CN1956829A - Production method of curved-surface mold and production method of optical element using this metal mold - Google Patents
Production method of curved-surface mold and production method of optical element using this metal mold Download PDFInfo
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- CN1956829A CN1956829A CNA2005800095320A CN200580009532A CN1956829A CN 1956829 A CN1956829 A CN 1956829A CN A2005800095320 A CNA2005800095320 A CN A2005800095320A CN 200580009532 A CN200580009532 A CN 200580009532A CN 1956829 A CN1956829 A CN 1956829A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
- B22D17/00—Pressure die casting or injection die casting, i.e. casting in which the metal is forced into a mould under high pressure
- B22D17/20—Accessories: Details
- B22D17/22—Dies; Die plates; Die supports; Cooling equipment for dies; Accessories for loosening and ejecting castings from dies
- B22D17/2245—Dies; Die plates; Die supports; Cooling equipment for dies; Accessories for loosening and ejecting castings from dies having walls provided with means for marking or patterning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22C—FOUNDRY MOULDING
- B22C9/00—Moulds or cores; Moulding processes
- B22C9/06—Permanent moulds for shaped castings
- B22C9/061—Materials which make up the mould
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/17—Component parts, details or accessories; Auxiliary operations
- B29C45/26—Moulds
- B29C45/263—Moulds with mould wall parts provided with fine grooves or impressions, e.g. for record discs
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
- B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
- B29C33/3857—Manufacturing moulds, e.g. shaping the mould surface by machining by making impressions of one or more parts of models, e.g. shaped articles and including possible subsequent assembly of the parts
- B29C33/3878—Manufacturing moulds, e.g. shaping the mould surface by machining by making impressions of one or more parts of models, e.g. shaped articles and including possible subsequent assembly of the parts used as masters for making successive impressions
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2011/00—Optical elements, e.g. lenses, prisms
- B29L2011/0016—Lenses
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The invention provides a method of easily manufacturing a metal mold able to add an antireflection structure to a lens or the like having a complicated surface shape such as an aspherical lens. The method comprises the steps of forming a silicon dioxide film (SiO2) film ( 2 ) on a curved-surface base substrate ( 1 ) formed in a specified shape, etching the silicon dioxide film (SiO2) film ( 2 ) using a resist mask ( 3 ) to form a specified shaped antireflection structure pattern, bonding a metal used for the metal mold ( 4 ) onto a silicon dioxide film (SiO2) film ( 21 ) on which this antireflection film pattern is formed to transfer the antireflection film pattern onto the metal used for the metal mold ( 4 ), and then re-moving the silicon dioxide film (SiO2) film to form a metal mold ( 4 a) having an antireflection structure on the curved surface.
Description
Technical field
The present invention relates to have the manufacture method of the curve mold that reflects micro concavo-convex structures such as preventing to construct, relate in particular to and use Machining of Curved Surface to be easy to the method that the member manufacturing has the curve mold of micro concavo-convex structure, and use this mould to make the method for optical element.
Background technology
In the past, in optical elements such as the optical pickup apparatus that has used translucent materials such as glass, plastics, non-spherical lens, on the light entrance face of substrate, implemented to be used to prevent the surface treatment of reflecting.As this surface treatment, have following method: by vacuum evaporation etc. with the overlapping method that the multilayer film of thin film dielectric film is arranged in light transmission basic surface film forming; Or fine and fine and close concavo-convex method is set at optical element surface.
The reflection that the concaveconvex shape by fine and fine and close on the optical element surface constitutes prevents structure, and known have the mould of use to form (for example, with reference to patent documentation 1) by plastic forming method.
Be used to be shaped and have the mould that the reflection that is made of fine and fine and close concaveconvex shape prevents the optical element of constructing, quartz or silicon are used as base material, the reflection that forms regulation by etching and processing on this base material prevents structure, and this base material is implemented coating and made.
Yet, as the lens of optical pickup apparatus etc., prevent structure on the structure of the curvature that has regulation as lens, the Machining of Curved Surface that need implement regulation to the quartz that becomes base material or silicon for above-mentioned reflection is set.
Patent documentation 1: the spy opens clear 62-96902 communique
Have at non-spherical lens etc. under the situation of lens etc. of complex surfaces shape, be difficult to process the base material that is used to form mould.That is, use as base material under the situation of quartz or silicon etc., the processing of these base materials is difficult, during formation fecund give birth to break, damaged etc., in the process of mfg. moulding die, produced the high problem of time and expense.
Summary of the invention
The present invention realizes in order to solve above-mentioned existing problem, and purpose is to provide a kind of can easily the manufacturing can have the method for the mould of concaveconvex shape additional fine and fine and close on the lens etc. of complex surfaces shape at non-spherical lens etc.
In addition, the object of the present invention is to provide and a kind ofly can easily make the method that non-spherical lens that the surface is provided with fine and fine and close concaveconvex shape etc. has the optical elements such as lens of complex surfaces shape.
