CN1826843A - Plasma treating apparatus and its electrode structure - Google Patents

Abstract

To provide a plasma treating apparatus for an object with a large area, wherein the amount of deflection due to the Coulomb force of the electrode is reduced and the uniformness of the surface treatment is ensured. An electrode structure (30X) of a plasma treating apparatus comprises a pair of electrode rows (31X, 32X) facing to each other in the back and forth direction and each extending in the left and right direction. Each electrode row is composed of electrode members (31A to 32C) arranged in the left and right direction. The electrode members of one electrode row and those of the other are so disposed in substantially the same positions in the left and right directions. Each of the electrode members of one electrode row has a polarity opposite to that of the respective opposed electrode member of the other. Between the opposed surfaces of the electrode members of the electrode rows, a row-to-row gap (33p) is defined. Any two adjacent electrode members of each electrode row have polarities opposite to each other.

Description

Plasma treatment appts and electrode structure

Technical field

The present invention relates to be used for the processing gas between the plasma electrode and handle plasma treatment appts the surface of processed workpiece.

Background technology

For example, in patent document 1, described a kind of so-called remote-type plasma treatment appts, wherein discharge space ionic medium processing gas between motor and injection is to contact with workpiece by carrier device.The motor of described device is such structure: wherein two flat electrode plates are settled relatively with parallel relation.Usually, these battery lead plates have the length of the width (on the direction perpendicular to the direction of the supply) that equals or be longer than workpiece.Therefore, the discharge space between these battery lead plates also has the width dimensions that equals or be longer than workpiece with the plasma spraying port that is connected to discharge space.Because this arranges, by will handle equably gas blowing by the injection tip on the whole length areas can a plasma treatment workpiece whole width, described processing gas has carried out plasma between motor.As a result, improved treatment efficient effectively.

In patent document 2, described a kind of being used for by direct current is converted to continuous wave and it is applied to the device that carries out Surface Treatment with Plasma between the pair of electrodes by inverter.

Patent document 1

Japanese Patent Laid-Open Publication No.2002-143795 (first page, Fig. 4)

Japanese Patent Laid-Open Publication No.2003-2003800 (first page)

Summary of the invention

Recently, the size such as the workpiece of liquid-crystalline glasses substrate becomes big and this trend is still arranged.Among them, in addition occurred a side greatly to such as 1.5mm to several millimeters.In order to handle the workpiece of surface area width and bigger, need the battery lead plate of plasma treatment appts to form longlyer with broad.

But the length of battery lead plate increases, and obtains difficulty of accurate dimensions precision.In addition, battery lead plate is easy to bending owing to acting on Coulomb force between the adjacent battery lead plate, the difference of thermal coefficient of expansion between the solid dielectric on metal master that constitutes electrode and surface and the caused thermal stress such as difference of the temperature within the electrode.As a result, non-homogeneousization of thickness area of discharge space, and the surface-treated uniformity is easy to suffer damage like this.In order to tackle the Coulomb force, the thickness of battery lead plate can increase to increase rigidity.But if such layout, the weight of electrode increases, and is used to support cost and processing cost that its electrical motor supporting structure not only bears heavier load but also increased material.

In addition, if electrode size increases, the power per unit area of supplying with from power supply reduces, and handling property descends.This problem only could solve when replacement has the power supply of larger capacity.But in fact in fact this be not easy to regard to the angle of cost of product etc.Attempt to utilize a plurality of power supplys in addition, each has less capacity and they are connected to single battery lead plate supplies with to increase total power supply.But under such situation, these power supplys need synchronized with each other.

First feature of the present invention relates to a kind of blowing away with contact by the processing gas in the plasma discharge space and with it processed workpiece is carried out the device of plasma treatment, in particular to a kind of electrode structure that is used to form aforesaid such discharge space.This electrode structure comprises second electrode row that first electrode of settling with side by side relationship in one direction that a plurality of electrod assembly was constituted is arranged and comprised other a plurality of electrod assemblies.

Have opposite polarity at one of electrod assembly of one of the electrod assembly of settling first electrode row who on essentially identical position, settles on the direction side by side and second electrode row, and form betwixt as part gap between the row of the part of discharge space.

Between first and second electrodes row, form gap between the row who comprises part gap between row.That is, between first and second electrodes row, form gap between the row who comprises part gap between a plurality of rows that connect with row.

The length of first and second electrodes rows' electrod assembly each all ideally less than the length of workpiece.

Each length of whole corresponding workpiece advantageously all of first and second electrodes rows' length.

The part gap forms gap between row between a plurality of rows, also overall formation discharge space is whole or most of by settling with side by side relationship with the form of arranging.

Because above-mentioned layout, workpiece can be handled on whole width, can obtain favourable treatment effeciency, and the length of each electrod assembly can be reduced to the width sub-fraction of about workpiece.In optional mode, single electrod assembly length reduces and does not rely on the width dimensions of workpiece, and by adjusting the number of arrangement side by side of electrod assembly, electrode row's length can form the width of corresponding workpiece.Because this layout can be easy to obtain dimensional accuracy, in addition, can reduce because the amount of bow that the Coulomb force caused etc. can obtain uniform surface treatment like this.Do not need to increase the thickness of electrod assembly, and can avoid the increase of weight, reduce to be applied to the weight on the supporting construction thus, and the increase that can prevent material cost etc.

Preferably, workpiece relatively moves in order to the mode that the bearing of trend with first and second electrodes rows (the arrangement direction side by side of first and second electrodes row's electrod assembly) intersects.That is, plasma treatment appts preferably includes the discharge process device, and described discharge process device comprises electrode structure and is used for the workpiece that relatively moves on the direction that intersects in the gap between with respect to the row of discharge process device and electrode structure.

Polarity comprises that electric field applies the utmost point and earth electrode.The electrod assembly that the formation electric field applies the utmost point preferably is connected respectively to different power supply (referring to Fig. 2).Because this arranges, can increase fully each electrod assembly per unit area supply power and do not use power supply with larger capacity, handle gas plasma fully, and can the improved treatment performance.In addition, be used for each electrod assembly that power supply is individually formed each power supply, power supply does not need synchronized with each other.

The electrod assembly that the formation electric field applies the utmost point can be connected to shared (single) power supply (referring to Figure 39).

The part gap can communicate with each other between row adjacent one another are, perhaps directly or by connected space (referring to Fig. 2,42), perhaps they can be separated by the next door.

At least one electrod assembly respect to one another is arranged on the match surface with solid dielectric on the essentially identical position arranging with first and second electrodes.Solid dielectric can comprise the thermojet film that constitutes such as aluminium oxide, and perhaps it can comprise the plate such as pottery, and this plate can be applied on the surface of electrod assembly.Electrod assembly is contained in the container that is made of pottery etc. and this container also is an acceptable as the solid dielectric layer.

First electrode row's electrod assembly and second electrode row's electrod assembly can (referring to Figure 33) departs from the direction settling side by side.In this case, be placed in the electrod assembly that relativeness " basic in settling position identical on the direction side by side " is settled greater than electrod assembly correspondence respect to one another on half of their length.

According to suitably setting up at interval between the adjacent electrode parts in each electrode row such as treatment conditions.

Settle side by side electrod assembly polarity adjacent one another are on the direction relatively (on the contrary) is favourable, and settling side by side in first electrode row/the second electrode row that the row's of formation internal clearance is more favourable between two adjacent on direction electrod assemblies.Because this arranges, this row's internal clearance is also as the other part of discharge space, and even can carry out reliable surface treatment corresponding to the part of the workpiece on the border between the adjacent electrode parts.The uniformity of improved treatment like this, more.Under the situation of the row's of formation internal clearance between the electrod assembly of settling side by side on the direction, as the other part of discharge space, these adjacent electrode parts are provided with solid dielectric at least one end surfaces.In addition, the electrod assembly that applies the utmost point at the formation electric field is connected respectively under the situation of different power supplys, and the supply power of unit are can increase effectively, and can improve handling property.In addition, synchronized with each other even power supply does not have, do not worry producing electric arc, because electric field applies the utmost point not directly adjacent to each other yet.

In addition, one of two electrod assemblies settling arrangement adjacent one another are on the direction side by side in first electrode row/the second electrode row comprise the first surface in gap between the row of formation and the second surface that is provided with angle with respect to first surface, and the another one of two electrod assemblies comprises usually in the 3rd surperficial also gap between the row of formation that first surface flushes, and with existing the 4th surface of second surface to placing, and the row's of formation internal clearance between second surface and the 4th surface is settled on relative the 3rd surface with angle.First surface and second surface also are acceptables with the right angle setting, and gap quadrature between internal clearance setting and row is arranged with the right angle setting in the 3rd surface and the 4th surface.

It also is acceptable (referring to Figure 34) that first surface and second surface are provided with respect to gap between row with acute angle setting and row's internal clearance obliquely with obtuse angle setting, the 3rd surface and the 4th surface.Because this layout,, and can prevent to handle and omit even also be easy to take place favourable discharge between first surface and the second surface on the corner part on the formed obtuse angle side being formed on.

In above-mentioned layout, the turning that is formed on the side at the obtuse angle between first surface and the second surface is the R lead angle with relatively large radius of curvature, and the turning on the side of formed acute angle between the 3rd surface and the 4th surface is the R lead angle (referring to Figure 36) with less relatively radius of curvature.Because this layout, be formed on Paint Gloss that turning on the obtuse angle side between first surface and the second surface can form, the turning that is formed on the acute side between the 3rd surface and the 4th surface is projected into bigger possible angle, can reduce to be formed on formed space between these two turnings and the other electrode row like this, like this, on the corner part on the obtuse angle side, can be easy to and reliably favourable discharge takes place.

Among the electrode row of tool on the electrode row's that first surface is arranged opposite side, also be acceptable (referring to Figure 34) with being placed in the end surfaces that electrod assembly arrangement in basic identical with the electrod assembly with first surface position strides across first surface and the 3rd surface.Because this arranges, on the corner part on the obtuse angle side that is formed between first surface and the second surface, can be easy to discharge, and can prevent the processing omission more reliably.

In first electrode row/the second electrode row, settle the row's of formation internal clearance among three electrodes adjacent one another are on the direction side by side, and also be acceptable (referring to Figure 37) at these two the row's internal clearances that tilt of relative direction mutually.

All electrodes on the opposite end that is placed in electrode row can have trapezium structure, rectangular structure or any other planar structure, and the surface, opposite end of described trapezium structure symmetry on relative mutually direction tilts.

Advantageously, the downstream of row's internal clearance is not can allowing processing gas open (referring to Figure 27,35) by the mode in gap between row from its inject process gas.Because this arranges, the processing gas by the plasma in row's internal clearance direct injection row internal clearance also is applied on the workpiece.

Except staggered polarity arrangement structure (Fig. 2 and other place), adjacent electrod assembly can have identical polarity (referring to Figure 40) on the direction that is arranged side by side.

In above-mentioned layout, the electrod assembly that the electric field that constitutes all electrodes (electric field applies electrode and grounding electrode) applies electrode can be connected respectively to different power supplys.Because this layout can increase the per unit area supply power fully, and can the improved treatment performance.

In addition, the insulation next door preferably is arranged on to have and is settling electric field adjacent on the direction to apply between the electrod assembly of electrode (referring to Figure 40) side by side.Because this layout is synchronized with each other even power supply does not have, and also can prevent between adjacent electrod assembly electric arc to take place.It also is acceptable that the insulation next door also is arranged between the electrod assembly with grounding electrode.

Advantageously, discharge space is provided with at upstream extremity and is used to form the inlet port formation part of handling the gas inlet port, and is provided with the injection tip formation part that forms injection tip in the downstream.By doing like this, bearing of trend, that is, the first and second electricity rows settle direction side by side and intersect towards the direction of injection tip from handling the gas inlet port.Have opposite polarity and form part gap between first row betwixt at one of electrod assembly of one of the electrod assembly of settling first electrode row who is placed on the direction in the primary importance side by side and second electrode row, the part gap is as the part of discharge space between first row, be placed in and the second place that primary importance is adjacent on first electrode row's electrod assembly electrod assembly one of other and second electrode row one of other have reciprocal polarity and form part gap between second row betwixt, the part gap is as the other part of discharge space between second row.

In addition, advantageously, described device also comprise with the processing gas stream near the part of the second place (near the part of adjacent segment) of flowing through between first row in the part gap guide between the primary importance and the second place the border or towards the gas guiding piece of the direction (towards the direction of adjacent segment) (referring to Fig. 5-30) of the second place.More advantageously, described device is provided with the gas guiding piece, described gas guiding piece not only will handle gas stream through part gap between first row but also between each row in the part gap processing gas near the side part of gap portion between adjacent row guide to sides adjacent.

Because above-mentioned layout, plasma can be sprayed onto on the position corresponding to the workpiece on the border between the part gap between adjacent row fully, and can prevent to handle and omit.Like this, the influence of following bending to reduce can obtain the surface-treated uniformity fully.

Under above-mentioned situation, be connected with different power supply respectively if having electrod assembly that electric field applies electrode, can under the situation that does not increase power supply capacity, obtain the supply power of unit are fully, and in addition, not need these power supplys synchronized with each other.

Gap portion can be arranged near within the part of the second place between first row, and the gas guide member has the gas guiding surface, as towards the direction of the injection tip described gas guiding piece in second place medium dip.Because this arranges, can reliably the gas stream near adjacent segment be incorporated into adjacent direction along the gas guiding surface.Under such situation, preferably, the gas guide member is provided with the gas that the direction relative with the gas guiding surface tilt at the ejection end oral-lateral from the gas guiding surface and returns surface (referring to Fig. 6).Because this layout, a part can flow towards the ejection end oral-lateral from the gas guide member around towards the processing gas that adjacent direction flows, handle gas and also can be ejected on the position of corresponding gas guide member in the workpiece, can prevent reliably to handle and omit.

The gas guiding piece also can be arranged on inlet port and form part upward (from the processing gas introducing side of electrode structure).

For example, inlet port comprises that a part of branch port of the second place in guiding part gap between near first row and this branch port towards second place bending, constitute gas guiding piece (referring to Fig. 9) thus.Because this arranges, can will handle the gas border between the part gap between the row of being directed to reliably.

As the gas guiding piece, can on position, be contained in (referring to Figure 13) in the inlet port corresponding to the part of the second place in part gap between near first row towards cowling panel that the second place tilts.Because this arranges, can be incorporated into the border between the part gap between row with handling gas reliably.

The gas guiding piece can comprise stop portions, be used to stop the end sections that is placed on the leading-in end oral-lateral of settling on the border between the part gap between part gap and second row between first row, and from its regional upper shed (referring to Figure 15) on the ejection end oral-lateral.Because this arranges, handle gas can be between row the border between the part gap between the row of flowing to after the ionic mediumization of part gap.

The inlet port that inlet port forms part have in the upwardly extending incision-like structure in arrangements side side by side and between being provided with across first row between part gap and second row part gap also be acceptable, and be contained in (referring to Figure 15) in the inlet port on the position on stop portions border between the part gap between arrange in part gap and second between arranging corresponding to first.

