CN1879001A - Radiation shield - Google Patents

Abstract

As part of a system for processing a workpiece by applying a controlled heat to the workpiece, a heating arrangement includes an array of spaced apart heating elements for use in a confronting relationship with the workpiece to subject the workpiece to a direct radiation that is produced. A radiation shield includes a plurality of members supported for movement between (i) retracted positions, which allow the direct radiation to reach the workpiece, and (ii) extended positions, in which the plurality of members cooperate in way which serves to at least partially block the direct radiation from reaching the workpiece and to absorb radiation emitted and reflected by the workpiece and thereby achieve greater control of the time-temperature profile than previously obtainable. At least certain ones of the members move between adjacent ones of the heating elements in moving those certain members between the retracted and extended positions. Tubular, curved and plate-like member configurations can be used.

Description

Radiation shield

Technical field

This paper relates generally to rapid thermal treatment (RTP) field of workpiece, relates in particular to a kind of radiation shield that comprises a plurality of sections, is used for applying controlled heat to workpiece.This paper discusses unblanketed baffle (shadow-free shutter) apparatus and method.

Background technology

When manufacturing included, but are not limited to this equipment, as semiconductor, photoelectronic device, flat-panel monitor and MEMS (Micro Electro Mechanical System), at least some operations may need to apply controlled heat.For example, in semiconductor, some operation need apply heat on wafer or other similar workpiece, to finish annealing.Particularly, ion injects quilt through being usually used in introducing doping agent at the selection area of wafer.Implement RTP annealing subsequently, this is because ion injecting process has destroyed the lattice structure that exposes on the wafer selection area, and the dopant atom that injects has been stayed the interstitial site of electric passivation.Annealing is used for dopant atom is moved into the position of substitution of lattice, so that their electricity activation, thereby the damage of the lattice structure that reparation takes place in ion implantation process.

Unfortunately, under the situation that lacks accurately control, can cause undesirable influence to the annealing of equipment one side of semiconductor wafer.Under the high temperature, dopant atom can be diffused into very high speed in the wafer, and most diffusion occurs in the annealing peak temperature, just needs to be used for activating the temperature of adulterant.Because the demand that the semiconductor wafer performance is strengthened and reduce equipment size gradually, need to make more and more shallow and being connected of formation fast.In order to realize that these demands also constantly reduce the size of equipment, need control as far as possible accurately in the following manner the annealing heat outline line of wafer, that is, and the temperature conditions of restriction adulterant diffusion when making wafer bear the activation adulterant.

The known structure that the short annealing that is used to realize single-chip is handled is utilized the heating element heater that produces radiation, and described radiation is directly born by workpiece.No. the 6th, 054,684, a kind of possible embodiment of this method such as United States Patent (USP), Pas etc. (being called Pas hereinafter) are published, in Fig. 3 a shown in, this figure is repeated by Fig. 1 of the application, has used other Reference numeral in Fig. 1.An annealing device utilizes Reference numeral 10 roughly to illustrate, and comprises wafer holder (wafer holder) 12 and heater 14.The latter can be made up of ohmic heating element heater or lamp.Baffle (shutter) system 16 be positioned heater 14 and can support between the wafer (not shown) on the wafer holder 12.The baffle 16 that provides is used for optionally stopping the energy that sends from heater 14, makes it can not arrive wafer.

Admit that as Pas described structure has problem, because the centre position of baffle system between wafer and heating element heater, so can on wafer, produce shade when baffle is positioned at open position.The result that these shades caused is the inhomogeneous heating of wafer surface.

Though Pas attempts considering that by propose to use reflective coating to reduce shadow problem on baffle its overall structure of instruction of the present invention back still is considered to and can not accepts.Especially, these shades will influence the shade equipment region, because this zone only is exposed under the non-direct radiation that heater 14 sends, thus can partial annealing.If in order fully the shadow region to be heat-treated and to increase open-assembly time, can cause directly being exposed to the excessive problem of adulterant diffusion of the wafer area under the heater.

Publish by Pan, United States Patent (USP) the 6th, 259, Fig. 3 of No. 062 is repeated by herein Fig. 2, has also used other Reference numeral among Fig. 2, comprises a device quite similar with the device of Pas.Pan has described a system, utilize Reference numeral 30 roughly to illustrate, wherein wafer 32 is supported on the pedestal 33 that is arranged in process chamber 34, makes wafer can be exposed to a plurality of heating sources 36 such as under the radiant heat lamp, and these thermals source are arranged on the above and below of wafer.As general convention of the prior art, reflective surface will 38 is positioned in the outside of thermolamp.Yet, be better than using Pas formula baffle, but two radiation-absorbing material spares 40 straight line on the direction shown in the double-head arrow 42 moves, make material 40 can be positioned at slidably between lamp 36 and the wafer 32 (upper and lower surface of wafer), perhaps shift out the zone (referring to Fig. 1 and 2 of Pan) that is located immediately between lamp 36 and the wafer 32 laterally.Yet it is very important to understand following problems, that is, in order to reach the purpose of raising system production capacity, the patent of Pan is involved in the post processing cooling of wafer 32 and uses heat absorption media 40.Like this, this patent cooling of the wafer after only being adapted to finish dealing with that seems.When it finished, media 40 slipped into the position between wafer and the reflecting surface 38, comprised the above and below of wafer simultaneously, and after finishing dealing with, in order to cool off wafer more fast so that it is removed, media absorbs and sends radiant heat 44 by wafer.The output of system can improve, for example, because the temperature-sensitive robot arm can pick up the wafer that cools off quickly.For this point, should be noted that Fig. 2 clearly shows post-treatment condition because do not have to illustrate the heat that sends from thermal source 36.

Because there is not the shadow problem of Pas formula baffle equipment in Pan formula equipment, if but attempt this structure applications among Pas, perhaps, will introduce another important problem, hereinafter horse back be discussed usually as a quick heat treatment part.

Still with reference to Fig. 2, the enforcement of heat outline line is controlled, at least partially, and owing to the use of special reason media 40 will cause problem.Especially, this paper thinks, as hereinafter will further describing, media 40 straight lines moved to the action in centre position between lamp 36 and the wafer 40, can progressively stop direct radiation.If handle really, for the lamp of emitted radiation, wafer is highly uneven being exposed in the radiation, and the unpredictable and unacceptable result who causes has exceeded the present invention and expected the degree of RTP.Yet, in addition, should be noted that Pan seems can only be adapted to the post processing purpose of its regulation.

The invention provides the equipment and the method that are highly profitable, it has solved previously described difficulty and problem, and other advantage is provided.

Summary of the invention

Handle in the system of workpiece by apply controlled heat to workpiece at one, described a kind of equipment and a kind of method.According to one aspect of the present invention, have the heater of flat heated, be used for keeping relativeness, so that workpiece bears the direct radiation that is produced by heater with workpiece.The radiation shield of segmentation comprises a plurality of sections, described a plurality of sections are supported on (i) withdrawal or open position and (ii) mobile between the expanded position, be allowed to arrive on the workpiece in described withdrawal or the described direct radiation of open position, launch or the closed position described a plurality of sections to stop that at least in part the mode that described direct radiation arrives on the workpiece matches.Moving-member moves between retracted position and expanded position a plurality of sections.In a special case, this moving-member is a kind of providing the acceleration that move and the deceleration parts controlled of section between retracted position and expanded position.

According to another aspect of the present invention, the heating element heater of a plurality of elongations is set to be in relative relation with workpiece, is used to make workpiece to be subjected to the radiation that heating element heater produces.Bracing or strutting arrangement has at least one surface, is used to support the heating element heater of a plurality of elongations, and described heating element heater is close to and is in side by side relationship mutually.The baffle spare of a plurality of elongations of being supported by bracing or strutting arrangement hinge ground at least generally aligns with the heating element heater of elongation, and can between retracted position (allowing radiation to send directly from heating element heater at described retracted position baffle spare impinges upon on the workpiece) and expanded position, move, make baffle spare begin from described surface outwards to move by retracted position, be clipped between heating element heater and the workpiece, at described expanded position, be provided with in a kind of mode that prevents that partial radiation at least from directly arriving on the workpiece.Moving-member moves the baffle spare of elongation between retracted position and expanded position.

According to another aspect of the present invention, the heater that is provided is used for keeping relative relation with workpiece, makes workpiece bear the direct radiation of being sent by heater.Radiation shield is supported, with at (i) retracted position with (ii) move pivotally between the expanded position, described retracted position is positioned on the side of the heater relative with workpiece at least in part to allow direct radiation to arrive on the workpiece, between heater and workpiece, at described expanded position, radiation shield is used to stop at least in part that the direct radiation to small part arrives workpiece.

According to another aspect of the present invention, heater comprises isolated heating element array, is used for keeping relative relation with workpiece, makes workpiece bear the direct radiation that is produced by heater.The radiation shield of segmentation comprises a plurality of supported sections, with at (i) retracted position with (ii) move between the expanded position, be allowed to arrive workpiece in the described direct radiation of described retracted position, match to stop the mode that arrives on the workpiece to the direct radiation of small part at least in part a plurality of sections of described retracted positions, and some section at least that described mode is set to make radiation shield moves between adjacent heating element heater when mobile between retracted position and expanded position.

According to another aspect of the present invention, described a kind of by workpiece being applied the system and method that controlled heat is handled workpiece.This system comprises a kind of equipment, and this equipment has the heater that is used for the relation relative with the workpiece maintenance, makes the processing width of workpiece bear the direct radiation of being sent by heater.Radiation shield is supported, between following state, to move, (i) retracted mode, this state allows direct radiation to arrive on the workpiece and can not cause shade on workpiece, (ii) deployed condition, radiation shield stops the direct radiation arrival workpiece to small part at least in part in this state, makes radiation shield move one section less than the distance of handling width between retracted mode and deployed condition.

According to another aspect of the present invention, as handling the part of the system of workpiece with heat treatment width by applying controlled heat, a kind of equipment and a kind of method are described to, have the heater that is used for the relation relative, make the processing width of workpiece bear the direct radiation of sending by heater with the workpiece maintenance.The radiation shield that comprises a plurality of elements, it is supported, between following state, to move, (i) retracted mode, this state allows direct radiation to arrive on the workpiece and can not cause shade on workpiece, (ii) deployed condition, radiation shield stops at least in part to the direct radiation of small part and arrives workpiece in this state, makes each element move one section less than the distance of handling width between retracted mode and deployed condition.

According to another aspect of the present invention, as handling the part of the system of workpiece by applying controlled heat, a kind of equipment and a kind of method are described to, and have the heater that is used for the relation relative with the workpiece maintenance, make workpiece bear the direct radiation of being sent by heater.Radiation shield comprises a plurality of cover elements, described cover element is supported, between following state, to move, (i) open mode, this state allows direct radiation to arrive on the workpiece and can not cause shade on workpiece, (ii) deployed condition is covered element and is stopped that at least in part direct radiation arrives workpiece in this state, makes each cover element move between adjacent heating element heater at least.A kind of parts are used to mobile radiation shield between open mode and deployed condition.

According to another aspect of the present invention, a linearly moving embodiment has been described, wherein only need linear baffle to move.In a special case, adopted the plane tabular baffle.In another feature, adopted the tubulose baffle.

Description of drawings

With reference to hereinafter in conjunction with the detailed description of following concise and to the point accompanying drawing, can understand the present invention better.

