CN1858652A - Method for keeping optical etcher high speed synchronous control time sequence signal completeness - Google Patents
Method for keeping optical etcher high speed synchronous control time sequence signal completeness Download PDFInfo
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Abstract
This invention discloses a method for maintaining the integrality of high speed synchronous control time sequence signals of an aligner, in which, a synchronous bus controller ensures the impedance control of high speed signals in lamination, besides, a supply plane of the bus controller is adjacent to the ground in lamination to form a plate condenser and the signal layer is adjacent to the ground, which realizes synchronous signal control to the exposing scanning to a step projecting aligner and takes the synchronous bus data transmission as the primary standard of time to strictly control the time point of each signal with its minimum time unit so as to realize real time and synchronization among signals of sub-modules.
Description
Technical field
The present invention is the method for a maintenance optical etcher high speed synchronous control time sequence signal completeness, the implementation procedure that relates to a kind of advanced scanning projecting photoetching machine synchronous control signal, further, relating to advanced scanning projecting photoetching machine synchro control bus is the implementation procedure of the synchronous control signal at center, and by the synchronous coordination process between the submodule of synchronous control signal control and constraint.
Background technology
Litho machine is the equipment of most critical in the ic processing.Abroad as far back as just having proposed the notion of photoetching of future generation many years ago, and technology such as extreme ultraviolet linear light quarter, electron beam projection lithography, ion beam projection lithography have been carried out a large amount of research, but owing to many reasons such as technology, production efficiency, costs, these technology still are difficult to complete practicability at present.Account for the deep UV projection lithography equipment that remains of market leading position at present.
Current, what the overwhelming majority came into operation is the step and repeat lithography machine.In the step and repeat lithography machine, whole image field exposes simultaneously.This system is design and realization easily.Along with market improves constantly the demand that, high precision wide to large scale, fine rule, high-level efficiency, low cost integrated circuit are produced, semiconductor equipment has been brought unprecedented challenge.The step and repeat lithography machine adopts Polaroid technology, for the lens combination that increases image field requirement larger diameter as support, but this requirement has run into the dual restriction of technical factor and economic factors, thereby has limited the step and repeat lithography machine to more high precision, larger sized chip manufacture direction develop.
In this case, the scientific research personnel has developed a kind of novel litho machine---advanced scanning projecting photoetching machine.In the step-by-step scanning photo-etching device, exposure process and step and repeat lithography machine are different.Light beam projects on the mask face by a slit and transmission illumination system, mask with set at the uniform velocity by this Shu Guang.Simultaneously, silicon chip motion in the opposite direction below lens.This step-by-step scanning photo-etching device is compared with the step and repeat lithography machine, has lower distortion and more large-area image field; Simultaneously, the mask platform of the work stage of carrying silicon chip and carrying mask can both realize high-speed motion, makes step-by-step scanning photo-etching device have very high throughput rate, thereby has satisfied the demand of market to semi-conductor chip processing better.
The ultimate principle of advanced scanning projecting photoetching machine is seen Fig. 1, and Figure 1A is image field and slit exposure area schematic, and zone 10 is an image field, and its scope is greater than common step and repeat lithography machine, and step and repeat lithography machine image field is generally 22*22mm
2, step-by-step scanning photo-etching device can reach 26*33mm
2, zone 11 is the slit exposure zone shown in the shade.Figure 1B is the advanced scanning projecting photoetching machine working state schematic representation, step-by-step scanning photo-etching device is when carrying out exposure scanning, at first will treat on the silicon chip 27 that exposed areas moves to the below of lens 22, silicon slice placed is on work stage 21, and the motion that remains a constant speed in exposure process.The mask 26 on this motion and the mask platform 23 and the motion parts of scanning slit unit 24 in time be strict synchronism on the position, silicon chip surface remains in exposure process in the best focal plane of lens 22 always simultaneously.When illuminator 25 arrives assigned address in work stage 21 and mask platform 23 with command speed, by synchronous triggering and the light dosage 28 that provides exposure required is provided.
