CN1811649A - Synthesizing quartz glass reactor controlled by micro-positive pressure - Google Patents
Synthesizing quartz glass reactor controlled by micro-positive pressure Download PDFInfo
- Publication number
- CN1811649A CN1811649A CN 200610000261 CN200610000261A CN1811649A CN 1811649 A CN1811649 A CN 1811649A CN 200610000261 CN200610000261 CN 200610000261 CN 200610000261 A CN200610000261 A CN 200610000261A CN 1811649 A CN1811649 A CN 1811649A
- Authority
- CN
- China
- Prior art keywords
- exhaust passage
- quartz glass
- air exhaust
- signal
- control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1407—Deposition reactors therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1446—Means for after-treatment or catching of worked reactant gases
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
The present invention discloses a micropositive pressure controlled reactor for synthesizing quartz glass. Said reactor includes the following several portions: closed furnace body, combustor, exhaust blower, exhaust channel, testing tube, valve, nitrogen gas tube, filter, differential pressure transmitter and control unit. Besides, said invention also provides the concrete structure of every portion, connection mode of all the above-mentioned portions and cuorking principle of said reactor.
Description
Technical field
The present invention relates to the preparation equipment of high-performance quartz glass, specially refer to the reactor in preparation III class and the IV class high-performance special quartz glass.
Background technology
Transparency silica glass has been widely used industrial, mainly contains following four kinds of main types and preparation method:
The I class: with mineral crystal or silica sand is raw material, the transparency silica glass of founding with electrothermal way.The atmosphere of founding has inert atmosphere, hydrogen atmosphere, also can be vacuum.(OH) content is lower than 5ppm (ppm=1 * 10 to hydroxyl in the quartz glass of founding under vacuum or inert atmosphere
-4%); Hydroxy radical content can reach 150ppm in the quartz glass of founding under hydrogen atmosphere.The impurity content height of this type of quartz glass, Al content are 30～100ppm, alkali metal content 5～10ppm.Be mainly used in electric light source, also be applied to industries such as metallurgy, chemical industry, semiconductor.
II class: the transparency silica glass that the mineral crystal raw material is founded in hydrogen-oxygen flame.Hydroxy radical content reaches 180～250ppm in this type of quartz glass.Metals content impurity is low, and Al content is less than 20ppm, and alkali metal content is lower than 5ppm, and softening temperature is than low 50 ℃ of I quartz-like glass.Be mainly used in semiconductor, the light source industry also is used for industries such as chemical industry, metallurgy.
III class: the hydrolysis in hydrogen-oxygen flame of silicon tetrachloride gas raw material, found into quartz glass.The metals content impurity of this type of quartz glass is lower than 1ppm, but hydroxy radical content surpasses 1000ppm, and contains the above Cl of 100ppm.The softening point of III quartz-like glass is than low 50～100 ℃ of preceding two quartz-like glass, but impurity content is low, and optical homogeneity is good, saturating ultraviolet, and anti-x ray irradiation x is applicable to optical material.
The IV class: with silicon tetrachloride gas is that raw material uses high-frequency plasma as the thermal source synthetic quartz glass, impurity content is lower than 1ppm in such quartz glass, hydroxy radical content is lower than 5ppm, Cl content 200ppm, optical homogeneity is preferably arranged, see through light wavelength wide ranges (0.18～3.5 μ m), be applicable to high-quality quartz pendulous reed and special optical material, as space technology laser-bounce prism and light transmitting fiber.
But, three during the last ten years, in synthetic III class of silicon tetrachloride gas deposition and IV quartz-like glass, adopt horizontal or vertical cvd furnace, a kind of vertical synthetic quartz glass cvd furnace as Chinese patent CN03244051.0 introduces comprises body of heater, be arranged at the basic rod in the body of heater, and the deposited weight surface of basic rod termination, place on the body of heater burner in addition to the deposited weight surface blanking, and the chimney that is used to discharge flue gas in the body of heater.This type of cvd furnace, general deposition efficiency by means raising quartz glasss such as control blanking velocity, blanking point distributions is considered and control for the shortage of the ambiance in the body of heater.
The innovation and creation content
The purpose of this invention is to provide a kind of equipment that is used for improving the rate of sedimentation and the efficient of synthetic quartz glass process, a kind of synthesizing quartz glass reactor controlled by micro-positive pressure that can accurately test and control gas and atmospheric pressure differential pressure in the burner hearth when silicon tetrachloride gas deposition synthetic quartz glass specifically is provided.
