CN1818758A - Liquid-crystal device and production thereof - Google Patents
Liquid-crystal device and production thereof Download PDFInfo
- Publication number
- CN1818758A CN1818758A CN 200510051612 CN200510051612A CN1818758A CN 1818758 A CN1818758 A CN 1818758A CN 200510051612 CN200510051612 CN 200510051612 CN 200510051612 A CN200510051612 A CN 200510051612A CN 1818758 A CN1818758 A CN 1818758A
- Authority
- CN
- China
- Prior art keywords
- substrate
- gap
- lcd device
- bulge
- colored filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Liquid Crystal (AREA)
- Optical Filters (AREA)
Abstract
A liquid crystal display device is prepared as forming color filter baseboard by transparent baseboard, black matrix, multiple color filters, multiple the first bulges and multiple the second bulges; setting black matrix on transparent baseboard and exposing partial transparent baseboard for defining out multiple the first openings multiple the second openings and multiple pixel regions as two openings in different size; setting color filter in pixel region; setting two said bulges on transparent baseboard with the first bulge corresponding to the first opening and the second one corresponding to the second opening as two said bulges in different height .
Description
Technical field
The present invention relates to a kind of structure and its method for making of display device, particularly relate to a kind of structure and its method for making of LCD device.
Background technology
Comprise a pair of substrate on the LCD device typical case, keep each other and separate and parallel relation.Space between this substrate is commonly referred to as gap of liquid crystal cell or cell gap (cell gap).One liquid crystal material is arranged in this cell gap between between this two substrates, can respond an electronic signal that adds and change its optical characteristics.
A plurality of electrodes place on the surface, inside of this substrate, in order to controlling this electronic signal, and it are acted on this liquid crystal material.The electrode spread that LCD device had of some pattern, can produce one group of predetermined literal or symbol, the LCD device of other pattern has electrode matrix simultaneously, it forms a display surface, comprise the pixel of access individually (pixel) element of a myriad of, each pixel element can optionally be started to form the image of unlimited variation.
Correct running in order to ensure LCD device it is highly important that, spread all over holding unit gap on this whole display surface evenly and precisely.Even, in the cell gap in addition atomic little error all can cause on the display surface outward appearance (the uneven blemishes of so-called panel colourity, Mura defective) of apparent and defective.When bestowing with a finger tip even during extremely slight pressure, this effect also can see in the existing liquid crystal display displays panel easily.For responding this pressure, will be reduced a little at the cell gap of involved area, cause the reduction of dim spot, contrast or other bad shortcoming in this show image.
In a prior art, as shown in Figure 1, this LCD device comprises a thin film transistor (TFT) (Thin Film Transistor; TFT) substrate 61, a colored filter (Color Filter; CF) substrate 71 and be clipped in this liquid crystal material 69 between the two.This cell gap mat is provided at 79 maintenances of a plurality of gap of 61,71 of this two substrates.This gap 79 is consistent height, such as by spilling the cloth technology, places this cell gap randomly usually.So can cause the uneven distribution of the sub-local density in gap usually.In order to ensure placing gap on this display surface All Ranges to have enough concentration,, must use superfluous gap to keep suitable cell gap.In addition, be used for the prior art of gap son configuration according to this type of, it places on " non-dynamically (inactive) " and " dynamically (active) " zone of this display panel.Should " dynamically " the regional zone that can optionally be started for this liquid crystal material, because they are between two relative electrodes, this electrode is disposed on this substrate.Be somebody's turn to do the zone that " non-dynamic " zone can't optionally be started for this liquid crystal material, because lack the comparative electrode on this substrate.
In essence, be that the structure of display panels and function just have several unwelcome shortcomings in the sub-technology in above-mentioned existing gap.Particularly drop on gap in this dynamic display area territory, can cause some shortcoming, descend, or bad light radiates near the sub-edge, this gap such as contrast.
Therefore, European patent the 1st, 030,211 A2 numbers, it is incorporated this case into and thinks reference, has disclosed a LCD, and as shown in Figure 2, it can omit the step of disseminating gap, and thereby avoids difference on the element thickness that uneven distribution produced of gap.This type of LCD device comprises thin film transistor (TFT) (Thin Film Transistor haply; TFT) substrate 30, a colored filter (Color Filter; CF) substrate 40 and is sealed in this liquid crystal material layer 49 between the two.As shown in Figure 2, form on this CF substrate 40 should outstanding pattern, that is gap 45 has the height of about 4.0 μ m, in order to the cell gap that is consistent.
Generally speaking, the cell gap of LCD is the mean distance between the alignment films of this two substrates, and be typically about two substrates to group after the height of this gap.
Yet this gap 45 in this two LCD of prior art and aforementioned European patent all places on the glass substrate 41, and this color filter layers 43 is disposed at this gap son 45 and this glass substrate 41 between the two.
With reference now to Fig. 3,, its column gap that is described in next 20 Φ μ m of room temperature directly places on the glass substrate, and the sub stress-strain diagram that has a color filter layers between the two with glass substrate in this column gap.Please understand, directly place this gap on this glass substrate to be substantially elastic body, shown in curve A, yet on this glass substrate and to have intervenient this gap of this color filter layers be that part is flexible, shown in curve B, wherein after being released, this load can possess a permanent strain d.Therefore, if load on a pressure (or stress) on this LCD device greatly to being enough to produce this permanent strain, this gap and place the overall height of this color filter layers on this glass substrate to be changed.In other words, after this LCD panel was bestowed a sizable pressure, this cell gap may be inhomogeneous, and the uneven flaw of this panel colourity (Mura defective) may produce.
Moreover with regard to the filling process of the combination of two substrates in the LCD and liquid crystal material, prior art provided many methods already.For example, thin film transistor (TFT) (the Thin Film Transistor that is necessary of the at first construction of two substrates of this display; TFT), circuit and colored filter.This two substrates is alignment mutually then, and spaced apart with about 5 microns distance, utilizes epoxy resin to combine in its edge again.This liquid crystal utensil that fills with liquid crystal material in conjunction with substrate and is placed a vacuum chamber, make this be in a vacuum state in conjunction with the gap in the substrate.Afterwards, with this in conjunction with the filling mouth of substrate towards this liquid crystal utensil, and be contacted with on this liquid crystal material, then destroy vacuum, make this filling mouth suck this liquid crystal material gradually in conjunction with a pressure differential of substrate inside and outside by capillary effect (capillary effect) and this in conjunction with substrate.
In in recent years, developed and a kind of quicker filling technique, that is so-called liquid crystal drop following formula (One Drop Fill) technology.In this technology, before the two substrates combination, the substrate in the two substrates accommodates the liquid crystal material that drop is inserted.This drop placement method is found in the United States Patent (USP) the 5th of giving people such as Teruhisa Ishihara on November 23rd, 1993,263, No. 888, title is " LCD panel process method (Method of Manufacture of Liquid Crystal Display Panel) ", it is incorporated this paper into and thinks reference.
