CN1941358A - Circuit substrate, electro-optical device and electronic apparatus - Google Patents

Abstract

A electro-optical device (1) comprises an electro-optical element interposed between a cathode (222) and an anode (23) and disposed on the substrate (2), active elements (24) addressing the electro-optical device, and insulating layers (283 and 284) comprising an insulating material interposed between at least one of the cathode (222) and anode (23) and substrate (2) and having a dielectric constant smaller than a prescribed value. The invention seeks to stably operate active elements such as transistors and to enable a display device to have a wide screen and to be stably operated for a long period of time.

Description

Circuit board, board, electric optical device and electronic equipment

Technical field

The present invention relevant for, the circuit board that is applicable to board, electric optical device and semiconductor device, the board, electric optical device that possesses the circuit board that forms by a plurality of material layers that contain electrical optical elements and active element that forms by a plurality of material layers that contain active element, the electronic equipment that possesses this board, electric optical device.

Background technology

As display unit, have and have liquid crystal cell, the liquid crystal indicator of organic electroluminescent component EL (ElectroLuminescenle), board, electric optical devices such as organic EL display.Especially organic EL display is, high brightness and self-luminous, and available DC low-voltage drives, and reaction waits display performance outstanding fast.And, ultra-thinization of display unit, lightweight, low consumption electric power turns to possibility.

Organic EL display has, and clips the formation of the luminescent layer that contains luminescent substance with the electrode layer of anode and negative electrode.And utilized from the anode injected holes and, from the negative electrode injected electrons, in the combination again of the luminescent layer with luminous energy, luminous phenomenon during from the excited state inactivation.

The problem that invention will solve

But in the board, electric optical device, the parasitic capacitance that produces between conductive portion such as distribution and electrode brings obstacle for the replacing of data.This wiring closet electric capacity exists with ... distribution length, becomes big with distribution is elongated, so when utilizing as the display unit of board, electric optical device, become the reason of the big pictureization of overslaugh.

And in recent years, along with semiconductor devices such as memory require high speed highly integrated and work, the electric capacity that produces between conducting positions such as distribution becomes a difficult problem.

The present invention so that the circuit board that can make active element steady operations such as transistor to be provided, can realize big pictureization in view of the above problems, but the board, electric optical device of lasting stability work and use their electronic equipment to be purpose.

Summary of the invention

In order to achieve the above object, circuit board of the present invention contains, the active element that disposes on insulating properties substrate, this substrate, supply drive electric signal or the distribution of driving electric and the dielectric film that is formed by insulating material of this active element, and the dielectric constant of described insulating material is lower than the dielectric constant of described substrate.

According to this invention, between the electrode of insulation active element, or the dielectric film of the wiring closet that is connected with this electrode contains the dielectric film that the insulating material of the following dielectric constant of definite value by having forms, so can reduce between electrode or the parasitic capacitance of wiring closet generation.Therefore, the insulation (isolation) between the drive signal of active element can be guaranteed to supply to, active element can be accurately driven.And, because parasitic capacitance diminishes, can make active element carry out work with the drive signal of higher frequency.As active element, can enumerate semiconductor elements such as transistor, two ends elements such as MIM.

The active element of foregoing circuit plate also can be a transistor.

In the foregoing circuit plate, the dielectric constant of described insulating material below 4 for well, dielectric constant is below 3, and is especially better below 2.5.

In addition, in the circuit board of foregoing invention, insulating material is a porous plastid, aeroge, porous matter silica, magnesium fluoride or contain its material, disperse the atomic colloid of magnesium fluoride, fluorine based polymer or contain its material contains the porous polymer with branched structure, quartz glass, alkylsiloxane, alkyl silsesquioxane polymer (alkyl silses quioxan), hydrogenation alkyl silsesquioxane polymer, the spin glass film of at least one in the polyene propyl ether, decide material and add in inorganic fine particles and the organic particle material of at least one.

In addition, the circuit board of foregoing invention, containing to cover the formed protective layer of active element is feature.

According to this invention, formed the protective layer that covers active element, so can prevent because of metal ingredient the gas in the atmosphere, the deterioration of the active elements that intrusion took place such as moisture.

And the circuit board of foregoing invention; protective layer is by containing at least one material in drier and the chemosorbent; contain at least one material in pottery, silicon nitride, oxidized silicon nitride, the silica; contain at least one material at least one and aluminium in boron, carbon, the nitrogen, phosphorus, the silicon; contain at least one material at least one and aluminium in cerium, ytterbium, samarium, erbium, yttrium, lanthanum, gadolinium, dysprosium, the neodymium, silicon, nitrogen, the oxygen, contain at least one material in barium monoxide, calcium oxide, active carbon, the zeolite etc. and form.

Board, electric optical device of the present invention is, contain the board, electric optical device that is clipped between negative electrode and the anode and is disposed at the electrical optical elements on the substrate, between at least one side and aforesaid substrate of above-mentioned negative electrode and above-mentioned anode, having disposed by the dielectric constant dielectric film that the insulating material below the definite value forms in institute is feature.

According to this invention, accompany between at least one side of the negative electrode of electrical optical elements and anode and aforesaid substrate and disposed, so reduce the parasitic capacitance that produces between this type of electrode by the dielectric constant dielectric film that the insulating material below the definite value forms in institute.Therefore, the insulation between the drive signal of electrical optical elements can be guaranteed to supply to, electrical optical elements can be accurately driven.And, because parasitic capacitance diminishes, can allow the electrical optical elements of drive signal of higher frequency carry out work.As the type of drive of this board, electric optical device, can arbitrarily adopt passive drive mode and active type of drive.As electrical optical elements, can enumerate organic EL, inorganic EL element, liquid crystal cell, electrophoresis element, laser diode, electronic emission element etc.

Board, electric optical device of the present invention is a feature to contain the active element that drives electrical optical elements.

According to this invention, can constitute the board, electric optical device of the active matrix mode that adopts active element, can realize brighter, reactive better board, electric optical device.As active element, can enumerate semiconductor elements such as transistor, two ends elements such as MIM etc.

The substrate of above-mentioned board, electric optical device also can be formed by insulating material.

The active element of above-mentioned board, electric optical device also can be a transistor.

The dielectric constant of the dielectric film of above-mentioned board, electric optical device below 4 for well, dielectric constant is below 3, and is especially better below 2.5.

In addition, in the above-mentioned board, electric optical device, can use as insulating material, porous plastid, aeroge, porous matter silica, magnesium fluoride or contain its material disperses the atomic colloid of magnesium fluoride, fluorine based polymer or contain its material, contain porous polymer, quartz glass, alkylsiloxane with branched structure, the alkyl silsesquioxane polymer, hydrogenation alkyl silsesquioxane polymer, the spin glass film of at least one in the polyene propyl ether, decide material and add in inorganic fine particles and the organic particle material of at least one.

In addition, board, electric optical device of the present invention, containing to cover formed the 1st protective layer of active element is feature.

According to this invention, formed the 1st protective layer that covers active element, so can prevent because of metal ingredient the gas in the atmosphere, the deterioration of the active elements that intrusion took place such as moisture.

And board, electric optical device of the present invention, containing with formed the 2nd protective layer of covered cathode is feature.

According to this invention, formed the 2nd protective layer on covered cathode top, so can prevent because of metal ingredient the gas in the atmosphere, the deterioration of the electrical optical elements that intrusion took place such as moisture.

In addition; the board, electric optical device of foregoing invention; one deck at least of the 1st and the 2nd protective layer is by containing at least one material in drier and the chemosorbent; contain at least one material in pottery, silicon nitride, oxidized silicon nitride, the silica; contain at least one material at least one and aluminium in boron, carbon, the nitrogen, phosphorus, the silicon; contain at least one material at least one and aluminium in cerium, ytterbium, samarium, erbium, yttrium, lanthanum, gadolinium, dysprosium, the neodymium, silicon, nitrogen, the oxygen, contain at least one material in barium monoxide, calcium oxide, active carbon, the zeolite etc. and form.

Board, electric optical device of the present invention is that organic EL is a feature with above-mentioned electrical optical elements.

According to this invention, make electrical optical elements by organic EL, can realize the unrestricted display unit of low voltage drive and angle of visibility.

Electronic equipment of the present invention is a feature to be equipped with foregoing circuit plate or above-mentioned board, electric optical device.

According to this invention,, can realize that the high input signal of relative frequency can stablize the following good electron equipment that shows work by reducing parasitic capacitance.

Attached explanation

Fig. 1 is the figure of an embodiment of demonstration board, electric optical device of the present invention, is the rough structure figure that expression is applicable to the example of organic EL display.

Fig. 2 is the expanded view of planar structure of the pixel portions of displayed map 1 display unit.

Fig. 3 is the sectional view along the A-A line of Fig. 2 for the figure of an embodiment of demonstration board, electric optical device of the present invention.

Fig. 4 is the figure that shows an example of the electronic equipment with board, electric optical device of the present invention.

Fig. 5 is the figure that shows an example of the electronic equipment with board, electric optical device of the present invention.

Fig. 6 is the figure that shows an example of the electronic equipment with board, electric optical device of the present invention.

Embodiment

Below, to one embodiment of the present of invention, describe with reference to drawing.

