CN1833313A - Device and method for surface treatment such as plasma treatment - Google Patents

Abstract

To effectively perform surface treatment of a large-area object even when a surface treatment device has short holes such as slits through which a treatment gas is blown against a surface of the object. A processing section (1) of a plasma surface treatment device (M) has a plurality of electrode plates (11, 12) arranged side by side. Between adjacent electrode plates, a slit-shaped hole (10a) is formed. A plurality of holes (10a) arranged side by side constitute a hole group (100). A work (W) to be treated is moved in the direction of the extension of the slits (10a) by a moving mechanism (4).

Description

Surface treatment is such as the equipment and the method for plasma treatment

Technical field

The present invention relates to a kind of be used to implement surface-treated equipment and method, this surface treatment is: such as by handling gas blowing to film deposition on the pending object, etching etc. are arranged, such as PCVD (plasma CVD), pyrolysis chemical vapour deposition (CVD) (thermal CVD) or the like.Especially, relate to a kind of so-called drone version plasma processing, and relate to a kind of method, in the method, have pending object to be placed in the outside in formed space between the adjacent electrode, and the plasma that forms between each electrode is directed onto on the object.

Background technology

For example, in patent document 1, a kind of drone version plasma processing as surface processing equipment has been described.This equipment comprises the plasma treatment device, and this plasma treatment device is made up of a plurality of vertical electrode plates that are arranged side by side.In these battery lead plates, be connected with high frequency electric source every one battery lead plate, the remaining battery lead plate every then is grounded.Between every pair of two adjacent battery lead plates, be formed with slit.Handling gas is imported in this slit from eminence.Concurrently, by will supply to from the High frequency power of power supply mention for the first time every one battery lead plate, and apply high-frequency electric field in the slit between adjacent electrode.Because such arrangement handle gas by plasma, thereby the slit between the adjacent electrode plates has been become the plasma space.This is ejected and is applied to having on the pending object below being installed on by the gas of plasma from the lower end of slit.By doing like this, implemented at the Surface Treatment with Plasma of object.

In patent document 2, a kind of method has been described, wherein along with the bearing of trend of battery lead plate and thereby the direction vertical with the bearing of trend that is formed at the slit between two adjacent battery lead plates in the mobile object, plasma is injected on the pending object.By battery lead plate also thereby with slit is made the length that has across the whole width extension of object, can handle whole object simultaneously.

In the equipment of in patent document 3, describing, comprise that the right a plurality of gas injection apparatus of battery lead plate are by arranged side by side.There is pending object to relatively move along the bearing of trend that is formed at the slit between adjacent battery lead plate.

[patent document 1] Japanese Patent Application Publication No.H05-226258 (first page);

[patent document 2] Japanese Patent Application Publication No.2002-143795 (first page);

[patent document 3] Japanese Patent Application Publication No.2003-249492 (first page).

The equipment of describing in the patent document 1 can not be dealt carefully with has large-area object, because the quantity of battery lead plate is very limited.On the contrary, for the object of small size, the quantity of battery lead plate become again exceed required, thereby too much electric power and handle gas and wasted.

Moreover in patent document 1 and 2, it is big more that the area of object becomes, and slit is just long more, and thereby battery lead plate must form needed size.If the required size that slit and battery lead plate form is elongated, then owing to deadweight, Coulomb force, thermal stress etc., battery lead plate is crooked easily.And also be not easy to ensure the accuracy of the size of slit and battery lead plate.Moreover, being accompanied by the increase of the quantity of battery lead plate, the weight exponentially ground of processing unit increases.

In patent document 3, many to battery lead plate to and thereby be formed at every pair of slit between two adjacent battery lead plates and do not arrange with the pitch that equates, thereby what handle is discontinuous at interval.Moreover, for the battery lead plate pitch between the adjacent gas injection apparatus and be in relation between the battery lead plate pitch in the corresponding gas injection apparatus, do not provide clearly explanation yet.

Therefore, primary and foremost purpose of the present invention provides a kind of method, this method can be such as film deposition, etching etc., in the surface treatment such as PCVD (plasma CVD), pyrolysis chemical vapour deposition (CVD) (thermalCVD) etc., implement surface treatment to having large-area object effectively, and further, even be used for each slit of inject process gas (slit row) when being designed to be short and small, this method can make that also the interval of handling is continuous.

Summary of the invention

By handling the equipment that gas blowing being used for to the object handle the surface that pending object (workpiece) is arranged, surface processing equipment according to the present invention comprises: the processor with one group of hole row, this group hole row is made up of a plurality of holes rows, each hole row among these a plurality of holes rows all along a direction extend and on the crossing direction of the bearing of trend of arranging with each hole with etc. pitch lie alongside one another; Processing gas is blowed by each hole row of described hole row; And be used on the direction that intersects with the direction that is arranged side by side the travel mechanism of mobile processor relatively with respect to object.

Because this arrangement, each hole row can be done short and smallly.On the other hand, even this object has big area, also can handle this surface effectively and make the interval of handling stablize constant.

In above-mentioned arrangement, the hole row can be made up of single slit (elongated slit), perhaps can be made up of a plurality of aperture or short slits that are provided with of embarking on journey.

Relative moving direction can be along each hole row's bearing of trend.Under the sort of situation, each hole row's bearing of trend (being relative moving direction) is orthogonal with the direction that is arranged side by side ideally, and is crossing but they can incline towards each other.When the distance between hole row and the object was near the operating distance upper limit that is set in effective range (admissible scope), pitch was set to ideally usually with effective processing width and equates.Because this arrangement can become continuous by the handled zone of plasma that comes from each hole row on the direction that is arranged side by side.The effective range of the distance between hole row and this object refers to the scope (see figure 4) that certain any processing speed on the object can be maintained at effective definite value or bigger value.Similarly, effectively handle width refer to surface treatment can be by the effective range of passing the width dimensions in the gamut that the single hole injected plasma of row implements, and the effective range of handling refers to a scope, in this scope, with this single hole arrange corresponding processing speed become predetermined ratio (such as, 15% to 25%) or bigger than maximum.

Each hole row all extends obliquely with respect to relative moving direction.Because this arrangement, the surface-treated consistency can be enhanced.

In the structure that this extends obliquely, each hole row comes with respect to relative moving direction diagonally extending and these holes that to lie alongside one another on the direction with relative moving direction quadrature also be acceptable.Selectively, each hole row comes with respect to relative moving direction diagonally extending and these holes that to lie alongside one another on the direction with the bearing of trend quadrature also be acceptable.In the structure of this diagonally extending, when the distance between hole row and the object was near the upper limit of effective range, pitch also can be set to and equal effectively to handle width substantially.

In the structure of above-mentioned diagonally extending, ideally, end on a hole row among the hole of two the adjacent arrangements row or each the predetermined hole row's among all described holes rows the bearing of trend and the other end on the bearing of trend that arranges in another hole among described two holes row are arranged on the same straight line on the relative moving direction.Because this arrangement, the surface-treated consistency can be further improved.

This equipment further can comprise be used for direction that the relative moving direction of object intersects on relatively swing the swing mechanism of processor.Because this arrangement, surface treatment can be by unification further.It is desirable to, swaying direction along and orientation or along with the direction of bearing of trend orthogonal.

Processor can comprise a plurality of sections of hole row group on bearing of trend.Because this arrangement, surface treatment can be implemented fully.

Ideally, the hole of adjacent holes row group comes on the direction that is arranged side by side and departs from mutually.Because this arrangement, surface treatment can be by unification.Especially, under hole row's bearing of trend and the parallel situation of relative moving direction, can effectively prevent generation with the inconsistency of speckle.

Ideally, the amount of skew is the 1/n (n is the hop count of hole row group) of pitch.Because this arrangement, the surface-treated consistency can be further improved.

In above-mentioned multi-segment structure, can be: this equipment further comprises with accepting: first swing mechanism, this first swing mechanism with direction that the relative moving direction of object intersects on relatively swing the hole row group of a section in two adjacent segment of a plurality of sections; Second swing mechanism, this swing mechanism with the same direction of the relative swaying direction of first swing mechanism on relatively swing another section in these two sections hole row group, the phase migration mutually of the phase place of this second swing mechanism and described first swing mechanism.Because this arrangement, the surface-treated consistency can be further improved.

Described surface processing equipment is to be used to spray the processing gas that derives from hole row group so that it is applied to device on the object, and this equipment also comprises pyrolysis chemical vapour deposition (CVD) (thermal CVD) equipment except plasma processing.

In plasma processing, it is desirable to, processor comprise a plurality of with etc. the electrod assembly that is arranged side by side of pitch, the slit of slit is formed between two adjacent electrod assemblies of described a plurality of electrod assemblies as a hole row, and hole row group (the hole row group of slit, be slot set) form by the slit that is formed between adjacent two electrod assemblies, being used for plasma treatment has the processing gas of pending object to pass from the slit.When having when being applied to plasma processing with said structure with the present invention of spline structure, this electrod assembly can be done to such an extent that size is little and in light weight, and this equipment can prevent the bending that the increase by mechanical length causes.And dimensional accuracy also can easily obtain.In addition, the quantity of the electrod assembly that this equipment can be arranged side by side by increase is handled has large-area object, and does not need to increase the size of single electrod assembly.Each electrod assembly all has such as tabular structure.

Adjacent electrode is configured to such as opposite polarity, and each slit is as the plasma space, and through the processing gas in plasma space by plasma and injection.In PCVD (plasma CVD) and other surface treatment, same acceptable is: the specific electrodes parts are identical with the polarity of the electrod assembly that is close to the one side, and opposite with the polarity of the electrod assembly that is close to its opposite side; By the active gases of plasma-activated, between adjacent electrode parts, pass with opposite polarity as handling gas; And film material gas passes between the adjacent electrode parts with identical polar as handling gas.

In above-mentioned plasma processing, same acceptable is: processor is included in a plurality of electrode modules that are connected separably on described hole row's the direction that is arranged side by side, each electrode module comprise a plurality of with etc. the electrod assembly that is arranged side by side of pitch, and this electrode module is formed the part of hole row group (slot set).Because this arrangement, by adjusting the linking number of electrode module, the size of whole hole row group can be set to tackle the size of object neatly.

Ideally, each electrode module in two adjacent electrode modules all has the tip electrodes parts that are arranged at the opposite end, and the tip electrodes parts of the another one electrode module of tip electrodes parts in these two electrode modules of an electrode module in two electrode modules are assembled in, so that these tip electrodes parts are formed single compound electrode parts, these compound electrode parts other each electrod assembly with adjacent two electrode modules on thickness is identical.Because this arrangement, even at the connecting portion of two electrode modules, the hole row's of slit-shaped pitch also can equate with the hole row's of remaining part pitch.

Ideally, processor comprises and is used for and will changes the rectification passage of processing gas homogenizing, and hole row is continuous with the rectification passage, so that hole row is bifurcated.In plasma processing, equally ideally, processor comprises a plurality of modular units that are connected separably on the direction that is arranged side by side, each modular unit includes electrode module and is connected in rectification module on the electrode module, rectification module comprises and is used for and will handles the rectification passage of gas homogenizing, the hole row of electrode module is connected to the rectification passage, is bifurcated so that the hole comes in each modular unit.Because this arrangement, processing gas homogenized in single rectification passage can pass a plurality of holes rows, and the processing corresponding with these holes row can more as one man be implemented.