Manufacture method with curve mold of micro concavo-convex structure of the present invention is characterised in that, forming formation silicon mesentery on the curved surface mother metal of regulation shape, on this silicon mesentery, use mask to implement etching and form the pattern of the fine sag and swell of regulation shape, lining mould metal on the silicon mesentery of the pattern that is formed with this fine sag and swell, remove silicon mesentery behind the pattern of sag and swell of replicated fine at this mould on metal, on curved surface, form mould with micro concavo-convex structure.
Its feature also is, the pattern of described fine sag and swell is that reflection prevents pattern.
Also can be: described mask is made of photoresist, is forming antireflection film on the described curved surface mother metal and between the silicon mesentery.
Demoulding material film can formed on the described curved surface mother metal and between the silicon mesentery.
In addition, described silicon mesentery can be made of the silicon dioxide film that forms by sputtering method.
In addition, manufacture method with mould of micro concavo-convex structure of the present invention, it is characterized in that, forming formation silicon mesentery on the curved surface mother metal of regulation shape, on this silicon mesentery, the effective coverage part has the fine concavo-convex pattern that constitutes by the regulation shape, be provided with more to the volume ratio of its outer concave convex pattern mask of significant change more, use this mask to implement etching, on described silicon mesentery, form from periphery towards interior week the fine concavo-convex degree of depth deepen and in the effective coverage, be formed with the degree of depth of regulation gradually, the concavo-convex fine pattern of shape, be formed with lining mould metal on the substrate of this relief pattern, this mould with metal on after the transfer printing relief pattern, separate described substrate and mould and form mould with metal.
In addition, the method for making method of optical element of the present invention, it is characterized in that, forming formation silicon mesentery on the curved surface mother metal of regulation shape, use mask to implement etching and on this silicon mesentery, form the pattern of the fine sag and swell of regulation shape, lining mould metal on the silicon mesentery of the pattern that is formed with this fine sag and swell, remove silicon mesentery behind the pattern of sag and swell of replicated fine at this mould on metal, on curved surface, form mould with micro concavo-convex structure, this mould is installed in cover half, on at least one side of dynamic model, by having used the injection moulding of described fixed half and moving half, be manufactured on the optical element that has the micro concavo-convex structure at least one side's the face.
As mentioned above, according to the present invention, can easily form even have the curved surface mother metal of curve form of the regulation of complicated shape such as sphere, axis target sphere, and, based on the curved surface of this curved surface mother metal, can form even have complexity such as sphere, axis target sphere shape regulation curved surface and have the curve mold of the concaveconvex shape structure of fine densification.
In addition, by antireflection film is set, the pattern that can carry out resist more densely forms, and has reflection that the concaveconvex shape by finer densification constitutes and prevents the curve mold of constructing so can form.
By using demoulding material film, can easily carry out separating of mould one side and mother metal one side.
In addition, have from periphery towards interior week by use, reflection prevents that the degree of depth of function from deepening gradually, be formed with cone shape concavo-convex reflection in the effective coverage with the spacing of regulation and prevent the curve mold of constructing, during potting resin, peel off from outer circumferential side easily, mould (pressing mold) or moulding product can be not damaged.
Description of drawings
Fig. 1 be by process sequence represent first embodiment of the present invention related have a cutaway view that reflection prevents the manufacturing of the curve mold of constructing;
Fig. 2 be by process sequence represent second embodiment of the present invention related have a cutaway view that reflection prevents the manufacturing of the curve mold of constructing;
Fig. 3 be by process sequence represent the 3rd embodiment of the present invention related have a cutaway view that reflection prevents the manufacturing of the curve mold of constructing;
Fig. 4 be by process sequence represent the 4th embodiment of the present invention related have a cutaway view that reflection prevents the manufacturing of the curve mold of constructing;
Fig. 5 is the vertical view of exposure process that expression is used for preventing towards the reflection of deepening optical element interior week gradually from the periphery of optical element the degree of depth of function;
The figure of each the regional mould of Fig. 6 optical element that to be expression make by the present invention and the relation of the adhesive force between the moulding product;
Fig. 7 is the shape of the employed finishing die of manufacture method of expression optical element of the present invention and the side sectional view of structure.
Among the figure, the 1-curved surface member; 2-silicon dioxide film (SiO
2) film; The 3-etchant resist; The 4-metal level; 4a, 4b-mould (pressing mold).
The specific embodiment
Below, with reference to accompanying drawing embodiments of the present invention are described.Fig. 1 be by process sequence represent first embodiment of the present invention related have a cutaway view that prevents the manufacturing of the curve mold of constructing by fine and close and the fine concavo-convex reflection that constitutes.
Shown in Fig. 1 (a), prepare to have spheres such as optical pickup apparatus object lens, collimation lens, the curved surface mother metal 1 of the curve form of regulation such as axis target (object) aspheric surface.Resin base material or glass baseplate that this curved surface mother metal 1 uses Machining of Curved Surface to be easy to metal base or to be shaped by this metal die.In this embodiment, for good aluminium alloy of machinability or carbon-free copper etc., utilize the miniature processing machine of ultraprecise that makes the diamond tool rotation and mirror finish becomes the curved surface of regulations such as sphere, axis target aspheric surface and forms.
