CN1832655B - Coaxial low-temp plasma material processor - Google Patents
Coaxial low-temp plasma material processor Download PDFInfo
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- CN1832655B CN1832655B CN200510011398XA CN200510011398A CN1832655B CN 1832655 B CN1832655 B CN 1832655B CN 200510011398X A CN200510011398X A CN 200510011398XA CN 200510011398 A CN200510011398 A CN 200510011398A CN 1832655 B CN1832655 B CN 1832655B
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Abstract
A coaxial low temperature plasma material processor includes a coaxial integrated discharge and material process cavity, an inner electrode, an outer electrode, a water circulation cooling system and a wind cooling system and the discharge and material process cavity is composed of an inner tube and an outer tube and the column centers are coincident, the outside of the outer tube covers the outer electrode and the internal electrode passes through the inner tube, nozzles for inputting and outputting the working gas and materials to be processed are distributed along the circles at both ends of the cavity, which utilizes mediums to block discharge and generates low temperature plasma in a coaxial processor cavity to input particles or gas to be processed and discharged after being processed by low temperature plasma in the cavity.
Description
Technical field
The present invention is a kind of low-temp plasma material processor, particularly coaxial low-temp plasma material processor.
Background technology
The dielectric barrier discharge principle is a kind of important low temperature plasma generation mechanism, it is by covering solid dielectric or place solid dielectric between negative and positive two electrodes on extremely arbitrarily in negative and positive two electrodes, suppress discharging current, stop discharge type to turn to arc discharge, produce low temperature plasma.In Surface Treatment Engineering such as nanometer powder surface treatment, need the evenly low temperature plasma of discharge of large volume.Dielectric barrier discharge can produce the equally distributed low temperature plasma in space with like glow discharge or the discharge of glow discharge form under an atmospheric pressure or low pressure.Atmospheric dielectric barrier discharge is important selection scheme because of not needing vacuum system, simple in structure, with low cost forming.The atmospheric dielectric barrier discharge structure mainly is divided into coaxial type and plate.For producing glow discharge or seemingly glow discharge, the anodic-cathodic spacing of discharger is generally less than 1 centimetre.The atmospheric dielectric barrier discharge of slab construction is mainly used in the surface treatment of big part material, and the atmospheric dielectric barrier discharge of coaxial configuration is used in the ozone generator the earliest.In the coaxial configuration atmospheric dielectric barrier discharge of similar ozone generator was used, gas medium was an air, and the solid dielectric material is generally pottery or heat resistant glass.In using, materials such as nanometer powder surface treatment often utilize flammable explosive gas such as hydrogen, methane as working gas, in the application of this coaxial configuration atmospheric dielectric barrier discharge device, need to consider the visuality of discharge condition and the sealing of working gas.For satisfying the visual requirement of discharge condition, the solid dielectric on external electrode surface can adopt the glass that possesses heat-resistant quality.In the traditional design scheme, the fixing need of inside and outside solid dielectric adopted complicated airtight construction, as O shape circle and metal or nonmetal sleeve etc.In the discharger long-time running, the discharge tube temperature raises.Different because of heat resistant glass with the thermal coefficient of expansion of immobilising device, very easily cause glass fragmentation faced or gas leakage.Because of there being a large amount of active particles in the discharge tube, O shape circle easily wears out and causes airtight inefficacy.
Summary of the invention
The objective of the invention is to overcome the shortcoming that prior art causes glass fragmentation faced or gas leakage easily, a kind of satisfy discharge condition visuality, the low-temp plasma material processor that do not leak of discharge working gas are provided.