In this technology, the elasticity of gap concerns in liquid crystal drop following formula (the One Drop Fill) technology, splashes on the substrate between the operational zone of amount of liquid crystal (operation window).When the gap was sub very few or amount of plastic deformation is excessive (for example elasticity coefficient is low excessively), the amount that goes up liquid crystal relatively was easy to too much, and also causes gravity look inhomogeneous (gravity mura).If gap son too much or during elastic deformation amount's low excessively (for example elasticity coefficient is too high), is gone up the amount of liquid crystal relatively and is easy to very fewly, then be easy to produce bubble.Under the elastomeric pattern of ideal, high highly more gap can obtain between big more operational zone.
Summary of the invention
Purpose of the present invention is exactly that a kind of method for making of bulge-structure is being provided, and adjusting the height of formed bulge-structure by the openings of sizes of light-shielding pattern, and constitutes the bulge-structure of differing heights, with as gap and orientation projection.
The structure and the manufacture method thereof that the purpose of this invention is to provide a kind of LCD device can be made gap of differing heights simultaneously, to keep the cell gap (cell gap) evenly and accurately of LCD device.
The structure and the manufacture method thereof that the purpose of this invention is to provide a kind of LCD device can form the orientation projection when making gap, to simplify technology, save cost of manufacture.
Based on above-mentioned or other purpose, the present invention proposes a kind of method for making of bulge-structure.At first, provide a colored filter substrate or a thin-film transistor array base-plate, wherein have a light-shielding pattern on this colored filter substrate or the thin-film transistor array base-plate, and this light-shielding pattern defines a plurality of openings.Then, on colored filter substrate with light-shielding pattern or thin-film transistor array base-plate, form a photoresist.Then, be mask with the light-shielding pattern, and photoresist exposed dorsad, to adjust the exposure depth of the photoresist of opening part by the size of opening by the opposite side of colored filter substrate or active elements array substrates.Afterwards, with development of photoresist, and formation is corresponding to a plurality of bulge-structures of opening.
The present invention also proposes a kind of LCD device, and it comprises one first substrate, one second substrate, a liquid crystal layer, a plurality of first bulge-structure and a plurality of second bulge-structure.Wherein, first substrate and second substrate junction lump together, and forming a cavity, and have a light-shielding pattern on second substrate, and this light-shielding pattern defines a plurality of first openings and a plurality of second opening of different size.In addition, liquid crystal layer is disposed in the cavity.In addition, first bulge-structure and second bulge-structure are positioned at cavity, wherein the first bulge-structure correspondence is disposed on the position of first opening of light-shielding pattern, and the second bulge-structure correspondence is disposed on the position of second opening of light-shielding pattern, and first bulge-structure has different height with second bulge-structure.
The present invention also proposes a kind of manufacture method of LCD device.At first, provide one first substrate and one second substrate, wherein have a light-shielding pattern on second substrate, and light-shielding pattern defines a plurality of first openings and a plurality of second opening of different size.Then, coating one photoresist on second substrate.Then, be mask with the light-shielding pattern, and photoresist exposed dorsad that wherein the photoresist of first opening part has different exposure depth with the photoresist of second opening part by the opposite side of second substrate.Afterwards, with development of photoresist, and form corresponding to a plurality of first bulge-structures of first opening and corresponding to a plurality of second bulge-structures of second opening, wherein first bulge-structure has different height with second bulge-structure.
The present invention proposes a kind of colored filter substrate, and it mainly comprises a transparency carrier, a black matrix", a plurality of colored filter, a plurality of first bulge-structure and a plurality of second bulge-structure.Wherein, black matrix" is configured on the transparency carrier, and exposes the transparency carrier of part, and to define a plurality of first openings, a plurality of second opening and a plurality of pixel region, wherein first opening and second opening are of different sizes.In addition, colored filter is disposed in the pixel region.In addition, first bulge-structure and second bulge-structure are disposed on the transparency carrier, and wherein first bulge-structure is corresponding to first opening, and second bulge-structure is corresponding to second opening, and first bulge-structure has different height with second bulge-structure.
The present invention proposes a kind of method for making of colored filter substrate.At first, provide a transparency carrier.Then, on transparency carrier, form a black matrix", to define a plurality of first openings, a plurality of second opening and a plurality of pixel region, wherein first opening and second opening are of different sizes, and this transparency carrier of first opening and second opening emerges part.Then, in pixel region, form a plurality of colored filters.Then, coating one photoresist on transparency carrier, and with black matrix" and colored filter is mask, and by the opposite side of transparency carrier photoresist is exposed dorsad, wherein the photoresist of first opening part has different exposure depth with the photoresist of second opening part.Afterwards, with development of photoresist, and form corresponding to a plurality of first bulge-structures of first opening and corresponding to a plurality of second bulge-structures of second opening, wherein first bulge-structure has different height with second bulge-structure.
The present invention proposes another kind of colored filter substrate, mainly comprises a transparency carrier, a black matrix", a plurality of colored filter, a plurality of first bulge-structure and a plurality of second bulge-structure.Wherein, black matrix" is configured on the transparency carrier, and exposes the transparency carrier of part, to define a plurality of first openings and a plurality of pixel region.In addition, colored filter is disposed in the pixel region, and wherein colored filter has a plurality of second openings, and first opening and second opening are of different sizes.In addition, first bulge-structure and second bulge-structure are disposed on the transparency carrier, and wherein first bulge-structure is corresponding to first opening, and second bulge-structure is corresponding to second opening, and first bulge-structure has different height with second bulge-structure.
The present invention proposes the method for making of another kind of colored filter substrate.At first, provide a transparency carrier.Then, on transparency carrier, form a black matrix", defining a plurality of first openings and a plurality of pixel region, and the transparency carrier of first opening emerges part.Then, form a plurality of colored filters in pixel region, it has a plurality of second openings, and with the transparency carrier of expose portion, wherein first opening and second opening are of different sizes.Then, coating one photoresist on transparency carrier, and be mask with black matrix" and colored filter, and by the opposite side of transparency carrier photoresist is exposed dorsad, wherein the photoresist of first opening part has different exposure depth with the photoresist of second opening part.Afterwards, with development of photoresist, and form corresponding to a plurality of first bulge-structures of first opening and corresponding to a plurality of second bulge-structures of second opening, wherein first bulge-structure has different height with second bulge-structure.
The present invention proposes another colored filter substrate, mainly comprises a transparency carrier, a black matrix", a plurality of colored filter, a plurality of first bulge-structure and a plurality of second bulge-structure.Wherein, black matrix" is configured on the transparency carrier, and exposes the transparency carrier of part, to define a plurality of pixel regions.In addition, colored filter is disposed in the pixel region, and wherein colored filter has a plurality of first openings and a plurality of second opening, and first opening and second opening are of different sizes.In addition, first bulge-structure and second bulge-structure are disposed on the transparency carrier, and wherein first bulge-structure is corresponding to first opening, and second bulge-structure is corresponding to second opening, and first bulge-structure has different height with second bulge-structure.
The present invention proposes the method for making of another colored filter substrate.At first, provide a transparency carrier.Then, on transparency carrier, form a black matrix", to define a plurality of pixel regions.Then, form a plurality of colored filters in pixel region, it has a plurality of first openings and a plurality of second opening, and with the transparency carrier of expose portion, wherein first opening and second opening are of different sizes.Then, coating one photoresist on transparency carrier, and be mask with black matrix" and colored filter, and by the opposite side of transparency carrier photoresist is exposed dorsad, wherein the photoresist of first opening part has different exposure depth with the photoresist of second opening part.Afterwards, with development of photoresist, and form corresponding to a plurality of first bulge-structures of first opening and corresponding to a plurality of second bulge-structures of second opening, wherein first bulge-structure has different height with second bulge-structure.
