CN1994859A - Manufacture method of ripple structure film and mould possessing the structure - Google Patents
Manufacture method of ripple structure film and mould possessing the structure Download PDFInfo
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- CN1994859A CN1994859A CN 200510137668 CN200510137668A CN1994859A CN 1994859 A CN1994859 A CN 1994859A CN 200510137668 CN200510137668 CN 200510137668 CN 200510137668 A CN200510137668 A CN 200510137668A CN 1994859 A CN1994859 A CN 1994859A
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Abstract
The invention relates to a ripple film and relative mould production, wherein it comprises that: providing one flexible film; providing one drawing force to draw the flexible film into fixed stress, to form one stress film; forming one film layer on the stress film; releasing the drawing force, to forming one ripple structure on the flexible film. The invention can be used in optical element, life product, etc. The invention uses electroformed mold technique and flexible film to produce mould, with low cost.
Description
Technical field
The present invention relates to the manufacture method of a kind of ripples structure and mould, the ripples structure that particularly relates to a kind of a kind of micro-/ nano grade of utilizing the strain of elastic film and forming, and then utilize elastic film to make a kind of ripples structural membrane and mould manufacturing method of mould with this structure with this ripples structure.
Background technology
The structure of micro-/ nano grade, quite extensive at optics and biomedical application, for example: backlight liquid crystal display module, the biomedical detection chip of raster pattern etc.In general, the structure of micro-/ nano grade all is to adopt ultraprecise processing, the little shadow of energy beam (laser, electron beam) to cooperate dry etching to form the structure of micro-/ nano grade then, utilizes electroforming to turn over mould has micro with formation mould more at last.
Yet, in the face of the complicated shape time, as: when cone or waveform configuration (just, cosine wave), utilize aforesaid method to be restricted or technology quite complicated, and with high costs.In addition, if the size of micro-structural can be contracted to several microns, then this micro-structure surface will have hydrophobic effect, can be applicable to the household supplies of anti-soil.And be contracted to about sub-micron in characteristic size, then can be applicable to micro electronmechanical and biomedical sector.If characteristic size is contracted to 200 nanometers when following, then can be applicable to optical module, as polaroid, antireflection matrix etc., its reflectivity can be less than 1%.But, make complicated shape or make the technology of characteristic size, so far, still belong to the budding stage to micron, sub-micron even nano-scale micro-structural.Therefore economical, large-area manufacturing micro-structural efficiently are the key points that comes into the market.
In the prior art, deliver a kind of technology of plasma oxidation of utilizing as people such as the N.Bowden of Harvard University and made method (the The controlled formation ofordered of ripples structure in the elasticity macromolecular material, sinusoidal structures by plasma oxidation of an elastomericpolymer, Appl.Phys.Lett.1999,75,2557.), to a dimethyl silicone polymer (polydimethylsiloxane, PDMS, hereinafter to be referred as PDMS) heat, utilize oxygen plasma to make its surface oxidation then to form a silicide layer (Silicate layer).Again the PDMS material is cooled off afterwards it is shunk, utilize the stress that shrinks that this silicide layer is formed the ripples structure.Utilize electroforming to turn over the molded metal film of making again, change being affixed on the drum die again.Yet, this technology is owing to utilize thermal strain to make the PDMS surface form the ripples structure, be subjected to the influence of the macromolecule glass transition temperature of PDMS, temperature can not be too high, also because temperature can not be too high, utilize the characteristic size of the ripples structure of thermal strain generation, its cycle is between several microns to tens of microns, and depth-to-width ratio is not high, and temperature controlling also is the problem that influences this micro-structural precision.In addition, also will just can form mould by changeing subsides (Bonding) when making drum die, production process is complicated and with high costs.
Comprehensively above-mentioned, need the shortcoming that a kind of ripples structural membrane and the mould manufacturing method with this structure solve prior art badly.
Summary of the invention
Main purpose of the present invention provides a kind of ripples structural membrane and the mould manufacturing method with this structure, utilize the strain of elastic film, and in its surface formation one thin layer, make this elastic film surface form the ripples structure by discharging stress, reach and simplify manufacturing process to form the purpose of accurate ripples structure.