Then, shown in Fig. 1 (b), be formed with at curved surface mother metal 1 on the surface of curved surface of regulation, form the silicon dioxide film (SiO of about 500nm～1 μ m by sputtering method as the silicon mesentery
2) film 2.In this embodiment, by having used SiO
2The RF magnetron sputtering of target has formed the silicon dioxide film (SiO of thickness 900nm
2) film 2.The membrance casting condition of this moment is to use SiO
2Target, substrate temperature are 200 ℃, and argon (Ar) throughput is 20sccm, and pressure is 1.36Pa.
Then, shown in Fig. 1 (c), at silicon dioxide film (SiO
2) apply resist on the film 2.In the coating of this resist, for example use the trade name " TDUR-P009 " of Tokyo Applied Chemistry Industrial Co., Ltd.'s system as resist, under rotating speed 4000rpm, carry out spin-applied, formed the etchant resist 3 of thickness 600nm.
Then, shown in Fig. 1 (d), for the coating etchant resist 3 expose, developing forms corrosion-resisting pattern 30.In this embodiment, as exposure device, (wavelength X=266nm), carry out first time and expose under exposure energy 750mJ is revolved substrate then and is turn 90 degrees, and has carried out multiple-exposure under exposure energy 750mJ to use the two-beam interference exposure device.Then, develop, formed the corrosion-resisting pattern (resist pattern) 30 that is formed with a plurality of cone shape projectioies with the 250nm spacing by the trade name " NMD-W " of Tokyo Applied Chemistry Industrial Co., Ltd.'s system.
Then, shown in Fig. 1 (e), above-mentioned corrosion-resisting pattern 30 as mask, is formed silicon dioxide film (SiO by reactive ion etching (RIE) pattern
2) film 2.In this embodiment, as the RIE Etaching device, used the trade name " NLD-800 " of ア Le バ Star Network (ULVAC) Co., Ltd. system.As etching gas, use C
4F
8And CH
2F
2Gaseous mixture, antenna power uses 1500W, grid bias power supply uses 400W, silicon dioxide film (SiO
2) rate of etch be made as 12nm/sec, formed the cone shape groove 21 of working depth 500nm thus.
Afterwards, shown in Fig. 1 (f),, form the concavo-convex silicon dioxide film (SiO that has the curved surface of regulation and be provided with cone shape fine densification by the surface if remove the etchant resist that is formed with corrosion-resisting pattern 30 by oxygen plasma ashing (ashing)
2) reflection that constitutes prevents to construct 2a.
Then, shown in Fig. 1 (g), by silicon dioxide film (SiO
2) reflection that constitutes prevents to construct the metal level 4 that 2a goes up becomes mould (pressing mold).For metal level 4,,, and grind the metal level 4 that the back side becomes the mould (pressing mold) of specific thickness in the above by plating formation nickel dam at first by after sputter formation nickel (Ni) kind brilliant (seed) layer.
At last, shown in Fig. 1 (h), by from silicon dioxide film (SiO
2) and the border of metal level 4 mechanically peel off mould (pressing mold) 4a, can obtain related curve mold 4a in this embodiment, described curve mold 4a has: being formed with 250nm is that the concavo-convex reflection of cone shape fine densification of spacing (pitch) prevents structure.
In the above-described embodiment, can easily form even have the curved surface mother metal 1 of the regulation curve form of complicated shape such as sphere, axis target (object) aspheric surface by the miniature processing machine of ultraprecise.And, curved surface based on this curved surface mother metal 1, operation through above-mentioned (b)～(h), can form even have the regulation curve form of complicated shapes such as sphere, axis target aspheric surface thus, and can form and have reflection that the concaveconvex shape by fine densification constitutes and prevent the curve mold 4a that constructs.
Then, with reference to Fig. 2 second embodiment of the present invention is described.Fig. 2 is the cutaway view that reflection prevents the manufacturing of the curve mold of constructing that has of representing second embodiment of the present invention by process sequence.Have, the part mark prosign identical with first embodiment for fear of repetition, omits its detailed explanation again.
Shown in Fig. 2 (a), with first embodiment similarly, prepare to have optical pickup apparatus with spheres such as object lens, collimation lens, the curved surface mother metal 1 of the curve form of regulation such as axis target aspheric surface.
Then, shown in Fig. 2 (b), be formed with at curved surface mother metal 1 on the surface of curved surface of regulation, antireflection member 11 is set.In this second embodiment,,, form chromium oxide (CrO) film of 100nm then in the above by chromium (Cr) film of sputtering method formation 100nm as antireflection member 11.As antireflection member 11, except that above-mentioned, also can use Al
2O
3, CeO
2, LaF
3, MgF
3, TiO
2, TiN, ZnS, ZrO
2Deng material.
Afterwards, shown in Fig. 2 (c), on the antireflection member 11 that is formed at curved surface mother metal 1, by the silicon dioxide film (SiO about sputtering method formation 500nm～1 μ m
2) film 2.In this embodiment, formed the silicon dioxide film (SiO of thickness 900nm
2) film 2.This silicon dioxide film (SiO
2) film 2 is to form under the condition identical with first embodiment.
Then, shown in Fig. 2 (d), at silicon dioxide film (SiO
2) form the etchant resist 3 of thickness 600nm on the film 2.This etchant resist 3 has also used the material identical with first embodiment.
