CN201030286Y - Low-temperature plasma industrial waste gas treatment apparatus - Google Patents
Low-temperature plasma industrial waste gas treatment apparatus Download PDFInfo
- Publication number
- CN201030286Y CN201030286Y CNU2007200379564U CN200720037956U CN201030286Y CN 201030286 Y CN201030286 Y CN 201030286Y CN U2007200379564 U CNU2007200379564 U CN U2007200379564U CN 200720037956 U CN200720037956 U CN 200720037956U CN 201030286 Y CN201030286 Y CN 201030286Y
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- plasma
- waste gas
- low temperature
- industrial waste
- dielectric
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Abstract
The utility model belongs to the environment protection technical field, which relates to a cryogenic plasma industrial waste gas processing device, which comprises a cryogenic plasma discharging plate, a power supply, a shell middle frame, an upper interface, and a lower interface, wherein the upper interface and the lower interface are respectively arranged on the lower end and the upper end of the shell middle frame, the lower interface is connected with an air inlet pipe, the upper interface is connected with an air outlet pipe, at least one cryogenic plasma discharging plate is equipped and is arranged in the shell middle frame, each cryogenic plasma discharging plate comprises at least one pair of metal electrodes and dielectric plate, and the paired metal electrodes are adequately arranged both sides of the dielectric plate are connected with the power supply. The utility model can process waste gas under normal pressure, can work when the velocity of flow of the waste gas reaches 15m/s, and can process waste gas with high speed and large flow. The utility model has a wide waste gas processing area, and can not only be used in processing H2S and CS2 and the like, but also be used in processing waste gases such as SO2, aromatic hydrocarbon class, polycyclic aromatic hydrocarbon, Freon, and halon and the like.
Description
Technical field
The utility model belongs to environmental protection technical field, relates to a kind of equipment for treating industrial waste gas, specifically equipment for treating industrial waste gas of plasma in low temperature.
Background technology
Along with improving constantly of social industrialization degree, also serious day by day by the problem of environmental pollution that industrial waste gas causes.Seek a kind of practical economical and practical again method degrade organic dirt and H
2S, CS
2, SO
2, hydrocarbon, fluorine Lyons, to breathe out material such as dragon be a job highly significant.This class material of burning disposal is not too suitable in existent method, because dragon is breathed out in fluorine Lyons, materials such as polycyclic aromatic hydrocarbon have very high heat-resistant stability.Use burning method the temperature of whole system must be heated to and very highly could destroy them, cause the waste of the energy like this, can produce more serious secondary pollution again, and etching problem is arranged, and Production by Catalytic Combustion Process is to fluorine Lyons, and it is inappropriate breathing out dragon, though effective to organic contamination, but to big flow, the improvement of high flow rate waste gas, still exist vapour lock big, problem such as efficient is low, and, sulphur, phosphorus, halogen etc. easily make catalyst poisoning, reduce thereby make catalyst life shorten performance.Also there are problems such as adsorption capacity, vapour lock, universality in the absorption-desorption method.
Show that after deliberation have a large amount of active particles in the plasma, these particles can destroy the hard-degraded substance in the dusty gas.How to utilize plasma to come poisonous in the processing environment and be difficult to resolve the focus that material is a Recent study, the someone does a lot.For example, human corona discharge pulse such as Clements J.S produces atmospheric plasma to degraded NO, SO
2Study, they are having 2.6%H
2Under the condition that O exists, initial concentration is the SO of 1000ppm
290% is removed behind discharge 5.2S, and human media such as Li Jing deaden discharge (promptly being called for short DBD) technology and produce nonequilibrium plasma treatment of simulated stack gases, and they draw and remove every kilogram of SO
2Need power consumption 75KWh.The method of human DBD such as the Chang M.B discharge volatile organic compounds such as formaldehyde of having degraded, the initial concentration that they draw HCHO is that 100ppm can obtain 97% dissociation yield under the voltage of 19KV.Human is also arranged with quadrat method degraded HCHO and phenol.China also has and carried out many researchs in this respect.But these present research work all do not reach the industrial practicability stage, and its subject matter is as follows: 1. most of research work will under low pressure be carried out, and can not carry out in atmosphere (normal temperature and pressure); 2. can not produce high power large volume plasma area, no practical value; 3. can not dynamically carry out in high velocity stream, also just can not be used for actual system; 4. do not have power conversion system efficiently, capacity usage ratio is low, lacks economic worth; 5. reactor is made complexity, is difficult to safeguard; 6. be difficult to bear the exhaust-gas treatment of high temperature.