According to additional features of the present invention, provide a kind of by plasma space inject process gas and will handle gas and be applied to the equipment that plasma treatment on the object that is arranged at described plasma space outside has pending object, wherein this equipment comprises first electrode module and second electrode module of arrangement in one direction.Each first electrode module and second electrode module include: a plurality of electrod assemblies that are arranged side by side on equidirectional with the direction that is arranged side by side of first and second electrode modules; And be used to connect support portion with the support electrode parts; Be formed at the slit between each adjacent electrod assembly as the plasma space; All electrod assemblies that make up the first end electrod assembly of an end that is arranged in the second electrode module side in all electrod assemblies of first electrode module and second electrode module are positioned at the second end electrod assembly of an end of the first electrode module side, in order to forming single compound electrode parts, and the electrod assembly of first electrode module except the electrod assembly of the electrod assembly of first end electrod assembly, combination and second electrode module except the second end electrod assembly each other with etc. the pitch setting.According to the structure of this feature, the number of the electrode module that is arranged side by side by adjustment can satisfy the size needs of object neatly.And, even with electrode module between the corresponding position of connecting portion also can handle with identical pitch, thereby can obtain the surface-treated consistency as in the position corresponding with each electrode module.This electrode module structure can be applied to not have in the equipment of travel mechanism equally, and promptly in this equipment, the processing relevant with the processor that comprises electrode module implemented in the mode of fixing with locating.

The first end electrod assembly has identical polarity with the second end electrode.In addition, ideally, first end electrod assembly and the second end electrod assembly be the compound electrode parts electrical ground.Because therefore this arrangement can prevent electric leakage.

According to a preferred embodiment of the present invention, in first electrode module, the first end electrod assembly comprises integratedly: towards the first outstanding thickening part of second electrode module; Thickness is less than first thickening part and towards first thickness reducing part of the opposite side of second electrode module side retraction.In second electrode module, the second end electrod assembly comprises integratedly: towards second thickness reducing part of the opposite side of first electrode module side retraction; On thickness greater than second thickening part and towards the second outstanding thickening part of first electrode module.In the compound electrode parts, first thickening part and second thickness reducing part are by assembled with each other, and first thickness reducing part and second thickening part are by assembled with each other.Because this arrangement, the first and second tip electrodes parts can firmly be connected, be made up and easily be separated.

In this preferred embodiment, to regulate at needs under the situation of temperature of first end electrod assembly, the fluid that is used for regulating the temperature of first end electrod assembly is formed in first thickening part ideally in the adjustment passage that wherein passes through.Because this arrangement, easily formation temperature is regulated passage.

According to another preferred embodiment of the invention, the compound electrode parts are along being divided into a plurality of localizing electrodes parts with the crossing Width of direction that is arranged side by side, localizing electrode's parts in adjacent localizing electrode's parts are supported by the support portion of first electrode module, and then composition first end electrod assembly, and another localizing electrode's parts in adjacent localizing electrode's parts are supported by the support portion of second electrode module, and then form the second end electrod assembly.Because this arrangement, the first and second tip electrodes parts can firmly be connected, and additionally, owing to there are not the needs of partly cutting down the first and second tip electrodes parts, therefore, can obtain sufficient rigidity and suppress crooked.Moreover localizing electrode's parts can easily be made.

Preferably, allow that the fluid of regulating temperature is formed in localizing electrode's parts from the adjustment tunnel-shaped of wherein passing through.Because localizing electrode's parts there is no need to do very thinly, therefore easily formation temperature is regulated passage.

Ideally, each electrod assembly of first electrode module and second electrode module all has the platy structure that intersects with the direction that is arranged side by side, and each tabular electrod assembly of first electrode module equates on thickness except the second end electrod assembly except tabular each electrod assembly of first end electrod assembly, tabular compound electrode parts and second electrode module.Because this arrangement, can be easily and reliably the envoy apart from equating.

According to surface treatment method of the present invention, comprise step: by in one direction with etc. each hole row of being arranged side by side among the hole row on processor of pitch blow processing gas, in order to will handle gas blowing to object in the processor that relatively moves on the direction that intersects in the direction that is arranged side by side relevant with object.Because this arrangement, each hole row can be done short and smallly.On the other hand, even object has big area, also can carry out effective surface treatment for object.

Can when the bearing of trend of arranging along each hole relatively move object, handle the injection of gas, perhaps in bearing of trend relative tilt ground mobile object, handle the injection of gas with respect to each hole row.

Ideally, when the distance between hole row and the object was near the upper limit of effective range, pitch was configured to equal substantially effectively to handle width, and was in this distance under near the upper limit of effective range the condition and handles.

Ideally, processor a plurality of sections by aligned apertures row group are formed, this hole row group is made up of a plurality of holes rows of pitches such as having on bearing of trend, and two adjacent sections of hole row group are offset on the direction that is arranged side by side, a plurality of sections of organizing in hole row of relative motion pin whole and being implemented.Because this arrangement can further improve the surface-treated consistency.

With direction that the direction of relative movement of object intersects on further in the relative swing processor, can implement to handle the injection of gas.Because this arrangement can further improve the surface-treated consistency.

Same acceptable is: processor a plurality of sections by aligned apertures row group are formed, this hole row group by a plurality of have on the bearing of trend parallel with relative motion etc. the hole row of pitch forms, the hole of adjacent section comes the relative swing with the position phase of skew on the direction that intersects with the direction of relative movement of object.

When comparing with the relative movement distance of object, ideally, the swing width of oscillating motion is for enough little.Equally ideally, the swing width of oscillating motion be set to pitch 1/2 or be a bit larger tham 1/2 of pitch.Because this arrangement can obtain the surface-treated consistency reliably.

The 1/m that the cycle of oscillating motion is set at the required time of the relatively mobile corresponding aperture of object row's the distance of length ideally is (m: integer) doubly.Because this arrangement can obtain the surface-treated consistency more reliably.

The present invention is applied to plasma treatment under the situation such as common normal pressure (near atmospheric pressure).When considering the simplification of pressure controlled simple and easy and device structure, the normal pressure that uses among the present invention is commonly referred to as 1.013 * 10 ⁴To 50.663 * 10 ⁴The pressure limit of handkerchief is preferably 1.333 * 10 ⁴To 10.664 * 10 ⁴Handkerchief, and more preferably be 9.331 * 10 ⁴To 10.397 * 10 ⁴The scope of handkerchief.

Description of drawings

Fig. 1 describes the first embodiment of the present invention, is the vertical view cutaway drawing of the atmospheric plasma treatment facility of I-I along the line among Fig. 2.

Fig. 2 analyses and observe key diagram for the forward sight of the atmospheric plasma treatment facility of II-II along the line among Fig. 1.

Fig. 3 is for describing the key diagram of the processing of being undertaken by the plasma gas from the slit of each electrode pair electrode.

Fig. 4 is for describing the coordinate figure of the universal relation between operating distance and the processing speed.

Fig. 5 describes the second embodiment of the present invention, is the vertical view of the general structure of atmospheric plasma treatment facility.

Fig. 6 is the vertical view of each electrode module of the equipment among Fig. 5.

Fig. 7 is the sectional view of the line VII-VII of modular unit in Fig. 8 of the equipment among Fig. 5.

The front cross-section view of the line VIII-VIII that Fig. 8 is a modular unit in Fig. 7.

Fig. 9 is the vertical view cutaway drawing of the line IX-IX of modular unit in Fig. 8 of leading portion and back segment.

Figure 10 is the vertical view cutaway drawing of the part of the battery lead plate of describing electrode module and the connecting portion between the infill panel.

Figure 11 (a) is in the front cross-section view of separation point position for adjacent electrode module on the description left and right directions, and Figure 11 (b) is for describing the front cross-section view that adjacent electrode module is in link position.

The front cross-section view of the line XII-XII that Figure 12 is a modular unit in Fig. 9.

Figure 13 is the vertical view cutaway drawing of the line XIII-XIII of rectification module in Fig. 8 of modular unit.

Figure 14 is the coordinate figure of the processing undertaken by the electrode module of leading portion and back segment with the formal description of the position of workpiece and processing speed.

Figure 15 describes the improved embodiment of second embodiment, and Figure 15 (a) is in the front cross-section view of separation point position for adjacent electrode module on the description left and right directions, and Figure 15 (b) is for describing the front cross-section view that adjacent block is in their link position.

Figure 16 describes the third embodiment of the present invention, is the vertical view cutaway drawing of atmospheric plasma treatment facility.

Figure 17 is the vertical view cutaway drawing of the improved embodiment of description the 3rd embodiment.

Figure 18 is the vertical view cutaway drawing of another improved embodiment of description the 3rd embodiment.

Figure 19 is for describing the vertical view cutaway drawing of an improved embodiment again of the 3rd example.

Figure 20 is the vertical view cutaway drawing of the another improved embodiment of description the 3rd embodiment.

Figure 21 is the vertical view cutaway drawing of the combined embodiment of the equipment of the assembly of the theme of describing the 3rd embodiment and second embodiment.

Figure 22 is for describing the vertical view of the fourth embodiment of the present invention.

Figure 23 is the vertical view of the improved embodiment of description the 4th embodiment.

Figure 24 is the result's of description test case 1 coordinate figure.

Description of reference numerals

M-atmospheric plasma treatment facility (surface processing equipment)

W-workpiece (pending object is arranged)

1-plasma treatment head (processor)

The 1X-modular unit

10-first and second electrode modules

10a-slit (hole row is as the slit in plasma space)

100-slot set (hole row group)

The battery lead plate of 11-high-potential electrode (tabular electrod assembly)

The battery lead plate of 12-grounding electrode (tabular electrod assembly)

12L, 12R-tip electrodes plate (first or the second end electrod assembly)

12X-combined electrical pole plate (compound electrode parts)

12f, 12k-first or second thickening part

12g, 12h-first or second thickness reducing part

12p-localizing electrode plate (localizing electrode's plate)

12a, 12b, 12c, 12f-coolant channel (adjustment passage)

The 20-rectification module

4-travel mechanism

The 8-swing mechanism

8A-first swing mechanism

8B-second swing mechanism

Embodiment

Followingly some embodiments of the present invention are described with reference to accompanying drawing.

Fig. 1 and Fig. 2 describe first embodiment according to basic structure of the present invention.Atmospheric plasma treatment facility M as surface processing equipment comprises: plasma treatment 1 (processor), processing gas supply source 2, power supply 3 and travel mechanism 4.Under approximate normal pressure (near under the atmospheric pressure), this plasma treatment equipment M is suitable for plasma treatment is carried out on the surface of workpiece W, and as pending object is arranged, workpiece W has big area, such as liquid-crystalline glasses substrate and semiconductor wafer.

Handle to lay in the gas supply source 2 gaseous state or liquid single or multiple processing gas component are arranged.Liquid gas component is volatilized, and supposes these gas components of various ingredients, suitable quantity, is mixed and makes a kind of processing gas according to the purpose of handling.