To achieve these goals, the present invention is by the following technical solutions:
A kind of synthesizing quartz glass reactor controlled by micro-positive pressure, comprise a closed furnace body, place the basic rod of body of heater and the deposited weight surface of basic rod termination, described upper of furnace body is established the burner that feeds intake to deposited weight surface, air exhaust passage is established in the bottom, wherein, be provided with flashboard in the described air exhaust passage, air exhaust passage connects the air draft blower fan; Described upper of furnace body is also established one and is communicated with the inner and extraneous testing tube of body of heater, one of described test pipe furnace outer end by valve connection nitrogen tube, another is communicated with a filtrator successively and is communicated with a differential pressure transmitter by a soft thin tracheae, described differential pressure transmitter is electrically connected a control module, the described air draft blower fan of control module electric control.
In the above-mentioned reactor, described control module comprises the signal process box one that is electrically connected successively, control computer, signal process box two, an and electrical control cubicles, differential pressure transmitter receives the pressure signal of threeway conduit, through wherein sensing element pressure differential is converted to current signal and be sent to signal process box one, signal process box one is imported control computer with conditioned signal, calculate a digital signal through control computer and export to signal process box two again, be that current signal sends electrical control cubicles to by signal process box two with digital signal transition again, thereby keep differential pressure constant in the burner hearth by the size of electrical control cubicles control air draft rotation speed of fan control flashboard opening.
In the above-mentioned reactor, described air exhaust passage, flashboard and air draft blower fan are a plurality of, and control with electrical control cubicles respectively.
In the above-mentioned reactor, described air exhaust passage is spaced in the body of heater bottom, and all air exhaust passage air ports remain on same surface level;
In the above-mentioned reactor, every arrangement, and stagger successively up and down by the air port of air exhaust passage at body of heater lower part interlayer for described air exhaust passage.
The present invention adopts technique scheme, and its advantage is as follows:
Can detect the pressure-fired value of burner hearth in real time, and can control the flow and the flow velocity of entrance and exit gas in real time, make to keep a constant relatively pressure-fired value in the burner hearth according to arts demand.
Make oven cavity atmosphere keep pressure-fired, be used to provide the foundation of the accurate control of hydrogen and oxygen flow, improve the service efficiency of heat energy,, reduce the loss of material, improve the product quality of synthetic quartz glass ingot, cut down the consumption of energy to improve deposition efficiency and rate of sedimentation.
Description of drawings
Fig. 1 is structure of reactor of the present invention and work synoptic diagram.
Fig. 2 is a control module working routine block diagram of the present invention.
Fig. 3 A is a kind of arrangement synoptic diagram of air exhaust passage in the reactor of the present invention;
Fig. 3 B arranges synoptic diagram for air exhaust passage in the reactor of the present invention is another kind of.
Embodiment
The present invention finds, in silicon tetrachloride gas deposition synthetic quartz glass process, ambiance in the burner hearth is for the certain influence that deposits of quartz glass, wherein, when keeping pressure-fired (1.5-3mm water column) in the burner hearth, the efficient and the speed of quartz glass deposition can be improved, and airflow field, temperature field and concentration field in the burner hearth can better be stablized.Based on this, the inventor has designed a kind of reactor that can make oven cavity atmosphere keep pressure-fired.
Referring to Fig. 1, synthesizing quartz glass reactor controlled by micro-positive pressure provided by the invention, comprise a closed furnace body 4, in this body of heater 4, vertically be provided with the deposited weight surface 5 of basic rod and basic rod termination, heat-insulation layer 6 is established in (basic rod rotates with the motor of body of heater 4 peripheral hardwares) body of heater 4 outsides, also be provided with the burner 3 that feeds intake to deposited weight surface 5 on body of heater 4 tops, be provided with air exhaust passage 10 in body of heater 4 bottoms, more than several big parts similar with existing quartz glass deposition furnace structure, during work, deposited weight surface 5 upper ends to rotation status feed intake from body of heater 4 tops by burner 3, the silica dioxide granule that is dispersed in the furnace chamber at high temperature deposits to formation use glass on the deposited weight surface 5 gradually, and the flue gas in the furnace chamber is discharged body of heater 4 by air exhaust passage 10.