Step-by-step scanning photo-etching device is by mask platform 23 and the work stage 21 relative modes that are synchronized with the movement, and waits other submodule collaborative work with illumination, realizes exposure actions.Because the factor of decision exposure quality such as alignment precision, critical size requires each submodule precise synchronization on action sequence that participation exposes in the litho machine.
Step-by-step scanning photo-etching device is compared with the step and repeat lithography machine, need note synchronous problem more, this be because:
(1) to all submodules that relates to, scanning must be finished in the identical time period.Specifically, work stage and mask platform must be passed through track planned in advance in the identical time period; Illuminator must provide equally distributed correct dose in the identical time period; The slit control system must synchronously open and close its slit with mask platform.
(2) for all submodules that relates to, the initial moment of scanning must be identical with the finish time.Particularly, work stage and mask platform must begin to provide the moment of exposure dose in illuminator, arrive correct position with correct speed.
Can draw by above analysis,, require all submodules that relate on scanning sequence, to obtain strict conformance for the exposure scan-synchronized.
In addition, it is that actual scanning is prepared that the submodule that participates in exposing needs a period of time, and this time period is called setup time, is mainly used in the speed that laser instrument precharge and work stage and mask platform begin to quicken finally to reach and remain on appointment.The actual scanning time be meant illuminator provide light source, simultaneously work stage and mask platform with uniform motion, silicon chip uniform exposure, finish the required time of exposure actions.
Therefore, single pass was made of preparatory stage and actual scanning stage in the litho machine.
Because throughput rate and performance demands should be able to directly enter into scanning next time after single pass finishes, and not occur pausing in the middle of twice scanning, such scanning is called continuous exposure scanning.In order to realize continuous exposure scanning, require when carrying out current scanning, can prepare essential information for scanning next time.In the continuous exposure scanning, Sao Miao setup time and actual scanning time need be according to the information acquisitions of current scanning next time, so system can only plan by jump ahead; Simultaneously, in the continuous exposure synchronous scanning process, because the variation of external condition need be used the follow-up exposure parameter of before having finished of scanning information correction.
Can draw as drawing a conclusion from above analysis: realize the control of continuous exposure scan-synchronized, the action of the submodule that relates in the mechanism assurance scanning process that need be specific is a strict synchronism; In order to guarantee that the synchronizing signal error between each submodule is strict controlled in the scope of permission, needs isochronous controller to control accurately in time.In order to satisfy these requirements, must guarantee the signal integrity of high-speed synchronous control timing.
Summary of the invention
The object of the present invention is to provide a kind of method that keeps optical etcher high speed synchronous control time sequence signal completeness, realized a kind of synchronizing signal control of advanced scanning projecting photoetching machine exposure scanning.
The present invention is achieved by the following technical solutions: a kind of method that keeps optical etcher high speed synchronous control time sequence signal completeness, isochronous bus controller are guaranteed the impedance Control of high speed signal when lamination.
Wherein, high speed signal is microstrip line or strip lines configuration.The characteristic impedance of high speed signal is 50 ohm.
In addition, power plane and ground level are formed a plate level electric capacity by placed adjacent, and simultaneously, signals layer and ground level are adjacent, and the spacing in the signals layer between the signal wire increases to 2 times of live widths, can also increase isolated ground between signal wire.Digital circuit in the isochronous bus controller and interface circuit are isolated fully, and reference planes are separately arranged.Isochronous bus controller is at the drive end series matching resistor.The synchronous bus control card that comprises isochronous bus controller is placed in the slot of System Backplane central authorities, reduces the relative time delay of bus controller card to each subcard.
The isochronous bus controller that the present invention realizes can obtain following effect in advanced scanning projecting photoetching machine:
(1) improved the reliability of isochronous bus controller;
(2) realized the accurate synchro control of a plurality of submodules in the exposure scanning process;
(3) improved of the real-time process control of industrial computer CPU board to synchronous scanning;
(4) improve the reliability of exposure scanning, and then improved production efficiency.