Based on above-mentioned, gap of the present invention directly places on this glass substrate, and can have different height, so after having born pressure or strength, this LCD device can be recovered fully and this cell gap can be consistent.In addition, the present invention can adjust exposure depth by the opening size on the light-shielding pattern, and to form the bulge-structure of differing heights simultaneously, it can be used as gap or orientation projection, therefore helps to simplify technology, reduces cost of manufacture.In addition, the present invention also helps in the processing technology of liquid crystal drop following formula (One Drop Fill), further strengthens to splash between the operational zone of amount of liquid crystal.
For above and other objects of the present invention, feature and advantage can be become apparent, preferred embodiment cited below particularly, and cooperate institute's accompanying drawing to be described in detail below.
Description of drawings
Fig. 1 one has the schematic cross section of the existing LCD device of spherical gap.
Fig. 2 one has the schematic cross section of the existing LCD device of outstanding pattern interval.
Fig. 3 directly places on the glass substrate for this gap, with and have be situated between a stress-strain figure between this gap and glass substrate of a color filter layers.
Fig. 4 a is the floor map according to a colored filter substrate of a LCD device of the present invention.
Fig. 4 b is the schematic cross section along the colored filter substrate of the profile line 4b-4b of Fig. 4 a.
Fig. 4 c is the schematic cross section along the colored filter substrate of the profile line 4c-4c of Fig. 4 a.
Fig. 5 is the part schematic cross section according to the LCD device of one embodiment of the invention.
Fig. 6 to 10 is the diagrammatic cross-section according to the manufacture method of a colored filter substrate of a LCD device of the present invention.
Figure 11 is the part schematic cross section of LCD device according to another embodiment of the present invention.
Figure 12 is the part schematic cross section of LCD device according to another embodiment of the present invention.
Figure 13 shows a colored filter substrate 800 according to another embodiment of the present invention.
Figure 14 shows a colored filter (Color Filter according to another embodiment of the present invention; CF) substrate 900.
Figure 15 illustrates and is the photomask opening of difformity and the size graph of a relation corresponding to its formed bulge-structure height
Figure 16 illustrates the synoptic diagram into the defined opening size of different photomasks among Figure 15.
Figure 17 A～17D, it illustrates the method for making of bulge-structure of the present invention in regular turn.
Figure 18 illustrates the substrate for the bulge-structure that has differing heights simultaneously.
Figure 19～21 illustrate the synoptic diagram of gap of differing heights respectively
Figure 22 illustrates the synoptic diagram into a kind of colored filter substrate of the preferred embodiments of the present invention.
Figure 23 illustrates the local schematic top plan view into the another kind of colored filter substrate of the preferred embodiments of the present invention.
The simple symbol explanation
30 TFT substrates, 40 CF substrates
41 glass substrates, 43 color filter layers
45 gaps son 49 liquid crystal material layers
61 TFT substrates, 69 liquid crystal materials
71 colored filter substrates, 79 gap
100 CF substrates, 120 glass substrates
140 electrode layers, 150 black matrix"s
152 gap subregions
160 colored filter 160a colored filters
160b colored filter 160c colored filter
170 alignment films, 180 gap
Sub-180b gap, 180a gap
182 negative photoresists, 184 ultraviolet lights
200 LCD devices
210 liquid crystal materials, 212 cavitys
220 TFT substrates, 222 glass substrates
224 grids, 225 gate lines
226 auxiliary capacitance lines, 227 semiconductor layers
The metal level of 228 pixel electrode 229a source regions
The metal level 233 look velums of 229b drain region
234 alignment films
500 CF substrates, 520 glass substrates
550 black matrix"s, 552 gap subregions
Subregion 552b gap, 552a gap subregion
560 colored filters, 580 gap
Sub-580b gap, 580a gap
610 liquid crystal materials, 612 cavitys
620 thin film transistor base plates, 622 transparency carriers
623 substrates
624 grids, 628 pixel electrodes
629 source electrodes, 634 alignment films
652 gap subregions
660 colored filters, 680 gap
Sub-680b gap, 680a gap
700 LCD devices
800 colored filter substrates, 850 black matrix"s
852 gap subregion 860a colored filters
860b colored filter 860c colored filter
878 openings, 880 gap
900 colored filter substrates, 950 black matrix"s
952 gap subregion 960a colored filters
960b colored filter 960c colored filter
980 gaps 987 keeps capacitor regions
The size of S photomask opening
1010 substrates, 1012 first surfaces
1014 second surfaces, 1020 light-shielding patterns
1022 openings
The 1022a first opening 1022b second opening
1030 photoresists, 1032 bulge-structures
The 1032a first bulge-structure 1032b second bulge-structure
1120 black matrix"s
1,122 first openings, 1,132 second openings
1,142 first bulge-structures, 1,144 second bulge-structures
1150 light-shielding patterns
Embodiment
With reference to figure 4a, 4b and 4c, it shows the gap submounts according to one embodiment of the invention, for example a colored filter (Color Filter; Hereafter is CF) substrate 100, be used for a thin film transistor (TFT) (Thin Film Transistor; TFT) LCD (Liquid Crystal Display; LCD) in the device.
Shown in Fig. 4 a, the pixel (pixel) that it is presented on the CF substrate 100 comprises pixel (sub-pixel) three times.Thin film transistor (TFT) on the TFT substrate (not shown) of this pixel and this LCD device is corresponding.Further with reference to figure 4b and 4c, it is the cross sectional view of Fig. 4 a along the CF substrate 100 of profile line 4b-4b and 4c-4c now.This CF substrate 100 has a transparency carrier, such as a glass substrate 120.One black matrix" 150 generally is made of metal, and such as the chromium (Cr) or the chromium oxide (CrOx) of form of film, perhaps black resin is made, and be covered on this glass substrate 120, and expose the glass substrate 120 of part, defining a plurality of pixel regions, and gap subregion 152.
This black matrix" 150 and this gap subregion 152 are generally and on the corresponding part of non-dynamic part of this LCD device, this partly includes source electrode bus bar, grid bus bar, auxiliary capacitance electrode and thin film transistor (TFT) on this TFT substrate.
This pixel region is corresponding to the dynamic part of this LCD device, and it is corresponding with the pixel electrode on this TFT substrate.Colored filter 160, for example red chromatic filter layer 160a, green tint color filtering optical layer 160b and blue color color filtering optical layer 160c, strip and replace corresponding on this pixel region.Those skilled in the art can understand, and this colored filter 160 can be arranged as various pattern.
Those skilled in the art should understand an alignment films 170, are for example formed with pi, can be coated on further on this glass substrate 120, to have the thickness of about 0.1 μ m.The surface of this alignment films 170 is suitable for this liquid crystal molecule of orientation, this alignment films for example rub processing (rubbing process), irradiation orientation (photo-align), or itself molecular characterization can make liquid crystal molecule have certain orientation, and does not need the processing technology that rubs again.
