CN1916796A - System and method for controlling batches in layers of reaction chamber - Google Patents
System and method for controlling batches in layers of reaction chamber Download PDFInfo
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- CN1916796A CN1916796A CN 200510092053 CN200510092053A CN1916796A CN 1916796 A CN1916796 A CN 1916796A CN 200510092053 CN200510092053 CN 200510092053 CN 200510092053 A CN200510092053 A CN 200510092053A CN 1916796 A CN1916796 A CN 1916796A
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- 238000006243 chemical reaction Methods 0.000 title claims abstract description 137
- 238000000034 method Methods 0.000 title claims description 46
- 230000008569 process Effects 0.000 claims description 32
- 238000012216 screening Methods 0.000 claims description 13
- 230000005540 biological transmission Effects 0.000 claims description 10
- 239000011229 interlayer Substances 0.000 abstract 1
- 238000005516 engineering process Methods 0.000 description 12
- 235000012431 wafers Nutrition 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 238000010276 construction Methods 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 238000004891 communication Methods 0.000 description 3
- 238000011161 development Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000004886 process control Methods 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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Abstract
A batch control system of reaction chamber interlayer comprises a machine with multiple reactors and an information unit. It is featured as utilizing said information unit to calculate out optimum control parameter for each reaction chamber on machine and to select out executable parameter according to executable state of reaction chamber as well as to transmit result to said machine with reaction chambers in parallel mode or in serial mode.
Description
Technical field
The present invention is relevant for control system and method thereof between a kind of batch, and particularly relevant for a kind of reaction chamber level batch between control system and method thereof.
Background technology
Development along with the semiconductor manufacturing industry, its chip area day by day increases, electronic component then dwindles day by day, process control has accurately become a necessary technology, reach process control accurately and must rely on infosystem, factory operation control system (Manufacturing Execution System for example, MES) promptly often be applied to the high semiconductor manufacturing industry of production procedure variability, for improving the board usage ratio of equipment, can utilize factory's operation control system to collect and make on-the-spot various data, the go forward side by side arrangement and the analysis of line data are to provide the supvr information correctly and timely.In addition, because the wearing and tearing of accumulating over a long period or the accumulation of material, many processes produce unavoidable variation, the controlled variable and the process prescription of board equipment adjusted in control (Run-to-Run control) between can utilizing batch this moment, with eliminate or disturbing factor such as minimizing process skew to influence that wafer was caused, control technology has become a kind of important technology of making efficient and workmanship that improves at present, batch.
Known reactions chamber level batch between control (chamber level Run-to-Run control) technology have following shortcoming, be that factory's operation control system can't be written into suitable controlled variable according to the state of board equipment reaction chamber, and, board equipment can't receive extra controlled variable from factory's control system of operating, so, cause board equipment must use same controlled variable in all reaction chambers with a plurality of reaction chambers, and cause this board equipment adopt the reaction chamber level batch between control technology when carrying out production operation, only can adopt parallel schema process (parallel mode process), and can't adopt serial mode process (serial mode process), yet the output efficiency of serial mode process is high than the parallel schema process.
How to make the reaction chamber level batch between control technology adopted the serial mode process, to improve the throughput rate that semiconductor is made, be a subject of development of control technology between present batch.
Summary of the invention
Purpose of the present invention be exactly provide a kind of reaction chamber level batch between control system, overcome the problem that known technology can't be applied to the serial mode process, to improve the throughput rate that semiconductor is made.
A further object of the present invention provide a kind of reaction chamber level batch between control method, in order to control a board equipment, make this board equipment be able to application response chamber level batch between control technology in a serial mode process, and then improve the throughput rate that semiconductor is made.