Description of drawings
Figure 1A is step-by-step scanning photo-etching device exposure image field and scanning slit;
Figure 1B is an advanced scanning projecting photoetching machine exposure scanning ultimate principle;
Fig. 2 is the structured flowchart of isochronous bus controller of the present invention in the scan-synchronized control system;
Fig. 3 is that spacing is 1 times of live width waveform of crosstalking;
Fig. 4 is that spacing is 2 times of live widths waveforms of crosstalking;
Fig. 5 is that spacing is 2 times of live widths and adds the isolated ground waveform of crosstalking;
Fig. 6 is no series matching resistor signal waveform;
Fig. 7 has the series matching resistor signal waveform;
Fig. 8 is a functional circuit isolation view of the present invention;
Fig. 9 is that isochronous bus controller of the present invention is applied to the scan-synchronized control procedure.
Embodiment
The present invention is a kind of method that keeps optical etcher high speed synchronous control time sequence signal completeness, has realized a kind of synchronizing signal control of advanced scanning projecting photoetching machine exposure scanning.The present invention with the synchronous bus data transmission as time reference, by the minimum time unit of synchronous bus, the time point of strict each signal of control, thereby realize signal between each submodule in real time and synchronously.
Isochronous bus controller is the core controller of advanced scanning projecting photoetching machine synchro control.After all subsystems that participate in the synchronous scanning process consulted under the exposure Control Software, isochronous bus controller was implemented the real-time synchro control on the whole scanning process hardware.
The structured flowchart of synchro control process as shown in Figure 2.
Wherein, isochronous bus controller is the core of real-time synchro control process, and the submodule and the motion control card that relate to for all scan exposures provide the unified time benchmark.The exposure Control Software passes to isochronous bus controller to sweep parameter by the VME bus interface of industrial computer CPU board, isochronous bus controller is according to industrial computer CPU board designated parameters, work stage motion control card, mask platform motion control card, work stage laser numbered card, mask platform laser numbered card, track control system, Lighting Control Assembly are carried out synchro control, in the corresponding synchronous of time point output accurately control signal.
The mode of operation that the VME bus interface of isochronous bus controller and industrial computer CPU board provides has A24, D16, RMW Slave, D08 (O), I (1～6) ROAK Interrupter etc.Its function comprises the industrial computer CPU board, and initiatively the register and the isochronous bus controller of access synchronized bus controller interrupt form proactive notification industrial computer CPU board with the VME bus.The interruption of isochronous bus controller is divided into that the time interrupts and order is interrupted, and the time interrupts being meant timer expiry report scanning mode, and it is order report error message when beginning that order is interrupted.
The function of isochronous bus controller is the error message of controlling the exchanges data of synchronous bus, generation synchronous regime broadcast singal, generation external sync control signal, gathering the synchronous scanning process.The requirement of isochronous bus controller be guarantee between each submodule in real time and synchronously.
Because the influence of signal transmission delay on printed circuit board (PCB), high speed signal is easy to generate the problem of signal integrity when transmitting on printed circuit board (PCB).The method of the maintenance optical etcher high speed synchronous control time sequence signal completeness that proposes for the present invention will realize High Speed Synchronous Bus signal stabilization, synchronously, be sent to each subcard exactly low delay, guarantee each submodule in real time and synchronous.
The integrated circuit board that the present invention relates to when designing printed circuit board, has carried out good control to five aspects such as lamination, layout, the control of crosstalking, impedance matching and system layouts.