Fig. 1 shows, present embodiment, be suitable for doing the ideograph of distribution structure of the board, electric optical device of display unit.

The board, electric optical device of present embodiment is, as active element and electrical optical elements, use the organic EL display of the active matrix mode of thin-film transistor (TFT:Thin Transistor is hereinafter referred to as TFT) and organic electroluminescent component (hereinafter referred to as organic EL) separately.

The board, electric optical device 1 of this figure has, a plurality of scan lines 131 (distribution) and, relative scanning line 131 with a plurality of holding wires 132 (distribution) of crisscross extension and, the a plurality of illuminating power supply wirings 133 (distribution) that extend side by side with holding wire 132 are separately the formation of distribution the time, the individual intersection point of corresponding scan line 131 and holding wire 132 is provided with pixel region A.

Each holding wire 132 has connected and has possessed shift register, level shift diode, and video line and film are intended the data line drive circuit 90 of switch.On the other hand, each scan line 131 has connected and has possessed shift register, the scan line drive circuit 80 of level shift diode.

And, each pixel region A is provided with, by scan line 131 with sweep signal supply to gate electrode switching TFT 22 (switching) and, keep by this switching TFT 22 picture signal supplied with by holding wire 132 maintenance electric capacity cap and, with the picture signal that keeps electric capacity cap to keep supply to gate electrode electric current TFT24 (current) and, when being connected electrically to illuminating power supply wiring 133 by this current mode TFT24 drive current from illuminating power supply wiring 133 flow into pixel electrodes 23 (anode) and, 222 organic ELs that accompany 3 of this pixel electrode 23 and negative electrode.

The above-mentioned board, electric optical device that constitutes 1 drives by scan line 131, and TFT22 is in the on state, and holding wire 132 current potentials of this moment remain to and keep electric capacity cap, and the conducting state of TFT24 depends on the state of this maintenance electric capacity cap.The corresponding magnitude of current of the conducting state of TFT24 is supplied with drive current by illuminating power supply wiring 133 to organic EL 3 by pixel electrode 23.The luminous intensity of organic EL 3 depends on that this supplies to the magnitude of current of organic EL 3.

Fig. 2 is, removes the expanded view of overlooking of pixel region A under the state of negative electrode 222 and organic EL 3.Among this figure, each pixel region is that four limits that are shaped as rectangular pixel electrode 23 are scanned line 131, holding wire 132, the configuration that illuminating power supply wiring 133 and other pixel electrodes are surrounded with scan line 131.The shape of pixel electrode 23 is not limited to rectangle, and other shapes also can.For example, when form constituting charge transport layer such as the luminescent layer of organic EL 3 and electronics or hole transporting layer with liquid phase process such as ink-jet method (process), in order to form uniform above-mentioned layer on pixel electrode 23, circle that employing is chamfered and ellipse etc. are shaped as.

Below, with reference to Fig. 3 board, electric optical device 1 is described.

Fig. 3 is the sectional view of Fig. 2 along the A-A line.Among this figure, board, electric optical device 1 is formed on, substrate 2 Hes, pixel electrode 23 Hes that indium tin oxide transparent electrode materials such as (ITO:Indium Tin Oxide) forms, organic EL 3 Hes of configuration on the pixel electrode 23, be configured to accompany negative electrode 222 Hes of organic EL 3 between the pixel electrode 23, form on the substrate 2 and have as the current mode TFT24 of control to the energising control part of the energising of pixel electrode 23.The upper strata of negative electrode 222 also is provided with sealant 20 (the 2nd protective layer).Negative electrode 222, by aluminium (Al), magnesium (Mg), gold (Au), silver (Ag), at least a metal of selecting in the calcium (Ca) constitutes.Negative electrode 222 also contains the alloy and the lamination thing of above-mentioned each material.TFT24 starts based on the start command signal of scan line drive circuit 80 and data line drive circuit 90, carries out the energising control to pixel electrode 23.

Light-emitting component 3 substantially by hole transporting layer 70 Hes that can carry the hole from anode 23, contains luminescent layer 60 Hes of a kind of organic EL material of electric optical material, and the electron supplying layer that is provided with above 50 of luminescent layer 60 constitutes.The top negative electrode (counter electrode) 222 that disposed of electron supplying layer 50.

TFT24 has possessed, by with SiO ₂Be arranged on the surface of substrate 2 for the protective underlayer layer 281 of main body.This TFT24; silicon layer 241 Hes that form on the upper strata of protective underlayer layer 281; the upper strata that is arranged at protective underlayer layer 281 is to cover insulating barrier 282 Hes of silicon layer 241; gate electrode 242 Hes that are provided with towards silicon layer 241 above the gate insulation layer 282; be arranged at gate insulation layer 282 upper stratas with the 1st interlayer dielectric 283 (dielectric film) of covering grid electrode 242 and; source electrode 243 Hes that are connected with silicon layer 241 by contact hole through gate insulation layer 282 and 283 perforates of the 1st interlayer insulating film; accompany that gate electrode 242 is arranged on towards the position of source electrode 243; drain electrode 244 Hes that are connected with silicon layer 241 by contact hole through gate insulation layer 282 and 283 perforates of the 1st interlayer insulating film; the upper strata that is arranged at the 1st interlayer insulating film 283 is to cover the barrier layer 285 (protective layers of source electrode 243 and drain electrode 244; the 1st protective layer) and, be arranged at the 2nd interlayer insulating film 284 (dielectric film) on its upper strata.

Configuration pixel electrode 23 above the 2nd interlayer insulating film 284, by the contact hole 23a through the 2nd interlayer insulating film 284 and barrier layer 285 perforates, pixel electrode 23 is connected with drain electrode 244.Be provided with in the surface of the 2nd interlayer insulating film 284 between the part and negative electrode 222 beyond the organic EL, be provided with the 3rd insulating barrier 221 that forms by synthetic resin etc.

In the silicon layer 241, accompanying gate insulation layer 282 is channel region with gate electrode 242 overlapping areas.In the silicon layer 241, the source side of channel region is provided with the source region, and the drain side of channel region is provided with the drain region.Wherein, the source region is by being connected with source electrode 243 through the contact hole of gate insulation layer 282 with 283 perforates of the 1st interlayer insulating film.On the other hand, the drain region by the contact hole through gate insulation layer 282 and 283 perforates of the 1st interlayer insulating film, is connected with the drain electrode 244 of same one deck of source electrode 243.Pixel electrode 23 is connected with the drain region of silicon layer 241 by drain electrode.

The material that is used for substrate 2 is not particularly limited, the formation of this example is because be to go out the light that is sent by luminescent layer 60 from substrate 2 side-draws that are provided with TFT24, so use the transparent or semitransparent material that can see through light, clear glass for example, quartz, sapphire, or polyester, polyacrylate, Merlon, the synthetic resin that polyether-ketone etc. are transparent.Especially, as the material that forms substrate 2, be fit to use cheap soda-lime glass.When using soda-lime glass, protect the not soda-lime glass of acid and alkali-resistance, strengthen the effect of the flatness of substrate 2, carry out the silica coating for well in order to reach.

Also can on substrate 2, dispose the color conversion film that contains colour filter film or photism material, or deielectric-coating, illuminant colour controlled.

On the other hand, the substrate 2 that is provided with TFT22 is for going out the situation of the formation (topemissior) of luminous light from the opposition side-draw, substrate 2 also can be opaque, this kind situation can be used potteries such as aluminium oxide, metallic plates such as stainless steel carry out the material of insulation processing such as surface oxidation, heat-curing resin, thermoplastic resin etc.

When forming protective underlayer layer 281, for substrate 2, TEOS (tetraethoxysilane), oxygen etc. are made raw material, by by plasma CVD legal system film, form the thick silicon oxide layer of about 200～500nm and make bottom protective film 281.

When forming silicon layer 241, the temperature with substrate 2 is made as about 350 ℃ earlier, forms the thick amorphous silicon layer of 30～70nm by plasma CVD method or ICVD method on the surface of bottom protective film 281.Then, to this amorphous silicon layer, by the laser annealing method, the flop-in method of heating, or solid phase rapidly etc. is carried out the crystallization processing, and the amorphous silicon layer crystallization is turned to poly silicon layer.The laser annealing method is for example used the wire harness of the long 400mm of bundle of excimer laser, and its output intensity is 200mJ/cm ²During the scanning wire harness, make each zone that partially overlaps in that is equivalent to its peak value 90% of lacking the laser intensity on direction.Then, poly silicon layer becomes figure with photoetching process, becomes the silicon layer 241 of island.

Silicon layer 241 is channel region and the source drain zone of current mode TFT 24 shown in Figure 1, but also forms in different sectional positions, becomes the channel region of switching TFT 22 and the semiconductor film in source drain zone.That is, two kinds of TFT 22,24th form simultaneously, but make with same operation, so in the following description, about TFT, current mode TFT 24 only are described, omit the explanation to switching TFT 22.

When forming gate insulation layer 282, for the surface of silicon layer 241, TEOS and oxygen etc. makes raw material, by by plasma CVD legal system film, forms the thick gate insulation layer 282 that is formed by silicon oxide layer and nitride film of 60～150nm.As the material of gate insulation layer 282, use the big high dielectric material of dielectric constant for well.