Then, shown in Fig. 2 (e), for the etchant resist 3 of coating, with first embodiment similarly, expose, develop and formed the corrosion-resisting pattern 30 that is formed with a plurality of cone shape projectioies with the 250nm spacing.
Then, shown in Fig. 2 (f), with above-mentioned corrosion-resisting pattern 30 as mask, with first embodiment similarly, pattern forms silicon dioxide film (SiO by reactive ion etching (RIE)
2) film 2.Form the cone shape groove 21 of working depth 500nm by this pattern.This pattern form also be with the same condition of first embodiment under carry out.
Afterwards, shown in Fig. 2 (g), if remove resist 30 by the oxygen plasma ashing, then formation has the curved surface of regulation and is provided with cone shape fine and fine and close concavo-convex silicon dioxide film (SiO by the surface
2) reflection that constitutes prevents to construct 2a.
Then, shown in Fig. 2 (h), by silicon dioxide film (SiO
2) reflection that constitutes prevents to construct the metal level 4 that 2a goes up becomes mould (pressing mold).
At last, shown in Fig. 2 (i), by from silicon dioxide film (SiO
2) and the border of metal level 4 mechanically peel off mould (pressing mold) 4a, can obtain the related curve mold 4a of this embodiment, described curve mold 4a have with the 250nm spacing formed cone shape concavo-convex reflection prevent the structure.
In the above-described 2nd embodiment, on the basis of the effect of first embodiment, the pattern that can carry out resist by antireflection member 11 more densely forms, and has the reflection that is made of finer and fine and close concaveconvex shape and prevents the curve mold 4a that constructs so can form.
Then, with reference to Fig. 3 the 3rd embodiment of the present invention is described.Fig. 3 is the cutaway view that reflection prevents the manufacturing of the curve mold of constructing that has of representing the 3rd embodiment of the present invention by process sequence.Have, the part mark prosign identical with first, second embodiment for fear of repetition, omits its detailed explanation again.
Shown in Fig. 3 (a), with first embodiment similarly, prepare to have optical pickup apparatus with spheres such as object lens, collimation lens, the curved surface mother metal 1 of the curve form of regulation such as axis target aspheric surface.
Then, shown in Fig. 3 (b), be formed with at curved surface mother metal 1 on the surface of curved surface of regulation, be provided with and have the release materials 12 that reflection prevents function.In the 3rd embodiment,, used coating to have to prevent the resist of function with ultraviolet corresponding reflection and cured firmly the material of (hard bake) as release materials 12.In this embodiment,, use the trade name " SWK-248DTr " of Tokyo Applied Chemistry Industrial Co., Ltd.'s system, under 180 ℃, carried out curing firmly as resist.
Afterwards, shown in Fig. 3 (c), on the release materials 12 that is formed at curved surface mother metal 1, by the silicon dioxide film (SiO about sputtering method formation 500nm～1 μ m
2) film 2.In this embodiment, formed the silicon dioxide film (SiO of thickness 900nm
2) film 2.This silicon dioxide film (SiO
2) film 2 is to form under the condition identical with first embodiment.
Then, shown in Fig. 3 (d), at silicon dioxide film (SiO
2) form the etchant resist 3 of thickness 600nm on the film 2.This etchant resist 3 has also used the material identical with first embodiment.
Then, shown in Fig. 3 (e), for the etchant resist 3 of coating, with first embodiment similarly, expose, develop and formed the corrosion-resisting pattern 30 that is formed with a plurality of cone shape projectioies with the 250nm spacing.
Then, shown in Fig. 3 (f), with above-mentioned corrosion-resisting pattern 30 as mask, with first embodiment similarly, form silicon dioxide film (SiO by reactive ion etching (RIE) pattern
2) film 2.Be formed with the cone shape groove 21 of working depth 500nm by this pattern.This pattern form also be with the same condition of first embodiment under carry out.
Afterwards, shown in Fig. 3 (g),, then form the concavo-convex silicon dioxide film (SiO that has the curved surface of regulation and be provided with cone shape fine densification by the surface if remove resist 30 by oxygen plasma ashing (plasma ashing)
2) reflection that constitutes prevents to construct 2a.
Then, shown in Fig. 3 (h), by silicon dioxide film (SiO
2) reflection that constitutes prevents to construct the metal level 4 that 2a goes up becomes mould (pressing mold).
Afterwards, shown in Fig. 3 (i), from release materials 12 and silicon dioxide film (SiO
2) the border mechanically with silicon dioxide film (SiO
2) and mould (pressing mold) 4a peel off integratedly.
Then, shown in Fig. 3 (j), remove the resist that the demoulding material that is attached to mould (pressing mold) side is used by oxygen plasma, (RIE) only removes silicon dioxide film (SiO by reactive ion etching
2) 2a.The etching gas of this moment has used CHF
3So, can obtain the related curve mold 4a of this embodiment, described curve mold 4a have with the 250nm spacing be formed with cone shape concavo-convex reflection prevent the structure.
In the above-described 3rd embodiment, can easily carry out separating of mould (pressing mold) side and mother metal 1 one sides.
