CN1978142A - Grinding tool and its manufacture - Google Patents
Grinding tool and its manufacture Download PDFInfo
- Publication number
- CN1978142A CN1978142A CNA2006101640689A CN200610164068A CN1978142A CN 1978142 A CN1978142 A CN 1978142A CN A2006101640689 A CNA2006101640689 A CN A2006101640689A CN 200610164068 A CN200610164068 A CN 200610164068A CN 1978142 A CN1978142 A CN 1978142A
- Authority
- CN
- China
- Prior art keywords
- grinding tool
- abrasive particle
- rubber particles
- grinding
- rubber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000227 grinding Methods 0.000 title claims description 99
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 239000002245 particle Substances 0.000 claims abstract description 151
- 229920001971 elastomer Polymers 0.000 claims abstract description 80
- 239000005060 rubber Substances 0.000 claims abstract description 80
- 238000000034 method Methods 0.000 claims description 51
- 239000000758 substrate Substances 0.000 claims description 37
- 238000007906 compression Methods 0.000 claims description 21
- 230000006835 compression Effects 0.000 claims description 20
- 239000000203 mixture Substances 0.000 claims description 15
- 238000010438 heat treatment Methods 0.000 claims description 13
- 238000002360 preparation method Methods 0.000 claims description 4
- 239000011159 matrix material Substances 0.000 abstract description 14
- 238000005498 polishing Methods 0.000 abstract description 11
- 239000006061 abrasive grain Substances 0.000 abstract 3
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 230000007774 longterm Effects 0.000 abstract 1
- 239000011521 glass Substances 0.000 description 12
- 239000000126 substance Substances 0.000 description 10
- 239000000843 powder Substances 0.000 description 8
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229920000459 Nitrile rubber Polymers 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000000155 melt Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920003048 styrene butadiene rubber Polymers 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000002174 Styrene-butadiene Substances 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 238000009499 grossing Methods 0.000 description 3
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 239000005297 pyrex Substances 0.000 description 2
- 229920002379 silicone rubber Polymers 0.000 description 2
- 239000004945 silicone rubber Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 244000043261 Hevea brasiliensis Species 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 229920002396 Polyurea Polymers 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- 229920000800 acrylic rubber Polymers 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 230000003467 diminishing effect Effects 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- OYQYHJRSHHYEIG-UHFFFAOYSA-N ethyl carbamate;urea Chemical compound NC(N)=O.CCOC(N)=O OYQYHJRSHHYEIG-UHFFFAOYSA-N 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 229920003049 isoprene rubber Polymers 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000010068 moulding (rubber) Methods 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
- 229920001194 natural rubber Polymers 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920003225 polyurethane elastomer Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
- B24B37/245—Pads with fixed abrasives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
- B24D18/0009—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using moulds or presses
Abstract
A polishing grindstone according to the present invention comprises abrasive grains dispersed in, bound to and held by a particulate matrix composed of rubber particles. With the polishing grindstone, the abrasive grains decreased in polishing properties owing to wear associated with polishing become easily detached from the surface of the grindstone, and fresh abrasive grains not worn are exposed at the surface, thus permitting polishing at a constantly stable speed, and ensuring stable polishing for a long term.
Description
Technical field
The present invention relates to grinding tool and manufacture method thereof, in more detail, relate to grinding tool and the manufacture method thereof that in long-time, stably to grind.
Background technology
In recent years, for the circuit substrate that in various electronic equipments, uses etc., owing to form fine wiring with high density, so it is required to have high surface smoothing.The glass substrate that uses in the hard disk of computer (disk) etc. also is required to have high surface smoothing.High surface smoothing like this can be realized by having used the mirror finish of grinding material.
For mirror finish, in general, substrate surface is become reach to a certain degree even surface by polishing (lapping) processing after, when supplying with cooling water, make polishing that substrate surface is subjected to grinding tool so that this substrate surface is ground, carry out mirror finish thus.