Electrode structure comprises that having a pair of part that gets involved also is acceptable with being used to be connected the separator of getting involved coupling part partly, getting involved one of part is being placed in the electrod assembly of primary importance on first electrode row and is being placed in clamping between the electrod assembly on the second place, the another one that gets involved part is clamped in the electrod assembly that is placed in primary importance and is placed between the electrod assembly on the second place in second electrode row, settle near the end sections on the leading-in end oral-lateral on border the coupling part, is provided as stop portions (referring to Figure 18) thus.Handle gas and flow to a part on the ejection end oral-lateral from the coupling part on border by part gap between row.

The injection tip formation part (from the ejection end oral-lateral of electrode structure) that is arranged on the gas guiding piece goes up and will also be acceptable towards second place introducing (referring to Figure 21) from the processing gas near the second place in part gap between first row.

In above-mentioned layout, the gas guiding piece is included in the acclivitous gas guiding surface of second party and is placed in corresponding to (referring to 21) on the position of the part of the second place in part gap between first row in the injection tip that forms part near injection tip also is acceptable.Because this arranges that plasma treatment gas can be applied to the workpiece part on the border between the part gap between corresponding row reliably.

The gas guiding piece is placed in corresponding to injection tip and forms between first row in the injection tip of part between part gap and second row on the position on the border between the part gap, also being acceptable near the electrode structure side, and the gas guiding piece comprises the stop portions (referring to Figure 26) of the end sections on the ejection end oral-lateral that is used to stop the border.Because this layout, the processing gas on the border between the row of flowing through between the part gap can the row of flowing between part gap and plasma therein, and the plasma gas of part gap ionic mediumization can flow in the injection tip on the downstream of stop portions between row.

The part gap also is an acceptable to injection tip with incision-like structure between first and second rows being connected to across the mode in part gap between the part gap between first row and second row, and allows thus to constitute gas guiding piece (referring to Figure 27) thus from the processing gas dispersion in part gap between first row.

Injection tip forms part and comprises perforated plate, disperses the processing gas from part gap between first row, and also is acceptable towards second place diffusion and injection place like this, perforated plate is provided as gas guiding piece (referring to Figure 23) thus.Because this layout, handling gas can eject reliably and equably, and also can prevent the processing omission reliably.

The opening port, the ratio that form the part of injection tip partly corresponding to the injection tip on the border between the part gap between arrange in part gap and second between first row are bigger corresponding to the other part of the injection tip formation part in part gap between first row, and the aforementioned part with bigger A/F is set to gas guiding piece (referring to Figure 27).Because this layout, in injection tip corresponding to first and second row between flow resistance on the part on border between the part gap can be than littler corresponding to the flow resistance on the part in part gap between first row, the processing gas of part gap ionic mediumization can flow to the part on corresponding border between first row.

The electrod assembly that is placed in the electrod assembly of primary importance and is placed in the second place in first electrode row has opposite polarity relative to each other, and internal clearance is arranged in formation between these electrod assemblies, and

The inlet port that inlet port forms part comprises that setting is directly connected to row's internal clearance (referring to Figure 32) across inlet port in inlet port and the row between the row in part gap between the part gap between first row and second row.

Of the present invention second is characterised in that and comprises that electric field applies electrode and settles grounding electrode respect to one another and form the plasma treatment appts of handling gas path betwixt, and a plurality of supply units that are used to apply electric field, be used between these electrodes plasma and handle gas, and be used to the synchronizer (referring to Figure 44) that makes these supply units synchronous.

Owing to above-mentioned layout, can fully increase the supply power of the per unit area of electrode, even the capacity of each supply unit is less, also can obtain handling property.In addition, the phase deviation between the supply unit can be eliminated, and like this, favourable Surface Treatment with Plasma can be carried out.

Advantageously, in a plurality of supply units each comprises that being used for the commercial AC voltage commutation is the rectifier of dc voltage, the inverter that after being rectified to AC voltage, is used to switch dc voltage by diverter switch, and synchronizer control is used for the inverter of supply unit, inverter (referring to Figure 45-48) synchronized with each other in change action like this.Because this layout, a plurality of power supplys can be synchronous reliably.Output from inverter can be sinusoidal AC, impulse wave AC, square wave AC etc.

Advantageously, synchronizer comprises the common grid segment signal output of the inverter that is used for supply unit, is input to the grid of switching device of each inverter in parallel (Figure 45) from the signal of signal output output.In optional mode, synchronizer comprises that a plurality of signal outputs also are acceptables, the signal output is set to the inverter of each supply unit, and the shared synchronizing signal that is used for the signal output is supplied with part, the synchronizing signal of supplying with part output from synchronizing signal is input to each of signal output in parallel, the input of response synchronizing signal like this, each signal output are input to signal in the grid of switching device of corresponding inverter (referring to Figure 46,47).

Apply electrode and grounding electrode for electric field, electric field applies electrode and is divided into a plurality of electrod assemblies at least, and each electrod assembly is connected with supply unit.

That is, described device can comprise that electric field applies electrode, and described electric field applies electrode and comprises the first and second spaced electrode parts;

Grounding electrode is used for applying formation processing gas path between the electrode at first and second electric fields;

First supply unit is used to be applied to the electric field that plasma processing gas is used between the first spaced electrode parts and the grounding electrode;

The second source device is used for applying the electric field that is used for plasma processing gas between the second spaced electrode parts and grounding electrode; And

Synchronizer is used to make first and second supply units (referring to Figure 44) synchronously.

Because above-mentioned layout, each spaced electrode part dimension can reduce, and since static load, contingent Coulomb force etc. causes between comparative electrode bending can reduce as much as possible.

Advantageously, first supply unit comprises that being used for the commercial AC voltage commutation is first rectifier of dc voltage, and first inverter that after being rectified to AC voltage, is used to switch dc voltage, and synchronizer control is used for the inverter of supply unit, inverter (referring to Figure 45-48) synchronized with each other in change action like this.

A plurality of spaced electrode parts are arranged as side by side relation with row, and grounding electrode is arranged be arranged in parallel (referring to Figure 44) therewith.Equally, in this arranges, can prevent electrical potential difference between the spaced electrode parts by synchronizer, and can prevent between these electrod assemblies that separates, electric arc to take place.By this feature, can reduce the interval between the spaced electrode parts.Also can eliminate described interval, the electrod assembly that separates like this is adjacent one another are.Like this, it is irregular to prevent that processing takes place on corresponding to the part in the workpiece at the interval between the spaced electrode parts, and can carry out reliable favourable Surface Treatment with Plasma.The grounding electrode that is utilized in above-mentioned layout can be that a kind of of one or its can be divided into ground connection spaced electrode parts.The electric field of settling in the identical position of settling side by side on the direction applies spaced electrode parts and ground connection spaced electrode parts can be correctly toward each other, perhaps can be offset settling on the direction side by side.

Electric field apply electrode be not divided into a plurality of electrod assemblies but its be one and this single electric field to apply that electrode is connected with a plurality of supply units be acceptable.Even under such situation, can prevent that electric field is owing to synchronous a plurality of supply units become unstable.

Synchronizer comprises the common grid segment signal output that is used for first and second inverters, and is input to from the signal of signal efferent branch output that (referring to Figure 45) also is acceptable the grid of switching device of first and second inverters in parallel.It also is acceptable that the shared synchronizing signal that synchronizer comprises the first and second signal outputs and is used for the first and second signal outputs is supplied with part, be imported into the first and second signal outputs in parallel from the synchronizing signal of synchronizing signal supply unit branch output, the input of response synchronizing signal like this, the first and second signal outputs are input to signal respectively in the grid of switching device of first and second inverters (referring to Fig. 6,47).

First supply unit is the resonant type high frequency electric source that drives on the resonance frequency of the LC resonant circuit that ancillary coil constituted of the output transformer by the first spaced electrode parts and first supply unit, and the second source device is the resonant type high frequency electric source that drives on the resonance frequency of the 2nd LC resonant circuit that ancillary coil constituted of the output transformer by the second spaced electrode parts and second source device.Under such situation, synchronizer detects the output waveform (the principal current waveform of the output transformer of first supply unit) of first inverter based on the signal rectification frequency of oscillation that detects, and after shared synchronizing signal is supplied with the part rectification first and second signal detectors in parallel, export synchronizing signal and respond it based on frequency of oscillation, the first grid segment signal output is input to signal in the grid of switching device of first inverter, and the second grid segment signal output also is an acceptable with the grid (referring to Figure 48) that signal is input to the switching device of second inverter.

Following manner also is an acceptable: under the situation of the electrostatic capacitance between the first spaced electrode parts and the grounding electrode greater than the electrostatic capacitance between the second spaced electrode parts and the grounding electrode, second electrode assembly is longer than first supply unit (referring to Figure 49) in the rise/lowering time of the voltage that is applied, perhaps the second spaced electrode parts and condenser be connected in parallel (referring to Figure 50).Because this arranges that the voltage waveform that is applied to the first and second spaced electrode parts can be consistent each other.

Plasma treatment of the present invention is preferably carried out under the pressure in the environment of air pressure (normal pressure).Ambient pressure refers to 1.013 * 10 ⁴To 50.663 * 10 ⁴Pressure in the scope of Pa is preferably 1.333 * 10 ⁴To 10.66 * 10 ⁴Among the scope of a (100-800 holder), when the easiness of the pressure adjustment of considering described device and the simplification of structure, more preferably, 9.331 * 10 ⁴To 10.394 * 10 ⁴Among the scope of Pa (700-780 holder).

Preferably, the present invention is by causing air glow discharge, promptly in the pressure within the scope of ambient pressure glow discharge takes place and produces plasma and handle.

Description of drawings

Fig. 1 is the side-looking viewgraph of cross-section according to the long-range version atmospheric plasma processing unit of first embodiment;

Fig. 2 is the viewgraph of cross-section of overlooking of the long-range version atmospheric plasma processing unit got on the line II-II of Fig. 1;

Fig. 3 is that wherein electrode structure protrudes into as the vertical view on the glass substrate of the workpiece of long-range version atmospheric plasma processing unit;

Fig. 4 is the schematic plan view that the embodiment of gas guide member wherein is set in the gap between the row of the electrode of electrode structure;

Fig. 5 is that the master of the electrode structure got on the line V-V of Fig. 4 looks viewgraph of cross-section;

Fig. 6 is that the master of the modified example of gas guide member looks viewgraph of cross-section;

Fig. 7 is that the master of the modified example of gas guide member looks viewgraph of cross-section;

Fig. 8 is that the master of the modified example of gas guide member looks viewgraph of cross-section;

Fig. 9 wherein handles the front view that gas leading end interruption-forming partly is provided with the embodiment of gas guiding piece;

Figure 10 has shown to be arranged on to handle the front view that the gas inlet port forms the additional embodiments of the gas guiding piece on the part;

Figure 11 has shown tilt vertical view with the embodiment of the stream coupling of the inclination of handling gas of the end surface of each electrod assembly wherein;

Figure 12 is the side-looking viewgraph of cross-section of being got from the line XII-XII of Figure 13, has shown to be arranged on to handle the additional embodiments that the gas inlet port forms the gas guiding piece on the part;

Figure 13 is that the master that the line XIII-XIII along Figure 12 is got looks viewgraph of cross-section;

Figure 14 is the perspective view as the stream rectification part of the gas guiding piece of Figure 12;

Figure 15 has shown that wherein handling the gas inlet port forms the master that part is provided with as the embodiment of the stop portions of the gas guiding piece that is used to the border between the part gap between the row of closing and look viewgraph of cross-section;

Figure 16 be Figure 15 embodiment overlook viewgraph of cross-section;

Figure 17 has shown that wherein the master that grid type separator as the gas guiding piece is arranged on embodiment between the electrode looks viewgraph of cross-section;

Figure 18 be wherein the grid type separator be shown in square view;

Figure 19 is that the master of the embodiment of Figure 17 looks viewgraph of cross-section;

Figure 20 is that wherein injection tip forms the decomposition diagram that part is provided with the embodiment of gas guiding piece;

Figure 21 is the front view of the embodiment of Figure 20;

Figure 22 is that wherein injection tip is provided with decomposition diagram as the embodiment of the perforated plate of gas guiding piece;

Figure 23 is that the master of the embodiment of Figure 22 looks viewgraph of cross-section;

Figure 24 has shown that injection tip wherein forms part and is provided with decomposition diagram as the embodiment of the stop portions of the gas guiding piece that is used to the border between the part gap between the row of closing;

Figure 25 is the viewgraph of cross-section that the line XXV-XXV along Figure 24 is got;

Figure 26 is the front view that the line XXVI-XXVI along Figure 24 is got;

Figure 27 is the decomposition diagram of the embodiment that shown that the downstream of wherein arranging internal clearance is opened by injection tip in arranging;

Figure 28 is the vertical view that the injection tip of the embodiment of Figure 27 forms parts (lower plate);

Figure 29 is the vertical view of the improvement embodiment of injection tip in the row;

Figure 30 (a) is the vertical view of the other improved embodiment of injection tip in the row;

Figure 30 (b) is the vertical view of the other improved embodiment of injection tip in the row;

Figure 31 has shown wherein to handle the decomposition diagram that gas is introduced the embodiment of inlet port in the part row of being provided with;

Figure 32 is the vertical view that the processing gas of Figure 31 is introduced part;

Figure 33 is the vertical view that has shown that first and second electrodes row's mutual electrode of opposite parts wherein are offset a little;

Figure 34 has shown the viewgraph of cross-section of overlooking of wherein arranging embodiment that internal clearance tilts;

Figure 35 is the decomposition diagram of the embodiment of Figure 34;

Figure 36 (a) is the vertical view that has shown gap and the intersection between row's internal clearance that tilts between the row who amplifies on the basis, and (b), (c) shown the vertical view that amplifies, and shown the modified example of the tilt angle varied between its medium dip row internal clearance respectively;

Figure 37 be arrange wherein that internal clearance tilts and each electrode row's electrod assembly be 4 embodiment overlook viewgraph of cross-section;

Figure 38 is the decomposition diagram of the embodiment of Figure 37;

Figure 39 is the vertical view that has shown the embodiment that wherein uses shared (single) power supply;

Figure 40 has shown that each electrode row wherein has the vertical view of the embodiment of identical polarity;

Figure 41 is each electrode plane graph of having identical polarity and using the embodiment of shared (single) power supply wherein;

Figure 42 be the end surface of wherein each electrode row's adjacent electrode parts be adjacent to each other the row's of elimination internal clearance like this embodiment overlook viewgraph of cross-section;

Figure 43 be wherein in Figure 42, have an embodiment among each row of identical polar overlook viewgraph of cross-section;

Figure 44 is the circuit diagram that has shown the basic structure of the embodiment that is provided with the synchronizer that is used for synchronous a plurality of supply units;

Figure 45 is the circuit diagram that has shown the embodiment of the specific structure with Figure 44;

Figure 46 is the circuit diagram of additional embodiments that has shown the ad hoc structure of Figure 44;

Figure 47 is the circuit diagram of the modification embodiment of Figure 46;

Figure 48 is the circuit diagram that has shown the other improvement embodiment of Figure 46;

Figure 49 (a) shows the wherein circuit diagram of the first and second spaced electrode parts embodiment that size differs from one another in Figure 44;

Figure 49 (b) is the view of waveform of output voltage that has shown first and second supply units of Figure 49 (a), and wherein trunnion axis shows the time, and the vertical axis display voltage;

Figure 50 has shown that wherein other solving device is applied to the circuit diagram of the embodiment of Figure 49 (a).

