CN1806067A - Copper electrolytic solution containing polymer having dialkylamino group of specified structure and organic sulfur compound as additive and electrolytic copper foil produced therewith - Google Patents

Copper electrolytic solution containing polymer having dialkylamino group of specified structure and organic sulfur compound as additive and electrolytic copper foil produced therewith Download PDF

Info

Publication number
CN1806067A
CN1806067A CN200480016822.3A CN200480016822A CN1806067A CN 1806067 A CN1806067 A CN 1806067A CN 200480016822 A CN200480016822 A CN 200480016822A CN 1806067 A CN1806067 A CN 1806067A
Authority
CN
China
Prior art keywords
copper foil
compound
electrolytic
additive
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN200480016822.3A
Other languages
Chinese (zh)
Other versions
CN1806067B (en
Inventor
土田克之
熊谷正志
花房干夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JX Nippon Mining and Metals Corp
Original Assignee
Nikko Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikko Materials Co Ltd filed Critical Nikko Materials Co Ltd
Publication of CN1806067A publication Critical patent/CN1806067A/en
Application granted granted Critical
Publication of CN1806067B publication Critical patent/CN1806067B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • C25D1/04Wires; Strips; Foils
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25CPROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/12Electrolytic production, recovery or refining of metals by electrolysis of solutions of copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25CPROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C3/00Electrolytic production, recovery or refining of metals by electrolysis of melts
    • C25C3/06Electrolytic production, recovery or refining of metals by electrolysis of melts of aluminium
    • C25C3/18Electrolytes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Laminated Bodies (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

An electrolytic copper foil of low profile whose surface roughness on the rough surface side (side opposite to shiny surface) in the electrolytic copper foil production using a cathode drum is low, which electrolytic copper foil can especially realize fine pattern formation and excels in extensibility and tensile strength at ordinary and high temperatures. In particular, there are provided a copper electrolytic solution comprising as additives a polymer having dialkylamino group, this polymer obtained by carrying out homopolymerization of an acrylic compound having dialkylamino group or copolymerization thereof with another compound having unsaturated bond, and an organic sulfur compound; and an electrolytic copper foil produced with the electrolytic solution.

