CN1975517B

CN1975517B - Display substrate, method of manufacturing the same and display panel having the same

Info

Publication number: CN1975517B
Application number: CN2006100647182A
Authority: CN
Inventors: 卢水贵; 全珍; 李知恩; 朴商镇
Original assignee: Samsung Electronics Co Ltd
Current assignee: Samsung Display Co Ltd
Priority date: 2005-11-03
Filing date: 2006-11-03
Publication date: 2010-12-08
Anticipated expiration: 2026-11-03
Also published as: CN1975517A; KR20070047956A

Abstract

A display substrate reducing a cost price and produced conveniently by a simple process includes a base substrate, a supporting pattern, and a first and a second protrusion pattern. The display substrate has a touch screen function detecting a touch point and electrically connected at the touch point to an array substrate having a plurality of pixel portions, and first and second signal lines formed thereon. The supporting pattern is formed on a base substrate with a first length, and maintains a separation distance from the array substrate. The first and second protrusion patterns are formed on the base substrate with a second length, and electrically connected to the first and second signal lines respectively. The protrusion pattern and the supporting pattern are simultaneously formed, and thus the manufacturing process can be simplified.

Description

Display base plate and manufacture method thereof and display panel with this substrate

Technical field

The display panel that the present invention relates to a kind of display base plate, makes the method for this display base plate and have this display base plate.More specifically, the present invention relates to a kind of display base plate that can reduce manufacturing cost and raising production convenience, the display panel of making the method for this display base plate and having this display base plate by simplified manufacturing technique.

Background technology

Usually, display device is that user's display image is so that the data that identification is handled by information process unit.Panel display apparatus has the advantage of for example miniaturization, lightweight structure, high definition or the like, so panel display apparatus is used widely.

Liquid crystal display (" LCD ") device often is used as panel display apparatus.The LCD device utilizes liquid crystal material to come display image.The LCD device uses liquid crystal material to come display image.Liquid crystal is according to changing light transmission according to the electric field intensity of executing thereon.

The LCD device comprises the LCD panel with array base palte, relative substrate and liquid crystal layer.Array base palte has the formation thin film transistor (TFT) as on-off element (" TFT ") thereon.Substrate and array base palte are combined relatively.Liquid crystal layer is arranged between array base palte and the relative substrate.

Usually, the LCD device has the importation that comprises operation interface, and handles the components of system as directed by the signal of importation input.The LCD device comes display image by the one-way communication utilization from the control signal of components of system as directed output.

Recently, the LCD device has used touch panel, and user's instruction can use the display icon of LCD panel directly to import, rather than one-way communication.

Touch panel is arranged on the LCD panel, and has display icon on LCD panel screen.When the user with finger or touchs display icon such as light pen and during the order of selecting to carry out, touch panel detects the order that touch point and the selected icon of foundation have and drives the LCD device.

Touch panel can and use when being not used in the keypad of mobile product when the input media of for example keyboard that is not used in computing machine or mouse, and therefore, the touch panel that has touch-screen on it will be used more and more widely.

Yet because touch panel is arranged on the LCD panel, thickness or size with product of touch panel will become big.In order to address this problem, touch panel and LCD panel form integral body.

With the integrally formed LCD panel of the touch panel that wherein has optical sensor be an illustrative example of touch panel.When contact somewheres such as finger or light pen, the optical sensor perception is from the input point of the light of shade or light pen generation.

Yet when the light surround grow or when dying down, the susceptibility of optical sensor will become big or diminish.Therefore, the LCD panel with optical sensor has when the light surround grow or when dying down, is difficult to determine the problem of touch point.

In order to address the above problem, developed a kind of LCD panel of type of touch screens.The LCD panel of type of touch screens has a conductive prominence and detection line.When the user touches the LCD panel of type of touch screens, the LCD panel detection touch point coordinate of type of touch screens.

Have on it the conductive prominence that forms and the LCD panel of detection line, further comprise the supporting element of keeping the gap between array base palte and the relative substrate and supporting two substrates.Yet conductive prominence and supporting element are difficult to integrally make by a step, so, will increase manufacturing process.

Summary of the invention

The invention provides a kind of display base plate of energy simplified manufacturing technique.

The present invention also provides a kind of manufacture method of this display base plate.

The present invention also provides a kind of display panel with this display base plate.

In the foundation embodiment of display base plate of the present invention, the display base plate of the display panel of the touch screen function with senses touch point coordinate is provided, display base plate is electrically connected on the touch point with array base palte, this array base palte has formation a plurality of pixel portion, first line and second line thereon, pixel portion is determined by many grid lines and many data lines, first and second line detected touch point, this display base plate comprises: base substrate, support pattern, first projection pattern and second projection pattern.Support that pattern is formed directly on the base substrate, it has first length and keeps uniform separation distance with array base palte.First and second projection pattern are formed directly on the base substrate, and it has second length and is electrically connected with first and second lines respectively at contact point.First length can be longer than second length.

Here, first and second projection pattern can have formation conductive layer thereon, and display base plate can further comprise formation thereon with the corresponding color-filter layer of pixel portion.

In exemplary embodiment according to the manufacture method of exemplary display base plate of the present invention, make the method for the display base plate of display panel, wherein this display base plate has touch screen function and determines the coordinate of touch point and be electrically connected on the touch point with array base palte, array base palte has formation a plurality of pixel portion thereon, first line and second line, by many grid lines and many pixel portion that data line is determined, and first line of detected touch point and second line, this method comprises: apply organic material layer on base substrate, above organic material layer and with organic material layer, exposed mask is set discretely, this exposed mask comprises formation first mask pattern and second mask pattern thereon, first mask pattern forms supports the pattern and second mask pattern to form first projection pattern and second projection pattern, the exposure organic material layer is kept even separation distance between exposed mask and the organic material layer simultaneously, and the development organic material layer forms support pattern and first and second projection pattern.

This method can further comprise the organic material layer of eliminating in the exposure area, and formation color-filter layer, above color-filter layer, organic material layer and photoresist layer, form conductive layer, on conductive layer, form pattern, and the conductive layer in elimination and the corresponding zone of support pattern.

In another embodiment according to the manufacture method of exemplary display base plate of the present invention, make with array base palte and have the formation a plurality of pixel portion thereon and the method for the display base plate of signal wire accordingly, wherein a plurality of pixel portion are determined by many grid lines and many data lines, the signal wire detected touch point, this method comprises: form the corresponding color filter pattern of pixel portion with base substrate, formed thereon on the base substrate of color filter pattern and formed organic material layer, the composition organic material layer, and formation has the support pattern and the projection pattern of different-diameter respectively, formed thereon on the base substrate of projection pattern and formed transparent electrode layer, and form to have covered the projected electrode of projection pattern, and formed thereon to form by heat-press step respectively on the base substrate of transparent electrode layer and had the support pattern and the projection pattern of differing heights.

In another embodiment according to the manufacture method of display base plate of the present invention, a plurality of pixel portion have been formed on it, the manufacture method of the display base plate of on-off element and signal wire, wherein a plurality of pixels are determined by many grid lines and many data lines, on-off element is formed on each pixel portion, the data line detected touch point, this method comprises: formed thereon on the base substrate of on-off element and formed organic material layer, the composition organic material layer, form respectively and have the support pattern and the projection pattern of different-diameter, formed thereon on the base substrate of supporting pattern and projection pattern and formed transparent electrode layer, the composition transparent electrode layer, and form to cover the projected electrode of projection pattern and the pixel electrode that is electrically connected with on-off element, formed thereon on the base substrate of pixel electrode and formed support pattern and projection pattern respectively with differing heights by heat-press step.

In foundation another embodiment of display panel of the present invention, display panel comprises array base palte and relative substrate.Array base palte has formation a plurality of pixel portion, first signal wire and secondary signal line thereon, wherein a plurality of pixel portion are determined by many grid lines and many data lines, first and second signal wire detected touch point and be respectively formed at grid line and the same direction of data line on.Substrate and array base palte are combined relatively, hold liquid crystal material.

Substrate comprises photoresist layer, supports pattern, first projection pattern and second projection pattern relatively.Photoresist layer is formed on the base substrate with grid line and data line respective regions.On photoresist layer, directly form support pattern, and keep uniform separation distance with array base palte with first length.On photoresist layer, directly form first and second projection pattern with second length.