Low-temp plasma material processor of the present invention comprises coaxial type integral type discharge and material process chambers, interior electrode, external electrode, hydrologic cycle cooling system and air cooling system.Discharge is made of interior pipe and outer tube cylinder axis coinciding with the material process chambers interior pipe and outer tube.Outer tube outer side covers external electrode runs through interior electrode in the interior pipe.Discharge along the circumferential direction is evenly distributed with the inlet, outlet/material mouth that supplies working gas and pending material to import, export with material process chambers two ends.The present invention adopts net metal external electrode and vitreous solid dielectric discharge and material process chambers, with the requirement of the visuality that satisfies discharge condition.Consider the seal requirement that the discharge working gas does not leak, discharge of the present invention and material process chambers are designed to integral type, inlet, outlet/material mouth adopts and vitreous solid dielectric identical materials, and use glass machining technique, the discharge of tubular glass matter solid dielectric and material process chambers and inlet, outlet/material mouth are sintered to integral body.The mouth of giving vent to anger/expect is provided with and is used for airtight prominent ring.Electrode adopts metal tube in of the present invention, logical cooling water in it, absorb the Joule heat that pipe upward produces in interior electrode and the vitreous solid dielectric with hydrologic cycle cooling system, prevent to manage fusion in discharge and the material process chambers vitreous solid dielectric, thereby the present invention can be worked long hours.Simultaneously, the present invention also adopts air cooling system to absorb the Joule heat that produces on external electrode and the vitreous solid dielectric outer tube, prevents discharge and the fusion of material process chambers vitreous solid dielectric outer tube, slows down the external electrode oxidation.Electrode grounding in the tubular metal, the net metal external electrode connects ac high voltage.
When internal and external electrode of the present invention connects high-voltage ac power, near in discharge and the material process chambers pipe gas medium ionization under highfield, form polyelectron avalanche and discharge or polyelectron ebb-flow discharge, near the electric field of the gas medium the outer tube inboard is less, forms ebb-flow discharge under action of high voltage.Discharge current density is little under the effect of vitreous solid dielectric, and discharge type is glow discharge or seemingly glow discharge.Working gas ionization in discharge and the material process chambers forms low temperature plasma.
During operation, hydrologic cycle cooling system and air cooling system are at first started shooting, and behind the cooling system steady operation, connect the high-voltage ac power output High Level AC Voltage of inside and outside electrode.After regional ionization between the inner and outer pipe of cavity, form positive and negative particle from the working gas of air inlet of the present invention/material mouth input.Part ion clashes under the electric field acceleration from the nanometer powder or the pending gas of air inlet/material mouth input, with physics or chemical mode attached to the nanometer powder surface or generate new gas.Nanometer powder after residual gas and the processing or gas are from giving vent to anger/expect a mouthful discharge.The heat that physics, chemical reaction discharge between Joule heat that gas discharge produces and particle is absorbed by hydrologic cycle cooling system and air cooling system, and the material processor temperature maintenance is stable.
Description of drawings
Fig. 1 is the structural representation of discharge of the present invention and material process chambers.Wherein: 1 outer tube, pipes, 3 air inlets/material chamber, 4 air inlets/material mouth, 5 chamber, 6 mouth, 8 of giving vent to anger/expect of giving vent to anger/expect is dashed forward and is encircled in 2.
Fig. 2 is discharge of the present invention and material process chambers and appended internal and external electrode schematic diagram thereof.Wherein: electrode, 11 exits in 9 external electrodes, 10.
Fig. 3 is the profile of discharge of the present invention and material process chambers.
Fig. 4 is a structural representation of the present invention.Wherein: 12 air cooling systems, 13 ground, 14 booster water pumps, 15 water tanks, 16 water pipes.
Embodiment
The present invention is made of the discharge of coaxial type integral type and material process chambers, interior electrode 10, external electrode 9, hydrologic cycle cooling system and air cooling system 12 etc.