Secondary objective of the present invention provides a kind of ripples structural membrane and the mould manufacturing method with this structure, utilizes the elastic film with ripples structure to make mould, reaches the purpose that can produce in a large number and reduce cost.
To achieve the above object, the invention provides a kind of manufacture method of ripples structural membrane, it includes the following step: at first, provide an elastic film.Then, provide a tensile force that this elastic film is stretched to fixing strain, to form a strain film.Then, on this strain film, form a thin layer.At last, discharge this tensile force, make to be formed with a ripples structure on this elastic film surface.
Described elastic film can be a macromolecular material.For example: a dimethyl silicone polymer material.
Described thin layer is a heterofilm, and it is one to have the film of high elastic coefficient, for example metal material or ceramic material.This metal material can be gold or titanium.
To achieve the above object, the present invention also provides a kind of manufacture method with flat plate mold of ripples structure, and it includes the following step: at first, provide an elastic film.Then, provide a tensile force that this elastic film is stretched to fixing strain, to form a strain film.Then, on this strain film, form a thin layer.Subsequently, discharge this tensile force, make to be formed with a ripples structure on this elastic film surface.At last, utilize a molding program, utilize film to make a flat plate mold with this ripples structure.
The elongation strain amount of described strain film is 30% to 110%.The wavelength of this ripples structure is between 500 nanometer to 6000 nanometers.The amplitude of this ripples structure is between 50 nanometer to 1900 nanometers.
Described molding program is that the mould mode is turned in an electroforming, and it includes the following step: at first, make the master mold with this ripples inverted configuration.Then, deposit a material layer on this master mold, break away to form this flat plate mold with this master mold then.
Described material layer may be selected to be a nickel, copper, nickel alloy, copper alloy one of them.
To achieve the above object, the present invention also provides a kind of manufacture method with drum die of ripples structure, and it includes the following step: at first, provide a roller.Then, on the wall of this roller, form an elastic film.Then, provide a tensile force that this elastic film is stretched to fixing strain, to form a strain film.Subsequently, on this strain film, form a thin layer.Next, discharge this tensile force, make to be formed with a ripples structure on this elastic film surface.At last, utilize a molding program, utilize roller to make a drum die with this ripples structure.
Described molding program is that the mould mode is turned in twice electroforming.It includes the following step: at first, provide a sleeve, and this roller is placed in this sleeve.Then, form one first material layer between this sleeve lining and this ripples structure, have a master mold with this ripples inverted configuration with making.Then, remove this elastomeric layer.At last, deposit one second material layer between this roller and this master mold, break away to form this drum die with this master mold then.
The elongation strain amount of described strain film is 5～24%.
The wavelength of described ripples structure is 2200～11200 nanometers.The amplitude of this ripples structure is 990～5800 nanometers.
The cross section of described roller may be selected to be circle, square, triangle and polygon one of them.
Ripples structure of the present invention is for having periodic waveform configuration, and this structure can be applicable to fields such as optical module, articles for daily use, biochip and polaroid.Utilize this elastic film to come mfg. moulding die, have this constructed products, can produce in a large number and with low cost with a large amount of productions with this ripples structure.
Description of drawings
Fig. 1 is a ripples structural membrane manufacture method preferred embodiment flow chart of the present invention.
Fig. 2 is a ripples structure waveform schematic diagram of the present invention.
Fig. 3 A to Fig. 3 H has the first preferred embodiment schematic diagram of manufacture method of the mould of ripples structure for the present invention.
Fig. 4 A to Fig. 4 H has the second preferred embodiment schematic diagram of manufacture method of the mould of ripples structure for the present invention.