In foundation another embodiment of display base plate of the present invention, the display base plate of display panel of touch screen function with coordinate of detected touch point, this display base plate is electrically connected on the touch point with relative substrate, comprising: by a plurality of grid line and a plurality of definite a plurality of pixel portion of data line of extending in second direction of extending at first direction; Be formed on the on-off element on a plurality of pixel portion; At upwardly extending first signal wire of first party; At the upwardly extending secondary signal line of second party; Be formed on the support pattern that has first length on the on-off element; Be respectively formed at first and second projection pattern on first and second signal wire, first and second projection pattern with second length littler than first length, be respectively formed at first and second sensing electrode on first and second projection pattern, first and second sensing electrode is electrically connected with first and second signal wire respectively.

Therefore, carry out the projection pattern of touch screen function and support the support pattern of the separation distance between array base palte and the relative substrate integrally to form, but thereby simplified manufacturing technique.

Description of drawings

Above and other features of the present invention and advantage can be by describing embodiment in detail with reference to the following drawings, and become apparent:

Fig. 1 is the block scheme that shows according to the exemplary display devices of exemplary embodiment of the present;

Fig. 2 is the planimetric map that shows the exemplary display devices of Fig. 1;

Fig. 3 is the exemplary array substrate of the exemplary display devices that shows Fig. 2 discretely and the decomposition diagram of exemplary relative substrate;

Fig. 4 is the planimetric map that shows according to the part of the exemplary display panel of exemplary embodiment of the present;

Fig. 5 is the part viewgraph of cross-section along the line I-I ' of Fig. 4;

Fig. 6 is the viewgraph of cross-section that shows the curved shape of the exemplary display panel that has applied external force;

Fig. 7 is the sequential chart that shows according to the illustrative methods of the detected touch point of one embodiment of the invention;

Fig. 8 shows the exemplary detection part schematic plan view that detects the touch point among Fig. 1 according to the exemplary sequential chart of Fig. 7;

Fig. 9 to 16 is for showing the cross-sectional view according to the exemplary manufacturing process of the exemplary display base plate of the embodiment of the invention;

Figure 17 is the curve map that shows the relation between the thickness of the size of the example mask pattern that is formed on the exposed mask and the retaining layer after exemplary developing process;

Figure 18 is what show according to the separation distance between exemplary exposure mask and the photosensitive high polymer organic material, the curve map of the variation in thickness of the retaining layer after exemplary development treatment;

Figure 19 is for along the line I-I ' of Fig. 4 and show part viewgraph of cross-section according to the exemplary display panel of another embodiment of the present invention;

Figure 20 and 21 is the viewgraph of cross-section that shows the projection pattern among Figure 19 and support the exemplary manufacturing process of pattern;

Figure 22 and 23 shows the block diagram of skeleton view of the typical assembly technology of exemplary display panel;

Figure 24 is the curve map that shows strain variation of the area of section of the exemplary support pattern of foundation when applying lasting external force on it;

Figure 25 A to 25C is the concept map that shows the strain technology of exemplary protrusions pattern and exemplary support pattern;

Figure 26 is for along the line I-I ' of Fig. 4 and show part viewgraph of cross-section according to the exemplary display panel of another embodiment of the present invention;

Figure 27 A and 27B are the viewgraph of cross-section that shows the typical manufacturing process of the exemplary protrusions pattern of Figure 26 and exemplary support pattern.

Embodiment

Can think that the embodiment of the following description of the present invention can differently be improved by multiple diverse ways, and does not break away from inventive principle disclosed herein, therefore scope of the present invention is not limited by these concrete present embodiment.On the contrary, the embodiment that provides here makes it openly will will be completely and completely, and will be by exemplifying rather than restrictedly passing on notion of the present invention fully to those skilled in the art.The similar in the whole text similar element of reference marker representative.

Be appreciated that when element be called as another element " on " time, its element in the middle of can directly on other elements, maybe can existing.On the contrary, when element be called as " directly " other elements " on " time, then do not have intermediary element to exist.Terminology used here " and/or " comprise one or more any and all combinations of associated listed items.

Though be appreciated that term first, second and the 3rd can be used for this and describe various elements, parts, zone, layer and/or part, these elements, parts, zone, layer and/or partly not limited by these terms.These terms only are used to distinguish an element, parts, zone, layer or part and other elements, parts, zone, layer or part.Therefore, first element discussed below, parts, zone, layer or part can be called as second element, parts, zone, layer or part, and without departing the teaching of the invention.

Here employed term is only for the purpose of describing special embodiment and be not intended to limit the present invention.As used herein, singulative also is intended to comprise plural form, unless content is clearly indicated the other meaning.Can understand further that term " comprises " and/or illustrate " comprising " existence of described feature, zone, integral body, step, operation, element and/or component when using in this instructions, not exist or add one or more other features, zone, integral body, step, operation, element, component and/or its group but do not discharge.

The convenience in order to describe here can the usage space relative terms, such as " following ", " below ", D score, " top ", " on " etc., an element or feature and other elements or feature relation are as shown in FIG. described.Be appreciated that the space relative terms is intended to comprise the different directions of device in using or operating except the direction of being painted in the drawings.For example, if device in the drawings is reversed, the element that is described as be in " below " or " following " of other elements or feature then should be oriented in " top " of described other elements or feature.Therefore, exemplary term " below " can comprise below and top both direction.Device also can have other orientation (revolve and turn 90 degrees or other orientation) and explain that correspondingly employed space describes language relatively here.

Unless define in addition, all terms used herein have (comprising technology and scientific terminology) the common identical meaning of understanding of those of ordinary skill in the field that the invention belongs to.It is also understood that such as those terms that in the common dictionary that uses, defines and to be interpreted as a kind of their consistent connotation of connotation with in correlation technique and background of the present disclosure, and should not be construed as idealized or excessive formal meaning, unless here so define clearly.

Described embodiments of the invention here with reference to cross-sectional illustration, this diagram is the synoptic diagram of desirable embodiment of the present invention.Therefore, can expect because for example variation of the illustrated shape that causes of manufacturing technology and/or tolerance.Therefore, embodiments of the invention should not be construed as the special region shape shown in being limited to here, but comprise because departing from of the shape that is caused by manufacturing for example.For example, illustrating or be described as flat zone can have coarse and/or non-linear characteristics usually.In addition, the wedge angle that illustrates can be a rounding.Therefore, the zone shown in the figure be in essence schematically and their shape be not intended to the accurate shape in zone is shown and not be intended to limit the scope of the invention.

Hereinafter, embodiments of the invention will be elaborated with reference to the accompanying drawings.

Fig. 1 is the block scheme that shows according to the exemplary display devices of the embodiment of the invention, and Fig. 2 is the planimetric map that shows Fig. 1 exemplary display devices;

With reference to figure 1 and 2, display base plate 100 comprises display panel 200, panel driving part 300, position detection part 400 and localization part 500.

Display panel 200 comprises array base palte 210, relative substrate 220 and liquid crystal layer (not shown).The grid line GL1-GLn that array base palte 210 has the data line DL1-DLm that is formed on the m number on array substrate D 2 directions and is formed on the n number on the D1 direction of array base palte 210, wherein ' m ' is natural number with ' n '.Data line DL1-DLm and grid line GL1-GLn are intersected with each other and insulated from each other.

For example the on-off element of thin film transistor (TFT) (" TFT ") is formed on each zone that arbitrary data line DL1-DLm and arbitrary grid line GL1-GLn intersect.

For example, the first on-off element TFT1 and the first pixel electrode PE1 all are formed on the zone that the first data line DL1 and the first grid line GL1 intersect.The gate electrode of the first on-off element TFT1 is electrically connected with the first grid line GL1.The source electrode of the first on-off element TFT1 is electrically connected with the first data line DL1.But isolate with the drain electrode of the first on-off element TFT1 of one deck formation with the source electrode, and be electrically connected with the first pixel electrode PE1 with source electrode electricity.

Similarly, on-off element TFT and pixel electrode PE are respectively formed at second to m data line DL2 to DLm with second to the zone that n grid line GL2 to GLn intersects.

In addition, array base palte 210 has formation first signal wire and secondary signal line thereon, with as further described as follows, carries out touch screen function.

The first signal wire SL1 (as shown in Figure 3) is identical with grid line GL1 to GLn to be extended along first direction D1, and secondary signal line SL2 (as shown in Figure 3) is identical with data line DL1 to DLm to be extended along second direction D2.First and second signal wire SL1 and SL2 are intersected with each other, and are electrically insulated from each other.

First and second signal wire SL1 and SL2 have driving voltage Vid, and this voltage has predetermined initial voltage level, and first and second signal wire SL1 is electrically connected with position detection part 400 with SL2.