Gate electrode 242 is, on gate insulation layer 282, forms to contain aluminium by sputtering method, and tantalum, molybdenum, titanium behind the conducting film of metals such as tungsten, graphically forms it again.

In order to form source region and drain region on the silicon layer 241, behind the formation gate electrode 242, this gate electrode 242 is made the figure pattern, with this, state injects phosphonium ion.Its result, for gate electrode 242, self-adjustment ground imports high concentration impurities, forms source region and drain region in silicon layer 241.And the part that does not import impurity has become channel region.

The 1st interlayer insulating film 283 is, (the SiO2 film: the dielectric constant=about 4) low-dielectric constant layer that forms of little advanced low-k materials is formed at the upper strata of gate insulation layer 282 by the general silicon oxide layer of permittivity ratio.

As the formation material of this 1st interlayer insulating film 283, can enumerate porous plastid, aeroge, porous matter silica, magnesium fluoride, fluorine based polymer, porous polymer etc.For example, have porous by SiO ₂The 1st interlayer insulating film 283 that film forms uses Si ₂H ₆And O ₃Make reacting gas, form by CVD method (chemical vapor deposition method).Use this type of reacting gas, then form big SiO in the gas phase ₂, be deposited on the gate insulation layer 282.So the 1st interlayer insulating film 283 has a lot of spaces in its layer, has become porous plastid.And the 1st interlayer insulating film 283 becomes porous plastid, has also become low-dielectric constant layer thereupon.

H (hydrogen) plasma treatment also can be carried out in the surface of the 1st interlayer insulating film 283.Handle by this, the dangling bonds in the Si-O combination on surface, space is replaced to the Si-H combination, improve the anti-moisture absorption of film.And these the 1st interlayer insulating film 283 surfaces of process plasma treatment also can be provided with SiO in addition ₂Layer.

Reacting gas when forming the 1st interlayer insulating film 283 with the CVD method is except Si ₂H ₆+ O ₃, also can use Si ₂H ₆+ O ₂, Si ₃H ₈+ O ₃, Si ₃H ₈+ O ₂And, also can will contain B (boron) reacting gas, contain F (fluorine) reacting gas, be added to above-mentioned reacting gas.

When forming the 1st interlayer insulating film 283 of porous plastid, by will have porous SiO2 film and, the SiO that forms with the reduced pressure chemical chemical vapour deposition usually ₂Rete is long-pending, can form the 1st interlayer insulating film 283 of membranous stable porous plastid.SiH under reduced pressure ₄And O ₂In the gas, plasma taking place intermittently or periodically, comes this type of film of lamination.Specifically, the 1st interlayer insulating film 283 is, substrate 2 is contained in institute surely in the container, keeps as 400 ℃ the time, adopts SiH ₄And O ₂Make reacting gas, RF voltage (high frequency voltage) is outer to be added on that container forms.In the film forming, SiH ₄Flow, O ₂Flow is certain, and corresponding RF voltage was the cycle to be added on container outward with 10 seconds.Meanwhile, plasma was to produce in the cycle with 10 seconds, eliminated.Like this by adopting the plasma of conversion in time, in a container, can repeat with the operation of decompression CVD and, decompression is down with the operation of plasma CVD.By repeating to reduce pressure CVD and decompression plasma CVD down, formation has the SiO in a lot of spaces in the film ₂Film.That is, the 1st interlayer insulating film 283 has had porousness.

The 1st interlayer insulating film 283 can be made of aeroge.Aeroge is, by the moistening colloid that the colloidal sol reaction of metal alkoxide forms, carry out supercritical drying and must the light transmission porous plastid with uniform hyperfine structure.Aeroge has silica aerogel, and aluminium oxide is the aeroge of keynote.Wherein, silica aerogel, the space accounts for more than 90% of volume, and remaining is to become the fine SiO of dendritic 10nm by aggegation ₂The material that particle constitutes.It is more effective that the silica aerogel that this voidage is high is made advanced low-k materials.

The silica aerogel process is made the technology of moistening colloid by sol method, the technology of the moistening colloid of maturation, and make by the supercritical drying drying process that the dry moistening colloid of supercritical drying obtains aeroge.Supercritical drying is, replaces and removes by liquid in the colloid of the Gel mile shape that will be formed by solid phase and liquid phase and supercritical fluid, need not shrink the method that colloid also can dry colloid be suitable for, and can obtain the aeroge of high voidage.

When for example forming the 1st interlayer insulating film 283 by silica aerogel, the method for on gate insulation layer 282 the moistening colloid of aeroge raw material being carried out coating and supercritical drying with spin coating method etc. forms.By using the supercritical drying of supercritical fluid, replace solvent in the moistening colloid with supercritical fluid, remove the solvent in the moistening colloid.As supercritical fluid, can use carbon dioxide (CO ₂) or alcohol such as methyl alcohol or ethanol, NH ₃, H ₂O, N ₂O, methane, ethane, ethene, propane, pentane, isopropyl alcohol, isobutanol encircles three fluoro methane, single fluomethane, cyclohexanol etc.

When forming low-dielectric constant layer by silica aerogel, with spin coating etc. after the moistening colloid of coating on the base material, supercritical drying, but also can on moistening colloid, mix synthetic resin (organic substance).The synthetic resin of this moment is that its thermal denaturation temperature is than the critical temperature height of supercritical fluid and the synthetic resin of energy printing opacity.When for example ethanol is made supercritical fluid, its thermal denaturation temperature can be enumerated hydroxy propyl cellulose (HPC), polyvinylbutyral (PVB) than the critical temperature height of ethanol and the synthetic resin of energy printing opacity, ethyl cellulose (PVB and EC are dissolved in ethanol, and are water insoluble) such as (EC).Selecting chlorine when using ether solvent is resins such as polyethylene, uses CO ₂Select HPC etc. for well when making solvent.

As low-dielectric constant layer, also can be that aluminium oxide is the aeroge of keynote beyond the silica aerogel, also can be by general silicon oxide layer (SIO ₂Film: the porous plastid that dielectric constant dielectric constant=4) is low.

As low-dielectric constant layer, also can be porous matter silica, also can be magnesium fluoride or the material that contains it.Can be coated with method by sputter by the low-dielectric constant layer of magnesium fluoride forms.Or, also can be to disperse the atomic colloid of magnesium fluoride.Or also can be fluorine based polymer or the material that contains it, perfluorinated alkyl polyethers for example, perfluorinated alkyl amine, or perfluorinated alkyl polyethers perfluorinated alkyl amine hybrid films.

In addition, as low-dielectric constant layer, also can be quartz glass, alkyl siloxane polymer, alkyl silsesquioxane polymer, hydrogenation alkyl silsesquioxane polymer isospin (spin on) glass-film (SOG).Or, also can be organic polymer, diamond film or fluorinated amorphous body carbon element films such as polyaryl ether.Low-dielectric constant layer by the spin glass film can pass through, and being coated with ethanol with the spin coating method on gate insulation layer 282 is the spin glass pleurodiaphragmatic in terspace material of solvent, is formed by the method for heat treatment with solvent evaporation.When forming the spin glass film, also can use above-mentioned supercritical drying.By using supercritical drying can improve spreadability and membranous.

And, as low-dielectric constant layer, also can in the fixed polymer adhesive, mix solubility or dispersed fluorocarbon.

As polymer adhesive, can enumerate polyvinyl alcohol, polyacrylic acid, polyvinyl pyrrolidone, polyethylene benzene sulfonic acid sodium salt, polyvinyl methyl ether, polyethylene glycol, poly-α-three fluoro methacrylic acid, polyvinyl methyl ether and anhydrous maleic acid acid anhydride, polyethylene glycol and propylene glycol, polyisobutylene acid etc.

As fluorocarbon, can enumerate the sad ammonium salt of perfluorinate, the sad tetramethyl ammonium of perfluorinate, the perfluorinated alkyl benzene sulfonic acid ammonium salt of C-7 and C-10, the perfluorinated alkyl benzene sulfonic acid tetramethyl ammonium of C-7 and C-10, fluorinated alkyl fourth stage ammonium iodate, the perfluorinate adipic acid, and perfluorinate adipic acid fourth stage ammonium salt etc.

And the method that imports the space as low-dielectric constant layer is effective, so outside the above-mentioned aeroge, also can use particulate to form between particulate or the microgap is done in the space in the particulate.Can use inorganic fine particles or organic particle as particulate.

Inorganic fine particles, with noncrystal for well.Inorganic fine particles, by metal oxide, nitride, sulfide or halide and become are formed better by metal oxide or metal halide.As metallic atom, Na, K, Mg, Ca, Ba, Al, Zn, Fe, Cu, Ti, Sn, In, W, Y, Sb, Mn, Ga, V, Nb, Ta, Ag, Si, B, Bi, Mo, Ce, Cd, Be, Pb and Ni be for well, Mg, and Ca, B and Si are better.It is also passable that use contains the inorganic compound of two kinds of metals.Especially the inorganic compound of Shi Heing is a silicon dioxide, i.e. SiO ₂

Microgap in the inorganic fine particles can form by the silica molecule that is cross-linked to form particle.Crosslinking-oxidization silicon molecule can make volume-diminished, and particle becomes porous matter.Inorganic fine particles with microgap (porous matter), by sol method (be recorded in the spy and open clear 53-112732 number, each communique of special public clear 57-9051 number) or deposition method (APPLIED OPTICS, 27,3356 pages (1988) record), directly synthetic as disperseing thing.Drying precipitated method obtains powder, can obtain disperseing thing by mechanical crushing.Also can use commercially available porous matter inorganic fine particles (as dioxide/silica gel).