As above-mentioned such grinding tool, for example in patent documentation 1 and 2, proposed to have the grinding tool of following structure, it is with abrasive particle dispersion and fixing in adhesives such as polyurethane resin or phenolic resins, in addition, in patent documentation 3, proposed to have the grinding tool of following structure, wherein use rubber such as silicone rubber as adhesive, and in this rubber, abrasive particle disperseed and fixing.
[patent documentation 1] spy opens the 2001-260037 communique
[patent documentation 2] spy opens the 2004-261942 communique
[patent documentation 3] spy opens the 2002-261054 communique
Yet, in above-mentioned patent documentation 1 and 2 grinding tools that proposed, because abrasive particle is securely fixed in conduct in the adhesive of hard resin, even therefore wearing and tearing take place and reduce in abrasive particle in attrition process, the abrasive particle that is worn also is difficult to come off, and the new abrasive particle that is not worn can not be exposed on the surface of grinding tool, consequently, be created in the problem that the short time grinding rate reduces and can not stably grind.For this reason, have following actual conditions, promptly aptly grinding tool is repaired (dressing) operation, perhaps must adopt when utilizing the attrition process of this grinding tool, use the so-called mechanochemistry of the chemical grinding of chemical solutions such as alkali lye to grind (Chemical Mechanical Polishing) such method.
In addition, in the grinding tool that in above-mentioned patent documentation 3, proposes, in rubber-like rubber, be dispersed with abrasive particle, therefore compare with patent documentation 1 and 2 grinding tools that proposed, the abrasive particle generation that is worn by attrition process comes off, and new abrasive particle exposes easily, and the problem that grinding rate reduces has obtained improvement to a certain degree.But, even in the grinding tool in such patent documentation 3 and since abrasive particle by securely in conjunction with, remain in the rubber thereby coming off of the abrasive particle that can not be worn fully equally and exposing of new abrasive particle, grinding rate can descend too at short notice, is seeking the improvement to it.
Summary of the invention
Therefore, the purpose of this invention is to provide a kind of by with grind the abrasive particle that the caused abrasiveness of wearing and tearing together is lowered and can easily come off from the surface, the new abrasive particle that is not worn exposes on the surface, and can grind, and grinding tool and the manufacture method thereof that in long-time, can stably grind with normally stable speed.
The present inventor is to disperseing abrasive particle in adhesive and the grinding tool of fixing structure has carried out studying with great concentration, found that: use the adhesive of rubber particles as bonded-abrasive, in by the formed particulate substrates of this rubber particles, abrasive particle disperseed and fixing, can address the above problem effectively thus, thereby finish the present invention.
According to the present invention, a kind of grinding tool is provided, it is characterized in that in the particulate substrates that is made of rubber particles (matrix), abrasive particle is disperseed, and combined and maintenance.
In grinding tool of the present invention, preferably:
(1) particle diameter of aforementioned rubber particles is 5～300 μ m;
(2), contain above-mentioned abrasive particle with the amount of 40～80 weight portions with respect to the above-mentioned rubber particles of 100 weight portions.
According to the present invention, the manufacture method of grinding tool also is provided, this method is made of following operation:
Mixed processes: mixed rubber particle and abrasive particle are with the preparation particulate mixtures;
Compression forming operation: aforementioned particulate mixtures compression forming is the regulation shape;
Heat treatment step: the formed body that is obtained by aforementioned compression forming operation is heat-treated.
In manufacture method of the present invention, preferably:
(3) with respect to the aforementioned rubber particles of 100 weight portions, use aforementioned abrasive particle with the amount of 40～80 weight portions;
(4) with 50～300kg/cm
2Pressure carry out compression forming;
(5) under 150～250 ℃ temperature, heat-treat;
(6) carry out compression forming and heat treatment simultaneously.