Here, first and second signal wire SL1 and SL2 can be formed on have red (R) pixel, in each unit pixel of green (G) pixel and blue (B) pixel, can fall into the scope of these embodiment though form the color pixel that replaces of unit pixel part, and also can be formed in each multiple-unit pixel.For example, first and second signal wire SL1 and SL2 can be formed in per four unit pixel.

Relatively substrate 220 is combined with array base palte 210, thereby the liquid crystal layer (not shown) is between with respect to substrate 220 and array base palte 210.Substrate 220 has the color-filter layer that is formed in each unit pixel and shows predetermined color relatively.Optionally, color filter can be formed on the array base palte 210.

In addition, relatively substrate 220 has formation projected electrode part ER thereon and carries out touch screen function.Projected electrode part ER has the formation first projected electrode ER1 and the second projected electrode ER2 thereon.First and second projected electrode ER1 is electrically connected with SL2 with first and second signal wire SL1 respectively according to the external force that applies thereon with ER2.

Here, first and second projected electrode ER1 and ER2 can be formed on and have for example red (R) pixel, in each unit pixel of green (G) pixel and blue (B) pixel, and can be formed in every a plurality of unit pixel.For example, first and second signal wire SL1 and SL2 can be formed in per four unit pixel.

Be formed on first and second signal wire SL1 and SL2 on the array base palte 210, be formed on relative substrate 220 on first and second projected electrode ER1 and ER2, all will be described further following with reference to figure 3.

Refer again to Fig. 1, panel driving part 300 comprises that sequential control part 310, power unit 320, grayscale voltage produce part 330, data-driven part 340 and gate driving part 350.

The operation of sequential control part 310 control display device 100.By for example external graphics controller, the primary data signal DATA_0 of red (R) pixel, green (G) pixel and indigo plant (B), and the main system of the first control signal CNTL1 is applied in the sequential control part 310.So, the output timing of sequential control part 310 control primary data signal DATA_0 comes display image on display panel 200, and exports the first data-signal DATA1, the second control signal CNTL2, the 3rd control signal CNTL3, the 4th control signal CNTL4 and the 5th control signal CNTL5.

Especially, the first control signal CNTL1 comprises main clock signal MCLK, horizontal synchronization sweep signal HSYNC and vertical synchronization sweep signal VSYNC.The second control signal CNTL2 comprises that horizontal start signal STH, reverse signal REV and data load signal TP come control data drive part 340.The 3rd control signal CNTL3 comprises that start signal STV, clock signal C K, printing initiating signal OE wait and control grid drive part 350.The 4th control signal CNTL4 comprises that clock signal clk, reverse signal REV wait and controls power unit 320.

Sequential control part 310 further output the 5th control signal CNTL5 is come test section, control position 400.The 5th control signal CNTL5 comprises sampled signal SS etc., controls initial driving power Vid from power unit 320 output to be applied on first and second signal wire SL1 and the SL2.

The 4th control signal CNTL4 that power unit 320 responses provide from sequential control part 310, output common voltage Vcom and Vcst, initial driving voltage Vid, analog drive voltage AVDD, grid ON/OFF voltage Von, Voff etc.Common voltage Vcom and Vcst are applied on the display panel 200.Initial driving voltage Vid is applied on the array base palte 210 and carries out touch screen function.Analog drive voltage AVDD is applied to grayscale voltage and produces on the part 330.ON/OFF voltage Von, Voff are applied on the gate driving part 350.

It is a plurality of based on distributing the suitable reference gray level voltage VGMA_R of resistance grey level's quantity that grayscale voltage produces part 330 outputs.The resistance ratios of distributing resistance to comprise and adjusting according to the gamma curvature that is applied on it by utilizing as the analog drive voltage AVDD of reference voltage.

Data-driven part 340 comprises data tape carrier package (" TCP ") 341 and data driving chip 342.The data line DL of m number can be divided into a plurality of data line pieces, and a plurality of data TCP341 can form with difference driving data lines piece.Array base palte 210 is electrically connected with data pcb (" PCB ") 360 by data TCP341, can form sequential control part 310 on data pcb 360.

In addition, data-driven part 340 serves as that the basis produces a plurality of grayscale voltage VGMA with the reference gray level voltage VGMA_R that produces part 330 outputs from grayscale voltage.Data-driven part 340 is based on the second control signal CNTL2 by sequential control part 310 and grayscale voltage VGMA supply, convert the first data-signal DATA1 of numeric type the digital signal D1-Dm of analog type to, and the output timing of control figure signal D1-Dm outputs among the data line DL1-DLm.

Gate driving part 350 comprises grid TCP351 and grid drive chip 352.The grid line GL of n number can be divided into a plurality of grid line pieces, and can form a plurality of grid TCP351 and come driven grid line piece respectively.

The 3rd control signal CNTL3 that gate driving part 350 response is sent from sequential control part 310 and grid ON/OFF voltage Von, the Voff that sends from power unit 320 produce signal G1-Gn, and output to grid line GL1-GLn.

Position and the coordinate of the external force PO that is applied to relative substrate 220 tops detected in position detection part 400.

For example, when the first projected electrode ER1 that is formed on relative substrate 220 contacts by external force PO with the first signal wire SL1 that is formed on array base palte 210, detection is applied to the variation of the initial driving voltage Vid of the first signal wire SL1, and obtains the Y-axis coordinate of external force.

In addition, when the second projected electrode ER2 that is formed on relative substrate 220 contacts by external force PO with the secondary signal line SL2 that is formed on array base palte 210, detection is applied to the variation of the initial driving voltage Vid of secondary signal line SL2, and obtains the X-axis coordinate of external force.

Position detection part 400 comprises that power control part divides and the data sampling part, will be further described hereinafter with reference to figure 8.Power control part divides response the 5th control signal CNTL5, and supply initial driving power Vid is to first and second signal wire SL1 and SL2.Data sampling partly detects the initial driving power Vid among first and second signal wire SL2 and the SL2, and exports the first detection signal DS1 and the second detection signal DS2.

Position detection part 400 can be formed in the data-driven part 340 of panel driving part 300.Position detection part 400 can be integrally formed on the data TCP341 of data-driven part 340 with data driving chip 340.When Data Detection part 400 formed with data driving chip 340 integral body, data driving chip 342 can further comprise the additional pad that is electrically connected with SL2 with first and second signal wire SL1.

Localization part 500 is handled the coordinate of X-axis and Y-axis based on first and second detection signal DS1 and the DS2 by position detection part 400 outputs, and determines to apply on display panel 200 the accurate point of external force PO.

Fig. 3 is the exemplary array substrate of exemplary display devices that Fig. 2 is shown discretely and the decomposition diagram of exemplary relative substrate.

With reference to figure 3, display panel 200 comprises array base palte 210 and relative substrate 220.

Array base palte 210 have a plurality of formation thereon and in D2 side upwardly extending data line DL, and a plurality of formation thereon and in D1 side upwardly extending grid line GL.

In addition, array base palte 210 has formation a plurality of first signal wire SL1 and a plurality of secondary signal line SL2 thereon and carries out touch screen function.The first signal wire SL1 extends along first direction D1, and secondary signal line SL2 is along second direction D2.

Array base palte 210 can further comprise a plurality of sensing electrode ES that are formed on the top of first and second signal wire SL1 and SL2.Sensing electrode ES comprises and passes first and second sensing electrode ES1 and the ES2 that contact hole CTH1 and CTH2 and first and second signal wire SL1 are electrically connected with SL2 respectively.

Substrate 220 has a plurality of projected electrode ER and a plurality of support pattern 226 relatively.Projected electrode ER has first length and carries out touch screen function.A plurality of support patterns 226 have second length and come for keeping separation distance, for example the cell gap between array base palte 210 and the relative substrate 220.Projected electrode ER is formed directly on the base substrate of relative substrate 220 with supporting pattern 226, come be included in array base palte 210 in base substrate contact.

Projected electrode ER comprises the first projected electrode ER1 that can be electrically connected with the first signal wire SL1, and the second projected electrode ER2 that can be electrically connected with secondary signal line SL2.The first projected electrode ER1 is formed on the relative substrate 220, thereby the first projected electrode ER1 is corresponding with the first sensing electrode ES1, and the second projected electrode ER1 is formed on the relative substrate 220, thereby the second projected electrode ER2 is corresponding with the second sensing electrode ES2.