Summary of the invention
The purpose of this utility model is to provide a kind of high power equipment for treating industrial waste gas of plasma in low temperature that can handle flow regime waste gas under normal atmosphere.
The purpose of this utility model can be achieved through the following technical solutions:
Equipment for treating industrial waste gas of plasma in low temperature, comprise discharge of plasma in low temperature plate, power supply, shell center, go up interface, lower interface, last interface and lower interface lay respectively at the following upper end of shell center, lower interface is connected to air inlet pipe, last interface is connected to blast pipe, the discharge of plasma in low temperature plate is provided with one at least, and be positioned at the shell center, every block of discharge of plasma in low temperature plate is made up of metal electrode and dielectric-slab, metal electrode is provided with a pair of at least, the two sides that is evenly distributed on dielectric-slab of paired symmetry, and link to each other with power supply.
The purpose of this utility model can also further realize by following technical measures:
Aforesaid equipment for treating industrial waste gas of plasma in low temperature, wherein said discharge of plasma in low temperature plate is provided with 1～1000, is parallel in the shell center.
Aforesaid equipment for treating industrial waste gas of plasma in low temperature, wherein said metal electrode are provided with 1～1000 pair, and the metal electrode that dielectric-slab is every interconnects.
Aforesaid equipment for treating industrial waste gas of plasma in low temperature, the distance between wherein said two metal electrodes and the dielectric-slab surface is 0.1～15 millimeter.
Aforesaid equipment for treating industrial waste gas of plasma in low temperature, the distance between wherein said two metal electrodes and the dielectric-slab surface is smaller or equal to 3 millimeters.
Aforesaid equipment for treating industrial waste gas of plasma in low temperature, wherein said metal electrode are silk, rod or the plate of stainless steel, nickel or nichrome, and dielectric-slab is quartz plate, ceramic wafer or other dielectric panel.
Aforesaid equipment for treating industrial waste gas of plasma in low temperature, wherein said upward interface and lower interface are horn-like, fixedly connected with shell center both sides respectively for horn-like big mouthful, horn-like osculum is connected to air inlet pipe and blast pipe respectively, and (air inlet) lower interface middle part is provided with two air-flow even flow plates.
Aforesaid equipment for treating industrial waste gas of plasma in low temperature, wherein said power supply is a difference output high voltage source, two high pressure outputs of power supply link to each other with the metal electrode on each dielectric-slab two sides respectively, the two output voltage-to-grounds size approximately equal of power supply, range error is less than ± 50%, and phase difference is 135 degree～225 degree.
Aforesaid equipment for treating industrial waste gas of plasma in low temperature, wherein said power supply is single-ended output high voltage source, the high-voltage output end of power supply is connected with the metal electrode of each dielectric-slab one side, and the metal electrode of the low-pressure end of power supply and each dielectric-slab another side is connected and ground connection.
Aforesaid equipment for treating industrial waste gas of plasma in low temperature, wherein said power supply are simple alternating current waveform, square wave, the modulation waveform of various frequencies or have the impulse waveform of repetition rate and any combination of these waveforms that voltage range is 2KV～40KV.
Advantage of the present utility model is: equipment for treating industrial waste gas of plasma in low temperature of the present utility model can be handled waste gas under-30 ℃～+ 300 ℃ normal pressure, can work under the waste gas flow velocity reaches the state of 15 meter per seconds.Owing to be large volume plasma zone, can handle waste gas by high-speed large-flow.A unitary reactor per hour can be handled 100m
3～2000m
3Above waste gas.The energy utilization rate height is about 4W/m
3.h about.The processing range of flue gas is wide, not only is applicable to H
2S, CS
2Etc. treatment of waste gas, also can be used for hydro carbons, SO
2, arene, polycyclic aromatic hydrocarbons (PAH), fluorine Lyons, breathe out treatment of waste gas such as dragon.In addition, also can be collaborative with catalyst, other organic pollution of degrading.Structurally this device is owing to adopted line plate structure unit, and installation and maintenance is simple.Therefore, this device has reached the industrial practicability requirement of plasma treatment waste gas, is with a wide range of applications.