Yet, above-mentioned be formed with mould that the reflection that is made of micro concavo-convex prevents function and carry out resin and fill by using, and when forming optical element, resin is filled in the fine pattern in the high visual field (aspect).Load when therefore, peeling off resin and mould increases.Particularly enlarge markedly, so pressing mold or moulding product might be damaged at the border of patternless zone and area of the pattern adhesive force.Load when therefore, the 4th embodiment is used to reduce to peel off.Therefore, by from the periphery of optical element towards interior week, the reflection of deepening optical element gradually prevents the concavo-convex degree of depth of function, and increases the load when peeling off gradually, peels off from outer circumferential side easily during potting resin thus.Below, based on Fig. 4 and Fig. 5 the 4th embodiment is described.
Fig. 4 is the cutaway view that reflection prevents the manufacturing of the curve mold of constructing that has of representing the 4th embodiment of the present invention by process sequence, and Fig. 5 is the vertical view of exposure process that expression is used for preventing towards the reflection of deepening optical element interior week gradually from the periphery of optical element the concavo-convex degree of depth of function.Have, the part mark prosign identical with first, second, third embodiment for fear of repetition, omits its detailed explanation again.
Shown in Fig. 4 (a), prepare to have the curved surface mother metal 1 of optical pickup apparatus with the curve form of regulations such as sphere, axis target aspheric surfaces such as object lens, collimation lens.
Then, shown in Fig. 4 (b), on the surface of the curved surface that is formed with regulation of curved surface mother metal 1,, formed the silicon dioxide film (SiO of thickness 900nm by the RF magnetron sputtering
2) film 2.This silicon dioxide film (SiO
2) film 2 is to form under the condition identical with first embodiment.
Then, shown in Fig. 4 (c), at silicon dioxide film (SiO
2) apply resist on the film 2.In the coating of this resist, for example use the electron beam negative resist of the trade name " NEB22 " of Sumitomo Chemical Company Ltd's system as resist, under rotating speed 3000rpm, carry out spin-applied, formed the etchant resist 3a of thickness 600nm.
Then, as Fig. 4 (d), shown in Figure 5, use the EB scanning means that the etchant resist 3a of coating is shone.Shine high more to the periphery irradiation energy more.For example, shown in Figure 5, to shine and scan in 100 μ m angles, at effective coverage 30a with 10 μ C/cm
2Energy exposure, be in its outside regional 30bl with 12 μ C/cm
2Energy exposure, at the regional 30b2 in the outside that is in regional 30bl with 14 μ C/cm
2Energy exposure, be in outermost regional 30b3 with 16 μ C/cm
2Energy exposure.Then, after the EB scanning, undertaken curing (PEB) after the exposure in two minutes, undertaken developing in two minutes by the developer solution model " MFCD-26 " of シ Block レ イ Off ア one イ one ス ト Co., Ltd. system then by 110 ℃ heating plates.Its result, 30a part in effective coverage has formed a plurality of cone shape projectioies with the 250nm spacing, has formed the corrosion-resisting pattern 31 of the thick more regional 30b of past more its outside projection.This corrosion-resisting pattern 31 becomes more from the effective coverage laterally the volume ratio of the relief pattern mask of marked change more.
Then, shown in Fig. 4 (e), as mask, pattern forms silicon dioxide film (SiO by reactive ion etching (RIE) with above-mentioned corrosion-resisting pattern 31
2) film 2.In this embodiment,, use the trade name " NLD-800 " of ア Le バ Star Network (ULVAC) Co., Ltd. system,, use C as etching gas as the RIE Etaching device
4F
8And CH
2F
2Gaseous mixture, antenna power uses 1500W, grid bias power supply uses 400W, silicon dioxide film (SiO
2) rate of etch be made as 12nm/sec, be etched into thus, form the groove 21 of working depth 500nm in the effective coverage.Its result is positioned at the zone in the outside of effective coverage 30a, has formed from periphery towards interior week, and reflection prevents the pattern that the degree of depth of the groove of function is deepened gradually.
Afterwards, shown in Fig. 4 (f), if remove resist 30 by the oxygen plasma ashing, then have regulation curved surface, be positioned at the zone in the outside of effective coverage 30a, from periphery towards interior week, reflection prevents that the degree of depth of function from deepening gradually, forms silicon dioxide film (SiO by the concaveconvex shape of the fine densification of regulation at effective coverage 30a
2) reflection that constitutes prevents to construct 2b.
Then, shown in Fig. 4 (g), by silicon dioxide film (SiO
2) reflection that constitutes prevents to construct the metal level 4 that 2b goes up becomes mould (pressing mold).For metal level 4, at first, form nickel dam by electroplating in the above, and become the metal level 4 of the mould (pressing mold) of specific thickness by the grinding back side by after sputter formation nickel (Ni) the kind crystal layer.
At last, shown in Fig. 4 (h), by from silicon dioxide film (SiO
2) and the border of metal level 4 mechanically peel off mould (pressing mold) 4a, zone in the outside that is positioned at effective coverage 30a of this embodiment, from periphery towards interior week, the degree of depth that reflects the groove that prevents function is deepened gradually, can obtain curve mold 4b at effective coverage 30a, its have with the 250nm spacing formed coniform concavo-convex reflection prevent the structure.
