CN1962426A - Preparation device of nano-carbon tube - Google Patents
Preparation device of nano-carbon tube Download PDFInfo
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- CN1962426A CN1962426A CN 200510101210 CN200510101210A CN1962426A CN 1962426 A CN1962426 A CN 1962426A CN 200510101210 CN200510101210 CN 200510101210 CN 200510101210 A CN200510101210 A CN 200510101210A CN 1962426 A CN1962426 A CN 1962426A
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Abstract
The invention discloses a preparing device of carbon nanometer pipe, which comprises the following parts: reacting chamber, which contains outlet; extracting device, which connects reacting chamber to reduce pressure in the reacting chamber; gas cooling device, which is set between reacting chamber and extracting device to cool the gas from reacting chamber, wherein the gas cooling device cools gas from reacting chamber to reduce gas temperature from extracting device, which avoids the contact of extracting device and high-temperature gas to lengthen lifetime of extracting device.
Description
[technical field]
The present invention relates to a kind of carbon nanotube preparing apparatus.
[background technology]
Since Japanology personnel Iijima is born in 1991 earlier finds carbon nanotube first in the arc-over product, because of its at machinery, electronics, physics, aspects such as chemistry have excellent performance, metal or semi-conductor electroconductibility as uniqueness, high physical strength, high capacity hydrogen storage ability and adsorptive power, electronic emission performance, directed heat conductivility and stronger wideband electromagnetic wave-absorbing property etc., make carbon nanotube be subjected to physics, the very big attention of chemistry and field such as Materials science and new high-tech industry department promotes the broad research and the practical application of carbon nanotube simultaneously.At present, carbon nanotube can be used as the aspects such as strongthener, field electron emission materials, electrode material for super capacitor, gas adsorption material, catalytic material, heat conducting material and sensing material of matrix material.
The method for preparing carbon nanotube has arc discharge method (Arc Discharge), laser disappear molten method (Laser Ablation), chemical Vapor deposition process (Chemical Vapor Deposition, CVD) etc., wherein CVD method growth carbon nanotube has the advantage that equipment is simple, low-cost and can maximize.
Typical C VD carbon nano-tube device comprises that the boat and that carries that a high-temperature heater, a Quartz stove tube, are arranged in the Quartz stove tube is arranged at the substrate that carries in the boat.During the preparation carbon nanotube, at first deposition one catalyst layer on substrate heats Quartz stove tube then, feeds carbon-source gas, and carbon-source gas reacts on catalyst layer under the condition of high temperature, thereby grows carbon nanotube.For improving carbon nanometer tube growth speed, use low pressure chemical vapor deposition method carbon nano-tube again, this method is a carbon nano-tube under the low pressure situation, the device of its use is taken out low-voltage device for further comprising on above-mentioned typical C VD carbon nano-tube device basic, this air outlet of taking out low-voltage device and Quartz stove tube communicates, the air pressure when being used to control reaction in the Quartz stove tube.This kind installs elevated temperature heat under low pressure and decomposes the mode of the carbon source gas carbon pipe of growing up, and its range of reaction temperature is 500-1000 ℃, and this causes constantly having in the reaction process high temperature entrap bubble to flow to taking out low-voltage device, thereby has a strong impact on the work-ing life of taking out low-voltage device.
[summary of the invention]
In view of this, be necessary to provide a kind of carbon nanotube preparing apparatus that reduces effluent air temp.
A kind of carbon nanotube preparing apparatus, it comprises: a reaction chamber, it has an air outlet; One takes out low-voltage device, communicates with described reaction chamber air outlet, is used to reduce the air pressure in the reaction chamber; One gas quench system is located at described reaction chamber and described taking out between the low-voltage device, is used to cool off the reaction chamber expellant gas.
With respect to prior art, described carbon nanotube preparing apparatus is provided with a gas quench system at described reaction chamber and described taking out between the low-voltage device, be used to cool off the reaction chamber expellant gas, enter the temperature of taking out the gas in the low-voltage device thereby reduce, avoid taking out low-voltage device and contact, can prolong the work-ing life of taking out low-voltage device with high-temperature gas.
[description of drawings]
Fig. 1 is a first embodiment of the invention carbon nanotube preparing apparatus diagrammatic cross-section;
Fig. 2 is first kind of reaction chamber refrigerating unit schematic cross-section;
Fig. 3 is second kind of reaction chamber refrigerating unit schematic cross-section;
Fig. 4 is a second embodiment of the invention carbon nanotube preparing apparatus diagrammatic cross-section;
Fig. 5 is that the gas cooling pipe is located at pipe connecting inwall synoptic diagram.
[embodiment]
Below in conjunction with accompanying drawing the present invention is described in further detail.
See also Fig. 1, the carbon nanotube preparing apparatus 100 that the first embodiment of the present invention provides comprises that heating part 20, the gas quench system 50 and that boat 30, places the substrates 40, that carry in the boat 30 to be used for reacting by heating chamber 10 that carry that a reaction chamber 10, is arranged in the reaction chamber take out low-voltage device 60.