Wherein, Reference numeral:
2-ripples structural membrane manufacture method 20～23-flow process
30-elastic film 301-strain film
31-thin layer 32-ripples structure
33-master mold 34-material layer
4-roller 50-elastic film
501-strain film 51-thin layer
52-ripples structure 53-first material layer
55-space 56-second material layer
The 6-sleeve
The specific embodiment
For feature of the present invention, purpose and function are had further cognition and understanding, hereinafter will the theory reason of relevant detailed structure of the present invention and design be described, detailed description is presented below:
See also shown in Figure 1ly, this figure is a ripples structural membrane manufacture method preferred embodiment flow chart of the present invention.This ripples structural membrane manufacture method includes the following step: at first shown in step 20, provide an elastic film, this elastic film can be a macromolecular material, for example: dimethyl silicone polymer (polydimethylsiloxane, PDMS is hereinafter to be referred as PDMS), but not as limit.Then carry out step 21, provide a tensile force that this elastic film is stretched to fixing strain, to form a strain film.Then, carry out step 22, form a thin layer on this strain film, in the present embodiment, the mode that forms this thin layer can be utilized the mode of evaporation, but not as limit.This thin layer can be a heterogeneous nano thin-film, can have the material of high elastic coefficient, as metal material or ceramic material.So-called heterogeneous, promptly the material of this thin layer is different with the material of this elastic film.In the present embodiment, this metal material is gold or titanium, but not as limit.
At last, carry out step 23 again, discharge this tensile force, make to be formed with a ripples structure on this elastic film surface.See also shown in Figure 2ly, this figure is a ripples structure waveform schematic diagram of the present invention.This ripples structure is the string wave function with wavelength and cycle, for example sine or cosine function etc., but be not limited thereto.
This ripples structure can be widely used in the product of biomedicine, photoelectricity even domestic environments.So but since this ripples structure with macromolecular material plated film fragile structure, can't be used among the mould.Therefore next, the invention provides a kind of method of utilizing this ripples structural membrane to come mfg. moulding die.See also shown in Fig. 3 A to Fig. 3 H, this figure is the first preferred embodiment schematic diagram of the manufacture method of the mould of the present invention with ripples structure.In the present embodiment, the technology of utilizing this ripples structural membrane to turn over mould with electroforming is made a flat plate mold, uses for a large amount of the manufacturing.
At first as shown in Figure 3A, provide an elastic film 30, this elastic film 30 can be a macromolecular material, for example: the PDMS material.Shown in Fig. 3 B, provide a tensile force F that this elastic film 30 is stretched to fixing strain then, to form a strain film 301.The scope of the elongation strain amount of this strain film 301 can be 30% to 110%.Then, shown in Fig. 3 C, form a thin layer 31 on this strain film 301, in the present embodiment, the mode that forms this thin layer 31 can be utilized the mode of evaporation, but is not limited thereto.This thin layer 31 can be a heterogeneous nano thin-film, can be the material with high elastic coefficient, as metal material or ceramic material.In the present embodiment, this metal material is gold or titanium, but is not limited thereto.
Next, shown in Fig. 3 D, discharge this tensile force F, make on these elastic film 30 surfaces to be formed with a ripples structure 32, the wavelength of this ripples structure 32 is between 500 nanometer to 6000 nanometers, and amplitude is between 50 nanometer to 1900 nanometers.Afterwards, shown in Fig. 3 E, form a master mold 33 on this ripples structure 32, the structure on this master mold 33 is opposite with this ripples structure 32.Then, shown in Fig. 3 F, remove this ripples structure 32 and this elastic film 30, and obtain this master mold 33.Shown in Fig. 3 G, utilize this master mold 33 again, in top electroforming one material layer 34, the material of this material layer 34 can be metal material, and this metal material may be selected to be nickel, copper, nickel alloy or copper alloy etc.At last,, remove this master mold 33, to obtain by this material layer 34 formed flat plate molds in the step of carrying out shown in Fig. 3 H.Because this flat plate mold is a metal material, therefore be suitable as the employed mould of a large amount of manufacturings.
Next explanation utilizes the structure of ripples structure fabrication drum die, sees also shown in Fig. 4 A to Fig. 4 H, and this figure is the second preferred embodiment schematic diagram of the manufacture method of the mould of the present invention with ripples structure.At first shown in Fig. 4 A, provide an out of roundness, the depth of parallelism and surface roughness preferable metal roller 4.Shown in Fig. 4 B, the PDMS material is evenly revolved on the surface that is plated on this metal roller 4 then, treat the crosslinked sclerosis of this PDMS material after, form a soft elastic film 50.In the present embodiment, though the cross section of this metal roller 4 is circular, its cross section also can be a polygon, as triangle, quadrangle etc.