So; be positioned at the zone in the outside of effective coverage 30a; from periphery towards interior week; reflection prevents that the degree of depth of function from deepening gradually; prevent the curve mold 4b that constructs by use the spacing have with regulation to be formed with cone shape concavo-convex reflection at effective coverage 30a; when potting resin, peel off from outer circumferential side easily, pressing mold or moulding product can be not damaged.
Use the reflection that is formed with all identical degree of depth shown in Figure 1 to prevent that the mould of constructing from making the moulding product.In addition, use mould shown in Figure 4 to make the moulding product.During to the mould of this use Fig. 1 and the adhesive force when using the mould of Fig. 4 compare.Its result as shown in Figure 6, according to the present invention, reduces from the adhesive force of outer peripheral portion in the regional 11b of periphery.Its result according to the 4th embodiment of the present invention, when potting resin, is peeled off from outer circumferential side easily, and pressing mold or moulding product can be not damaged.
The structure of the 4th embodiment is applicable to that above-mentioned second, third embodiment also can obtain same effect.
In addition, in the above-described embodiment, be that mould has used silicon dioxide film (SiO as silicon
2) mould, but also can use silicon (Si) film, silicon nitride (SiN) film etc.In addition, also can will use organosilan (silane) to wait the sog film that forms by spin coating to be used as the silicon mesentery.
Then, with reference to Fig. 7 the situation of using above-mentioned mould of the present invention to make optical element is described.Fig. 7 is the shape of the employed finishing die of manufacture method of expression optical element of the present invention and the side sectional view of structure.This finishing die has cover half 60 and dynamic model 70.Cover half 60 and dynamic model 70 are cooperated, between two moulds 60,70, form cavity 80, on the part around this, form the gateway 81 that is connected with cavity 80.Supply with molten plastic resin via gateway 81 to this cavity 80, thus at inner potting resin.
Cover half 60 is made of first member 61 of central portion and second member 62 of periphery, and two members 61,62 are formed by steel, and interfixing is one.On first member 61, be formed with the forming surface 61a of the smooth concave surface relative with dynamic model 70, on second member 62, be formed be disposed at forming surface 61a around the forming surface 61b of annular ditch groove.The forming surface 61a of first member 61 is corresponding to the lens face as a side of the lens (not shown) of moulding product, the forming surface 62a of second member 62 corresponding to be located at lens around flange.
Dynamic model 70 is by constituting as the lug boss 71 of the die component of center side with from the main part 72 that supports this lug boss 71 on every side.Front end at lug boss 71 is equipped with mould (pressing mold) 4a that makes by any one method of above-mentioned first～the 4th embodiment of the present invention.Mould 4a forms the concave surface corresponding to the opposing party's of lens lens face, is formed with the reflection that is made of fine and fine and close male and fomale(M﹠F) and prevents to construct 40a on this concave surface.By main part 72 form around forming surface 72a corresponding to around flange.
Lug boss 71 can be installed along axle (X) direction slidably with the state that is embedded among the hole 72b that is located on the main part 72.After making the die sinking of two moulds, 60,70 separation, this lug boss 71 is moved to cover half 60 1 sides with respect to main part 72, separating residual is in the lens of dynamic model 70 1 sides thus.
Then, the shaping to the lens that used finishing die shown in Figure 7 describes simply.At first, carry out mold closing by dynamic model 70 being engaged in cover half 60.At this moment, cover half 60 and dynamic model 70 utilize detent mechanisms such as omitting illustrated chimeric pin to be fixed in the state that the mutual alignment is aimed at.By this mold closing, the cavity 80 of the shape of forming face 61a, the 61b that between two moulds 60,70, forms cover half 60 closed and forming face 40a, the 72a of dynamic model 70.
Then, in the cavity 80 that is formed between two moulds 60,70, inject molten plastic resin.Molten plastic resin is imported in the cavity 80 between two moulds 60,70 via gateway 81, and cavity 80 is melted plastic resin and fills.
Then, the molten plastic resin that is filled in the cavity 80 is carried out the heat release cooling.The temperature that is expelled to the molten plastic resin in the cavity 80 is generally 200～300 ℃, if contact with forming face 40a, the 72a, 61a, the 61b that remain 100～180 ℃ two moulds 60,70 usually, then molten plastic resin is cooled and solidifies.At this moment, molten plastic resin enters in the micro concavo-convex pattern of the forming face 40a that is formed at lug boss 71 substantially fully.
Then, the molten plastic resin that is filled in by the time in the cavity 80 hardens fully.Thus, can obtain lens corresponding to the shape of cavity 80.One side's of these lens face forms smooth convex surface corresponding to forming face 61a, and the opposing party's of lens face forms corresponding to forming face 40a and to have reflection and prevent the convex surface of constructing.In addition, around lens, be formed with flange corresponding to forming face 61b, 72a.
Afterwards, the die sinking that dynamic model 70 is separated from cover half 60.Its result, formed products becomes the state that residues in dynamic model 70 and separate from cover half 60.