Description of drawings
Fig. 1 is the structural representation of an embodiment of the utility model.
Fig. 2 is the side view of a discharge of plasma in low temperature plate.
Fig. 3 is the front elevation of Fig. 2.
Fig. 4 is the connection diagram of each metal electrode of the present utility model and difference high voltage source.
Fig. 5 is the connection diagram of each metal electrode of the present utility model and single-ended output high voltage source.
The specific embodiment
Embodiment one
The utility model is a kind of equipment for treating industrial waste gas of plasma in low temperature, its structure as shown in Figure 1, low temperature plasma emission-control equipment of the present utility model has adopted the line plate structure, by discharge of plasma in low temperature plate 4, compositions such as power supply and corresponding shell center 1, last interface 2 and lower interface 3.Wherein discharge of plasma in low temperature plate 4 quantity are 1～1000, are parallel in the shell center 1.In theory, shell center 1 interior more discharge of plasma in low temperature plates 4 that can be arranged in parallel.Last interface 2 and lower interface 3 are horn-like, fixedly connected with shell center 1 both sides respectively for horn-like big mouthful, and horn-like osculum is connected with blast pipe with air inlet pipe respectively, and the horn-like osculum of lower interface 3 taps into tracheae, and the horn-like osculum of last interface 2 picks out tracheae.The arrangement of discharge of plasma in low temperature plate 4 is seen as evenly distributed from cross section.Be provided with two air-flow even flow plates 5 and 6 at the trumpet-shaped middle part of lower interface 3, the air-flow that can make input is each the discharge of plasma in low temperature plate 4 by being arranged in parallel uniformly.
The single plate structure of the discharge of plasma in low temperature plate 4 of present embodiment such as Fig. 2, shown in Figure 3.Fig. 2 is the cross-sectional view of discharge of plasma in low temperature plate 4, and Fig. 3 is the front elevation of discharge of plasma in low temperature plate 4. Metal electrode 7,8 is the two sides that is evenly distributed on dielectric-slab 9 of paired symmetry, and quantity is 1～1000 pair, in theory can be many to metal electrode arbitrarily.Dielectric-slab 9 every metal electrodes interconnect.The shape of metal electrode 7,8 can be silk, rod, also can be plate.The dielectric-slab 9 general insulating materials such as quartz or pottery that adopt are made thickness of slab 0.5～6mm. Metal electrode 7,8 materials can adopt wire, rod or plates such as stainless steel, nickel or nichrome.Distance between metal electrode 7,8 and the dielectric-slab surface is 0.1～15mm.Fig. 4 is the connection diagram of each metal electrode and difference high voltage source, and two high pressure outputs of difference output high voltage source 10 link to each other with metal electrode 7, metal electrode 8 respectively.The surface of dielectric-slab 9 is a region of discharge to the gap 11 between two metal electrodes 7,8, opens difference output high voltage source 10, regulates output voltage to gap discharge, can produce discharge low-temperature plasma.
If metal electrode 7,8 is smaller to the distance on dielectric-slab 9 surfaces, be generally less than 3mm, also can adopt the mode of the single-ended output high voltage source excitation of Fig. 5, the high-voltage output end of single-ended output high voltage source 12 is connected with the metal electrode 7 of each dielectric-slab 9 one side, and the metal electrode 8 of the low-pressure end of single-ended output high voltage source 12 and each dielectric-slab 9 another side is connected and ground connection.The surface of dielectric-slab 9 is a region of discharge to the gap 11 between two metal electrodes 7,8, opens difference output high voltage source 10, regulates output voltage to gap discharge, can produce discharge low-temperature plasma.