Fig. 1 directly selects from United States Patent (USP) the 6th, 054, Fig. 3 a of No. 684, for the purpose that the prior art that a kind of baffle implements is discussed in this repetition;

Fig. 2 directly selects from United States Patent (USP) the 6th, 259, Fig. 3 of 062, for the baffle embodiment that the back cooling processing in the patent of ' 062 is discussed in this repetition;

Fig. 3 is positive general view, illustrates to comprise the RTP system of baffle device made in accordance with the present invention, be used to describe in detail baffle be positioned at open, the structure that is highly profitable of retracted position;

Fig. 4 is positive general view, illustrates the RTP system that comprises as shown in Figure 3 according to baffle device of the present invention, wherein baffle be positioned at close, expanded position;

Fig. 5 is perspective sketch plan, the more detailed baffle device that illustrates shown in Fig. 3,4;

Fig. 6 is the general view in side that is used to drive the device of baffle of the present invention;

Fig. 7 is the perspective sketch plan of baffle device of the present invention, is obtained by a side of the baffle device relative with workpiece, has described baffle moving with respect to heater;

Fig. 8 is the perspective sketch plan of baffle device as shown in Figure 7, is obtained by a side of the baffle device relative with workpiece, has described the situation when baffle is positioned at expanded position;

Fig. 9 is the perspective sketch plan of the baffle device shown in Fig. 3-8, is observed by the rear side of baffle device, away from workpiece, illustrates the situation of baffle driving mechanism at its expanded position, also describes the reflector assembly that supports the baffle device in detail;

Figure 10 illustrates another embodiment of the invention for the perspective sketch plan, is observed by the side of the baffle device relative with workpiece, and the baffle that picture in picture shows moves on flat heated, and each baffle then moves between adjacent heating lamp;

Figure 11 is the perspective sketch plan of embodiment as shown in figure 10, is also observed by the rear side of baffle device, and away from workpiece, baffle is positioned at expanded position shown in it, to such an extent as to a baffle is relative with two heating lamps;

Figure 12 is the perspective sketch plan of baffle shown in Figure 10,11, is observed by the rear side of baffle device, away from workpiece, illustrates the baffle driving mechanism that is positioned at withdrawal or open position, also detailed icon support the reflector assembly of baffle device;

Figure 13 is the perspective sketch plan of baffle device as shown in figure 12, is also observed by the rear side of baffle device, away from workpiece, illustrates the baffle driving mechanism that is positioned at expanded position;

Figure 14 is the positive general view of another embodiment of baffle device of the present invention, describes the structure that it is highly profitable in detail, illustrates plane baffle spare from launching (closing) to the interior progress of withdrawal (opening) position range;

Figure 15 looks sketch plan for the end of baffle device as shown in figure 14, illustrates its structure in further detail;

Figure 16 is an amplification front elevation, has roughly described the pair of control rod to the connection as baffle in Figure 15,16 illustrated embodiments;

Figure 17 is the perspective sketch plan according to another embodiment of baffle device of the present invention, is used to describe in detail the structure that it is highly profitable;

Figure 18 is general view part, that amplify more, illustrates the part in the baffle device driving mechanism shown in Figure 17, is used for illustrating in more detail its structure;

Figure 19 is a general view another part, that amplify more, illustrates another part of baffle device driving mechanism shown in Figure 17, is used for its structure of more detailed explanation;

Figure 20 is the positive general view that part is removed, illustrate another embodiment of baffle device of the present invention, be used to describe in detail the structure that it is highly profitable, wherein illustrate the baffle spare that plane, straight line moves by the progress that is withdrawn in the expanded position scope;

Figure 21 looks sketch plan in the end of the part of baffle device as shown in figure 20, illustrates the reflector panel that has the baffle slit and be positioned baffle wherein;

Figure 22 a is the positive general view that the part of an alternative embodiment of the invention is removed, and is used to illustrate the tubulose baffle embodiment that is highly profitable;

Figure 22 b is the bottom surface perspective sketch plan of the embodiment of another baffle device shown in Figure 22 a, and wherein baffle is in retracted position;

Figure 22 c is another bottom surface perspective sketch plan of baffle device shown in Figure 22 b, has selected baffle and is positioned at the position that they launch;

Figure 23 is used to describe the selectable distribution of tubulose baffle and heating element heater for based on looking sketch plan in the end of the embodiment of tubulose baffle shown in Figure 22 a, and described heating element heater and baffle interrelate, and near the thermal source of circular flat shape;

Figure 24 is the positive general view that part is removed, and illustrates another embodiment of baffle of the present invention, is used to describe concentric configuration of tubulose baffle and crew-served circular lamp arrays;

Figure 25 a is the bottom surface perspective sketch plan of baffle device as shown in figure 24, is used for its structure of more detailed description;

Figure 25 b is the bottom surface perspective sketch plan of the embodiment shown in Figure 25 a, and its baffle is in retracted position among the figure;

Figure 25 c is another bottom perspective sketch plan of the baffle device shown in Figure 25 b, and baffle selected among the figure is illustrated as expanded position;

Figure 26 illustrates the general view in cross section that is manufactured to the baffle device with two section baffle blades, and described the expansion process of a baffle blade with respect to another.

The specific embodiment

Explanation hereinafter is to introduce those of ordinary skill in the art to make it can make and use the present invention, also is provided in the context and demand thereof of patent application.Can be easy to for a person skilled in the art described embodiment is carried out different variations, and its principle of generality can be applied in the additional embodiments.Therefore, the present invention is not limited to these and provides embodiment, but according to principle and the consistent wide region of special case described in the literary composition.

Preamble has been described Fig. 1 and Fig. 2, hereinafter just directly pays close attention to Fig. 3, and Fig. 3 is the positive generally view of RTP treatment system made in accordance with the present invention, by Reference numeral 100 indications.Should be noted that similar Reference numeral is used to represent similar assembly in all different accompanying drawings, and be not drawn to scale for each accompanying drawing of the purpose that makes the reader be more readily understood.And, should be appreciated that some terms, for example, " go up (upper) ", " low ", " left side ", " right side ", " going up (above) ", D score and " side " all just are used for purpose of description, rather than for the restriction of direction of operating and any associated change thereof.And, in a width of cloth accompanying drawing, occur under the situation of a plurality of similar assemblies, for drawings clear ground purpose, have only minority in those similar assemblies or have only one, can use the Reference numeral indication.

Also with reference to Fig. 3, system 100 comprises heating lamp 102 arrays (the independent terrestrial reference of several quilts in them shows, shown in an end-view) tubular, elongation, for example, tungsten halogen lamp can certainly adopt the lamp of other existing suitable kind, or will develop the kind that.Each lamp 102 cooperatively interacts and forms flat heated 104 jointly, represents with a dotted line.Should be appreciated that this flat heated is the structure of the description of a plane source of an expression, is gone out by radiation from this plane source heat, and, as this structure, the specific position shown in flat heated is not limited to, but can move into or shift out the lamp array in any suitable manner.Workpiece 106, for example, semiconductor wafer is supported, its have relative with lamp 102 go up, first type surface 108.In this structure, the upper surface 108 of workpiece typically is generally parallel to flat heated 104 at least.Workpiece 106 is supported in its periphery usually, is perhaps supported by minimum 3 supporting pin (not shown).Peripheral support can be by quartzy (SiO ₂) or other material of carborundum or some with suitable heat, chemical property make.Supporting pin is typically made by carborundum or quartz.Typically, if workpiece 106 in all sides besieged or workpiece be wafer by a ring that is free to slide 110 around its girth, this ring is roughly illustrated, and has circular configuration usually, make it complementally around workpiece, as semiconductor wafer with periphery.As known in the art, free skating rotating ring 110 is preventing aspect the disadvantageous temperature effect of workpiece peripheral circumferential very usefully, and described influence is because the rate of temperature change of workpiece periphery causes with respect to the rate of temperature change of the other parts of workpiece 106 is quicker.Workpiece 106 rotates with suitable speed in strengthening the conforming heat treated of workpiece usually.The support that the free skating rotating ring is fixed usually makes any asymmetric heat affecting reduce by time average or eliminates.Should be appreciated that each lamp 102 cooperatively interacts determines that one has the flat heated 104 of rectangle or square profile, and the periphery of workpiece then is a circle roughly.For this point, the periphery of flat heated can be shaped as any suitable shape, as long as the radiation diagram that passes first type surface 108 that workpiece can be fit to when workpiece rotates.As what will see, the present invention can also similarly be applied to, and thermal source comprises the situation of the element of segmentation.For example, thermal source can be formed by following method, thereby is about to have the integrated plane thermal source that forms near circle of fluorescent tube of different length.

Shower nozzle device 120 can be inserted between lamp 102 and the workpiece 106, and it comprises first near the general plane part 122 and second of lamp 102 planar member 124 roughly, and it is first roughly between planar member 122 and the workpiece 106, shown in Fig. 3 and 4.Therefore, seedpod of the lotus head cavity 126 is formed between the first and second general plane parts, and wherein process gas or multiple gases (not shown) can be introduced by passage 128, and described passage is formed in one or more seedpod of the lotus head cavity 126 all bit positions that are centered around.Lower planar member 124 has a plurality of through holes 130, and the independent terrestrial reference of several quilts wherein shows, the industrial gasses that inject by passage 128 penetrate the upper surface 108 of striking work through chamber 126 by through hole 130.Be used for should with suitable gaseous species comprise any suitable gas, include, but are not limited to following gas: Ar, N ₂, O ₂, He, N ₂O, NO, H ₂, NH ₃And H ₂O.Planar member 122 and 124 can by any radiation 132 that lamp 102 is sent compatibly material transparent make, these materials comprise, for example the quartz plate that can be easy to process, perhaps aluminium oxide or aluminium oxynitride.

Continuation is with reference to Fig. 3, and the baffle device is by Reference numeral 200 expressions made in accordance with the present invention.Baffle device 200 comprises reflector panel 202, and it uses the clip (not shown) to support lamp 102, and described clip is arranged on each relative two ends of elongation fluorescent tube.Reflector assembly 202 can be made by any suitable heat proof material, for example, and aluminium, titanium or stainless steel.

Forward Fig. 5 to, it combines with Fig. 3, and the former accompanying drawing is that baffle device 200 is observed the perspective view at baffle device top from the top down after partly removing, thereby illustrates the side of removing lamp 102 device afterwards.A plurality of pivot arm (pivot arm) 204, each pivot arm is included in the end that pivot location 205 pivotally is connected with reflector panel 202.A relative end of each pivot arm 204 is fixedly attached on one of baffle spares 206 a plurality of elongations, arc (have only its top edge visual in Fig. 5) by using banded arm 207, and described banded arm will be described in more detail below.The relative end that should be appreciated that the baffle spare of elongation can pivotally be provided with according to the mode that is equal to described end in essence, but owing to illustrative these relative ends of limiting do not illustrate.Should be noted that this figure illustrates the baffle spare that is in retracted position, thereby the end-view of the baffle spare 206 that Fig. 3 provided has exposed baffle owing to removed reflector panel 202.Each elongation baffle one of device body 202 formed a series of slit 208 that are reflected receives.In Fig. 5,, can be clear that to be used to cover baffle spare 206 slit 208 of (only its tail edge as seen) that described backboard 209 is supported on the upper surface of reflector panel 202 owing to removed a jiao of reflector backboard 209.Reflector backboard 209 has a plurality of through holes 210, and described through hole and slit 208 align, by these through hole gas pressurizeds, being provided to the refrigerating gas of lamp 102, because the heating element heater of specific modality, for example, manganese silk-Halogen lamp LED need be worked in certain temperature range.Strengthen the ground cooling in order to provide, reflector panel can have a series of cooling bath 211, by these grooves, and suitable cooling fluid, for example, water or other heat exchanger fluid can flow therein.Selectively, liquid coolant can be arranged in groove, and does not need the flows outside of bringing out.Like this, as in order to produce the result who brings out heating of heat reallocation/circulation useful in the reflector panel, liquid can flow passively, for example as the result of convection current.For purpose clearly, do not illustrate reflector backboard 209 among Fig. 3.And at their retracted position, baffle spare 206 does not need fully to be received in the reflector panel 202 yet; In suitable modification, baffle can be easily part be located at reflector panel 202 above or below stretch.

Still with reference to Fig. 3 and 5, each baffle spare 206 comprises banded arm 207, and it has bowed shape, and is fixedly connected to the upper end of pivot arm 204.Valuably, banded arm 207 can be at each opposing ends monolithic molding of the baffle spare that extends.Each banded arm can depend on that with any yes, and the mode that is fit to of material type is connected on other pivot arm of branch.Pivot arm 204 can be made by the material that is fit to, for example, and aluminium, stainless steel, plating beryllium or titanium.Baffle spare 206 can be made by the material that is fit to, and includes but not limited to titanium, stainless steel, plating beryllium and aluminium.Consider following factor, for example, preferred temperature, material thickness, heat treatment requirements comprise the energy setting and the processing time of peak temperature, lamp, adopt special material can adapt to special application.

Each pivot arm 204 comprises the pivot pin 214 of outside stretching, extension, and it can be retained on each pivot arm in any suitable manner.Through hole on executing agency's bar 220 that each pivot pin 204 can be extended in any suitable manner receives, and makes that all baffles 206 can consistent action by moving of executing agency's bar.Should be appreciated that this action can finish in the mode of unconfined quantity basically, comprise transmission device or linear actuator that use is driven by the motor that is fit to.This example is described the motor 222 (Fig. 3) of knowing clearly and having driving shaft 223, described drive shaft dish 224, and this driving-disc pivotally is connected on executing agency's bar 220 by pivot pin 214 '.Motor drive shaft 223 and pivot arm end part aligning pivotally, simultaneously the distance between axle 223 and the pin 214 ' is corresponding to the pivot location 205 of each pivot arm with sell radial distance between 214, thereby the executing agency's bar 220 that rotates to be of the dish 224 that motor drives provides suitable moving.

Consider that some advantage is owing to use stepper motor or AC syncmotor to drive baffle device of the present invention.As hereinafter describing in detail, need to open and close as far as possible apace baffle usually.Like this, stepper motor or AC syncmotor can be programmed to have selected " at a high speed " and the velocity profile line of " low speed ".Therefore, for example, motor can drive electrically in the mode that the peak acceleration that initial baffle launches is provided.Near the expanded position of baffle the time, can use motor controller so that ways of deceleration to be provided, avoid " slamming " or exceed expanded position-no matter the sort of situation can both cause destroying potentially.This acceleration that needs when moving from the expanded position to the retracted position or deceleration can easily provide.To the control on the retracted orientation can be same accurately.In any embodiment, should understand, the present invention expects that also employing stepper motor or AC syncmotor directly drive drive assembly, described drive assembly drives the baffle device successively.