Description

Contain polymkeric substance that contains dialkyl amido with specific skeleton and organosulfur compound as the copper electrolyte of additive and the electrolytic copper foil of making by this electrolytic solution
Technical field
The present invention relates to the copper electrolyte that in the manufacturing of electrolytic copper foil, uses, particularly be used to make the copper electrolyte of the electrolytic copper foil that can realize fine patterning, the elongation when normal temperature and high temperature and tensile strength excellence.
Background technology
Generally when making electrolytic copper foil, be to use the metal system negative electrode rotating cylinder of the rotation of glazed surface, with the insoluble petal anode (anode) around this negative electrode rotating cylinder of encirclement of cardinal principle lower part position configuration of this negative electrode rotating cylinder, copper electrolyte is flowed between above-mentioned negative electrode rotating cylinder and anode, simultaneously between them, apply potential difference, make copper galvanic deposit on the negative electrode rotating cylinder, when reaching specific thickness, peel off the copper of galvanic deposit, manufacturing copper foil continuously from this negative electrode rotating cylinder.
The Copper Foil that obtains although it is so is commonly referred to as living paper tinsel, but implements surface treatment several times thereafter, can be used for printed circuit board etc.
The summary of existing Copper Foil manufacturing installation as shown in Figure 1.This electrolytic copper foil device in accommodating the electrolyzer of electrolytic solution, is provided with negative electrode rotating cylinder 1.This negative electrode rotating cylinder 1 is with the state rotation of part in electrolytic solution (lower part substantially) dipping.
Mode with the periphery lower part of surrounding this negative electrode rotating cylinder 1 is provided with insoluble anode (anode) 2.Between this negative electrode rotating cylinder 1 and the anode 2 certain clearance 3 is arranged, electrolytic solution betwixt flows.Dispose 2 positive plates in the device of Fig. 1.
Constitute in the device of this Fig. 1, supply with electrolytic solution from the below, this electrolytic solution flows through the gap 3 of negative electrode rotating cylinder 1 and anode 2, overflow from the upper limb of anode 2, and then this circulation of elecrolyte.Between negative electrode rotating cylinder 1 and anode 2, insert rectifier, can between keep the voltage of regulation.
Along with the rotation of negative electrode rotating cylinder 1, the copper thickness of galvanic deposit increases from electrolytic solution, when reaching more than or equal to certain thickness, peels off this life paper tinsel 4, and batches continuously.The livings paper tinsel that manufactures of operation like this, the flow velocity of the electrolytic solution by the distance between adjustment negative electrode rotating cylinder 1 and the anode 2, supply or the electric weight of supply can be adjusted thickness.
With the Copper Foil that such electrolytic copper foil manufacturing installation produces, the face that contacts with the negative electrode rotating cylinder becomes minute surface, and the face of opposition side becomes irregular uneven surface.In common electrolysis, exist the concavo-convex fluctuating of this uneven surface very big, the problem of undercut, fine patterning difficulty takes place during etching easily.
In addition, follow the densification of printed circuit board recently, people require to follow narrow and smallization of circuit width, the Copper Foil that multiple stratification can realize fine patterning gradually.In order to realize this fine patterning, need have the deliquescent Copper Foil of etching speed and homogeneous, i.e. the Copper Foil of etching characteristic excellence.
On the other hand, printed circuit board is with Copper Foil desired performance, the elongation when being not only normal temperature, and the high temperature elongation characteristics of the crackle that also requires to be used to prevent that thermal stresses from causing, and then require to be used to obtain the high-tensile of the dimensional stability of printed circuit board.But as mentioned above, there is the problem that is not suitable for above-mentioned fine patterning fully in the big Copper Foil of concavo-convex fluctuating of above-mentioned uneven surface.The low sectionization of uneven surface thus begins one's study.
Known generally in order to realize this low sectionization, can realize by in electrolytic solution, adding a large amount of glue, thiocarbamides.
But the problem that the elongation when such additive existence can cause normal temperature and high temperature sharply descends, reduce greatly with the performance of Copper Foil as printed circuit board.
Summary of the invention
Problem of the present invention is, in the electrolytic copper foil that has used the negative electrode rotating cylinder is made, obtain the little low section electrolytic copper foil of surfaceness of uneven surface side (opposition side of light face), particularly obtain to realize the electrolytic copper foil of fine patterning and then elongation when normal temperature and high temperature and tensile strength excellence.
Present inventors find, by add the only additive that can realize low sectionization in electrolytic solution, can obtain to realize the electrolytic copper foil of fine patterning, the elongation when normal temperature and high temperature and tensile strength excellence.
Present inventors are based on this knowledge, copper electrolyte circulates between negative electrode rotating cylinder and anode, make copper electrodeposition on the negative electrode rotating cylinder, the Copper Foil of galvanic deposit is peeled off from this negative electrode rotating cylinder, continuously in the electrolytic copper foil manufacture method of manufacturing copper foil, contain the polymkeric substance that contains dialkyl amido and the copper electrolyte of organosulfur compound carries out electrolysis by use with specific skeleton, can obtain to realize the electrolytic copper foil of fine patterning, the elongation when normal temperature and high temperature and tensile strength excellence, thereby finish the present invention.