In this embodiment, this black matrix" 150, colored filter 160, electrode layer 140 and gap 180 have the thickness of about 0.16 μ m, about 1.5 μ m, about 0.15 μ m and about 5.81 μ m respectively.Conspicuous,, and help in the processing technology of liquid crystal drop following formula (One Drop Fill) greater than this cell gap (cellgap) according to the height of this gap 180 of the present invention, further strengthen between the operational zone.In addition, be applied to a vertical orientation (vertically-aligned when gap according to the present invention submounts; VA) the LCD device of form, this gap submounts can have a regional regulation device (domainregulating means), such as being formed on the projection (protrusions) on this substrate or utilizing the slit (for example ITO slit) of transparency electrode, in order to the direction of regulation liquid crystal.LCD device with vertical orientation of regional regulation device is disclosed in this European patent of incorporating this case reference into and discloses the 0th, 884,626-A2 number.
With reference now to Fig. 5,, it shows one according to LCD device 200 of the present invention.This LCD device 200 comprises this CF substrate 100 according to the present invention and TFT substrate 220, and the edge of this CF substrate 100 and TFT substrate 220 sticks together and be in the same place, and to define a cavity 212, is used for holding this liquid crystal material 210.This cavity 212 has a gap (cell gap evenly and accurately that is defined by this a plurality of gaps 180; Cell gap).The structure of this TFT substrate 220 is described as follows.On a glass substrate 222, be formed separately grid 224, gate line (scanning linear) 225 and this auxiliary capacitance line 226.This grid 224, gate line 225 and this auxiliary capacitance line 226 cover a dielectric film 233.Form on this dielectric film 233 on each grid 224 as the semi-conductor layer 227 of TFT (thin film transistor (TFT)) passage.Moreover, form in the upper section of each semiconductor layer 227 as the source electrode of this TFT and metal level 229a, the 229b of drain region, and be connected to source line and pixel electrode 228.For example with this pixel electrode 228 that ITO was constituted, cover each auxiliary capacitance line 226, and this dielectric film 233 is disposed at therebetween again.In addition, an alignment films 234 is formed on this source electrode and drain region 229a, 229b and this pixel electrode 228.
The present invention also provides a kind of method in order to make this CF substrate 100.At first, with reference to figure 6, providing the substrate 120 with a flat surfaces, for example is a glass substrate.For satisfying optical concentration value (Optical density) greater than 3.5, to reach high correlative value, form a black matrix", the chromium film that for example forms the about 0.16 μ m of thickness is on this glass substrate 120, and a photoresist is formed on this chromium film then.Afterwards, use a photomask, it has a predetermined pattern, in order to this photoresist is exposed.Through after developing, this chromium film of etching and form this black matrix" 150, and this black matrix" 150 has a gap subregion 152, such as toroidal, octagon, polygon, quadrilateral, triangle or square shape etc.
With reference to figure 7, red, green and blue colored filter 160 for example is shaped by red resin, green resin and blue resins being coated on this glass substrate 120 respectively.The thickness of this colored filter 160 has different-thickness according to different colored photo anti-corrosion agent materials and colourity demand, for example is set at about 1.5 μ m.This colored filter 160 is overlapping in edge with this black matrix" 150.This colored filter 160 is configured as a pattern, to expose this black matrix" 150 and this gap subregion 152 that is positioned at the below.These colored filter 160 manufacturing process for example are a gold-tinted lithography process.
Afterwards, with reference to figure 8, form community electrode 140, for example by sputtered indium-tin-oxide (Indi μ mTin Oxide; ITO), the indium tin oxide of about 0.15 μ m thickness is covered on this colored filter 160, this black matrix" 150 and this gap subregion 152.
Then, be coated on this glass substrate 120, and cover this gap subregion 152 with reference to figure 9, one negative photoresists 182.One is suitable for this photoresist is formed the light of curing reaction, for example is that a ultraviolet light 184 shines this glass substrate 120 by opposite side, in order to this negative photoresist 182 is exposed.This negative photoresist 182 can produce bond (closslinking) after through these ultraviolet light 184 irradiations, that is this negative photoresist 182 will harden after by these ultraviolet light 184 irradiations, and does not dissolve in the developer.Behind development and baking-curing, this negative photoresist 182 forms this gap 180 of the height of about 5.81 μ m thickness.Those skilled in the art as can be known, this gap 180 can be arbitrary shape, such as circular cone, octagonal column, anistree awl, polygon corner post, polygon pyramid or flat column etc., be not only be defined as cylindric.This colored filter 160 is opaque for this ultraviolet light 184, to avoid being positioned at these negative photoresist 182 sclerosis of colored filter 160 tops.In the case, this colored filter 160 and this black matrix" 150 act as a photomask, so that this gap 180 is shaped, as shown in figure 10.
In a particular experiment example, with regard to employed colored filter now, ITO, and glass substrate with regard to, its transmittance corresponding to the ultraviolet light of different wave length is listed as follows:
| Wavelength (λ) | R/ITO R745-4 (2μm) | G/ITO G772-4 (2μm) | B/ITO B764-4 (2μm) | ITO+ glass 0.6mm glass | Naked glass 0.6mm |
| J line (335nm) | 0 | 0 | 0 | 54.45％ | 74.39％ |
| I line (365nm) | 7.10％ | 1.31％ | 0 | 66.73％ | 84.99％ |
| H line (405nm) | 5.07％ | 0.54％ | 36.51％ | 70.36％ | 90.64％ |
| G line (437nm) | 1.13％ | 0.27％ | 64.92％ | 81.77％ | 91.15％ |
In this transmittance tabulation, first row are arranged as ultraviolet light J line (wavelength 335nm) respectively, I line (wavelength 365nm), H line (wavelength 405nm) and G line (wavelength 437nm), and first row is arranged as red negative photoresist (the model R745-4 of JSR company of thick 0.6mm ITO+ on glass respectively, thickness 2 μ m), green negative photoresist (the model G772-4 of JSR company of ITO+ that thick 0.6mm is on glass, thickness 2 μ m), the blue negative photoresist (the model B764-4 of JSR company, thickness 2 μ m) of ITO+ that thick 0.6mm is on glass, ITO+bare glass (thickness is 0.6mm) and bare glass (thickness is 0.6mm) penetrate the absorption value of light under different wave length.This ultraviolet light J line (wavelength 335nm), I line (wavelength 365nm), H line (wavelength 405nm) and G line (wavelength 437nm) can be used USHIO 10KW fluorescent tube to be sent by an exposure sources, and use ultraviolet spectrum instrument (UV Spectr μ mMeter), such as machine models: USHIO Spectroadiometer USR-405 is measured.
It is as shown in the table, when this ultraviolet light J line (wavelength 335) shines the red negative photoresist of ITO+, the green negative photoresist of ITO+ and ITO+ blueness negative photoresist, though its penetrance is minimum, but its irradiation energy minimum increases the process time that makes negative photoresist 182 on this gap subregion 152 harden into this gap 180.Moreover, when this ultraviolet light H line (wavelength 405nm) and G line (wavelength 437nm) irradiation ITO+ blueness negative photoresist, its penetrance is higher, with making the negative photoresist 182 beyond this gap subregion 152 harden, the space that holds liquid crystal is changed maybe can't hold liquid crystal.