With reference to Fig. 5, illustrate selectable device, be used for the opposite end (just on Fig. 3,4 motor 222 opposites) of executing agency's bar 220, wherein pivoting lever 226 pivotally receives in the pivot pin 214 one.Simultaneously, pivoting lever 226 relative ends pivotally are connected pivoting point 228 places of reflector panel 202, make the mobile pivoting lever that causes of executing agency's bar 220 stablize actuator stem 220.This device has constituted a basis of the selectable drive unit that promptly will narrate.

With reference to Fig. 6, a kind of structure that is used to drive pivoting lever 226 has been described roughly.As indicated above, in order to rotate, pivoting lever 226 pivotally receives a pin that is positioned properly 214.Yet under situation shown in this figure, the driving shaft 223 of additional motor 222 is connected, thereby the optional rotation of pivoting lever 226 with respect to pivoting point 228 is provided, and in turn, mobile executing agency bar 220, mobile subsequently baffle 206.Should be appreciated that described drive unit can adopt any suitable structure or combination.

With reference to Fig. 3,5 and 6, should be appreciated that the driving shaft (not shown) of stretching, extension can be connected on the motor 223 in order similarly to drive the baffle executing agency that is arranged on the relative side of baffle mechanism.To describe a use motor below in detail and have the similar device of both-end driving shaft.And pivoting lever 226 as shown in Figure 5 also can be used in the relative side of baffle device.If desired, relative pivoting lever can for example, use additional motor or drive unit in any suitable manner, for baffle 206 provides more synchronized or collaborative moving.Should understand, within the scope of the invention, the motor of any suitable quantity can be used, even four motors, wherein each motor is used for driving the end in each the relative two ends of a pair of executing agency bar 220.As hereinafter describing, in feeling usually, collaborative, level and smooth mobile and many runnings of baffle consider that item is relevant, include but not limited to provide for the opposite end of baffle the driving of " evenly ", balance, coordination.

With reference to Fig. 5,, can adopt instrument in any suitable manner separately for the purpose of monitored process parameter.For example, reflector panel 209 supports an instrumentation 232, and this instrumentation passes the baffle device by opening 234 (only illustrating its inlet) and observes workpiece 106.The instrument that is fit to comprises, but is not limited to leucoscope, emission meter and reflective meter.Should be noted that instrumentation 232 also of great use, especially be subjected under the situation of the lamp radiation of section any time when baffle for the temperature of determining baffle 206.The instrument of any suitable quantity can be used.

Another aspect of monitored process parameter is the understanding to the baffle leaf position.For this point, should be appreciated that stepping and AC syncmotor can easily be driven by digital motor controller.Therefore, motor controller can be monitored the position of rotation of rotating shaft, and described rotating shaft is ordered to move the position that is in the baffle of closed-loop fashion with tracking.End switches or " playback " switch are often used in definite home position, can be used to indicate the specific position of a baffle blade of motor controller, for example, and the retracted position of baffle blade.As further enhancing or selectable enhancing, can on motor drive shaft, connect encoder such as optical encoder, directly to indicate the position of motor drive shaft, this mode is known by those skilled in the art.

Describe baffle assembly 200 of the present invention in detail, will pay close attention to its detailed operation and attendant advantages thereof below.To its ending, reader's initial reference Fig. 3 and 5, each accompanying drawing have described according to baffle device 200 of the present invention, and wherein baffle 206 is positioned at opening of they or retracted position.When baffle was closed beginning, baffle 206 shifted out from reflector panel 202 in the direction of lamp 102.

With reference to Fig. 7, in conjunction with Fig. 3,5 and 6, in the moving process of baffle, each independent baffle passes through flat heated 104 then in the middle of a pair of adjacent lamp 102 (Fig. 7) moves closer to or is positioned at.In Fig. 7, baffle device 200 illustrates in the mode of bottom surface perspective sketch plan, has described the baffle 206 that moves to the centre position after arrow 252 indicated direction rotations, and this centre position is positioned among withdrawal and the expanded position.Flat heated 104 is described by with dashed lines, to be illustrated in the intersection location along dotted line 260 of each baffle and flat heated in this centre position.For this point, should understand, do not need baffle 206 is recalled " opening " position, as shown in Figure 7, described " turning on " position is positioned on lamp 102 or the flat heated 104 fully.That is, at their retracted position, baffle can be deployed between the adjacent lamp 102 at least in part, perhaps partly is deployed in flat heated 104 fronts, as long as radiation 132 directly occurs on the workpiece 106.Baffle 206 is retracted into reflector panel 202 fully, can avoid the prolongation exposure of baffle under direct lamp radiation valuably.

Fig. 4,8 and 9 illustrates baffle 206, the especially Fig. 8 that is in expanded position, and is helpful, and it roughly illustrates the details of baffle expanded position, and 206a-g represents by mark.Especially, the outer surface 264 of the leading edge 262 of the first baffle 206a and the second baffle 206b is approaching.Certainly, baffle 206g comprises baffle last in this series, thereby, there is not baffle to surpass it, contact at expanded position with it.

Should be noted that the end shield body 206a that is positioned at baffle device right side shown in Fig. 4, do not hinder light 240, described light is sent by rightmost side lamp 102, thereby this light do not impinge upon on the workpiece 106, but impinges upon on the free skating rotating ring 110.For this point, remember that the shape of baffle blade is very important as shown in the figure, for example shape shown in Fig. 3-5.Like this, visible each banded arm 207 in the end-view of Fig. 4, they are not to be used for hindering light, only the baffle in the elongation of the banded arm of least significant end plays this effect.Similarly, light 250 is penetrated by the lamp 102 of high order end, does not also impinge upon on the workpiece 106, but impinges upon on the free skating rotating ring 110.Even so, light 250 is also hindered by as shown in Figure 4 baffle device, because these light directly impinge upon on the baffle blade of expansion.

With reference to Fig. 3 and Fig. 4, should be appreciated that slit 208 (having only a drawings attached mark mark), the slit of low order end as shown in Figure 3 is constructed to help the mode of each baffle along the guiding of the passage between withdrawal and expanded position.At least, slit 208 is constructed to match with the track of baffle blade between withdrawal and expanded position, because each baffle blade all has rigid shape.Therefore, slit is designed to receive the baffle blade when it is in retracted position, thereby makes the baffle blade not weaken the light that penetrates from lamp, and can penetrate the memory space of baffle.In the present embodiment, at least closely, the quantity of the quantity of lamp 102 and baffle 206 has relation one to one.Should arouse attention, each baffle rotates only about half of distance around one of lamp 102 in the transformation from the retracted position to the expanded position.As shown in Figure 4, each baffle moves through lamp and its rotation relatively, thereby is positioned at the below of next adjacent lamps 102 at least in part.

With reference to Fig. 3-5 and 9, banded arm 204 and slit 208 are set to cooperatively interact, and avoid the adjacent baffle that occurs when mobile between retracted position and expanded position and the conflict of banded arm.Open with reference to this paper, for the purpose that prevents that baffle and the arm position in any baffle blade rotation is in contact with one another, those skilled in the art can easily make the variation of the suitable banded arm configuration of many kinds.

Above-detailed baffle device 200 of the present invention, its several advantages that have are what be worth to discuss.An advantage is virtually completely to have avoided forming on workpiece shadow, still adopts the baffle device of segmentation simultaneously.This is considered to provide inundatory advantage with respect to the baffle device of prior art, and baffle device of the prior art is supported between thermal source and the process source, Pas document as noted before.Up to now, prior art does not have to solve the method that occurs shade when adopting the segmentation baffle yet.

As another advantage, shade do not occur and be with highly evenly, fast mode at least in part block radiation the ability of contact workpiece is not relevant.That is to say that the single document that slips into baffle Pan as noted before is described, for example, estimate that baffle will need move at least 14 inches owing to a thick wafer of 300mm between its withdrawal and expanded position.If when the radiation irradiation of suitable level is to workpiece, carry out This move, just will cause highly inhomogeneous and unbalanced heat treatment.This move has additional influence, causes the inhomogeneous cooling of basic unit.These influences are additional to natural conditions, can cause bigger heat treatment inhomogeneous.A kind of effort of eliminating this difficulty is exactly mobile more fast baffle, yet, the rate travel that this but needs extremely at a high speed, can not realize.For this point, should be noted that the only rotation of workpiece is considered to be helpless to solve this uneven result, in less than a rotation because baffle launches usually.Even the workpiece rotary speed can obtain the increase of essence, yet Pan formula baffle still can cause the inhomogeneous of radiation.Opposite with it, the present invention utilizes segmentation baffle device, and wherein each baffle moves a relatively short distance, will fully eliminate shade.Embodiment shown in Fig. 3 and 4 estimates that the arc length that each baffle spare moves is no more than 4 inches (much smaller than wafer diameter) between the withdrawal of each baffle and expanded position.It should be noted that to move and be exceeded three factors and reduce.At himself and by himself, consider to follow and eliminated shade that this difference is considered to provide inundatory advantage with respect to prior art.

Generally acknowledge that Pan formula baffle device can improve, the improvement of certain limit at least, for example, by using the baffle that slips into from relative both sides or using the iris baffle, as adopting in the camera.These improvement are still not competent when having the big workpiece of more multiprocessing demand.

More extremely important should being appreciated that, any baffle device is instructed as Pas, and its baffle all is positioned between heater and the wafer if having time in institute, bears the caused problem of huge heat.For example, under the situation of baffle with respect to the direction of heater and selected radioactivity surface and coating baffle directly is exposed under the heater for a long time not considering, will finally causes the high-temperature of baffle.Under certain conditions, this coating self will become the problem in the prior art enforcement.For example, need have high radioactivity coating usually at the expanded position of baffle in the face of wafer.If these baffles rotate to retracted position subsequently, high radiation coating directly is exposed under the radiation of heater at least in part.Therefore, the baffle device of this prior art needs extremely to note with respect to the selection of the thermal coefficient of expansion of assembly, therefore serious restriction the special material that can adopt.Perhaps, people consider to adopt effective cooling device to address this problem attempting, and for example, the liquid that passes each baffle by formation receives cooling bath.Yet unfortunately, because the momentum and the volume of baffle have had great growth, complicated situation is introduced into more, has therefore reduced the response of action.The present invention is considered to solve these problems completely, because the baffle of withdrawal can be covered in the reflector assembly completely.

With reference to Fig. 5, the heat radiation that the temperature of baffle blade 206 is mapped to when blade is contracted in the baffle space is regulated, the refrigerating gas that is flowed to simultaneously slit 208 from reflector panel 209 is regulated, and has therefore removed the heat that is included in the withdrawal blade in the space 208.In fact, the leading edge of each baffle can be by the reflector assembly of withdrawing slightly, and it has the shade that is got by direct exposure like this, and perhaps as mentioned below, described leading edge can be set to be used for reflected radiation.In one embodiment, the baffle blade can be preheated, to reach predetermined thermal equilibrium state before handling first workpiece.

Baffle device 200 has the ability that is highly profitable with all embodiment shared in common of the present invention,, changes the time-temperature curve that workpiece experienced that is.By regulating the speed and the baffle blade is closed the zero-time of the expansion of (perhaps other trigger event) time with respect to lamp, hot profile peak value shape can be changed the speed maximization into rising, the time that causes reaching maximum temperature is minimized, and also maximize from the cooldown rate of maximum temperature, cause forming sharp keen peak value or sharp cutting edge of a knife or a sword rather than circular profile.Certainly, by this expectation target, the baffle operation can be controlled, for example, in response to reading of pyrometer, reaches a predetermined temperature such as workpiece.The maximization of the acutance of hot outline line can be of value to cause more and more shallow and being connected of formation fast.Therefore, the control that can obtain before the contrast, baffle device of the present invention reached to time-the bigger control of temperature profile line.For this point, what needs were fast as far as possible moves to expanded position with the baffle blade from the position that their are withdrawn.The baffle duration of run regional extent of the present invention expection from about 10ms to 300ms.The baffle duration of run of 50-150ms is considered to have the process advantage.

With reference to Figure 10 and 11, the embodiment of another baffle device of the present invention utilizes Reference numeral 300 roughly to illustrate.Baffle device 300 has been shared the advantage of aforesaid baffle device 200, and additional advantage is provided.Therefore, this discussion will be limited in the difference of baffle assembly 300 and baffle assembly 200 largely.Should consider that those of ordinary skill in the art can easily realize baffle device 300 by using this explanation and the explanation of aforementioned baffle device 200.Yet main difference is that baffle device 300 adopts a plurality of baffles 306, and each baffle all is approximately the twice of baffle 206 width in the baffle assembly 200 at least.In this manner, baffle 306 moves between per two lamps 102, as Figure 10 institute schematic diagram.Figure 11 has described the baffle 306 that is in expanded position, makes each baffle at least generally be positioned at two lamps 102 times, with block radiation 132.