Organic particle also is for well with noncrystalline.Organic particle with by the synthetic polymeric microsphere of the polymerization reaction (as emulsion polymerization method) of monomer for well.Organic particle polymer contain fluorine atoms is for well.The synthetic used fluorochemical monomer of fluoropolymer has fluoroolefins hydrocarbon (for example, fluorinated ethylene, vinylidene fluorite, tetrafluoroethene, hexafluoropropylene, perfluor-2,2-dimethyl-1,3-two  are luxuriant), the fluorinated alkyl esters class of acrylic or methacrylic acid and ethylene fluoride ethers.Also can use the fluorochemical monomer and the copolymer of fluorochemical monomer not.Fluorochemical monomer can not enumerated olefine (for example, ethene, propylene, isoprene, vinyl chloride, the inferior ethene of chlorine), esters of acrylic acid (for example, methyl acrylate, ethyl acrylate, 2-EHA), methyl acrylic ester is (for example, methyl methacrylate, EMA, butyl methacrylate), phenylethylene (for example, styrene, vinyl toluene, AMS), ethene ethers (for example, ethylene methacrylic ether), vinyl esters (for example, vinylacetate, propionate), acrylic amide (for example, N tert butyl acrylamide, N-cyclohexyl acrylamide), methacryl amine and vinyl cyanide.

Microgap in the organic particle can form by the silica molecule that is cross-linked to form particle.Crosslinking-oxidization silicon molecule can make volume-diminished, and particle becomes porous matter.In order to make the polymer that forms particle, the 20mol% of the monomer of synthetic polymer above for polyfunctional monomer for well.The ratio of polyfunctional monomer is, 30 to 80mol% is better, and 35 to 50mol% is best.Polyfunctional monomer can be enumerated, alkadiene (for example, butadiene, pentadiene), acrylic acid and polyol ester class (for example, ethylene glycol diacrylate, 1,4-diacrylate cyclohexyl, six acrylic acid diamyl erythritol esters), the metering system acid polyol ester is (for example, Ethylene glycol dimethacrylate, four different acrylic acid 1,2, the 4-cyclohexyl, tetramethyl acrylic acid amyl group erythritol ester), divinyl compound (for example, divinyl cyclohexane, 1, the 4-divinylbenzene), divinylbenzene sulfonic acid, bisacrylamide class (for example, methylene-bisacrylamide) and two methacryl amine.Interparticle microgap forms by overlapping particulate more than 2 at least.

Also can constitute low-dielectric constant layer by material with fine emptying aperture and finely particulate inorganic matter.At this moment, form low-dielectric constant layer by coating, fine emptying aperture is, carries out the activate gas treatment after the layer coating, by gas from pull-up from forming.Perhaps, (for example, the MgF of the ultramicron more than 2 kinds ₂And SiO ₂) mix, it is also passable recently to form low-dielectric constant layer by its mixing of variation on the film thickness direction.Dielectric constant changes with the variation of mixing ratio.The SiO that ultramicron produces during by the ethyl silicate thermal decomposition ₂Bond.During the thermal decomposition of ethyl silicate, the burning by the ethyl part also produces carbon dioxide and steam.By carbon dioxide and steam from pull-up from, generate the gap between ultramicron.Or, also can form the inorganic micro powder end of containing porous matter silica and the low-dielectric constant layer of adhesive, also can form particulate, the space formation low-dielectric constant layer between particulate by overlapping 2 above fluoropolymers.

Can improve voidage with the molecular structure level.The polymer that for example uses arborescence etc. to have branched structure also can obtain low-k.

In order to form source electrode 243 and drain electrode 244, on the 1st interlayer insulating film 283, become figure earlier with photoetching process, form the contact hole of corresponding source electrode and drain electrode.Form aluminium then; Chrome, the conductive layer that metals such as tantalum form is with after covering the 1st interlayer insulating film 283, when figure being set forming the zone of source electrode and drain electrode with mark to cover, by conductive layer is become figure, form source electrode 243 and drain electrode 244.

Barrier layer 285 is, prevents to be diffused into TFT 24 sides from containing the organic EL side that constitutes luminescent layer 60, so by forming to cover source electrode 243 and drain electrode 244 with the same method of the 1st interlayer insulating film 283.As the material on barrier layer 285, can enumerate and contain B (boron), C (carbon), at least a element of selecting among the N (nitrogen) and, Al (aluminium), Si (silicon), the insulating barrier of at least a element of selecting among the P (phosphorus).

For example, can use the nitride of the aluminium of aluminium nitride (AlxNy) representative, the carbide of the silicon of carborundum (SixCy) representative, the nitride of the silicon of silicon nitride (SixNy) representative, the nitride of the boron of boron nitride (BxNy) representative, the phosphide of the boron of boron phosphide (BxPy) representative.And the pyroconductivity of the oxide of the aluminium of aluminium oxide (AlxOy) representative is 20Wm ^-1K ^-1, exothermal effect is good, can prevent the thermal degradation when of light-emitting component, is one of appropriate materials.This type of material not only has above-mentioned effect, prevents the effect that moisture is invaded in addition.

Above-claimed cpd other elements also capable of being combined.For example, aluminium oxide adds nitrogen, can use the nitriding and oxidizing aluminium that is shown AlNxOy.This material also is except exothermal effect, also has the effect of the intrusion that prevents moisture and mobile ion etc.

And, also can use and contain Si, Al, N, O, the dielectric film of M (but, M is at least a uncommon great soil group element, Ce (cerium) preferably, Yb (ytterbium), Sm (samarium), Er (erbium), Y (yttrium), La (lanthanum), Gd (gadolinium), Dy (dysprosium), at least a element of picking out among the Nd (neodymium)).This type of material also is except exothermal effect, also has the effect of the intrusion that prevents moisture and mobile ion etc.

And, also can use diamond thin or contain the carbon element film of noncrystal carbon element film (especially,, being called similar diamond carbon element) at least a near the film of diamond characteristic.Their pyroconductivity is very high, and it is extremely effective to make exothermic layer.But the voice band brown transmitance of thickness thickening reduces, thus use as far as possible film thick (preferably 5～100nm) for well.

The purpose of protective layer is to protect TFT from mobile ion and moisture on earth, so preferably do not damage the material of its effect.Therefore, also can use the above-mentioned film that forms by material by monomer with above-mentioned exothermal effect, this type of film of lamination and, prevent that the dielectric film that sees through (representational have silicon nitride film (SixNy) and nitriding and oxidizing silicon fiml (SiOxNy)) of mobile ion and moisture from being effective.

The 2nd interlayer insulating film 284, identical with the 1st interlayer insulating film 283, by porous plastid, aeroge, porous matter silica, magnesium fluoride, fluorine based polymer, formations such as porous polymer with the same operation of formation method of the 1st interlayer insulating film 283, are formed on the upper strata on barrier layer 285.

After barrier layer 285 forms back and the 2nd interlayer insulating film 284 and forms, the part formation contact hole 23a that each comfortable and drain electrode 244 is corresponding.

The dielectric constant of the 1st interlayer insulating film 283, the 2 interlayer insulating films 284 is set in below 3 to well, is more preferably to be set in below 2.5.

Be connected the anode 23 of organic EL 3, by ITO and mix the SnO of fluorine ₂, reach transparent electrode materials such as ZnO and polyamine and form, be connected to the drain electrode 244 of TFT 24 by contact hole 23a.Anode 23 is to form the film that is formed by above-mentioned transparent electrode material on the 2nd interlayer insulating film 284, by becoming figure to form this film.

The 3rd insulating barrier 221 is by allyl resin, and synthetic resin such as poly-imide resin constitute.The 3rd insulating barrier 221 is to form anode 23 backs to form.As the formation method of the 3rd concrete insulating barrier 221, for example, allyl resin, the resist of poly-imide resin etc. is dissolved in solvent, and by spin coating, coating such as dip coating forms insulating barrier.The constituent material of insulating barrier is so long as be not dissolved in solvent in the printing ink, and easily becomes the material of figure with methods such as etches, and which type of can.With etches such as photoetching techniques,, form the 3rd insulating barrier 221 simultaneously with peristome 221a by forming peristome 221a.

At this, the surface of the 3rd insulating barrier 221 has formed the zone of demonstration lyophily (for example oleophylic China ink) and the zone of demonstration lyophobicity (for example oleophobic China ink).In the present embodiment, be, form each zone by plasma treatment process.Specifically, plasma treatment process comprises, pre-heating technique and, make the electrode surface of the wall of peristome 221a and pixel electrode 23 become the oleophylic China ink oleophylic China ink metallization processes and, make the 3rd insulating barrier 221 above become the oleophobic China ink oleophobic China ink metallization processes and, process for cooling.