＜Reference numeral 〉

W...... workpiece

2...... processing gas source

3A, 3B, 3C...... power supply

Shared 3...... (single) power supply

30...... discharge process part

30X...... electrode unit (electrode structure)

31X...... first electrode row

31A, 31B, 31C, 31D...... electrod assembly

32X...... second electrode row

32A, 32B, 32C, 32D...... electrod assembly

33s...... gap between row

33p...... part gap between row

33r...... connected space

33q...... row's internal clearance

31d...... side turning, obtuse angle

31e...... acute side turning

32d...... side turning, obtuse angle

32e...... acute side turning

33u...... the intersection between first electrode row and the row's internal clearance

33v...... the intersection between second electrode row and row between the gap

43...... inlet port forms part

43a...... handle the gas inlet port

43b...... and near the corresponding branch port of a part (gas guiding piece) of the second place in part gap between first row

43d...... and near the corresponding branch port of a part (gas guiding piece) of the second place in part gap between second row

43h...... inlet port (main inlet port) between row

43i...... inlet port in the row (auxiliary inlet port)

49...... lower plate (injection tip formation part)

49a...... incision-like injection tip

49B...... gas leader (gas guiding piece)

49c...... gas guiding surface

The injection tip 49d...... top bar

49E...... bridge portion (being used to be blocked in the stop portions of the end sections on the borderline ejection end oral-lateral between the part gap between the adjacent row of injection tip)

The injection tip 49f...... get out of a predicament or an embarrassing situation

49g...... upside space from the perforated plate of injection tip

49h...... injection tip between row

49i...... injection tip in the row (injection tip of big A/F, gas guiding piece)

49j...... diamond shaped opening (injection tip of big A/F, gas guiding piece)

49k...... triangle open mouth (injection tip of big A/F, gas guiding piece)

49m...... injection tip between row

The injection tip in the row 49n...... tilt

49U...... the plate portion of topping bar of lower plate

49L...... the plate portion of getting out of a predicament or an embarrassing situation of lower plate

51...... gas guide member (gas guiding piece)

51a...... gas guiding surface

52...... gas guide member (gas guiding piece)

52a...... gas guiding surface

52b...... gas returns the surface

53...... gas guide member (gas guiding piece)

54...... gas guide member (gas guiding piece)

53a, 54a...... gas guiding surface

60...... stream rectification part as the gas guiding piece

62...... settle cowling panel near connected space

70...... stop member (stop portions)

80...... gate type space

81...... flow out part (insertion portions between the adjacent electrode parts)

Coupling part 82...... (stop portions)

90...... perforated plate as the gas guiding piece

90a...... many holes

100...... electric field applies electrode

200...... grounding electrode

301...... first supply unit

302...... second source device

400...... synchronizer

111...... the first spaced electrode parts

112...... the second spaced electrode parts

211, the spaced electrode parts of 212...... grounding electrode

A 311...... DC rectifier

321...... first inverter

331...... first transformer

321a, 321b, 321c, 321d...... first switching device

312...... the 2nd DC rectifier

322...... second inverter

332...... second transformer

322a, 322b, 322c, 322d...... second switching device

Shared 410...... (single) signal output

411...... first grid segment signal output

412...... second grid segment signal output

450...... shared synchronizing signal is supplied with part

A...... commercial AC power supply

Embodiment

After this with reference to the accompanying drawings embodiments of the invention are described.

Fig. 1-3 has shown the atmospheric plasma processing unit according to the remote-type of the first embodiment of the present invention.The workpiece W of this device is such as the large scale liquid crystal glass substrate, with and Width (left and right directions among Fig. 2,3, and with Fig. 1 in the direction of paper quadrature) the about 1.5m of width.Can in normal temperature, heat, cool off or keep workpiece W.

As shown in Figure 1, plasma treatment appts comprise nozzle head 1, handle gas source 2, three (a plurality of) power supply 3A, 3B, 3C and transmitting devices 4.

Nozzle head 1 supports by the bracing or strutting arrangement (not shown), and blowing direction points to downwards like this.

The processing gas that is suitable for processing intent is stored in to be handled in the gas source 2.

Power supply 3A, 3B, the identical pulse-like voltage of 3C output.Advantageously, the rise/lowering time of this pulse is 10 μ s or littler, and between the row that after this will illustrate the part gap 33p in, electric field strength is 10-1000kV/cm, frequency is 0.5kHz or bigger.

Except impulse wave, can use continuous wave power supply such as high frequency.

Transmitting device 4 comprises and transmits (left and right directions among Fig. 1) such as the roller conveyer and with glass substrate W as workpiece on fore-and-aft direction and with its downside by nozzle head 1.Processing gas in nozzle head 1 ionic mediumization is blown on this glass substrate W, and carries out plasma treatment usually under normal pressure.Certainly, fixing glass substrate W and moving nozzle head 1 also are acceptables.Conveyer 4 can comprise belt conveyer.In optional mode, workpiece can transmit by being clamped between the up-down rollers.

With the nozzle head 1 that explains according to remote-type atmospheric plasma processing unit.As shown in Figure 1, 2, nozzle head 1 comprises that handling gas introduces part 20 and following release processor 30.Nozzle head 1 with the lateral of transmission direction (above-below direction among Fig. 2, the 3) quadrature of glass substrate W on extend longer.

Handle gas and introduce the pipe unit 25 that part 20 comprises by and to the right two pipes 21,22 that (with the direction of the paper surface quadrature of Fig. 1) extends left, and the bilateral elongated chamber of settling with upper and lower relation.The point-like hole 25a of the greater number of passing through from the supreme chamber 23 of upside of each pipe 21,22 settles with short spacing in a longitudinal direction.Handle gas source 2 and be connected to the left end (the close side on the paper surface among Fig. 1) of pipe 21 and the right-hand member (inboard on the paper surface among Fig. 1) that passes through the other pipe 22 of gas feed path 2a.Flow in the chamber 23 mobile in the opposite direction within pipe 21,22 simultaneously from the processing gas of handling gas source 2 by these point-like holes 25a.After this, handling gas flow into down in the chamber 24 by the incision-like gap 20a in the preceding and rear side that is formed on pipe unit 25.Because this arranges, handles homogenizing on gas all positions in the bilateral longitudinal direction of handling gas introducing part 20.

Discharge process device 30 comprises framework 40, be contained in electrode holder 48 in this framework 40, be arranged on electrode unit (electrode structure) 30X and lower plate 49 within the retainer 48.Framework 40 comprises that each is by formed upper plate 41 of rigid metal and side plate 42.

Retainer 48 comprises the reverse L shaped parts of a pair of cross section, its each formed by insulating material such as pottery and resin.

Be connected to chamber 24 and about (vertical) incision-like through hole 41a of extending with the paper surface direction among Fig. 1 be formed in the upper plate 41 of framework 40.Be connected to through hole 41a and about the incision-like gap 48a that extends be formed between the upper portion of a pair of reverse L shaped parts in the cross section of retainer 48.About the incision-like of extending handle gas inlet port 43a and constitute by through hole 41a and gap 48a.Inlet port formation part 43 is that oppositely L shaped a pair of upper lateral part branch constitutes by the upper plate and the cross section of framework 40.

The incision-like injection tip 49a that extends about being comprised by the formed lower plate 49 of insulating element also constitutes injection tip and forms part.

Comprise that the inlet port of handling gas inlet port 43a forms part 43 and settles in the mode of vertical clamping electrode unit 30X with the lower plate 49 that comprises injection tip 49a.

To describe electrode unit 30X in detail below.

As shown in Figure 1, 2, electrode unit 30X is included in pair of electrodes row 31X, the 32X that settles with relative relation on the fore-and-aft direction.Electrode row 31X, 32X extend about each.Front side first electrode row 31X comprises three (n spare) electrod assembly 31A, 31B, the 31C that settles with the side by side relationship bilateral.Rear side second electrode row 32X comprises 3 (n spare) electrod assembly 32A, 32B, the 32C that can be parallel to the side by side relationship bilateral arrangement of first electrode row 31X in its mode.Gap 33s is formed between these first and second electrodes row 31X, the 32X between the incision-like row who extends linearly.

Electrod assembly 31A-32C each by such as the metal of copper and aluminium, such as the metal alloy of stainless steel and bronze, and form such as the elemental substance of the conductive component of interphase.Each has the structure that bilateral extends thickness and flat electrod assembly 31A-32C.Their bilateral length approximately is 1/3 (1/n) of the bilateral width dimensions of workpiece W.Comprise that the length of gap 33s between entire electrode row's the length of three electrod assemblies and row is longer than the width dimensions of workpiece W a little.

The length of electrod assembly 31A-32C is respectively such as 50-odd number cm.By settling three electrod assemblies with relation side by side in a longitudinal direction, can form the effective processing width of about 1.5m for entire electrode unit 30X.

The length of each electrod assembly can differ from one another, but the length of comparative electrode parts is preferably mutually the same.

As shown in Figure 1, 2, in order to prevent arc discharge, comprise that the solid dielectric layer 34 such as the thermojet film of aluminium oxide is coated on each electrod assembly 31A-31C.(in Fig. 3 and after this, solid dielectric layer 34 is not shown in due course).

Solid dielectric layer 34 covers the relative front surface with pairing row, two end surfaces on the longitudinal direction and the upper and lower surface of each electrod assembly.Solid dielectric layer 34 further extends to four sides of rear surface from these surfaces.Solid dielectric layer 34 preferably thickness is approximately 0.01-4mm.Except aluminium oxide, other tabular, sheet or film like material such as pottery and resin can be used to be coated on the outer surface of electrod assembly.The width of the solid dielectric layer 34 on the rear surface is 1mm or more preferably, and 3mm or more more preferably.In Fig. 1,2, the thickness of solid dielectric layer 34 shows in exaggerative mode.

The turning of each electrod assembly 31A-32C is the R lead angle, to prevent arc discharge.The radius of curvature of this R is 1-10mm and more preferably for 2-6mm preferably.

As shown in Figure 2, bilateral is placed in two identical locational electrod assembly 31A, 32A among electrode row 31X, the 32X; 31B and 32B; And 31C and 32C respectively on the direction of front and back toward each other.

That is, be placed in electrod assembly 31A on the left side of electrode unit 30X and electrod assembly 32A on the direction of front and back toward each other.Be formed between these electrod assemblies 31A, the 32A as part gap 33p between the row of the left part of gap 33s between row.Be placed in electrod assembly 31B in the center and electrod assembly 32B on the direction of front and back toward each other, and be formed between these electrod assemblies 31B, the 32B as part gap 33p between the row of the core of gap 33s between row.Be placed in electrod assembly 31C on the right side and electrod assembly 32C on the direction of front and back toward each other, be formed between these electrodes 31C, the 32C as part gap 33p between the row of the right side part of gap 33s between row.The preferably about 1mm-3mm of the thickness (distances on the fore-and-aft direction between the electrode of opposite parts) of part gap 33p and more preferably about 1mm-2mm between each row.

Between left side row between part gap 33p and central row on the border between the 33p of part gap, the turning by four electrod assembly 31A, 31B, 32A, 32B forms connected space 33r.Between left side row between part gap 33p and central row part gap 33p be communicated with by connected space 33r is linear each other.Similarly, on the border between the 33p of part gap between part gap 33p between the row of central authorities and right side row, being used to be interconnected, the connected space 33r of part gap 33p, 33p forms by four electrod assembly 31B, 31C, 32B, 32C between these rows.

Gap 33A is formed by the connected space 33r of gap 33p and these gaps 33p that interconnects between three left sides, core and right side row between row.

As shown in Figure 1, the whole length of the upper end open of gap 33s is connected with gas inlet port 43a between this row, and the whole length of lower ending opening is connected to injection tip 49a simultaneously.

Omitting lower plate or injection tip formation parts 49 also is acceptable, and the lower ending opening of gap 33s itself constitutes injection tip between row, and processing gas directly sprays by the lower ending opening of gap 33s between this row.

As shown in Figure 2, left electrodes parts 31A and and first electrode row 31X in the adjacent core electrod assembly 31B of parts 31A between the row of formation internal clearance 33q.This row's internal clearance 33q is connected with left side connected space 33r.Row's internal clearance 33q also is formed between core electrod assembly 31B and the right electrodes parts 31C, and this row's internal clearance 33q is connected with right side connected space 33r.

Similarly, row internal clearance 33q also is respectively formed among adjacent electrod assembly 32A, 32B among second electrode row 32X, the 32C, and this row's internal clearance 33q is connected with corresponding connected space 33r.

The surface of the parts 31A-32C of gap 33p meets at right angles between the surface of each electrod assembly 31A-32C of the row of being used to form internal clearance 33q and the row of being used to form.Gap 33s quadrature between row internal clearance 33q and row.Row's internal clearance 33q thickness preferably approximately is 1-3mm.

Be used to keep the little separator 36 at the interval between each adjacent electrode parts to be arranged on and respectively arrange internal clearance 33q.Separator 36 is formed by insulation and the plasma corrosion resistant material such as pottery.The mode that separator 36 is settled is to become a side (from a side in the more distally that other electrode queues) to the rear surface of each electrod assembly, and the row of assurance internal clearance 33q is as the space thus.As the degree of depth of row's internal clearance 33q of space (deducting the width of separator 36) such as approximately being 5mm.The thickness (distances between the bilateral adjacent electrode parts) of row internal clearance 33q greatly in the row of approximating electrode 33q or arrange between part gap 33p, perhaps greater than gap 33q or 33s such as about 1mm-3mm.

As shown in Figure 2, electrode unit 30X is staggered polarity installing structure.That is, toward each other one of electrod assembly applies electrode as electric field on fore-and-aft direction, and another one is as grounding electrode.Like this, these electrod assemblies have opposite polarity relative to each other.In addition, bilateral ground electrod assembly adjacent one another are also has opposite polarity.

Especially, in the left part of electrode unit 30X, front side electrode parts 31A is connected to pulse power 3A by power supply supply line 3a, and back side electrodes parts 32A is by ground wire 3e ground connection simultaneously.Because this arranges, impulse electric field is formed on by the pulse voltage of being supplied with by power supply 3A between the left side row of electrode unit 30X among the 33p of part gap, and produces glow discharge therein.

In the core of electrode unit 30X, electrod assembly 31B is by ground wire 3e ground connection, and electrod assembly 32B is connected to pulse power 3B by power supply supply line 3b simultaneously.Because this arranges, the pulse voltage that impulse electric field is supplied with by power supply 3B is formed between central row among the 33p of part gap, and produces glow discharge therein.

In the part of the right side of electrode unit 30X, electrod assembly 31C is connected to pulse power 3C by power supply supply line 3e, and electrod assembly 32C is by ground wire 3e ground connection simultaneously.Because this arranges, the pulse voltage that impulse electric field is supplied with by power supply 3C is formed between the row of right side among the 33p of part gap, and produces glow discharge therein.