Next shown in Fig. 4 C; provide a tensile force F that this elastic film 50 is stretched to fixing strain; to form a strain film 501; in the present embodiment, the elongation strain amount of this strain film is 5%～24%, under this strained condition; can form preferable ripples structure; scope as for elongation strain can be decided according to elastomeric material, therefore not scope tube have much, all in protection scope of the present invention.Form a thin layer 51 then on this strain film 501, in the present embodiment, the mode that forms this thin layer 51 can be utilized the mode of evaporation, but is not limited thereto.This thin layer 51 can be a heterogeneous nano thin-film, for having the material of high elastic coefficient, as metal material or ceramic material.In the present embodiment, this metal material is gold or titanium, but is not limited thereto.
Then shown in Fig. 4 D, discharge this tensile force F, make on these elastic film 50 surfaces to be formed with a ripples structure 52, the cycle of this ripples structure 52 is 2200 nanometer to 11200 nanometers, and amplitude is 990 nanometer to 5800 nanometers.Next carry out a molding step, utilize twice electroforming to turn over the roller that mould will have this ripples structure and make a drum die.See also shown in Fig. 4 E, a sleeve 6 is provided, and this roller 4 is placed in this sleeve 6, form one first material layer 53 then between these sleeve 4 inwalls and this ripples structure 52.See also shown in Fig. 4 F, then remove this elastic film and this ripples structure, make this first material layer form a master mold opposite with this ripples structure 52, this moment is at this roller 4 between surperficial and this mother's film, because PDMS and this ripples structure are removed, be formed with a space 55.Afterwards, shown in Fig. 4 G, in this space, form one second material layer 56 in the electroforming mode, this second material layer 56 may be selected to be a nickel, copper, nickel alloy, copper alloy one of them.Material that afterwards should mother's film is removed.At last, shown in Fig. 4 H, this cylinder and this sleeve 6 are broken away to form drum die, the structure of this mould is promptly identical with the ripples structure.The above only is preferred embodiment of the present invention, when can not with the restriction scope of the invention.The i.e. equivalence of making according to claim of the present invention generally changes and revises, and does not still depart from the scope of the present invention, and all should be considered as further embodiment of the present invention.
Comprehensively above-mentioned, device provided by the invention has that technology is simple, characteristic size is little and can produce advantage to reduce cost in a large number, therefore be enough to satisfy industrial requirement, can further improve the competitiveness of industry, met the required condition that possesses of application invention of Patent Law defined.
Claims (23)
1, a kind of manufacture method of ripples structural membrane is characterized in that, includes the following step:
One elastic film is provided;
Provide a tensile force that this elastic film is stretched to fixing strain, to form a strain film;
On this strain film, form a thin layer; And
Discharge this tensile force, make to be formed with a ripples structure on this elastic film surface.
2, the manufacture method of ripples structural membrane as claimed in claim 1 is characterized in that, this elastic film can be a macromolecular material.
3, the manufacture method of ripples structural membrane as claimed in claim 2 is characterized in that, this macromolecular material is a dimethyl silicone polymer.
4, the manufacture method of ripples structural membrane as claimed in claim 1 is characterized in that, this thin layer is a heterofilm.
5, the manufacture method of ripples structural membrane as claimed in claim 4 is characterized in that, this heterofilm may be selected to be a metal material and a ceramic material one of them.
6, a kind of manufacture method with mould of ripples structure is characterized in that, includes the following step:
One elastic film is provided;
Provide a tensile force that this elastic film is stretched to fixing strain, to form a strain film;
On this strain film, form a thin layer;
Discharge this tensile force, make to be formed with a ripples structure on this elastic film surface; And
Utilize a molding program, utilize film to make a mould with this ripples structure.
7, the manufacture method with mould of ripples structure as claimed in claim 6 is characterized in that, this mould is a flat plate mold.
8, the manufacture method with mould of ripples structure as claimed in claim 7 is characterized in that, the elongation strain amount of this strain film is 30% to 110%.
9, the manufacture method with mould of ripples structure as claimed in claim 7 is characterized in that, the wavelength of this ripples structure is between 500 nanometer to 6000 nanometers.
10, the manufacture method with mould of ripples structure as claimed in claim 7 is characterized in that, the amplitude of this ripples structure is between 50 nanometer to 1900 nanometers.