Described reaction chamber 10 is got final product by the sealable cavity that stable chemical performance, resistant to elevated temperatures material form, and material is preferably quartzy, and its two ends are respectively equipped with an inlet mouth 101 and an air outlet 102.Described substrate 40 can be porous silicon-base plate or silicon substrate, high temperature resistant and and subsequent step in catalyzer phenomenons such as chemical reaction or atom infiltration do not take place material all can, require its cleaning surfaces, do not destroy the subsequent reactions condition.Described heating part 20 is used for reaction chamber 10 heating, and preferably, it is outer to reach the uniform heating effect that heating part 20 closely is centered around reaction chamber 10, and described heating part 20 specifically can be a process furnace.
Described air outlet 102 of taking out low-voltage device 60 and reaction chamber 10 communicates, and is used to control the air pressure in the reaction chamber 10, so that reaction chamber 10 air pressure inside in the carbon nano tube growth process is lower than ambient pressure.In the present embodiment, described air outlet 102 of taking out low-voltage device 60 and reaction chamber 10 links to each other by a pipe connecting 70.The described low-voltage device 60 of taking out adopts off-gas pump.
Described gas quench system 50 is arranged at described reaction chamber 10 and described taking out between the low-voltage device 60, is used to cool off reaction chamber 10 expellant gas.Described gas quench system 50 can be the fin type refrigerating unit, also can be liquid-cooled-type cooling device, and preferably described gas quench system 50 is a liquid-cooled-type cooling device.In the present embodiment, described gas quench system 50 comprises a cooling room 501 that can supply pipe connecting 70 to wear, and accommodates the cooling work material in this cooling room 501.This cooling work material can adopt one or more mixing of water, methyl alcohol, ethanol, acetone, hexane, liquefied ammonia, liquid nitrogen.Because described cooling work material heat absorption can be vaporized, under the situation that guarantees safety, for the benefit of described gas quench system 50 long-time continuous are used, one air pressure valve 502 can be set on the shell wall of described cooling room 501, when cooling room 501 internal gas pressures reach certain value, 502 of air pressure valves can be opened, to reduce the air pressure in the cooling room 501.Preferably, described pipe connecting 70 snakelike being arranged in the described cooling room 501.When materials not volatile and that price is more cheap such as making water was done the cooling work material, described gas quench system 50 can use a tank.
The described reaction chamber 10 general silica tubes that use, when being used for as the silica tube of reaction chamber 10 when longer, its part of stretching out heating part 20 is longer, can be used as gas quench system 50 is set, with cooling reaction chamber 10 expellant gas, this moment, the described low-voltage device 60 of taking out can directly link to each other with the air outlet 102 of reaction chamber 10.
Described carbon nanotube preparing apparatus 100 also can further comprise a reaction chamber refrigerating unit 80, it is located in the described reaction chamber 10 or outside the reaction chamber 10, after being used for the reaction end in reaction chamber 10, accelerate the cooling of reaction chamber 10, with the temperature fall time of shortening reaction chamber 10, thus the efficient of increase carbon nanotube batch process.As shown in Figure 2, when described reaction chamber refrigerating unit 80 was located in the reaction chamber 10, described reaction chamber refrigerating unit 80 can comprise that one is arranged at the interior pipe 803 in the described reaction chamber 10, described in the present embodiment in pipe 803 parallel and coaxial with reaction chamber 10.The tube wall of pipe 803 tube wall and this reaction chamber 10 forms a tube chamber 801 in described, comprises the cooling work material in this tube chamber 801, carry this moment boat 30 and substrate 40 be located at described in the pipe 803.Described cooling work material can adopt one or more mixing of water, methyl alcohol, ethanol, acetone, hexane, liquefied ammonia, liquid nitrogen.As shown in Figure 3, described reaction chamber refrigerating unit 80 also can comprise at least one reaction chamber cooling tube 802, comprise the cooling work material in this reaction chamber cooling tube 802, described cooling work material can adopt one or more mixing of water, methyl alcohol, ethanol, acetone, hexane, liquefied ammonia, liquid nitrogen.Because density becomes big after the condensation of gas, in reaction chamber 10, cold air can be sunk, hot gas can rise, therefore the gas temperature of reaction chamber 10 inner tops is higher, for improving cooling efficiency, can make described reaction chamber cooling tube 802 paste the inwall of reaction chamber 10 or top and the bottom that outer wall is distributed in reaction chamber 10, and reaction chamber cooling tube 802 distribution densities at reaction chamber 10 tops are greater than reaction chamber cooling tube 802 distribution densities of these reaction chamber 10 bottoms.For reducing manufacturing cost, also described reaction chamber cooling tube 802 can be set around outside the described reaction chamber 10.
Described reaction chamber refrigerating unit 80 is different from described gas quench system 50 when using, described gas quench system 50 is open when reaction chamber 10 reactions, be used to cool off the high-temperature gas that reaction chamber 10 is discharged, cooled gas is discharged by taking out low-voltage device 60.Described reaction chamber refrigerating unit 80 is to finish the back in reaction to open, and to reduce reaction chamber 10 temperature inside as early as possible, takes out sample fast.
