially evenly is equipped with a plurality of through holes 16, therefore but air feed stream evenly passes through, and can not influence the distribution of air-flow, so can make wafer 20 obtain average radiating effect or processing procedure effect, and reduce wafer 20 subregions because of the unclear deficiency of damaging of radiating effect.

The above only is preferred embodiment of the present utility model; not in order to restriction the utility model; all any modifications of within spirit of the present utility model and principle, being done, be equal to and replace and improvement etc., all should be included within the protection range of the present utility model.

Claims

1. a mechanical wafer fixture collector ring is characterized in that, described collector ring comprises that one has the rectification ring body of holding function, flows the through hole that passes through with the uniformity that improves air-flow but be provided with a plurality of air feed external week of described collector ring.

2. mechanical wafer fixture collector ring as claimed in claim 1 is characterized in that described rectification ring body radially is provided with fluting.

3. mechanical wafer fixture collector ring as claimed in claim 1 or 2 is characterized in that described rectification ring body is provided with folder.

4. mechanical wafer fixture collector ring as claimed in claim 1 or 2 is characterized in that, described a plurality of through holes be uniformly distributed in the rectification ring body axially on.

5. mechanical wafer fixture collector ring as claimed in claim 1 or 2 is characterized in that, described through hole be symmetrically distributed in the rectification ring body axially on.

6. mechanical wafer fixture collector ring as claimed in claim 1 or 2 is characterized in that, described through hole is microscler, square, circular port or slotted eye.

7. mechanical wafer fixture collector ring as claimed in claim 1 or 2 is characterized in that described rectification ring body is provided with fixing hole and establishes for the folder group.