That is, the present invention is made of following.
[1] a kind of copper electrolyte, it contains: contain the polymkeric substance of dialkyl amido and organosulfur compound as additive, described polymkeric substance is by making the acrylic compounds with dialkyl amido carry out homopolymerization or obtain with other compound copolymerization with unsaturated link(age).
As [1] described copper electrolyte, it is characterized in that [2] above-mentioned acrylic compounds with dialkyl amido is with following general formula (1), (2) or (3) expression,
(in general formula (1)~(3), R 1The alkyl of expression hydrogen or carbonatoms 1~5, R 2And R 3The alkyl of representing carbonatoms 1~5 respectively, n are represented 1~5 integer).
As [1] described copper electrolyte, it is characterized in that [3] above-mentioned organosulfur compound is the compound shown in following general formula (4) or (5),
X-R 1-(S) n-R 2-Y (4)
R 4-S-R 3-SO 3Z (5)
(in general formula (4) and (5), R 1, R 2And R 3Be the alkylidene group of carbonatoms 1~8, R 4Be selected from hydrogen,
, X is selected from hydrogen, sulfonic group, phosphonate group, sulfonic acid or phosphonic basic metal alkali or ammonium salt base, and Y is selected from sulfonic group, phosphonate group, sulfonic acid or phosphonic basic metal alkali, and Z is hydrogen or basic metal, n is 2 or 3).
[4] a kind of electrolytic copper foil is to use the described copper electrolyte of each of above-mentioned [1]~[3] to make.
[5] a kind of copper plate pressing plate is to use above-mentioned [4] described electrolytic copper foil to make.
Description of drawings
As described, Fig. 1 is the diagrammatic illustration figure of existing Copper Foil manufacturing installation.This electrolytic copper foil device is provided with negative electrode rotating cylinder 1 in accommodating the electrolyzer of electrolytic solution.This negative electrode rotating cylinder 1 is with the state rotation of part in electrolytic solution (lower part substantially) dipping.
Mode with the periphery lower part of surrounding this negative electrode rotating cylinder 1 is provided with insoluble anode (anode) 2.Between this negative electrode rotating cylinder 1 and the anode 2 certain clearance 3 is arranged, electrolytic solution betwixt flows.Dispose 2 positive plates in the device of Fig. 1.
Embodiment
In the present invention importantly, contain in electrolytic solution: contain the polymkeric substance and the organosulfur compound of dialkyl amido, described polymkeric substance is by making the acrylic compounds with dialkyl amido carry out homopolymerization or obtain with other compound copolymerization that contain unsaturated link(age).Only add anyly, all can not realize purpose of the present invention.
As the acrylic compounds among the present invention with dialkyl amido, can list, have dialkyl amido acrylic compound, have the methacrylic compound of dialkyl amido etc., be included in the compound that is combined with alkyl on the carbon of the vinyl inside in the compound.As acrylic compounds with dialkyl amido, the compound shown in preferred following general formula (1)~(3).
(in general formula (1)~(3), R 1The alkyl of expression hydrogen or carbonatoms 1~5, R 2And R 3The alkyl of expression carbonatoms 1~5, n represents 1~5 integer.)
As R 1, preferred hydrogen or methyl are as R 2, R 3Alkyl, preferable methyl or the ethyl of carbonatoms 1~5.
As the compound shown in above-mentioned general formula (1)~(3), for example can use, vinylformic acid dimethylamino ethyl ester, diethyl aminoethyl methacrylate, dimethylaminoethyl methacrylate, N, N-diethyl acrylamide, N, N-DMAA, N, N-dimethylaminopropyl acrylamide, N, N-dimethylaminopropyl Methacrylamide etc.
The polymkeric substance that contains dialkyl amido with specific skeleton is by making these acrylic compounds that contain dialkyl amido carry out homopolymerization or obtain with other the compound copolymerization that contains unsaturated link(age).
When carrying out homopolymerization, preferably with water as solvent, use potassium peroxydisulfate, the such radical initiator of peroxo disulfate acid ammonium as polymerization starter.
In addition, when carrying out copolymerization with other compounds that contain unsaturated link(age) other have the compound of unsaturated link(age), it is the unsaturated compound of copolymerization, as preferred compound, can list vinylformic acid 2-hydroxyethyl ester, vinylformic acid 2-hydroxy-propyl ester, methacrylic acid 2-hydroxyethyl ester etc.
The weight-average molecular weight that contains the alkylamino polymkeric substance as obtaining by homopolymerization or copolymerization is preferably 1000~500000.
Fully do not finish though respond, the situation of monomer residue, if the residual monomer mol ratio smaller or equal to 40%, so promptly use and monomeric mixture, also no problem on characteristic.
In addition, organosulfur compound is preferably the compound of the structural formula with above-mentioned general formula (4) or (5).
As the organosulfur compound shown in the above-mentioned general formula (4), can enumerate and preferably use for example following compound.
H 2O 3P-(CH 2) 3-S-S-(CH 2) 3-PO 3H 2
HO 3S-(CH 2) 4-S-S-(CH 2) 4-SO 3H
NaO 3S-(CH 2) 3-S-S-(CH 2) 3-SO 3Na
HO 3S-(CH 2) 2-S-S-(CH 2) 2-SO 3H
CH 3-S-S-CH 2-SO 3H
NaO 3S-(CH 2) 3-S-S-S-(CH 2) 3-SO 3Na
(CH 3) 2CH-S-S-(CH 2) 2-SO 3H
In addition, as the organosulfur compound shown in the above-mentioned general formula (5), can enumerate and preferably use for example following compound.
HS-CH 2CH 2CH 2-SO 3Na
HS-CH 2CH 2-SO 3Na
Figure A20048001682200091
The polymkeric substance that contains dialkyl amido in the copper electrolyte and the ratio of organosulfur compound in weight ratio, are preferably 1: 5~5: 1, more preferably 1: 2~2: 1.The concentration of polymkeric substance in copper electrolyte that contains dialkyl amido is preferably 1~200ppm.
In copper electrolyte, except the above-mentioned polymkeric substance and organosulfur compound that contains dialkyl amido, can also add the known additive such as polyether compound, polymine, phenazine dyes, glue, Mierocrystalline cellulose of polyoxyethylene glycol, polypropylene glycol etc.