With reference to Figure 12 and 13, illustrate baffle device 300 top-down perspective sketch plans, it has reflector assembly 302, compare with the slit 208 of device 200 (Fig. 5), the quantity of the slit 308 that this reflector assembly is included is its half, makes each baffle 306 all be received in the slit 308.Figure 12 has described the baffle device 300 that is in withdrawal, open position, and Figure 13 has described the baffle device 300 that is in expanded position.Each baffle spare 306 comprises banded arm 312, and similar to the banded arm 207 of device 200, when seeing from the side, it has bowed shape, and it is fixedly attached to the upper end of one of pivot arm 204.In addition, banded arm 312 can be formed in each end of the baffle spare of each elongation integratedly.Each banded arm can be connected on other pivot arm of branch in any suitable manner.Yet corresponding with the continuous bow-shaped structural of the banded arm 207 of embodiment 200 (Fig. 5 is used for comparison), as shown in figure 12, banded arm 312 is shaped by using right angle Offset portion 316.With respect to the instrument and equipment among Fig. 5 232, the instrument that baffle device 300 is provided is also more favourable, because the space between device 300 slit 308 approximately is the twice in space between two slits 208 on the device 200.

Should be noted that the baffle device, when being positioned at expanded position, can arrange with respect to heating lamp in any suitable manner.For this point, should understand, in all embodiment that is fit to, baffle device of the present invention, it is all effective to be considered to the thermal source that rearranges for " array " thermal source of any form or by the space isolated component, moves between the withdrawal of baffle and expanded position because baffle of the present invention can easily be set to pass any array.And, relying on the consideration of scaling, baffle can be broadened with respect to the interval of heating element heater, to face three or more heating element heaters.

With reference to Figure 14, illustrate another baffle device of the present invention, utilize Reference numeral 400 roughly to illustrate, it has shared the advantage of aforementioned each embodiment.Figure 14 is positive partial cross section view, illustrates reflector assembly 402 and is removed, to show the relation of the slit 408 that extends baffle 406 and a series of elongations in reflector assembly 402.The suitable material that is used to make baffle 408 comprises, but is not limited to titanium, stainless steel, plating beryllium and aluminium.Baffle 406a and 406b are illustrated as the expanded position that is positioned at them, and baffle 406c-e is illustrated as and is positioned at the centre position simultaneously.Baffle 406f is illustrated as and is positioned at fully retractable position.Should be appreciated that for ease of different exercisable baffle positions is shown, described baffle 406, but for the moving of unanimity in the mode of Figure 14, baffle can be easily according to hereinafter will describe the setting of mode.

With reference to Figure 15, in conjunction with Figure 14, the former is the bottom view of baffle device 400, and wherein all baffles 406 all are illustrated as the retracted position that is in them, are positioned at reflector assembly slit 408.Should be noted that every lamp 102 is positioned at clip 409 supports of its opposite end, embodiment as noted before.As shown in figure 14, each baffle 406 is a general plane, has the certain thickness between a pair of opposed major surfaces 416 and 418.When baffle is positioned at their expanded position, the leading edge 420 of baffle 406a is approaching with the back edge 421 of adjacent baffle 406b, does not preferably contact.In described embodiment, slit 408 has consistent width, and this width is wideer slightly than the thickness of each baffle 406.Therefore, the pivot of each baffle moves and is performed, and baffle is fully shifted out slit 408 separately.Yet, should be appreciated that this is dispensable; Slit 408 can comprise a kind of like this structure (not shown), that is, the rotation to small part of this structure and baffle adapts, and described baffle partly is contained in the slit.In this method, the realization of baffle rotation will be described below.

With reference to Figure 14-16, utilize pair of control bar 420 that each baffle 406 is moved, described control lever is arranged on the relative two ends of each baffle.Every pair of control lever comprises first control lever 422 and second control lever 424.Figure 16 is a zoomed-in view, illustrates being connected of pair of control bar and a baffle.Be connected on position 426 and 428 to the end pivot of the baffle of first and second control levers, spaced apart along the width or the thickness direction of each baffle, near its rear rim 421.Therefore, as one man mobile pair of control rod guidance has caused the translation with a fixed angle θ of the baffle that is supported, and described angle is formed between control lever and the baffle.The control lever 422 and 424 mobile baffle that causes being supported each other rotates.That is to say that angle θ changes in response to relatively moving.The coordination of control lever is moved and has been caused the control of baffle between retracted position and expanded position to be moved.For this point, should be appreciated that by the different coordination of adopting control lever and move that baffle can move in the different mode of not limitting quantity.

In example shown in Figure 14, the pivot of control lever follows hard on each baffle and takes place through reflector assembly 402.As selectable example (not shown), baffle can move with two basic steps.At first, control lever can consistent being moved to become position of rotation with baffle from its retracted position.At position of rotation, control lever just relative to moving with another control lever, reaches its expanded position with the rotation baffle.It is not shown to be used for the specific mechanism of mobile in phase control lever, just can propose the suitable structure of many kinds to reach this purpose because consider those of ordinary skill in the art according to whole disclosing.Yet, should be appreciated that control lever 422 and 424 must be constructed to, make relatively moving of baffle 406 rotations supported can not cause in the end of control lever near the conflict at pivot location 426 and 428 places.For example, shown in the side view of Figure 14, the control lever of baffle 406e looks and is arranged side by side that its baffle launches accordingly from control lever is linear.Yet, baffle 406a and 406b, at their expanded position, control lever 424 looks and moves on control lever 422 position before; Make the latter hardly as seen, perhaps can't see at all.In one embodiment, control lever 424 can use the swivel pin of different length to link, with the distance that the end of control lever is different with the marginating compartment of baffle, they are pivotally to be connected on the baffle, simultaneously, baffle can be made in a kind of mode of their slight deformation when baffle never rotates to rotation, transformation from linear correspondence position to expanded position that allows by elastomeric material.The suitable material that is used for the production control bar includes but not limited to stainless steel and titanium.

Painted/the coating schemes that is fit to can offer any baffle device of the present invention, will adopt the baffle device 400 among Figure 14 to be described for example as unrestricted below.As an example, baffle is in their expanded position, and the surface 418 in the face of lamp 102 of baffle can be reflexive.In one embodiment, reflexive coating for example, gold, silver, polishing or scattering aluminium, white paint or aluminium oxide can be applied on these surfaces.Surface 416, relative with workpiece (as Fig. 4) is positioned at its expanded position, can have highly emissivity by high absorption from the electromagnetic radiation of about 1 to 10 micron wave length.For example, this surface can still, still not absorbed the radiation of being sent by workpiece by the radiation heating of lamp in de-registration to allow blade by white paint covering pitch-dark or that have selected reflectivity properties.The leading edge 420 of each baffle 406 can be white or reflexive, and to improve the heating of baffle, described leading edge is relative with lamp when baffle is positioned at retracted position.And, the surface 440 of reflector assembly 402 or any other have appeared at reflector assembly surface among the embodiment that described, can have reflective coating 442, to change the radiation 444 of directive workpiece, therefore improve the uniformity of heating, limited the absorption of heat by the reflector assembly.And, selective reflectivity (selective reflectivity) can be used on reflector assembly or other the surface, the United States Patent (USP) sequence number 10/629 that is called " selective reflectivity process chamber withcustomized wavelength response (selective reflectivity process chamber) " with the name of submitting on July 28th, 2003 with customization wavelength response, the 400 very favorable modes of being instructed are carried out, this application is had by applicant of the present invention, at this it is incorporated herein by reference in full.

With attention directing Figure 17, this Figure illustrates a system below, utilize Reference numeral 500 roughly to illustrate.System 500 comprises another embodiment of baffle device of the present invention, by Reference numeral 501 indications.Baffle device 501 is similar to previously described baffle device 200, but has the stepping motor drive device 502 that is supported by reflector assembly 503 of change, shown in perspective view.The reflector assembly is supported rotatably by chamber 504.Also should be noted that another be arranged on the baffle device 501 of a relative side in chamber 504 ', can be set to be equal to, but be not must be so with baffle device 501.

With reference to Figure 18, in conjunction with Figure 17, the former provides the view of more detailed stepper motor, and described stepper motor is installed on the reflector assembly, and comprises both-end driving shaft 508.One end of driving shaft 508 rotates a cam.Be connected on the cam, the other end of connector 512 then pivotally is connected on executing agency's bar 220 simultaneously one end pivoting of connector 512.Connector and pivoting lever 226 can be pivotally connected to the common point 514 of executing agency's bar 220 in any suitable manner.Therefore, the mobile connector 512 of the rotation of cam 510 in turn, causes executing agency's bar 220 to make baffle 206 move between its withdrawal and expanded position.

With reference to Figure 17 and 19, the relative driving output of stepper motor 506 is connected on the driving shaft 516 (shown in the with dashed lines) of stretching, extension, and it stretches to the actuating device that is positioned at baffle device 500 relative sides (actuation arrangement) 520.Actuating device 520 as shown in figure 19, comprises second cam 522, and this cam is supported by flange 524 and is used for rotation.Second cam 522 receives for the driving shaft 516 in the stretching, extension of this rotation.Second connector 526 pivotally is connected on second cam 522, and its relative end then pivotally is connected the relative end of executing agency's bar 220.By using this structure, the end to end effect of each baffle 206 is moved and is obtained balance.Like this, each baffle is subjected at its two ends, at least closely is subjected to, identical active force.This structure, and described similar structure are owing to the reason that hereinafter is about to narration is considered to have special advantage.

An important aspect of the operation of baffle device of the present invention is exactly an actuation speed.Particularly, how soon baffle can be moved on the both direction between withdrawal and the expanded position.Even it is favourable that baffle device of the present invention has moving the short distance of independent baffle blade aspect shadeless height, but consider particular processing, the baffle blade should enough be moved at least fast, to obtain acceptable uniformity.A kind of structure shown in Figure 17-19, many other places are described in this explanation, and are especially useful with respect to action time.Should be appreciated that because actuation speed has improved any the increment that will inform a baffle leaf curling at the driven embodiment of an end of baffle.Yet a method makes blade become hard exactly, and this method increases the momentum of blade inherently, make its with speed on the thing followed increase competition mutually.Yet, by driving the two ends of baffle, for the purpose of putting into practice.This concern for the baffle leaf curling has just been solved.Observe in a kind of slightly different mode, compare with single-ended drive, baffle blade quite light on the weight can be used to the both-end drives structure, and the thing followed is the reduction of action time.And lighter assembly can be used to the whole actuating mechanism of baffle completely, thereby surmounts the benefit of use blade lighter, that hardness is weak slightly.Relatively, the flatness of the execution under any speed is related to repeatability.That is to say that repeatability shows as the required time permissible value that opens or closes the baffle device.Higher repeatability is converted into how reproducible result.Therefore, use, need the renewable performance of height, so common expection uses the both-end baffle to drive in any suitable embodiment in order to handle exactly.

To Figure 20, this figure illustrates another baffle embodiment made in accordance with the present invention, utilizes Reference numeral 600 roughly to illustrate with attention diversion.Baffle device 600 and 602 cooperations of lamp array, described lamp array comprise the array that become by lamp 102, thereby limit flat heated 104.The workpiece (not shown) can be supported, for example, and with the system's 100 described corresponding to modes shown in Fig. 3 in the preamble and 4.And the shower nozzle device can be sandwiched between lamp 102 and the workpiece, for example, and the shower nozzle device 120 shown in Fig. 3 and 4.For succinct purpose, workpiece and shower nozzle device have just no longer repeated.

Still with reference to Figure 20, baffle device 600 comprises baffle blade gripper shoe 604, and it is formed with a plurality of isolated slits 606, the end of one of a plurality of baffles 608 of each slot acceptance.The baffle blade is indicated by 608a-g respectively.Baffle blade gripper shoe just partly illustrates two different upright positions, in order to describe different operating conditions, yet, should understand, all baffle blades can be supported as one man to move by single baffle blade gripper shoe.Baffle blade gripper shoe is towards with movable away from the direction of reflector panel 610, shown in double-head arrow 612, to launch and withdrawal baffle blade.The baffle blade 608a of the leftmost side is illustrated as being in fully retractable position, thereby the low side of baffle 608a sinks into one section suitable distance 611 in the reflector panel 610, in the present embodiment the about 2.5mm of this distance.Especially, the amount of blade depression enough is used to hinder the filament of direct-view corresponding to the lamp 102 that is located immediately at baffle 608a down either side.

Illustrate the expansion process of baffle blade 608 among Figure 20 from left to right, wherein, blade 608b-c is deployed into enough low side with these blades to move to roughly and align with the surface 614 of reflector panel.Blade 608d-h further illustrates the expansion of the baffle blade that increases progressively from left to right, and blade 608i-j then is shown complete expanded position, and is positioned at the gripper shoe 604 that offsets with reflecting plate 610 and is connected.In the present example, launch the baffle blade fully and approximately launched 40mm from 614 beginnings of low side reflector panel surface.For this point, every lamp 102 comprises a filament 616 that is represented as a point.Filament is apart from reflector panel surperficial 614 about 12mm, and the about 16mm in space.Therefore, between the baffle blade 608 between at interval amount and lamp and the lamp distance at interval equate it also is 16mm.Should understand, all sizes that provide all are for for the spirit of description that one of may structures to many kinds is provided, and as restriction, consider the disclosure, and these above-mentioned possible structures can be utilized by those of ordinary skill in the art.Should be appreciated that the baffle structure may be provided in baffle must be between per two adjacent with it lamp, and for example, baffle can be positioned between other per two lamps.