That is, base material (is the substrate 2 that contains the 3rd insulating barrier etc. at this) is heated to institute's fixed temperature (for example about 70～80 ℃), and then the oxygen that carries out in the atmosphere as oleophylic China ink metallization processes is plasma treatment (for example, the O of reacting gas ₂Plasma treatment).The tetrafluoromethane that carries out in the atmosphere as oleophobic China ink metallization processes is plasma treatment (for example, the CF of reacting gas then ₄Plasma treatment), because of the heated base material cool to room temperature of plasma treatment, just oleophylic China ink and oleophobic China ink can be imparted to position, institute bonding part.How many electrode surfaces of pixel electrode 23 also is subjected to this CF ₄The influence of plasma treatment, but the material of pixel electrodes 23 such as ITO is poor to the compatibility of fluorine, so the hydroxy that obtains in the oleophylic China ink metallization processes has been preserved the oleophylic China ink not by fluorine-based replacement.

Hole transporting layer 70 is formation on anode 23.At this, as the formation material of hole transporting layer 70, be not particularly limited can use well-known, pyrazoline derivative for example, arylamine derivative, stilbene derivatives, triphenyldiamine derivative etc.Specifically, there is the spy to open clear 63-70257 number, with the 63-175860 communique, the spy opens flat 2-135359 number, with 2-135361 number, with 2-209988 number, with 3-37992 number, the example of being put down in writing with the 3-152184 communique, but with the triphenyldiamine derivative for well, wherein also with 4,4 '-two (N (3-methylbenzene)-N-aniline) biphenyl is the most suitable.

Hole injection layer instead of holes transfer layer can be formed, also hole transporting layer and hole injection layer can be formed.At this moment, as the formation material of hole injection layer, can enumerate copper phthalocyanine (CuPc), the poly-inferior phenylethylene of the inferior benzene of poly-tetrahydrochysene thiophenyl, 1, the two (4-N of 1-, N-xylyl aminobenzene) cyclohexane, three (oxine) aluminium etc., but especially with copper phthalocyanine (CuPc) for well.

When forming hole injection/transfer layer 70, adopt ink-jet method.That is, after the constituent printing ink that contains hole injection/conveying material is sprayed onto the electrode surface of anode 23,, on electrode 23, form hole injection/transfer layer 70 by carrying out dried and heat treatment.After this hole injection/transfer layer forms technology, should prevent the oxidation of hole injection/transfer layer 70 and luminescent layer 60,, carry out to good in the inert gases such as argon gas at nitrogen.For example, fill the constituent printing ink that contains hole injection/conveying material at ink gun (not illustrating), the nozzle of ink gun is towards the electrode surface of anode 23, and in relatively move ink gun and the base material (is substrate 2 at this), the ink droplet that will control to 1 dropping liquid amount from nozzle is sprayed onto electrode surface.Then, the droplets of ink of ejection is carried out dried,, form hole injection/transfer layer 70 being contained in the polar solvent evaporation of constituent printing ink.

As constituent printing ink, for example can use, polyphenylene sulfide derivatives such as polyethylene dioxythiophene, mixtures such as polystyrolsulfon acid are dissolved in the material of isopropyl alcohol isopolarity solvent.At this, the droplets of ink of ejection is diffused in the electrode surface of the anode 23 that oleophylic China ink handled, and is filled near the bottom of peristome 221a.In addition-and the aspect, the 3rd insulating barrier 221 top repulsion droplets of ink that the oleophobic China ink was handled and non-cohesive.So, even departing from from eject position, droplets of ink is sprayed onto on the 3rd insulating barrier 221, not soaked above this by droplets of ink, and the droplets of ink of being ostracised rolls in the peristome 221a of the 3rd insulating barrier 221.

Luminescent layer 60 is formed on above the hole injection/transfer layer 70.Formation material as luminescent layer 60 is not particularly limited, and can use low molecule organic light emission pigment and polymeric luminescent material, i.e. each luminescent substance that is formed by kind of fluorescent material and phosphorus.Serve as in the common Yoke macromolecule of luminescent substance, especially with the material that contains the inferior ethene structure of propine for well.Low molecular fluorescence body for example can use naphthalene derivatives, anthracene derivant perylene derivative, ton system is told by polymethylene system, coumalin system, pigments such as anthocyanin system, the metallic complex salt of 8-hydrogen quinoline and derivative thereof, aromatic amine, four phenyl ring pentadiene derivants etc., or the spy opens clear 57-51781, the well-known material of being put down in writing with the 59-194393 communique.

When using the high molecular fluorescent body, can use side chain to have the macromolecule of fluorescent base, but the material that contains common Yoke structure with main chain is for well as the formation material of luminescent layer 60, especially with polythiophene, the inferior benzene of poly--p-, the inferior ethene of poly (arylene ether) gathers fluorenes and derivative thereof for well.Wherein also with the inferior ethene of poly (arylene ether) and derivative thereof for well.Inferior ethene of this poly (arylene ether) and derivative thereof are to contain the condensate of the recurring unit shown in the following note chemical formula (1) more than 50 moles of % that account for all recurring units.Also relevant with the structure of recurring unit, but the recurring unit shown in the chemical formula (1) accounts for the better more than 70% of all recurring units.

-Ar-CR＝CR’- (1)

At this, Ar is that the carbon element atomicity that participates in Yoke combination altogether is arylalkenyl below 20 or a polycyclic compound base more than 4, R, R ' are independent separately to be by hydrogen, the alkyl of carbon number 1～20, the aryl of carbon number 6～20, the polycyclic compound of carbon number 4～20, the base of selecting in the cyano group.

This high molecular fluorescent body as the recurring unit beyond the recurring unit shown in the chemical formula (1), can contain aromatic compound base or derivatives thereof, polycyclic compound base or derivatives thereof, and make up they and base.And the recurring unit shown in the chemical formula (1) and other recurring units also can have ether, ester group, and amide groups, the non-Yoke unit altogether of imido grpup links, and it is also passable to contain such non-part of Yoke altogether in the recurring unit.

The Ar of the chemical formula (1) of last note high molecular fluorescent body is, the carbon number that participates in Yoke combination altogether is aryl base below 20 or a polycyclic compound base more than 4, enumerate down the aromatic compound base or derivatives thereof base shown in the note chemical formula (2), polycyclic compound base or derivatives thereof base, and the base of their gained of combination etc.

[changing 1]

(R ₁～R ₉₂, independently be hydrogen, the alkyl of carbon number 1～20, alkoxyl and alkylthio group separately; The aryl of carbon number 6～18 and aryloxy group; And the base of selecting in the polycyclic compound of carbon number 4～14.)

In them with phenylene, substituted phenylene, diphenylene replaces diphenylene, naphthalene two bases replace naphthalene two bases, anthracene-9,10-two bases replace anthracene-9,10-two bases, pyridine-2,5-two bases, substituted pyridines-2,5-two bases, the inferior thienyl of inferior thienyl and replacement is for well.Be more preferably phenylene, diphenylene, naphthalene two bases, pyridine-2,5-two bases, inferior thienyl.

The R of chemical formula (1), R ' are under hydrogen or the cyano group substituent situation in addition, as the alkyl of carbon number 1～20, can enumerate methyl, ethyl, propyl group, butyl, amyl group, hexyl, heptyl, octyl group, decyl, dodecyl etc., with methyl, ethyl, amyl group, hexyl, heptyl, octyl group is for well.Aryl can be enumerated, phenyl, the alkoxyphenyl radical of 4-C1～C12 (C1～C12 refers to that carbon number is 1～12, below also identical.), the alkane phenyl of 4-C1～C12,1-naphthyl, 2-naphthyl etc.

From the viewpoint of solvent soluble, the Ar of chemical formula (1) has, the alkyl of more than one carbon number 4～20, and alkoxyl and alkylthio group, the aryl of carbon number 6～18 and aryloxy group, and the base of selecting in the polycyclic compound of carbon number 4～14 is for well.

Can enumerate following material as this type of substituting group.As the alkyl of carbon number 4～20, can enumerate butyl, amyl group, hexyl, heptyl, octyl group, decyl, dodecyl etc., wherein with amyl group, hexyl, heptyl, octyl group is for well.And, as the alkoxyl of carbon number 4～20, can enumerate butoxy, amoxy, own oxygen base, heptan the oxygen base, octyloxy, the last of the ten Heavenly stems oxygen base, dodecyloxy etc., wherein with amoxy, own oxygen base, heptan the oxygen base, octyloxy is for well.As the alkylthio group of carbon number 4～20, can enumerate butylthio, penta sulfenyl, own sulfenyl, heptan sulfenyl, hot sulfenyl, the last of the ten Heavenly stems sulfenyl, dodecane sulfenyl etc., wherein with penta sulfenyl, own sulfenyl, heptan sulfenyl, hot sulfenyl is for well.As aryl, can enumerate phenyl, the alkoxyphenyl radical of 4-C1～C12, the alkane phenyl of 4-C1～C12,1-naphthyl, 2-naphthyl etc.As aryloxy group, can enumerate phenol oxygen base.As polycyclic compound, can enumerate the 2-thienyl, 2-pyrrole radicals, 2-furyl, 2-, 3-or 4-pyridine radicals etc.This type of substituent number closes the structure of recurring unit and difference with the molecular weight of this high molecular fluorescent body, but from will obtaining the viewpoint of the high high molecular fluorescent body of dissolubility, per molecule amount 600 corresponding more than one this type of substituting group for well.