The present invention propose a kind of reaction chamber level batch between control system, it comprises: a board equipment and an infosystem, this board equipment has a plurality of reaction chambers, this infosystem and this board equipment room have one first data link, this infosystem is for each this reaction chamber, calculate its reaction chamber controlled variable, and whether be in executable state according to these a plurality of reaction chambers, but in these a plurality of reaction chamber controlled variable, filter out at least one execution parameter, but by this first data link transmit should execution parameter and at least one prescription of carrying out to this board equipment.
According to the described reaction chamber level of preferred embodiment of the present invention batch between control system, wherein this infosystem for example is to comprise controller module between factory operation control system module and a batch, this factory operation control system module has one second data link between controller module between therewith batch, and controller module comprises parameter screening module between this factory's operation control system module or this batch.
The present invention propose a kind of reaction chamber level batch between control method, in order to control a board equipment, this board equipment has a plurality of reaction chambers, this control method comprises: the status information that obtains these a plurality of reaction chambers; For each this reaction chamber, calculate its reaction chamber controlled variable; Whether be in executable state according to this a plurality of reaction chambers, but screen these a plurality of reaction chamber controlled variable and produce at least one execution parameter; Whether be in executable state according to these a plurality of reaction chambers, select at least one prescription of carrying out; And but execution parameter is somebody's turn to do in transmission and this can carry out prescription to steps such as this board equipment.
Based on described, control system of the present invention and method thereof are for each this reaction chamber, calculate its reaction chamber controlled variable, and whether be in executable state according to these a plurality of reaction chambers, screen this a plurality of reaction chamber controlled variable, select at least one prescription of carrying out, make the differential responses chamber can adopt different controlled variable, so application response chamber level batch between control technology in a serial mode process.
For described and other purposes, feature and advantage of the present invention can be become apparent, preferred embodiment cited below particularly, and conjunction with figs. are described in detail as follows.
Description of drawings
Fig. 1 represent reaction chamber level of the present invention batch between the control system structural drawing.
Fig. 2 represent reaction chamber level of the present invention batch between the control method process flow diagram.
Fig. 3 represents the system construction drawing of a preferred embodiment of the present invention.
Fig. 4 represents the system construction drawing of another preferred embodiment of the present invention.
The main element symbol description
10: board equipment
11: the first reaction chambers
12: the second reaction chambers
20: infosystem
21: factory's operation control system module
211: parameter screening unit
22: controller module between batch
221: parameter screening unit
31: the first data link
32: the second data link
Step S2: the step that obtains the status information of reaction chamber
Step S4:, calculate the step of its optimized reaction chamber controlled variable for each reaction chamber
Step S6: whether be in executable state according to reaction chamber, but screening reaction chamber controlled variable and produce the step of at least one execution parameter
Step S8: whether be in executable state according to reaction chamber, select at least one step of carrying out prescription
Step S10: but above-mentioned execution parameter and the above-mentioned step of carrying out prescription to this board equipment transmitted
Embodiment
See also Fig. 1, Fig. 1 represent reaction chamber level of the present invention batch between the control system structural drawing, one board equipment 10 has one first reaction chamber 11 and one second reaction chamber 12,10 of one infosystem 20 and board equipment pass through one first data link, 31 mutual Data transmission, first data link 31 for example is to adopt a RS232 connecting line, and employing semiconductor equipment communication standard (SemiconductorEquipment Communication Standard, SECS) mutual Data transmission, or for example be to adopt an Etherloop (Ethernet) circuit, and adopt tcp/ip communication to reach an agreement on and high speed SECS information service (High-Speed SECS Message Services, HSMS) mutual Data transmission.
In the semiconductor process, one produces the manufacturing that batch (lot) comprises a plurality of wafers usually, utilize control system of the present invention, these a plurality of wafers can select to send into first reaction chamber 11, also can select to send into second reaction chamber 12, because of can utilizing first reaction chamber 11 and second reaction chamber 12 simultaneously, this processes, for example first wafer is processed with first reaction chamber 11, second wafer is processed with second reaction chamber 12, after first wafer machines, the 3rd wafer is processed with first reaction chamber 11, by that analogy, that is adopts a serial mode process to process, in addition, also can select to use same reaction chamber to process the wafer that same production is criticized, another is produced the wafer of criticizing and then uses another reaction chamber processing, that is adopts a parallel schema process to process.