Among the present invention, in order to monitor the pressure condition in the body of heater 4 at any time, establish one at body of heater 4 near the position of deposited weight surface 5 and be communicated with body of heater 4 inside and extraneous testing tube 2, this testing tube 2 is the quartz glass tube of corrosion-and high-temp-resistant, this testing tube other end wherein one be communicated with a nitrogen tube by a nitrogen stop valve 17, another is communicated with a filtrator 15 successively and is connected to a differential pressure transmitter 16 by a soft thin tracheae, and another of differential pressure transmitter 16 mouthful maintenance is communicated with atmosphere; Differential pressure transmitter 16 has a differential pressure sensing element, and this element can change the pressure signal in the burner hearth that records into electric signal exports to the control module that places body of heater 4 outsides; In addition, be provided with the flashboard 8 of adjustable openings size in air exhaust passage 10, establish air draft blower fan 7 in air exhaust passage 10 ends, air draft blower fan 7 is electrically connected with an electrical control cubicles 11.
Referring to Fig. 1, in the present invention, control module comprises the signal process box 1 that is electrically connected successively, control computer 12, signal process box 2 14 ', an and electrical control cubicles 11, the pressure signal of differential pressure transmitter acceptance test 2, through wherein sensing element pressure differential is converted to current signal and be sent to signal process box 1, signal process box 1 transfers current signal to the acceptable digital signal input of computing machine control computer 12 again, the pressure-fired value that is provided with in this numerical value and computing machine through control computer 12 compares, comparative result is exported to signal process box 2 14 with the form of digital signal, and ', by signal process box 2 14 ' sends electrical control cubicles 11 to after this digital signal is converted to analog current signal; Thereby the size of being controlled flashboard 8 openings by the rotating speed of electrical control cubicles 11 control air draft blower fans 7 keeps constant differential pressures in the body of heater 4.
Referring to Fig. 1 and Fig. 2, the reactor workflow of said structure is as follows:
Close material flow controller 1, open the feeding nitrogen of nitrogen stop valve 17 in the testing tube 2, the SiO 2 powder in the flushing line is closed stop valve 17 then;
Begin to open material flow controller 1, aerating oxygen, hydrogen and silicon tetrachloride vapor in the body of heater 4, oxyhydrogen feeds intake from body of heater 4 tops in 3 mouthfuls of burnings of burner, the silicon dioxide microparticle of formation with flow depositions in the body of heater 4 to deposited weight surface 5;
The burner hearth internal reaction carries out in the process, gas enters in the testing tube 2 in the burner hearth, the atmosphere of this gas is identical with atmosphere in the burner hearth, HCl gas in the atmosphere is filtered absorber 15 and absorbs, silica dust is filtered absorber 15 and filters (protection differential pressure transmitter 16 is not corroded), air-flow does not have differential pressure through behind the gas-particulate filter 15, stream pressure acts on differential pressure transmitter 16, differential pressure transmitter 16 calculates pressure reduction with the gaseous tension of burner hearth and the pressure of ambient atmosphere, produce an electric signal through the sensing element in the differential pressure transmitter 16 again and send signal process box 1 to, be transformed into conditioned signal through signal process box 1, conditioned signal is sent to control computer 12 through data bus 13, computing machine 12 compares conditioned signal that obtains and the pressure-fired value of wherein setting, if scope at the 1.5-3mm water column, then judge and keep pressure in the burner hearth, export a conditioned signal to signal process box 2 14 this moment ', through signal process box 2 14 ' be converted to electric signal and be delivered to electrical control cubicles 11, keep original frequency of operation by electrical control cubicles 11 control air draft blower fans 7; If computing machine 12 judged results are that differential pressure is less than the 1.5mm water column, then export another group conditioned signal (simulating signal reduces the frequency of blower fan), through signal process box 2 14 ' and electrical control cubicles 11 control air draft blower fans 7 and reduce frequency, turn down flashboard 8, the burner hearth air output is reduced, increase pressure; If computing machine 12 judged results are that differential pressure is greater than the 3mm water column, then by signal process box 2 14 ' and electrical control cubicles 11 control air draft blower fans 7 increase frequencies, open big damper 8, to increase the burner hearth air capacity, pressure is reduced.So the repetitive cycling said process just can be controlled at the pressure-fired of burner hearth in the scope that needs.
Can understand from above introduction, the present invention be by when reaction control the burner hearth gas atmosphere be efficient and the speed that pressure-fired improves quartz glass deposition.In reactor provided by the invention, open size by the flashboard 8 in the air exhaust passage 10 in the control module control body of heater 4, adjust exhaust air rate with this, thereby keep burner hearth to have constant differential pressure.Employed numerical value conversion and computing equipment are existing accessory in the control module of the present invention, wherein said differential pressure transmitter adopts the 3000SGT-0 product of U.S. Dwyer company, signal process box can adopt the ADAM8231-1BD60 industry I/O module of grinding magnificent company, signal process box 14 is with the DC simulation signal of the 4-20mA of differential pressure differential pressure transmitter 16 outputs, by low-pass filtering, amplification, become this analog signal conversion the digital signal of 0-5V to send computing machine 12 to.Electrical control cubicles adopts the Himel-CRN/CRS type Industry Control case of Shanghai Schneider Industry Control company limited, and the comparison numerical value that control computer is set is the 1.5-3.0mm water column.
In order more accurately to control furnace chamber pressure, the air exhaust passage 10 among the present invention can be established a plurality of, corresponding, flashboard and air draft blower fan also are made as a plurality of, and each is subjected to electrical control cubicles 11 controls respectively.Referring to Fig. 3 A and Fig. 3 B, when establishing a plurality of air exhaust passage, a plurality of air exhaust passages 10 are spaced in body of heater 4 bottoms, and all air exhaust passages 10 remain on same surface level, referring to Fig. 3 A; It is two-layer up and down also can all air distribution path 10s to be distributed in the body of heater bottom, and the air exhaust passage 10 in each layer is spaced, and bilevel air exhaust passage 10 staggers successively.
Through experimental verification, adopt same feeding mode and sample introduction means, utilize reactor of the present invention to carry out pressure-fired control after, quartz glass deposition efficient was brought up to 4: 1 by original about 6: 1, rate of sedimentation is brought up to about 260g/hr by original about 200g/hr.
Claims (5)
1, a kind of synthesizing quartz glass reactor controlled by micro-positive pressure, comprise a closed furnace body, place the basic rod of body of heater and the deposited weight surface of basic rod termination, described upper of furnace body is established the burner that feeds intake to deposited weight surface, air exhaust passage is established in the bottom, it is characterized in that, be provided with flashboard in the described air exhaust passage, air exhaust passage connects the air draft blower fan; Described upper of furnace body is also established one and is communicated with the inner and extraneous testing tube of body of heater, one of described test pipe furnace outer end by valve connection nitrogen tube, another is communicated with a filtrator successively and is communicated with a differential pressure transmitter by a soft thin tracheae, described differential pressure transmitter is electrically connected a control module, the described air draft blower fan of control module electric control.
2, according to the described synthesizing quartz glass reactor controlled by micro-positive pressure of claim 1, it is characterized in that, described control module comprises the signal process box one that is electrically connected successively, control computer, signal process box two, an and electrical control cubicles, differential pressure transmitter receives the pressure signal of threeway conduit, through wherein sensing element pressure differential is converted to current signal and be sent to signal process box one, signal process box one is imported control computer with conditioned signal, calculate a digital signal through control computer and export to signal process box two again, be that current signal sends electrical control cubicles to by signal process box two with digital signal transition again, thereby keep differential pressure constant in the burner hearth by the size of electrical control cubicles control air draft rotation speed of fan control flashboard opening.
According to claim 1 or 2 described synthesizing quartz glass reactor controlled by micro-positive pressure, it is characterized in that 3, described air exhaust passage, flashboard and air draft blower fan are a plurality of, and control with electrical control cubicles respectively.
According to the described synthesizing quartz glass reactor controlled by micro-positive pressure of claim 3, it is characterized in that 4, described air exhaust passage is spaced in the body of heater bottom, all air exhaust passage air ports remain on same surface level;
According to the described synthesizing quartz glass reactor controlled by micro-positive pressure of claim 3, it is characterized in that 5, every arrangement, and stagger successively up and down by the air port of air exhaust passage at body of heater lower part interlayer for described air exhaust passage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610000261 CN1811649A (en) | 2006-01-10 | 2006-01-10 | Synthesizing quartz glass reactor controlled by micro-positive pressure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610000261 CN1811649A (en) | 2006-01-10 | 2006-01-10 | Synthesizing quartz glass reactor controlled by micro-positive pressure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1811649A true CN1811649A (en) | 2006-08-02 |
Family
ID=36844610
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200610000261 Pending CN1811649A (en) | 2006-01-10 | 2006-01-10 | Synthesizing quartz glass reactor controlled by micro-positive pressure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1811649A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104926088A (en) * | 2015-07-16 | 2015-09-23 | 中国建筑材料科学研究总院 | Method for preparing highly-uniform synthetic quartz glass weight |
| CN106219949A (en) * | 2016-08-08 | 2016-12-14 | 湖北菲利华石英玻璃股份有限公司 | A kind of big specification light salts down the production method of film substrate synthetic quartz glass ingot |
| CN106810056A (en) * | 2017-03-20 | 2017-06-09 | 无锡市孚艾科技有限公司 | A kind of high purity quartz process units |
-
2006
- 2006-01-10 CN CN 200610000261 patent/CN1811649A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104926088A (en) * | 2015-07-16 | 2015-09-23 | 中国建筑材料科学研究总院 | Method for preparing highly-uniform synthetic quartz glass weight |
| CN104926088B (en) * | 2015-07-16 | 2018-04-10 | 中国建筑材料科学研究总院 | Height is uniformly synthesized the preparation method of quartz glass stone roller |
| CN106219949A (en) * | 2016-08-08 | 2016-12-14 | 湖北菲利华石英玻璃股份有限公司 | A kind of big specification light salts down the production method of film substrate synthetic quartz glass ingot |
| CN106219949B (en) * | 2016-08-08 | 2019-01-15 | 湖北菲利华石英玻璃股份有限公司 | A kind of big specification light salts down the production method of ilm substrate synthetic quartz glass ingot |
| CN106810056A (en) * | 2017-03-20 | 2017-06-09 | 无锡市孚艾科技有限公司 | A kind of high purity quartz process units |
| CN106810056B (en) * | 2017-03-20 | 2022-11-15 | 杭州永通智造科技有限公司 | High-purity quartz production device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1811649A (en) | Synthesizing quartz glass reactor controlled by micro-positive pressure | |
| KR20180095616A (en) | Preparation of silica glass body using dew point control in melting furnace | |
| US6129899A (en) | Processes for producing synthetic quartz powder and producing shaped quartz glass | |
| KR20180095623A (en) | Manufacture and post-treatment of silica glass products | |
| CA1179213A (en) | Process for producing an optical fiber preform and apparatus therefor | |
| CN1222472C (en) | High-dispersion nano silicon dioxide preparation method | |
| CN1811648A (en) | Micro-positive-pressure measuring and controlling method and system in synthetizing quartz glass | |
| CA2916122A1 (en) | Improved viewing port design for use in production of polycrystalline silicon | |
| CN1322260A (en) | Continuous oxidation process for crystal pulling apparatus | |
| CN1796286A (en) | Equipment and technique for fabricating large size CVD ZnS material in high evenness | |
| CN100351426C (en) | Chemical vapor deposition equipment | |
| CN1123544C (en) | Method of mfg. porous glass base material for optical fiber | |
| US6339940B1 (en) | Synthetic quartz glass manufacturing process | |
| CN1277773C (en) | Method for producing primary product of optic-fibre and its producing device | |
| CN102229465B (en) | Membrane oxygen-enriched combustion device of lithium aluminosilicate glass melting furnace and using method thereof | |
| CN206591033U (en) | A kind of high purity quartz process units | |
| CN106810056B (en) | High-purity quartz production device | |
| KR20200098403A (en) | Method of producing porous glass preform for optical fiber | |
| CN211170460U (en) | Flow field stabilizing device of clean reaction chamber for preform cladding deposition | |
| CN1397507A (en) | Equipment for producing glass particle deposition | |
| JP3651129B2 (en) | Optical fiber preform manufacturing apparatus and manufacturing method | |
| CN207775078U (en) | Control capacity glass granules deposition efficiency makeup based on OVD is set | |
| CN1689999A (en) | Production method of low-hydroxylic quartz tube capable of filtering ultraviolet rays | |
| CN113354263B (en) | Method and equipment for producing synthetic quartz glass | |
| CN111018338A (en) | Gas seal device of VAD sintering furnace core pipe and application thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| AD01 | Patent right deemed abandoned | ||
| C20 | Patent right or utility model deemed to be abandoned or is abandoned |