In addition, lamination the electrolytic copper foil of the present invention and copper plate pressing plate that obtains becomes the copper plate pressing plate that can realize fine patterning and elongation when normal temperature and high temperature and tensile strength excellence.
Embodiment
Enumerate embodiment below, the present invention is described in more detail.
The synthesis example 1 that contains the dialkyl amino based polyalcohol
With the N of 50g, N-dimethylaminopropyl acrylamide is dissolved in the 50g ion exchanged water, to wherein adding the 0.5g potassium peroxydisulfate, under nitrogen atmosphere, 60 ℃ of polyreactions 3 hours.The compound that obtains is the mixture that contains dialkyl amino based polyalcohol (I) (weight-average molecular weight 8500) and monomer whose shown in the following chemical formula, and the monomer containing ratio is 20~30%.
Figure A20048001682200101
The synthesis example 2 that contains the dialkyl amino based polyalcohol
Except the N with above-mentioned synthesis example 1, N-dimethylaminopropyl acrylamide becomes beyond the dimethylaminoethyl methacrylate, uses with the same method of synthesis example 1 and carries out polymerization.The compound that obtains is the mixture that contains dialkyl amino based polyalcohol (II) (weight-average molecular weight 4500) and monomer whose shown in the following chemical formula, and the monomer containing ratio is about 6%.
Figure A20048001682200111
The synthesis example 3 that contains the dialkyl amino based polyalcohol
Except the N with above-mentioned synthesis example 1, N-dimethylaminopropyl acrylamide becomes beyond the N,N-DMAA, uses with the same method of synthesis example 1 and carries out polymerization.The compound that obtains is the mixture that contains dialkyl amino based polyalcohol (III) (weight-average molecular weight 9200) and monomer whose shown in the following chemical formula, and the monomer containing ratio is about 10%.
Embodiment 1~6 and comparative example 1~5
Use electrolytic copper foil manufacturing installation as shown in Figure 1, produce the electrolytic copper foil of thickness 35 μ m.Electrolytic solution composed as follows.
Cu: 90g/L
H 2SO 4: 80g/L
Cl: 60ppm
Polyoxyethylene glycol (PEG): 20mg/L or 0mg/L
Fluid temperature: 55~57 ℃
Additive A: two (3-sulfo group propyl group) sodium disulfide
(the system SPS of RASCHIG society)
Additive B 1: the dialkyl group that contains that above-mentioned synthesis example 1 obtains with ad hoc structure
Amino polymeric blends
Additive B 2: the dialkyl group that contains that above-mentioned synthesis example 2 obtains with ad hoc structure
Amino polymeric blends
Additive B 3: the dialkyl group that contains that above-mentioned synthesis example 3 obtains with ad hoc structure
Amino polymeric blends
The surfaceness Rz of the electrolytic copper foil that obtains (μ m) is a standard with JIS B 0601, normal temperature elongation (%), room temperature tensile strength (kgf/mm 2), high temperature elongation (%), high temperature tensile strength (kgf/mm 2) be standard with IPC-TM650, measure.The result is shown in table 1~table 3.
Table 1
PEG (mg/L) Additive A (mg/L) Additive B 1 (mg/L) Rz (μm) Normal temperature elongation (%) Room temperature tensile strength (kgf/mm 2) High temperature elongation (%) High temperature tensile strength (kgf/mm 2)
Embodiment 1 20 50 100 0.98 11.0 34.8 15.0 20.9
Embodiment 2 0 50 100 0.75 9.7 37.0 16.2 20.8
Comparative example 1 20 0 0 5.5 9.85 35.2 12.3 19.8
Comparative example 2 20 0 100 5.8 0.8 13.2 1.5 14.3
Comparative example 3 20 50 0 5.1 0.2 10.6 2.9 12.6
Table 2
PEG (mg/L) Additive A (mg/L) Additive B 2 (mg/L) Rz (μm) Normal temperature elongation (%) Room temperature tensile strength (kgf/mm 2) High temperature elongation (%) High temperature tensile strength (kgf/mm 2)
Embodiment 3 20 50 100 0.88 10.5 36.2 15.8 20.5
Embodiment 4 0 50 100 0.91 9.5 35.5 15.7 20.7
Comparative example 4 20 0 100 5.4 0.5 9.9 3.2 13.2
Table 3
PEG (mg/L) Additive A (mg/L) Additive B 3 (mg/L) Rz (μm) Normal temperature elongation (%) Room temperature tensile strength (kgf/mm 2) High temperature elongation (%) High temperature tensile strength (kgf/mm 2)
Embodiment 5 20 50 100 0.82 10.0 35.2 16.0 20.8
Embodiment 6 0 50 100 0.82 10.8 35.4 15.8 20.6
Comparative example 5 20 0 100 5.3 0.6 11.4 2.6 12.8
Shown in above-mentioned table 1~3, in the embodiment 1~6 that has added additive of the present invention (polymkeric substance that contains dialkyl amido and organosulfur compound with ad hoc structure), surfaceness Rz is that 0.75~0.98 μ m, normal temperature elongation are 9.5~11.0%, room temperature tensile strength is 34.8~37.0kgf/mm 2, the high temperature elongation is 15.0~16.2%, high temperature tensile strength is 20.5~20.9kgf/mm 2Though can realize significant so low sectionization, normal temperature elongation, room temperature tensile strength, high temperature elongation, high temperature tensile strength and the comparative example 1 that does not add any additives are compared, and show equal excellent specific property.Relative therewith, do not having the comparative example 1 that adds and only adding in a kind of comparative example 2~5 of additive, can not realize low sectionization.In addition, when only adding a kind of additive, normal temperature elongation, room temperature tensile strength, high temperature elongation, high temperature tensile strength are bad on the contrary.
The industry utilizability
As known from the above, the copper electrolyte that contains dialkyl amino based polyalcohol and organosulfur compound with ad hoc structure that added of the present invention, has following excellent specific property, namely, low sectionization to the matsurface of resulting electrolytic copper foil is very effective, percentage elongation in the time of not only can effectively keeping normal temperature in addition also can effectively be kept high temperature percentage elongation characteristic, further also can obtain equally high-tensile. In addition, above-mentioned common interpolation is important, just can obtain above-mentioned characteristic thus.
In addition, utilize electrolytic copper foil of the present invention, can obtain being suitable for the copper-clad laminate of low section by conventional method.