Grinding tool of the present invention is to disperse in the particulate substrates that is made of rubber particles and be combined with abrasive particle, therefore, coming off from the surface easily, on the grinding tool surface, expose the new abrasive particle that is not worn by grinding the abrasive particle that exists on the grinding tool surface that is worn that is produced.Consequently, it is so unfavorable to avoid grinding rate at short notice to descend effectively, and can stably carry out attrition process in long-time.In addition, also not using under the situation of the chemical grinding that uses chemical solution, just can carry out attrition process effectively by the mechanical lapping of only using this grinding tool.
Description of drawings
Fig. 1 is the schematic diagram of the cross-section structure of expression grinding tool of the present invention.
Fig. 2 represents the schematic diagram of the cross-section structure of known grinding tool in the past.
Fig. 3 is the stereogram that expression is mounted with the grinding wheel of grinding tool of the present invention.
Fig. 4 is illustrated in to use the grinding wheel of the present invention that embodiment 1 makes and when carrying out the grinding of glass substrate, flows through the chart of relation of the amount of grinding of the current value of rotating shaft of the grinding piece number of glass substrate and grinding wheel and glass substrate.
The specific embodiment
＜grinding tool 〉
With reference to Fig. 1, grinding tool of the present invention is disperseed by the particulate substrates 3 that forms by rubber particles 1 and in this matrix 3 and the abrasive particle 5 fixed constitutes.Promptly, rubber particles 1 is when keeping shape of particle, mutually melt bonded and form particulate substrates 3 on each particle surface, simultaneously this matrix 3 on the surface of the abrasive particle 5 of dispersion rubber particles 1 also take place melt bondedly, therefrom abrasive particle 5 is fixed in the matrix 3.As shown in Figure 1, on the surface of this grinding tool, abrasive particle 5a exposes, and makes the substrate surface of regulation be subjected to the polishing of this abrasive particle 5a, can carry out attrition process to substrate surface thus.
In addition, Fig. 2 represents the cross-section structure of known grinding tool in the past, this grinding tool has the structure of disperseing and be fixed with abrasive particle 5 in matrix 7, and this matrix 7 is formed by various resins or rubber etc., but the main difference of itself and grinding tool of the present invention is: matrix is fully integratedization by the curing of resin or rubber, in like this by the matrix 7 of incorporate resin or rubber, abrasive particle 5 is disperseed and is fixing.
Promptly, in known in the past grinding tool as shown in Figure 2, abrasive particle 5 is embedded in the matrix and is firmly fixed (promptly, the bond strength of matrix 7 and abrasive particle 5 is higher), therefore, form following structure, the abrasive particle 5a that promptly exposes on the surface by attrition process takes place to wear and tear when diminishing, also be difficult to come off from the grinding tool surface, the new abrasive particle 5 that is not worn is difficult to be exposed to the surface.Consequently, if carry out attrition process, grinding rate reduces at short notice.
Relative therewith, in grinding tool of the present invention shown in Figure 1, matrix 3 is by forming in that melt surface is bonding between a large amount of rubber particles 1, there is abrasive particle 5 in the gap of rubber particles 1, by with the bonding structure that is fixed that forms of the melt surface of this rubber particles 1, compare with the grinding tool of Fig. 2, the contact area of abrasive particle 5 and matrix 3 (rubber particles 1) is little, and both adhesions are little.Therefore, owing to the attrition process surperficial abrasive particle 5 that has been worn breaks away from easily, since be present in the surface rubber particles 1 wearing and tearing or come off, the new abrasive particle 5 that is not worn promptly is exposed on the grinding tool surface, grinding rate does not reduce at short notice, and can stably carry out attrition process in long-time.
In grinding tool of the present invention, the particle diameter that forms the rubber particles 1 of particulate substrates 3 is preferably the scope of 5～300 μ m.That is, if the particle diameter of rubber particles 1 is excessive, then the confining force of abrasive particle 5 (adhesion of matrix 3 and abrasive particle) is lower than essential value, and unnecessary coming off takes place abrasive particle 5 easily when attrition process, and attrition process may reduce.In addition, if the particle diameter of rubber particles 1 is too small, then the confining force of abrasive particle 5 becomes excessive, and the abrasive particle 5a that is worn that exists on the grinding tool surface is difficult to generation and comes off, and consequently, might be easy to generate the reduction of grinding rate.