Power supply 3 as the electric field feeding mechanism is provided, and power supply 3 output voltages such as pulse voltage, are being handled an isoionic voltage of 1 formation as being used for.What hope obtained is: the rise time of pulse and/or fall time are 10 μ s or shorter, pulse duration is 200 μ s or shorter, electric field strength in the slit between adjacent battery lead plate 10 is 1 to 1000kV/cm as described later, and ripple is 0.5kHz or higher frequently.

For voltage pulse output, power supply 3 is not limited to one, but power supply 3 can be a power supply that is used to export sinusoidal high-frequency ac voltage or is used for output dc voltage.

Travel mechanism 4 is connected with the workpiece placement station 5 (only shown in Figure 2) of level.Workpiece W is flat on this workpiece placement station 5.In (direction shown in double-headed arrow among Fig. 1) on the fore-and-aft direction, travel mechanism's 4 travelling workpiece platforms 5 and thereby travelling workpiece W.By doing like this, workpiece W is through handling 1 following and accepting Surface Treatment with Plasma.Workpiece W can be processed when moving back and forth, and is perhaps processed when forwards or rearward (only one-way movement) is mobile, and then removed from work stage 5.Certainly, workpiece W fixes with being positioned, and travel mechanism 4 with handle 1 and be connected and be used for moving that to handle head also be acceptable.Travel mechanism 4 can be roller transmissioning device or analog.Be assumed to roller transmissioning device, then workpiece W can directly be positioned on this roller transmissioning device, and therefore can save workpiece placement station 5.

As shown in Figure 2, workpiece temperature adjusting device 5H (object temperature adjusting device) is connected to the workpiece placement station 5 of equipment M such as heater.By this workpiece temperature adjusting device 5H, workpiece is heated or cooled the suitable temperature that is used to handle.This workpiece temperature adjusting device 5H can be arranged at the outside of workpiece placement station 5.

The plasma head 1 of plasma processing M will be described.

As shown in Figure 2, handle 1 and be supported on the unshowned support base so that this processing 1 is located in the position higher than workpiece placement station 5, and thereby workpiece W be placed on the platform 5.Handling 1 is made of single modular unit 1X.The rectification module 20 that this modular unit 1X comprises electrode module 10 and is installed on the upside of this electrode module 10.This electrode module 10 constitutes the plasma release, and rectification module 20 constitutes rectifier.

Receiving port 21 and rectification tunnel-shaped are formed on the rectification module 20.Leading to the pipe 2a that handles gas supply source 2 is connected with receiving port 21.The rectification passage is made up of rectification hole 23a of rectification chamber 20a, slit-shaped (or point-like) etc.End portion at gas rectification module 20 is provided with cowling panel 23, with the formation parts as rectification hole.A plurality of rectification hole 23a in the left and right sides with etc. pitch be formed in the cowling panel 23.Each rectification hole 23a is the form of slits of extending along fore-and-aft direction (direction vertical with the paper of Fig. 2).Except form of slits, rectification hole 23a can be the hole of a plurality of point-like, and these holes are arranged at front side and rear side in the mode of scattering.These rectification hole 23a is with man-to-man mode and the corresponding connection of a plurality of slit 10a, and these a plurality of slit 10a are formed between the battery lead plate as hereinafter described.Just, a plurality of slit 10a are connected with single rectification passage, so that a plurality of slit 10a is from single rectification passage punishment fork.A plurality of cowling panels 23 are pressed the upper and lower relation setting, also are acceptables so that the rectification chamber can be divided into a plurality of parts.The processing gas that comes out from source of supply 2 is received by the receiving port 21 of gas rectification module 20 via pipe 2a, then by the rectification passage of forming by chamber 20a, rectification hole 23a etc. by rectification/homogenizing, and be imported into electrode module 10 afterwards.

As depicted in figs. 1 and 2, handling an electrode module 10 of 1 comprises insulation shell 19 and is contained in electrode ranks (electrode row) in this housing 19.This housing 19 is side and open lower side thereon, and in vertical view, has along the upwardly extending rectangular configuration of the right and left vertical with the moving direction of workpiece W.Length on the left and right directions of housing 19 is bigger than the width dimensions on the left and right directions of workpiece W.

The electrode ranks that are contained in the housing 19 are made up of a plurality of first and second battery lead plates 11 and 12 (plate electrode parts).In those battery lead plates 11 and 12 each forms square plate, and this square plate is made by the conducting metal with same structure and size.Each battery lead plate 11 and 12 vertically and along fore-and-aft direction ground is provided with.Those battery lead plates 11 and 12 mutually with etc. pitch be arranged side by side.On the long sidewall of long sidewall in the place ahead and rear that each battery lead plate 11 and 12 leading section and rearward end are supported in housing 19 regularly.

The polarity of battery lead plate differs from one another along the direction that is arranged side by side.That is, as shown in Figure 1, the supply lines 3a that is derived by power supply 3 is branched off into a plurality of being connected respectively to and handles the branch line on one battery lead plate 11 of 1.Those battery lead plates 11 are used separately as electric field supplying electrode (high-potential electrode).The battery lead plate 12 every one of handling the remainder of head passes through ground wire 3b ground connection, and is used separately as grounding electrode.Between adjacent battery lead plate 11 and 12, formed impulse electric field by the pulse voltage that comes from power supply 3.

Although not shown, solid-state insulating barrier covers on the surface of each battery lead plate 11,12 by thermal spraying such as aluminium oxide.

The slit 10a of slit-shaped is formed between adjacent battery lead plate 11 and 12.This slit or slit 10a are vertical, and extend upward (moving direction of workpiece W) in front and back.Single slit 10a forms " the hole row who extends in one direction ".The width that is formed on the left and right directions of the slit 10a between per two adjacent electrodes is identical.The upper part of each electrode narrow slit 10a is connected respectively on the slit-shaped rectification hole 23a of corresponding rectification module 20.Rectification hole 23a is used for importing to respectively among the slit 10a of electrode pair electrode handling gas as introduction channel.The slit 10a of each electrode pair electrode is used as to make and handles the passage that gas passes therethrough, and also is used as discharge space, when electric power when power supply 3 is supplied to battery lead plate 11, because effect of electric field produces glow discharge in this discharge space.Because this arrangement provides and has handled gas therein by the plasma space of plasma.

The end portion opening of each electrode narrow slit 10a is so that as the upwardly extending processing gas blowing port in front and back.

Acceptable is: the end portion at housing 19 is provided with the separable base plate that forms parts as injection tip.The lower surface adjacency of base plate and battery lead plate 11,12, and the injection tip of slit that is directly connected to the slit 10a of electrode pair electrode is formed on the base plate.Under this kind situation, single hole row is made up of the slit 10a of electrode pair electrode and the injection tip that is connected to the slit of slit 10a.Preferably, base plate is made up of such as pottery insulating material.

Handling in 1, slot set 100, just the hole row who is made up of the hole row of slit-shaped organizes and is made up of the slit 10a that is arranged side by side.The length that this slot set 100 is extended is longer than the left and right sides width of workpiece W.

The end portion (injection tip) of handling a slit 10a of 1 and the distance between the workpiece W just operating distance WD (Fig. 2) are set to and are near the value WD of the upper limit in the effective range ₀(value WD ₀Refer to the operating distance WD of setting hereinafter ₀).As shown in Figure 4, the effective range of operating distance WD refers to such scope: wherein the processing speed of a certain point measurement on workpiece W remains in effective definite value or bigger.When operating distance surpassed this effective scope, the processing speed of measurement point sharply reduced.That is to say the operating distance WD of above-mentioned setting ₀For sharply reducing the distance before taking place.Such as WD here ₀=6mm.

As shown in Figure 3, the pitch between the battery lead plate 11 and 12 is set to and effectively handles width about equally, and this effectively handles width is the operating distance WD of processing gas (following be called at appropriate location " plasma gas ") to set by plasma ₀Pass that each slit 10a is injected to be implemented.Effectively handle the scope S that width refers to width dimensions ₀: wherein by pass surface treatment that plasma gas that single slit 10a sprays implements in the gamut S that surface treatment can be done effectively.If represent by R by the processing speed that the plasma gas that passes single slit 10a injection is implemented, and its maximum is by R _MaxRepresent that so effectively process range refers to such scope: wherein processing speed R becomes one with respect to maximum R _MaxPredetermined ratio cc or bigger.That is to say, refer to and satisfy R 〉=α * R _MaxScope.Such as α=15% to 20%.R becomes R _MaxPoint directly be under the center of slit 10a usually.Process range S and effective process range S ₀Become R with respect to R _MaxPoint launch left and to the right.

The width of process range S and effectively handle width S ₀Decide according to operating distance.When operating distance in effective range, that is to say and satisfying WD≤WD ₀Scope in the time, operating distance increases manyly more, effectively process range S ₀Just effectively handling width increases just manyly more.Therefore, in the equipment M of this embodiment, by operating distance S being set near the value WD the upper limit ₀, effectively handle width and be increased as much as possible, and by making electrode pitch P equate to make that with the effective width of handling the electrode pitch is increased as much as possible.

The operation of the atmospheric plasma treatment facility M of this structure will be described.

From the processing gas of handling gas supply source 2 in handling a gas rectification module 20 of 1 by rectification, and then by iontophoresis electrode equably to the slit 10a of electrode.Therewith concurrently, be applied to the battery lead plate that replaces 11 of electrode module 10 from the pulse voltage of power supply 3.By doing like this, form the impulse electric field that produces glow discharge among the slit 10a of each electrode pair electrode, and handle gas by plasma (being excited/intensified).The processing gas of plasma is sprayed downwards equably.Simultaneously, workpiece W passes through handling on just parallel with the slit 10a direction of a fore-and-aft direction under 1 by travel mechanism 4, handles gas and is injected on the workpiece W by each slit 10a.By doing like this, can implement such as surface treatments such as film deposition, etching, cleanings.

Homogenized processing gas in single rectification passage can be imported into slit 10a, and the processing gas that flows in these slits 10a can be homogenized, and thereby the processing corresponding with those slits 10a can be implemented equably.

As shown in Figure 3, because the pitch P of above-mentioned slit 10a and the relation of effectively handling between the width, the surface-treated scope of effectively being implemented by the plasma gas that comes from single slit 10a institute is continuously with the surface-treated scope by the effective enforcement of the plasma gas that comes from next slit 10a.Be located immediately at each battery lead plate 11 and 12 following positions, shown in the dotted line of Fig. 3, partly overlapped by the processing speed that the plasma gas that sprays by two sides of slit 10a, 10a is implemented.Therefore, shown in the solid line of Fig. 3, actual processing speed can be increased.Because this arrangement, workpiece W can be handled on left and right directions equably.And because slot set 100 is extended longlyer than the left and right sides width of workpiece W, the whole width about workpiece W can be handled simultaneously.Like this, move forward and backward workpiece W by travel mechanism 4, the whole surface of workpiece W can be effectively handled.

The workpiece of large-area (width of side) can be by increasing battery lead plate 11,12 number and thereby the number of the slit 10a of the electrode pair electrode that is arranged side by side by increase satisfy.Need not consider the size of workpiece W, the size of each battery lead plate 11,12 can be made very little.Therefore, can obtain the accuracy of size at an easy rate, in addition also can weight reduction.Like this, the number of bends that causes of the bending under the effects such as battery lead plate 11,12 gravity at self, Coulomb force, thermal stress can be reduced.Because on each battery lead plate 11,12 (except that the battery lead plate that is positioned at side, two ends, the left and right sides), and the Coulomb force does as a whole being cancelled from double side acting in relatively directed Coulomb force, so can prevent bending more reliably.

And, because operating distance is set greatly as much as possible, effectively the width of handling and thereby pitch P be set greatlyyer, the thickness of battery lead plate 11,12 can access sufficiently to be increased.Because these features, battery lead plate 11,12 can be enhanced aspect intensity, thereby can prevent bending more reliably.

Other embodiments of the invention are described now.In ensuing embodiment, assembly same with the above-mentioned embodiment is represented by identical Reference numeral and its description is simplified.

Fig. 5 to Figure 13 describes second embodiment of detailed structure of the present invention.At first with reference to concise and to the point second embodiment that describes of Fig. 5.

Comprise a plurality of modular unit 1X according to the processing of the atmospheric plasma treatment facility of second embodiment 1.Those modular units 1X forms two sections, and one is arranged in front side (upside of Fig. 5) and another is at rear side (downside of Fig. 5).A plurality of modular unit 1X arrange left and to the right in every section.Modular unit 1X is connected each other separably with the modular unit that those are arranged in the adjacency on its front side, rear side and left side, right side.As first embodiment, the rectification module (see figure 7) that each modular unit 1X comprises electrode module 10 and is installed on electrode module 10 upsides.Therefore, handling in 1, a plurality of electrode modules 1 form two sections, one in the front side and another at rear side, and arrange left and to the right.Electrode module 10 is connected each other separably with the electrode module that those are arranged in the adjacency on its front side, rear side and left side, right side.If one in adjacent two electrode modules 10,10 is called as first electrode module, then another one is called as second electrode module.Equally, handling in 1, a plurality of rectification modules 20 form two sections, one in the front side and another in the back, and arrange left and to the right." rectifier " formed rectification module 20 (see figure 7)s of handling a modular unit 1X of 1 by all and formed, and the plasma release is made up of all electrode modules 10.

As shown in Figure 5, each electrode module 10 is made up of the battery lead plate 11,12 of predetermined number, and this battery lead plate 11,12 is arranged left and to the right with constant pitch.(it should be noted that in Fig. 5, the number of the battery lead plate of each electrode module 10 is compared with those the detailed structures shown in Fig. 6 to 11 and reduced, its purpose only is in order to simplify.) front side section electrode arrangement and thereby the slot set 100 of the section of front side form by the battery lead plate 11,12 of all electrode modules 10 of the section of front side.The slot set 100 of the electrode arrangement of the section of rear side and the section of rear side is made up of the battery lead plate 11,12 of all electrode modules 10 of the section of rear side.That is, handling in 1, slot set 100 forms two sections, and one in the front side and another is at rear side.

The battery lead plate 12,12 that is positioned at the opposite end of two electrode modules 10 (is described as the back, these battery lead plates are illustrated by Reference numeral 12R, 12L respectively) be placed in together, so that form single combined electrical pole plate 12X (compound electrode parts), in each section of leading portion and back segment, this electrode module 10 is adjacent to each other left with on the direction to the right.Other battery lead plate 11,12 of the thickness and all of combined electrical pole plate 12X is identical.Because this arrangement, all the slit pitches of slot set 100 that are positioned at front side and rear side are mutually the same, even the coupling part between two electrode modules also is so, and the pitch P that equates is provided in the whole of whole slot set 100.

The detailed structure of second embodiment is described referring now to Fig. 6 to 13.

As shown in Figure 7, the rectification module 20 of each modular unit 1X comprises in microscler mode provides two (a plurality of) cowling panel 23U, 23L forward and the housing 29 that extends of direction backward (among Fig. 7 for left and direction to the right) in the housing 29.A pair of the place ahead and rear receiving port 21 are arranged at the upper surface of housing 29.Lead to the supply pipe 2a that handles gas supply source 2 and be each unit 20 bifurcated, and be connected respectively on the receiving port 21.

Shown in Fig. 7 and 8, two cowling panel 23U, 23L in the housing 29 vertically are provided with interval.The inside of housing 29 is divided into chamber 20a, 20b, the 20c of three sections (multistages) by cowling panel 23U, 23L.Receiving port 21 is connected with the chamber 20a of epimere.

As shown in figure 13, each cowling panel 23U, 23L are made up of the plate of porous.Upper, middle and lower chamber 20a, 20b, 20c are connected by hole 23c, the 23d that is formed among those cowling panels 23U, the 23L.For example hole 23c, the 23d of each cowling panel 23U, 23L are arranged on the lattice point to the interval of 12mm with 10mm with embarking on journey.Yet, it should be noted, do not have the hole directly to be formed at the following position of cowling panel 23U at epimere.The size of these holes 23c, 23d is towards the cowling panel of hypomere and reduce successively.Such as, the diameter of each hole 23c of the cowling panel 23U of epimere is 3mm, the diameter of each hole 23d of the cowling panel 23L of hypomere is 2mm.

" rectification passage " is made up of chamber 20a, 20b, 20c and hole 23c, the 23d of each rectification module 20.

As shown in Figure 8, housing 29 is provided with four (a plurality of) support columns 26 at the upper surface of base plate 24.This support column 26 with microscler mode forward and backward (the paper orthogonal of direction and Fig. 8) extend, and left and arrangement to the right with being separated from each other.The cowling panel 23L that is positioned at hypomere is supported by these support columns 26.The chamber 20c of hypomere is formed between the adjacent support column 26.The chamber that is hypomere is divided into five by support column 26 (partition wall).Each 20c of sub-chamber in microscler mode forward and extend back.Chamber 20c is connected to the upper part of slit 10a of the electrode pair electrode of electrode module 10 by being formed at gas bullport 24a on the base plate 24.Single chamber 20c communicates with two slit 10a of vicinity.That is, a plurality of slit 10a are connected on the rectification passage of each rectification module 20 in the mode of bifurcated.

Come from the paired front and back receiving port 21 that the processing gas of handling gas supply source 2 passes supply pipe 2a and rectification module 20, be imported into thereafter in the chamber 20 of epimere.Then handling a large amount of hole 23c that gas passes cowling panel 23U flows among the chamber 20b in stage casing.Because directly do not form hole 23c below each receiving port 21, processing gas can be distributed to the whole zone in the epimere chamber 20a fully, and is sent to afterwards among the chamber 20b in stage casing.Thereafter, handling a large amount of hole 23d that gas passes cowling panel 23L flows among the corresponding 20c of sub-chamber of hypomere.Then handling gas is imported between each adjacent electrode of electrode module 10 via the bullport 24a of housing base plate 24.

As shown in Figure 6, each electrode module 10 of second embodiment comprises: the battery lead plate 11,12 (tabular electrod assembly) that a plurality of (such as 11) arrange left and to the right with constant pitch; And the end wall 15 (support section) that is arranged at the front-end and back-end of battery lead plate 11,12.Electrode module 10 in microscler mode forward and extend back.

Shown in Fig. 6 and 7, each wall 15 that is positioned at front-end and back-end comprises inwall parts 16 and is connected to the outer wall parts 17 of the outer surface of inwall parts 16 by screw.As hereinafter described, the big groove 16f (Figure 12) that is used for store refrigerant is formed at the outer surface of inwall parts 16.Outer wall parts 17 are as the lid that covers this groove 16f.Outer wall parts 17 are made such as stainless steel by metal, and inwall parts 17 are formed from a resin.Reason is to prevent the discharge that occurs in metal outer wall parts 17 places from as hereinafter described metallic screw 51.The filling block 14 that resin is made is set at the inner surface of inwall parts 16, and the number of this filling block 14 is consistent with the number that battery lead plate is removed outer wall.Each infill panel 14 has the structure and the front and back of vertical direction lengthening and does not have the compartment of terrain arrangement mutually.

Arrive shown in Figure 8 as Fig. 6, each battery lead plate 11,12 of electrode module 10 is made such as aluminium and stainless steel by conducting metal, and the attitude of pointing to fore-and-aft direction with their longitudinal direction is arranged, and their thickness direction points to left and right directions, and their Width directed in orthogonal direction.As Figure 16 and shown in Figure 180, form first battery lead plate 11 of high-potential electrode and second battery lead plate 12 of composition grounding electrode and on left and right directions, alternately arrange.Second battery lead plate 12, promptly grounding electrode is arranged in left end and right-hand member respectively.By the battery lead plate 12 on left side and right side, formed the left outer wall and the right outer wall of electrode module 10.In the time the battery lead plate 12 of left end need being come with other battery lead plate 12 differences, they are indicated by the Reference numeral 12 with " L ", and in the time the battery lead plate 12 of right-hand member need being come with other battery lead plate 12 differences, they are indicated by the Reference numeral 12 with " R ".To remove those when needs and be positioned at left side and right side and be positioned at the front side and the battery lead plate of rear side 12 when coming with other battery lead plate 12 differences, they are indicated by the Reference numeral 12 of having " M ".

In adjacent two electrode modules 10,10 in the left and right sides, if one of the left side is called as " first electrode module ", then one of the right is called as " second module ", if the right-hand member battery lead plate 12R in the electrode module in left side 10 is " the first termination electrode parts ", then the left end battery lead plate 12L in the electrode module 10 on right side is " the second termination electrode parts ".On the contrary, if the electrode module on right side 10 is called as " first electrode module ", then Zuo Ce electrode module is called as " second electrode module ", if the left end battery lead plate 12L in the electrode module on right side 10 is " the first termination electrode parts ", then the right-hand member battery lead plate 12R in Zuo Ce the electrode module 10 is " the second termination electrode parts ".

Remove the tabular flat pattern that nine battery lead plates 11,12M outside those battery lead plates that are positioned at electrode module 10 two ends have equal thickness.Those battery lead plates 11, the length of 12M on fore-and-aft direction are 3000mm for example, and their thickness on left and right directions for example is 9mm, and their width on above-below direction for example are 60mm.As shown in Figure 6, front end surface and the rear end surface of respective electrode plates 11,12M is close to and is fixed in by metallic screw 51 to infill panel 14.

While is as battery lead plate 12L, the 12R at the two ends that are positioned at electrode module 10 of the outer wall of electrode module 10, on fore-and-aft direction, extend longlyer than inner battery lead plate 11,12M, this battery lead plate 12L, 12R are close to the left side and the right side of left end and the right-hand member and the inwall parts 16 of infill panel 14, and near be connected on the outer wall parts 17 by screw.

Shown in Fig. 6 to 9, the dielectric plate 13 of the solid of forming by aluminium oxide or the both side surface that analog is affixed on battery lead plate 11,12M respectively.Similarly solid dielectric plate 13 is affixed on the right side flat surfaces of left end battery lead plate 12L and the left side flat surfaces of right-hand member battery lead plate 12R equally respectively.The thickness of those solid dielectric plate 13 for example is 1mm.Except subsides add solid dielectric plate 13, also can be and cover film thereon by thermal spraying solid dielectric or analog.

Shown in Fig. 6,8 and 9, have narrow and slit predetermined thickness, just the slit 10a of electrode pair electrode is formed at (more strictly, between their solid dielectric plate 13) between adjacent electrode 11 and 12.As the situation of first embodiment, the slit 10a of electrode pair electrode handles the passage of gas from wherein passing through as allowing, and as discharge space.In this discharge space, owing to glow discharge takes place applying of electric field.This electric field is to be applied on the battery lead plate 11 by the electric power from power supply 3 to cause.Therefore, the slit 10a of electrode pair electrode handles gas by plasma also as the plasma space in these ionization spaces.The integral body of single electrode module 10 has the slit 10a of ten electrode pair electrodes.Pitch between the slit 10a of those electrode pair electrodes equates with pitch between the battery lead plate 11,12.

Shown in Fig. 6,9 and 10, each spacer 18 is placed between the anterior end of two solid dielectric plate 13 and between the rear end.These two solid dielectric plate 13 are had the slit 10a of each electrode pair electrode by positioned opposite to each other between them.Because such arrangement, corresponding solid dielectric plate 13 is pushed down by battery lead plate 11,13 respectively, thereby the width of slit 10a on left and right directions of this electrode pair electrode is maintained at predetermined value.For example, the thickness of the slit 10a of this electrode pair electrode is 1mm.

As mentioned above, the upper end of the slit 10a of each electrode pair electrode is connected to the bullport 24a (Fig. 8) of rectification module 20.

Shown in Fig. 8 and Figure 11 (a), the upper and lower of the left electrodes plate 12L of each electrode module 10 on width than all other battery lead plate 11,12M thin, therefore formed a pair of upper and lower thickness reducing part 12g, 12g.Central part at the above-below direction of left electrodes plate 12L has outstanding structure, and this outstanding structure is outstanding towards adjacent electrode module 10, and forms the thickening part 12f thicker than thickness reducing part 12g.As shown in Figure 2, thickness reducing part 12g and thickening part 12f ground, front and back on the whole length of left end battery lead plate 12L extends.For example, the thickness of thickening part 12f is 7mm, and the thickness of thickness reducing part 12g is 2mm.

On the other hand, shown in Fig. 8 and Figure 11 (a), the central part on the above-below direction of the right-hand member battery lead plate 12R of each electrode module 10 has groove, and this groove shaped is formed in the outer surface of this central part.Because this structure, the central part on the above-below direction of right-hand member battery lead plate 12R forms thickness reducing part 12h, and the upper and lower of each formation thickening part 12K is thicker than thickness reducing part 12h.As shown in Figure 2, thickness reducing part 12h and thickening part 12K ground, front and back on the whole length of right-hand member battery lead plate 12R extends.For example, the thickness of the thickness reducing part 12h of right-hand member battery lead plate 12R is 2mm, and the thickness of thickening part 12k is 7mm.

If an electrode module 10 on the left side in adjacent two electrode modules 10,10 is called as " first electrode module ", then You Bian a electrode module 10 is called as " second electrode module "; If the thickening part 12K of the right-hand member battery lead plate 12R in the left electrodes module 10 and thickness reducing part 12h are respectively as " first thickening part " and " first thickness reducing part ", then the thickness reducing part 12g of the left end battery lead plate 12L in the right electrodes module 10 and thickening part 12f are respectively as " second thickness reducing part " and " second thickening part ".(certainly, if right electrodes module 10 and left electrodes module are hereinafter referred to as " first electrode module " and " second electrode module ", then left electrodes plate 12L thickening part 12f and the thickness reducing part 12g in the right electrodes module 10 is hereinafter referred to as " first thickening part " and " first thickness reducing part ", and thickness reducing part 12h and the thickening part 12k of the right-hand member battery lead plate 12R in the left electrodes module 10 then is hereinafter referred to as " second thickness reducing part " and " second thickening part ".)

As Figure 11 (b) and shown in Figure 12, in each leading portion and back segment of plasma treatment 1, the thickening part 12f with outstanding structure of the right side module 10 in adjacent two electrode modules 10,10 is installed to the thickness reducing part 12h with groove structure of left side module 10.Similarly, the thickening part 12k with outstanding structure of left side module 10 is installed to the thickness reducing part 12g with groove structure of right side module 10.In this way, the left end battery lead plate 12L of the right-hand member battery lead plate 12R of left side module 10 and right side module 10 is positioned in together.By those battery lead plates 12R, 12L, formed good combined planar battery lead plate 12X.This combined electrical pole plate 12X forms grounding electrode.

The thickness (9mm) of combined electrical pole plate 12X is identical with the thickness of other battery lead plate 11,12M.Because such arrangement, shown in Figure 11 (b), the size of the pitch of battery lead plate (for example: P=12mm) equate, even also be so at the connecting portion place between two adjacent electrode modules 10 of the left and right sides, just as the other parts in remainder.That is, battery lead plate 11, the 12M of the battery lead plate 11 of left side module 10,12M, combined electrical pole plate 12X and right side module 10 have identical pitch.Because such arrangement, the pitch of slit 10a is specific size P by uniformization on whole slot set 100 whole.

As shown in Figure 8, be provided with base plate 10L in the bottom of electrode module 10.This base plate 10L is made such as pottery by insulating material, and is attached to the lower surface of battery lead plate 11,12L.A plurality of spray slits 10b are formed among the base plate 10L.Those spray slits 10b along fore-and-aft direction extend and by left and to the right with etc. pitch P be arranged in parallel.Under the situation as the slit 10a of above-mentioned electrode pair electrode, the pitch of spray slits 10b is identical, even the connecting portion place between two electrode modules 10 also is so, just as the other parts in remainder.

Be formed with step (step) in the following side of each spray slits 10b, and the width of each spray slits 10b increases upwards from this step.The bottom of two solid dielectric plate 13,13 is inserted into the wider portion of spray slits 10b, these two solid dielectric plate 13,13 toward each other, and the slit 10a of electrode pair electrode is sandwiched between them.The slit 10a of the electrode pair electrode between two solid dielectric plate 13,13 is connected to the following side from the step of spray slits 10b.The following side of spray slits 10b is towards the lower surface opening of base plate 10L, and is used as the injection tip of handling gas." hole row " is made up of the slit 10a of single electrode pair electrode and the bottom of connection spray slits 10b thereon.

Shown in Fig. 5 to 9, the leading portion modular unit 1X of second embodiment and back segment modular unit 1X depart from mutually with half the part that equals pitch P left and to the right.Like this, leading portion electrode module 10 and back segment electrode module 10 depart to the left or to the right with the part that equals half pitch (p/2).Because this arrangement, leading portion slot set 100 and back segment slot set 100 depart to the left or to the right with the part that equals half pitch (p/2).

Because departing from of this half pitch, shown in the double dot dash line among Figure 14, can be by the caused low ebb of the processing gas portion of passing through leading portion slot set 10 by overlapping by the institute of the caused peak of processing gas portion of passing through back segment slot set 100, and shown in the dotted line of Figure 14, peak, front side portion can be overlapping by institute of rear side low ebb portion.As a result, shown in the solid line of Figure 14, processing speed can be by unification on a left side and right direction, and the scrambling that can suppress to handle.

Moreover even because the connecting portion of slot set 100 between left electrode module 10 and right electrode module 10 has specific speed P, so uniformity of treatment also can be further improved.

The power supply structure of the battery lead plate 11,11 of second embodiment will be described.

Shown in Fig. 7,8, five (a plurality of) supply of electric power pins 31 are arranged side by side left and to the right in the front portion of rectification module 20, and pin 31 vertically passes the front portion like this.The upper end of each supply of electric power plug 31 is connected to power supply 3 by a live wire 3a (supply of electric power line), and the bottom embeds in first battery lead plate 11 of electric field feed end.Similarly, the rear portion of rectification module 20 has grounding pin 32.The top of grounding pin 32 is by ground wire 3b ground connection, and the bottom embeds second battery lead plate 12 that is arranged in earth terminal.

The electrode module 10 of second embodiment has the cooler (thermoregulator) that is used for battery lead plate 11,12.

Particularly, shown in Fig. 7 and 8, be formed among each battery lead plate 11, the 12M as three (a plurality of) coolant channel 10c, 10d, 10e of adjustment passage, like this, they are separated between the upper and lower.Each coolant channel 10c extends before and after 10e is on the whole length of battery lead plate 11,12M.

As shown in Figure 7, three passage 14a, 14b, 14c are formed on the front end face that is used for battery lead plate 11,12M and each filling block 14 of rear end face, and these three passages are separated between the upper and lower like this.As shown in Figure 9, each passage 14a to the channel part 14e that extends before and after 14c comprises and with channel part 14e left and the channel part 14f that intersects to the right, and in vertical view, each passage 14a to 14c has the structure of T shape.The channel part 14e of epimere passage 14a is connected on the epimere coolant channel 10c of respective electrode plates 11,12M, and the channel part 14e of stage casing passage 14b is connected to stage casing coolant channel 10d, and hypomere passage 14c is connected on the hypomere coolant channel 10e.

As shown in figure 10, on the connecting portion between the passage 14e of the coolant channel 10c to 10e of battery lead plate 11,12M and filling block 14, provide connector lining 65 with circular cylindrical structure.Be formed at the angle chamfering between the front/rear end of outer surface and connector lining 65, and provide O shape circle respectively.These O shape circles are flattened by metallic screw.

As shown in Figure 9, the channel part 14f of the passage 14a of the same height of filling block 14 to the left and right directions of 14c direction to the left and right is in point-blank and connects, and this filling block 14 is arranged side by side left and to the right.

Shown in Fig. 8,9, coolant channel 12b is formed among the thickening part 12f of left end battery lead plate 12L of each electrode module 10.This coolant channel 12b extends front and back on the almost whole length of left end battery lead plate 12L.The left side of the stage casing passage 14b of left end filling block 14 and right channel part 14f are connected to the adjacent part of the front-end and back-end of coolant channel 12b.

Shown in Fig. 9 to 12, in each electrode module 10, the leading section of coolant channel 12b and rearward end the passage 16b of the left side by internal part 16 before and after being positioned at respectively are connected on the cold-producing medium storage vault 16f.

Similarly, coolant channel 12a is formed at the thickening part 12k of the upper end that is arranged in right-hand member battery lead plate 12R, and coolant channel 12c is formed at the thickening part 12k that is arranged in the lower end.Those coolant channels 12a, 12c extend front and back on the almost whole length of right-hand member battery lead plate 12R.Left and right sides channel part 14f (Fig. 7) of the epimere passage 14a of right-hand member filling block 14 be connected to epimere cold-producing medium 12a the front and back end near, and the left and right sides channel part 14f of hypomere passage 14c be connected to hypomere coolant channel 12c front-end and back-end near.The front and back end portion of coolant channel 12a, 12c is connected to cold-producing medium storage vault 16f by passage 16a, the 16c of the right side of inwall parts 16 before and after being positioned at respectively.

As shown in Figure 7, the upper surface at the front side of electrode module 10 inwall parts 16 provides the refrigerant inlet end 61 that is connected to cold-producing medium storage vault 16f.Be connected to refrigerant inlet end 61 from the cold-producing medium supply pipe 6a of cold-producing medium source of supply 6 extensions.

On the other hand, the upper surface at the rear side inwall parts 16 of electrode module 10 provides the refrigerant outlet end 62 that is connected to cold-producing medium storage vault 16f.Refrigerant discharge leader road 6b begins to extend from this port 62.