See also Fig. 2, Fig. 2 represent reaction chamber level of the present invention batch between the control method process flow diagram, this controlling party genealogy of law is utilized an infosystem 20 controls one board equipment 10, wherein board equipment 10 has one first reaction chamber 11 and one second reaction chamber 12,10 of infosystem 20 and board equipment have one first data link 31, at first, infosystem 20 obtains this a plurality of reaction chambers 11 by first data link 31,12 status information step S2, and the first reaction chamber controlled variable and the second reaction chamber controlled variable step S4 of difference calculating optimumization, then, infosystem 20 is according to these a plurality of reaction chambers 11, whether 12 be in executable state, but screen the above-mentioned first reaction chamber controlled variable and the second reaction chamber controlled variable and produce at least one execution parameter step S6, then, same according to these a plurality of reaction chambers 11, whether 12 be in executable state, select at least one prescription step S8 that carries out, at last, but infosystem 20 transmits above-mentioned execution parameter and above-mentioned the execution filled a prescription to board equipment 10 step S10.
See also Fig. 3, Fig. 3 represents the system construction drawing of a preferred embodiment of the present invention, one board equipment 10 has one first reaction chamber 11 and one second reaction chamber 12, one infosystem 20 comprises controller module 22 between factory operation control system module 21 and a batch, 10 of factory's operation control system module 21 and board equipment pass through one first data link, 31 mutual Data transmission, factory operation control system module 21 and batch between 22 of controller modules have one second data link 32, controller module 22 has parameter screening unit 221 wherein batch, in a process, board equipment 10 transmits a request instruction (request) to factory's operation control system module 21 by first data link 31, the content of this request instruction comprises the status information of first reaction chamber 11 and second reaction chamber 12, afterwards, factory's operation control system module 21 is by second data link, 32 these a plurality of reaction chambers 11 of transmission, 12 status information to batch between controller module 22, then, the first reaction chamber controlled variable and the second reaction chamber controlled variable of controller module 22 difference calculating optimumizations between batch, and according to these a plurality of reaction chambers 11, whether 12 be in executable state, but utilize parameter screening unit 221 to filter out at least one execution parameter, for example the state of first reaction chamber 11 is in executable state, and the state of second reaction chamber 12 is in not executable state, then but to filter out the above-mentioned first reaction chamber controlled variable be execution parameter in parameter screening unit 221, and the above-mentioned second reaction chamber controlled variable is by filtering, then, but controller module 22 transmits above-mentioned execution parameter to factory's operation control system module 21 by second data link 32 between batch, factory's operation control system module 21 is in executable state according to first reaction chamber 11, the prescription of selecting first reaction chamber 11 is for can carry out prescription, but and transmit above-mentioned execution parameter and above-mentioned the execution filled a prescription to board equipment 10 by first data link 31, but board equipment 10 utilized first reaction chamber 11 and carried out process with above-mentioned execution parameter and the above-mentioned prescription of carrying out this moment.
See also Fig. 4, Fig. 4 represents the system construction drawing of another preferred embodiment of the present invention, one board equipment 10 has one first reaction chamber 11 and one second reaction chamber 12, one infosystem 20 comprises controller module 22 between factory operation control system module 21 and a batch, 10 of factory's operation control system module 21 and board equipment pass through one first data link, 31 mutual Data transmission, factory operation control system module 21 and batch between 22 of controller modules have one second data link 32, wherein factory's operation control system module 21 has parameter screening unit 211, in a process, board equipment 10 transmits a request instruction to factory's operation control system module 21 by first data link 31, after, factory operation control system module 21 by second data link 32 transmit another request instructions to batch between controller module 22, the content of these a plurality of request instructions comprises the status information of first reaction chamber 11 and second reaction chamber 12, then, the first reaction chamber controlled variable and the second reaction chamber controlled variable of controller module 22 difference calculating optimumizations between batch, and utilize second data link, 32 above-mentioned first reaction chamber controlled variable of transmission and the above-mentioned second reaction chamber controlled variable to factory's operation control system module 21, factory's operation control system module 21 is utilized parameter screening unit 211, according to these a plurality of reaction chambers 11, whether 12 be in executable state, screen out and be in the not controlled variable of the reaction chamber of executable state, but and keep at least one execution parameter, for example the state of first reaction chamber 11 is in executable state, and the state of second reaction chamber 12 is in not executable state, then parameter screening unit 211 screens out the second reaction chamber controlled variable, but and keep the first reaction chamber controlled variable is execution parameter, then, factory's operation control system module 21 is in executable state according to first reaction chamber 11, the prescription of selecting first reaction chamber 11 is for can carry out prescription, but and transmit above-mentioned execution parameter and above-mentioned the execution filled a prescription to board equipment 10 by first data link 31, but board equipment 10 utilized first reaction chamber 11 and carried out process with above-mentioned execution parameter and the above-mentioned prescription of carrying out this moment.
In sum, control system of the present invention and method thereof are respectively for first reaction chamber 11 and second reaction chamber 12, calculate its optimized reaction chamber controlled variable, and whether be in executable state according to these a plurality of reaction chambers 11,12, screen and transmit above-mentioned reaction chamber controlled variable, because of this controlled variable that can transmit single reactor to board equipment 10, make first reaction chamber 11 have different controlled variable with second reaction chamber 12, so application response chamber level batch between control technology in a serial mode process.
Though the present invention with preferred embodiment openly as above; right its is not that any those skilled in the art are under the situation that does not break away from the spirit and scope of the present invention in order to qualification the present invention; can change and modification, so protection scope of the present invention is as the criterion with the claim institute restricted portion that is proposed.
Claims (9)
- A reaction chamber level batch between control system, comprising:One board equipment, this board equipment has a plurality of reaction chambers; AndOne infosystem, this infosystem and this board equipment room have one first data link, this infosystem is for each this reaction chamber, calculate its reaction chamber controlled variable, and whether be in executable state according to these a plurality of reaction chambers, but in these a plurality of reaction chamber controlled variable, filter out at least one execution parameter, but by this first data link transmit should execution parameter and at least one prescription of carrying out to this board equipment.
- 2. control system as claimed in claim 1, wherein this infosystem comprises controller module between factory operation control system module and a batch, has one second data link between controller module between this factory's operation control system module and this batch.
- 3. control system as claimed in claim 2, wherein controller module has parameter screening unit between this batch, but in order to filter out this execution parameter.
- 4. control system as claimed in claim 3, wherein this factory's operation control system module transmits the status information of these a plurality of reaction chambers to controller module between this batch by this second data link, after the computing through controller module between this batch, but controller module is somebody's turn to do execution parameter to this factory's operation control system module by this second data link transmission between this batch.
- 5. control system as claimed in claim 2, wherein this factory's operation control system module has parameter screening unit, but in order to filter out this execution parameter.
- 6. control system as claimed in claim 5, wherein this factory's operation control system module transmits request of data instruction to controller module between this batch by this second data link, after the computing through controller module between this batch, controller module transmits these a plurality of reaction chamber controlled variable to this factory's operation control system module by this second data link between this batch.
- 7. control system as claimed in claim 1, wherein this board equipment system adopts the serial mode process.
- 8. control system as claimed in claim 1, wherein this board equipment system adopts the parallel schema process.