(1) lamination
The lamination parameter of printed circuit board (PCB) comprises the content of the following aspects: the number of plies of printed circuit board (PCB); The distribution of power plane and ground level; Substrate material, thickness, specific inductive capacity, the width of each layer copper thickness and signal wire etc.These parameters have not only determined the velocity of propagation of signal in the printed circuit board (PCB) plate, and have determined the characteristic impedance of every single line.The basis of the signal integrity of High Speed Synchronous Bus is impedance Control.Isochronous bus controller is designed to ten laminates, and signal is designed to the structure of microstrip line and strip line, has guaranteed that each high speed signal all has good impedance Control.Its characteristic impedance is 50Ohm, and transmission delay is 0.15ns/inch.Independent ground level, power plane are beneficial to impedance Control, reduce electromagnetic interference (EMI), filter away high frequency noise.In isochronous bus controller, ground level, power plane are formed a plate level electric capacity like this by placed adjacent.Capacitance since boring etc. to influence meeting smaller, about 500pF/inch2.The stray inductance of this plate capacitance is very little, and good high frequency decoupling ability can be provided, for the steady operation of High Speed Synchronous Bus provides guarantee.
(2) crosstalk
Crosstalking is the main path that EMI propagates.High speed cabling and other susceptible signals are probably destroyed by crosstalking of causing of outside.The distance of high speed signal parallel transmission is long more, and cross-interference issue is serious more.Therefore, when the backboard of design transmitting high speed synchronous bus, taked following measure: the distance between (1) two signal line is increased to 2 times of live widths, has reduced the coupling between the transmission line; (2) when wiring, signal is walked from the nearer signals layer of reference horizontal plane of manufacturing, has strengthened the coupling between signal and the ground level like this, reduced and the closing signal line between coupling, reduced effectively and crosstalked; (3) between signal wire, add isolated ground.
When spacing was 1 times of live width, the amplitude of disturbed signal fluctuation (crosstalking) was 247mV, as shown in Figure 3;
When spacing was 2 times of live widths, the amplitude of disturbed signal fluctuation (crosstalking) was 132mV, as shown in Figure 4;
When spacing is 2 times of live widths, and when adding isolated ground, the amplitude of disturbed signal fluctuation (crosstalking) is 33mV, and as shown in Figure 5, signal obviously improves.
(3) impedance matching
The basic reason of signal integrity is impedance matching.Must carry out impedance matching to the transmission line that has problems of Signal Integrity.The matching way that isochronous bus controller adopts is that quality of signals is obviously improved at the drive end series matching resistor, has guaranteed the stable of High Speed Synchronous Bus signal.
During no series matching resistor, the waveform of signal, as shown in Figure 6;
When series matching resistor is arranged, the waveform of signal, as shown in Figure 7, signal obviously improves.
(4) placement-and-routing
The synchronous bus control card has taken into full account the topology of High Speed Synchronous Bus when placement-and-routing, shortened High Speed Synchronous Bus wiring lines length, has reduced the time-delay of High Speed Synchronous Bus effectively.The time-delay of High Speed Synchronous Bus on the isochronous bus controller on printed circuit board (PCB) is no more than 0.9ns.For bus signals,, also to guarantee the relative time delay unanimity between the signal except reducing the time-delay of signal.Because concerning data bus, address bus, the sampling of data occurs in synchronization, thus the relative length of necessary strict control bus, to guarantee the synchronism of image data.The relative time delay of the High Speed Synchronous Bus on the isochronous bus controller is no more than 0.1ns.
During placement-and-routing, also to isolate, as shown in Figure 8 the circuit of difference in functionality.Isochronous bus controller mainly comprises digital circuit and two parts of interface circuit.These two parts are isolated fully, and reference planes are separately arranged.Like this, the noise of coming in by interface circuit is blocked in interface, can the signal in the plate not exerted an influence, and has guaranteed the stable of High Speed Synchronous Bus signal.
(5) system design
The system that the present invention relates to is based on the system of VME bus protocol.High Speed Synchronous Bus is transmitted between each integrated circuit board by backboard.When system design, the synchronous bus control card is placed in the slot of backboard central authorities.Can effectively reduce synchronous bus like this and control the relative time delay that snaps into each subcard.Synchronous bus control snaps into the about 0.8ns of maximum delay of each subcard, the about 0.1ns of minimum time-delay.Like this, guaranteed the High Speed Synchronous Bus signal can low delay, synchronously be sent to each subcard, realized each submodule in real time and synchronously.