The cold-producing medium from source of supply 6 via pipeline 6a temporarily is stored among the cold-producing medium storage vault 16f by arrival end 61 such as cooling water, and bifurcated enters three passage 16a to 16c afterwards.The cold-producing medium that passes the epimere passage 16a that is positioned at the right side flows into epimere battery lead plate 12R, part of refrigerant directly flows backward, the epimere passage 14a of lateral mass before remaining simultaneously cold-producing medium flows into, bifurcated enters the epimere coolant channel 10c of each battery lead plate 11,12M and flows backward then.The cold-producing medium that passes the stage casing passage 16b that is positioned at the left side flows into the coolant channel 12b of left end battery lead plate 12L, part of refrigerant directly flows backward, the stage casing passage 14b of lateral mass before remaining simultaneously cold-producing medium flows into, bifurcated enters the stage casing coolant channel 10d of each battery lead plate 11,12M and flows backward then.The cold-producing medium that passes the hypomere passage 16c that is positioned at the right side flows into the hypomere coolant channel 12c of right-hand member battery lead plate 12R, part of refrigerant directly flows backward, the hypomere passage 14c of lateral mass before remaining simultaneously cold-producing medium flows into, bifurcated enters the hypomere coolant channel 10e of each battery lead plate 11,12M and flows backward then.Because this arrangement, battery lead plate 11,12 can be by all coolings (temperature adjustment).

The cold-producing medium of rearward end that arrives the coolant channel 10c to 10e of each battery lead plate 11,12M passes back lateral mass passage 14a to 14c, converges to then on the rearward end of coolant channel 12a to 12c of battery lead plate 12L, 12R.Like this, cold-producing medium passes rear side inwall passage 16a to 16c, is stored in the rear side of cold-producing medium storage vault 161 then.Thereafter, cold-producing medium is discharged from the port of export 62 via pipe 6b.

If there be the pending size of workpiece W on left and right directions bigger, modular unit 1X and thereby electrode module 10 can additionally be connected.Because this arrangement, the number that is arranged side by side of battery lead plate 11,12 and electrode pair electrode narrow slit 10a can easily increase, and thereby slot set 100 can easily be prolonged.If it is less to handle the size of ground workpiece W on left and right directions, modular unit 1X and thereby electrode module 10 can partly recall.Because this structure arrangement, the number that is arranged side by side of battery lead plate 11,12 and electrode pair electrode narrow slit 10a can easily reduce, and thereby slot set 100 can easily be shortened.Owing to this arrangement, can satisfy the needs of the size of workpiece W neatly.

In adjacent two electrode modules 10,10 in the left and right sides, relative tip electrodes plate 12R, the 12L of electrode module 10,10 can be assembled to by the thickening part 12f (12k) that will have outstanding profile among other thickness reducing part 12h (12g) of the profile with depression and be securely connected and make up.Fractured operation also can easily realize.

Because tip electrodes plate 12L, 12R have thickening part 12f, 12k respectively, coolant channel 12a to 12c can be formed at respectively among these thickening parts 12f, the 12k, and thereby can easily obtain coolant channel.

By with operating distance and effectively handle width setup get big as far as possible and thereby the envoy big as far as possible apart from P, battery lead plate 11,12 can be made thick as much as possible.Because this arrangement can easily form coolant channel 10a to 10c.

Figure 15 has described the improved embodiment of second embodiment.

Shown in Figure 15 (b), in this improved embodiment, the combined electrical pole plate 12X that is formed by two adjacent on left and right directions battery lead plates 10 is divided into the battery lead plate 12p (that is a plurality of tabular localizing electrode's parts) of four parts on direction up and down.Each plate 12p of localizing electrode has on left and right directions and other battery lead plate 11, the same thickness of 12M, and has the upwardly extending prismatic structures in front and back that intersects at the paper with Fig. 5.Shown in Figure 15 (a), in the plate 12p of these localizing electrodes, the first and the 3rd localizing electrode of counting from the top hardens and is incorporated on the right part of left electrodes module 10, therefore the right-hand member battery lead plate 12R that has formed right electrodes module 10, and the second and the 4th localizing electrode hardens and is incorporated on the left part of right electrodes module 10, has therefore formed the left end battery lead plate 12L of right electrodes module 10.Although describe in detail, the two ends longitudinally of each plate 12p of localizing electrode are connected to (see figure 6) on the end wall of corresponding electrode module 10, and are supported by end wall.

The first local battery lead plate 12p and the 3rd plate 12p of localizing electrode that are attached to left end electrode module 10 are bonded with each other with the second local battery lead plate 12p and the 4th plate 12p of localizing electrode that are attached to right-hand member electrode module 10, form single combined electrical pole plate 12X thus.

According to the improved embodiment of Figure 15, there is no need on tip electrodes plate 12L, 12R to form depressed part or protuberance, just can make at an easy rate and also can easily obtain plane precision.Because these features, tip electrodes plate 12L, 12R can contact with solid dielectric plate 13 surfaces reliably.And the thickness of the plate 12p of localizing electrode of composition tip electrodes plate 12L, 12R is the same with other battery lead plate 11,12M's, but thicker than thickening part 12f, the 12k of second embodiment, and they do not have thickness reducing part 12g, 12h.Therefore, can obtain enough rigidity and can suppress crooked.Because these features, can prevent each tip electrodes plate 12L, 12R reliably and be applied to slit between this solid dielectric plate 13.As a result, can obtain stable plasma.In addition, even at the connecting portion of left and right sides electrode module 10, slot set 100 also can be kept reliably with specific pitch, and like this, the surface-treated consistent performance accesses further raising.

In addition, the plate 12p of localizing electrode that forms tip electrodes plate 12L, 12R can easily be made, and the quantity of treatment step can be reduced, and same structure can be applied to each and whole plate 12p of localizing electrode.Because this arrangement, the cost of parts just can not be high.

Coolant channel 10f (adjustment passage) is formed among each plate 12p of localizing electrode.Although do not describe in detail, these coolant channels 10f is connected to cold-producing medium storage vault 16f (see figure 9) respectively.Those battery lead plates 11,12M are connected to cold-producing medium storage vault 16f except tip electrodes plate 12L, coolant channel 10c, the 10d of 12R, 10e, and not respectively by coolant channel 10f.

Figure 16 describes the third embodiment of the present invention.The 3rd embodiment is the improvement embodiment of first embodiment (Fig. 1 and Fig. 2) of relevant base configuration of the present invention.

In the 3rd embodiment, handle a housing 19 of 1 and extend to the left and right, and each battery lead plate 11,12 in the housing 19, with the direction of left and right directions orthogonal on, just arranged side by side on the moving direction of workpiece W described in first embodiment.

On the other hand, different with first embodiment in the 3rd embodiment, battery lead plate 11,12 is that left and right directions tilts with angle θ (θ＜(pi/2)) with respect to their directions that is arranged side by side.((pi/2)-θ) tilts with angle with respect to the moving direction (direction back and forth) of workpiece W for they.Therefore, also ((pi/2)-θ) tilts the bearing of trend of the slit 10a of electrode pair electrode with angle with respect to the moving direction of workpiece W.In the 3rd embodiment, although the slit 10a of battery lead plate 11,12 and electrode pair electrode is tilted to the right with respect to the place ahead (top among Fig. 6), yet they also can be tilted to the left.

Shown in the single-point line of Figure 16, it is on same the straight line of fore-and-aft direction that the rearward end (lower end among Figure 16) of the electrode pair electrode of the leading section of the slit 10a of a certain electrode pair electrode (upper end among Figure 16) and direct neighbor is positioned at along the moving direction of workpiece W.In other words, the position of the left and right directions of the rearward end of the slit 10a of the position of the left and right directions of the leading section of the slit 10a of above-mentioned a certain electrode pair electrode and the electrode pair electrode that the is adjacent alignment that is in line.Therefore, among the plasma processing M1 in the 3rd embodiment, slot set 100 satisfies following formula:

L×cosθ＝(t+d)×cosecθ ...(1)

Wherein L represents the length of the slit 10a of electrode pair electrode, and t represents the thickness (interval between the adjacent electrode pair electrode narrow slit) of battery lead plate 11,12 and the width (interval between the adjacent battery lead plate 11,12) that d represents the slit 10a of electrode pair electrode.

Although it is not shown, be arranged at the cowling panel 23a (see figure 2) of slit-shaped of rectification module 20 of upside of electrode module 10 and the slit 10a of electrode pair electrode and tilt equally matchingly, and be directly connected on the whole length of corresponding electrode to electrode narrow slit 10a.

In above-mentioned structure, the processing gas of plasma is injected on the workpiece W.Meanwhile, workpiece W moves around under the effect of travel mechanism 4.At that time, each of workpiece W and whole points move past the zone that is positioned under the electrode pair electrode ground slit 10a and the zone under the battery lead plate 11,12 obliquely.Because this arrangement, the isoionic quantity that exposes can be homogenized.In addition, because on the end of the opposite end on the fore-and-aft direction of the slit 10a of adjacent electrode pair electrode is positioned at same straight line on the fore-and-aft direction, when workpiece W by time a time, each that the plasma gas that exposes can be on workpiece and whole some places are homogenized.Because this arrangement, surface treatment can be implemented into whole work-piece W reliably, and can prevent the generation with the scrambling of speckle reliably.Especially, under the situation of general normal pressure, because gas is difficult to scatter, so the scrambling of band speckle takes place easily.Above-mentioned arrangement then can effectively prevent the generation of this scrambling.

As among first embodiment, need not consider the size of workpiece W, each battery lead plate 11,12 also can be shortened reliably.

Slit 10a, the 10a of two electrode pair electrodes is not limited to those directly slits adjacent one another are, and same straight line L1 is lined up in the end that is positioned at the opposite end on the fore-and-aft direction of this slit 10a on fore-and-aft direction.They can alternately arrange or every several electrodes to the slit of electrode and arrange.That is will be extraordinary, if slot set 100 satisfies the following formula that obtains by the above-mentioned formula of vague generalization (1):

L×cosθ＝n×(t+d)×cosecθ ...(2)

Wherein n represents integer 1 or bigger.In Fig. 6 (those are adjacent one another are with an interval), n=1.

Electrode module 10 when Figure 17 represents to satisfy n=2 in the above-mentioned formula (2).In this electrode module 10, each battery lead plate 11,12 and thereby the slit 10a of electrode pair electrode than the inclination more among Figure 16.The leading section of the slit 10a of a certain electrode pair electrode and being arranged on the fore-and-aft direction on same the straight line L1 with the rearward end of the slit 10a of adjacent (being the next slit of adjacent slots) the electrode pair electrode in interval therewith.

As shown in figure 18, even identical among the structure of each battery lead plate 11,12 and direction quadrature that is arranged side by side and electrode module itself and Fig. 1, by integral inclination ground is provided with, battery lead plate 11,12 and thereby the slit 10a of electrode pair electrode also can be tilted setting.

As shown in figure 18, in vertical view entire process 1 (=(pi/2)-θ) tilts with angle θ ' in the clockwise direction.Because this arrangement, the longitudinal direction of electrode module 10 tilts with angle θ ' with respect to left and right directions.Equally, battery lead plate 11,12 and thereby the slit 10a of electrode pair electrode be that the moving direction of workpiece W tilts with angle θ ' with respect to fore-and-aft direction.The leading section of the slit 10a of a certain electrode pair electrode and be positioned on the fore-and-aft direction on same the straight line L1 in the rearward end of the slit 10a of the electrode pair electrode of right-hand direct neighbor therewith.In electrode module shown in Figure 180 10, satisfy the following formula that is equivalent to formula (2).

L×cos(π/2-θ’)＝n×(t+d)×sin(π/2-θ’) ...(3)

Defining in L, t, d and the n in the formula (3) and the formula (2) is the same.In the electrode module 10 of Figure 18, n=1.Certainly, electrode module 10 can be tilted so that n becomes integer 2 or bigger.In vertical view, electrode module 10 can tilt in the counterclockwise direction rather than in the clockwise direction.

Same in the structure of the inclination shown in Figure 16 to 18, a plurality of sections of slot set 100 can be arranged on front side and rear side.

For example, processing head shown in Figure 19 comprises two electrode modules that are arranged in the front and back side and two sections that are arranged in the slot set of front and back side.The housing 19 of each electrode module 10 extends upward at the right and left with workpiece movement direction quadrature, and as shown in Figure 16, battery lead plate 11,12 is arranged side by side left and to the right in housing 19.These battery lead plates 11,12 and thereby the slit 10a of electrode pair electrode with respect on left and right directions be arranged side by side direction at a predetermined angle θ tilt.The slot corresponding 10a of the electrode module 10 of side departs from half pitch before and after being arranged on left and right directions.Although not shown, gas rectification module 20 is installed on the upside of each electrode module 10.

In Figure 19,, also can set one and make formula (2) satisfy the value of n 〉=2 although the value that tilt angle theta sets satisfies formula (1) (that is, the situation of n=1 in the formula (2)).

According to a kind of like this two sections structure of inclination, surface treatment can be implemented in a kind of mode of homogenizing more.And the size of each battery lead plate 11,12 can be made smaller.

Figure 20 has represented another one embodiment, and the electrode module 10 of the wherein inclination of Figure 18 forms with a kind of structure of multistage.The processing head of this embodiment comprises the electrode module 10 that being arranged in the front and back side of two inclinations, and this electrode module 10 is the same with Figure 18's.The longitudinal direction of each module 10 extends on the direction of tilt angle theta with respect to left and right directions. Battery lead plate 11,12 and thereby the slit 10a of electrode pair electrode be arranged side by side on the longitudinal direction of electrode module 10, and with the direction of the longitudinal direction orthogonal of electrode module 10 on be directed, promptly with respect to the moving direction angulation θ ' of workpiece W.

Although the electrode module 10 of side departs from left and right directions a little before and after being arranged in, they also can be arranged in unswerving mode.

Figure 21 has represented another one embodiment, and wherein the equipment of second embodiment (Fig. 5 to Figure 14) forms with the structure that tilts.

According to this embodiment, handle 1 an a large amount of electrode module 10 that laterally is arranged side by side in two sections of side before and after being included in.By this arrangement, two sections of the slot set 100 of side before and after being arranged in have been formed.In vertical view, entire process 1 tilts with angle θ ' in the clockwise direction.Because this arrangement, the direction that is arranged side by side of electrode module 10 tilts with angle θ ' with respect to left and right directions (with the direction of the moving direction orthogonal of workpiece W).Each battery lead plate 11,12 of electrode module 10 and thereby each slit 10a of each slot set 100 be arranged side by side the direction orthogonal, and be that the moving direction of workpiece W tilts with the direction of angle θ ' therefore with respect to fore-and-aft direction.

Tilt angle theta ' satisfy below formula and being provided with, this formula and above-mentioned formula (2) and (3) are equal to:

θ’＝tan ^-1(n×P/L) ...(5)

In above-mentioned formula (5), respectively, P represents between the battery lead plate 11,12 and the pitch between the slit 10a of electrode pair electrode (such as, P=12mm), L represent the slit 10a of electrode pair electrode length (such as, L=300mm), and n represents integer 1 or bigger.In the equipment of Figure 21, n=1.Because this arrangement, on left and right directions among adjacent two electrode narrow slit 10a, the moving direction of the workpiece W of the rearward end of the leading section of left electrodes slit 10a and right electrodes slit 10a on the fore-and-aft direction is set on the same straight line L.

Although the concrete structure of electrode module 10 is identical with second embodiment's shown in Fig. 6 to 13, tip electrodes plate 12L, 12R can be being configured with the same mode of the improved embodiment of second embodiment shown in Figure 15, rather than according to the tip electrodes plate among second embodiment.Although toe lateral section and backside segments depart from half pitch (P/2) on left and right directions, be not must needs yet depart from.The angle θ ' that tilts can be provided with to satisfy n 〉=2 in formula (1).In vertical view, electrode module 10 can tilt in the counterclockwise direction, rather than tilts in the clockwise direction.

In the above-described embodiments, handle 1 and be fixed on the supporting seat, and can not move.Yet, handle 1 on the direction that the moving direction with workpiece W intersects swing relatively also be acceptable.

That is, in the 4th embodiment shown in Figure 22, be included on the processing 1 supporting seat (not shown) that is supported on slidably on the left and right directions of single hop of the modular unit 1X that is arranged side by side on the left and right directions.Swing mechanism 8 is connected in this processing 1.This swing mechanism 8 comprises: such as, mutual brake, turnable brake, be used for switching mechanism that flip-flop movement is converted to reciprocal motion or the like, and this swing mechanism 8 can be swung entire process 1 on left and right directions.When plasma treatment, workpiece W moves forward and backward under the effect of travel mechanism 4, and handles 1 swing on left and right directions (with the direction of the moving direction orthogonal of workpiece W).Meanwhile, handle gas by plasma and be ejected on the workpiece W.Because this arrangement even the bearing of trend of each slit parallels with the moving direction of workpiece W, also can prevent the generation with the inconsistency of speckle, thereby the surface-treated consistent performance accesses raising.

By swing mechanism 8 caused amplitudes of fluctuation, such as be between the battery lead plate and the slit 10a of electrode pair electrode between pitch P 1/2, but in fact, amplitude of fluctuation is from the accuracy of position with acceleration/deceleration is optimal optimizes in the scope bigger than P/2.Because this arrangement can prevent the inconsistency with speckle reliably.

Hunting period, the translational speed according to the workpiece W that is caused by travel mechanism 4 was optimised.Particularly, be set to hunting period: workpiece W move with the isometric distance of the length part of slit 10a during, handle 1 an only swing naturally.Because this arrangement can prevent because the generation of the inconsistency that oscillating motion self causes.

Figure 23 has described the improvement embodiment of the 4th embodiment that above-mentioned swing mechanism is installed.Two sections of the modular unit 1X that is arranged side by side on the left and right directions of side before and after the processing of this improvement embodiment 1 is included in.The whole modular unit 1X of toe lateral section (upside among Figure 23) is supported by unshowned supporting seat, and unit 1X can slide on left and right directions as a unit like this.Equally, the whole modular unit 1X of backside segments (downside among Figure 23) is supported by supporting seat, and like this, unit 1X can slide on left and right directions as a unit, but is separated with toe lateral section.Toe lateral section modular unit 1X is connected with the first swing mechanism 8A, and rear side root module 1X is connected with the second swing mechanism 8B.These swing mechanisms 8A, 8B the has structure same with above-mentioned swing mechanism 8, and be arranged in corresponding section modular unit 1X and on left and right directions, swing respectively.And, these swing mechanisms 8A, 8B co-operating, they can depart from swaying phase mutually like this.This phase difference ψ is, such as ψ=pi/2.This amplitude of fluctuation is the same with cycle and above-mentioned swing mechanism 8.Because this arrangement, can prevent the generation of the inconsistency handled reliably, thereby the surface-treated consistency can be further improved.

The present invention is not limited to the foregoing description, but can adopt many other embodiment.

For example, slot set 100 is not limited to one or two section, but can be the section of three or more.Under the sort of situation, preferably, adjacent section departs from the direction that is arranged side by side of slit 10a.Preferably, this deviation is pitch ÷ (hop count).Especially, under the bearing of trend of each slit 10a and situation that the moving direction of workpiece W parallels, the number of section increases manyly, and uniformity of treatment will be higher.Even the bearing of trend of each slit 10a parallels with the moving direction of workpiece W, under the situation that does not need conforming processing, only single section of slot set 100 also just enough.

Can accept ground, be not single slit, and the arrangement but a plurality of slit and short slit are embarked on journey is so that as " single hole row ".Same acceptable is: be not slot set 100, but a plurality of rows that are made up of slit and short slit are arranged on the direction that intersects with bearing of trend, so that be used as " hole row group ".

Each electrod assembly of first, second electrode module might not need to have flat platy structure, but they can have circular cylindrical structure or similar shape.

Can receive ground, the thickness of the first end electrod assembly of first electrode module and the second end electrod assembly of second electrode module is equivalent to half of other electrod assembly approximately respectively, and the thickness of the compound electrode parts of being made up of front and rear also equates with other electrod assembly.

In the structure of the inclination of each embodiment shown in Figure 16 and 17, satisfy n=1 and n=2 simultaneously although oblique angle θ is provided in the formula (1), yet this oblique angle can be provided in also in the formula (1) and satisfies n=3 or bigger.In each embodiment of oblique structure shown in Figure 21, oblique angle θ ' is provided in the formula (4) and satisfies n=1 at Figure 18, and this oblique angle also can be provided in the formula (4) and satisfy n=2 or bigger.Moreover the oblique angle of this oblique structure there is no need to satisfy formula (1) to formula (4).This oblique angle θ ' can suitably be set in 0 scope of spending less than 90 degree.

In the embodiment of as shown in figure 22 swing mechanism, handle 1 be fixed and workpiece W when moving forward and backward on left and right directions swing also be acceptable.Under the sort of situation, swing mechanism can be assembled in the travel mechanism.Certainly, workpiece W be fixed and handle 1 when moving on left and right directions swing also be acceptable.

Swaying direction is not limited to the direction that is arranged side by side of slit 10a, but just enough good as long as the moving direction of this direction and workpiece W intersects.This swaying direction also can tilt with respect to the direction that is arranged side by side.

In the embodiment of swing mechanism shown in Figure 23, although slot set 100 (hole row group) is set to two sections, yet they can be set to three sections or more section, and they can swing respectively by each section, so that adjacent section swaying phase departs from mutually.This phase difference ψ is such as being ψ=π/n, wherein the number of the n section of being.Yet the present invention does not limit to therewith.It can suitably be set according to the condition of handling etc.At three sections with more under the situation of multistage, the swing mechanism that is connected with a section in the adjacent section is called as " first swing mechanism " as defined in the claim, and the swing mechanism side that is connected with another section is called as " second swing mechanism ".Acceptable is, the slot set (hole row group) of a section in the adjacent section is fixing, and workpiece W swings by first swing mechanism, and the slot set of another section (hole row group) is swung in the mode that the oscillating motion with respect to workpiece W is offset on phase place.

The swinging operation that is produced by swing mechanism also can be applied in the leaning device among Figure 16 to 21.