- A reaction chamber level batch between control method, in order to control a board equipment, this board equipment has a plurality of reaction chambers, this control method comprises:Obtain the status information of these a plurality of reaction chambers;For each this reaction chamber, calculate its reaction chamber controlled variable;Whether be in executable state according to this a plurality of reaction chambers, but screen these a plurality of reaction chamber controlled variable and produce at least one execution parameter;Whether be in executable state according to these a plurality of reaction chambers, select at least one prescription of carrying out; AndBut execution parameter is somebody's turn to do in transmission and this can carry out prescription to this board equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100920531A CN100422888C (en) | 2005-08-16 | 2005-08-16 | System and method for controlling batches in layers of reaction chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100920531A CN100422888C (en) | 2005-08-16 | 2005-08-16 | System and method for controlling batches in layers of reaction chamber |
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| Publication Number | Publication Date |
|---|---|
| CN1916796A true CN1916796A (en) | 2007-02-21 |
| CN100422888C CN100422888C (en) | 2008-10-01 |
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| Application Number | Title | Priority Date | Filing Date |
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| CNB2005100920531A Expired - Fee Related CN100422888C (en) | 2005-08-16 | 2005-08-16 | System and method for controlling batches in layers of reaction chamber |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101963802A (en) * | 2010-08-25 | 2011-02-02 | 江苏大学 | Virtual measurement method in batch manufacture procedure and system therefor |
| CN102456537A (en) * | 2010-10-27 | 2012-05-16 | 沈阳中科博微自动化技术有限公司 | Cluster semiconductor equipment oriented reaction chamber and transfer chamber function invoking method |
| CN103236383A (en) * | 2013-05-04 | 2013-08-07 | 四川虹欧显示器件有限公司 | Method for dynamically determining and optimizing parameter importance in manufacturing process of plasma display screen |
| CN103236382A (en) * | 2013-05-04 | 2013-08-07 | 四川虹欧显示器件有限公司 | Method for determining process parallel rationalization of manufacturing process of plasma display screen |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5926690A (en) * | 1997-05-28 | 1999-07-20 | Advanced Micro Devices, Inc. | Run-to-run control process for controlling critical dimensions |
| US7337019B2 (en) * | 2001-07-16 | 2008-02-26 | Applied Materials, Inc. | Integration of fault detection with run-to-run control |
| CN1308816C (en) * | 2002-03-14 | 2007-04-04 | 旺宏电子股份有限公司 | System and method for automatic presetting technological parameters for ion implantation machine set |
| US7619184B2 (en) * | 2003-03-04 | 2009-11-17 | Micron Technology, Inc. | Multi-parameter process and control method |
-
2005
- 2005-08-16 CN CNB2005100920531A patent/CN100422888C/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101963802A (en) * | 2010-08-25 | 2011-02-02 | 江苏大学 | Virtual measurement method in batch manufacture procedure and system therefor |
| CN101963802B (en) * | 2010-08-25 | 2012-08-15 | 江苏大学 | Virtual measurement method in batch manufacture procedure and system therefor |
| CN102456537A (en) * | 2010-10-27 | 2012-05-16 | 沈阳中科博微自动化技术有限公司 | Cluster semiconductor equipment oriented reaction chamber and transfer chamber function invoking method |
| CN103236383A (en) * | 2013-05-04 | 2013-08-07 | 四川虹欧显示器件有限公司 | Method for dynamically determining and optimizing parameter importance in manufacturing process of plasma display screen |
| CN103236382A (en) * | 2013-05-04 | 2013-08-07 | 四川虹欧显示器件有限公司 | Method for determining process parallel rationalization of manufacturing process of plasma display screen |
| CN103236382B (en) * | 2013-05-04 | 2015-06-10 | 四川虹欧显示器件有限公司 | Method for determining process parallel rationalization of manufacturing process of plasma display screen |
| CN103236383B (en) * | 2013-05-04 | 2015-08-05 | 四川虹欧显示器件有限公司 | Dynamically determining and optimization method of plasma panel process parameters importance |
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| Publication number | Publication date |
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| CN100422888C (en) | 2008-10-01 |
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Granted publication date: 20081001 |