Claims (5)

1. copper electrolyte, it contains: contain the polymkeric substance of dialkyl amido and organosulfur compound as additive, this polymkeric substance is by making the acrylic compounds with dialkyl amido carry out homopolymerization or obtain with other the compound copolymerization that contains unsaturated link(age).
2. copper electrolyte as claimed in claim 1 is characterized in that, above-mentioned acrylic compounds with dialkyl amido is with following general formula (1), (2) or (3) expression,
Figure A2004800168220002C3
(in general formula (1)~(3), R 1The alkyl of expression hydrogen or carbonatoms 1~5, R 2And R 3The alkyl of representing carbonatoms 1~5 respectively, n are represented 1~5 integer).
3. copper electrolyte as claimed in claim 1 is characterized in that, above-mentioned organosulfur compound is the compound with following general formula (4) or (5) expression,
X-R 1-(S) x-R 2-Y (4)
R 4-S-R 3-SO 3Z (5)
(in general formula (4) and (5), R 1, R 2And R 3Be the alkylidene group of carbonatoms 1~8, R 4Be selected from hydrogen,
, X is selected from hydrogen, sulfonic group, phosphonate group, sulfonic acid or phosphonic basic metal alkali or ammonium salt base, and Y is selected from sulfonic group, phosphonate group, sulfonic acid or phosphonic basic metal alkali, and Z is hydrogen or basic metal, n is 2 or 3).
4. electrolytic copper foil is to use each described copper electrolyte of claim 1~3 to make.
5. a copper plate pressing plate is to use the described electrolytic copper foil of claim 4 to make.
CN200480016822.3A 2003-07-29 2004-06-16 Copper electrolytic solution containing polymer having dialkylamino group of specified structure and organic sulfur compound as additive and electrolytic copper foil produced therewith Expired - Lifetime CN1806067B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003202920 2003-07-29
JP202920/2003 2003-07-29
PCT/JP2004/008791 WO2005010239A1 (en) 2003-07-29 2004-06-16 Copper electrolytic solution containing polymer having dialkylamino group of specified structure and organic sulfur compound as additive and electrolytic copper foil produced therewith