The present invention can be applicable to those handle gases by hole row group such as a plurality of slot injection so that be applied to type on the pending object.The present invention not only can be applicable to Surface Treatment with Plasma, and can be applicable to such as the etched electrodeless surface treatment by thermal chemical vapor deposition (thermal CVD), HF (hydrofluoric acid) steam or analog.The present invention similarly can be applicable to various surface treatments, such as the ashing by ozone or analog, pass through CF ₄Or the etching of analog, film deposition (CVD), cleaning, surface modification (hydrophilic treated, hydrophobic treatment) or similarly surface treatment.The pressure condition of handling is not limited to general normal pressure, but can be in the environment of decompression.

Test case 1

A test case will be described now.Much less, the present invention is not limited to following test case.

Under the condition below, use the etched same plasma processing that is used for to carry out etching as second embodiment (Fig. 5 is to Figure 14).

Electrode temperature: 50 degrees centigrade

Workpiece temperature: 100 degrees centigrade

Handle gas

CF ₄：200sccm

O ₂：800sccm

H ₂O：15sccm

Pulse frequency: 20kHz

Supply voltage: 300V

Then, on the whole width on the left and right directions of workpiece, only measure thickness by the residual film after handling from the plasma gas of front end slot set (hole row group), and the residual thin thickness after the processing in measurement front side and rear side two sections.

The results are shown among Figure 24.By in the processing of front end, film thickness has slight inhomogeneous only.When additionally being carried out by the processing of rear end, film thickness is homogenizing almost completely.

Claims (33)

1, a kind of by handling the equipment that gas blowing is handled to having on the pending object and to described object surfaces, described equipment comprises:

Processor, this processor has one group of hole row, this group of hole row is made up of a plurality of holes rows, each described hole row all along a direction extend and with the crossing direction of each described hole row's bearing of trend on etc. pitch arranged side by side each other, arrange by each described hole and to blow processing gas; And

Travel mechanism, this travel mechanism are used for relatively moving described processor on the direction that intersects with the direction that is arranged side by side with respect to described object.

2, surface processing equipment as claimed in claim 1, wherein relative moving direction is along each described hole row's bearing of trend.

3, surface processing equipment as claimed in claim 1, the mutual orthogonal of the direction that is arranged side by side arranged of each described hole row's bearing of trend and described hole wherein, and relative moving direction is along bearing of trend.

4, surface processing equipment as claimed in claim 1, wherein each described hole row's bearing of trend tilts with respect to relative moving direction.

5, surface processing equipment as claimed in claim 1, wherein each described hole row's bearing of trend tilts with respect to relative moving direction, and described hole row's be arranged side by side direction and relative moving direction orthogonal.

6, surface processing equipment as claimed in claim 1, wherein each described hole row's bearing of trend tilts with respect to relative moving direction, and described hole row's be arranged side by side direction and bearing of trend orthogonal.

7, surface processing equipment as claimed in claim 4, wherein end on a hole row among the hole of two the adjacent settings row or each the predetermined hole row's among all described holes rows the bearing of trend and the other end on the bearing of trend that arranges in another hole among described two holes row are arranged on the same straight line on the relative moving direction.

8, surface processing equipment as claimed in claim 1, wherein when described hole row and distance between the described object were set near the upper limit of effective range, each described pitch was configured to equate with effective processing width usually.

9, surface processing equipment as claimed in claim 1, further comprise be used for the direction of the direction orthogonal that relatively moves of described object on relatively swing the swing mechanism of described processor.

10, surface processing equipment as claimed in claim 1, wherein said processor comprises a plurality of sections of the described hole row group that is positioned on the bearing of trend, and the hole of another section in the hole of a section in two described a plurality of sections adjacent segment row and described two sections comes on the direction that is arranged side by side and departs from mutually.

11, surface processing equipment as claimed in claim 10, the wherein said amount that departs from are the 1/n of described pitch, and n is the number of the section of hole row group.

12, surface processing equipment as claimed in claim 1, wherein said processor comprise a plurality of sections of the described hole row group that is positioned on the bearing of trend, and

Described equipment further comprises:

First swing mechanism, this swing mechanism on the direction that the direction that relatively moves with described object intersects, relatively swing two described a plurality of sections adjacent sections in the hole row group of a section; And

Second swing mechanism, this swing mechanism is relatively swung the hole row group of another section in described two sections on the direction identical with the relative swaying direction of described first swing mechanism, the phase migration mutually of the phase place of this second swing mechanism and described first swing mechanism.

13, surface processing equipment as claimed in claim 1, wherein said processor comprises: a plurality of with etc. the electrod assembly that is arranged side by side of pitch, be formed between two adjacent electrod assemblies of described a plurality of electrod assemblies as the slit-shaped slit-shaped of a hole row among the described hole row;

The processing gas that is used for the described object of plasma treatment passes described slit.

14, surface processing equipment as claimed in claim 13, wherein said processor comprises a plurality of electrode modules, on described hole row's the direction that is arranged side by side, these a plurality of electrode modules are connected separably,

Each described electrode module comprises a plurality of electrod assemblies that are arranged side by side with same pitch, and forms the part of described hole row group.

15, surface processing equipment as claimed in claim 14, each electrode module in wherein said adjacent two electrode modules all has and is arranged at the tip electrodes parts of end toward each other, the described tip electrodes parts of another electrode module in the described tip electrodes parts of an electrode module in described two electrode modules and described two electrode modules are assembled together, so that these tip electrodes parts form single compound electrode parts

Described compound electrode parts equate with other each electrod assembly of described adjacent two electrode modules on thickness.

16, surface processing equipment as claimed in claim 1, wherein said processor comprise and are used to make the rectification passage of handling the gas homogenizing, and described hole row is continuous with described rectification passage, so that described hole row's bifurcated.

17, surface processing equipment as claimed in claim 14, wherein said processor comprises a plurality of modular units, these a plurality of modular units are connected on the direction that is arranged side by side separably, each modular unit in the described modular unit comprises described electrode module and the rectification module that is connected on the described electrode module, described rectification module comprises the rectification passage that is used to make processing gas homogenizing, and the hole of described electrode module row is connected to described rectification passage, so that described hole comes bifurcated in each described modular unit of described modular unit.

18, a kind of surface treatment method comprises step:

By with etc. pitch will handle gas along each hole row among a plurality of holes row that a direction is arranged side by side and blow on the processor, so that on the direction that intersects with the direction that is arranged side by side, relatively move in the described processor with respect to described object, with handling gas blowing, carry out this surface treatment to pending body surface is arranged.

19, surface treatment method as claimed in claim 18, wherein said step are included in when relatively moving described object on the bearing of trend of arranging in each hole in described hole row, blow described processing gas.

20, surface treatment method as claimed in claim 18, wherein said step be included in respect to the bearing of trend relative tilt of each hole row among the row of described hole when moving described object, blow described processing gas.

21, surface treatment method as claimed in claim 18, wherein be in the upper limit of effective range when neighbouring when described hole row and distance between the described object, described pitch is configured to and effectively handles width and equate substantially, and described step comprises that described distance is in the processing under near the situation of the upper limit of described effective range.

22, surface treatment method as claimed in claim 18, wherein said processor a plurality of sections by aligned apertures row group are formed, the a plurality of hole rows that have described same pitch on the bearing of trend of this hole row group by each the hole row in described hole row form, and two adjacent sections of described hole row group depart from the direction that is arranged side by side mutually

Described relative motion is implemented with respect to the described a plurality of sections whole of described hole row group.

23, surface treatment method as claimed in claim 18, wherein said step comprise when further relatively swinging described processor on the direction that the described direction that relatively moves with described object intersects, blow described processing gas.

24, surface treatment method as claimed in claim 23, the swing width of wherein said oscillating motion be set to described pitch 1/2 or be slightly larger than 1/2 of described pitch.

25, surface treatment method as claimed in claim 23, the cycle of wherein said oscillating motion be set to described object relatively move corresponding described hole row length apart from the time required time 1/m doubly, m is an integer.

26, surface treatment method as claimed in claim 18, wherein said processor is formed by a plurality of sections of hole row group are set, and a plurality of holes rows that have described same pitch on the bearing of trend of this hole row group by each hole row in described hole row form,

Parallel with described relative motion, the described hole row of adjacent segment is with mode swing relatively on the direction that the described direction that relatively moves with object intersects of phase deviation.

27, a kind of equipment, this equipment are by plasma space inject process gas and will handle gas and be applied to and be arranged at having on the pending object outside the described plasma space, and in order to the described object of plasma treatment, described equipment comprises:

First electrode module that lies alongside one another in one direction and second electrode module,

Described first electrode module and second electrode module include: a plurality of electrod assemblies, these a plurality of electrod assemblies are arranged side by side on the direction identical with the direction that is arranged side by side of described first electrode module and second electrode module, and comprise the support portion that is used to connect and support described electrod assembly

Slit-shaped as described plasma space is formed between each adjacent electrod assembly,

Make up the second end electrod assembly of all described electrod assemblies of the first end electrod assembly of all described electrod assemblies of described first electrode module and described second electrode module, so that form single compound electrode parts, described first end electrod assembly is positioned at an end of the described second electrode module side, described second electrod assembly is positioned at an end of the described first electrode module side, and

Electrod assembly except the electrod assembly of the described first end electrod assembly of described first electrode module, described combination and electrod assembly except the second end electrod assembly of described second electrode module each other with etc. the pitch setting.

28, plasma processing as claimed in claim 27, the electrod assembly that wherein said the second end electrod assembly and described the second end electrod assembly are described combination electrical ground.

29, plasma processing as claimed in claim 27, wherein, in first electrode module, described first end electrod assembly comprises integratedly: to the first outstanding thickening part of described second electrode module; And thickness less than described first thickening part and to first thickness reducing part of the opposite side of described second electrode module side retraction,

In described second electrode module, described the second end electrod assembly comprises integratedly: to second thickness reducing part of the opposite side of described first electrode module side retraction; And thickness is greater than described second thickening part and to the second outstanding thickening part of described first electrode module, and

In described compound electrode parts, described first thickening part and described second thickness reducing part are assembled with each other, and described first thickness reducing part and described second thickening part are assembled with each other.

30, plasma processing as claimed in claim 29, wherein the adjustment tunnel-shaped is formed in described first thickening part, and described passage makes the fluid of the temperature be used for regulating described first end electrod assembly pass through from this passage.

31, plasma processing as claimed in claim 27, wherein said compound electrode parts are divided into a plurality of localizing electrodes parts on the Width that intersects with the direction that is arranged side by side of described first and second electrode modules, localizing electrode's parts in these adjacent localizing electrode's parts are supported by the described support portion of described first electrode module, thereby form described first end electrod assembly, and another localizing electrode's parts in these adjacent localizing electrode's parts support by the described support portion of described second electrode module, thereby form described the second end electrod assembly.

32, plasma processing as claimed in claim 31, wherein the adjustment tunnel-shaped is formed in the described localizing electrode parts, and described passage makes the fluid be used for regulating temperature pass through from this passage.

33, plasma processing as claimed in claim 27, each electrod assembly of wherein said first and second electrode modules all has platy structure, the direction that is arranged side by side of this structure and described first and second electrode modules intersects, and this each tabular electrod assembly equates on thickness except the described first end electrod assembly of described first electrode module and described tabular compound electrode parts and described tabular each electrod assembly described the second end electrod assembly except described second electrode module.

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