With reference to Figure 21, in conjunction with Figure 20, the former has described a general view in plane that baffle 608 is positioned at a slit 618, and described slit is formed by reflector panel 610 (only partly illustrating), and this figure observes from the viewpoint of lamp 102.Each slit 618 can have bearing arrangement 620.In the present example, bearing arrangement comprises two pairs of bearing parts 622, and each is to all being arranged on the relative two ends of baffle 608.Bearing part can be made by following material, for example, and any polymer that is suitable for high temperature, for example, carbon fluoride related polymer, carbon, graphite vitreous carbon (graphite glassy carbon), diamond coatings pottery.Selectable, as also can to use metal and dry type or wet lubricant to import porous material.Therefore, in the position away from bearing part, baffle blade 608 is spaced a distance with the periphery of slit 606, and this distance is approximately equal to the thickness of bearing part 622, thereby has formed the peripheral channel 623 around the baffle blade.Bearing part can be made by any suitable mode, for example, and along the thickness direction of entire emission device plate 610, with the master of reflector panel, apparent surface's position adjacent and/or along reflector panel thickness direction position at interval.In this manner, as long as gripper shoe 604 is not positioned at the position that offsets with reflector panel 610, refrigerating gas just can pass the peripheral channel 623 around each baffle blade.These refrigerating gases not only play the effect of cooling baffle blade, and, cool off additional assembly in view of the above, for example, shower nozzle thereunder or window device (shown in Fig. 3 and 4).

For plate is moved on the direction shown in the illustrated double-head arrow 612, any suitable actuating mechanism can both be used, for example, at least one linear actuator 626, it has the axle of execution 628, and this axle is connected on the baffle gripper shoe 604 so that it is moved.The executing agency of any suitable quantity can both be utilized, with mobile gripper shoe 604 or mobile other baffle that divides.Considering only needs linear moving, and should be appreciated that those skilled in the art can be easy to provide the execution device of any suitable quantity on whole disclosed basis.

The material that is suitable for making baffle blade 608 comprises, but is not limited to aluminium, stainless steel, titanium, plating beryllium, pottery, C-base composte material and suitable composition.Reflector panel 610 can by, for example, aluminium, stainless steel, titanium and suitable composition are made, baffle blade gripper shoe 604 then can by, for example, aluminium, titanium and suitable composition are made.Baffle blade 608 can be received in the baffle blade gripper shoe 604 regularly, for example, and by locator, epoxy resin, compression set, the metal connecting piece of machinery.Described baffle blade first type surface color or structure should be able to absorb radiation, thereby when extending, baffle absorbs the radiation of lamp as much as possible, and the color of their low side or structure should reflected radiations, thereby absorb few radiation of trying one's best when baffle is withdrawn.Described color and structure can obtain by any suitable mode, for example, and by using coating.Should be noted that the different baffles or the small set of baffle can have different length and/or be made from a variety of materials in the specific baffle device of described any embodiment.

Be positioned at simultaneously under the situation of workpiece above and below (not shown) at the heating of being adopted/baffle device, it may be useful that a heating/baffle device is rotated about 90 degree with respect to other heating/baffle device at its principal plane, is for any minimized purpose of optical effect that is distributed on the baffle vane slit at least.

The lamp 102 that use has the fastest cooling response is considered to useful.Certainly this has been applied among all embodiment as herein described, be particularly suitable for baffle device 600, just hereinafter be about to the embodiment of introduction, because when baffle extends fully, at least the restricted exposure of some of workpiece directly is under the radiation, as hereinafter will further narrating.

Describe the structure of baffle structure 600 above in detail.At first, the design of baffle device 600 is carried out in the following manner, i.e. the minimized mode of problem that plan will be relevant with the baffle deformable blade.For example, the distortion that is caused by the baffle leaf blade manufacture process, perhaps by distortion that thermal stress caused, described thermal stress results from energy that the baffle blade is absorbed under the energy that is exposed to lamp and other hot transitional surface time the or because the distortion that acceleration caused of baffle blade in the expansion process of blade.Hot transitional surface comprises any surface, and for example, surface, chamber, this surface are subjected to the radiation again in radiation absorption and the process chamber.Should be appreciated that baffle blade 608 has stopped that partly radiation 620 directly arrives workpiece, this workpiece is positioned at baffle device below, as shown in figure 20.Yet based on described geometric figure, these baffles have stopped the radiation of a considerable amount of lamps at its expanded position.As shown in the figure, with respect to lamp 102j, only the radiation in another less radiation emission angle scope simultaneously directly takes place on the workpiece of below in the radiation that is in the α angle by lamp 102j emission potentially, represent by β, then reflex on the workpiece from reflecting plate surface 614 potentially.If the baffle blade is envisioned for the size with best absorption and expection, the direct lamp radiation crested body device that has about 87% (315 °/360 °) so receives.Certainly, this figure can easily adjust to the suitable dimensions change.Consider the simplification of baffle device, this characteristic is considered to the advantage of highly significant, especially has only linearly moving situation with respect to the needs baffle.In this moved, any any concern for the conflict between adjacent baffle all was eliminated, and simultaneously the concern by the conflict that obtains rotatably also is eliminated.And the structure that the extreme of baffle moves fast owing to baffle device 600 is more prone to, and at least owing to following reason, it is linear promptly moving, and each baffle fully cooperates with gripper shoe 604 along its length direction.All the result is very effective, and still has noticeable simple baffle device.

The structure of baffle device 600 can be changed different ways perhaps for different purposes.For example, non-linear lamp can use together with the baffle with different lengths of run, and described length of run is based on the structure of lamp array and determine.As another example, can distribute the adjusting of finishing hot outline line by fixed allocation or the dynamic structure of adjusting length of run.Like this, all blades can launch identical amount and/or different blades can launch different amounts.Other for another example example, baffle blade does not wherein need normally to launch to reflector panel.The latter increase direct radiation stop degree and regulate conforming purpose very useful.

Below with reference to Figure 22 a, it illustrates the embodiment of another one according to baffle Apparatus and system of the present invention, utilizes Reference numeral 700 roughly to illustrate.Baffle device 700 matches with lamp array 702, and described lamp array comprises the array that lamp 704 is formed, thereby has formed flat heated 104.Lamp 704 is with the end point structure setting.The expection of this example adopts the tubulose baffle to combine with the tungsten filament-Halogen lamp LED with outstanding structure.Can use the lamp of tubular structure to constitute the array of this form, all have electrical connection at each end of pipe, and each tubular lamp all have suitable reflector structure.For example, United States Patent (USP) the 5th, 155, the structure of " light pipe " showed for No. 336.For this point, should consider that the reflector panel with elongation filament lamp or the lamp with radiation generation point source of any form, the capsule that centers on and association of any form can be by using setting and the tubulose baffle of its filament transverse to the first type surface of workpiece jointly.Baffle can launch between each baffle and the reflector panel that is associated thereof or the one or more this device that centers on.The workpiece (not shown) can be supported, for example, and in the 100 described corresponding to modes of the system shown in Fig. 3 in the preamble and 4.And shower nozzle and window device can be sandwiched between lamp 704 and the workpiece, for example, and the shower nozzle device 120 shown in Fig. 3 and 4.Purpose has for simplicity just no longer repeated the description of workpiece and shower nozzle.

Continuation is with reference to Figure 22 a, and baffle device 700 comprises baffle blade gripper shoe 705, and it is formed with a plurality of isolated baffles and receives slit 706, and each slit is set to receive the end of one of a plurality of tubulose baffles 708.In the present example, each shape that is received in the baffle in the slit is an annular, and each tubulose baffle spare 708 is structures of tubular, though this is dispensable.For example, can use any suitable the close-shaped of continuous surface that have, for example, the tubular surface of rotation (for example oval), perhaps Feng Bi polygon is as triangle, rhombus, hexagon, square or rectangular configuration.Should be noted that this figure illustrates the tubulose baffle and the lamp of linear distribution in order to strengthen reader's understanding, but also can adopt other any suitable lamp and the method for salary distribution of tubulose baffle, as hereinafter describing in detail.

705 of baffle blade gripper shoes are shown in two different vertical shift positions by segment map, by 705a and 705b indication, yet, for different operating conditions is described, should understand, move for conforming, all tubulose baffle blades can be supported by independent baffle gripper shoe.Baffle blade gripper shoe towards or away from the direction of reflector panel on movable, shown in double-head arrow 712, to launch or withdrawal baffle blade.At least can use an actuator, for example, have the linear actuator 626 of the actuator axle 628 of gripper shoe of being connected to 705.In addition, in order to finish moving of hope, also can use the actuator of any structure.The part 705a of the leftmost side of baffle blade gripper shoe is illustrated as and is in fully retractable position, makes the low side of baffle 708 be recessed in one section suitable distance in the reflector panel 710, and in the present example, this distance is 2.5mm approximately.Reflector panel 710 can, for example, coated any suitable height radioactive material, for example, gold, aluminium, barium sulfate, titanium oxide, other different oxide of aluminium oxide, and their combination.

Continuous ring-like slit 714 is shaped around each lamp, thereby allows a tubulose baffle 708 from wherein moving through.Each slit 714 has a width, and it allows refrigerating gas, and for example, air is according to the downward direction process slit shown in the figure.These refrigerating gases are by one group of opening 715 that is had by gripper shoe 705, and enter slit 714 subsequently.After tubulose baffle and reflector panel 710 coolings, these gases will impact on the window/shower nozzle device that is positioned at the below (shown in Fig. 3 and 4).Lamp with reflective interior surfaces receives cover 716 and is formed, and is used to receive each lamp 704.Reflexive surface can form by following method, for example by coating (using listed material in the leading portion) or by the use moulding material, still, should remember not need to use reflector.

The expansion process of tubulose baffle blade as Figure 22 a from left to right shown in, wherein blade 708a-b withdrawal.The further expansion that illustrates the baffle blade that blade 708c-f increases progressively from left to right, blade 708g-h then is illustrated as and is in expanded position completely, gripper shoe with by Reference numeral 705b indication is located in immediate being against on the reflector panel 710 in the mode that continuous refrigerating gas can be provided.Stop flowing of refrigerating gas if desired, reflector panel 710 and gripper shoe 705 can be set to engage synergistically mutually to finish this purpose.

With reference to Figure 22 b and 22c, in conjunction with Figure 22 a, the former illustrates the underside perspective view of another embodiment of the device of tubulose baffle shown in Figure 22 a, and wherein baffle 708 is in retracted position.Figure 22 c illustrates the baffle 708 that selected some are in expanded position, certainly, should understand the expansion that all baffles can be simultaneously.Should be appreciated that each baffle 708 has an inside, it receives a heating element heater at least in part when moving from the retracted position to the expanded position.Certainly, also can be implemented as make the part of each heating element heater at least in the baffle moving process sometime in the outside of the inside of baffle.For example, the tubulose baffle can be pulled out reflector panel 705 completely from its retracted position.As another example, the tubulose baffle can supported support, and this support member launches to the main tubular body of each baffle from gripper shoe 705, defines the inside of baffle, make heating element heater when baffle is positioned at completely expanded position, to the outside that is positioned at brake tube inside of small part.

In this example, the baffle mounted blade that launches fully to low side reflector panel surface 715 at a distance of 45mm.The about 25mm of diameter of each tubulose baffle blade.Should understand, all sizes that provide all are for for the spirit to the description of one of many kinds possibility structures is provided, and make those of ordinary skill in the art can utilize the disclosure, and not as restriction.Based on this geometry, have little angle α and β, show that with respect to the tubulose baffle 708g that launches fully baffle is used to stop the light of considerable part, otherwise above-mentioned light will impinge upon on the workpiece when baffle is withdrawn fully.Should be appreciated that and consider whole openly, can be easy to this figure is adjusted, baffle diameter and length of run are changed.And, should be noted that the baffle that is positioned at expanded position, the same with all embodiment described herein, also can absorb the energy of launching and reflecting by workpiece and chamber.

With reference to Figure 23, illustrate the lamp that is used for baffle device 700 and the plan view of the selectable distribution of tubulose baffle.Should be appreciated that the distribution that is lamp/baffle with respect to the main distinction of implementing shown in Figure 22 a.In this enforcement, provide a kind of hexagonal array of being formed by lamp 704 and baffle 708 800.At least acceptable is approaching, and this distribution can be considered to provide the thermal source of a circle, thereby finishes the heating and cooling to the workpiece unanimity.

Compound/laminated material and suitable combination that the material that is fit to of tubulose baffle blade 708 of being used to be shaped includes, but are not limited to aluminium, stainless steel, titanium, plating beryllium, graphite.Reflector panel 710 can be made by following material, for example, uses aluminium, stainless steel, titanium and suitable combination.Baffle 708 can be received in baffle blade gripper shoe 705 regularly, for example, and by locator, epoxy resin, compression set, the metal connecting piece of machinery.At least baffle blade interior first type surface should absorption modulation or the radiation of heat-source energy.Inner surface also can be set to absorb the radiation of being sent by workpiece and other energy transitional surface, though this is dispensable.The least significant end of each tubulose baffle should be able to reflected radiation, at least should reflectoscope or the radiation of thermal source, to such an extent as to when baffle is withdrawn, absorb the least possible radiation.Preferably, the outer first type surface of each baffle is the radiation sorbent surface, thereby absorbs by workpiece emission and radiation reflected.As indicated above, coating is a kind of mode that these character are provided, though can utilize many in selectable embodiment, for example, absorb or the relevant assembly of discrete material manufacturing of reflectivity properties by having.