When applying external force PO on it, because first length of projected electrode ER is littler than second length of supporting pattern 226, the first projected electrode ER1 and the first sensing electrode ES1 electrically contact, and the second projected electrode ER2 and the second sensing electrode ES2 electrically contact.

Therefore, when applying external force PO, be electrically connected with ER2 with first and second projected electrode ER1 respectively with SL2 with first and second signal wire SL1 that first and second sensing electrode ES1 is electrically connected with ES2 respectively.

In addition, the common voltage Vcom from power unit output shown in Figure 1 is applied on the projected electrode ER.Be applied on first and second signal wire SL1 and the SL2 from the initial driving voltage Vid of power unit 320 outputs.Electrically contact by external force PO owing to applied projected electrode ER and the sensing electrode ES of common voltage Vcom, will change at the electromotive force that is applied to the initial driving voltage Vid on first and second signal wire SL1 and the SL2 on the touch point.

The electromotive force of initial driving voltage Vid in the first signal wire SL1 changes the coordinate that is used to determine Y-axis or first direction D1.The electromotive force of initial driving voltage Vid in secondary signal line SL2 changes the coordinate that is used to determine X-axis or second direction D2.

Fig. 4 is the planimetric map that shows according to the part of the exemplary display panel of the embodiment of the invention; Fig. 5 is the part viewgraph of cross-section along the line I-I ' of Fig. 4; And Fig. 6 is the viewgraph of cross-section that shows the curved shape of the exemplary display panel that has applied external force.

With reference to figure 4 and 5, display base plate 200 comprises array base palte 210, relative substrate 220 and be arranged on liquid crystal layer (not shown) between array base palte 210 and the relative substrate 220.

Array base palte 210 has a plurality of pixels, and pixel forms thereon with matrix shape as the standard block of display image on base substrate.Between a plurality of pixels, ji pixel Pji comprises j grid line GLj, i data line DLi, ji TFT Tji and ji pixel electrode PEji.

J grid line GLj extends on first direction D1.I data line DLi and j grid line GLj be electrical isolation to each other.I data line DLi with the vertical substantially second direction D2 of first direction D1 on extend, GLj intersects with the j grid line.

Ji pixel region PAji is by i data line DLi and the j grid line GLj near i+1 data line DLi+1 and j-1 grid line GLj-1 is definite respectively.Ji pixel region PAji has formation ji TFT Tji and ji pixel electrode PEji thereon.

The gate electrode G of ji TFT Tji bifurcated from j grid line GLj goes out, and electrode S bifurcated from i data line DLi in source goes out, and drain electrode D is electrically connected with ji pixel electrode PEji.Data-signal transmits by i data line DLi, and gate signal is applied on the j grid line GLj.Therefore, TFT Tji responds gate signal, and outputting data signals is to ji pixel electrode PEji.

In addition, ji pixel electrode Pji can further comprise ji store electricity line ball SEji, and it is used for receiving common voltage Vcom and definite sub-capacitor Cst.

Array base palte 210 has formation thereon and at the upwardly extending first signal wire SL1 of the first party that parallels with grid line GL, and forms thereon and the upwardly extending secondary signal line of the second party SL2 that parallels with data line DL.

The first signal wire SL1 can be formed on the same one deck that forms with grid line GL, and secondary signal line SL2 can form on the same one deck that forms with data line DL, reduces the manufacturing process of array base palte 210 and the thickness of display panel 200.Apply initial driving voltage Vid to the first signal wire SL1 and secondary signal line SL2.

Array base palte 210 comprises the formation first sensing electrode ES1 thereon, and the first sensing electrode ES1 is arranged on the top top of the first signal wire SL1 and is electrically connected with the first projected electrode ER1 on being formed on relative substrate 220.In addition, array base palte 210 further comprises the formation second sensing electrode ES2 thereon, and the second sensing electrode ES2 is arranged on the top top of secondary signal line SL2 and is electrically connected with the second projected electrode ER1 on being formed on relative substrate 220.

With reference to figure 4 and 5, array base palte 210 comprises first base substrate 211, tft array layer 212 and pixel electrode PE.

First base substrate 211 for example comprises, but is not limited to for example transparent material of glass.

First base substrate 211 has formation tft array layer 212 thereon.Tft array layer 212 comprises a plurality of TFT, protective seam 213, complanation layer 214 and the first signal wire SL1.

Among a plurality of TFT each includes gate electrode 212a, gate insulation layer 212b, active layer 212c, ohmic contact layer 212d, source electrode 212f and drain electrode 212e.

Protective seam 213 or passivation layer comprise, for example, organic insulator, inorganic insulation layer, or its composition cover TFT.

In addition, contact hole CTH3 is formed on the drain electrode 212e that exposes TFT on protective seam 213 and the complanation layer 214.

Because the first data line SL1 is formed on the same one deck that forms with gate electrode 212a, gate insulation layer 212b, protective seam 213 and complanation layer 214 have covered the top of the first signal wire SL1.Therefore, the first signal wire SL1 and the first projected electrode ER1 electrical isolation.

Secondary signal line SL2 can be formed on the gate insulation layer 212b, and this gate insulation layer 212b is and source electrode 212f, drain electrode 212e and the essentially identical layer of data line DL.Protective seam 213 has covered secondary signal line SL2 with complanation layer 214.Thereby, the secondary signal line SL2 and the second projected electrode ER2 electrical isolation.

Pixel electrode PE comprises for example transparent conductive material of tin indium oxide (" ITO "), and be formed on complanation layer 214 on corresponding with each pixel region.

The first sensing electrode ES1 that the first signal wire SL1 and the first projected electrode ER1 are electrically contacted forms by the etch process that is used to form pixel electrode PE.Therefore, on the same top that is formed on complanation layer 214 of the first sensing electrode ES1 with pixel electrode PE.

Same, be formed on complanation layer 214 on the same of the second sensing electrode ES2 that the secondary signal line SL2 and the second projected electrode ER2 are electrically contacted with pixel electrode PE.

Gate insulation layer 212b, protective seam 213 have formation contact hole CTH1 thereon with complanation layer 214; and contact hole CTH1 exposes the branch line BR (shown in Figure 4) of the first signal wire SL1 or the first signal wire SL1, and the first sensing electrode ES1 and the first signal wire SL1 are electrically contacted.

The second sensing electrode ES2 can be electrically connected with secondary signal line SL2 by the contact hole CTH2 that partly exposes secondary signal line SL2.Being used for contact hole CTH2 that part exposes the second data line SL2 passes protective seam 213 and forms with complanation layer 214.

Substrate 220 comprises second base substrate 221, photoresist layer (or black matrix) 222, color-filter layer 223, complanation layer 224, projection pattern 225, supports pattern 226 and common electrode layer 227 relatively.

Second base substrate 221 comprises the transparent insulation material of glass for example or polycarbonate (" PC ").In one embodiment, second base substrate 221 is flexible being bent when having applied external force PO, thereby display panel 200 has touch screen function, and second base substrate 221 can further comprise for example plastic material substrate of PC in this case.Optionally, glass substrate can be etched or be ground and have the thin thickness of about 0.2mm to 0.5mm, and has about 0.2mm and can be used as second base substrate 221 to the about glass substrate of 0.5mm thickness.

The photoresist layer 222 that forms relative substrate 220 is faced TFT, data line DL, grid line GL, the first signal wire SL1 and the secondary signal line SL2 of array base palte 210.Photoresist layer 222 stops that light passes the liquid crystal that is arranged on not the zone of being controlled by pixel electrode PE, and has improved the contrast of display panel.

Color-filter layer 223 comprises, for example, and red color filter pattern R, green color filter pattern G and blue color filter pattern B, and form corresponding to pixel.For example, color-filter layer 223 parts and photoresist layer 222 are overlapping.

Complanation layer 224 is formed on the top of color-filter layer 223, can be the organic insulator that makes relative substrate 220 complanations.

Projection pattern 225 can form by lithography step with support pattern 226.In other words, photosensitive high polymer organic material PP is coated on second base substrate 221 with formation photoresist layer 222 thereon, and exposed mask is arranged on the photosensitive high polymer organic material.So, organic material will be exposed and develop.

Based on foundation exposure total amount or the different developing property of time shutter, the projection pattern 225 of formation has the length that differs from one another with support pattern 226.Therefore, support pattern 226 to have the first length a1 and keep the separation distance that equates substantially with array base palte 210 and cell gap between the relative substrate 220, projection pattern 225 has than the second less length a2 of the first length a1 that supports pattern 226, carries out touch screen function.Thereby, support pattern 226 to serve as one group of column spacer (column spacer) of display panel 200.