Therefore, because the penetrance of the ultraviolet light (I line) of wavelength 365nm is substantially between J line (wavelength 335), between ultraviolet light H line (wavelength 405nm) and the G line (wavelength 437nm), it has for the penetrance of ITO and glass substrate higher, and for red, green, the penetrance of blue colored filter is lower, so select ultraviolet light for use to wavelength 365nm, in order to react this negative photoresist 182, can utilize various colored filters, for example red, green, the blue color colo(u)r filter, and form photomask naturally, so most of ultraviolet light can only penetrate negative photoresist material sclerosis and formation gap of gap subregion with this gap.According to this experiment example, the preferred penetrance in the zone beyond this gap subregion is less than 7.1%, and the optimal penetration rate is less than 1.31%.
In addition, consider the residual film problem of the gap used photoresist of son on chromatic filter layer, absorbing agent (being the UV absorbers of 365nm wavelength at this embodiment) can be added in the chromatic filter layer (at this embodiment for adding redness, green tint color filtering optical layer to), to guarantee that ultraviolet light can only penetrate the gap subregion, and can utilize red, green, blue color colo(u)r filter and black matrix" to form photomask naturally, utilize light the gap subregion voluntarily contraposition form gap.At last, this alignment films that is shaped is to cover the surface of this glass substrate 120, shown in Fig. 4 b.
Moreover as shown in Figure 5, this CF substrate 100 can further combine with a TFT substrate 220, and the edge of this CF substrate 100 and TFT substrate 220 sticks together and be in the same place, to define a cavity 212, in order to hold this liquid crystal material 210.This cavity 212 has one evenly and accurately gap (cell gap) that is defined by this a plurality of gaps 180.Afterwards, a Polarizer is respectively installed to after this CF substrate 100 and this TFT substrate, LCD device according to the present invention just is accomplished again.This liquid crystal material 210 can be disposed between this two substrates 100 and 220 by vacuum suction technology or liquid crystal drop following formula (One Drop Fill) technology.
As previously mentioned, directly be disposed on this glass substrate 120 according to gap of the present invention 180, this gap 180 is flexible substantially.When this LCD device is bestowed an external pressure or a strength, have only this gap 180 to be out of shape.Because directly placing gap 180 on the glass substrate 120 according to the present invention is flexible substantially, so after this external pressure or load are released, this gap 180 will be got back near they original sizes keeping evenly and cell gap accurately, and can not cause the uneven flaw of panel colourity.Moreover this gap 180 has higher height, so in the processing technology of liquid crystal drop following formula (OneDrop Fill), can further strengthen between the operational zone.
Now please refer to Figure 11, it shows a colored filter (ColorFilter according to another embodiment of the present invention; CF) substrate 500, are used for a thin film transistor (TFT) (Thin Film Transistor; TFT) LCD (Liquid Crystal Display; LCD) in the device.This CF substrate 500 is similar to this CF substrate 100, the figure number that wherein similar element marking is similar substantially.In this CF substrate 500, this gap 580 is disposed in this colored filter 560.In the manufacture process of this colored filter substrate 500, a black matrix" 550 is covered on this glass substrate 520, and exposes the glass substrate 520 of part, to define a plurality of pixel regions or colorized optical filtering panel region.A plurality of colored filters 560 are disposed on this colorized optical filtering panel region, and can have a plurality of openings, expose this glass substrate 520, and use and define a plurality of these gap subregions 552.When coating and development negative photoresist, light can pass this gap subregion 552, and this negative photoresist of this some is hardened, and forms a plurality of gaps 580 by this.Because in this embodiment, the gap subregion is positioned at the pixel region the inside, so in order to make the material of this gap 580, can be the material of the identical color of this colorized optical filtering panel region in this pixel region, with the transmittance of increase display.
Now please refer to Figure 12, it shows a LCD (LiquidCrystal Display according to another embodiment of the present invention; LCD) device 700, it has a thin film transistor (TFT) (Thin Film Transistor; TFT) substrate 620.This LCD 700 is similar to this LCD 200, the figure number that wherein similar element marking is similar substantially.This thin film transistor base plate 620 comprises a transparency carrier 622, a grid 624, one source pole 629 and a pixel electrode 628 (constituting such as ITO), and this grid 624, this source electrode 629 and this pixel electrode 628 are formed on this transparency carrier 622 with existing technology.Generally speaking, this grid 624 with scan circuit and be connected, by formed thereby in the lithography corrosion process of one first metal, and this source electrode 629 is connected with data circuit, by formed thereby in the lithography corrosion process of one second metal.In this thin film transistor base plate 620, a plurality of colored filters 660 are formed on this pixel electrode 628, and a plurality of gaps 680 is disposed in this colored filter 660.
In the manufacture process of this thin film transistor base plate 620, a plurality of colored filters 660 are formed on this pixel electrode 628, and expose the pixel electrode 628 of part, to define a plurality of pixel regions.These a plurality of colored filters 660 have a plurality of openings, expose this pixel electrode 628, and use and define a plurality of these gap subregions 652.When coating and development negative photoresist, ultraviolet light can pass this gap subregion 652 by the outside of this transparency carrier 622, and this negative photoresist of this some is hardened, and forms a plurality of gaps 680 by this.In addition, an alignment films 634 is formed on this source electrode 629, this colored filter 660 and this gap 680.
This thin film transistor base plate 620 can further combine with another substrate 623, and the edge of this thin film transistor base plate 620 and this substrate 623 sticks together is in the same place, to define a cavity 612, in order to hold a liquid crystal material 610, so to form this LCD device 700.This cavity 612 has one evenly and accurately gap (cell gap) that is defined by this a plurality of gaps 680.Those skilled in the art can understand, and two Polarizer (not shown) can be respectively installed on the outer surface of this thin film transistor base plate 620 and this substrate 623.
Now please refer to Figure 13, it shows a colored filter (ColorFilter according to another embodiment of the present invention; CF) substrate 800.This CF substrate 800 is similar to this CF substrate 100, the figure number that wherein similar element marking is similar substantially.In the manufacture process of this colored filter substrate 800, a black matrix" 850 is covered on the glass substrate, and exposes the glass substrate of part, defining a plurality of pixel regions or colorized optical filtering panel region, and a plurality of opening 878.A plurality of colored filter 860a, 860b, 860c are disposed on this colorized optical filtering panel region and this opening 878, and expose this glass substrate, and use and define a plurality of these gap subregions 852.When coating and development negative photoresist, light can pass this gap subregion 852, and this negative photoresist of this some is hardened, and forms a plurality of gaps 880 by this.Moreover those skilled in the art can understand this gap 880 can be corresponding to the position of the thin film transistor (TFT) of thin film transistor base plate (not shown).