The high voltage source that the utility model applies on two metal electrodes 7,8 of discharge of plasma in low temperature plate 4 can or have the impulse waveform of repetition rate and any combination of these waveforms for simple alternating current waveform, the square wave of various frequencies, and voltage is in 2KV～40KV scope.High voltage source two output voltage-to-grounds size approximately equal, range error are less than ± 50%, and phase difference is near 180 degree (135 °～225 °).
Equipment for treating industrial waste gas of plasma in low temperature operation principle of the present utility model is as follows: what the utility model adopted is a kind of anticyclonic non-equilibrium discharge, this discharge generation is provided with a dielectric-slab 9 in any position, centre of two metal electrodes 7,8 between two metal electrodes 7,8.After connecting difference output high voltage source 10, high voltage is added on two metal electrodes 7 and 8, gas between two metal electrodes 7,8 discharges under the high voltage action of alternative electric field and produces low temperature plasma, in plasma area, there be the electronics of a large amount of average energies, electron bombard H at 5～15ev
2S, CS
2Deng, make H
2S or CS
2Deng being transformed into various active particles, as H
-, S, HS
+Deng, and H
-With O in the air
2Be combined into H
2O, HS
+With O
2Also can produce H
2O and S or SO
2Or the like, reached removal H
2S, CS
2Effect.And for example, electron bombard CF
2Behind the ClBr, produce CF
2, CL, Br, CF
2ClB
r +, CF
2Cl
+The isoreactivity particle, O in these particles and the air
2Effect produces COF
2, Br
2, Cl
2Deng gas, reach and remove CF
2The effect of CLBr.
The utility model can also have other embodiment, and the technical scheme that equal replacement of all employings or equivalent transformation form all drops within the claimed scope of the utility model.
Claims (10)
1. equipment for treating industrial waste gas of plasma in low temperature, comprise the discharge of plasma in low temperature plate, power supply, the shell center, last interface, lower interface, last interface and lower interface lay respectively at the following upper end of shell center, lower interface is connected to air inlet pipe, last interface is connected to blast pipe, the discharge of plasma in low temperature plate is provided with one at least, and be positioned at the shell center, it is characterized in that: described every block of discharge of plasma in low temperature plate is made up of metal electrode and dielectric-slab, described metal electrode is provided with a pair of at least, the two sides that is evenly distributed on dielectric-slab of paired symmetry, and link to each other with power supply.
2. equipment for treating industrial waste gas of plasma in low temperature as claimed in claim 1 is characterized in that: described discharge of plasma in low temperature plate is provided with 1～1000, is parallel in the shell center.
3. equipment for treating industrial waste gas of plasma in low temperature as claimed in claim 1 is characterized in that: described metal electrode is provided with 1～1000 pair, and the metal electrode that dielectric-slab is every interconnects.
4. as claim 1 or 2 or 3 described equipment for treating industrial waste gas of plasma in low temperature, it is characterized in that: the distance between described two metal electrodes and the dielectric-slab surface is 0.1～15 millimeter.
5. equipment for treating industrial waste gas of plasma in low temperature as claimed in claim 4 is characterized in that: the distance between described two metal electrodes and the dielectric-slab surface is smaller or equal to 3 millimeters.
6. as claim 1 or 2 or 3 described equipment for treating industrial waste gas of plasma in low temperature, it is characterized in that: described metal electrode is silk, rod or the plate of stainless steel, nickel or nichrome, and described dielectric-slab is quartz plate, ceramic wafer or other dielectric panel.
7. as claim 1 or 2 or 3 described equipment for treating industrial waste gas of plasma in low temperature, it is characterized in that: described upward interface and lower interface are horn-like, fixedly connected with shell center both sides respectively for horn-like big mouthful, horn-like osculum is connected to air inlet pipe and blast pipe respectively, and the lower interface middle part is provided with two air-flow even flow plates.
8. equipment for treating industrial waste gas of plasma in low temperature as claimed in claim 1, it is characterized in that: described power supply is a difference output high voltage source, two high pressure outputs of power supply link to each other with the metal electrode on each dielectric-slab two sides respectively, the two output voltage-to-grounds size approximately equal of power supply, range error is less than ± 50%, and phase difference is 135 degree～225 degree.