In addition, in order moderately to keep the adhesion with abrasive particle 5, rubber particles 1 is preferably curing rubber, for example utilizes hardometer to measure the rubber hardness (JIS K6253) that obtains and is preferably 50～80 scope.If the hardness of rubber particles 1 is littler than above-mentioned scope, then in compression forming operation described later, abrasive particle 5 becomes big with the contact area of rubber particles 1, thereby the adhesion of abrasive particle 5 is higher than essential value, consequently, be difficult to make the abrasive particle 5a that is worn to come off, may be easy to generate the reduction of grinding rate from the surface.On the contrary, if the above-mentioned scope of the hardness ratio of rubber particles 1 is big, then between the rubber particles 1 or the melt surface of rubber particles 1 and abrasive particle 5 bonding become the difficulty, cause the reduction of attrition process owing to the reduction of the confining force of abrasive particle 5, according to circumstances, keep the form of grinding tool and also may become difficulty.
Further, as the rubber that forms above-mentioned rubber particles 1, have no particular limits, for example can use acrylonitrile-butadiene rubber (NBR), SBR styrene butadiene rubbers (SBR), polyurethane rubber, polyureas rubber, urethane-urea rubber, acrylic rubber, butadiene rubber, isoprene rubber, silicone rubber aptly, contain suitable materials such as fluorubber, natural rubber.Wherein, by compression forming described later and heat treatment, particle surface generation heat fusing is bonding, and forms particulate substrates 3 as shown in Figure 1 easily, at this on the one hand, and preferred NBR and SBR.
In the present invention, as the abrasive particle 5 that disperses and fix in the particulate substrates 3 that constitutes by rubber particles 1, can use himself is known material, is the hard inorganic powder of representative with cerium oxide, silica (quartz, fused silica etc.), aluminium oxide, carborundum, zirconia etc. for example.From the viewpoint of high attrition process, such abrasive particle 5 is preferably attritive powder, the general scope of preferred its particle diameter below 20 μ m.
In addition, different and different according to the kind of abrasive particle 5 or rubber particles 1, but in general,, disperse abrasive particle 5 with the amount of 40～80 weight portions with respect to the rubber particles 1 of 100 weight portions, it guarantees that in long-time aspect the excellent attrition process be preferred.
(in Fig. 3, grind mould represent with 12) for example as shown in Figure 3, above-mentioned grinding tool of the present invention forms ring-type, is adhesively fixed by bonding agent etc. on the support substrate 14 of identical shaped annular metal manufacturing, is made for grinding wheel 10 and uses.Promptly, in this grinding wheel 10, the surface of grinding mould 12 becomes smooth attrition process face 12a, the heart partly is formed with through hole 12b therein, make grinding wheel 10 rotations on one side, and supply with lapping liquid (cooling water or grinding wet goods), the attrition process face 12a of grinding tool 12 with the substrate surface of regulation pressed and contact on one side, carry out attrition process thus.At this moment, as required, also can supply with chemical solutions such as alkali lye, carry out chemical grinding in the lump with mechanical lapping, but,, therefore needn't use such chemical grinding in the lump in long-time because excellent attrition process can be kept according to grinding tool 12 of the present invention, only just can carry out attrition process by mechanical lapping, it is big advantage of the present invention.
The manufacturing of＜grinding mould 〉
Above-mentioned grinding mould is made through mixed processes, compression forming operation and heat treatment step.
-mixed processes-
At first, in mixed processes, rubber particles that will be made of above-mentioned rubber and abrasive particle mix with the preparation particulate mixtures.That is, in order to form particulate mixtures, do not carrying out mixing the mixing of carrying out rubber particles and abrasive particle by the dry type of using mixers such as Henschel mixer under the incorporate situation of fusion such as melting mixing.