Now please refer to Figure 14, it shows a colored filter (ColorFilter according to another embodiment of the present invention; CF) substrate 900.This CF substrate 900 is similar to this CF substrate 100, the figure number that wherein similar element marking is similar substantially.In the manufacture process of this colored filter substrate 900, a black matrix" 950 is covered on the glass substrate, and exposes the glass substrate of part, to define a plurality of pixel regions or colorized optical filtering panel region.A plurality of colored filter 960a, 960b, 960c are disposed on this colorized optical filtering panel region, and can have a plurality of openings, expose this glass substrate, and use and define a plurality of these gap subregions 952.When coating and development negative photoresist, light can pass this gap subregion 952, and this negative photoresist of this some is hardened, and forms a plurality of gaps 980 by this.Moreover those skilled in the art can understand this gap 980 can be corresponding to the maintenance capacitor regions 987 of thin film transistor base plate (not shown), that is the position of auxiliary capacitance electrode, shown in dotted line.Described before combining, the invention is characterized in and utilize pattern existing in the LCD (Pattern), such as black matrix", colored filter, scan circuit or first metal (Metal One) or data circuit or second metal (MetalTwo), define the gap subregion.Again, these patterns are lighttight for the light with the exposure of the photoresist of this gap, so this gap can be by the outside exposure of arbitrary substrate of this LCD, and form on this substrate.So, in the manufacture process according to gap of the present invention, do not need extra photomask,, just be able to directly this gap is shaped by the introns zone on this pattern with this photoresist exposure.And gap of the present invention is not limited to independent use, also can use with in the lump with traditional spherical gap (Ball spacer) or adhesive type gap (adhesive spacer).In addition, any those skilled in the art as can be known, gap of the present invention can adopt a light-proof material to form (a for example black resin), takes place to avoid the light leak situation.
The present invention makes light-shielding pattern with the light tight rete on CF substrate or the TFT substrate, and forms gap in the mode of exposure (back-exposure process) dorsad.It should be noted that, if based on the technology that the foregoing description was disclosed, the present invention more can be by the design to the opening size (being above-mentioned gap subregion) that light-shielding pattern defined, adjust exposure depth, and can form gap (hybrid spacers) of differing heights simultaneously corresponding to the photoresist of aperture position.This design with gap of differing heights will help to improve the anti-pressure ability of panel of LCD, and more help increasing with technology under the liquid crystal drop and splash between the operational zone of liquid crystal.
Please refer to Figure 15 and Figure 16, wherein Figure 15 illustrates and is the photomask opening of difformity and the size graph of a relation corresponding to its formed bulge-structure height, and Figure 16 illustrates the synoptic diagram into the defined opening size of different photomasks among Figure 15.Horizontal ordinate as shown in figure 15 is the opening size of photomask, and ordinate is the height of formed bulge-structure, wherein Figure 15 enumerates difform photomask openings such as rhombus, rectangle, square, octagon, and indicates the size of the photomask opening of these shapes among Figure 16 with label S.By can finding significantly among Figure 15, corresponding different opening sizes can form the bulge-structure of differing heights.In more detail, by the design of photomask opening size, can control the exposure depth of its pairing photoresist, the height of the formed bulge-structure in back that therefore develops just can be different.
In conjunction with above-mentioned exposure dorsad that discloses and the technology of adjusting the photomask opening, the present invention can form the bulge-structure of differing heights simultaneously in LCD device, with usefulness as gap (hybridspacer), hereinafter will illustrate the method in order to the bulge-structure that forms identical or different height of the present invention, and the content of above-mentioned all embodiment all can be incorporated into hereinafter, with as a reference.
Please refer to Figure 17 A～17D, it illustrates the method for making of bulge-structure of the present invention in regular turn.
At first, shown in Figure 17 A, provide a substrate 1010, wherein this substrate 1010 for example is above-mentioned colored filter substrate or thin-film transistor array base-plate, and this substrate 1010 has a corresponding first surface 1012 and a second surface 1014.In addition, has light-shielding pattern 1020 on the first surface 1012 of substrate 1010, this light-shielding pattern 1020 for example is above-mentioned black matrix", colored filter, scans circuit or the first metal layer (Metal One) or data circuit or second metal level (Metal Two), in order to defining a plurality of openings 1022, and this opening 1022 for example is above-mentioned gap subregion.
Then, shown in Figure 17 B, form a photoresist 1030 on substrate 1010, it covers light-shielding pattern 1020, and this photoresist 1030 for example is a negative photoresist.
Then, shown in Figure 17 C, be mask, and photoresist 1030 exposed dorsad by a side of the second surface 1014 of substrate 1010 with light-shielding pattern 1020.Wherein, according to the photomask opening size that Figure 15 illustrated and the graph of a relation of bulge-structure height, for example can select wherein a kind of photomask design of shape, and the relation curve among corresponding Figure 15, design the shape and the size of the opening 1022 of light-shielding pattern 1020.In a preferred embodiment, for example can form the opening 1022 of rectangle, and adjust the exposure depth of the photoresist 1030 at opening 1022 places by the size of opening 1022.
Afterwards, shown in Figure 17 D, photoresist 1030 is developed, and formation is corresponding to a plurality of bulge-structures 1032 of opening 1022.
In the above-described embodiments, for example can on substrate 1010, form the bulge-structure of equal height simultaneously.Certainly, if light-shielding pattern 1020 has the opening 1022 of different size, then in response to different exposure depth, the height of its formed bulge-structure 1032 will can be not identical.
Please refer to Figure 18, it illustrates the substrate for the bulge-structure that has differing heights simultaneously.Wherein, light-shielding pattern 1020 on the substrate 1010 has the first opening 1022a and the second opening 1022b of different size, and by these the first opening 1022a and the second opening 1022b, just can form the first bulge-structure 1032a and the second bulge-structure 1032b simultaneously through forming photoresist, exposing and step such as development dorsad with differing heights.For example, the difference in height of the first bulge-structure 1032a and the second bulge-structure 1032b for example is 0.4 μ m, and can have the panel of LCD that mixes gap (hybrid spacers) with formation with these first bulge-structure 1032a and the second bulge-structure 1032b as gap.Structure with the above-mentioned LCD device that Fig. 5, Figure 11 and Figure 12 were disclosed is an example, and Figure 19～21 illustrate its synoptic diagram with gap of differing heights respectively.
As shown in figure 19, with the black matrix" on the colored filter substrate 100 150 as light-shielding pattern, wherein black matrix" 150 defines the gap subregion 152a and the 152b of different size, with carry out photoresist coating, dorsad after the steps such as exposure and developments, the sub-180a in gap and the 180b of formation differing heights on colored filter substrate 100.
In addition, as shown in figure 20, as light-shielding pattern, wherein colored filter 560 defines the gap subregion 552a and the 552b of different size, and more for example can add light absorber in the colored filter 560, to increase its shaded effect with colored filter 560.In like manner, carry out photoresist coating, dorsad after the steps such as exposure and development, just can form the sub-580a in gap and the 580b of differing heights on colored filter substrate 500, wherein the explanation about other member and its method for making please refer to the foregoing description, no longer repeats to give unnecessary details at this.
In addition, be manufactured with structure (the stack-up type colored filter of colored filter 660 on the thin film transistor base plate 620 as shown in figure 21, color filter on array, COA), the colored filter 660 that wherein is disposed on the pixel electrode 628 can define the gap subregion 652a and the 652b of different size equally, so can form the sub-680a in gap and the 680b of differing heights.
Other member and its method for making about being illustrated in Figure 19～21 please refer to the explanation of previous embodiment, no longer repeat to give unnecessary details at this.