Then, use not shown drive unit, with lug boss 71 from the state-driven that is accommodated in main part 72 to cover half 60 1 sides.Thus, lens are promptly separated from dynamic model 71 demoulding fully.
The lens of Huo Deing can be applicable to optical Pickup device etc. like this.Have again, in the above-described embodiment, mould with micro concavo-convex pattern is installed on dynamic model 70, but also can be installed in cover half 60 1 sides, or be installed on dynamic model 70 and cover half 60 both sides, as long as according to the design of the optical element of making, suitably mould of the present invention is used for dynamic model 70 and cover half 60 gets final product.
Have, in the above-described embodiment, as the example of the concaveconvex shape of fine densification, exemplified reflection and prevented structure, but so long as fine and fine and close concaveconvex shape, the present invention is also applicable to the situation of the structure of the optical element pattern of making other function.For example, also applicable to the situation of making fine pattern that constitutes polarizer or the fine pattern that constitutes diffraction grating etc.
Current disclosed embodiment should think just in all respects illustration and and unrestricted.Scope of the present invention is not only represented by the explanation of above-mentioned embodiment, also represents by the scope of patent request, means to comprise and the meaning of the scope equalization of patent request and all changes in the scope.
The present invention applicable to make light picker with diffraction grating, light picker with polarizer, light picker with lens, mobile phone with the method that shows lid etc., also can be used in and reflection is set on the surface of these members prevents the situation of constructing.
Claims (7)
1. the manufacture method with curve mold of micro concavo-convex structure is characterized in that,
Forming formation silicon mesentery on the curved surface mother metal of regulation shape, on this silicon mesentery, use mask to implement etching and form the pattern of the micro concavo-convex structure of regulation shape, lining mould metal on the silicon mesentery of the pattern that is formed with this fine sag and swell, remove silicon mesentery behind the pattern of sag and swell of replicated fine at this mould on metal, on curved surface, form mould with micro concavo-convex structure.
2. the manufacture method with curve mold of micro concavo-convex structure according to claim 1 is characterized in that,
The pattern of described fine sag and swell is that reflection prevents pattern.
3. the manufacture method with curve mold of micro concavo-convex structure according to claim 1 and 2 is characterized in that,
Described mask is made of photoresist, is forming antireflection film on the described curved surface mother metal and between the silicon mesentery.
4. the manufacture method with curve mold of micro concavo-convex structure according to claim 1 and 2 is characterized in that,
Forming demoulding material film on the described curved surface mother metal and between the silicon mesentery.
5. according to each described manufacture method in the claim 1～4, it is characterized in that with curve mold of micro concavo-convex structure,
Described silicon mesentery is the silicon dioxide film that forms by sputtering method.
6. the manufacture method with mould of micro concavo-convex structure is characterized in that,
Forming formation silicon mesentery on the curved surface mother metal of regulation shape, on this silicon mesentery, the effective coverage part has the pattern that the micro concavo-convex by the regulation shape constitutes, the mask that volume ratio to its outer concave convex pattern changes more is set more, use this mask to implement etching, on described silicon mesentery, form from periphery towards interior week the fine concavo-convex degree of depth deepen and in the effective coverage, be formed with the degree of depth of regulation gradually, the concavo-convex fine pattern of shape, be formed with lining mould metal on the substrate of this relief pattern, this mould with metal on after the transfer printing relief pattern, separate described substrate and mould and form mould with metal.
7. the manufacture method of an optical element is characterized in that,
Forming formation silicon mesentery on the curved surface mother metal of regulation shape, on this silicon mesentery, use mask to implement etching and form the pattern of the fine sag and swell of regulation shape, lining mould metal on the silicon mesentery of the pattern that is formed with this fine sag and swell, remove silicon mesentery behind the pattern of sag and swell of replicated fine at this mould on metal, on curved surface, form mould with micro concavo-convex structure, this mould is installed in cover half, on at least one side of dynamic model, by having used the injection moulding of described fixed half and moving half, be manufactured on the optical element that has the micro concavo-convex structure at least one side's the face.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004089859 | 2004-03-25 | ||