In addition, a plurality of projection pattern 225 are formed on and are formed in the corresponding zone of the first signal wire SL1 on the array base palte 210.Same, a plurality of projection pattern 225 are formed on and are formed in the corresponding zone of secondary signal line SL2 on the array base palte 210.

For example, support that pattern 226 is formed on the shadow zone, and not owing to supporting pattern 226 to influence the light transmission of display panel 200.Support pattern 226 can be formed on each pixel, or have in each unit pixel of pixel of predetermined number.For example, support that pattern 226 forms with uniform density.

Common electrode layer 227 comprises for example transparent conductive material of tin indium oxide (" ITO "), indium zinc oxide (" IZO ") etc., and is formed on the complanation layer 224, thereby common electrode layer 227 has covered projection pattern 225.In the technology that forms common electrode 227, transparency conducting layer can be formed on the top of supporting pattern 226.Preferably, being formed on the transparency conducting layer of supporting on pattern 226 tops is removed.In addition, the transparency conducting layer that has covered the reserve part of supporting pattern 226 is removed.

Form common electrode layer 227, thereby common electrode layer 227 covers the top of projection pattern 225, therefore finished the first projected electrode ER1 that comprises projection pattern 225 and common electrode layer 227.Simultaneously, be appreciated that common electrode layer 227 has further covered the top of projection pattern 225, therefore finished the second projected electrode ER2 that comprises projection pattern 225 and common electrode layer 227.

Therefore, as shown in Figure 6, because external force PO and bending is moved towards array base palte 210, the first projected electrode ER1 is electrically connected with the first sensing electrode ES1 the first projected electrode ER1 with second base substrate 221.As mentioned above, the electromotive force that is applied to the initial driving voltage Vid on the signal wire SL changes with contacting of sensing electrode ES according to projected electrode ER, thereby, can detect the coordinate that is applied to the external force PO on it.

The first projected electrode ER1 is formed on the photoresist layer 222.In other words, form not and the equitant first projected electrode ER1 of the transit area of pixel and the first sensing electrode ES1, so will not influence aperture ratio of pixels.

For this purpose, the first signal wire SL1 has connected branch line BR, and the first projected electrode ER1 and the first sensing electrode ES1 can be formed in the photoresist layer zone.Branch line BR extends along second direction D2 from the first signal wire SL1 that extends along first direction D1, and is formed on the photoresist layer zone.

In addition, in order to form the first projected electrode ER1, photoresist layer 222 is preferably formed the enough width with first projected electrode ER1 between unit pixel of covering and the adjacent cells pixel.Unit pixel comprises, for example, all shows the ji-1 pixel Pji-1 of R, G, B color, ji pixel Pji, ji+1 pixel Pji+1.

And the first sensing electrode ES1 is formed on the layer identical with ji+1 pixel electrode PEji+1, and has separation distance with ji+1 pixel electrode PEji+1, stops the coupling phenomenon between the first sensing electrode ES1 and the ji+1 pixel electrode PEji+1.Therefore, formed with the first sensing electrode ES1 adjacent pixel electrodes PEji+1 and to have a grooved area towards ji+1 pixel electrode PEji+1, therefore, when observing in the plane, pixel electrode PEji+1 has a concave surface as shown in Figure 4.

As mentioned above, projected electrode ER and signal wire SL are described with reference to the first projection ER1 and the first signal wire SL1, but it will be apparent to those skilled in the art that, be associated with it, the second projected electrode ER2 and secondary signal line SL2 can be by forming with formation first projection ER1 and the essentially identical method of the first signal wire SL1.

And, shown first and second projected electrode ER1 and ER2 in one embodiment of the invention, and respectively with first and second projected electrode ER1 and ER2 corresponding first and second sensing electrode ES1 and ES2 be formed on photoresist layer 222 corresponding zones on.Optionally, first and second projected electrode ER1 and ER2 are adjacent one another are, and by branch line BR and the secondary signal line SL2 that on same photoresist layer 222, forms the first signal wire SL1 adjacent one another are, and on the top of branch line BR and secondary signal line SL2, forming first and second sensing electrode ES1 and ES2 respectively, first and second sensing electrode ES1 and ES2 are formed on the same photoresist layer zone.

And, in optional embodiment, by first and second sensing electrode ES1 and the ES2 of on same photoresist layer 222, forming adjacent one another are, and by whole first and second projection pattern 225 that forms, first and second projected electrode ER1 and ER2 can wholely form, and form incorporate projected electrode.

The method of carrying out the touch screen function of display panel will be described hereinafter:

Fig. 7 is the sequential chart that shows according to the typical method of the detected touch point of one embodiment of the invention, and Fig. 8 shows realization detects the touch point among Fig. 1 according to the exemplary sequential chart of Fig. 7 exemplary detection part floor map.

With reference to figure 7 and 8, have under the situation of the total voltage Vcom that is applied on it (cycle before the SY1) at common electrode layer 227, power control part divide 410 responses from sequential control part 310 outputs of Fig. 1 the 5th control signal CNTL5 and be driven.Then, the initial driving voltage Vid from power unit 320 outputs is applied to first and second signal wire SL1 and SL2 last (the cycle between SY1 and SY2).

As predetermined projected electrode ER1p+q and the ER2p+q that is being formed between first and second projected electrode ER1 on first and second signal wire SL1 and the SL2 and the ER2, when contacting first and second signal wire SL1 and SL2 by external force respectively (between SY2 and SY3 during in), first and second signal wire SL1 that is contacted with ER2 by projected electrode ER1 and the voltage levvl of SL2 change.

When the electromotive force of common voltage Vcom is lower than initial driving voltage Vid, for example be approximately 0V and initial driving voltage Vid when being approximately 5V as common voltage Vcom, the electric current that is transmitted by first and second signal wire SL1 and SL2 is applied on the common electrode layer 227, and the voltage levvl of first and second signal wire SL1 and SL2 is approaching or become the electromotive force (in the cycle between SY3 and SY4) of common voltage Vcom.

In this case, the sampled signal SS that 420 responses of data sampling part are supplied with by sequential control part 310, cycle between SY3 and SY4 for example, come the different voltage levvl of first and second signal wire of locking (latch) SL1 and SL2, and produce and export first and second detection signal DS1 and DS2.

In order to reach this purpose, data sampling part 420 can comprise the latch (latch) of reception sampled signal SS as the control input.

Data sampling part 420 is formed on each first and second signal wire SL1 and the SL2 independently.In addition, power control part divides 410 can form with the on-off element of for example metal-oxide semiconductor (MOS) (" MOS ") transistor etc., and can jointly be connected with SL2 with first and second signal wire SL1.

Thereafter, localization part 500 has as shown in Figure 1 made up Y and X-axis coordinate and determined to apply the touch point of external force on display panel 200.Determine Y and X-axis coordinate based on first and second detection signal DS1 and DS2 by 420 outputs of data sampling part.

Fig. 9 to 16 is for showing the xsect according to the exemplary manufacturing process of the exemplary display base plate of the embodiment of the invention.Particularly, show formation projection pattern 225 thereon with Fig. 5 and the relative substrate 220 of supporting pattern 226.

With reference to figure 9, each pixel is divided on the top of second base substrate 221 of relative substrate 220, and light can not enter each pixel from the outside in each pixel thereby photoresist layer 222 is formed on.Photoresist layer 222 can comprise the metallic film of chromium (Cr) for example or the organic material of carbonic ester for example.Photoresist layer 222 can comprise further that for example the bilayer of chromium (Cr)/chromium oxide (CrOx) reduces reflectivity.When describing special exemplary materials, be appreciated that optionally to be fit to the scope that material will fall into these embodiment.

With reference to Figure 10, photosensitive high polymer organic material PP is coated on the whole zone of second base substrate 221 with formation photoresist layer 222 thereon.The thickness of the photosensitive high polymer organic material PP preferably first length a1 with support pattern 226 shown in Figure 5 is identical.

With reference to Figure 11, exposed mask MASK is arranged on the predetermined distance b in photosensitive high polymer organic material PP top.Light source is arranged on exposed mask MASK top, and photosensitive high polymer organic material PP then exposes.Exposed mask MASK comprises that for example the shielding material of chromium (Cr) comes shielded from light.In addition, exposed mask has the formation first mask pattern MP1 and the second mask pattern MP2 thereon, and light shield area L CA is formed on outside first and second mask pattern MP1 and the MP2.

The first mask pattern MP1 is the mask pattern that forms the support pattern 226 on second base substrate 221, and the second mask pattern MP2 is the mask pattern that forms the projection pattern 225 on second base substrate 221.In addition, the first mask pattern MP1 has the essentially identical peripheral shape with the second mask pattern MP2, but more relatively large than the second mask pattern MP2.For example, when first and second mask pattern MP1 and MP2 had annular shape, the diameter of the first mask pattern MP1 was longer than the diameter of the second mask pattern MP2.

With reference to Figure 12, when photosensitive high polymer organic material PP utilizes exposed mask MASK exposure by contiguous type (proximity type) exposure technology, to be exposed the photosensitive high polymer organic material PP in first and second mask pattern MP1 and the corresponding zone of MP2, but will not be exposed with the corresponding photosensitive high polymer organic material of light shield area L CA PP.

According to the size of first and second mask pattern MP1 and MP2, optical diffraction will change, and thereby exposure area variation.In other words, have than the larger sized relatively first mask pattern MP1 of the second mask pattern MP2 and have less diffraction corons.Therefore, with the corresponding zone of the first mask pattern MP1 in photosensitive high polymer organic material PP will than with the corresponding zone of the second mask pattern MP2 in photosensitive high polymer organic material PP expose manyly.

Photosensitive high polymer organic material with different exposures is baked technology and developing process.Then, eliminate and the corresponding photosensitive high polymer organic material of light shield area L CA PP.Therefore, according to different exposure, the support pattern 226 of almost having kept the primary coat thickness of photosensitive high polymer organic material PP and having had first a length a1 is formed on the bottom of the first mask pattern MP1.

In addition, according to different exposures, projection pattern 225 is formed on the bottom of the second mask pattern MP2, and projection pattern 225 is eliminated preset thickness and had the second length a2 from the primary coat thickness of photosensitive high polymer organic material PP.

Separation distance b may command between photosensitive high polymer organic material PP and the exposed mask MASK is supported first length a1 of pattern 226 and the second length a2 of projection pattern 225.In other words, in contiguous type exposure technology,, support that the pattern 226 and the length of projection pattern 225 can be controlled because exposure technology is finished by the device of control separation distance b.In other words, have when separation distance b increases that 90 ° incident angle reduces and thus exposure reduce, and the incident angle that has 90 ° when separation distance b reduces subtracts greatly and the principle that increases of exposure thus, can be used to control the exposure of photosensitive high polymer organic material PP.

As shown in figure 17, utilize the mask pattern MP1 and the MP2 that are formed on exposed mask MASK to finish exposure and developing process, so, the size that is proportional to mask pattern MP1 and MP2 decides the reservation thickness of photosensitive high polymer organic material PP.In addition, as shown in figure 18, be inversely proportional to the reservation thickness that separation distance b between exposed mask MASK and the photosensitive high polymer organic material PP decides photosensitive high polymer organic material PP.

With reference to Figure 13, color-filter layer 223 is formed on the top with formation support pattern 226 thereon and second base substrate 221 of projection pattern 225.Color-filter layer 223 for example is formed on color filter pattern R, G and B, with on the corresponding position of the pixel cell of photoresist layer 222.

Color-filter layer 223 is by for example forming for the spin coating proceeding that obtains uniform thickness.In spin coating proceeding, the pigment of formation color filter is from the lower part ejection with respect to the top of supporting pattern 226 and projection pattern 225, thereby color-filter layer 223 does not form on the top of supporting pattern 226 and projection pattern 225.

With reference to Figure 14, complanation layer 224 is formed on the top of second base substrate 221 with formation color-filter layer 223 thereon.Complanation layer 224 protection color-filter layers 223 also make relative substrate 220 complanations.Complanation layer 224 can comprise the third rare or polyimide resin.

With reference to Figure 15, common electrode layer 227 is formed on the top of second base substrate 221 with formation complanation layer 224 thereon.Common electrode layer 227 is coated on complanation layer 224 and projection pattern 225 and supports on the pattern 226.Be used for common voltage Vcom is applied to the common electrode layer 227 of liquid crystal material, the transparent conductive material with high-transmission rate, conductance, chemical stability and thermal stability of ITO forms with for example depositing by sputter.Projection pattern 225 forms projected electrode ER with common electrode layer 227, and the signal wire SL shown in projected electrode ER and Fig. 5 electrically contacts by external force PO.Electrically contact the voltage levvl that changes initial driving voltage Vid as shown in Figure 7, and thereby detected the coordinate that is applied to the external force on it.

With reference to Figure 16, come from supporting pattern 226 to eliminate common electrode layer 227 and forming non-conductive support pattern 226 by additional technology.Therefore, because the electrical connection of as shown in Figure 5 array base palte 210 has stoped the change of the common voltage Vcom that is applied on the common electrode layer 227, and therefore not have to occur because common voltage Vcom and for the electrical effect of the element of formation on array base palte 210.

In this exemplary embodiment, when minus (negative type) exposure technology has been described, wherein photosensitive high polymer organic material PP keeps by developing process, is appreciated that the positivity exposure technology also can apply in this optional embodiment.

As mentioned before, Figure 17 is the curve map that shows the relation between the thickness of the size of the example mask pattern that is formed on the exposed mask and the retaining layer after exemplary developing process.With reference to Figure 17, can see that mask pattern has big more size, the thickness of the retaining layer behind developing process is also big more.

Figure 18 is what show according to the separation distance between exemplary exposure mask and the photosensitive high polymer organic material, the curve map of the variation in thickness of the retaining layer after exemplary developing process.With reference to Figure 18, can see that the separation distance between mask and the photosensitive high polymer organic material PP is big more, the thickness of the retaining layer behind developing process is also big more.

Figure 19 is for along the line I-I ' of Fig. 4 and show part viewgraph of cross-section according to the exemplary display panel of another embodiment of the present invention.

With reference to Figure 19, display panel 600 comprises array base palte 210, relative substrate 620 and be arranged on liquid crystal layer (not shown) between array base palte 210 and the relative substrate 620.

With reference to figure 5 and 19, the display panel 600 of Figure 19 comprises and the display panel 200 of Fig. 5 array base palte 210 with spline structure.Therefore, with the specific descriptions of omitting array base palte shown in Figure 19 210.

Substrate 620 comprises base substrate 621, black matrix 622, color-filter layer 623, complanation layer 624, projection pattern 625, supports pattern 626 and common electrode layer 627 relatively.Base substrate 621, black matrix 622 and color-filter layer 623 can form to has and according to the identical structure of the relative substrate 220 of the display panel 200 of embodiments of the invention.Therefore, any further description of these elements will be omitted.

Complanation layer 624 is formed on the color-filter layer 623, comprises the organic insulator that makes relative substrate 620 complanations.

Projection pattern 625 can apply photosensitive high polymer organic material PP by being included in support pattern 626, the photoetching process formation of mask and exposed mask is set on the top of photosensitive high polymer organic material PP on the complanation layer 624.Projection pattern 625 with support pattern 626 can with display panel 200 at the foundation embodiments of the invention on form on projection pattern 225 and the same position of supporting pattern 226 and form.

Projection pattern 625 is formed on the base substrate 621.Projection pattern 625 is towards the rising height projection of direction to be scheduled to of array base palte 210.The rising height of the projection pattern 625 that forms is littler with cell gap between the relative substrate 620 than array base palte 210.

Support pattern 626 and projection pattern 625 to form simultaneously, and have the diameter bigger than projection pattern 625.In addition, the height of the support pattern 626 of formation and array base palte 210 and the cell gap between the substrate 620 is identical relatively.Therefore, support pattern 626 to keep the cell gap between array base palte 210 and the relative substrate 620 and support array base palte 210 and relative substrate 620.

Preferably, support pattern 626 to be formed on black matrix top, thereby do not influence the light transmission of display panel 600.In addition, support on the pattern 626, support pattern 626 to be preferably formed in the black matrix area, wherein support pattern 626 not electrically contact with the pixel electrode PE or the first sensing electrode ES1 that are formed on the array base palte 210 because common electrode layer 627 is formed on.Support that pattern 626 can be formed on each pixel or each has on the pixel cell of predetermined number pixel.Preferably, support that pattern 626 is formed on the whole display panel 600 with uniform density.

Common electrode layer 627 comprises for example transparent conductive material of tin indium oxide (" ITO "), indium zinc oxide (" IZO ") etc., and is formed on and covers projection pattern 625 on the front surface of base substrate 621 and support pattern 626.The first projected electrode ER1 of 210 direction projection from base substrate 621 towards array base palte forms by projection pattern on the top that is formed on projection pattern 625 625 and common electrode layer 627.