Certainly, except above-mentioned Figure 19～21 embodiment that illustrated, the present invention also can define the gap subregion of different size the while by black matrix" and colored filter.In addition, gap that is positioned on the black matrix" for example can be corresponding to parts such as the thin film transistor (TFT) on the TFT substrate, trace wiring, data circuits, and gap that is positioned on the colored filter for example can be corresponding to the auxiliary capacitance electrode on the TFT substrate, and the unlikely aperture opening ratio (aperture ratio) that influences LCD device.In other words, in a preferred embodiment, gap is positioned on the corresponding part of non-dynamic part of LCD device, and this partly is included in source electrode bus bar (trace wiring), grid bus bar (data circuit), auxiliary capacitance electrode and thin film transistor (TFT) on this TFT substrate.
In addition, of the present invention in order to the technology that forms bulge-structure except that can be applicable to make of gap, if be applied to multi-zone vertical alignment nematic (multi-domain vertical alignment, during MVA) LCD device, also can when making gap, optionally on colored filter substrate or thin film transistor base plate, make the orientation projection.
Please refer to Figure 22, it illustrates the synoptic diagram of a kind of colored filter substrate of the preferred embodiments of the present invention.In the present embodiment, black matrix" 1120 for example defines first opening 1122, and colored filter 1130 for example defines second opening 1132, wherein the size of first opening 1122 for example is about 20 μ m, the size of second opening 1132 is about 11 μ m, and the height of its formed first bulge-structure 1142 and second bulge-structure 1144 for example is respectively 4 μ m and 1.4 μ m, and both have the difference in height of about 2.6 μ m.Certainly, the size that forms the required opening of this difference in height also can be for example tried to achieve by the cited photomask opening of Figure 15 and the relation curve of bulge-structure height.First bulge-structure 1142 that highly is 4 μ m can be used as gap, and highly is that second bulge-structure 1144 of 1.4 μ m can be used as the orientation projection.
Please refer to Figure 23, the present invention for example also can be in second opening 1132 that above-mentioned colored filter 1130 is defined the light-shielding pattern 1150 of reserve part, it for example is colored filter or black matrix", and by the exposure depth of the photoresist in light-shielding pattern 1140 may command second opening 1132 of this reservation, to adjust the height of formed second bulge-structure (orientation projection).
What deserves to be mentioned is,, also can define multiple sized opening simultaneously,, and then provide the LCD device that has mixing gap and orientation projection simultaneously with gap of formation differing heights as Figure 22 or 23 described black matrix"s 1120.In addition, above-mentioned production method can be applicable to the making of gap son and orientation projection on the thin film transistor base plate equally, and right those skilled in the art should know by inference easily with reference to the foregoing description and explanation, so give unnecessary details no longer one by one.
In sum, the present invention has following feature and advantage at least:
(1) gap directly places on this glass substrate, and can have different height, so after having born pressure or strength, this LCD device can be recovered fully and this cell gap can be consistent.
(2) can adjust exposure depth by the opening size on the light-shielding pattern, to form the bulge-structure of differing heights simultaneously, it can be used as gap or orientation projection, therefore helps to reduce the photomask number and the technology number of use, and then enhance productivity, and can reduce cost of manufacture.
(3) gap of differing heights helps in the processing technology of liquid crystal drop following formula (One Drop Fill), further strengthens to splash between the operational zone of amount of liquid crystal, with the raising rate that manufactures a finished product.
Though the present invention discloses as above with preferred embodiment; yet it is not in order to limit the present invention; those skilled in the art can do a little change and retouching without departing from the spirit and scope of the present invention, thus protection scope of the present invention should with accompanying Claim the person of being defined be as the criterion.
Claims (25)
1, a kind of LCD device has one first substrate, one second substrate, lumps together with this first substrate junction, and forms a cavity, liquid crystal material, is disposed in this cavity and a plurality of gaps, it is characterized in that:
Have a pattern on one of in this first substrate and this second substrate, in order to defining a plurality of gaps subregion, and this gap is disposed on this gap subregion.
2, LCD device as claimed in claim 1, wherein this pattern comprises black matrix".
3, LCD device as claimed in claim 1, wherein this pattern comprises colored filter.
4, LCD device as claimed in claim 1, wherein this pattern comprises a first metal layer.
5, LCD device as claimed in claim 1, wherein this pattern comprises one second metal level.
6, LCD device as claimed in claim 1, wherein this gap forms via the irradiation sclerosis.
7, LCD device as claimed in claim 1, wherein the preferred transmittance in the zone beyond this gap subregion is less than 7.1%.
8, LCD device as claimed in claim 7, wherein the best transmittance in the zone beyond this gap subregion is less than 1.31%.
9, LCD device as claimed in claim 1, wherein this gap subregion disposes corresponding to a thin film transistor (TFT).
10, LCD device as claimed in claim 1, wherein this gap subregion disposes corresponding to an auxiliary capacitance electrode.
11, LCD device as claimed in claim 2 comprises also that wherein a colored filter disposes corresponding to a pixel region, and this colored filter coverage gap subregion not.
12, LCD device as claimed in claim 11, wherein this colored filter comprises a light absorber.
13, LCD device as claimed in claim 11, wherein this first substrate and this second substrate define a cell gap (cell gap), and the height of this gap is greater than the height of this cell gap.
14, LCD device as claimed in claim 11, wherein each this first substrate and this second substrate all have an alignment films, and this cell gap is the mean distance between this two alignment films.
15, LCD device as claimed in claim 1, wherein this gap is formed by a light-proof material.
16, LCD device as claimed in claim 15, wherein this light-proof material is a black resin.
17, LCD device as claimed in claim 15, wherein this pattern is a light-shielding pattern, this light-shielding pattern defines a plurality of first openings and a plurality of second opening of different size; Wherein those gap comprise a plurality of first bulge-structures, and correspondence is disposed on the position of those first openings of this light-shielding pattern, and is positioned at this cavity; And
A plurality of second bulge-structures, correspondence are disposed on the position of those second openings of this light-shielding pattern, and are positioned at this cavity, and wherein this first bulge-structure has different height with this second bulge-structure.
18, a kind of manufacture method of LCD device comprises the following steps:
One first substrate and one second substrate are provided;
In this inboard of this second substrate and outer surface one on, form a light-shielding pattern, to define a plurality of gaps subregion;
On this inner surface in this second substrate, be coated with a photoresist;
On this outer surface in this second substrate, irradiation light; And
With this development of photoresist, and form a plurality of gaps.
19, the manufacture method of LCD device as claimed in claim 18 also comprises the following steps:
This first substrate is combined with this second substrate, to form a cavity; And
One liquid crystal material is filled in this cavity.
20, the manufacture method of LCD device as claimed in claim 18 also comprises the following steps:
One liquid crystal material is splashed on one in this first substrate and this second substrate;
This first substrate is combined with this second substrate, so this liquid crystal material is sealed between this first substrate and this second substrate.
21, the manufacture method of LCD device as claimed in claim 18, wherein this pattern is a black matrix".
22, the manufacture method of LCD device as claimed in claim 18, wherein this pattern is a colored filter.
23, the manufacture method of LCD device as claimed in claim 18, wherein this pattern is first metal.
24, the manufacture method of LCD device as claimed in claim 18, wherein this pattern is second metal.