See also Fig. 4, the carbon nanotube preparing apparatus 100 ' that provides for the second embodiment of the present invention, carbon nanotube preparing apparatus 100 differences among the described carbon nanotube preparing apparatus 100 ' and first embodiment are gas quench system 50 ', this gas quench system 50 ' comprises that at least one is located at the gas cooling pipe 503 of pipe connecting 70 inwalls or outer wall, comprises the cooling work material in this gas cooling pipe 503.Preferably, described gas cooling pipe 503 is set around outside the pipe connecting 70.Described gas cooling pipe 503 also can be located at the inwall of pipe connecting 70 as shown in Figure 5.
With respect to prior art, described carbon nanotube preparing apparatus is provided with a gas quench system at described reaction chamber and described taking out between the low-voltage device, be used to cool off the reaction chamber expellant gas, enter the temperature of taking out the gas in the low-voltage device thereby reduce, avoid taking out low-voltage device and contact, can prolong the work-ing life of taking out low-voltage device with high-temperature gas.And carbon nanotube preparing apparatus cools off reacted reaction chamber fast by a reaction chamber refrigerating unit, can shorten the reaction chamber temperature fall time, thereby increases the efficient of carbon nanotube batch process.
Be understandable that, for the person of ordinary skill of the art, can make other various corresponding changes and distortion by technical conceive according to the present invention, and all these change the protection domain that all should belong to claim of the present invention with distortion.
Claims (12)
1. carbon nanotube preparing apparatus, it comprises: a reaction chamber, it has an air outlet; One takes out low-voltage device, communicates with described reaction chamber air outlet, is used to reduce the air pressure in the reaction chamber; It is characterized in that described reaction chamber and described taking out are provided with a gas quench system between the low-voltage device, be used to cool off the reaction chamber expellant gas.
2. carbon nanotube preparing apparatus as claimed in claim 1 is characterized in that described carbon nanotube preparing apparatus also comprises a pipe connecting, this air outlet, pipe connecting ligation chamber and take out low-voltage device.
3. carbon nanotube preparing apparatus as claimed in claim 2 is characterized in that, described gas quench system is a liquid-cooled-type cooling device.
4. carbon nanotube preparing apparatus as claimed in claim 3 is characterized in that, described gas quench system comprises a cooling room that can supply described pipe connecting to wear, and comprises the cooling work material in this cooling room.
5. carbon nanotube preparing apparatus as claimed in claim 4 is characterized in that, described pipe connecting is snakelike to be arranged in the described cooling room.
6. carbon nanotube preparing apparatus as claimed in claim 3 is characterized in that, described gas quench system comprises that at least one is located at the gas cooling pipe of described pipe connecting inwall or outer wall, comprises the cooling work material in this gas cooling pipe.
7. carbon nanotube preparing apparatus as claimed in claim 6 is characterized in that, described gas cooling pipe is set around outside the pipe connecting.
8. as each described carbon nanotube preparing apparatus of claim 1 to 7, it is characterized in that described carbon nanotube preparing apparatus also comprises to be located in the described reaction chamber or the outer reaction chamber refrigerating unit of reaction chamber.
9. carbon nanotube preparing apparatus as claimed in claim 8, it is characterized in that, described reaction chamber refrigerating unit comprises that one is arranged at the interior pipe in the described reaction chamber, and inwall of the outer wall of pipe and this reaction chamber forms a tube chamber in this, comprises the cooling work material in this tube chamber.
10. carbon nanotube preparing apparatus as claimed in claim 8 is characterized in that, described reaction chamber refrigerating unit comprises a plurality of reaction chamber cooling tubes, comprises the cooling work material in this reaction chamber cooling tube.
11. carbon nanotube preparing apparatus as claimed in claim 10 is characterized in that, described reaction chamber cooling tube is set around outside the described reaction chamber.
12. carbon nanotube preparing apparatus as claimed in claim 10, it is characterized in that, described reaction chamber cooling tube is distributed in top and the bottom in the reaction chamber, and the reaction chamber cooling tube distribution density of reaction chamber inner top is greater than the reaction chamber cooling tube distribution density of this reaction chamber inner bottom part.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200510101210 CN1962426A (en) | 2005-11-10 | 2005-11-10 | Preparation device of nano-carbon tube |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200510101210 CN1962426A (en) | 2005-11-10 | 2005-11-10 | Preparation device of nano-carbon tube |
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| CN1962426A true CN1962426A (en) | 2007-05-16 |
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| CN 200510101210 Pending CN1962426A (en) | 2005-11-10 | 2005-11-10 | Preparation device of nano-carbon tube |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019183766A1 (en) * | 2018-03-26 | 2019-10-03 | 苏州捷迪纳米科技有限公司 | Carbon nanotube preparation system |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019183766A1 (en) * | 2018-03-26 | 2019-10-03 | 苏州捷迪纳米科技有限公司 | Carbon nanotube preparation system |
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Open date: 20070516 |