The discharge of coaxial type integral type is made by glassy substances integral body with the material process chambers, and glassy substances can be heat resistant glasses such as quartz glass.As shown in Figure 1, discharge is made of outer tube 1, interior pipe 2, air inlet/material chamber 3, air inlet/material mouth 4, give vent to anger/expect chamber 5 and the mouth 6 of giving vent to anger/expect with the material process chambers.Interior pipe 2 wall thickness are even, are the 1-5 millimeter, internal diameter 3-20 millimeter, and pipe range can determine according to actual needs.Outer tube 1 wall thickness is even, is the 1-5 millimeter, internal diameter 5-50 millimeter, and pipe range can determine according to actual needs.The interior pipe 2 and the outer tube 1 cylinder axis coinciding of integral type discharging chamber.Air inlet/material mouth 4 is used for input service gas and pending material, and its quantity and size can determine according to actual needs that air inlet/material mouth 4 is provided with and is used for airtight prominent ring 7.Air inlet/material chamber 3 is the changeover portion of air inlet/material mouth 4 with outer tube 1, and air inlet/material mouth 4 is distributed on air inlet/material chamber 3, and air inlet/material chamber 3 is a concave arc shape with the coupling part of outer tube 1, and the axial length of air inlet/material chamber 3 outer surfaces requires decision according to edge flashing.The mouth 6 of giving vent to anger/expect is used to export material and the residual gas after the processing, and its quantity and size can determine according to actual needs that the mouth 6 of giving vent to anger/expect is provided with and is used for airtight prominent ring 8.Give vent to anger/expect the chamber 5 for to give vent to anger/expect the changeover portion of mouth 6 and outer tube 1, give vent to anger/(material) mouth 6 is distributed on the chamber 5 of giving vent to anger/expect, give vent to anger/the expect coupling part of chamber 5 and outer tube 1 is a concave arc shape, chamber 5 outer surfaces of giving vent to anger/expect axially along the face length degree greater than 15 centimetres, to prevent the edge flashing between internal and external electrode.Air inlet/material) mouth 4 along the circumferential direction evenly distributes on cavity with the mouth 6 of giving vent to anger/expect.
The preparation technology of coaxial type integral type discharging chamber is: interior pipe 2, outer tube 1, air inlet/material mouth 4, air inlet/material chamber 3, give vent to anger/expect mouth 6 and the coupling part separately, chamber 5 of giving vent to anger/expect are linked together after being transformed into liquid state with heating means, eliminate the stress of coupling part again with annealing process.
As shown in Figure 2, discharge and material process chambers outer side covers external electrode 9, electrode 10 in running through in the interior pipe 2 is equipped with exit 11 on the external electrode, be useful on fixing screw on the exit 11.
Interior electrode is made by copper tube.Interior electrode places in the interior pipe of discharge and material process chambers, and both closely cooperate.The length of interior electrode is greater than interior pipe range, and the length of pipe can determine according to actual needs in stretched out interior electrode both sides.Interior electrode grounding.
External electrode is made by copper mesh, and mesh is less than 5 * 5 square millimeters.External electrode covers the outer tube outside, and outer tube is wrapped fully, and external electrode can be fixed with several red copper rings.External electrode must extend on the arc linkage section of air inlet (material) chamber, give vent to anger (material) chamber and outer tube.External electrode connects ac high voltage.
As shown in Figure 4, hydrologic cycle cooling system is made up of with water tank 15 water pipe 16, booster water pump 14.The outer surface or the inner surface of electrode 10 in water pipe 16 closely is socketed in.The pressurized water pump lift is greater than 5 meters.During hydrologic cycle cooling system work, booster water pump draws water from water tank, and in the electrode, cooling water and interior electrode are kept the hygral equilibrium of interior electrode by the heat exchange pattern heat-shift in water pipe is delivered to.Air cooling system 12 adopts driving external electrode gas flow on every side such as axial flow blower, and this air cooling system is installed near the external electrode 9.
The voltage of the High Level AC Voltage potential source that the present invention connect is 1-100kV, and frequency is 50Hz-100kHz.
External electrode 9 exits 11 of the present invention connect high-voltage ac power 17, and interior electrode 10 links to each other with ground 13.