Figure 20 and 21 viewgraph of cross-section for the exemplary manufacturing process that shows exemplary protrusions pattern among Figure 19 and exemplary support pattern.

With reference to Figure 20, the complanation layer 624 of substrate 620 has the uniform photosensitive high polymer organic material of formation thickness thereon PP relatively.The exposed mask MASK of exposure photosensitive high polymer organic material PP is arranged on photosensitive high polymer organic material PP top.Exposed mask MASK comprises shielding material.

Exposed mask MASK comprises the first mask pattern MP1 and the second mask pattern MP2.The diameter of the second mask pattern MP2 is bigger than the diameter of the first mask pattern MP1.Light shield area L CA is formed on outside first and second mask pattern MP1 and the MP2.

When photosensitive high polymer organic material PP is exposed, with first and second mask pattern MP1 and the corresponding zone of MP2 in photosensitive high polymer organic material PP be exposed, but with the corresponding zone of light shield area L CA in photosensitive high polymer organic material PP be not exposed.

With reference to Figure 20 and 21, when the photosensitive high polymer organic material PP of exposure is developed, eliminated the photosensitive high polymer organic material PP that is not exposed, the projection pattern part 625a that all has the column spacer shape is formed on the base substrate 621 with supporting pattern part 626a.Projection pattern part 625a is by first mask pattern MP1 exposure and formation.Support pattern part 626a by second mask pattern MP2 exposure and formation.

Projection pattern part 626a has same height with supporting pattern part 625a.Support pattern part 626a to have wideer diameter than projection pattern part 625a.For example, the diameter of projection pattern part 625a is approximately 10 μ m, supports the diameter of pattern part 626a to be approximately 17 μ m.

Projection pattern part 625a can be with two face side supporting pattern part 626a has the stairstepping that reduces along the direction diameter of array base palte.The marginal portion that contacts with array base palte can be circle.

Figure 22 and 23 shows the block diagram of the typical assembly technology of exemplary display panel.

With reference to Figure 22, sealant distributes around array base palte 210 by coating apparatus for sealant SD, and with the peripheral adjacent formation seal pattern SP of array base palte 210.Sealant for example, comprises thermoset resin, and the width of seal pattern SP is uniform substantially with height.

Then, with reference to Figure 23, array base palte 210 is positioned opposite to each other with relative substrate 620, and the sealant among the seal pattern SP hardens by heat pressing process then.By heat pressing process, array base palte 210 is with relative substrate 620 combinations with one another and have uniform distance, and the external force by heat pressing process makes the projection pattern part 625a that is formed in the relative substrate 620 and supports pattern part 626a distortion.

Figure 24 is the curve map that shows variation of the strain of the area of section of the exemplary support pattern of foundation when applying lasting external force on it.

With reference to Figure 24, can find that when increasing the cross-sectional area of supporting pattern (column spacer), the strain that fixing external force causes reduces, and when reducing the cross-sectional area of supporting pattern (column spacer), strain increases.

Therefore, with in array base palte and the coarctate heat pressing process of relative substrate, have than the projection pattern of supporting the diameter that pattern part is little and partly have bigger compressive strain ratio.

Table 1 has been showed the cell gap of liquid crystal after the display panel with different support patterns has applied identical external force.

Table 1

	Sample 1	Sample 2
			Applying the cell gap after the external force (μ m)	3.27	3.35

Sample 1 comprises the display panel of the support pattern with 10 μ m diameters, and sample 2 comprises the display panel of the support pattern with 17 μ m diameters.The height of in sample 1 and sample 2, supporting pattern with applying external force before cell gap equate.

Consider the result of table 1, sample 1 has the averaging unit gap of about 3.27 μ m and sample 2 is about 3.35 μ m.In other words, have than little than sample 2 of the cell gap of the liquid crystal in the support pattern sample 1 of minor diameter.Therefore, can notice that reduce consistently with the diameter of supporting pattern, the compressive strain ratio has increased.

Figure 25 A to 25C is the concept map that shows the strain technology of exemplary protrusions pattern and exemplary support pattern.

Figure 25 A is the viewgraph of cross-section that shows the display panel 600 before carrying out heat pressing process, Figure 25 B is the viewgraph of cross-section that shows the display panel 600 in carrying out heat pressing process, and Figure 25 C shows the viewgraph of cross-section of having carried out the display panel 600 behind the heat pressing process.

With reference to figure 25A and 25B, before carrying out heat pressing process and form projection pattern part 625a and support pattern part 626a after the seal pattern SP and have identical first a highly.During heat pressing process, because the external force of heat pressing process, projection pattern part 625a has second identical height b, the wherein a with supporting pattern part 626a〉b.

With reference to figure 25B and 25C, because having with supporting pattern part 626a, projection pattern part 625a compares less diameter and bigger compressive strain ratio, the height of projection pattern part 625a can't recover behind heat pressing process again.Yet,, support the height of pattern part 626a almost can return to the first height a owing to support pattern part 626a to have to compare big diameter and less compressive strain ratio with projection pattern part 625a.

Therefore, the difference in height between projection pattern part 625a and the support pattern part 626a occurred, occurred simultaneously supporting that the aspect ratio projection pattern part 625a of pattern part 626a is bigger.

Thereby projection pattern part 625a becomes the projection that has enough highly to come the contact array substrate during applying external force PO and supports pattern 625.Projection pattern 625 becomes the projected electrode ER with touch screen function by being formed on the whole lip-deep common electrode layer 627 that has covered projection pattern 625 that comprises of relative substrate.

Because than having experienced the subtle change on the height, supporting pattern part 626a to become support pattern 626, its lower compressive strain keeps separation distance between array base palte 210 and the relative substrate 620 because support pattern part 626a.

Projection pattern 625 with difference in functionality can form by the heat pressing process of array base palte 210 with relative substrate 620 simultaneously with supporting pattern 626.

Figure 26 is for along the line I-I ' of Fig. 4 and show part viewgraph of cross-section according to the exemplary display panel of another embodiment of the present invention.

With reference to Figure 26, display panel 700 comprises array base palte 210, relative substrate 720 and be arranged on liquid crystal layer (not shown) between array base palte 210 and the relative substrate 720.

With reference to figure 5 and 26, the display panel 700 of the embodiment that provides according to the present invention can comprise that the display panel 200 according to embodiments of the invention with Fig. 5 has essentially identical array base palte.Thereby identical reference marker will be used to refer to the same or similar part of describing for those in the embodiment of Fig. 5.

Array base palte 210 comprises first base substrate 211, tft array layer 212, the first projected electrode ER1, supports pattern 226 and pixel electrode PE.Though do not illustrate, be appreciated that array base palte 210 further comprises the second projected electrode ER2.

First base substrate 211 comprises for example transparent material of glass.

Tft array layer 212 is formed on first base substrate 211.Tft array layer 212 comprises a plurality of TFT, protective seam 213 and the first signal wire SL1.Though do not illustrate, be appreciated that tft array layer 212 further comprises secondary signal line SL2.

Each of a plurality of TFT comprises gate electrode 212a, gate insulation layer 212b, active layer 212c, ohmic contact layer 212d, source electrode 212f and drain electrode 212e.

Protective seam 213 comprises, for example, covers the organic insulator of TFT.

In addition, for the drain electrode 212e that makes TFT exposes, contact hole CTH3 passes protective seam 213 and forms.Protective seam 213 can further comprise the complanation layer that makes array base palte 210 complanations.

Because the first signal wire SL1 is formed on the same one deck that forms with gate electrode 212a, gate insulation layer 212b and protective seam 213 have covered the top of the first signal wire SL1.

Tft array layer 212 has formation projection pattern 225 and support pattern 226 thereon.

Projection pattern 225 and support pattern 226 utilize the essentially identical photoetching process described in Figure 20 and 21 to form, but in this embodiment, projection pattern 225 and support pattern 226 are formed on the array base palte 210.In other words, photosensitive high polymer organic material PP applies and is formed with thereon on the array base palte 210 of protective seam 213, utilizes exposed mask to finish photoetching process, forms projection pattern 225 then and supports pattern 226.A plurality of projection pattern 225 and the corresponding formation of the first signal wire SL1, a plurality of projection pattern 225 and the corresponding formation of secondary signal line SL2 (not shown).

Projection pattern 225 is the rising height projection of the direction towards relative substrate 720 to be scheduled to from array base palte 210.The rising height of the projection pattern 225 that forms is littler with cell gap between the relative substrate 720 than array base palte 210.

Support pattern 226 and projection pattern 225 to form simultaneously, and have the diameter bigger than projection pattern 225.In addition, the support pattern 226 of formation has and array base palte 210 and the relative identical height of cell gap between the substrate 720.Therefore, support pattern 226 array base palte 210 to be set on the position of certain separation distance being separated by, and support array base palte 210 and relative substrate 720 with relative substrate 720.

Preferably, support pattern 226 to be formed under the black matrix 722, thereby do not influence the light transmission of display panel 700 owing to the shape of supporting pattern 226.

Support that pattern 226 can be formed on each pixel or each has on the pixel cell of predetermined number pixel.Preferably, support pattern 226 on whole display panel 700, to form with uniform density.

Pixel electrode layer PE comprises for example transparent conductive material of tin indium oxide (" ITO "), and is formed on the protective seam 213 corresponding to each pixel.

In the photoetching process that forms pixel electrode layer PE, the first sensing electrode ES1 is formed on the projection pattern 225.When applying external force PO, the common electrode 727 during the first sensing electrode ES1 makes the first signal wire SL1 and is formed on relative substrate 720 is electrically connected.

The first sensing electrode ES1 comprises with pixel electrode PE identical materials and is formed on the same one deck that forms with pixel electrode PE.The second sensing electrode ES2 (not shown) can be formed on the same one deck that forms with pixel electrode PE.

The first projected electrode ER1 by projection pattern 225 be formed on projection pattern 225 upper surfaces on the first sensing electrode ES1 from array base palte 210 the direction projection towards relative substrate 720.

Gate insulation layer 212b and protective seam 213 have the contact hole CTH1 (not shown) of wearing it and crossing, and contact hole CTH1 exposes the first signal wire SL1 makes the first sensing electrode ES1 be electrically connected with the first signal wire SL1.

Substrate 720 comprises base substrate 721, black matrix 722, color-filter layer 723, complanation layer 724 and common electrode layer 727 relatively.

Base substrate 721 comprises the transparent insulation material of glass for example or polycarbonate (" PC ").Base substrate 721 is flexible applying under the little external force, give display panel 200 touch screen functions, thereby base substrate 721 can comprise for example plastic material of polycarbonate (" PC ").

Black matrix 722 and TFT, data line DL, grid line (not shown), the first signal wire SL1 and the corresponding formation of secondary signal line (not shown).

Color-filter layer 723 for example, comprises red color filter pattern, green color filter pattern and blue color filter pattern, corresponding formation with pixel.Color-filter layer 723 preferred fractions with black matrix 722 are overlapping.

Complanation layer 724 is formed on the top of color-filter layer 723 and the expose portion of black matrix 722, and comprises the organic insulator that makes 120 complanations of second substrate.

Common electrode layer 727 comprises the transparent conductive material of tin indium oxide (" ITO ") for example or indium zinc oxide (" IZO "), and is formed on the complanation layer 724.

Though described the first projected electrode ER1 and the first signal wire SL1, be appreciated that as shown in Figure 4 the second projected electrode ER2 and secondary signal line SL2 can utilize essentially identical method to form.

With reference to figure 27A, photosensitive high polymer organic material PP forms with uniform thickness on the protective seam 213 of array base palte 210.Exposed mask MASK is arranged on photosensitive high polymer organic material PP top and comes composition photosensitive high polymer organic material PP.Exposed mask MASK comprises that shielding material comes shielded from light.

In addition, exposed mask MASK has the formation first mask pattern MP1 and the second mask pattern MP2 thereon, and light shield area L CA is formed on outside first and second mask pattern MP1 and the MP2.

The first mask pattern MP1 forms the mask pattern of supporting pattern 226 on array base palte 210, the second mask pattern MP2 is the mask pattern that forms projection pattern 225 on array base palte 210.In addition, the first mask pattern MP1 has the essentially identical shape with the second mask pattern MP2, and has the relatively large size than the second mask pattern MP2.For example, as first and second mask pattern MP1, MP2 during with round-shaped formation, the diameter of the first mask pattern MP1 is longer than the diameter of the second mask pattern MP2.

When photosensitive high polymer organic material PP is exposed, to be exposed fully with the upper surface of first and second mask pattern MP1 and the corresponding photosensitive high polymer organic material of MP2 PP, but not be exposed with the corresponding photosensitive high polymer organic material of light shield area L CA PP.

Shown in Figure 27 B, when the photosensitive high polymer organic material PP of exposure is developed, just eliminated the photosensitive high polymer organic material PP that is not exposed.Therefore, active layer 213 has projection pattern part 225a and supports pattern part 226a, and the two all has the shape of formation column spacer thereon.Projection pattern part and support pattern part 225a and 226a have same height.Support pattern part 226a to have wideer diameter than projection pattern part 225a.For example, the diameter of projection pattern part 225a can be approximately 10 μ m, and supports the diameter of pattern part 226a can be approximately 17 μ m.

Though do not show in the accompanying drawings; pass through photoetching process; the first sensing electrode ES1 that corresponds to the pixel electrode PE of each pixel portion and correspond to projection pattern part 225a forms on the protective seam 213 that is formed with projection pattern part 225a and support pattern part 226a thereon.So, array base palte 210 utilizes with relative substrate 720 and carries out hot pressing as Figure 22 and 23 described packaging technologies.

Be formed on the projection pattern part 225a on the array base palte and support pattern part 226a by being out of shape as the external force in Figure 22 and the 23 described packaging technologies.In this case, as described in Figure 24 and table 1, because the projection pattern part 225a that has than minor diameter has bigger compressive strain ratio, the strain ratio of projection pattern part 225a supports that should changing of pattern part 226a is big.

Therefore, with reference to Figure 26 and 27B, when when being applied to external force on the display panel 700 and making relative curved substrate, projection pattern part 225a becomes and has the projection pattern 225 that enough highly contacts relative substrate 720.Projection pattern 225 is by being formed on the first sensing electrode ES1 on projection pattern 225 tops, becoming the first projected electrode ER1 with touch screen function.

Because support pattern part 226a has less compressive strain ratio and the subtle change on experience height during the packaging technology, supports pattern part 226a to become the support pattern 226 that array base palte 210 is set on the position of the relative substrate 720 certain separation distances of distance.

According to the present invention, the relative substrate of display panel is electrically connected with the array base palte with first and second signal wire and fetches detected touch point, and has the elements of a fix that touch function is determined the touch point.In this case, the technology sum of making display base plate can reduce technology by formation projection pattern and holding components in a technology.Projection pattern is electrically connected with first and second signal wire, and the elements of a fix of detected touch point.Holding components keeps the separation distance between array base palte and the relative substrate.

Therefore, make the technology sum of display base plate and can simplify, improved the convenience of making and reduced cost price.

Described embodiments of the invention and advantage thereof, can notice, under the situation of spirit of the present invention that does not break away from the claim definition and scope, the present invention can make multiple change, replacement and variation.

Claims

1. method of making display base plate, this display base plate has formation a plurality of pixel portion, on-off element and signal wire thereon, a plurality of pixel portion are determined by many grid lines and many data lines, on-off element is formed in each pixel portion, the signal wire detected touch point, this method comprises:

Be formed with thereon on the base substrate of on-off element and form organic material layer;

The composition organic material layer forms support pattern and the projection pattern that has different-diameter respectively;

Be formed with thereon on the base substrate of supporting pattern and projection pattern and form transparent electrode layer;

The composition transparent electrode layer forms projected electrode that covers projection pattern and the pixel electrode that is electrically connected with on-off element; And

Formed thereon by heat-press step to form on the base substrate of pixel electrode and had the support pattern and the projection pattern of differing heights to each other.

2. the display base plate of a display panel, this display panel has the coordinate that touch screen function comes detected touch point, and display base plate is electrically connected on the touch point with relative substrate, and this display base plate comprises:

By in upwardly extending many grid lines of first party and a plurality of pixel portion of determining at upwardly extending many data lines of second party;

Be formed on the on-off element in a plurality of pixel portion;

At upwardly extending first signal wire of first party;

At the upwardly extending secondary signal line of second party;

Be formed on the support pattern on the on-off element with first length;

Be respectively formed on first and second signal wire and have first and second projection pattern of second length littler than first length; And

First and second sensing electrode that is respectively formed on first and second projection pattern and is electrically connected with first and second signal wire respectively.