From above-described process as can be seen, use the method for the maintenance optical etcher high speed synchronous control time sequence signal completeness of the present invention's proposition, can realize the synchro control between internal system and the system effectively, and fully guarantee the real-time of synchronous control signal.
For understanding the present invention better, use the present invention in the synchro control process, we have proposed a specific embodiment, realize the synchro control between each submodule of scanning projection photoetching, and protection scope of the present invention is not limited to the scope that present embodiment is determined.
As shown in Figure 9, control system is by host computer, industrial computer CPU board, isochronous bus controller, motion control card, laser numbered card, and track control system, Lighting Control Assembly are formed.
Host computer adopts workstation or industry control PC, uses operating systems such as Unix or Windows; The industrial computer CPU board adopts as VxWorks, pSOS, RTLinux, real time operating systems such as WinCE; Host computer and industrial computer CPU board are by the interconnection of Industrial Ethernet communication mode.Adopt the VME bus to link together between industrial computer CPU board and isochronous bus controller, motion control card, the laser numbered card, so that carry out real-time embedded message exchange.Adopt self-defining synchronous bus SDB to carry out exchanges data between isochronous bus controller, motion control card, the laser numbered card.Outer synchronous signal between isochronous bus controller and track control system, the Lighting Control Assembly connects employing RS485 differential signal line and connects.The acp chip that isochronous bus controller, motion control card, laser numbered card use is FPGA, DSP etc.Exposure Control Software module is positioned at host computer; Scan control software module industrial computer CPU board.
In order to realize synchro control, isochronous bus controller is issued synchronizing information to work stage motion control card and mask platform motion control card in real time by synchronous bus, isochronous bus controller sends synchronizing information by outer synchronous signal to track control system and Lighting Control Assembly simultaneously, is fully synchronous with work stage, mask platform, dosage supply and slit motion in the strict guarantee continuous exposure scan control.
Based on the isochronous bus controller of above-mentioned making, be incorporated into the control of scanning photoetching machine continuous exposure scan-synchronized, concrete steps are as follows:
Step A: the exposure Control Software module that is positioned at host computer sends to the industrial computer CPU board to exposure parameter by Ethernet.
Step B: the industrial computer CPU board receives exposure parameter, and by the Vxworks operating system of industrial computer CPU board, the invoke synchronous driver module sends to corresponding data in the isochronous bus controller.
Step C: the industrial computer CPU board starts isochronous bus controller by the invoke synchronous driver module.
Step D: under the assurance of synchronous bus signal integrity mechanism, isochronous bus controller notice motion control card and laser numbered card, current state enters the preparation sweep phase, and work stage is moved to sweep starting point.
Step E: under the assurance of synchronizing signal integrity mechanism, isochronous bus controller output blade synchronizing signal indication VS blade Y0 setting in motion.
Step F: under the assurance of synchronizing signal integrity mechanism, isochronous bus controller output laser precharging signal is indicated the high-voltage capacitor charging of first light pulse.
Step G: the preparation sweep phase of isochronous bus controller control is finished, and isochronous bus controller interrupts to the request of industrial computer CPU board, and the current preparation sweep phase of notice industrial computer CPU board is finished.
Step H: under the assurance of synchronous bus signal integrity mechanism, isochronous bus controller notice motion control card and laser numbered card, current state enters the actual scanning stage.And output laser explosure synchronizing signal, the guidance lighting control system produces laser pulse.Laser instrument continues to keep charged state.
Step I: under the assurance of synchronizing signal integrity mechanism, isochronous bus controller output blade synchronizing signal indication VS blade Y1 setting in motion.
Step J: the actual scanning stage of isochronous bus controller finishes, and isochronous bus controller interrupts to the request of industrial computer CPU board, and the notice industrial computer current actual scanning stage of CPU board finishes.
Step K: if Step D is returned in continuous sweep, otherwise to Step L.
Step L: under the assurance of synchronous bus signal integrity mechanism, isochronous bus controller notice motion control card, laser numbered card enter idle condition.