When the present invention moved, the booster pump 14 and the air cooling system 12 of hydrologic cycle cooling system were at first started shooting, and behind hydrologic cycle cooling system and the air cooling system steady operation, connected the high-voltage ac power 17 output High Level AC Voltages of inside and outside electrode.Under action of high voltage, glow discharge takes place or discharges like flame in the zone between the inner and outer pipe of discharge and material process chambers from the working gas of air inlet/material mouth 4 inputs.From air inlet/material mouth 4 input nanometer powder or pending gases.The part ion that gas discharge produces clash into the nanometer powder or the pending gas of input under the electric field acceleration, surperficial or generate new gas attached to nanometer powder with physics or chemical mode.Nanometer powder after residual gas and the processing or gas are from giving vent to anger/expect mouthful 6 discharges.The heat that physics, chemical reaction discharge between Joule heat that gas discharge produces and particle is absorbed by hydrologic cycle cooling system and air cooling system, and the temperature maintenance of coaxial low-temp plasma material processor of the present invention is stable.
Claims (4)
1. coaxial low-temp plasma material processor is characterized in that: it comprises coaxial type integral type discharge and material process chambers and interior electrode [10], external electrode [9], hydrologic cycle cooling system and air cooling system [12]; The discharge of coaxial type integral type is made by glassy substances integral body with the material process chambers; Discharge and material process chambers are by outer tube [1], interior pipe [2], air inlet/material chamber [3], air inlet/material mouth [4], give vent to anger/expect chamber [5] and the mouth [6] of giving vent to anger/expect formation; Interior pipe [2] and outer tube [1] cylinder axis coinciding; Air inlet/material mouth [4] is provided with and is used for airtight prominent ring [7]; Air inlet/material mouth [4] is distributed on air inlet/material chamber [3], air inlet/material chamber [3] are the changeover portion of air inlet/material mouth [4] with outer tube [1], air inlet/material chamber [3] are concave arc shape with the coupling part of outer tube [1], and the axial length of air inlet/material chamber [3] outer surface requires decision according to edge flashing; The mouth [6] of giving vent to anger/expect is provided with and is used for airtight prominent ring [8]; Give vent to anger/expect chamber [5] for to give vent to anger/expect the changeover portion of mouth [6] and outer tube [1], the mouth [6] of giving vent to anger/expect is distributed on the chamber [5] of giving vent to anger/expect, give vent to anger/the expect coupling part of chamber [5] and outer tube [1] is a concave arc shape, give vent to anger/expect chamber [5] outer surface axially along the face length degree greater than 15 centimetres, to prevent the edge flashing between internal and external electrode; Air inlet/material mouth [4] along the circumferential direction evenly distributes on cavity with the mouth [6] of giving vent to anger/expect; Discharge and material process chambers outer side covers external electrode [9] run through interior electrode [10] in the interior pipe [2], exit [11] is housed on the external electrode [9], and exit is useful on fixing screw on [11]; Interior electrode [10], external electrode [9] closely contact with the material process chambers with discharge; Hydrologic cycle cooling system is made up of with water tank [15] water pipe [16], booster water pump [14]; Water pipe [16] closely is socketed in the outer surface or the inner surface of interior electrode [10]; Air cooling system [12] adopts axial flow blower, is installed near the external electrode [9].
2. according to the described coaxial low-temp plasma material processor of claim 1, it is characterized in that: electrode [10] is made by metal tube in described, places in the interior pipe [2] of discharge and material process chambers, and both closely cooperate; The length of interior electrode [10] is greater than the length of interior pipe [2], and the length that interior pipe [2] is stretched out in interior electrode [10] both sides can determine according to actual needs; Interior electrode [10] ground connection.