For different purposes, the structure of baffle device 700 can change according to many kinds of modes.For example, can use based on the lamp array and/or the baffle with different lengths of run to produce more consistent cooling.As another example, can distribute the adjusting of finishing hot outline line by fixed allocation or the dynamic structure of adjusting length of run.Like this, all blades can launch identical amount and/or different blades can launch different amounts, even in the different time.

Usually, with respect to baffle device of the present invention, inconsistent baffle structure is adopted in expection, for example, wherein the baffle structure is stopping with a kind of mode, the same degree that does not perhaps stop pass the radiation of whole baffle array, thereby allow nonconforming adjusting.As another example, the baffle device is contemplated to, and has the executing agency of surpassing, thereby drives the baffle of different groups, also is to regulate for nonuniformity.

Above describe many kinds of embodiments of the invention in detail, be worth now proposing some and the contrast of prior art.Unlike the prior art, quote as this paper, for example, Pas invention, baffle device of the present invention has been avoided the shade that occurs on the workpiece completely when baffle is in withdrawal (opening) position.For this point, it is very important to understand following content, that is, this advantage with provide the consistent mode of being heated of workpiece height launch (closing) or the withdrawal (opening) baffle ability provide simultaneously.Like this, compare with using the monolithic baffle that slips into the position between heating unit and the workpiece simply, baffle device of the present invention provides a kind of heat treated embodiment, as one man passes through the surface of whole work-piece potentially by beginning and/or end operation.By regulating the speed and closing or the expansion zero-time of the baffle blade of the trigger event that other is relevant with respect to lamp, hot outline line can be changed to obtain the control than obtainable time-the temperature profile line is bigger in the past, above-mentioned trigger event, for example, to reading of workpiece temperature.The combination of these advantages-unblanketed uniformity-be considered to respect to prior art, to have overwhelming advantage.

Referring now to Figure 24 and 25a, illustrate another embodiment of system made in accordance with the present invention, utilize Reference numeral 1000 roughly to illustrate.System 1000 comprises baffle device 1002, and it matches with circular lamp arrays 1004 (preferably shown in Figure 25 a), thereby has determined flat heated 104, the array that above-mentioned lamp array is made up of lamp 704.As indicated above, the lamp with reflective interior surfaces receives cover 716 and is formed, and is used to receive each lamp 704.The circular thermal source that should be appreciated that consistent plane is by suitably approaching.As indicated above, the tubulose baffle can use with the elongation lamp of other form, and this lamp is included in the light-pipe structure (not shown), described light-pipe structure be set to the principal plane of workpiece transversal direction or normal direction on.The workpiece (not shown) can be supported, for example, with the system's 100 corresponding to modes shown in the described Fig. 3 of preamble and 4.And shower nozzle and window device can be placed between lamp array and the workpiece, for example, and shower nozzle device 120 shown in Fig. 3 and 4.

Continuation is with reference to Figure 24 and 25a, and baffle 1002 comprises baffle blade gripper shoe 1006 (as shown in figure 24), and it is formed with a plurality of isolated concentric baffles and receives slit 1008, and each slit is set to receive the end of one of a plurality of tubulose baffles 1010.These baffles are tubular construction, though this is dispensable, and with one heart, make baffle 1010a have minimum diameter, and the most inboard lamp 704 and being provided with in the whole relatively circular lamp arrays.Yet, should be appreciated that the center lamp is dispensable.Baffle 1010b-d has progressively the diameter that increases with around the lamp 704 that progressively increases quantity.The baffle that reflector panel 1012 has a series of annulars receives slit 1014a-d, each slit has the diameter that increases gradually, and each slit all is used for receiving in the following manner one of corresponding baffle 1010, that is,, the purpose of launching and withdrawing movably therefrom passes for allowing baffle.The situation of embodiment as noted before, anyly suitable close-shapedly can both be used for baffle and reflector panel receives slit (having the structure near the lamp array), described slit has continuous surface, as the rotation tubular surface (for example, oval) or the polygon of sealing, as triangle, rhombus, hexagon, square or rectangular configuration.

1006 quilts of baffle blade gripper shoe have partly illustrated three different deviation posts, indicate by Reference numeral 1016a-c, in order to describe different operating conditions, yet, should understand, for the consistent purpose that moves, all tubulose baffle blades can both be supported by single baffle gripper shoe, though this is dispensable, for example, baffle can be moved and/or gathers two or more baffles and move together by independent.In the present example, baffle blade gripper shoe 1006 towards with direction away from reflector panel 1012 on removable, shown in double-head arrow 1020, baffle 1010 is moved through ring-like slit 1014.For example can use pair of actuator, have the linear actuator 626 of the actuator axle 628 of gripper shoe of being connected to 1006.In addition, any suitable actuator structure can use to finish the action of hope.The core of baffle blade gripper shoe is illustrated as and is in complete retracted position 1016a, make that the low side of baffle 1010a is big to aliging with reflector plane 1012, though the depression that the low side of baffle may be slight in this position is with above described baffle mechanism 700 is identical.Reflector panel 1012 can, for example, coated any high reflection material that is fit to as indicated above, for example, with reference to baffle device 700.

Each annular baffle receives slit 1014 can have a width, and this width allows refrigerating gas, and for example, air passes slit along direction downward shown in the figure.This refrigerating gas is introduced into and passes one group of opening 1022 that is had by gripper shoe 1006, enters slit 1014 subsequently.After cooling tubulose baffle and reflector panel 1012, on the window/shower nozzle device below gas just impacts (shown in Fig. 3 and 4).

Figure 24 illustrates the progress that tubulose baffle blade 708 launches, and wherein baffle 1010a fully withdraws.Baffle 1010b be illustrated as launch fully and withdraw between the centre position.Baffle 1010c and 1010d fully launch, and make gripper shoe 1006 contact in the mode that stops refrigerating gas with reflector panel 1012.To the material resources and/or the thermal stress that can be used to reduce among present embodiment and other embodiment on the assembly that be blocked in of refrigerating gas, described assembly, for example, window or shower nozzle that baffle and processing environment are separated.Cooling blast is provided if desired, will provides a segment distance between reflector panel and the gripper shoe, even when baffle launches fully.

With reference to Figure 25 b and 25c, the former illustrates the underside perspective view of the baffle 1010 that is in retracted position.Figure 25 c then illustrates some selected baffles that are in expanded position in the baffle, though, required understanding, all baffles can side by side launch.

With reference to Figure 24 and 25a-c, should be appreciated that each baffle 1010 has an inside, it receives at least one heating element heater at least in part in the moving process from the retracted position to the expanded position, with above described tubulose baffle device 700 is identical.Selectable structure also can be used, as above about the description of tubulose baffle device 700.In the present example, lamp 704 be set at the concentric circle of tubulose baffle structure in, make the tubulose baffle per two the circle lamps concentric circles between launch.Therefore, it is big that each segment distance of the diameter of baffle just becomes gradually, and described distance depends on the increase of the set of a circle lamp.Should be noted that the tubulose baffle need be between per two continuous concentric rings of being made up of lamp 704, for example, the based target performance determines.

In the present example, the baffle blade that launches fully from the low unfolded surface of reflector panel the distance of about 45mm.The about 25mm of diameter of each tubulose baffle blade.Should understand, all sizes that provide all are for for the spirit to the description of one of many kinds possibility structures is provided, and make those of ordinary skill in the art can utilize the disclosure, and not as restriction.Based on this geometry, the direct radiation crested body device of some useful quantity stops.Certainly, by the change that is fit on geometry, this figure can be conditioned and raise or reduction, for example, changes baffle to spacing distance between the baffle and length of run.And, should be noted that the baffle that is positioned at expanded position, the same with all embodiment described herein, also can absorb the energy of launching and reflecting by workpiece and chamber.

The material that is fit to that is used to make tubulose baffle blade 1010 comprises above described those materials, for example, and with reference to the tubulose baffle of baffle device 700.Similarly, the use of above-mentioned material can be applicable in other assembly of baffle device 100 equally.Baffle blade 1010 can be received in the baffle blade gripper shoe 1006 regularly, for example, and by locator, epoxy resin, compression set, the metal connecting piece of machinery.Two first type surfaces of each baffle blade are set to can absorption modulation or the radiation of heat-source energy, and the radiation of being sent by workpiece or other hot transitional surface.The least significant end surface of tubulose baffle should reflected radiation, is the radiation of reflectoscope or thermal source at least, thereby is the least possible absorption radiation in the baffle withdrawal.As indicated above, for the reaction that need to obtain, but coating and any selection scheme that other is fit to can both be used.

Identical with the situation of baffle device 700, the structure of baffle device 1000 can be changed to be permitted different ways, and these modes are for the consideration to various objectives, for example, and in conjunction with the discussion of baffle device 700.

About the lamp array shown in Figure 23 and 25, should understand, no matter how many reflectors are arranged, all reflecting plate is not set to needs near each lamp.For example, the axial symmetry array of lamp can begin to launch from plane reflector.As another example, the annular lamp structure can be by " flute profile " reflector to pusher.The tubulose baffle, as be used for subject drawings, can similarly use with these designs.Should mention, a network structure can be provided, for example, alveolate texture, in order as one man to move, wherein all tubulose baffles all reciprocally connect, perhaps Zheng Ti shaping.However, this network structure also is considered to the radiation shield of segmentation, as long as it movably passes heating element array.

With reference to Figure 25 a, should be appreciated that any tubulose baffle can both be divided into two or more sections, these sections cooperation has formed total and inside.As an example, baffle 1010d can online 1016a and 1016b cut apart, thereby with baffle in two.

With reference to Figure 26, illustrate the another one embodiment of baffle device made in accordance with the present invention, utilize Reference numeral 1100 roughly to illustrate.It should be noted that, present embodiment and Fig. 3-19 described embodiment are the most approaching, Shen Chang lamp is arranged as in the above-described embodiments, and their axis of elongation is alignd with the first type surface of workpiece at least roughly, and baffle then moves between per two adjacent lamps at least.Owing to the details about this device above is provided, has therefore just no longer repeated for succinct purpose.Yet what arouse attention is, baffle device 1100 has comprised the baffle blade construction 1102 of segmentation, and it is supported and covered by reflector panel 1103.In the present example, each baffle blade 1102 has two-stage structure.Illustrate the expansion progress of baffle 1102 among this figure from left to right.Baffle 1102a is fully retractable in reflector panel 1106.Baffle 1102b just shifts out from reflector panel.Baffle 1102c is emerged from reflector panel, simultaneously its first section 1108 and second sections 1110 relations that are maintained fixed mutually.Illustrated baffle 1102d is that in further expansion process, section 1110 is just shifting out from section 1108.Baffle 1102e has described baffle section 1110 and has launched fully with respect to section 1108.Should be appreciated that relatively moving between the baffle section and may take place that described embodiment does not want it is made restriction in any time in the expansion/withdrawal process.

Generally speaking, herein disclosed is following content: as the part of the system by workpiece being applied controlled heat treatment workpiece, heater comprises isolated heating element array, is used for being in relativeness with workpiece, makes workpiece be subjected to the direct radiation that it produces.Radiation shield comprises a plurality of elements, it is supported to move between with upper/lower positions, (i) retracted position, described direct radiation is allowed to arrive on the workpiece in this position, (ii) expanded position, match in the mode that stops direct radiation at least in part and arrive on the workpiece and absorb at a plurality of elements in this position, thereby can cross and obtain and control that before time of comparing-the temperature profile line is bigger by workpiece emission and radiation reflected.At least specific workpiece moves in adjacent heating element heater, just these workpiece of determining is moved between withdrawal and expanded position.Tubulose, crooked and flat structure can both be used.

Though each aforesaid physical embodiments has been described has the special different assembly of tendency separately,, should understand, the present invention can have multiple specific structure, and different assemblies is placed on more various position and the mutual direction in these structures.And method described herein can be revised in unlimited kind of mode, for example, resequences, revises and variant step is recombinated.Therefore, should be understood that, device disclosed herein can provide with multiple different structure with the method that interrelates with it, and can make amendment with the countless versions different modes, the present invention can show as many kinds other specific modality and without departing from the spirit and scope of the present invention.Therefore, these examples and method are considered to illustrative rather than restrictive, and the present invention is not limited to the given details of this paper, and can make amendment in claim institute restricted portion.

Claims (89)

1. handle in the system of workpiece by workpiece being applied controlled heat at one, a kind of equipment comprises:

Heater, this heater has a flat heated, is used for keeping relativeness with described workpiece, so that described workpiece bears the direct radiation that is produced by described heater;

The radiation shield of segmentation, it comprises a plurality of sections, described a plurality of sections supported between following position, to move by described flat heated at least in part, (i) retracted position, allow described direct radiation to arrive on the described workpiece in this position, (ii) expanded position, in this position described a plurality of sections to stop that at least in part the mode that described direct radiation arrives on the workpiece matches;

Be used for the described a plurality of sections parts that between described retracted position and described expanded position, move.