Rubber particles is the powder of curing rubber, the average grain diameter that preferably has above-mentioned scope, the powder of such curing rubber for example adds rubber-moulding to in monomer component and the polymerization initiator, to reach that vulcanizing agents such as the curing agent (for example organic peroxide) of the amount of regulation hardness or sulphur mix and the polymerizable composition, polymerizable composition that obtains, use the suspension polymerisation of this polymerizable composition, polymerizable composition or emulsion polymerization etc., then can easily be prepared.For the average grain diameter of curing rubber powder, can wait suitable the adjustment according to the amount or the stirring condition of employed surfactant when the suspension polymerisation etc.
In addition, that has as above narrated is such, and for the amount of rubber particles and abrasive particle, can be set at respect to 100 parts by weight of rubber particles is the scope of 40～80 weight portions.
-compression forming operation-
Then, the particulate mixtures for preparing like that as mentioned above is filled in the mould of regulation, compression forming is as shown in Figure 3 a ring-type isotactic setting shape for example.For the pressure of this moment, different and different according to the kind of rubber particles and hardness etc., but be generally 50～300 kg/cm
2About.Promptly, by this compression section, can make rubber particles and abrasive particle driving fit with suitable contact area, if this pressure is higher than essential value, then the contact area of rubber particles and abrasive particle becomes too big, perhaps the closing force of abrasive particle and rubber particles or the closing force between the rubber particles become excessive, by heat treatment described later, the adhesion of rubber particles (particulate substrates) and abrasive particle becomes excessive, the coming off of abrasive particle that is worn by attrition process becomes difficult, attrition process reduction at short notice.On the contrary, if this pressure is too low, then the confining force of abrasive particle reduces, and perhaps the adhesion between the rubber particles reduces, and is difficult to guarantee suitable attrition process.
In addition, by this compression forming operation, rubber particles is extruded and is slightly flat, but its particle diameter is identical in fact with the particle diameter of the rubber particles that uses as raw material.
-heat treatment step-
In this operation, the formed body that is obtained by above-mentioned compression forming operation is heated, keep the shape of particle of rubber particles thus, under this state, the melt surface melt surface bonding and rubber particles and abrasive particle that carries out between the rubber particles is bonding.Therefore, this heat treatment temperature is according to the difference of the kind of employed rubber particles or hardness and difference, and it is preferred in general being 150～250 ℃.If this heat treatment temperature is too high, then can not keep shape of particle.Deform between the rubber particles, and may be turned to the ocean shape by one securely; On the contrary, if heat treatment temperature is lower than essential value, can not realize that then the melt surface melt surface bonding or rubber particles and abrasive particle between the rubber particles is bonding, the intensity that produces formed body self reduces, thereby is difficult to obtain the good grinding tool of attrition process.
And this heat treatment period can be about 1～5 hour usually.
In the present invention, above-mentioned heat treatment also can be carried out after compression forming, from in the short time and carry out the bonding viewpoint of melt surface melt surface bonding or rubber particles and abrasive particle between the rubber particles effectively, preferably under the condition of pressurization, carry out simultaneously with compression forming.
As shown in Figure 3, be engaged, be fixed on the support substrate of regulation according to the grinding tool of the present invention of above-mentioned such manufacturing, it can be used as grinding wheel and is used for the attrition process of various substrates etc.
Embodiment
＜embodiment 1 〉
As rubber powder and abrasive particle, use following substances.
Rubber powder
Material: NBR curing rubber
Particle diameter: 5～300 μ m
Rubber hardness (JIS K 6253); 50 (measuring) by hardometer
Abrasive particle
Material: cerium oxide
Particle diameter: 0.1～10 μ m
Above-mentioned rubber powder of 100 weight portions and 50 weight portion abrasive particles are carried out the dry type mixing, thus the preparation particulate mixtures.