Above-mentioned high molecular fluorescent body can be at random, and piece or graft polymers also can be the macromolecules with their intermediate structure, for example with the randomcopolymer of bulk.Consider from the viewpoint of the high high molecular fluorescent body of the quantum yield that will obtain fluorescence, the randomcopolymer of band bulk, bulk or graft polymers are than randomcopolymer is good completely.And the organic EL of formation is to utilize fluorescence from film, so this high molecular fluorescent body uses the material of the fluorescence with solid state.

When this high molecular fluorescent body was used solvent, suitable had, chloroform, carrene, dichloroethanes, oxolane, toluene, xylyl etc.Relevant with the structure and the molecular weight of high molecular fluorescent body, but normally more than this kind solvent solubilized 0.1wt%.

Above-mentioned high molecular fluorescent body, its molecular weight is 10 with polystyrene conversion ³～10 ⁷For good, their degree of polymerization becomes with repetitive structure and its ratio.Consider film forming, the sum of repetitive structure generally 4～10000 for well, is more preferably 5～3000, and preferably 10～2000.

The synthetic method of such high molecular fluorescent body is not particularly limited, for example by arlydene in conjunction with the dialdehyde compounds of two aldehyde radicals and, the Wittig reaction of the  salt that arlydene obtains in conjunction with the compound and the triphenyl phasphine of two halogenation methyl.As other synthetic methods, the dehydrohalogenation method of arlydene in conjunction with the compound of two halogenation methyl arranged.And have from arlydene in conjunction with the  salt of the compound of two the halogenation methyl intermediate with alkali polymerization gained, obtain the  salt decomposition method of this high molecular fluorescent body by heat treatment.Any synthetic method is added third compound with the skeleton beyond the inferior virtue by monomer, changes it and has ratio, can change the structure of the contained recurring unit of high molecular fluorescent body that generates, so also can suitably introduce, copolymerization makes the recurring unit shown in the chemical formula (1) at 50 moles more than the %.In them, the method for Wittig reaction, on the viewpoint of the control of reaction and yield better.

Specify the synthetic method of the inferior vinyl copolymer of arlydene of an example of above-mentioned high molecular fluorescent body more.For example, when obtaining the high molecular fluorescent body, earlier at two (halogenation methyl) compound by the Wittig reaction, more specifically as 2,5-two octyloxies-p-xylyl dibromide in the dinethylformamide solvent, forms  salt with the triphenyl phasphine reaction at N, with it and dialdehyde compounds, concrete as terephthalaldehyde etc., in ethanol, carrying out Wittig with the lithium ethylate reacts condensation, inferior phenylethylene base and 2 have been obtained containing, the high molecular fluorescent body of 5-two octyloxies-p-phenylene vinylidene.At this moment, copolymer reaction makes more than 2 kinds  salt and/or dialdehyde compounds more than 2 kinds in order to obtain.

When this type of high molecular fluorescent body was used for the formation material of luminescent layer, its purity can influence the characteristics of luminescence, so after preferably synthetic, re-refine, carried out purification process with chromatography.

As the material that forms of the luminescent layer that forms by above-mentioned high molecular fluorescent body, show whole colors in order to reach, use red, green, blue three-colour light-emitting layer material, each freedom fixed one-tenth graphics device (ink discharge device) be mapped to the pixel A R of predetermined location, become figure.

Above-mentioned luminescent substance also can use main material to add the material of the form of guest materials.

This type of luminescent material just like macromolecule organic and low molecular material, has the material that contain fluorchrome and phosphorus for the characteristics of luminescence that change gained luminescent layer to be fit to use as guest materials as the main material material.

As macromolecular organic compound, the situation of the material that dissolubility is low, behind the coating precursor, by being heating and curing shown in following chemical formula (3), can generate and make common Yoke is the luminescent layer of macromolecule EL layer.For example, presoma is the situation of  salt, breaks away from by heat treated  base, and becoming common Yoke is macromolecular organic compound.

And, the situation of the material that dissolubility is high, directly behind the coating material, removing desolvates just can become luminescent layer.

[changing 2]

Above-mentioned macromolecular organic compound is a solid, has hyperfluorescence, can form the solid ultrathin membrane of homogeneous.And forming can be high, and with the adherence height of ITO electrode, forming firm common Yoke after solidifying is polymeric membrane.

Such macromolecular organic compound, with the inferior ethene of poly (arylene ether) for well.Inferior ethene water soluble series solvent of poly (arylene ether) or organic solvent, the modulation of the coating fluid when being coated with on the 2nd matrix 11 is easy, and polymerizableization under the certain condition, so can obtain the high film of quality on the optics.

As the inferior ethene of this type of poly (arylene ether), can enumerate PPV (poly-(right-the Ya phenylethylene)), MO-PPV (poly-(2,5-dimethoxy-1, the inferior phenylethylene of 4-)), CN-PPV (poly-(2, the two own Oxy-1s of 5-, the inferior benzene of 4--(the inferior ethene of 1-cyanogen))), MEH-PPV (poly-[2-methoxyl group-5-(2 '-ethyl hexyl oxy)]-right-Ya phenylethylene) waits the PPV derivative, PTV (poly-(2, the inferior ethene of 5-ethylidene)) wait poly-(alkylthrophene), PFV (poly-(2, the inferior furans of 5-Asia ethene)), poly-(to inferior benzene), poly alkyl fluorene etc., wherein also with the material that forms by PPV or PPV derivative precursor shown in chemical formula (4) and, the poly alkyl fluorene shown in chemical formula (5) (concrete poly alkyl fluorene based copolymer shown in chemical formula (6)) is for well.

PPV etc. are, have hyperfluorescence, and the pi-electron that forms two keys is the electroconductive polymer of non-polarization on polymer chain, so can obtain high performance organic EL.

[changing 3]

[changing 4]

[changing 5]

Outside the above-mentioned PPV film, can form macromolecular organic compound and low molecular material, promptly this example is planted as enumerating that main material uses, quinoline aluminum complex compound (Alq3) and diphenylethyllene ethene and with BeBq2 shown in the chemical formula (7) and Zn (OXZ) ₂Remove TPD, outside the material that ALO, DPVBi etc. use before, pyrazoline, quinolizine carboxylic acid, perfluor chromene  salt, chromene quinolizine, rubrene, phenanthroline europium complex etc. also can use the organic EL constituent more than a kind or 2 kinds that contains them.

[changing 6]

On the other hand, as the guest materials that makes an addition to this type of main material, can enumerate as above-mentioned fluorchrome and phosphorus.Especially fluorchrome can change the characteristics of luminescence of luminescent layer, as the luminous efficiency of raising luminescent layer, or the effective ways of the change very big wavelength of light absorption (illuminant colour).That is, fluorchrome not merely is the luminescent layer material, also can be used as the dye material of bearing luminous function.For example, can be being that carrier on the macromolecular organic compound molecule is transferred on the fluorchrome molecule in conjunction with the energy of the lasertron that generates again with Yoke altogether.At this moment, luminous by the high fluorchrome molecule generation of fluorescence quantum efficiency, so the electric current quantum efficiency of luminescent layer also increases.Thereby, adding fluorchrome in the formation material by luminescent layer, the luminescent spectrum of luminescent layer also becomes fluorescence molecule simultaneously, so be the effective ways that change illuminant colour.

Said herein electric current quantum efficiency is that the yardstick based on luminous function investigation luminescent properties is defined as follows formula.

The energy of the photon that η E=is emitted/input electrical energy

And, by conversion with the very big wavelength of light absorption of the coating of fluorchrome, can send red, indigo plant, green ternary coloured light, its result can obtain panchromatic demonstration body.

And, by fluorchrome is coated with, can significantly improve the luminous efficiency of organic EL.

As fluorchrome, form the situation of the luminescent layer that sends the emitting red light look, use the DCM-1 of laser pigment, or rhodamine (rhodamine) or rhodamine derivative, bengllu etc.By this type of fluorchrome is coated main materials such as PPV, therefore can form luminescent layer, but the class fluorchrome mostly is water-soluble, coat water-soluble PPV precursor  salt after, carry out heat treated and just may form more uniform luminescent layer.This type of fluorchrome specifically can be enumerated rhodamine B, rhodamine B host, and rhodamine 6G, rhodamine 101 perchlorates etc., the material more than 2 kinds that mixes them is also passable.

The situation of the luminescent layer of green emitting look is sent in formation, uses quinacridine, rubrene, and DCJT and derivative thereof are for well.About this type of fluorchrome, identical with above-mentioned fluorchrome, by coating main materials such as PPV, can form luminescent layer, therefore but the class fluorchrome mostly is water-soluble, coat water-soluble PPV precursor  salt after, carry out heat treated and just may form more uniform luminescent layer.

The situation of the luminescent layer of blue-light-emitting look is sent in formation, uses diphenylethyllene benzene and derivative thereof for well.About this type of fluorchrome, also identical with above-mentioned fluorchrome, by coating main material material such as PPV, can form luminescent layer, therefore but the class fluorchrome mostly is water-soluble, coat water-soluble PPV precursor  salt after, carry out heat treated and just may form more uniform luminescent layer.

Other fluorchromes with blue-light-emitting look can be enumerated coumalin (coumalie) and derivative thereof.This type of fluorchrome, good with the intermiscibility of PPV, easily form luminescent layer.Coumalin especially wherein, itself is insoluble to solvent, but increases its dissolubility by suitable selection substituting group, becomes to dissolve in solvent.This type of fluorchrome specifically can be enumerated coumalin-1, coumalin-6, coumalin-7, coumalin 120, coumalin 138, coumalin 152, coumalin 153, coumalin 311, coumalin 314, coumalin 334, coumalin 337, coumalin 343 etc.

Fluorchrome with different blue-light-emitting looks can be enumerated tetraphenylbutadiene (TPB) or TPB derivative, DPVBi etc.This type of fluorchrome with identical water-soluble solution such as above-mentioned red fluorescence pigments, and well easily forms luminescent layer with the intermiscibility of PPV.

For above fluorchrome, of all kinds a kind of usefulness is also passable, and mixed the use also can more than 2 kinds.

This type of fluorchrome can use shown in the chemical formula (8), shown in the chemical formula (9), the material shown in the chemical formula (10).

[changing 7]

[changing 8]

[changing 9]

This type of fluorchrome for by above-mentioned altogether Yoke being the main material material that macromolecular organic compound etc. forms, adds 0.5～10Wt% for well with method described later, and 1.0～5.0Wt% is better in interpolation.The addition of fluorchrome is too much, is difficult to keep the weatherability and the durability of luminescent layer, and on the other hand, addition is very few, and is above-mentioned insufficient because of adding the effect that fluorchrome obtains.

And, make an addition to the phosphorus of making the object material of main material material, be fit to use the Ir (PPy) shown in the chemical formula (11) ₃, Pt (thpy) ₂, PtOEP etc.

[changing 10]

When the phosphorus shown in the preceding note chemical formula (11) is made the object material,, especially be fit to use the CBP shown in the chemical formula (12), DCTA, TCPB, DPVBi, Alq3 as the main material material.

Above-mentioned fluorchrome closes phosphorus, also can make an addition to the main material material as guest materials together.

[changing 11]

By such main body/object is that luminescent substance is when forming luminescent layer 60, becoming graphics device (ink discharge device) to form material supplying systems such as a plurality of nozzles in advance, by main material material and guest materials being sprayed simultaneously by predefined amount ratio, can form luminescent layer 60 from nozzle.

Luminescent layer 60, the operation same with the formation method of hole injection/transfer layer 70 forms.That is, after the constituent printing ink that will contain the luminescent layer material with ink-jet method is sprayed onto above the hole injection/transfer layer 70,, be formed at formation luminescent layer 60 on the hole injections/transfer layer 70 of peristome 221a inside of the 3rd insulating barrier 221 by carrying out dried and heat treatment.Because the constituent printing ink of ejection is repelled in the zone that oleophobic China ink was handled, though droplets of ink from fixed ejection position deviation, the droplets of ink of being repelled still rolls in the peristome 221a of the 3rd insulating barrier 221.

Electron supplying layer 50 is formed on above the luminescent layer 60.The electron supplying layer 50 also formation method with luminescent layer 60 is identical, is formed by ink-jet method.Formation material as electron supplying layer 50, be not particularly limited, can enumerate the  oxadiazole derivative, anthraquinone bismethane and derivative thereof, benzoquinones and derivative thereof, naphthoquinones and derivative thereof, anthraquinone and derivative thereof, four cyanogen anthraquinone bismethane and derivatives thereof, fluorene derivative, hexichol two acrylonitriles and derivative thereof, diphenol quinone derivative, the metal complex of oxine and derivative thereof etc.Specifically, the same with the formation material of previous hole transporting layer, be fit to use the spy to open clear 63-70257 number, with the 63-175860 communique, Te Kaiping-No. 2135359, with 2-135361 number, with 2-209988 number, with 3-37992 number, the example with the 3-152184 communique is put down in writing especially is fit to use 2-(4-biphenyl)-5-(4-tert-butyl benzene)-1,3,4- diazole, benzoquinones, three (8-chinol) aluminium.

The formation material mixing of the formation material of above-mentioned hole injection/transfer layer 70 and the formation material of electron supplying layer 50 and luminescent layer 60, forming the material use as luminescent layer also can, at this moment, hole injection/transfer layer forms the use amount of material and electron supplying layer formation material, the difference with the classes of compounds of using, but to consider not disturb the weight range of the sufficient film forming and the characteristics of luminescence suitably to depend on.Usually, luminescent layer formation material is 1～40 weight % relatively, is more preferably 2～30 weight %.

Hole injection/transfer layer 70 and electron supplying layer 50 etc. are not limited to ink-jet method, also availablely shelter vapour deposition method and form.

Negative electrode 222 is, on the whole surface of electron supplying layer 50 and the 3rd insulating barrier 221, or forms with striated.Negative electrode 222, preferably by Al, Mg, Li, the alloy material of monomer material and Mg: Ag such as Ca (10: 1 alloys) forms one deck, but also can be with metal (comprising alloy) the layer formation of 2 layers and 3 layers.Specifically, also can use LiO ₂(about 0.5nm)/Al and LiF (about 0.5nm)/Al, MgF ₂The laminated structure of/Al.Negative electrode 222 is the films that formed by above-mentioned metal, light-permeable.

Sealant 20 is that the intrusion for organic EL blocking outside atmosphere forms covering barrier layer 285 and negative electrode 222 surfaces.Material as constituting sealant 20 can use pottery and silicon nitride, oxidized silicon nitride, and silica etc., and also sealant 20 is to form with the same method of the 1st interlayer insulating film 283.Sealant 20 is used to constitute also effective with the same material in barrier layer 285.

As above explanation, TFT22 is between 24 individual electrode, and each distribution (for example, scan line 131, the holding wire 132 that are connected with these electrodes, illuminating power supply wiring 133 etc.) be provided with the dielectric film that forms by low-k between, so can reduce between each electrode and the parasitic capacitance of each distribution generation.Thus, can guarantee to supply to TFT22, the insulation of 24 drive signal, accurately driven for emitting lights layer 60.And, because parasitic capacitance diminishes, can allow the TFT22 of drive signal of higher frequency, 24 carry out work.

Particularly, by the common electrode (at above-mentioned negative electrode 222) of relative pixel electrode etc. fixedly the regulation current potential electrode or distribution, holding wire or scan line etc., supply with between the signal wiring of the signal of telecommunication that changes low-dielectric constant layer be set, electric capacity can be reduced, and the problem of the signal weakening of the signal of telecommunication or hysteresis etc. can be overcome this signal wiring.

Therefore, board, electric optical device 1 can be realized the stability of demonstration work and large-scale (big picture) change of viewing area.

And, by forming barrier layer 285 covering TFT22,24, can prevent by metal ingredient, the gas in the atmosphere, the deterioration of the active element that intrusion took place of moisture etc., board, electric optical device 1 can be realized demonstration work steady in a long-term.

Particularly, above-mentioned low-dielectric constant layer is porous, the intrusion of the gas moisture in metal ingredient, the atmosphere etc. causes deterioration easily, so by (for example in the generation source of above-mentioned deterioration factor, negative electrode 222) configuration barrier layer and low dielectric constant layer and between the active element can receive simultaneously that the signal that reduces the signal of telecommunication lowers or effect that lags behind and the effect that makes the board, electric optical device long-term stability.

In addition, by forming the sealant 20 of covered cathode 222 tops, can prevent from metal ingredient that the outside of luminescent layer 20 is immersed, gas, moisture etc. the atmosphere, and can prevent the deterioration of negative electrode 222 and luminescent layer 60, make board, electric optical device 1 realize display action steadily in the long term.

Among the last note embodiment, low dielectric materials such as the 1st interlayer insulating film 283, the 2 interlayer insulating films 284 each personal porous plastid form, but need not form with low dielectric material all, and one deck at least wherein forms with low dielectric material and gets final product.

In the present embodiment, on the 1st interlayer insulating film 283, form barrier layer 285, but formation also can reach same effect on the 2nd interlayer insulating film 284.

The configuration on appropriate combination barrier layer 285 and, form the material category of the 1st interlayer insulating film 283 and the 2nd interlayer insulating film 284, can constitute board, electric optical device 1.

Remove above-mentioned hole injection/transfer layer 70, luminescent layer 60 outside the electron supplying layer 50, also can add all risk insurance sheath, is formed at counter electrode 222 sides of luminescent layer 60, seeks the long lifetime of luminescent layer 60.As the formation material of this type of all risk insurance sheath, use the BCP shown in chemical formula (13), the BAlq shown in the chemical formula (14), but consider that the words BAlq of long lifetime is better.

[changing 12]

[changing 13]

Below, the electronic equipment with board, electric optical device of the foregoing description is described.

Fig. 4 is the oblique view that shows mobile phone one example.Among this figure, the body of symbol 1000 expression mobile phones, the display part of going up the note board, electric optical device is used in symbol 1001 expressions.