Since above-mentioned layout, each part of part gap 33p between three rows of electrode unit 30X as discharge space, and like this, gap 33s is as discharge space between common whole row.

In addition, the voltage that impulse electric field is supplied with by power supply 3A, 3B, 3C is similarly constructed in each row's internal clearance of four row's internal clearance 33q, and produces glow discharge therein.Because this arranges that row's internal clearance 33q also is used as the part of the discharge space of electrode unit 30X.These row internal clearance 33q connect between left side and central row the breaking part between the 33p of part gap between between the 33p of part gap and center and right side row respectively, form discharge space continuously thus on the whole length of the bilateral of electrode unit 30X.

Three electrod assembly 31A, 32B, 31C that the formation electric field applies electrode are connected respectively to different power supply 3A, 3B, 3C.

If respectively, the left part of electric field unit 30X is called " primary importance ", and with " part gap 33p between the row of left side " conduct " part gap between first row ", then respectively, core can be called " second place adjacent " with primary importance, and with part gap 33p between central row as " second between row part gap ".

If the core with electrode unit 30X is called as " primary importance " and part gap 33p between central row is called as " part gap between first row " respectively, then respectively, left part or right side part are called " second place adjacent " and part gap 33p between the row of left side and right side is called " part gap 33p between second row " with primary importance.

If respectively, the right side part of electrode unit 30X is called " primary importance ", part gap 33p between the row of right side is called " part gap between first row ", then respectively, core is called that part gap 33p is called between " second place adjacent with primary importance " and central row in " part gap between second row ".

As shown in Figure 1, (not shown in Fig. 2 and subsequent view), nozzle head 1 is being provided with the pulling plug (drawing screw part) 601 on the side plate 42 that bolt ring 603 by resin manufacture is hooked to framework 40 and is being threaded onto each electrod assembly 31A-32C being pulled outwardly the moving electrode parts on fore-and-aft direction on the discharge process device 30, and is used on fore-and-aft direction electrod assembly inwardly promoted the hold-down bolt (clamping screw parts) 602 by keeping 48.Pulling plug 601 and hold-down bolt 602 on the bilateral direction with the spacing setting.The front and back position of each electrod assembly 31A-32C, and the thickness of gap 33s can be by these bolt 601,602 adjustings between the row of making thus.These push away/and hold-down bolt 601,602 also causes the holdout device of bending as the Coulomb force by electrod assembly 31A-32C.Electrod assembly 31A-32C is provided preferably with two groups or more groups and pushes away/compression bolt 601,602.

The operation of the long-range version atmospheric plasma processing unit of structure like this will be described below.

Introduce on the longitudinal direction of gap 33s between the processing gas of two-way ground homogenizing in the part 20 is introduced in electrode unit 30X by inlet port 43a row handling gas.Parallel therewith, the pulse power supplies to electrod assembly 31A, 32B, 31C from power supply 3A, 3B, 3C respectively.By doing like this, among the 33p of part gap, glow discharge takes place therein and carry out plasma (activation) to handling gas between impulse electric field is formed on and respectively arranges.The processing gas of plasma sprays equably by part gap 33p between each row among the injection tip 49a like this.Like this, as shown in Figure 3, plasma is applied to the region R 1 of part gap 33p between each row on the upper surface of corresponding glass substrate W, can carry out surface treatment like this.

Be incorporated among the connected space 33r and from its row of flowing into internal clearance 33q from the part of the processing gas of inlet port 43a.Among this row's internal clearance 33q glow discharge taking place also by supply with pulse voltage from power supply, and carries out plasma to handling gas.The part of the connected space 33r of processing gas from corresponding injection tip 49a of plasma is sprayed like this in row's internal clearance 33q.By doing like this, plasma also can be ejected on the region R 2 of the connected space 33r among the corresponding glass substrate W.By doing like this, the glass substrate W with big zone can carry out the uniform plasma surface treatment and usually without any irregular on two-way whole width.

Similarly, can be by glass substrate W be moved forward and backward the whole surface of handling glass substrate W by carrier device 4.

Even entire electrode unit 30X has the length of the width dimensions of corresponding glass substrate W, the length of each electrod assembly 31A-32C equal its about 1/3rd (sub-fractions) and, therefore, can be easy to obtain dimensional accuracy.In addition, even make the Coulomb force effect very big by applying electric field, because the difference that constitutes the metal master of electrod assembly 31A-32C and be arranged in the thermal coefficient of expansion between its lip-deep solid dielectric layer 34 produces bigger thermal stress, this can the limit flexion amount.Because this arranges, can keep arranging the width of part gap 33p consistently.Correspondingly, handling gas flow can keep among the 33p of part gap between row equably, and can obtain uniform surface treatment thus.In addition, do not need to enlarge the thickness of electrod assembly, increasing rigidity, can reduce to be applied to the load of supporting construction and the cost that can prevent to increase material by avoiding the weight increase.

Owing to use power supply 3A, 3B, 3C respectively for small electrode parts 31A, 32B, 31C,, also can increase the supply of the power supply of per unit area fully even the capacity of each power supply 3A, 3B, 3C is less.Like this, handle gas plasma fully, and can obtain the high processing performance.In addition, owing to power supply 3A, 3B, 3C are connected respectively to independent electrod assembly, they do not need synchronized with each other.In addition, owing in staggered mode polarity is set, it is not two-way adjacent one another are that electric field applies electrode, does not therefore worry because the electric arc that formed undesired electric field produced between the adjacent electrode parts, even power supply 3A, 3B, 3C do not have synchronized with each other.

Other embodiments of the invention will be described below.In after this illustrated embodiment, the parts identical with the above embodiments are used and are represented with identical reference number in the accompanying drawings, and have simplified explanation.

In the embodiment shown in Fig. 4,5, the gas guide member 51 that constitutes " gas guiding piece " is contained between each row among the 33p of part gap.This gas guide member 51 is positioned near on the part gap between adjacent (second place) row among the part gap 33p between each first row.That is, among the 33p of part gap, gas guide member 51 is positioned on its right side part between on the left side row.Among the 33p of part gap, gas guide member 51 is placed in respectively on left side and the right side part between central row.Among the 33p of part gap, gas guide member 51 is placed on its left part between the row of right side.

Gas guide member 51 is by being formed such as the insulation of pottery and plasma corrosion resistant material and having towards last wedge structure (elongated triangular structure).That is, gas guide member 51 comprises vertical surface, is downward-sloping gas guiding surface 51a of the sides adjacent of acute angle (towards the direction of the second place) and the lower surface that connects the lower end on these two surfaces in vertical surface therewith.The bilateral width of the lower surface of gas guide member 51 is 5mm or littler preferably.

Indicated as the arrow among Fig. 5, the gas stream f0 that flows into all processing gas the 33s of gap between row from guiding port 43a directly flows downward, described gas stream f0 by except in each primary importance with the part the part (near the part of the second place) that part gap 33p is adjacent between row.On the other hand, by being introduced on the adjacent direction along the guiding surface 51a of gas guide member 51 near the gas stream f1 of part adjacent among the part gap 33p between the row of each primary importance.At the described processing gas of this process ionic mediumization.Plasma gas stream f1 sprays by injection tip 49a by connected space 33r.Because this arranges that plasma can be sprayed onto on the region R 2 of the connected space 33r among the corresponding glass substrate W more reliably.As a result, scrambling can be prevented to handle more reliably, and the surface-treated uniformity can be improved more.

For the gas stream f0 among the part gap 33p between the row in each primary importance, along the downward downside that is close to a part of f2 circulation of the gas that flows to gas guide member 51 of the vertical surface of gas guide member 51.This makes it can carry out plasma treatment reliably, even on the part of the downside of corresponding gas guide member 51, and the uniformity of improved treatment more.

According to the test that the inventor carried out, the needed time of emptying can reduce in the process of emptying, and this is before handling, by carrying out described emptying heating electrode etc.

Fig. 6 has shown the improvement embodiment of gas guide member.This gas guide member 52 is provided with downwards the gas guiding surface 52a that tilts from summit angle and sides adjacent (towards the direction of the second place) and the laterally inclined gas relative with sides adjacent returns surperficial 52b from the lower end of gas guiding surface 52a downwards.

According to this gas guide member 52, along gas guiding surface 52a be incorporated into a part of f3 of the gas stream f1 on the adjacent direction can be reliably along gas return surperficial 52b turn back to relative side and reliably circulation to the downside of gas guide member 52.Because this arranges, can be close to and carry out plasma treatment under the gas guide member 52 reliably and can improve the uniformity of processing more.

The gas guide member is not limited to the structure as shown in Fig. 5,6, and still, it can have other different structure, as long as they can be incorporated into the adjacent second place with gas stream near the second place of part gap 33p between first row.For example, the gas guide member can have in the cross section of cross section and as shown in Figure 7 gas guide member 53 the regular triangle structure or with the adjacent direction of as shown in Figure 8 gas guide member 54 on the structure of downward-sloping flat tabular structural similarity.In these parts 53,54, (towards the direction of the second place) downward-sloping inclined surface constitutes gas guiding surface 53a, 54a respectively on adjacent direction.

In embodiment as shown in Figure 9, be used for gas stream is formed part 43 at the gas inlet port that the gas guiding piece that guides on the adjacent direction is arranged on from electrode unit 30X on the upside (handle gas and introduce side).Specifically, the inlet port of gas inlet port formation part 43 constitutes by small branch port 43b, the 43c of a large amount of numbers, described small branch port 43b, 43c are being placed on the two-way direction on the short spacing, rather than the bilateral slit 48a of first embodiment.For these branch port 43b, 43c, follow closely downwards corresponding to the branch port 43c of mid portion of part gap 33p between row and to open.On the other hand, the branch port 43b (towards direction of the second place) on adjacent direction of the side part (near the part of the second place) of part gap 33p tilts between corresponding close each first row.This inclination branch port 43b constitutes " gas guiding piece ".

For all processing gas, plasma follows part gap 33p between the row of flowing through downwards closely simultaneously by the gas stream f0 of the port 43c of vertical branch, is sprayed onto then on the glass substrate W.

On the other hand, flow through inclination branch port 43b gas stream f1 (towards the direction of the second place) downward-sloping mobile while on the adjacent direction row between part gap 33p ionic mediumization.Then, the gas of plasma sprays under connected space 33r.Because this arranges, on the region R 2 of the connected space of corresponding glass substrate W, can carry out Surface Treatment with Plasma and the uniformity that can improve processing reliably.

In embodiment as shown in figure 10, be arranged on the electric motor units 30X top part of (only having shown reference number 33B) with the gas inlet tube 43P that deals with gas inlet port formation part.Gas inlet tube 43P along part gap 33p between first row extend and longitudinal component with the left side of part gap 33p between corresponding to first row and right side on the mode bending that is bent upwards.Be incorporated into pin-and-hole branch port 43d, the 43e of the greater number of the port among the 33p of part gap between first row on the longitudinal direction of pipe 43P, to be formed in the lower portion of gas introduction tube 43P as handling gas than short spacing.Branch port 43e corresponding to the mid portion of part gap 33p between first row follows closely usually under shed.On the other hand, these branch port 43e at more close two ends (towards direction of the second place) on adjacent direction tilts more.Settle these branch port 43e at more close two ends than on adjacent direction, tilt more (towards the direction of the second place).Be placed in the branch port 43d on the two ends, that is, on adjacent direction, tilt most near the side part (near the part of the second place) that part gap 33p is adjacent between first row.This branch port 43d constitutes " gas guiding piece ".

Handling gas is incorporated on the end sections of inlet tube 43P.Flow through guiding tube 43P and leak into from branch port 43d, 43e gradually and be placed in part gap 33p between first on the part of bottom row of the body of herein regulating the flow of vital energy.For all gas, the gas stream f1 ' that flows out branch port 43d dips down in (towards the direction of the second place) on the adjacent direction and tiltedly flows through part gap 33p between first row.Because this arranges that plasma treatment can be carried out, and can improve the uniformity of processing on the region R corresponding with the connected space of glass substrate W 2.

In embodiment as shown in figure 11, the opposed end surface of each electrod assembly 31A-32C that the relative bilateral of inclined cut is adjacent (having only reference number 31A, 31B to be shown), the upper portion on each opposed end surface separates and more close downwards with adjacent electrode significantly from adjacent electrod assembly.Correspondingly, the width of connected space 33r and row's internal clearance 33q reduces downwards more.

Indicated as the arrow among Figure 11, to handle gas on identical with the inclination of each end surface usually angle between the row of being incorporated among the 33p of part gap, because this layout, can increase the distance of passing through that is used to handle gas, and gas is handled in plasma fully by part gap between row.

In the embodiment shown in Figure 12,13, handle gas inlet port formation part 43 and on inlet port 43a, be provided with mobile rectification part 60 that three (a plurality of) make as the insulating resin of gas guiding piece.Inlet port 43a is on the whole length of gap 33s between row, i.e. part gap 33p between three rows, the form of the otch of extension.As shown in figure 14, each mobile rectification part 60 comprises substrate 61 and a plurality of single lip-deep mobile rectification cowling panel 62,63 that is arranged on substrate 61 integratedly.Substrate 61 is the forms of elongated thin plate that have corresponding to the length of part gap 33p between each row.Shown in Figure 12,13, substrate 61 is adjacent with the inner surface of the incision-like through hole 41s of framework upper plate 41, and three mobile rectification parts 60 with side by side relation in a row bilateral settle, and under such condition, be contained among the incision-like through hole 41a.Flow rectification part 60 with arrange between part gap 33p become man-to-man corresponding relation.Border between the adjacent mobile rectification part 60 is corresponding with connected space 33r.

Shown in Figure 13,14, the cowling panel 62,63 that flows is settled with spacing on the longitudinal direction of substrate 61.Incision-like through hole 41a is separated by these mobile cowling panels 62,63.As shown in figure 12, the inner surface on the opposite side of the substrate 61 among flow cowling panel 62,63 and the incision-like through hole 41a is adjacent, and the rectification part 60s that flows thus is fixed firmly to the inside of through hole 41a.As shown in figure 13, settle the mobile cowling panel 62 of close connected space 33r downward-sloping towards adjacent mobile rectification part 60.The mobile cowling panel 63 common vertical posture settings of all other with them.

Indicated as the reference number f0 among Figure 13, the major part processing gas that is incorporated into inlet port 43a directly flows downward.Handling gas is difficult to by 63 disturbances of cowling panel of flowing.On the other hand, as indicated among the reference number f1, handle gas stream and tilt near the place of settling the cowling panel 62 that flows.The stream f1 of this inclination flows by part (near the part of the second place) and the more close connected space 33r near part gap 33p between adjacent first row, and makes thus that part gap 33p carries out plasma simultaneously between the second adjacent row.Because this arranges that plasma also can be ejected into the downside of connected space 33r, the surface treatment of plasma can be carried out on the region R 2 of the connected space of corresponding glass substrate W, and can improve the uniformity of processing.

The rectification part 60 that flows can only be arranged on the top part near connected space 33r.For mobile cowling panel 62,63, can eliminate and flow cowling panel 63 and only utilize the cowling panel 62 that flows.

In the embodiment shown in Figure 12,13, although 60 of the rectification parts that flow are arranged among the through hole 41a of upper plate 41 of framework 40, it also can be arranged on the gap 48a of retainer 48.

In the embodiment shown in Figure 15,16, the stop member (stop portions) 70 that insulating resin forms is coupled to handles the inlet port 43a that the gas inlet port forms part 43.Stop member 70 is placed in corresponding on the part of the connected space 33r among the inlet port 43a (border between arrange in part gap and second between first row between the part gap), and its mode is to stride across part gap 33p between two adjacent rows.End sections on the inlet port 43a side of connected space 33r stops with this stop member 70.Connected space 33r on the injection tip opens by stop member 70, and is connected with inlet port 43a by part gap 33p between two rows that are adjacent.

Indicated as the reference number f1 among Figure 15, by near first row between part gap 33p connected space 33r (like this, near part gap 33p between second row) the processing gas plasmaization of a part, flow into connected space 33r with circulation to the mode of the downside of stop member 70 then.Because this arranges that plasma also is ejected into the downside of connected space 33r, plasma surface treatment can be reliably carried out on the region R 2 of the connected space of corresponding glass substrate W, and improves the uniformity of handling.

In the embodiment shown in Figure 17-19, the separator of revising Fig. 2 is to be provided as " gas guiding piece ", shown in Figure 17 and 19, be inserted in the border between the adjacent electrod assembly of the bilateral of electrode structure 30X by the separator 80 of the formed door of insulating resin shape.That is, the separator 80 of door shape each all be clamped between left electrodes parts 31A, 32A and middle body electrod assembly 31B, the 32B respectively and between middle body electrod assembly 31B, 32B and right electrodes parts 31C, the 32C.

As shown in figure 18, separator 80 comprises pair of leg part 81 and is used for dividing 81 coupling part 82 connected to one another, upper part and the flat platy structure with shape with these shanks.The outline of door shape separator 80 is consistent with the profile of the side part of entire electrode unit 30X.As shown in Figure 19, pair of leg part 81 clamping between adjacent first electrod assembly of first electrode row 31X, and other shank divides 81 clampings between adjacent second electrod assembly of second electrode row 32X.These shanks divide 81 as " insertion portions between the adjacent electrode parts ".

The shank of separator 80 divides 81 posterior face near electrod assembly (near the electrode row side separately from other) to settle, and obtains the row's internal clearance 33q as the space thus.It also is acceptable that shank divides 81 width to equal electrod assembly 31A-32C, arranges internal clearance 33q complete filling shank like this and divides 81.

Shown in Figure 17,18, the upside that settle near row internal clearance 33q and connected space 33r coupling part 82, that is, and near inlet port 43a side.End sections on the inlet port 43a of the side of connected space 33r stops with this coupling part 82.Connected space 33r from the injection tip of coupling part 82 opens and is connected with inlet port 43a by part gap 33p between the row who is adjacent.Coupling part 82 is set to " be used to stop between first row between part gap and second row stop portions of the end sections on the leading-in end oral-lateral on the border between the part gap and open from it blow port side ".

Indicated as the reference number f1 among Figure 17, handle gas by part gap 33p and plasma therein, the 82 connected space 33r that flow on the downside then between the row on the both sides of coupling part 82 from the coupling part.Because this arranges, Surface Treatment with Plasma can be carried out on the region R 2 of the connected space of corresponding glass substrate W reliably, and improves the uniformity of handling.In addition, by allowing adjacent electrod assembly polarity difference each other in each electrode row 31X, 32X, row's internal clearance 33p can and handle also plasma therein of gas as the part of discharge space.Because this arranges, the uniformity of handling be carried out and be improved more to Surface Treatment with Plasma can reliably on the region R 2 of the connected space of corresponding glass substrate W.

In the embodiment shown in Figure 20,21, " gas guiding piece " is arranged on the downside (ejection end oral-lateral) from electrode unit 30X.That is, lower plate 49 is at the gas leader 49B that is provided with on the position corresponding to the sidepiece part (near the part of the second place) of part gap 33p between near each first row on its bilateral elongated cuts shape injection tip 49a as the gas guiding piece.Gas leader 49B and lower plate 49 are integrally formed.Gas leader 49B cross section has triangular arrangement, have towards the downward-sloping gas guiding surface 49c of adjacent side (towards the direction of the second place), and between the preceding and back of injection tip 49a is surperficial bridge joint.

As shown in Figure 21, for the processing gas of part gap 33p ionic mediumization between first row, near the gas stream f1 of adjacent outflow side part " pass through the gas guiding surface 49c of gas leader 49B in upward introducing of adjacent direction (towards the direction of the second place).Because this arranges, can on the region R 2 of the connected space of corresponding glass substrate W, can carry out Surface Treatment with Plasma and the uniformity that can improve processing reliably.

In the embodiment as shown in Figure 22,23, the perforated plate 90 with a large amount of hole 90a is coupled among the incision-like injection tip 49a as the lower plate 49 of gas guiding piece.Settle the lower portion of downward a little perforated plate 90 and close injection tip 49a from electrode unit 30X.

Processing gas from part gap 33s between row disperses also homogenizing therein from the perforated plate 90 of injection tip 49a among the 49g of upside space.Correspondingly, shown in the reference number f1 among Figure 23, the processing gas of part part gap 33p ionic mediumization between each row also is distributed to the downside of connected space 33r.Then, gas ejects described a large amount of hole 90a equably.Because this arranges, can improve the uniformity of processing.

In the embodiment as shown in Figure 24,25 and 26, the injection tip that is used as discharging processor 30 forms lower plate 49 partly and constitutes by two upper and lower plates part 49U, 49L.Form with row on the plate portion 49U that tops bar corresponding to the injection tip 49d that tops bar of three incision-like of part gap 33p between each row.The left side injection tip 49d that tops bar of injection tip 49d and central authorities that tops bar cuts off by bridge portion 49E.Similarly, injection tip 49d and the right side injection tip 49d that tops bar that tops bar of central authorities cuts off by other bridge portion 49E.

The injection tip 49d that respectively tops bar is directly connected to part gap 33p between upside row.Top bar the width of injection tip 49d greater than the width of part gap 33p between row.

Having the injection tip 49f that gets out of a predicament or an embarrassing situation that length is substantially equal to the whole length of gap 33s between row is formed among the plate portion 49L that gets out of a predicament or an embarrassing situation.Get out of a predicament or an embarrassing situation the width of injection tip 49f less than the width of part gap 33p between the width of the injection tip 49d that tops bar and the row of being substantially equal to.

Bridge portion 49E is positioned to and is adjacent under the connected space 33r.The lower end of connected space 33r stops by this bridge portion 49E.Because this layout, bridge portion 49E constitutes " be used to stop between first row between part gap and second row stop portions of the end sections on the leading-in end oral-lateral on the border between the part gap ".The injection tip 49f that gets out of a predicament or an embarrassing situation is placed under the bridge portion 49E.That is, bridge portion 49E settles near upside in the whole injection tip that comprises up/down steps injection tip 49d, 49f.Connected space 33r only is connected by part gap between the row who is adjacent with injection tip 49d, 49f.

Plate portion 49U, 49L can be integrally formed each other, and injection tip forms part and can constitute by three of laminations or a plurality of plate portion rather than two.

Indicated as the reference number f1 among Figure 26, the processing gas that prevention flows downward within connected space 33r directly flow to injection tip from connected space 33r by bridge portion 49E, and must flow through part gap and plasma therein between the row who is adjacent, the gas of plasma flow among the injection tip 49d then.Plasma gas is the get out of a predicament or an embarrassing situation injection tip 49f and it down spray of circulation to the downside of the 49E of bridge portion then.Because this arranges that the uniformity of handling can be carried out and improve to Surface Treatment with Plasma reliably on the region R 2 of corresponding connected space.

Figure 27,28 has shown the embodiment more of formed injection tip 49a in the lower plate 49 that is formed on plasma treatment appts.Between the upwardly extending row in bilateral side, extend before and after injection tip and two with two of part therebetween injection tip 49i in the localities and in the short row of the mode that injection tip 49h intersects between row and be formed in the lower plate 49.Injection tip 49h is at the end sections of gap 33s between the row of being connected on its whole length between row.One of injection tip 49i just in time are placed on the border between left electrodes parts 31A, 32A and contre electrode parts 31B, the 32B and are connected to row's internal clearance 33q between these electrod assemblies and the end portion of connected space 33r in two rows.Injection tip 49i just is placed on the border between contre electrode parts 31B, 32B and right electrodes parts 31C, the 32C and the row of being connected to internal clearance 33q between the end portion of these electrod assemblies and connected space 33r in the row in addition.Because this arranges, the A/F of the injection tip of lower plate 49 is bigger and reduced flow resistance on the part of part gap 33p between each row of correspondence at the part upper wall on the border between the 33p of part gap between the adjacent row of correspondence.

In the processing gas blowing of row internal clearance 33q ionic mediumization goes out to be connected to row under the next-door neighbour row internal clearance 33q outside the injection tip 49i.Leave the partly processing gas blowing of (near the part of the second place) of sidepiece near part gap 33p between each first row, injection tip 49i flows in the row with less flow resistance simultaneously.Because this arranges, uniformity that can improved treatment.Injection tip 49i in the row of corresponding injection tip 49a (the injection tip part of the big opening on the border between corresponding first and second rows between the part gap) constitutes " gas guiding piece ".

Injection tip 49i is effective in following layout in the row, wherein whole row's internal clearance 33q fills with isolation spacer, handling gas like this can only pass through in the structure of gap 33s between row, perhaps therein be arranged on row's internal clearance 33q therebetween and electrod assembly adjacent one another are has identical polarity, like this as not discharging among the row's internal clearance 33q among the embodiment that will be explained below (Figure 40,41, and other place).That is, the processing gas of part gap 33p ionic mediumization attempts to flow into injection tip 49i and less flow resistance in the row with big opening between each row, can obtain to handle the uniformity of gas thus.

The length of injection tip 49i can suitably increase or reduce in the row, and does not need consistent with the length of row's internal clearance 33q.

In addition, as shown in Figure 29, injection tip 49i can be only between the row of being arranged on the side of injection tip 49h (for example, second electrode row 32X side) in the row.

Row in injection tip 49i can with the combinations such as gas leader 49B of Figure 20.

Eliminate lower plate or injection tip formation parts 49 and also can receive, the lower ending opening of gap 33s itself constitutes injection tip between row internal clearance 33q and row, handles gas and directly passes through its injection.

Be not limited to incision-like structure corresponding to the structure of the injection tip part of the big opening on the border between the 33p of part gap between first and second rows as injection tip 49i in the row.For example, as the opening 49j as shown in Figure 30 (a), it can be diamond shaped structure or the opening 49k of conduct as shown in Figure 30 (b), and it can be the triangular structure of the side projection of injection tip 49h towards between row.It also can have other different structure, such as circular configuration.

Figure 31,32 has shown that gas guiding piece or inlet port form the embodiment of the modification of part 43.The processing gas inlet port 43a that is connected to chamber 24 in the lower end of unshowned processing gas introducing part 20 is formed on inlet port and forms in the part 43.Handle that gas inlet port 43a is included in inlet port (main inlet port) between the row that length is extended on the bilateral direction and inlet port (auxiliary inlet port) 43i in the row of formed cutting profile on the both sides in two places on the mid portion of inlet port 43h between this row.

The end portion of inlet port 43h is at gap 33s between the row of being directly connected on its whole length between row.

In the row inlet port 43i each all be placed between adjacent electrod assembly 31A, the 31B the border and on the border between adjacent electrod assembly 31B, the 31C of first electrode row 31X, and on the border between adjacent electrod assembly 32A, the 32B and on the border between adjacent electrode parts 32B, the 32C of second electrode row 32X, and they are directly connected to the upper part of the row's internal clearance 33q between these electrod assemblies.

Handle that gas introduces that the processing gas of homogenizing in the part 20 is incorporated between each row part gap 33q from inlet port 33q between row and in arrange inlet port 43i be introduced directly into and arrange internal clearance 33q.Because this layout, the processing gas of the row of being introduced directly into internal clearance 33q can not towards the border deflection between the 33p of part gap between the part gap 33p between first row and second row between each first row among the 33p of part gap by the situation of the processing gas of plasma under plasma, and can obtain amount of plasma reliably on the border between the 33p of part gap between first and second rows.As a result, improved the uniformity of handling.

The length of inlet port 43i can suitably increase or reduce in the row, and does not need consistent with the length of row's internal clearance 33q.In addition, inlet port 43i can be only between the row of being arranged on the side of the front and back side of inlet port 43h in the row.

In the present embodiment, electrod assembly 31A, the 32A of two electrode rows 31X, 32X; 31B and 32B; And 31C and 32C do not need correctly on fore-and-aft direction toward each other, but they need be on essentially identical position toward each other.For example, in embodiment as shown in Figure 33, the electrod assembly 32A-32C of the electrode part 31A-31C of first electrode row 31X and second electrode row 32X departs from a little and is placed on the two-way direction.

The offset arrangement structure of Figure 33 can be applied to the electrode structure that alter polarity is arranged that has with Fig. 2 and other place, and it can be applied to the electrode structure that each each row of having shown in Figure 40,41 has identical polarity, and other place, this will be explained below.According to the test that the inventor carried out, the whole zone of workpiece W can be handled on Width, even two rows depart from each other a little, not only under the situation of the structure of each each row's identical polar but also under the situation of alter polarity structure.

In described embodiment before this, gap 33s quadrature between row's internal clearance 33q and row but the former can relative latter's inclination shown in Figure 34 and 35.For two electrod assemblies about first electrode row 31X all, row's internal clearance 33q on the formation surface (second surface) of left electrodes parts 31A gap 33s between with respect to row is forming surface (first surface) with for example obtuse angle settings of 150 degree.On the other hand, gap 33q forms surface (the 4th surface) and forms surface (the 3rd surface) with for example acute angle setting of 30 degree with respect to gap 33s between row between the row of right electrodes parts 31B.Because this layout, row's internal clearance 33q of first electrode row 31X is downward-sloping to the right away from gap 33s between row with the acute angle of for example 30 degree with respect to gap 33s between row.

Similarly, for two electrod assemblies about second electrode row 32X, row's internal clearance 33q of left electrodes parts 32A forms surface (the 4th surface) and form to form surface (the 3rd surface) with the acute angle settings such as 30 degree with respect to gap 33s between row, and row's internal clearance 33q of right electrodes parts 32B form surface (second surface) with respect to the formation surface (first surface) of gap 33s between row with obtuse angle settings such as 150 degree.Owing to this arranges, row's internal clearance 33q of second electrode row 32X is downward-sloping left to spend angles such as 30 away from gap 33s between row with respect to gap 33s between row.

About 60 degree are preferably spent from about 30 in the angle of inclination of row's internal clearance 33q.Between row the thickness of gap 33p and row internal clearance 33q each all be preferably about 1mm to about 3mm.Each approximately is 1m for the length of electrod assembly 31A, 31B, 32A, 32B, forms effective processing width of about 2m on entire electrode by settling two electrod assemblies in a longitudinal direction.

Shown in the Figure 36 (a) on the basis of amplifying, in first electrode row 31X, turning, the obtuse angle 31d that row's internal clearance of formation surface (first surface) and left electrodes parts 31A forms between the surface (second surface) between the row of being formed on is the lead angle with relatively large radius of curvature R.The acute corners 31e that formation surface (the 3rd surface) and row's internal clearance form between the surface (the 4th surface) between the row of being formed on is the lead angle with less relatively radius of curvature R.Although it is not shown, in second electrode row 32X, forming the acute corners 32e that row's internal clearance of surface (second surface) and left electrodes parts 32A forms between the surface (the 4th surface) between the row of being formed on is the R lead angle with less relatively radius of curvature, is the lead angle with relatively large radius of curvature R and form turning, the obtuse angle 32d that row's internal clearance of surperficial (first surface) and right electrodes parts 32B forms between the surface (the 3rd surface) between the row of being formed on.For example, the radius of curvature of turning, obtuse angle 31d, 32d is approximately 40mm, and the radius of curvature of acute corners 31e, 32e is approximately 3mm.

Portion only acute angle or obtuse angle and each all electrod assembly 31A, 31B, the corner part of 32A, 32B is the R lead angle.

Difference when radius of curvature is spent near 90 at the angle of inclination of row's internal clearance 33q preferably reduces.For example, shown in Figure 36 (b), when the angle between the 33s of gap between the row of being formed on internal clearance 33q and row is about 45 degree, if the radius of curvature of the turning 31e on the acute side is 3mm, the preferably about 40mm of the radius of curvature of the turning 31d on the obtuse angle side.As shown in Figure 36 (c), when the angle between the 33s of gap between the row of being formed on internal clearance 33q and row approximately is 60 when spending, if the radius of curvature of the turning 31e on the acute side is 3mm, then the radius of curvature of the turning 31d on the obtuse angle side preferably approximately is 8mm.

As shown in Figure 35,36 (a), gap 33s forms the surface and is positioned to and forms across gap 33s between the row of left electrodes parts 31A that gap 33s forms surface (the 3rd surface) between the row of right electrodes parts 31B of surface (first surface) and first electrode row 31X between the row of the electrod assembly 32A on the left side of second electrode row 32X.

Similarly, gap 33s forms the surface and is positioned to and forms across gap 33s between the row of right electrodes parts 32B that gap 33s forms surface (the 3rd surface) between the row of left electrodes parts 32A of surface (first surface) and second electrode row 32X between the row of the right electrodes parts 31B of first electrode row 31X.

Because above-mentioned layout, the intersection 33v between intersection 33u between row internal clearance 33q and first electrode row's row between the 33s of gap and row internal clearance 33q and second electrode row's row between the 33s of gap departs from the bilateral direction.In four corner part 33u, 33v limiting each intersection 33u, 33v, two obtuse angle corner part 31d, 32d are placed in the outside on the bilateral direction, be placed between obtuse angle corner part 31d, the 32d and remain two acute corners part 31e, 32e.

As shown in Figure 35, between the row that length is extended on the bilateral direction in the row on injection tip 49m and a pair of both sides that are arranged on the core of injection tip 49m between this row in the mode that cuts off injection tip 49n be formed in the lower plate 49.Between row between injection tip 49m and row the end portion of gap 33s align and be connected to its whole length.Injection tip 49n is tilted to the right and is directly connected to the end portion of the inclination row internal clearance 33q of first electrode row 31X in for example 30 degree angles of leaving from injection tip 49m between row in the row on first electrode row 31X side.The interior injection tip 49n of row on second electrode row 32X side is tilted to the left with about 30 degree angles of leaving from injection tip 49m between row and is directly connected to the inclination row internal clearance 33q that second electrode is arranged 32X.Can eliminate lower plate 49.

This embodiment according to Figure 34-36, since be formed on gap 33s between the row of electrod assembly 31A form surface and row's internal clearance 33q form the turning between the surface and be formed on gap 33s between the row of electrod assembly 32B form surface and row's internal clearance 33q form between the surface the turning each all be the obtuse angle, favourable glow discharge also is easy to take place on these corner parts 31d, 32d, and can prevent to handle leakage in the generation of the place of corresponding these corner parts 31d, 32d.

In addition, because obtuse angle corner part 31d, 32d are bigger R lead angles, they can form as much as possible reposefully, and are easy to take place favourable glow discharge.On the other hand, since with acute corners part 31e, the 32e of obtuse angle corner part 31d, 32d electrode of opposite parts 31B, 32B be a little R lead angle, they allow outstanding as much as possible, can reduce at intersection 33u, the 33v between the 33s of gap between row internal clearance 33q and row like this.Because this arranges, can obtain favourable glow discharge more reliably at the corner part on the obtuse angle side.As a result, can prevent from more reliably on the position of the corner part on the corresponding obtuse angle side, to take place to handle to leak.

In addition, can on the different corner part of electrod assembly, prevent arc discharge by the R lead angle.

Processing gas in part gap 33p ionic mediumization between row sprays by injection tip 49m between arranging, and directly sprays by injection tip 49n in arranging at the processing gas of row's internal clearance 33q ionic mediumization.By the parallel workpiece W that moves forward and backward relatively, the zone of the zone of part gap 33p but also corresponding row's internal clearance 33q can be carried out plasma reliably and handled between the row of not only corresponding workpiece W.Although on the acute side and the part between two intersection 33u, the 33v be difficult to take place glow discharge, the zone of corresponding these parts also can be by carrying out plasma treatment from the plasma jet of row's internal clearance 33q reliably.By this feature, can prevent from fully to handle to leak and take place, the whole zone of workpiece W can be handled equably.

The inventor uses Figure 34,35 device to carry out the uniformity Processing Test.

The Center Length of each electrod assembly 31A, 32B is 987mm, and the Center Length of each electrod assembly 32A, 32B is 1013mm, and each electrode row's whole length is 2m, and each thickness of these electrod assemblies is 1mm.The angle of inclination that tilts to arrange internal clearance 33q is 30 degree, and the angle of acute angle portion 31e, the 32e of electrod assembly is 150 degree.The radius of curvature R of turning acute angle portion 31e, 32e is 3mm, and the radius of curvature R of obtuse angle corner part 31d, 32d is 40mm.Solid dielectric layer 34 is to have the aluminium oxide thermojet film that thickness is 0.5mm.

The supply unit of 12A, 7.5kW is used as power supply 3A, 3B, and has the pulse voltage of 15kHz frequency, and the peak-to-peak value voltage Vpp that applies 15kV.ITO substrate as liquid crystal panel is used as workpiece W.Water is 95 degree to the contact angle of unprocessed substrate.Use nitrogen to be used as being used to wash the processing gas of substrate and washing substrate W on 800slm.The speed that is used to transmit substrate is 2m/min.Gross power is 4.5kW.

After washing, with respect to near the corresponding 10cm of intersection 33u, 33v on the surface area of substrate, with the contact angle of the distance measurement water of 3mm.As a result, on all measurement points, contact angle is 25 degree or littler.When water is applied to the whole surface of substrate, make the surface wetting equably.Confirm like this to handle not leak to take place.

In the embodiment shown in Figure 37,38, first electrode row 31X comprises with linear four electrod assembly 31A, 31B, 31C, the 31D that settles of side by side relationship bilateral, and three row's internal clearance 33q that tilt are formed between the first adjacent electrod assembly.These three per two adjacent segments that tilt to arrange in the internal clearance relatively tilt mutually.That is, center two electrod assembly 31B, the 31C of each first electrode row 31X have bilateral symmetry trapezium structure.Long side of each adjacent electrode parts 31B, 31C and short side with trapezium structure are oppositely settled mutually.Because this layout, in first electrode row 31X, left side row's internal clearance 33q is tilted to the right away from the intersection between the gap 33 between left side row internal clearance 33q and row, central row internal clearance 33q is tilted to the left away from the intersection between the 33s of gap between row internal clearance 33q and row, and right side row's internal clearance 33q is tilted to the right away from the intersection between the 33s of gap between right side row internal clearance 33q and row.

Similarly, second electrode row 32X comprises four electrod assembly 32A, 32B, 32C, the 32D that settles with the side by side relationship bilateral downwards.These are formed on three per two mutual relative tilts of adjacent segment that tilt to arrange among the internal clearance 33q in second electrod assembly.Each has two electrod assembly 32B, the 32C at center bilateral symmetry trapezium structure and their long side and short side is oppositely settled mutually.

Each has hexahedron structure rather than trapezium structure is an acceptable central electrode parts 31B, 31C, 32B, 32C, and the incline directions of three row's internal clearance 33q overlap each other.

As shown in figure 38, have the structure of incision-like and on the bilateral direction, extend and with row between injection tip 49m and be arranged to and tilt to arrange internal clearance 33q and become row's internal clearance 33q of one-one relationship to be formed in the lower plate 49 between the row that overlaps of gap 33s.Lower plate 49 is chosen wantonly.

The inventor uses Figure 37,38 device to carry out the uniformity Processing Test.

The Center Length of each electrod assembly 31A, 32A is 513mm, the Center Length of each electrod assembly 31B, 32B is 526mm, the Center Length of each electrod assembly 31C, 32C is 487mm, the Center Length of each electrod assembly 31D, 32D is 474mm, electrode row's whole length is 2m, and the thickness of each of these electrod assemblies is 30mm.The thickness of gap 33s and row's internal clearance 33q is respectively 1mm between row.The angle of inclination that tilts to arrange internal clearance 33q is 30 degree, and the acute angle of each electrod assembly is 30 degree, and the obtuse angle of each is 150 degree.The angle of inclination of each row's internal clearance 33q that tilts is 30 degree, and the acute angle of each electrod assembly is 30 degree, and each obtuse angle is 150 degree.The radius of curvature R of acute corners part is 3mm, and the radius of curvature of obtuse angle corner part is 40mm.Solid dielectric layer 34 is the aluminium oxide thermojet films with thickness 0.5mm.

The kind of workpiece, handle gas kind etc. with use above-mentioned test identical as Figure 34,33 device.Gross power is 8.9kW.

After washing, contact angle is 16 degree or littler on all measurement points.Determined so not take place to handle to leak.

In embodiment as shown in figure 39, electrod assembly 31A, 32B, 31C that the formation electric field applies electrode are connected to shared (single) power supply 3, rather than as independent power supply 3A, 3B, 3C in the above embodiments.Correspondingly, be formed on that the plasma electric field among the 33p of part gap can be synchronous reliably each other between each row.Certainly, the gas guiding piece also is applied to this single power supply architecture.

In embodiment as shown in Figure 40, the polarity arrangement of electrode unit 30X makes each electrode row 31X, 32X have identical polarity rather than as the arranged alternate in the above embodiments.

That is, electrod assembly 31A, 31B, the 31C of first electrode row 31X are connected respectively to power supply 3A, 3B, 3C and they all have electric field and apply polarity like this.On the other hand, electrod assembly 32A, 32B, the 32C of all second electrode row 32X have grounding electrode.In this polarity arrangement, glow discharge also takes place among the 33p of part gap between row, and handles also plasma therein of gas.

Row's internal clearance 33q complete filling has the partition wall 35 such as pottery of insulation and anti-plasma material, and the electrod assembly that bilateral is adjacent is insulated from each other.Because this arranges, can prevent between the adjacent electrode of bilateral electric arc to take place.

If each partition wall 35 is arranged on and has electric field and apply between the parts of the adjacent electrode at least 31A-31C of electrode, partition wall 35 does not need to be arranged between the adjacent electrode 32A-32C with grounding electrode.Can connect grounding electrode 32A-32C.

The part of the close second place of part gap 33p is provided with the gas guide member 51 as shown in Fig. 4,5 between each first row, as " gas guiding piece ".Alternatively, can utilize " gas guiding piece " as other type as shown in other accompanying drawing.

In embodiment as shown in Figure 41, each row has among the electrode unit 30X of identical as shown in Figure 40 polarity therein, has the electrod assembly 32A-31C that electric field applies electrode and is connected to shared (single) power supply 3.

Although embodiment as shown in Figure 41 respectively arranges the internal clearance 33q insulation partition wall 35 that complete filling is identical as shown in figure 40, also can eliminate partition wall 35 with the row of opening internal clearance 33q, because it is synchronous reliably each other that voltage is applied to electrod assembly 31A-31C.Not only adjacent grounding electrode parts 32A-32C but also adjacent power electrode parts 31A-31C all directly contact be acceptable, the row's of formation internal clearance 33q not like this.

As shown in Figure 42, in having the electrode unit 30X that arranges as the alter polarity among first embodiment (Fig. 2), the bilateral adjacent electrode parts of each electrode row 31X, 32X are adjacent one another are also to be acceptable, like this row of elimination internal clearance 33q.Particularly, each electrod assembly has each and is coated on solid dielectric layer 34e on its side end surface, and the solid dielectric layer 34e on the side end surface of adjacent electrod assembly, 34e is adjacent one another are and closely adhering to each other.These solid dielectric layers 34e, 34e on the side end surface has the effect that is used as insulating barrier between these adjacent electrod assemblies.The width of connected space 33r between adjacent row between the 33p of part gap equals the gross thickness of two solid dielectric layer 34e, 34e.

One of two adjacent mutually electrod assemblies only are provided with solid dielectric layer 34e on an one side end surface, and expose the side end surface of its metal master of other dielectric members.Under such situation, the solid dielectric layer 34e that is coated on the side end surface of an aforesaid independent electrod assembly can be with two electrod assemblies insulation.

In the embodiment as Figure 42, it also is acceptable that the gas guiding piece such as gas guide member 51 is provided.Because this layout,, promptly be close under solid dielectric layer 34e, the 34e, and can improve the uniformity of processing even also can jet plasma in connected space 33r.

In embodiment, can be inserted between the adjacent electrod assembly as the partition wall among Figure 40 35 as Figure 42.

In the embodiment of Figure 42, for electrod assembly 31A, 32B, 31C provide each power supply 3A, 3B, 3C, respectively as in first embodiment, but single power supply 3 rather than single power supply 31A, 32B, 31C can be used among the embodiment as Figure 39.

As shown in Figure 43, in having the electrode unit 30X that arranges as the every row's identical polar among the embodiment of Figure 40, the adjacent electrode parts of each electrode row 31X, 32X can be adjacent one another are.The side end surface of each electrod assembly of this embodiment is not distinguished the applying solid dielectric layer, but has exposed metal master.Because this arranges that the side end surface of the metal master of bilateral adjacent electrode parts directly adjacent to each other.Connected space 33r does not almost have size, and part gap 33p directly is connected to each other usually between adjacent row.Three power supply 3A, 3B, 3C advantageously are mutually symmetrical.Do not have each other under the situation of symmetry at them, the electric field of electrode row 31X applies electrod assembly 31A-31C each is provided with solid dielectric layer 34e as the insulating barrier among the embodiment of Figure 42 on side end surface at least.Except independent power supply 31A, 32B, 31C, single power supply 3 can be used among the embodiment as Figure 41.In embodiment, can use gas guiding piece such as the gas guide member as Figure 43.

Figure 44 has shown the example according to the basic structure of the common plasma treatment appts of second feature.This device comprises that a pair of electric field applies electrode 100 and grounding electrode 200, two (a plurality of) supply units 301,302, and the synchronizer 400 that is used for these supply units 301,302.

Electric field applies electrode 100 and is divided into two (a plurality of) electrod assemblies 111,112.Each has electrod assembly 111,112 separately flat platy structure and settles with the linear bilateral of side by side relationship.Similarly, grounding electrode 200 is divided into two (a plurality of) flat tabular spaced electrode parts 212,212, and these electrod assemblies that separate 211,212 are settled with the linear bilateral of side by side relationship.

Left side spaced electrode parts 111,211 toward each other.Right side spaced electrode parts 112,212 toward each other.

Comprise that the electric field of spaced electrode parts 111,112 applies first electrode row of electrode 100 corresponding the foregoing descriptions, comprises second electrode row of grounding electrode 200 corresponding the foregoing descriptions of spaced electrode parts 211,212 simultaneously.

The left side that electric field applies electrode 100 separates electric field parts 111 corresponding to such as " the first spaced electrode parts " that limited in the claims, and right side spaced electrode parts 112 are corresponding to " the second spaced electrode parts ".Electric field applies electrode 100 can be divided into three or a plurality of electrod assembly, rather than two.Under such situation, one of selected these three spaced electrode parts as the first spaced electrode parts and remaining two another one respectively as the second spaced electrode parts.

Gap 33s is formed on two types electrode 100,200, promptly between first and second electrodes row.Processing gas from unshowned processing gas source is introduced among this gap 33s and the electric field plasma therein by applying from supply unit 301,302.The processing gas blowing of plasma is to workpiece, to realize required Surface Treatment with Plasma under usually normal pressure like this.Gap 33s is with dealing with gas path and plasma space.

Although not shown, electric field apply electrode 100 and grounding electrode 200 at least one of apparent surface be provided with the solid dielectric layer that pottery constituted that comprises such as aluminium oxide.

Two ground connection spaced electrode parts 211,212 are respectively by ground wire 3e ground connection.

The left side first spaced electrode parts 111 are connected to first supply unit 301.The right side second spaced electrode parts 112 are connected to the second source device 302 different with first supply unit 301.Each all exports high frequency AD voltage supply unit 301,302, such as state or the sinusoidal wave state with pulse.

Apply under the situation that electrode 100 is divided into three or a plurality of electrod assemblies at electric field, the number that utilizes supply unit is identical with the number of the electrod assembly that separates to be favourable, and they are connected to each other with man-to-man relation.Under such situation, the supply unit that is connected to the first spaced electrode parts of these three spaced electrode parts is used as " first electrode assembly ", and the power supply that is connected to the second spaced electrode parts is as " second source device ".

The first and second spaced electrode parts 111,112 need not settled with side by side relationship in identical row, but they can be placed in respectively among the different rows.

Electric field applies electrode 100 and is divided into a plurality of spaced electrode parts and grounding electrode 200 not separately and to be left individual unit be acceptable.Electric field applies electrode 100 not separately and keep and be connected to this individual unit electric field as individual unit and a plurality of supply unit to apply electrode 100 also be acceptable.

Electrode structure is not limited to parallel flat platy structure, but it can be the Crossed Circle structure.Also can be such structure: one has circular cylinder shape (roller shape structure and another one have the cylindrical depression surface).

Two supply units 301,302 are connected to synchronizer 400.The output phase of synchronizer 400 synchronization power supply devices 301,302.

According to said structure, because the electrod assembly 111,112 that separates is connected respectively to supply unit 301,302, the power supply that can fully increase the per unit area of electrode 100,200 is supplied with, even supply unit 301,302 capacity are not very big.Correspondingly, can improve handling property.

In addition, two supply units 301,302 can prevent phase deviation by synchronizer 400.Correspondingly, can prevent between spaced electrode parts 111,112, to form phase difference, and can prevent from like this between these electrod assemblies 111,112, to produce arc discharge.Because this arranges that the interval between the spaced electrode parts 111,112 can reduce, perhaps parts 111,112 can be adjacent one another are equably.Like this, can prevent from the part in the space between the corresponding spaced electrode parts 111,112, to take place to handle scrambling.As a result, can carry out favourable surface treatment.

In addition, by as among first embodiment electrode 100,200 being divided into a plurality of parts, each electrod assembly length can reduce and can reduce because bending, the static load that the Coulomb force caused.

Figure 45 has shown the specific example of the structure of Figure 44.First supply unit 301 comprises a DC rectifier 311 that is connected to commercial AC power supply A, first transformer 331 that is connected to first inverter 321 of this DC rectifier 311 and is connected to first inverter 321.

DC rectifier 311 comprises that such as diode bridge and smoothing circuit and the commercial AD voltage commutation that is suitable for source power supply A be DC.

First inverter 321 comprises the bridgt circuit of the first switching device 321a that is made of transistor, 321b, 321c, 321d, and switches after being rectified to the AC with predetermined waveform and conversion DC.

Second side of first transformer 331 is connected to the first spaced electrode parts 111.331 increases of first transformer supply to the first spaced electrode parts 111 from the output voltage of first inverter 321 and with it.

Second source device 302 has the structure identical with first supply unit 301.That is, second source device 302 comprises the 2nd DC rectifier 312 that is connected to commercial AC power supply A, second inverter 322 that is connected to this 2nd DC rectifier 321, and second transformer 322 that is connected to second inverter 322.

Second rectifier 312 comprises such as diode bridge and smoothing circuit, and the commercial AD voltage commutation that is suitable for source power supply A is DC.

Second inverter 322 comprises the bridgt circuit of the second switching device 322a that is made of transistor, 322b, 322c, 322d, and switches after being rectified to the AC with predetermined waveform and conversion DC.

Second side of second transformer 332 is connected to the second spaced electrode parts 112.Second transformer 332 increases the output voltage from second inverter 322, and it is supplied to the second spaced electrode parts 112.

Synchronizer 400 comprises the control device that is used for first and second inverters 321,322.That is, synchronizer (circuit control device) 40 comprises shared (single) signal output 410, is used for switching the switching device 321a-321d by two (a plurality of) inverters 321,322,322a-322d.Output 410 is provided with four terminal 410a, 410b, 410c, 410d.Signal line 420a extends from terminal 410a.Signal line 420a is branched off into two line 421a, 422a.Branch line 421a is connected to the grid of the switching device 321a of first supply unit 301 by a plurality of transformer 431a.Other branch line 422a is connected to the grid of the switching device 322a of second source device 302 by pulse converter 342a.

Similarly, the signal line 420b that draws from terminal 410b branches into two branch lines.Branch line 421b is connected to the grid of the switching device 321b of first power supply 301 by pulse converter 431b, and another one branch line 422b is connected to the grid of the switching device 322b of second source device 302 by pulse converter 432b.

The signal line 420c that draws from terminal 410c branches into two branch lines.One of branch line 421c is connected to the grid of the switching device 321c of first supply unit 301 by pulse converter 431c, and other branch line 422c is connected to the grid of the switching device 322c of second source device 302 by pulse converter 432c.

The signal line 420d that draws from terminal 410d branches into two branch lines.Branch line 421d is connected to the grid of the switching device 321d of first supply unit 301 by pulse converter 431d, and other branch line 422d is connected to the grid of the switching device 322d of second source device 302 by pulse converter 432d.

According to above-mentioned structure, signal can be assigned among the switching device 322a of the switching device 321a of inverter 321 of the first in parallel supply unit 301 and second source device 302.Because this layout, switching device 321a, 322a be opening/closing simultaneously.Similarly, switching device 321b, 322b be opening/closing simultaneously, and switching device 321d, 322d can the while opening/closings.

Because above-mentioned layout, the handover operation of the inverter 321,322 of two supply units 301,302 can be synchronous reliably, and the output of supply unit 301,302 mutually can be synchronous reliably.Correspondingly, the voltage with phase homophase can be applied to two divided electrod assemblies 111,112.Like this, can between spaced electrode parts 111,112, prevent the generation of electrical potential difference reliably, and prevent arc discharge reliably.Because this arranges, can stablize reliably and favourable Surface Treatment with Plasma.

The inventor uses device as shown in Figure 5 to carry out plasma treatment.Switching frequency is 30kHz, and the peak-to-peak value voltage between the electrode 10,20 is Vpp=15kV.

As a result, affirmation can not produce the undesired discharge such as arc discharge between adjacent spaced electrode parts 111,112.

Figure 46 has shown the other typical case structure of Figure 44.This device is different with the device of Figure 45 in the configuration aspects of synchronizer (circuit control device).That is, in synchronizer 400, in each supply unit 301,302, provide the signal output.Promptly, synchronizer 400 is provided with the first grid segment signal output 411 that is used for first supply unit 301 and is used for the second grid segment signal output 412 that second source is grabbed device 302, and these signal outputs 411,412 are supplied with part 450 Synchronization Control by shared synchronizing signal.

First grid segment signal output 411 is provided with four terminal 411a, 411b, 411c, 411d.Signal line 421a extends from terminal 411a.Signal line 421a is connected to the grid of the switching device 321a of first supply unit 301 by pulse converter 431a.Similarly, signal line 421b extends and is connected to by pulse converter 431b the grid of switching device 321c from terminal 411b.Signal line 421d extends and is connected to by pulse converter 431d the grid of switching device 321d from terminal 411.

Second grid output 412 is provided with four terminal 412a, 412b, 412c, 412d.Signal line 422a extends from terminal 412a.Signal line 422a is connected to the grid of the switching device 322a of second source device 302 by pulse converter 432a.Similarly, signal line 422b extends and is connected to by pulse converter 412b the grid of switching device shifter 322b from terminal 412b.Signal line 422c extends and is connected to by pulse converter 432c the grid of switching device 322c from terminal 412c.Signal line 422d extends and is connected to by pulse converter 432d the grid of switching device 322d from terminal 412d.

Synchronizing signal is supplied with part 450 shared synchronizing signal is supplied to two signal outputs 411,412.That is, synchronous signal line 460 is supplied with the lead-out terminal extension of part 450 from synchronizing signal.Synchronous signal line 460 branches into two lines 461,462.A branch line 461 is connected to first grid segment signal output 411, and other branch line 462 is connected to second grid segment signal output 412.

According to said structure, the synchronizing signal of supplying with part 450 from synchronizing signal is divided in two signal outputs 411,412 of parallel connection, and based on this synchronizing signal, signal output 411,412 is exported signal respectively.Because this structure, the handover operation of two supply units 301,302 can be synchronous reliably each other, and the output of supply unit 301,302 mutually can be synchronous reliably.Like this, the power supply with phase homophase can be applied to two electrod assemblies that separate 111,112, and can prevent arc discharge reliably, otherwise will this thing happens owing to the electrical potential difference that produced between spaced electrode parts 111,112 institute.Because this arranges, can stablize reliably and favourable Surface Treatment with Plasma.

Figure 47 has shown the improvement embodiment of Figure 46.This synchronizer that improves embodiment is provided with first control IC 413 that is used for first supply unit 301 and second control IC 414 that is used for second source device 302.First control IC 413 comprises the function of the first grid segment signal output 411 of corresponding synchronizing signal supply part 450 and Figure 46.That is, first control IC 413 has the oscillating circuit that is built in wherein and based on the oscillator signal of being exported in the oscillating circuit from then on, signal outputs to first inverter 321 from terminal 411a, 411b, 411c, 411d.In addition, the oscillating circuit of first control IC 413 is connected to second control IC 414 by oscillator signal line 463.Because this arranges that the oscillator signal of exporting from first control IC 413 also is input to second control IC 414.

Second control IC 414 comprise corresponding Figure 46 second grid segment signal output 412 function and will output to second inverter 322 from the signal of terminal 412a, 412b, 412c, 412d based on oscillator signal from first control IC 413.

Because above-mentioned layout, the handover operation of two inverters 321,322 can be synchronous reliably, and the output of supply unit 301,302 mutually can be synchronous reliably.

Figure 48 has shown the other improvement embodiment of Figure 46.

The one LC resonant circuit 315 constitutes by second coil of the first spaced electrode parts 111,211 and first transformer 331, and second coil of the 2nd LC resonant circuit 352 by the second spaced electrode parts 112,212 and second transformer 332 constitutes.For supply unit 301,302, be used for the high frequency electric source of the resonant type of these LC resonant circuits 351,352 of resonance.

Feedback signal line 459 extends from the outlet side (master of transformer 331) of the inverter 321 of first supply unit 301.This feedback signal line 459 is connected to the testing circuit 452 that is stored in the synchronizer 400.Testing circuit 452 is connected to the rectification circuit 453 that is stored in the synchronizing signal supply part 450.

Testing circuit 452 detects the output current (principal current of first transformer 331) of first inverter 321 and it is outputed to rectification circuit 453 by feedback signal line 459.Rectification circuit 453 is based on the input rectifying frequency of oscillation of coming self-detection circuit 452.That is, when the output of inverter 321 is lower than the resonance frequency of a LC resonant circuit 351 frequently, increased frequency of oscillation.On the other hand, when the output frequency of first inverter 321 is higher than the resonance frequency of a LC resonant circuit 351, reduced frequency of oscillation.Synchronizing signal is supplied with part 450 is distributed frequency of oscillation after being rectified to first grid segment signal output 411 in parallel and second grid segment signal output 412 synchronizing signal.Because this layout, two supply units 301,302 can be synchronously and in addition, the output frequency of the inverter 321,322 of supply unit 301,302 can be consistent with the resonance frequency of LC resonant circuit 351,352 reliably, and can obtain higher power output.

The static capacity of the size and first and second electrod assemblies that cause thus is preferably with identical as the embodiment of Figure 44-48, but they can be different.For example, in the device shown in Figure 49 (a), the first spaced electrode parts, 111,211 length dimensions are bigger, and like this, static capacity is bigger than the second spaced electrode parts 112,212.Under such situation, shown in Figure 49 (b), voltage pulse output is preferably longer than the rising/fall time from the voltage pulse output of first supply unit, 301 to first spaced electrode parts 111 from the rising of second source device 302 to second spaced electrode parts 112 and/or fall time.Alternatively, as shown in Figure 50, condenser 113 can be connected to the littler spaced electrode parts 112 of size.Because this arranges that the voltage waveform that is applied to large-sized spaced electrode parts 111 and undersized spaced electrode parts 112 can be consistent each other.

The invention is not restricted to the embodiments described, but can make amendment under the situation that does not deviate from spirit of the present invention.

For example, in electrode structure, part gap 33p can be by filling such as the partition wall that is formed on the insulating resin between the connected space 33r between the 33p of part gap between adjacent row and insulated from each other between adjacent row.

A plurality of steps of electrode unit 30X can be settled on fore-and-aft direction.

The width of part gap 33p between the width of the suitable row of foundation internal clearance 33q and row.The width of row internal clearance 33q can the row of being greater than or less than between the width of part gap 33p.

The major part of different embodiment can make up, form the gas guiding piece or the gas introducing apparatus of part 43 such as the gas inlet port among Fig. 9-16, the 31-32, and other parts, gas guiding piece among the discharge space 33s of Fig. 4-8, and other parts, and the gas guiding piece in the injection tip of Figure 20-30 formation part 49, and other parts.

Can eliminate and handle gas leader 20 and handle gas and can directly be directed to the discharge process part 30 from handling gas source.Be provided on this path preventing that the pressure-regulating valve of pressure change from also being acceptable.

The present invention even can be applied in the different Surface Treatment with Plasma such as cleaning, thin film deposition, etching, surface modified (hydrophilic treated, water repel handle etc.) and ashing, it also can be applied in the Surface Treatment with Plasma of not only using glow discharge but also corona discharge, surface discharge, arc discharge etc., with and also can be applied in the Surface Treatment with Plasma of under normal pressure and the pressure that reduces, carrying out.

Claims (34)

1. the electrode structure of a plasma treatment appts, the gas that is used for the processing gas of plasma discharge space and sprays described plasma with processed workpiece is contacted, described electrode structure forms described discharge space in described device, described electrode structure comprises:

First electrode row, a plurality of electrod assemblies are drawn together in the described first electrode package, and each electrod assembly has the length shorter than described workpiece, and settles with side by side relationship in one direction, and described first electrode row has the length corresponding to described workpiece as a whole;

Second electrode row, the described second electrode package is drawn together other a plurality of electrod assemblies and is lined up parallel relation with described first electrode, each other a plurality of electrod assembly has the length shorter than described workpiece, and being positioned to each other side by side relation, described second electrode row has the length corresponding to described workpiece as a whole;

Has opposite polarity at one of described electrod assembly of one of the described electrod assembly of settling described first electrode row who on essentially identical position, settles on the direction side by side and described second electrode row, and part gap between formation is arranged therebetween, the part gap is as the part of described discharge space between described row; And

Gap between row, the gap comprises part gap between described row between described first and second electrodes row between this row, the gap has the length corresponding to described workpiece between described row.

2. the electrode structure of plasma treatment appts according to claim 1, wherein, described polarity comprises that electric field applies electrode and grounding electrode, has only to constitute those described electrod assemblies that described electric field applies electrode and be connected respectively to different power supplys.

3. the electrode structure of plasma treatment appts according to claim 1, wherein, described polarity comprises that electric field applies electrode and grounding electrode, has only to constitute those described electrod assemblies that described electric field applies electrode and be connected to common source.

4. the electrode structure of a plasma treatment appts, the gas that is used for the processing gas of plasma discharge space and sprays institute's plasma with processed workpiece is contacted, described electrode structure forms described discharge space in described device, described electrode structure comprises:

First electrode row, a plurality of electrod assemblies of settling with side by side relationship are in one direction drawn together in the described first electrode package;

Second electrode row, other a plurality of electrod assemblies of settling with side by side relationship and parallel with described first electrode row are drawn together each other in the described second electrode package;

Has opposite polarity at one of described electrod assembly of one of the described electrod assembly of settling described first electrode row who on essentially identical position, settles on the direction side by side and described second electrode row, and part gap between formation is arranged therebetween, the part gap is as the part of described discharge space between described row; And

Gap between row, the gap comprises part gap between the described row who is formed between described first and second electrodes row between described row; And

Relative to each other polarity is opposite for two electrod assemblies in described each the described electrode row's who settles arrangement adjacent one another are on the direction side by side described electrod assembly.

5. the electrode structure of plasma treatment appts according to claim 4, wherein, row's internal clearance is formed in described first electrode row and/or described second electrode row between two electrod assemblies of the described described electrod assembly of settling arrangement adjacent one another are on the direction side by side, and described row's internal clearance also forms the part of described discharge space.

6. the electrode structure of plasma treatment appts according to claim 5, wherein, one of described two electrod assemblies comprise the first surface that forms gap between described row and with respect to the second surface of the angled setting of described first surface, and the another one in described two electrod assemblies comprises roughly concordant with described first surface and forms the 3rd surface in gap between described row, and staggered relatively and with described second surface with respect to the 4th surface of described the 3rd surperficial angled arrangement, described row's internal clearance is formed between described second surface and described the 4th surface.

7. the electrode structure of plasma treatment appts according to claim 6, wherein, described first surface and second surface form the obtuse angle, described the 3rd surface and described second surface formation acute angle, the gap becomes tilt relationship between described row's internal clearance and described row.

8. the electrode structure of plasma treatment appts according to claim 7, wherein, the turning that is formed on the side at the obtuse angle between described first surface and the second surface is the R lead angle with relatively large radius of curvature, and the turning on the side of formed acute angle between described the 3rd surface and the 4th surface is the R lead angle with less relatively radius of curvature simultaneously.

9. the electrode structure of plasma treatment appts according to claim 7, wherein, among the described electrode row on the opposite side of the described electrode row with described first surface, be placed in the end surface of the locational described electrod assembly arrangement identical substantially across described first surface and described the 3rd surface with described electrod assembly with described first surface.

10. the electrode structure of plasma treatment appts according to claim 7, wherein, the downstream of described row's internal clearance is opened, can not make described processing gas by gap between described row from its inject process gas.

11. the electrode structure of a plasma treatment appts, the gas that is used for the processing gas of plasma discharge space and sprays institute's plasma with processed workpiece is contacted, described electrode structure forms described discharge space in described device, described electrode structure comprises:

First electrode row, a plurality of electrod assemblies of settling with side by side relationship are in one direction drawn together in the described first electrode package;

Second electrode row, other a plurality of electrod assemblies of settling with side by side relationship and parallel with described first electrode row are drawn together each other in the described second electrode package;

Has opposite polarity at one of described electrod assembly of one of the described electrod assembly of settling described first electrode row who on essentially identical position, settles on the direction side by side and described second electrode row, and part gap between formation is arranged therebetween, the part gap is as the part of described discharge space between described row; And

Gap between row, the gap comprises part gap between the described row who is formed between described first and second electrodes row between described row; And

Relative to each other polarity is identical for two electrod assemblies in described each the described electrode row's who settles arrangement adjacent one another are on the direction side by side described electrod assembly.

12. the electrode structure of plasma treatment appts according to claim 11, wherein, described polarity comprises that electric field applies electrode and grounding electrode, and the insulation partition wall is arranged on and has between described two electrod assemblies settling side by side in the described electrod assembly that described electric field adjacent one another are on the direction applies electrode.

13. plasma treatment appts, be used for processing gas is incorporated into discharge space from inlet port, with described gas described discharge space ionic mediumization and will by the gas blowing of plasma by injection tip with processed workpiece is contacted, described device comprises:

Electrode structure, comprise first electrode row and second electrode row, described first electrode row is included in a plurality of electrod assemblies of settling with side by side relationship from described inlet port on the direction that the direction of described injection tip intersects, and other a plurality of electrod assemblies of settling with side by side relationship and parallel with described first electrode row are drawn together each other in the described second electrode package; And

Has opposite polarity at one of described electrod assembly of one of the described described electrod assembly of settling described first electrode row who on primary importance, settles on the direction side by side and described second electrode row, and form part gap between first row therebetween, the part gap is as the part of discharge space between described first row; And the another one electrod assembly in another one electrod assembly in described first electrode row's who settles on the second place adjacent with described primary importance the described electrod assembly and described second electrode row's the described electrod assembly has reciprocal polarity, and form part gap between second row therebetween, the part gap is as the other part of described discharge space between described second row;

Described device also comprises the gas guiding piece, described gas guiding piece will be handled gas stream and be directed to border between the described primary importance and the described second place by the part near the described second place in the part gap between described first row, perhaps in channeling conduct on the direction of the described second place.

14. plasma treatment appts according to claim 13, wherein, the part gap is being provided with the gas guide member near within the described part of the described second place between described first row, and described gas guide member has the gas guiding surface towards described second place inclination.

15. plasma treatment appts according to claim 14, wherein, described gas guide member is provided with the gas that tilts in the direction relative with described gas guiding surface and returns the surface on the described ejection end oral-lateral of described gas guiding surface.

16. plasma treatment appts according to claim 13 wherein, comprises that also the inlet port that is used to form described inlet port forms part;

Described gas guiding piece is arranged on described inlet port and forms on the part.

17. plasma treatment appts according to claim 16, wherein, the described inlet port that described inlet port forms part comprises the branch port that is directed near the described part of the described second place in part gap between described first row, described branch port forms described gas guiding piece thus towards second place setting.

18. plasma treatment appts according to claim 16, wherein, cowling panel towards described second place inclination, as described gas command device, between corresponding to close described first row, be contained in described inlet port on the position of the described part of the described second place in part gap and form in the described inlet port of part.

19. plasma treatment appts according to claim 13, wherein, described gas guiding piece comprises the stop portions that is used to be blocked in the end sections on the described leading-in end oral-lateral of settling on the border between the part gap between part gap and described second row between described first row, and opens described zone thus on the ejection end oral-lateral.

20. plasma treatment appts according to claim 19 wherein, comprises that also the inlet port that is used to form described inlet port forms part,

The described inlet port that described inlet port forms part has in the upwardly extending incision-like structure in described arrangements side side by side and part gap between the part interstitial row and between described second row between being provided with across described first row, is contained in the described inlet port on the position on described stop portions described border between the part gap between arrange in part gap and described second between arranging corresponding to described first.

21. plasma treatment appts according to claim 19, wherein, described electrode structure comprises the separator with a pair of insertion portion and the coupling part that is used to be connected described insertion portion, one of described insertion portion is clamped in the described electrod assembly on the described electrod assembly that is placed on the described primary importance and the described second place that is placed among described first electrode row, the another one of described insertion portion be clamped in be placed among described second electrode row between the described electrod assembly and the described electrod assembly on the described second place on the described primary importance, settle near the end sections on the described leading-in end oral-lateral on described border described coupling part, is set to stop portions thus.

22. plasma treatment appts according to claim 13 wherein, comprises that also the injection tip that is used to form described injection tip forms part,

The described injection tip formation part that is arranged on described gas guiding piece goes up and will be from introducing towards the described second place near the processing gas of the described part of the described second place in part gap between described first row.

23. plasma treatment appts according to claim 22, wherein, described gas guiding piece comprises the gas guiding surface, and described gas guiding surface tilts and is placed in and forms near described injection tip on the corresponding position of described part of the described second place in part gap between described first row in the described injection tip of part in second direction.

24. plasma treatment appts according to claim 22, wherein, described gas guiding piece is placed in and described injection tip forms between described first row in the described injection tip of part between part gap and described second row on the corresponding position, border between the part gap, its setting makes near described electrode structure side, and described gas guiding piece comprises the stop portions of the end sections on the described ejection end oral-lateral that is used to stop described border.

25. plasma treatment appts according to claim 22, wherein, described injection tip forms part and comprises perforated plate, from the processing gas in part gap between described first row disperseed and and then also towards described second place diffusion and eject, provide described perforated plate as described gas guiding piece thus.

26. plasma treatment appts according to claim 22, wherein, and between described first row between part gap and described second row corresponding described injection tip in described border between the part gap form part described injection tip a part opening greater than and described first row between the corresponding described injection tip in part gap form the opening of an other part of the described injection tip of part, and have bigger A/F described the former partly be set to described gas guiding piece.

27. plasma treatment appts, be used for processing gas is incorporated into discharge space from inlet port, with described gas described discharge space ionic mediumization and will by the gas blowing of plasma by injection tip with processed workpiece is contacted, described device comprises:

Electrode structure, comprise first electrode row and second electrode row, described first electrode row is included in a plurality of electrod assemblies of settling with relation side by side from described inlet port on the direction that the direction of described injection tip intersects, and other a plurality of electrod assemblies of settling with side by side relationship and parallel with described first electrode row are drawn together each other in the described second electrode package; And

Has opposite polarity at one of described electrod assembly of one of the described described electrod assembly of settling described first electrode row who on primary importance, settles on the direction side by side and described second electrode row, and form part gap between first row therebetween, the part gap is as the part of described discharge space between described first row; And the another one electrod assembly in another one electrod assembly in described first electrode row's who settles on the second place adjacent with described primary importance the electrod assembly and described second electrode row's the electrod assembly has reciprocal polarity, and form part gap between second row therebetween, the part gap is as the other part of described discharge space between described second row, the described electrod assembly that is placed in the described electrod assembly on the primary importance among described first electrode row and is placed on the second place among described first electrode row has reciprocal polarity, and the row's of formation internal clearance betwixt;

Described device comprises that also the inlet port that is used to form described inlet port forms part; And

The described inlet port that described inlet port forms part comprises inlet port between the row who is provided with across part gap between part gap between described first row and described second row and is directly connected to inlet port in the row of described row's internal clearance.

28. a plasma treatment appts comprises settling toward each other and forming the electric field of handling gas path betwixt applying electrode and grounding electrode; A plurality of supply units are used to apply the electric field that is used for the described processing gas of plasma between described electrode; And make the synchronous synchronizer of described supply unit.

29. plasma treatment appts according to claim 28, wherein, each all comprises the rectification of rectification path described a plurality of supply units, is used for the commercial ac voltage rectification is rectified into direct voltage; And inverter, being used for switching dc voltage be rectified into alternating voltage by the switching device rectification after, described synchronizer control is used for the described inverter of described supply unit, and described like this inverter is synchronized with each other in change action.

30. plasma treatment appts according to claim 29, wherein, described synchronizer comprises the common grid segment signal output of the described inverter that is used for described supply unit, is imported into the grid of described switching device of each described inverter in parallel from the signal of described signal output output.

31. plasma treatment appts according to claim 29, wherein, described synchronizer comprises: a plurality of signal outputs, and described signal output is set to the described inverter of each supply unit; And shared synchronizing signal is supplied with part, be used for described signal output, the synchronizing signal of supplying with part output from described synchronizing signal is imported into each described signal output in parallel, thereby in response to the input of described synchronizing signal, each described signal output all is input to signal in the described grid of described switching device of corresponding inverter.

32. a plasma treatment appts comprises:

Electric field applies electrode, comprises the first and second spaced electrode parts;

Grounding electrode is used for applying formation processing gas path between the electrode at described first and second electric fields;

First supply unit is used for applying the electric field that is used for the described processing gas of plasma between described first spaced electrode parts and described grounding electrode;

The second source device is used for applying the electric field of the described processing gas of plasma between described second spaced electrode parts and described grounding electrode; And

Synchronizer, described synchronizer make described first and second supply units synchronous.

33. plasma treatment appts according to claim 32, wherein, the electrostatic capacitance between described first spaced electrode and the described grounding electrode is greater than the electrostatic capacitance between described second spaced electrode and the described grounding electrode, and

Described second electrode assembly is longer than the rising/fall time that applies voltage of described first supply unit.

34. plasma treatment appts according to claim 32, wherein, the electrostatic capacitance between described first spaced electrode and the described grounding electrode is greater than the electrostatic capacitance between described second spaced electrode and the described grounding electrode, and

Described second spaced electrode parts and condenser are connected in parallel.

Images