With 100kg/cm
2Pressure be toroidal with resulting particulate mixtures compression forming, then, remain under this pressure on one side, 150 ℃ times maintenances several minutes, heat-treat thus on one side, thereby make the circular grinding tool of following specification.
External diameter: 300mm
Internal diameter: 100mm
Thickness: 10mm
By the section of the above-mentioned grinding tool of microscopic examination, through confirming: as shown in Figure 1, Yi Bian keep shape of particle between the curing rubber particle, Yi Bian it is bonding to form particulate substrates that melt surface takes place, in this particulate substrates, abrasive particle is fixed by melt surface is bonding.
In addition, the above-mentioned grinding tool that obtains is engaged on the circular metal system support substrate that is fixed on as shown in Figure 3, by the circumference of grinding tool and the circumference of this glass substrate are coincided, and make the grinding tool rotation, according to following condition attrition process is carried out on the surface of the pyrex substrate of the disc-shape of following specification thus.
The pyrex substrate:
Diameter: 150mm
Maximum surface roughness Ry (JIS B 0601-1994); 0.1925 μ m
Grinding condition:
Grinding pressure (to the extruding force of the grinding tool of glass substrate): 150g/cm
2
The rotating speed of grinding tool: 30m/ second (circumference)
Lapping liquid: water (quantity delivered: 2L/ minute)
Milling time: 150 seconds
By above-mentioned attrition process, the maximum surface roughness Ry of glass baseplate surface reaches 0.0335 μ m, thereby has obtained smooth minute surface.Can judge thus: the abrasive particle that is worn on grinding tool surface produces and comes off, new abrasive particle is exposed to the surface step by step, thereby can carry out attrition process effectively, and, under the situation of the chemical grinding that does not use alkali lye, also can obtain the minute surface of high smooth.
In addition, under these conditions, continuously 10 pieces of glass substrates are carried out attrition process.At this moment, the relation with the amount of grinding of the current value of the grinding piece number of glass substrate and the rotating shaft that flows through grinding wheel and per 1 piece of glass substrate is shown among Fig. 4.And, when the current value that flows through the rotating shaft of grinding wheel is illustrated in attrition process to load that this rotating shaft applied.
Can judge from the result of Fig. 4: if 2～4 pieces of glass substrates are carried out attrition process, then amount of grinding and current value are stable.This point shows following aspect, and promptly by the attrition process of glass substrate, then new abrasive particle progressively exposes, and can carry out attrition process with certain stabilised efficiency ground, thereby does not need for example polishing operation of grinding tool.
Claims (8)
1. grinding tool, in the particulate substrates that is made of rubber particles, abrasive particle is disperseed, and combined and keep.
2. grinding tool according to claim 1, the particle diameter of wherein said rubber particles are the scope of 5～300 μ m.
3. grinding tool according to claim 1 wherein forms the described rubber particles of particulate substrates with respect to 100 weight portions, contain described abrasive particle with the amount of 40～80 weight portions.
4. the manufacture method of grinding tool, this method is made of following operation:
Mixed processes: mixed rubber particle and abrasive particle are with the preparation particulate mixtures;
Compression forming operation: described particulate mixtures compression forming is the regulation shape;
Heat treatment step: the formed body that is obtained by described compression forming operation is heat-treated.
5. the manufacture method of grinding tool according to claim 4 wherein with respect to the described rubber particles of 100 weight portions, is used described abrasive particle with the amount of 40～80 weight portions.
6. the manufacture method of grinding tool according to claim 4 is wherein with 50～300kg/cm
2Pressure carry out compression forming.
7. the manufacture method of grinding tool according to claim 4 is wherein heat-treated under 150～250 ℃ temperature.