Publications (2)

Publication Number Publication Date
CN1806067A true CN1806067A (en) 2006-07-19
CN1806067B CN1806067B (en) 2010-06-16

Family

ID=34100616

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200480016822.3A Expired - Lifetime CN1806067B (en) 2003-07-29 2004-06-16 Copper electrolytic solution containing polymer having dialkylamino group of specified structure and organic sulfur compound as additive and electrolytic copper foil produced therewith

Country Status (5)

Country Link
JP (1) JP4255130B2 (en)
KR (1) KR100729061B1 (en)
CN (1) CN1806067B (en)
TW (1) TWI250226B (en)
WO (1) WO2005010239A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104854265A (en) * 2012-11-26 2015-08-19 德国艾托特克公司 Copper plating bath composition
TWI649455B (en) * 2013-09-11 2019-02-01 古河電氣工業股份有限公司 Electrolytic copper foil, flexible circuit board and battery

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5329715B2 (en) 2010-11-15 2013-10-30 Jx日鉱日石金属株式会社 Electrolytic copper foil
KR102377286B1 (en) 2017-03-23 2022-03-21 에스케이넥실리스 주식회사 Electrodeposited copper foil, current collectors for negative electrode of lithium-ion secondary batteries and lithium-ion secondary batteries

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57114685A (en) * 1981-01-07 1982-07-16 Kuraray Co Ltd Brightener for plating bath
JP3313277B2 (en) * 1995-09-22 2002-08-12 古河サーキットフォイル株式会社 Electrodeposited copper foil for fine pattern and its manufacturing method
US5863410A (en) * 1997-06-23 1999-01-26 Circuit Foil Usa, Inc. Process for the manufacture of high quality very low profile copper foil and copper foil produced thereby
JP3506411B2 (en) * 1997-12-29 2004-03-15 日本表面化学株式会社 Zinc plating method
LU90532B1 (en) * 2000-02-24 2001-08-27 Circuit Foil Luxembourg Trading Sarl Comosite copper foil and manufacturing method thereof
KR100389061B1 (en) * 2002-11-14 2003-06-25 일진소재산업주식회사 Electrolytic copper foil and process producing the same
JP4083171B2 (en) * 2002-12-25 2008-04-30 日鉱金属株式会社 Copper electrolyte containing quaternary amine compound polymer having specific skeleton and organic sulfur compound as additive, and electrolytic copper foil produced thereby

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104854265A (en) * 2012-11-26 2015-08-19 德国艾托特克公司 Copper plating bath composition
US9551080B2 (en) 2012-11-26 2017-01-24 Atotech Deutschland Gmbh Copper plating bath composition
CN104854265B (en) * 2012-11-26 2017-08-08 德国艾托特克公司 Electroless copper bath composition
TWI649455B (en) * 2013-09-11 2019-02-01 古河電氣工業股份有限公司 Electrolytic copper foil, flexible circuit board and battery