2. equipment as claimed in claim 1, wherein, described heater comprises heating element array, and at least some described section be displaced between the adjacent heating element heater in the described heating element heater in the mode that between described retracted position and described expanded position, moves.

3. equipment as claimed in claim 2, wherein, each described heating element heater has a heated mandrel, make the heated mandrel of all heating element heaters be in side by side relationship, and each described section all is the baffle spare that forms the elongation of baffle length dimension, makes the length dimension of baffle spare of described elongation aim at least mutually.

4. equipment as claimed in claim 3, wherein, the baffle length dimension of the heated mandrel of described heating element heater and described elongation baffle is partitioned at least roughly relation of side-by-side alignment.

5. equipment as claimed in claim 3, wherein, described workpiece comprises the first type surface that will be exposed to described heater, and described baffle length dimension is with the first type surface of side by side, spaced relation and workpiece rough alignment at least.

6. equipment as claimed in claim 3, wherein, described workpiece comprises the first type surface that will be exposed to heater, and described baffle length dimension is approximately perpendicular to the first type surface of described workpiece at least.

7. equipment as claimed in claim 3, wherein, the baffle spare of the described elongation baffle spare that is provided so that at least one elongation moves and is passed at least in part flat heated between adjacent heating element heater in the mode that moves between the retracted position of this baffle spare and expanded position.

8. equipment as claimed in claim 3, wherein, comprise bracing or strutting arrangement, this bracing or strutting arrangement supports described heating element heater, and has surface in the face of described heater, described bracing or strutting arrangement also has the baffle slit of a plurality of elongations, and each described baffle slit all comprises the baffle opening that is formed at described surface, makes each described baffle slit be set to one of baffle spare that receives at least in part at described retracted position described elongation.

9. equipment as claimed in claim 8, wherein, described bracing or strutting arrangement has the thickness perpendicular to described surface, and has a plurality of through holes that pass described thickness, each through hole comprises and forms in this lip-deep opening, is used for the gas that described at least heating element heater is cooled off.

10. equipment as claimed in claim 8, wherein, described bracing or strutting arrangement has the thickness perpendicular to described surface, and has at least one cooling bath in described thickness, is used for holding cooling fluid in this cooling bath.

11. equipment as claimed in claim 8, wherein, the baffle spare of each described elongation comprises a pair of relative end, between described end, has extended length, each corresponding end is supported by hinge means, this hinge means comprises the hinge arms that can be connected with described bracing or strutting arrangement hinge ground, makes the baffle spare of each elongation rotatably move between its retracted position and expanded position.

12. equipment as claimed in claim 5, wherein, at described expanded position, each baffle spare can be positioned between described flat heated and the described workpiece at least partially, to cooperatively interact with other baffle spare and to stop described direct radiation.

13. equipment as claimed in claim 3, wherein, the baffle spare of each elongation is arc in the transversal plane perpendicular to the length dimension of the baffle spare of each elongation.

14. equipment as claimed in claim 13, wherein, the baffle spare of each elongation comprises leading edge and back edge, be close along a baffle spare at the leading edge of the baffle spare of the specific elongation of described expanded position one near line and adjacent elongation, described near line between the back edge of the baffle spare of its leading edge and adjacent elongation.

15. equipment as claimed in claim 14, wherein, described back edge near line and adjacent baffle is adjacent.

16. equipment as claimed in claim 3, wherein, the baffle spare of each elongation comprises leading edge and back edge, make that at least described leading edge is relative with described heater when baffle is positioned at described retracted position, and the described leading edge of at least one baffle comprises reflective color.

17. equipment as claimed in claim 3, wherein, the baffle spare of each elongation is included in described expanded position and described heating element heater interior surface opposing, and the described inner surface of at least one baffle has supported the reflection-type material.

18. equipment as claimed in claim 3, wherein, the baffle spare of each elongation is included in described expanded position and described workpiece opposed outer surface, and the described outer surface of at least one baffle comprises that radiation absorbs color.

19. equipment as claimed in claim 3, wherein, the baffle spare of described elongation centers on elongation heating element heater separately at least in part in the mode that moves and rotates between described retracted position and described expanded position.

20. equipment as claimed in claim 3, wherein, baffle spare continuous in the baffle spare of described elongation moves between the adjacent heating element heater that replaces.

21. equipment as claimed in claim 3, wherein, the baffle spare of each described elongation is shaped as rectangle plane plate roughly, described rectangle plane plate has a pair of opposed major surfaces and has a pair of relative end, between the described first type surface certain thickness is arranged, has described baffle length dimension between the described end, and described moving-member comprises the pair of control arm, the relative two ends of baffle spare that described pair of control arm is positioned each elongation, and each described control arm comprises the control arm end on one of baffle spare of pivotally being connected described elongation, does this pivot to control arm the mobile baffle spare that causes an elongation that pivotally connects that makes that every pair of control arm is controlled relatively that (they do not rotate with control arm in the mode that moves between described retracted position and described expanded position?).

22. equipment as claimed in claim 1, wherein, described moving-member is set to be used for all described section is as one man moved between described retracted position and described expanded position.

23. equipment as claimed in claim 1, wherein, described heater comprises the heating element array that is in side by side relationship, and from described retracted position when described expanded position moves, each described section begins to move and pass described heating element array along expansion direction from retracted position.

24. equipment as claimed in claim 23, wherein, described expansion direction at least roughly by retracted position towards described workpiece, and each described section be to be set to the baffle spare that launches to described workpiece from described retracted position.

25. equipment as claimed in claim 24, wherein, each described baffle spare is shaped as the generally flat at least plate that defines principal plane, and described expansion direction at least generally aligns with principal plane, and towards workpiece.

26. equipment as claimed in claim 24, wherein, each baffle spare is shaped as the tubular structure that defines baffle inside, make each baffle spare from described retracted position when described expanded position moves, at least one described heating element heater is received in the described baffle inside of each baffle spare at least in part.

27. equipment as claimed in claim 26, wherein, at least one described baffle spare is received in the baffle inside of another described baffle spare.

28. equipment as claimed in claim 26, wherein, described tubular structure is a tubular.

29. equipment as claimed in claim 23, wherein, described heating element heater is arranged as a series of concentric rings, described baffle is also arranged with one heart, make to begin each continuous tubulose baffle that outside from described central point, the described ring that centers on greater number moves from the central point of described array.

30. equipment as claimed in claim 1, wherein, described moving-member comprises provides the parts that described section acceleration that moves and deceleration are controlled between retracted position and expanded position.

31. equipment as claimed in claim 3, wherein, each baffle spare has a baffle plane, and described moving-member adopt respectively towards with away from the linear movement of described heater direction each baffle is launched and withdrawal, make each baffle in its baffle plane, move.

32. equipment as claimed in claim 31, wherein, each baffle has a pair of opposed major surfaces, and at least one baffle comprises that on described opposed major surfaces radiation absorbs color.

33. equipment as claimed in claim 31, wherein, each baffle spare comprises the first and second main relatively edges of a pair of elongation, the main edge of described first elongation is received by described gripper shoe, and described moving-member by towards with away from the direction of described heater on move described gripper shoe linearly and described baffle spare as one man moved.

34. equipment as claimed in claim 33, wherein, when described baffle was mobile between described retracted position and described expanded position, described second of at least one baffle moved and passes described flat heated relative to main edge.

35. equipment as claimed in claim 34, wherein, the described second main relatively edge of at least one baffle comprises the radiation reflective color.

36. equipment as claimed in claim 31, wherein, described baffle device is included on the side of described heater and the reflector panel of facing with it, this reflector panel is relative with described workpiece, and on described reflector panel, have a plurality of elongation baffle slits, make each baffle in the process of launching and withdrawing, in a baffle slit, move.

37. equipment as claimed in claim 36, wherein, each baffle has comprehensive outer surface region, at least one selected slit forms the periphery of an inside, wherein said reflector panel has a plurality of bearing parts in described selected slit, be used for contacting with the part of described comprehensive outer surface, make with described bearing part away from the comprehensive outer surface of described baffle, open with the peripheral intervals of the inside of described slit, received by the interval that is approximately described bearing part thickness at the comprehensive outer surface of baffle described in the periphery of the inside of described slit.

38. equipment as claimed in claim 37, wherein, described baffle and described slit are spaced apart, thereby have formed a plurality of cooling baths, provide at least cooling to described selected baffle thereby refrigerating gas can flow through this cooling bath.

39. handle in the system of workpiece by workpiece being applied controlled heat at one, a kind of method comprises the steps:

One heater is provided, and this device has a flat heated, and this plane is used for keeping relativeness with described workpiece, makes described workpiece bear the direct radiation that is produced by heater;

Dispose the radiation shield of a segmentation, make it comprise a plurality of sections, described a plurality of sections are supported between with upper/lower positions and move, (i) retracted position, allow described direct radiation to arrive on the described workpiece in this position, (ii) expanded position matches to stop the mode that described direct radiation arrives on the described workpiece at least in part at a plurality of workpiece in this position.

40. method as claimed in claim 39, wherein, the described heater that provides comprises a heating element array, makes some described section to be displaced between the adjacent heating element heater in the described heating element heater in the mode that moves between described retracted position and described expanded position.

41. method as claimed in claim 40, wherein, each described heating element heater is in elongated lengthwise, has a heated mandrel, make the heated mandrel of described heating element heater be in side by side relationship, and each the described section baffle spare as the elongation that forms the baffle length dimension provides, and also comprises the length dimension of the baffle spare of described elongation is aimed at least mutually.

42. method as claimed in claim 41 wherein, is arranged in the baffle length dimension of the heated mandrel of described heating element heater and described elongation baffle the relation of isolated at least roughly side-by-side alignment.

43. method as claimed in claim 42, wherein, described workpiece comprises the first type surface that will be exposed to described heater, comprises that also the first type surface with described baffle length dimension and workpiece is arranged in the relation of isolated at least roughly side-by-side alignment.

44. method as claimed in claim 42, wherein, described workpiece comprises the first type surface that will be exposed to described heater, comprises that also heated mandrel and the described baffle length dimension with described heating element heater is arranged in the first type surface that is approximately perpendicular to described workpiece at least.

45. method as claimed in claim 41, wherein, the baffle spare of the described elongation baffle spare that is provided so that each elongation moves and is passed at least in part flat heated between adjacent heating element heater in the mode that moves between the retracted position of described baffle spare and expanded position.

46. method as claimed in claim 41, wherein, comprise the step that forms bracing or strutting arrangement, described bracing or strutting arrangement is used to support described heating element heater and has a surface in the face of described heating element heater, described bracing or strutting arrangement also is shaped as the baffle slit with a plurality of elongations, each described baffle slit all has the baffle opening that is formed at described surface, makes each described baffle slit all be arranged in use in described retracted position and receives one of baffle spare of described elongation at least in part.

47. method as claimed in claim 46, wherein, described bracing or strutting arrangement is shaped as the thickness that has perpendicular to described surface, and has a plurality of through holes that pass described thickness, each through hole comprises and forms in this lip-deep opening, is used for the gas that described heating element heater is cooled off.

48. method as claimed in claim 46, wherein, described bracing or strutting arrangement is shaped as the thickness that has perpendicular to described surface, and has at least one cooling bath in described thickness, is used for holding cooling fluid in this cooling bath.

49. method as claimed in claim 46, wherein, the baffle spare of described elongation is set to comprise a pair of relative end, between described end, has extended length, also comprise the step of using hinge means that each described opposed end is supported, this hinge means comprises the hinge arms that can be connected with described bracing or strutting arrangement hinge ground, makes the baffle spare of each described elongation move rotatably between its retracted position and expanded position.

50. method as claimed in claim 31, wherein, at described expanded position, the baffle spare of each elongation can be positioned between described flat heated and the described workpiece at least partially, itself and other baffle spare is cooperatively interacted and stops described direct radiation.

51. method as claimed in claim 41, wherein, it is arc that the baffle spare of each elongation is set in the transversal plane perpendicular to the length dimension of the baffle spare of each elongation.

52. method as claimed in claim 51, wherein, the baffle spare of each elongation also is set to have leading edge and back edge, be close along a baffle spare at the leading edge of the baffle spare of the specific elongation of described expanded position one near line and adjacent elongation, described near line between the leading edge and back edge of the baffle spare of described adjacent elongation.

53. method as claimed in claim 52, wherein, described back edge near line and described adjacent baffle is adjacent.

54. method as claimed in claim 41, wherein, the baffle spare of each elongation is set to comprise leading edge and back edge, make that at least described leading edge is relative with described heater when baffle is positioned at described retracted position, also comprise described leading edge is configured as the step that comprises reflective color.

55. method as claimed in claim 41, wherein, the baffle spare of each elongation is shaped as and comprises inner surface, and is relative with described heating element heater at this inner surface of described expanded position, also is included in the step of described inner surface supporting reflex section bar material.