8. the manufacture method of grinding tool according to claim 4 is wherein carried out compression forming and heat treatment simultaneously.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP351523/2005 | 2005-12-06 | ||
| JP2005351523 | 2005-12-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1978142A true CN1978142A (en) | 2007-06-13 |
Family
ID=38119419
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2006101640689A Pending CN1978142A (en) | 2005-12-06 | 2006-12-06 | Grinding tool and its manufacture |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20070128995A1 (en) |
| CN (1) | CN1978142A (en) |
| TW (1) | TW200734120A (en) |
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| CN105171625A (en) * | 2015-10-31 | 2015-12-23 | 赵雪雅 | Silica gel base material, silica gel tile abrading block and preparation method of silica gel tile abrading block |
| CN105171628A (en) * | 2015-08-03 | 2015-12-23 | 苏州瑞高工程科技有限公司 | Resin abrasive disc |
| CN105579198A (en) * | 2013-09-28 | 2016-05-11 | Hoya株式会社 | Method for manufacturing glass substrate for magnetic disk and method for manufacturing magnetic disk |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1668476A (en) * | 1925-09-16 | 1928-05-01 | Rubber Latex Res Corp | Abrasive article and process of making the same |
| DE3545308A1 (en) * | 1985-12-20 | 1987-06-25 | Feldmuehle Ag | GRINDING DISC WITH DAMPING |
| US6069080A (en) * | 1992-08-19 | 2000-05-30 | Rodel Holdings, Inc. | Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the like |
| US6595831B1 (en) * | 1996-05-16 | 2003-07-22 | Ebara Corporation | Method for polishing workpieces using fixed abrasives |
| US6033449A (en) * | 1997-11-17 | 2000-03-07 | Cooper; Alex | Polishing tool |
| JP2001179609A (en) * | 1999-12-28 | 2001-07-03 | Roki Techno Co Ltd | Polishing pad |
| US20020016139A1 (en) * | 2000-07-25 | 2002-02-07 | Kazuto Hirokawa | Polishing tool and manufacturing method therefor |
| US6659846B2 (en) * | 2001-09-17 | 2003-12-09 | Agere Systems, Inc. | Pad for chemical mechanical polishing |
-
2006
- 2006-11-30 TW TW095144449A patent/TW200734120A/en unknown
- 2006-11-30 US US11/606,160 patent/US20070128995A1/en not_active Abandoned
- 2006-12-06 CN CNA2006101640689A patent/CN1978142A/en active Pending
Cited By (9)
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| CN102335887A (en) * | 2011-10-31 | 2012-02-01 | 杨孙艺 | Silicon carbide rubber sanding block for polishing and grinding glazed tile |
| CN103909476A (en) * | 2012-12-28 | 2014-07-09 | 达兴材料股份有限公司 | Grinding stone, grinding piece containing grinding stone and manufacturing method of grinding piece |
| CN103909476B (en) * | 2012-12-28 | 2016-08-17 | 达兴材料股份有限公司 | Grinding stone, grinding piece containing grinding stone and manufacturing method of grinding piece |
| CN105579198A (en) * | 2013-09-28 | 2016-05-11 | Hoya株式会社 | Method for manufacturing glass substrate for magnetic disk and method for manufacturing magnetic disk |
| CN105579198B (en) * | 2013-09-28 | 2018-04-27 | Hoya株式会社 | The manufacture method of glass substrate for disc and the manufacture method of disk and grinding tool |
| CN105171628A (en) * | 2015-08-03 | 2015-12-23 | 苏州瑞高工程科技有限公司 | Resin abrasive disc |
| CN105171625A (en) * | 2015-10-31 | 2015-12-23 | 赵雪雅 | Silica gel base material, silica gel tile abrading block and preparation method of silica gel tile abrading block |
| CN110091259A (en) * | 2019-05-17 | 2019-08-06 | 珠海大象磨料磨具有限公司 | Corase grinding super-hard abrasive tool and preparation method thereof |
| CN110091259B (en) * | 2019-05-17 | 2021-06-04 | 珠海大象磨料磨具有限公司 | Superhard grinding tool for coarse grinding and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200734120A (en) | 2007-09-16 |
| US20070128995A1 (en) | 2007-06-07 |
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Open date: 20070613 |