25, the manufacture method of LCD device as claimed in claim 18, wherein this light-shielding pattern also comprises a plurality of first openings and a plurality of second opening of different size;
So that this photoresist of those first opening parts has different exposure depth with this photoresist of those second opening parts; And
With this development of photoresist, and form corresponding to a plurality of first bulge-structures of those first openings and corresponding to a plurality of second bulge-structures of those second openings, wherein this first bulge-structure has different height with this second bulge-structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100516124A CN100489616C (en) | 2005-02-08 | 2005-02-08 | Liquid-crystal device and production thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100516124A CN100489616C (en) | 2005-02-08 | 2005-02-08 | Liquid-crystal device and production thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1818758A true CN1818758A (en) | 2006-08-16 |
| CN100489616C CN100489616C (en) | 2009-05-20 |
Family
ID=36918825
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2005100516124A Expired - Fee Related CN100489616C (en) | 2005-02-08 | 2005-02-08 | Liquid-crystal device and production thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100489616C (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100443978C (en) * | 2006-10-26 | 2008-12-17 | 友达光电股份有限公司 | Liquid crystal display panel |
| US7671952B2 (en) | 2007-01-29 | 2010-03-02 | Au Optronics Corp. | Multi-domain vertical alignment liquid crystal display panel |
| US7719649B2 (en) | 2007-03-09 | 2010-05-18 | Au Optronics Corporation | Liquid crystal display panel |
| US7724343B2 (en) | 2006-10-16 | 2010-05-25 | Au Optronics Corporation | Liquid crystal display panel |
| CN101266950B (en) * | 2007-03-13 | 2010-12-08 | 乐金显示有限公司 | Method of fabricating array substrate for liquid crystal display device |
| CN102809849A (en) * | 2012-08-07 | 2012-12-05 | 京东方科技集团股份有限公司 | Liquid crystal display device, color film substrate and manufacture method thereof |
| CN103760747A (en) * | 2013-12-25 | 2014-04-30 | 深圳市华星光电技术有限公司 | Mask plate, method for carrying out exposure on the mask plate and liquid crystal panel comprising mask plate |
| CN104991382A (en) * | 2015-08-07 | 2015-10-21 | 京东方科技集团股份有限公司 | Display panel, manufacturing method thereof and display device |
| US9298082B2 (en) | 2013-12-25 | 2016-03-29 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Mask plate, exposure method thereof and liquid crystal display panel including the same |
| CN109188759A (en) * | 2018-09-29 | 2019-01-11 | 南京中电熊猫平板显示科技有限公司 | A kind of color membrane substrates and its manufacturing method |
-
2005
- 2005-02-08 CN CNB2005100516124A patent/CN100489616C/en not_active Expired - Fee Related
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7724343B2 (en) | 2006-10-16 | 2010-05-25 | Au Optronics Corporation | Liquid crystal display panel |
| CN100443978C (en) * | 2006-10-26 | 2008-12-17 | 友达光电股份有限公司 | Liquid crystal display panel |
| US7671952B2 (en) | 2007-01-29 | 2010-03-02 | Au Optronics Corp. | Multi-domain vertical alignment liquid crystal display panel |
| US7719649B2 (en) | 2007-03-09 | 2010-05-18 | Au Optronics Corporation | Liquid crystal display panel |
| CN101266950B (en) * | 2007-03-13 | 2010-12-08 | 乐金显示有限公司 | Method of fabricating array substrate for liquid crystal display device |
| CN102809849B (en) * | 2012-08-07 | 2015-08-05 | 京东方科技集团股份有限公司 | A kind of liquid crystal indicator, color membrane substrates and manufacture method thereof |
| CN102809849A (en) * | 2012-08-07 | 2012-12-05 | 京东方科技集团股份有限公司 | Liquid crystal display device, color film substrate and manufacture method thereof |
| CN103760747A (en) * | 2013-12-25 | 2014-04-30 | 深圳市华星光电技术有限公司 | Mask plate, method for carrying out exposure on the mask plate and liquid crystal panel comprising mask plate |
| CN103760747B (en) * | 2013-12-25 | 2015-05-06 | 深圳市华星光电技术有限公司 | Mask plate, method for carrying out exposure on the mask plate and liquid crystal panel comprising mask plate |
| WO2015096249A1 (en) * | 2013-12-25 | 2015-07-02 | 深圳市华星光电技术有限公司 | Mask plate, method for performing exposure on same, and liquid crystal panel comprising mask plate |
| US9298082B2 (en) | 2013-12-25 | 2016-03-29 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Mask plate, exposure method thereof and liquid crystal display panel including the same |
| CN104991382A (en) * | 2015-08-07 | 2015-10-21 | 京东方科技集团股份有限公司 | Display panel, manufacturing method thereof and display device |
| CN109188759A (en) * | 2018-09-29 | 2019-01-11 | 南京中电熊猫平板显示科技有限公司 | A kind of color membrane substrates and its manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN100489616C (en) | 2009-05-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1818758A (en) | Liquid-crystal device and production thereof | |
| CN1065342C (en) | A liquid crystal display device and a method froducing the same | |
| US7738067B2 (en) | Method of manufacturing spacers on a color filter substrate | |
| CN1095083C (en) | Color filter substrate and color liquid crystal display device | |
| CN1092805C (en) | Liquid crystal display device with wide viewing angle characteristics comprising high resistivity black matrix | |
| CN1126002C (en) | Diffuse reflection plate and liquid display device using the plate and manufacturing method thereof | |
| CN1693977A (en) | Liquid crystal display device and method for fabricating the same | |
| CN1595245A (en) | Liquid crystal display apparatus | |
| CN100351682C (en) | Substrate for electro-optical device and its making method, electro-optical device and electronic equipment | |
| CN1837905A (en) | Flexible liquid crystal display and manufacturing method thereof | |
| CN1151026A (en) | Liquid crystal display device having uniform liquid crystal layer thickness | |
| CN1769973A (en) | Method for fabricating a light-shielding layer for a liquid crystal display device | |
| WO2021259247A1 (en) | Display substrate and manufacturing method therefor, panel, display device, and mask plate | |
| CN1704826A (en) | Liquid crystal display device | |
| CN1624498A (en) | Color filter substrate, liquid crystal display panel, liquid crystal display apparatus and method of manufacturing the same | |
| JP2005031414A (en) | Liquid crystal display device and its manufacturing method | |
| CN1721957A (en) | Liquid crystal display panel and method for producing the same | |
| CN1221840C (en) | Liquid crystal light shutter, optical printing head and method for producing lquid crystal light shutter | |
| US7876415B2 (en) | Display substrate having a TFT liquid crystal display region surrounded by a seal region having a cell-gap compensating part with a dummy pattern formed from the same layer as a pixel electrode of the TFT | |
| CN1797128A (en) | Method for producing alignment layer in liquid crystal display device | |
| CN100347593C (en) | Method for fabricating a liquid crystal display device | |
| CN1831609A (en) | Color light fictering substrate and manufacturing method thereof | |
| CN1704808A (en) | Liquid crystal display device and substrate to be used for liquid crystal display device, and methods for producing the same | |
| JP4594943B2 (en) | Liquid crystal display panel combination method | |
| CN1930517A (en) | Substrate with spacer, panel, liquid crystal panel, method for producing panel, and method for producing liquid crystal panel |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090520 Termination date: 20190208 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |