CN1923711A - Method of eliminating lead from nickel chloride solution - Google Patents
Method of eliminating lead from nickel chloride solution Download PDFInfo
- Publication number
- CN1923711A CN1923711A CN 200610152789 CN200610152789A CN1923711A CN 1923711 A CN1923711 A CN 1923711A CN 200610152789 CN200610152789 CN 200610152789 CN 200610152789 A CN200610152789 A CN 200610152789A CN 1923711 A CN1923711 A CN 1923711A
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- China
- Prior art keywords
- resin
- chloride solution
- nickel chloride
- lead
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
The invention discloses a lead removing method in the nickel chloride solution through resin, which makes nickel chloride solution and D318 resin exchange ion to remove lead.
Description
Technical field
A kind of method of eliminating lead from nickel chloride solution relates to the method for removing impurity in a kind of chlorination medium, particularly removes method plumbous in the nickel chloride solution with resin.
Background technology
Usually adopt the chemical precipitation method deleading in the traditional technology, but this method is only applicable to the higher solution of lead content, and post precipitation still has a spot of lead (about 0.2g/l) to exist in solution, influence the quality of the finished product.Existing degree of depth method for removing lead adopts ion exchange resin usually, and FPA90, the FPA98 resin deleading effect in nickel chloride solution is bad, does not reach the production needs; The deleading of D363, D296 resin can produce a desired effect, but capacity is little, and qualifying liquid only is the twice of resin volume; D318, D331 resin capacity are big, and effect is better, but the D331 resin regeneration is when handling, and when adopting washing or washing back use acid treatment, effect is all undesirable, and regeneration is difficult, so D331 should not operate.
Summary of the invention
Purpose of the present invention is exactly the deficiency that exists at above-mentioned prior art, and a kind of method that can effectively reduce the lead in the nickelous chloride production system is provided.
The objective of the invention is to be achieved through the following technical solutions.
A kind of method of eliminating lead from nickel chloride solution is characterized in that nickel chloride solution and D318 resin carry out ion exchange lead removal.
The D318 resin is a Zeo-karb, and when nickel chloride solution process resin-column, lead ion in the solution and the hydrogen ion in the resin exchange, and the lead ion in the solution is adsorbed on the resin, thereby reaches the effect that reduces plumbum ion concentration in the solution.Lead can be reduced to below the 0.08g/l through the nickel chloride solution behind the D318 resin deleading.
The parsing of D318 resin is divided into washes nickel and two processes of regeneration, wash HCL solution that nickel adopts 0.1mol/L with 3 times of resin volumes/hour flow velocity through ion exchange column, the time of carrying out this operation is 2 hours; Use pure water or water of condensation during regeneration, with 4 times of resin volumes/hour flow velocity by resin-column, regeneration in 2 hours finishes.
The inventive method has realized the purpose of deleading from nickel chloride solution, makes that lead content satisfies the accuracy electroplate requirement in the nickelous chloride finished product.Resin regeneration is easy, and cost is low, can not cause environmental pollution.
Embodiment
A kind of method of nickel chloride solution resin deleading, sodium hydroxide solution with 4N passes through resin-column earlier, is alkalescence until solution, uses the pure water washing resin to neutral then, hydrochloric acid soln washing resin with 4N is acid until effusive solution again, uses the pure water washing resin to neutral again.With purify good nickel chloride solution with 1 times of resin volume/hour flow velocity by ion exchange column, the lead ion in the solution is adsorbed, adsorption cycle is 8 hours.After absorption finishes, the deleading resin is washed nickel operation, the HCL solution of 0.1mol/L with 3 times of resin volumes/hour flow velocity through ion exchange column, the time of carrying out this operation is 2 hours.The resin of washing behind the nickel will carry out regenerative operation, uses pure water or water of condensation during regeneration, with 4 times of resin volumes/hour flow velocity by resin-column, 2 hours these EOs, regeneration finishes.
Embodiment 1
Carry out ion-exchange through pretreated D318 resin and nickel chloride solution, nickel chloride solution is with the flow velocity process resin-column of 1 times of resin volume, and adsorption cycle is 8 hours.Wash the nickel operation then, the hydrochloric acid soln of 0.1mol/L approximately through two hours, is washed the nickel end of processing with the flow velocity process resin-column of 3 times of resin volumes.At last resin is regenerated, pure water is used in resin regeneration, and through resin-column, resin regeneration in about 2 hours finishes with 4 times of resin volumetric flow rates.
Liquid contrast g/l behind liquid, the deleading before the deleading
Liquid before the deleading | Liquid behind the deleading | Liquid before the deleading | Liquid behind the deleading |
0.065 | 0.0072 | 0.039 | 0.024 |
0.031 | 0.034 | 0.024 | 0.025 |
0.036 | 0.012 | 0.056 | 0.015 |
0.039 | 0.0024 | 0.078 | 0.042 |
0.030 | 0.019 | 0.0090 | 0.036 |
0.047 | 0.032 | 0.022 | 0.0017 |
0.026 | 0.0030 | 0.044 | 0.0065 |
0.034 | 0.0081 | 0.047 | 0.011 |
0.054 | 0.016 | 0.040 | 0.043 |
0.040 | 0.0044 | 0.0036 | 0.026 |
0.033 | 0.011 | 0.050 | 0.0082 |
0.038 | 0.0038 | 0.051 | 0.066 |
0.0072 | 0.0016 | 0.047 | 0.041 |
0.037 | 0.015 | 0.035 | 0.043 |
0.082 | 0.0017 |
Claims (1)
1. the method for an eliminating lead from nickel chloride solution is characterized in that nickel chloride solution and D318 resin carry out ion exchange lead removal.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 200610152789 CN1923711A (en) | 2006-09-29 | 2006-09-29 | Method of eliminating lead from nickel chloride solution |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 200610152789 CN1923711A (en) | 2006-09-29 | 2006-09-29 | Method of eliminating lead from nickel chloride solution |
Publications (1)
Publication Number | Publication Date |
---|---|
CN1923711A true CN1923711A (en) | 2007-03-07 |
Family
ID=37816560
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 200610152789 Pending CN1923711A (en) | 2006-09-29 | 2006-09-29 | Method of eliminating lead from nickel chloride solution |
Country Status (1)
Country | Link |
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CN (1) | CN1923711A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100554168C (en) * | 2007-09-07 | 2009-10-28 | 金川集团有限公司 | A kind of method of removing iron from nickel chloride leachate |
CN106587178A (en) * | 2016-12-21 | 2017-04-26 | 金川集团股份有限公司 | Zinc removing method of nickel chloride solution |
CN110812888A (en) * | 2019-10-23 | 2020-02-21 | 金川集团股份有限公司 | Method for removing silicon by nickel solution adsorption |
-
2006
- 2006-09-29 CN CN 200610152789 patent/CN1923711A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100554168C (en) * | 2007-09-07 | 2009-10-28 | 金川集团有限公司 | A kind of method of removing iron from nickel chloride leachate |
CN106587178A (en) * | 2016-12-21 | 2017-04-26 | 金川集团股份有限公司 | Zinc removing method of nickel chloride solution |
CN110812888A (en) * | 2019-10-23 | 2020-02-21 | 金川集团股份有限公司 | Method for removing silicon by nickel solution adsorption |
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PB01 | Publication | ||
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SE01 | Entry into force of request for substantive examination | ||
C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
WD01 | Invention patent application deemed withdrawn after publication |