3. according to the described coaxial low-temp plasma material processor of claim 1, it is characterized in that: described external electrode [9] is made by wire netting, and mesh is less than 5 * 5 square millimeters; External electrode [9] covers outer tube [1] outside, and outer tube [1] is wrapped fully; External electrode [9] is fixed with several beckets; External electrode [9] must extend to air inlet/material chamber [3], on the arc linkage section of give vent to anger/expect chamber [5] and outer tube [1]; External electrode [9] connects ac high voltage.
4. according to the described coaxial low-temp plasma material processor of claim 1, it is characterized in that: the preparation technology of described coaxial type integral type discharging chamber is, interior pipe [2], outer tube [1], air inlet/material mouth [4], air inlet/material chamber [3], give vent to anger/expect mouth [6] and the coupling part separately, chamber [5] of giving vent to anger/expect are linked together after being transformed into molten condition with heating means, eliminate the stress of coupling part again with annealing process.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200510011398XA CN1832655B (en) | 2005-03-09 | 2005-03-09 | Coaxial low-temp plasma material processor |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200510011398XA CN1832655B (en) | 2005-03-09 | 2005-03-09 | Coaxial low-temp plasma material processor |
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| CN1832655A CN1832655A (en) | 2006-09-13 |
| CN1832655B true CN1832655B (en) | 2011-01-26 |
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| CN200510011398XA Expired - Fee Related CN1832655B (en) | 2005-03-09 | 2005-03-09 | Coaxial low-temp plasma material processor |
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Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103787337A (en) * | 2012-10-29 | 2014-05-14 | 王红卫 | Plasma preparation apparatus of trichlorosilane |
| CN103681197B (en) * | 2013-12-11 | 2016-02-17 | 苏州市奥普斯等离子体科技有限公司 | A kind of capillary glass inside pipe wall plasma processing apparatus |
| CN104219863A (en) * | 2014-09-23 | 2014-12-17 | 江苏大学 | Double-medium low-temperature plasma generator |
| CN104302083B (en) * | 2014-10-27 | 2017-01-25 | 核工业西南物理研究院 | Streamlined powder material modification device for graft polymerization of low-temperature plasma under normal pressure |
| CN104284505A (en) * | 2014-10-27 | 2015-01-14 | 核工业西南物理研究院 | Normal-pressure low-temperature plasma running water form powder material modifying system |
| CN106304591B (en) * | 2016-09-19 | 2019-03-08 | 成都测迪森生物科技有限公司 | A kind of low-temperature plasma jet device |
| CN110124471B (en) * | 2018-02-09 | 2022-02-25 | 中国石油化工股份有限公司 | High flux low temperature plasma system for decomposing hydrogen sulfide and method for decomposing hydrogen sulfide |
| CN109302790A (en) * | 2018-06-01 | 2019-02-01 | 苏州海唐智能装备有限公司 | A kind of novel plasma powder modifying device |
| CN111385954B (en) * | 2018-12-29 | 2023-06-13 | 中国石油化工股份有限公司 | Plasma apparatus and method for decomposing hydrogen sulfide |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2312518Y (en) * | 1997-11-28 | 1999-03-31 | 复旦大学 | Low temp. plasma discharging tube |
| CN2678760Y (en) * | 2004-02-25 | 2005-02-16 | 孙陶 | Prodn. appts. for synthetizing multi-kind of nano powders by utilizing plasma |
-
2005
- 2005-03-09 CN CN200510011398XA patent/CN1832655B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2312518Y (en) * | 1997-11-28 | 1999-03-31 | 复旦大学 | Low temp. plasma discharging tube |
| CN2678760Y (en) * | 2004-02-25 | 2005-02-16 | 孙陶 | Prodn. appts. for synthetizing multi-kind of nano powders by utilizing plasma |
Non-Patent Citations (2)
| Title |
|---|
| JP-昭56-155631(A) 1981.12.01 |
| JP-特开平7-206414(A) 1995.08.08 |
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Granted publication date: 20110126 Termination date: 20140309 |