56. method as claimed in claim 41, wherein, the baffle spare of each elongation comprises outer surface, and is relative with workpiece at this outer surface of described expanded position, and the described outer surface of at least one baffle comprises that radiation absorbs color.

57. method as claimed in claim 41, wherein, the baffle spare of described elongation is supported for, and the elongation heating element heater that centers at least in part separately in the mode that moves between described retracted position and described expanded position rotates.

58. method as claimed in claim 41 comprises baffle spare continuous in the baffle spare of described elongation is set to move between the adjacent heating element heater that replaces.

59. method as claimed in claim 41, wherein, comprise the step that the baffle spare of each described elongation is configured as rectangle plane plate roughly, described rectangle plane plate has a pair of opposed major surfaces and has a pair of relative end, between the described first type surface certain thickness is arranged, has described baffle length dimension between the described end, also comprise the step that moving-member is set, described moving-member comprises the pair of control arm, the pair of control arm is positioned the relative two ends of baffle spare of each elongation, and each control arm comprises the control arm end on one of baffle spare of pivotally being connected described elongation, and this pivots to control arm the mobile baffle spare that causes an elongation that pivotally connects that makes that every pair of control arm is controlled relatively in the mode that moves between described retracted position and described expanded position.

60. method as claimed in claim 39, wherein, described moving-member is set to be used for all described section is as one man moved between described retracted position and described expanded position.

61. method as claimed in claim 39, wherein, the described heater that is provided comprises a heating element array of arranging with side by side relationship, and from described retracted position when described expanded position moves, wherein each described section begins to move and pass described heating element array along expansion direction from described retracted position.

62. method as claimed in claim 61, wherein, described expansion direction at least roughly by described retracted position towards described workpiece, and be configured to the baffle spare that launches to described workpiece from described retracted position with each described section.

63. method as claimed in claim 62, wherein, each described baffle spare is shaped as the generally flat at least plate that defines principal plane, and described expansion direction at least generally aligns with described principal plane, and towards described workpiece.

64. method as claimed in claim 62, comprise each baffle spare is shaped as the tubular structure that defines baffle inside, make each baffle spare from described retracted position when described expanded position moves, a described heating element heater is received in the described baffle inside of each baffle spare at least in part.

65. as the described method of claim 64, wherein, at least one described baffle spare is received in the baffle inside of another described baffle spare.

66. as the described method of claim 64, wherein, described tubular structure is a tubular.

67. method as claimed in claim 39, wherein, described moving-member is set to comprise to be provided described section acceleration that moves and the parts controlled of deceleration between retracted position and expanded position.

68. method as claimed in claim 62, comprise described heating element heater is arranged as a series of concentric rings, described baffle is also arranged with one heart, makes to begin each continuous tubulose baffle from the central point of described array, outside from described central point, the described ring that centers on greater number moves.

69. method as claimed in claim 41, wherein, each baffle spare has a baffle plane, and described moving-member is set to adopt respectively towards with linear movement away from described heater direction each baffle being launched and withdrawal, makes each baffle move in its baffle plane.

70. as the described method of claim 69, wherein, each baffle has a pair of opposed major surfaces, also being included in provides radiation to absorb color on the described opposed major surfaces of at least one baffle.

71. method as claimed in claim 41, wherein, comprise reflector panel is arranged on the side of described heater and with it and face, this reflector panel is relative with described workpiece, and on described reflector panel, have a plurality of elongation baffle slits, make each baffle in the process of launching and withdrawing, in a baffle slit, move.

72. as the described method of claim 71, wherein, each baffle has comprehensive outer surface region, and described method comprises that at least one selected slit of formation is to form the periphery of an inside, and described reflector panel formed have a plurality of bearing parts, be used for contacting with the part of described comprehensive outer surface, make with described bearing part away from the comprehensive outer surface of described baffle, open with the peripheral intervals of the inside of described slit, received by the interval that is approximately described bearing part thickness at the comprehensive outer surface of baffle described in the periphery of the inside of described slit.

73. as the described method of claim 72, wherein, described baffle and described slit are spaced apart, thereby form a plurality of cooling baths, provide cooling to described at least selected baffle thereby refrigerating gas can flow through this cooling bath.

74. handle in the system of workpiece by workpiece being applied controlled heat at one, a kind of equipment comprises:

The heating element heater of a plurality of elongations is used to make described workpiece to bear the radiation that is produced by described heating element heater;

Bracing or strutting arrangement, it has at least one surface that is used to support described heating element heater, and described heating element heater is in the relation relative with described workpiece abreast;

The baffle spare of a plurality of elongations, at least roughly align with described elongation heating element heater, and allow described radiation to send the retracted position that directly impinges upon on the workpiece and make described baffle spare begin from described surface outwards to move by described retracted position from described heating element heater at described baffle spare, removable to be sandwiched between the expanded position between the selected adjacent heating element heater, at described expanded position, be provided with to the mode that the described radiation of small part directly shines on described of the worker with a kind of preventing;

Be used between described retracted position and described expanded position, supporting and moving the parts of the baffle spare of described elongation.

75. as the described equipment of claim 74, wherein, at described expanded position, described baffle spare also is sandwiched between described workpiece and the described heating element heater.

76. handle in the system of workpiece by workpiece being applied controlled heat at one, a kind of method comprises the steps:

Heating element heater by a plurality of elongations is provided, is used to make described workpiece to bear the radiation that produces by described heating element heater;

Form a bracing or strutting arrangement, it has at least one surface that is used to support described heating element heater, and described heating element heater is in the relation relative with described workpiece abreast;

Support the baffle spare of a plurality of elongations, it is at least roughly alignd with described elongation heating element heater, and allow described radiation to send the retracted position that directly impinges upon on the described workpiece and make described baffle spare begin from described surface outwards to move by described retracted position from described heating element heater at described baffle spare, removable to be sandwiched between the expanded position between described heating element heater and the described workpiece, at described expanded position, be provided with to the mode that the described radiation of small part directly shines on the described workpiece with a kind of preventing.

77. as the described method of claim 76, wherein, at described expanded position, described baffle spare also is sandwiched between described workpiece and the described heating element heater.

78. handle in the system of workpiece by workpiece being applied controlled heat at one, an equipment comprises:

Heater is used for keeping relative relation with described workpiece, makes described workpiece bear the direct radiation of being sent by described heater;

Radiation shield, supported, between with upper/lower positions, to move pivotally, (i) retracted position, be positioned at least in part on the side of the described heater relative to allow described direct radiation to arrive on the workpiece and (ii) expanded position, between described heater and described workpiece with described workpiece, at described expanded position, described radiation shield is used to stop at least in part that described direct radiation arrives described workpiece.

79. handle in the system of workpiece by workpiece being applied controlled heat at one, a kind of method comprises the steps:

One heater is provided, is used for keeping relative relation, make described workpiece bear the direct radiation of sending by described heater with described workpiece;

Support radiation shield, so that optionally pivot is mobile between described heater and described workpiece between with upper/lower positions, (i) retracted position, be positioned at least in part on the side of the described heater relative to allow described direct radiation to arrive on the described workpiece with described workpiece, (ii) expanded position, at described expanded position, described radiation shield is used to stop at least in part that described direct radiation arrives described workpiece.

80. handle in the system of workpiece by workpiece being applied controlled heat at one, an equipment comprises:

Heater, it comprises an isolated heating element array, is used for keeping relative relation with described workpiece, makes described workpiece bear the direct radiation that is produced by described heater;

The radiation shield of segmentation, comprise a plurality of sections, described a plurality of sections are supported between with upper/lower positions and move, (i) retracted position, this position allows the described workpiece of described direct radiation irradiation, (ii) expanded position, in this position described a plurality of sections to stop that at least in part the mode that described direct radiation arrives on the workpiece matches; And be set in the section that is moving in the mode that between described retracted position and described expanded position, moves these particular segments between the adjacent heating element heater in some described radiation shield at least.

81. handle in the system of workpiece by workpiece being applied controlled heat at one, a kind of method may further comprise the steps:

One heater is provided, and this heater comprises an isolated heating element array, is used for keeping relative relation with described of worker, makes described workpiece bear the direct radiation that is produced by described heater;

The radiation shield of segmentation is set, this radiation shield comprises a plurality of sections, described a plurality of sections are supported between with upper/lower positions and move, (i) retracted position, this position allows the described workpiece of described direct radiation irradiation, (ii) expanded position, in this position described a plurality of sections stopping that at least in part the mode that described direct radiation arrives on the described workpiece matches, described a plurality of sections and be set in the section that is moving in the mode that between described retracted position and described expanded position, moves these particular segments between the adjacent heating element heater in some described radiation shield at least.

82. handle in the system with workpiece of handling width by workpiece being applied controlled heat at one, a kind of equipment comprises:

Heater is used for keeping relative relation with described workpiece, makes the processing width of described workpiece bear the direct radiation of being sent by described heater;

Radiation shield, supported, between following state, to move, (i) open mode, this state allows described direct radiation to arrive on the described workpiece and can not cause shade on described workpiece, (ii) deployed condition stops that at radiation shield described in this state described direct radiation arrives described workpiece, makes described radiation shield move one section distance less than described processing width between described retracted mode and described deployed condition;

Be used between described open mode and described deployed condition, moving the parts of described radiation shield.

83. handle in the system with workpiece of handling width by workpiece being applied controlled heat at one, a kind of method comprises the steps:

One heater is provided, is used for keeping relative relation, make the processing width of described workpiece bear the direct radiation of sending by described heater with described workpiece;

Support radiation shield, between following state, to move, (i) open mode, this state allows described direct radiation to arrive on the described workpiece and can not cause shade on described workpiece, (ii) deployed condition, stop that at radiation shield described in this state described direct radiation arrives described workpiece, make described radiation shield between described retracted mode and described deployed condition, move one section distance less than described processing width;

Mobile radiation shield between described open mode and described deployed condition.

84. handle in the system with workpiece of handling width by workpiece being applied controlled heat at one, a kind of equipment comprises:

Heater is used for keeping relative relation with described workpiece, makes the processing width of described workpiece bear the direct radiation of being sent by described heater;

Radiation shield, comprise a plurality of elements, described element is supported, with following state between move, (i) open mode, this state allow described direct radiation to arrive on the described workpiece and can not cause shade and (ii) deployed condition on described workpiece, stop that at radiation shield described in this state described direct radiation arrives described workpiece, make each described element between described open mode and described deployed condition, move one section distance less than described processing width;

Be used between described open mode and described deployed condition, moving the parts of described radiation shield.

85. as the described equipment of claim 84, wherein, described heater comprises the device of being made up of heating element heater, and described radiation shield comprises a plurality of sections, as above-mentioned a plurality of elements, these sections cooperatively interact in described deployed condition and to stop described direct radiation at least in part, and are being retracted at least between the selected adjacent described heating element heater in the moving of described open mode.

86. handle in the system with workpiece of handling width by workpiece being applied controlled heat at one, a kind of method comprises the steps:

One heater is provided, is used for keeping relative relation, make the processing width of described workpiece bear the direct radiation of sending by described heater with described workpiece;

Radiation shield is set, make it comprise a plurality of elements, described element is supported, between following state, to move, (i) open mode, this state allow described direct radiation to arrive on the described workpiece and can not cause shade and (ii) deployed condition on described workpiece, stop that at radiation shield described in this state described direct radiation arrives described workpiece, make each described element between described open mode and described deployed condition, move one section distance less than described processing width;

Between described open mode and described deployed condition, move described radiation shield.

87. as the described method of claim 86, wherein, the described heater that provides comprises the device of being made up of described heating element heater, and described radiation shield is set to comprise a plurality of sections, as above-mentioned a plurality of elements, these sections cooperatively interact in described deployed condition and to stop described direct radiation at least in part, and are being retracted at least between the selected adjacent described heating element heater in the moving of described open mode.

88. handle in the system of workpiece by workpiece being applied controlled heat at one, a kind of equipment comprises:

Heater is used for keeping relative relation with described workpiece, makes described workpiece bear the direct radiation that is produced by described heater, and described heater comprises a plurality of isolated heating element heaters;

Radiation shield comprises a plurality of cover elements, described cover element is supported, between following state, to move, (i) open mode, this state allows described direct radiation to arrive on the described workpiece and can not cause shade on described workpiece, (ii) deployed condition stops at least in part that at the element of cover described in this state described direct radiation arrives described workpiece, makes each described cover element move between adjacent heating element heater at least;

Be used between described open mode and described deployed condition, moving the parts of described radiation shield.

89. handle in the system of workpiece by workpiece being applied controlled heat at one, a kind of method comprises the steps:

One heater is provided, is used for keeping relative relation with described workpiece, make described workpiece bear the direct radiation that is produced by described heater, described heater comprises a plurality of isolated heating element heaters;

Radiation shield is set, make it comprise a plurality of cover elements, described cover element is supported, between following state, to move, (i) open mode, this state allow described direct radiation to arrive on the described workpiece and can not cause shade and (ii) deployed condition on described workpiece, stop at least in part that at the element of cover described in this state described direct radiation arrives described workpiece, make each described cover element between adjacent heating element heater, move at least;

Between described open mode and described deployed condition, move described radiation shield.

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