Also Published As

Publication number Publication date
KR20060026963A (en) 2006-03-24
WO2005010239A1 (en) 2005-02-03
TWI250226B (en) 2006-03-01
JP4255130B2 (en) 2009-04-15
KR100729061B1 (en) 2007-06-14
CN1806067B (en) 2010-06-16
TW200506097A (en) 2005-02-16
JPWO2005010239A1 (en) 2006-09-07

Similar Documents

Publication Publication Date Title
CN1293235C (en) Copper electrolyte comprising amine compound having specific skeleton and organic sulfur compound and electrolytic copper foil prepared using the same
CN1244720C (en) Plating method of electrocytic copper
JP4273309B2 (en) Low rough surface electrolytic copper foil and method for producing the same
CN1500915A (en) Electrolyte solution for manufacturing electrolytic copper foil and electrolytic copper foil manufacturing method using the same
CN1170963C (en) Cyanide-free monovalent copper eletroplating solutions
CN1564881A (en) Copper electrolytic solution containing quaternary amine compound having specific skeleton and organic sulfur compound as additives, and electrolytic copper foil produced therefrom
CN1202697C (en) Method for filling through hole
CN1564880A (en) Copper electrolytic solution containing quaternary amine compound having specific skeleton and organic sulfur compound as additives, and electrolytic copper foil produced therefrom
CN1612951A (en) Direct electrolytic metallization of non-conducting substrate
JP5595301B2 (en) Copper electrolyte
CN1940146A (en) Leveler compounds
CN1726309A (en) Copper electrolytic solution and electrolytic copper foil produced therewith
JP2004339558A5 (en)
CN1764744A (en) Electrolytic copper foil with low roughness surface and process for producing the same
CN1854347A (en) Low roughness copper foil with high strength and manufacture thereof
CN1337475A (en) Method for making electrodeposited cooper foil and electrodeposited cooper foil
CN1220709A (en) Alkoxylated dimercaptans as copper additives
CN1715457A (en) Surface coarsening method and surface coarsening liquid for copper foil
CN1292432A (en) Electro-deposition copper foil and its manufacturing method
CN1806067A (en) Copper electrolytic solution containing polymer having dialkylamino group of specified structure and organic sulfur compound as additive and electrolytic copper foil produced therewith
CN1311103C (en) Method for electroplating electrode of ceramic wafer electronic component
CN1799294A (en) Process for filling micro-blind vias
CN1314839C (en) Copper bath capable of depositing lackluster copper coat and method thereof
CN1757798A (en) Propanetriol non-cyanide bright copper plating liquid
CN1441086A (en) Nickel electric plating liquid

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
ASS Succession or assignment of patent right

Owner name: NIPPON MINING HOLDINGS INC.

Free format text: FORMER OWNER: NIPPON MINING + METALS CO., LTD.

Effective date: 20140512

C41 Transfer of patent application or patent right or utility model
C56 Change in the name or address of the patentee

Owner name: JX NIPPON MINING + METALS CORPORATION

Free format text: FORMER NAME: NIPPON MINING HOLDINGS INC.

CP01 Change in the name or title of a patent holder

Address after: Tokyo, Japan

Patentee after: JX Nippon Mining & Metals Corp.

Address before: Tokyo, Japan

Patentee before: Nippon Mining Holdings Inc.

TR01 Transfer of patent right

Effective date of registration: 20140512

Address after: Tokyo, Japan

Patentee after: Nippon Mining Holdings Inc.

Address before: Tokyo, Japan

Patentee before: Nippon Mining & Metals Co.,Ltd.

CP01 Change in the name or title of a patent holder

Address after: Tokyo, Japan

Patentee after: JX NIPPON MINING & METALS Corp.

Address before: Tokyo, Japan

Patentee before: JX Nippon Mining & Metals Corp.

CP01 Change in the name or title of a patent holder
CP02 Change in the address of a patent holder

Address after: No.4, 10-fan, erdingmu, huzhimen, Tokyo, Japan

Patentee after: JX NIPPON MINING & METALS Corp.

Address before: Tokyo, Japan

Patentee before: JX NIPPON MINING & METALS Corp.

CP02 Change in the address of a patent holder