9. equipment for treating industrial waste gas of plasma in low temperature as claimed in claim 1, it is characterized in that: described power supply is single-ended output high voltage source, the high-voltage output end of power supply is connected with the metal electrode of each dielectric-slab one side, and the metal electrode of the low-pressure end of power supply and each dielectric-slab another side is connected and ground connection.
10. equipment for treating industrial waste gas of plasma in low temperature as claimed in claim 8 or 9, it is characterized in that: described power supply is simple alternating current waveform, square wave, the modulation waveform of various frequencies or has the impulse waveform of repetition rate and any combination of these waveforms that voltage range is 2KV～40KV.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2007200379564U CN201030286Y (en) | 2007-05-23 | 2007-05-23 | Low-temperature plasma industrial waste gas treatment apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2007200379564U CN201030286Y (en) | 2007-05-23 | 2007-05-23 | Low-temperature plasma industrial waste gas treatment apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201030286Y true CN201030286Y (en) | 2008-03-05 |
Family
ID=39162180
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU2007200379564U Expired - Lifetime CN201030286Y (en) | 2007-05-23 | 2007-05-23 | Low-temperature plasma industrial waste gas treatment apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201030286Y (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102284079A (en) * | 2010-06-18 | 2011-12-21 | 北京博电兴源节能科技有限公司 | Novel plasma stink treatment device |
| CN103111168A (en) * | 2013-02-26 | 2013-05-22 | 中维环保科技有限公司 | Large-air-volume low-concentration plasma exhaust gas treatment device |
| CN103585863A (en) * | 2013-09-09 | 2014-02-19 | 中船重工海博威（江苏）科技发展有限公司 | Low-temperature plasma waste gas treatment system |
| CN105148692A (en) * | 2015-08-17 | 2015-12-16 | 上海仲砾环保科技工程有限公司 | Filament plate type oil fume purification equipment adopting high-frequency nano-ions and having odor removal function |
-
2007
- 2007-05-23 CN CNU2007200379564U patent/CN201030286Y/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102284079A (en) * | 2010-06-18 | 2011-12-21 | 北京博电兴源节能科技有限公司 | Novel plasma stink treatment device |
| CN102284079B (en) * | 2010-06-18 | 2013-09-18 | 北京博电兴源节能科技有限公司 | Novel plasma stink treatment device |
| CN103111168A (en) * | 2013-02-26 | 2013-05-22 | 中维环保科技有限公司 | Large-air-volume low-concentration plasma exhaust gas treatment device |
| CN103585863A (en) * | 2013-09-09 | 2014-02-19 | 中船重工海博威（江苏）科技发展有限公司 | Low-temperature plasma waste gas treatment system |
| CN105148692A (en) * | 2015-08-17 | 2015-12-16 | 上海仲砾环保科技工程有限公司 | Filament plate type oil fume purification equipment adopting high-frequency nano-ions and having odor removal function |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: NANJING SUMAN PLASMA TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: WAN JINGLIN Effective date: 20110425 Free format text: FORMER OWNER: WAN RONGLIN |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 210004 7/F, TONGYU BUILDING, NO. 41, TANGZI STREET, NANJING CITY, JIANGSU PROVINCE TO: 210007 NO. 3, YOUYIHE ROAD, BAIXIA DISTRICT, JIANGSU PROVINCE |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20110425 Address after: Friendship road 210007 No. 3 Baixia District of Jiangsu Province Patentee after: Nanjing Suman PDP Technology CO., Ltd. Address before: 210004 Jiangsu Province, Nanjing City Hall Street No. 41 Tongyu building 7 floor Co-patentee before: Wan Ronglin Patentee before: Wan Jinglin |
|
| C56 | Change in the name or address of the patentee | ||
| CP02 | Change in the address of a patent holder |
Address after: Friendship road Nanjing Baixia District of Jiangsu Province, No. 3 210007 Patentee after: Nanjing Suman PDP Technology CO., Ltd. Address before: Friendship road 210007 No. 3 Baixia District of Jiangsu Province Patentee before: Nanjing Suman PDP Technology CO., Ltd. |
|
| CX01 | Expiry of patent term |
Granted publication date: 20080305 |
|
| CX01 | Expiry of patent term |