Fig. 5 is the oblique view that shows Wristwatch-type electronic equipment one example.Among this figure, symbol 1100 expression table bodies, the display part of going up the note board, electric optical device is used in symbol 1101 expressions.

Fig. 6 is the display text processor, the oblique view of an example of portable information processing unit such as PC.Among this figure, symbol 1200 expression information processing devices, input parts such as symbol 1202 expression keyboards, symbol 1204 expression information processing device bodies, the display part of going up the note board, electric optical device is used in symbol 1206 expressions.

Fig. 4～electronic equipment shown in Figure 6 has the board, electric optical device of going up note embodiment, so can reduce wiring closet and interelectrode parasitic capacitance, can realize showing the electronic equipment of working stability.

Technical scope of the present invention be not limited to the note embodiment, do not break away from aim of the present invention scope that can carry out various changes.For example, on remember among the embodiment, as the formation of organic EL, clamp luminescent layer and hole transporting layer with pair of electrodes, but also can insert the electron supplying layer beyond luminescent layer and the hole transporting layer, hole injection layer, electron injecting layer etc. have the organic layer of various functions.In addition, the concrete material of being given an example among the embodiment etc. only is an example, also can suitably change.

Luminescent layer 60 in the formation of the display unit 1 of present embodiment can change other optics demonstration materials such as liquid crystal layer into.

In the present embodiment, the so-called back emitted type of substrate 2 side-draw light from the TFT 22,24 of configuration display unit 1 is illustrated, but is not limited thereto, it also can be display unit from the so-called front end emission type of getting light of tossing about of the substrate 2 of the TFT 22,24 of configuration display unit 1.

According to the present invention, because of between the electrode that contains active element, or the dielectric film of the wiring closet that is connected with this electrode of insulation, the dielectric film that the insulating material of the following dielectric constant of definite value forms by having can reduce between electrode or the parasitic capacitance of wiring closet generation.Thus, can guarantee to supply to the insulation between the drive signal of each active element, and can accurately drive electrical optical elements by each active element.And, because parasitic capacitance diminishes, can allow each active element of drive signal of higher frequency carry out work.Thereby, can carry out stable demonstration work, realize the maximization of the board, electric optical device of viewing area.

In addition, if form the protective layer (the 1st protective layer) to cover active element, can prevent that then the intrusions such as gas, moisture in metal ingredient, the atmosphere from causing the deterioration of active element, and can realize making steadily in the long term circuit board and board, electric optical device work.

And; if form the 2nd protective layer with covered cathode, can prevent outside metal ingredient, the gas in the atmosphere for electrical optical elements; the deterioration of the caused electrical optical elements of intrusion of moisture etc., the board, electric optical device that can realize carrying out lasting stability demonstration work.

Claims (29)

1, a kind of circuit board, it is characterized in that: contain the insulating properties substrate, be disposed at described substrate active element, supply with to drive the electric signal of described active element or drive the driving electric of described active element distribution, the 1st dielectric film, be formed at the 2nd dielectric film of described the 1st dielectric film and be formed at the electrode of described the 2nd dielectric film, by being connected with the contact hole that described the 2nd dielectric film is provided with across described the 1st dielectric film, the dielectric constant of the described substrate of permittivity ratio of described the 1st dielectric film is low at least for described active element and described electrode.

2, a kind of circuit board, it is characterized in that: contain the insulating properties substrate, be disposed at the active element of described substrate, supply with electric signal that drives described active element or the distribution that drives the driving electric of described active element, the 1st dielectric film, be formed at the 2nd dielectric film and the electrode that is formed at described the 2nd dielectric film of described the 1st dielectric film, described active element is a transistor, by being connected with described electrode with the contact hole that described the 2nd dielectric film is provided with across described the 1st dielectric film, the dielectric constant of the described substrate of permittivity ratio of described the 1st dielectric film is low at least for the semiconductor film that comprises in the described transistor.

3, circuit board according to claim 1 and 2 is characterized in that: also contain the 3rd dielectric film that is arranged between described circuit board and described the 1st dielectric film.

4, according to any described circuit board of claim 1-3, it is characterized in that: the dielectric constant of described the 1st dielectric film is below 3.

5, according to any described circuit board of claim 1-4, it is characterized in that: the dielectric constant of described the 1st dielectric film is below 2.5.

6, according to any described circuit board of claim 1-5, it is characterized in that: also comprise the 4th dielectric film that is provided with between described the 2nd dielectric film and the described electrode.

7, according to any described circuit board of claim 1-6, it is characterized in that: the insulating material that described the 1st dielectric film is comprised is at least one among porous plastid, aeroge, porous matter silica, magnesium fluoride, fluorine based polymer, the porous polymer.

8, according to any described circuit board of claim 1-7, it is characterized in that: the insulating material that described the 1st dielectric film is comprised is the spin glass that contains quartz glass, alkyl siloxane polymer, alkyl silsesquioxane polymer, hydrogenation alkyl silsesquioxane polymer, polyaryl ether arbitrarily, diamond film, at least a in the fluorinated amorphous body carbon element film.

9, according to any described circuit board of claim 1-8, it is characterized in that: described the 1st dielectric film contains to be decided material to some extent and adds at least a in inorganic fine particles and the organic particle.

10, circuit board according to claim 9 is characterized in that: described the 1st dielectric film contains the atomic colloid of disperseing magnesium fluoride.

11, according to any described circuit board of claim 1-10, it is characterized in that: described the 2nd dielectric film covers described active element.

12, according to any described circuit board of claim 1-11, it is characterized in that: described the 2nd dielectric film contains at least a in drier and the chemosorbent.

13, according to any described circuit board of claim 1-12, it is characterized in that: described the 2nd dielectric film contains at least a in described pottery, silicon nitride, oxidized silicon nitride, the silica.

14, according to any described circuit board of claim 1-13, it is characterized in that: described the 2nd dielectric film contains at least a in boron, carbon, nitrogen, aluminium, phosphorus, silicon, cerium, ytterbium, samarium, erbium, yttrium, lanthanum, gadolinium, dysprosium, neodymium, oxygen, barium monoxide, calcium oxide, active carbon and the zeolite.

15, circuit board according to claim 6 is characterized in that: the dielectric constant of described the 4th dielectric film is below 4.

16, circuit board according to claim 6 is characterized in that: the dielectric constant of described the 4th dielectric film is below 3.5.

17, a kind of board, electric optical device is characterized in that: any described circuit board and electrical optical elements with claim 1-16.

18, a kind of board, electric optical device, it is characterized in that: contain substrate, be arranged at the 1st electrode and the electrical optical elements between the 2nd electrode that are formed on described substrate, be arranged at the 1st dielectric film between described the 1st electrode and the described substrate, be formed at the 2nd dielectric film between described the 1st electrode and the described substrate, be arranged at the 3rd dielectric film between described the 1st dielectric film and the described substrate, the dielectric constant of described the 1st dielectric film is below 4.

19, a kind of board, electric optical device, it is characterized in that: contain substrate, be arranged on the 1st electrode and the electrical optical elements between the 2nd electrode that are formed on the described substrate, be arranged on the 1st dielectric film between described the 1st electrode and the described substrate, be formed at the 2nd dielectric film between described the 1st dielectric film and described the 1st electrode, be configured in the 3rd dielectric film between described the 1st dielectric film and the described substrate, the dielectric constant of described the 1st dielectric film is below 3.

20, according to claim 18 or 19 described board, electric optical devices, it is characterized in that: also contain the active element that drives described electrical optical elements.

21, board, electric optical device according to claim 20 is characterized in that: described the 2nd dielectric film is protected described active element from movable plasma or moisture.

22, according to any described board, electric optical device of claim 18-21, it is characterized in that: described the 2nd dielectric film contains in drier and the chemosorbent at least a.

23, according to any described board, electric optical device of claim 18-22, it is characterized in that: described the 2nd dielectric film is by at least a the forming in pottery, silicon nitride, oxidized silicon nitride, the silica.

24, according to any described board, electric optical device of claim 18-23, it is characterized in that: described the 2nd dielectric film contains at least a in boron, carbon, nitrogen, aluminium, phosphorus, silicon, cerium, ytterbium, samarium, erbium, yttrium, lanthanum, gadolinium, dysprosium, neodymium, oxygen, barium monoxide, calcium oxide, active carbon and the zeolite.

25, according to any described board, electric optical device of claim 18-24, it is characterized in that: described electrical optical elements is an organic electroluminescent component.

26, according to any described board, electric optical device of claim 18-25, it is characterized in that: also comprise the sealant that is formed at described the 2nd electrode, described sealant is by at least a the forming in pottery, silicon nitride, oxidized silicon nitride, the silica.

27, according to any described board, electric optical device of claim 18-25, it is characterized in that: described the 2nd electrode has diaphragm.

28, board, electric optical device according to claim 27 is characterized in that: described diaphragm contains at least a in drier and the chemosorbent.

29, according to any described board, electric optical device of claim 18-28, it is characterized in that: the light that described electro optical element sends is fetched into outside the described board, electric optical device from described substrate one side.

30, a kind of electronic equipment is characterized in that: have any described circuit board of claim 1-16, perhaps have any described board, electric optical device of claim 17-29.

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