| JP089859/2004 | 2004-03-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1956829A true CN1956829A (en) | 2007-05-02 |
Family
ID=35056056
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2005800095320A Pending CN1956829A (en) | 2004-03-25 | 2005-03-18 | Production method of curved-surface mold and production method of optical element using this metal mold |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20070144700A1 (en) |
| JP (1) | JP4404898B2 (en) |
| CN (1) | CN1956829A (en) |
| WO (1) | WO2005092588A1 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101949518A (en) * | 2010-09-29 | 2011-01-19 | 上海铭源光源发展有限公司 | Manufacturing method for fly lens structure |
| CN102084272B (en) * | 2008-12-26 | 2014-06-18 | 索尼公司 | Method for manufacturing microfabricated object |
| CN106660260A (en) * | 2014-08-04 | 2017-05-10 | 捷客斯能源株式会社 | Method for manufacturing member having irregular pattern |
| US10018874B2 (en) | 2013-08-01 | 2018-07-10 | Lg Chem, Ltd. | Alignment film for liquid crystal lens and mold for preparing the same |
| CN110612184A (en) * | 2017-05-08 | 2019-12-24 | Ykk株式会社 | Plastic molded article |
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| JP4833569B2 (en) * | 2005-03-24 | 2011-12-07 | パナソニック株式会社 | Optical lens having antireflection structure |
| JP4539657B2 (en) | 2007-01-18 | 2010-09-08 | ソニー株式会社 | Anti-reflection optical element |
| JP2009000834A (en) * | 2007-06-19 | 2009-01-08 | Fujitsu Component Ltd | Decorative casing and its manufacturing method |
| FI121061B (en) * | 2007-07-04 | 2010-06-30 | Reate Oy | Method and apparatus for manufacturing an optical object |
| JP4945460B2 (en) * | 2008-01-04 | 2012-06-06 | 株式会社東芝 | Method for forming antireflection structure and antireflection structure |
| GB2465607A (en) * | 2008-11-25 | 2010-05-26 | St Microelectronics | CMOS imager structures |
| JP2010152411A (en) * | 2010-04-05 | 2010-07-08 | Sony Corp | Optical element and its manufacturing method, and replicate substrate for manufacturing optical element and its manufacturing method |
| WO2012114714A1 (en) * | 2011-02-22 | 2012-08-30 | パナソニック株式会社 | Optical member |
| JP5315484B1 (en) | 2012-02-06 | 2013-10-16 | パナソニック株式会社 | OPTICAL ELEMENT, IMAGING DEVICE EQUIPPED WITH THE SAME, AND OPTICAL ELEMENT MANUFACTURING METHOD |
| KR102260184B1 (en) * | 2014-02-26 | 2021-06-04 | 삼성디스플레이 주식회사 | Cover window and display device having the same |
| CN113106403B (en) * | 2020-01-09 | 2023-02-28 | 昆山微电子技术研究院 | Coating method for inner curved surface of optical device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2531472B2 (en) * | 1992-08-07 | 1996-09-04 | 株式会社ニコン | Method for manufacturing plastic molding mold |
| US5390412A (en) * | 1993-04-08 | 1995-02-21 | Gregoire; George D. | Method for making printed circuit boards |
| US20030080471A1 (en) * | 2001-10-29 | 2003-05-01 | Chou Stephen Y. | Lithographic method for molding pattern with nanoscale features |
| JP4183101B2 (en) * | 1996-03-26 | 2008-11-19 | 株式会社エンプラス | Mold fine processing method, mold and molded product |
| JP2000057638A (en) * | 1998-08-04 | 2000-02-25 | Matsushita Electric Ind Co Ltd | Exposure method, exposure device and manufacture of metallic mold |
| US6969472B2 (en) * | 2001-04-19 | 2005-11-29 | Lsi Logic Corporation | Method of fabricating sub-micron hemispherical and hemicylidrical structures from non-spherically shaped templates |
| WO2003046904A1 (en) * | 2001-11-30 | 2003-06-05 | Tdk Corporation | Information medium master manufacturing method, information medium stamper manufacturing method, information medium master manufacturing apparatus, and information medium stamper manufacturing apparatus |
| JP4270806B2 (en) * | 2002-05-24 | 2009-06-03 | 大日本印刷株式会社 | Method for producing antireflection article by sol-gel method |
| JP2004012856A (en) * | 2002-06-07 | 2004-01-15 | Nippon Sheet Glass Co Ltd | Optical element, mold for optical element, and method for manufacturing optical element |
| JP4218372B2 (en) * | 2003-03-06 | 2009-02-04 | コニカミノルタオプト株式会社 | Manufacturing method of mold for optical element |
| WO2004101248A1 (en) * | 2003-05-13 | 2004-11-25 | Kuraray Co., Ltd. | Resin forming mold and production method for the resin forming mold |
-
2005
- 2005-03-18 JP JP2006511450A patent/JP4404898B2/en not_active Expired - Fee Related
- 2005-03-18 WO PCT/JP2005/005012 patent/WO2005092588A1/en active Application Filing
- 2005-03-18 US US10/594,154 patent/US20070144700A1/en not_active Abandoned
- 2005-03-18 CN CNA2005800095320A patent/CN1956829A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102084272B (en) * | 2008-12-26 | 2014-06-18 | 索尼公司 | Method for manufacturing microfabricated object |
| CN101949518A (en) * | 2010-09-29 | 2011-01-19 | 上海铭源光源发展有限公司 | Manufacturing method for fly lens structure |
| US10018874B2 (en) | 2013-08-01 | 2018-07-10 | Lg Chem, Ltd. | Alignment film for liquid crystal lens and mold for preparing the same |
| CN106660260A (en) * | 2014-08-04 | 2017-05-10 | 捷客斯能源株式会社 | Method for manufacturing member having irregular pattern |
| CN110612184A (en) * | 2017-05-08 | 2019-12-24 | Ykk株式会社 | Plastic molded article |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4404898B2 (en) | 2010-01-27 |
| WO2005092588A1 (en) | 2005-10-06 |
| JPWO2005092588A1 (en) | 2008-02-07 |
| US20070144700A1 (en) | 2007-06-28 |
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