11, the manufacture method with mould of ripples structure as claimed in claim 7 is characterized in that, this molding program is that the mould mode is turned in an electroforming, and it includes the following step:
Make a master mold with this ripples inverted configuration; And
Deposit a material layer on this master mold, break away to form this flat plate mold with this master mold then.
12, the manufacture method with mould of ripples structure as claimed in claim 11 is characterized in that, this material layer may be selected to be nickel, copper, nickel alloy, copper alloy one of them.
13, the manufacture method with mould of ripples structure as claimed in claim 6 is characterized in that, this elastic film can be a macromolecular material.
14, the manufacture method with mould of ripples structure as claimed in claim 13 is characterized in that, this macromolecular material is a dimethyl silicone polymer.
15, the manufacture method with mould of ripples structure as claimed in claim 6 is characterized in that, this thin layer is a heterofilm.
16, the manufacture method with mould of ripples structure as claimed in claim 15 is characterized in that, this heterofilm may be selected to be metal material and ceramic material one of them.
17, the manufacture method with mould of ripples structure as claimed in claim 6 is characterized in that, this elastic film is formed on the roller, and this mould is a drum die.
18, the manufacture method with mould of ripples structure as claimed in claim 17 is characterized in that, the elongation strain amount of this strain film is 5～24%.
19, the manufacture method with mould of ripples structure as claimed in claim 17 is characterized in that, the wavelength of this ripples structure is 2200～11200 nanometers.
20, the manufacture method with mould of ripples structure as claimed in claim 17 is characterized in that, the amplitude of this ripples structure is 990～5800 nanometers.
21, the manufacture method with mould of ripples structure as claimed in claim 17 is characterized in that, this molding program is that the mould mode is turned in twice electroforming.
22, the manufacture method with mould of ripples structure as claimed in claim 21 is characterized in that, this twice electroforming turned over the mould mode and also included the following step:
One sleeve is provided, and this roller is placed in this sleeve;
Form one first material layer between this sleeve lining and this ripples structure, have a master mold with this ripples inverted configuration with making;
Remove this elastomeric layer; And
Deposit one second material layer between this roller and this master mold, break away to form this drum die with this master mold then.
23, the manufacture method with mould of ripples structure as claimed in claim 17 is characterized in that, the cross section of this roller may be selected to be circle, square, triangle and polygon one of them.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2005101376681A CN1994859B (en) | 2005-12-31 | 2005-12-31 | Manufacture method of ripple structure film and mould possessing the structure |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2005101376681A CN1994859B (en) | 2005-12-31 | 2005-12-31 | Manufacture method of ripple structure film and mould possessing the structure |
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| Publication Number | Publication Date |
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| CN1994859A true CN1994859A (en) | 2007-07-11 |
| CN1994859B CN1994859B (en) | 2011-01-26 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106426992A (en) * | 2016-09-22 | 2017-02-22 | 日氟荣高分子材料(上海)有限公司 | Plastic film with light trapping structure, and preparation method and application of plastic film |
| CN112985661A (en) * | 2019-12-13 | 2021-06-18 | 天津大学 | Electronic skin based on human epidermis structure and preparation method and application thereof |
| CN112985648A (en) * | 2019-12-13 | 2021-06-18 | 天津大学 | Dielectric layer and preparation method thereof, capacitive pressure sensor and application thereof |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1292977C (en) * | 2005-06-09 | 2007-01-03 | 西安交通大学 | Deep submicron three-dimensional rolling mould and its mfg. method |
-
2005
- 2005-12-31 CN CN2005101376681A patent/CN1994859B/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106426992A (en) * | 2016-09-22 | 2017-02-22 | 日氟荣高分子材料(上海)有限公司 | Plastic film with light trapping structure, and preparation method and application of plastic film |
| CN112985661A (en) * | 2019-12-13 | 2021-06-18 | 天津大学 | Electronic skin based on human epidermis structure and preparation method and application thereof |
| CN112985648A (en) * | 2019-12-13 | 2021-06-18 | 天津大学 | Dielectric layer and preparation method thereof, capacitive pressure sensor and application thereof |
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| Publication number | Publication date |
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| CN1994859B (en) | 2011-01-26 |
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