Claims (9)
1, a kind of method that keeps optical etcher high speed synchronous control time sequence signal completeness is characterized in that: isochronous bus controller is guaranteed the impedance Control of high speed signal when lamination.
2, the method for maintenance optical etcher high speed synchronous control time sequence signal completeness according to claim 1 is characterized in that: high speed signal is microstrip line or strip lines configuration.
3, the method for maintenance optical etcher high speed synchronous control time sequence signal completeness according to claim 2 is characterized in that: the characteristic impedance of high speed signal is 50 ohm.
4, the method for maintenance optical etcher high speed synchronous control time sequence signal completeness according to claim 1 is characterized in that: power plane and ground level are formed a plate level electric capacity by placed adjacent, and simultaneously, signals layer and ground level are adjacent.
5, the method for maintenance optical etcher high speed synchronous control time sequence signal completeness according to claim 4 is characterized in that: the spacing in the signals layer between the signal wire increases to 2 times of live widths.
6, the method for maintenance optical etcher high speed synchronous control time sequence signal completeness according to claim 5 is characterized in that: increase isolated ground between the signal wire.
7, the method for maintenance optical etcher high speed synchronous control time sequence signal completeness according to claim 1 is characterized in that: digital circuit in the isochronous bus controller and interface circuit are isolated fully, and reference planes are separately arranged.
8, the method for maintenance optical etcher high speed synchronous control time sequence signal completeness according to claim 1 is characterized in that: isochronous bus controller is at the drive end series matching resistor.
9, the method for maintenance optical etcher high speed synchronous control time sequence signal completeness according to claim 1, it is characterized in that: the synchronous bus control card that comprises isochronous bus controller is placed in the slot of System Backplane central authorities, reduces the relative time delay of bus controller card to each subcard.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103439866A (en) * | 2013-08-28 | 2013-12-11 | 哈尔滨工业大学 | VxWorks-based lithography machine double-workbench communication method and device |
| CN104181901A (en) * | 2014-09-04 | 2014-12-03 | 哈尔滨工业大学 | Upper computer centralized management and multi-level control system based on VxWorks |
| CN104698765A (en) * | 2013-12-10 | 2015-06-10 | 上海微电子装备有限公司 | Control method and control system of step-and-scan lithography machine |
| CN106647181A (en) * | 2016-12-19 | 2017-05-10 | 电子科技大学 | High-speed image exposure method for maskless lithography machine of DMD |
| CN113983924A (en) * | 2021-10-27 | 2022-01-28 | 北京航天巨恒系统集成技术有限公司 | Coordinate calculation system, method and device of multi-axis laser interferometer |
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- 2006-06-02 CN CNB2006100272694A patent/CN100474116C/en active Active
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103439866A (en) * | 2013-08-28 | 2013-12-11 | 哈尔滨工业大学 | VxWorks-based lithography machine double-workbench communication method and device |
| CN103439866B (en) * | 2013-08-28 | 2015-04-15 | 哈尔滨工业大学 | VxWorks-based lithography machine double-workbench communication method and device |
| CN104698765A (en) * | 2013-12-10 | 2015-06-10 | 上海微电子装备有限公司 | Control method and control system of step-and-scan lithography machine |
| CN104181901A (en) * | 2014-09-04 | 2014-12-03 | 哈尔滨工业大学 | Upper computer centralized management and multi-level control system based on VxWorks |
| CN104181901B (en) * | 2014-09-04 | 2016-07-06 | 哈尔滨工业大学 | Multilevel control system is managed concentratedly based on VxWorks host computer |
| CN106647181A (en) * | 2016-12-19 | 2017-05-10 | 电子科技大学 | High-speed image exposure method for maskless lithography machine of DMD |
| CN106647181B (en) * | 2016-12-19 | 2018-03-09 | 电子科技大学 | A kind of high speed image exposure method for DMD maskless photoetching machines |
| CN113983924A (en) * | 2021-10-27 | 2022-01-28 | 北京航天巨恒系统集成技术有限公司 | Coordinate calculation system, method and device of multi-axis laser interferometer |
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Address after: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |