CN1806067A - Copper electrolytic solution containing polymer having dialkylamino group of specified structure and organic sulfur compound as additive and electrolytic copper foil produced therewith - Google Patents
Copper electrolytic solution containing polymer having dialkylamino group of specified structure and organic sulfur compound as additive and electrolytic copper foil produced therewith Download PDFInfo
- Publication number
- CN1806067A CN1806067A CN200480016822.3A CN200480016822A CN1806067A CN 1806067 A CN1806067 A CN 1806067A CN 200480016822 A CN200480016822 A CN 200480016822A CN 1806067 A CN1806067 A CN 1806067A
- Authority
- CN
- China
- Prior art keywords
- copper foil
- compound
- electrolytic
- additive
- copper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 69
- 239000011889 copper foil Substances 0.000 title claims abstract description 41
- 239000010949 copper Substances 0.000 title claims abstract description 29
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 28
- 239000000654 additive Substances 0.000 title claims abstract description 22
- 150000002898 organic sulfur compounds Chemical class 0.000 title claims abstract description 16
- 230000000996 additive effect Effects 0.000 title claims description 20
- 239000008151 electrolyte solution Substances 0.000 title abstract description 18
- 125000004663 dialkyl amino group Chemical group 0.000 title abstract description 10
- 229920000642 polymer Polymers 0.000 title abstract 3
- 150000001875 compounds Chemical class 0.000 claims abstract description 22
- -1 acrylic compound Chemical class 0.000 claims abstract description 9
- 238000007334 copolymerization reaction Methods 0.000 claims abstract description 8
- 125000003368 amide group Chemical group 0.000 claims description 19
- 239000003792 electrolyte Substances 0.000 claims description 18
- 239000000126 substance Substances 0.000 claims description 17
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 239000001257 hydrogen Substances 0.000 claims description 10
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 229910052728 basic metal Inorganic materials 0.000 claims description 6
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical group OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 4
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical group OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 4
- 239000003513 alkali Substances 0.000 claims description 4
- 150000003818 basic metals Chemical class 0.000 claims description 4
- 238000003825 pressing Methods 0.000 claims description 4
- 125000001118 alkylidene group Chemical group 0.000 claims description 2
- 150000003863 ammonium salts Chemical class 0.000 claims description 2
- 239000002585 base Substances 0.000 claims description 2
- 150000002431 hydrogen Chemical group 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 9
- 230000007261 regionalization Effects 0.000 abstract 1
- 230000003746 surface roughness Effects 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 description 10
- 238000003786 synthesis reaction Methods 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- 238000000059 patterning Methods 0.000 description 9
- 239000000178 monomer Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- 150000005846 sugar alcohols Polymers 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- 238000009434 installation Methods 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 3
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 2
- 235000019394 potassium persulphate Nutrition 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VEPOHXYIFQMVHW-XOZOLZJESA-N 2,3-dihydroxybutanedioic acid (2S,3S)-3,4-dimethyl-2-phenylmorpholine Chemical compound OC(C(O)C(O)=O)C(O)=O.C[C@H]1[C@@H](OCCN1C)c1ccccc1 VEPOHXYIFQMVHW-XOZOLZJESA-N 0.000 description 1
- SJIXRGNQPBQWMK-UHFFFAOYSA-N 2-(diethylamino)ethyl 2-methylprop-2-enoate Chemical compound CCN(CC)CCOC(=O)C(C)=C SJIXRGNQPBQWMK-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- JNDVNJWCRZQGFQ-UHFFFAOYSA-N 2-methyl-N,N-bis(methylamino)hex-2-enamide Chemical compound CCCC=C(C)C(=O)N(NC)NC JNDVNJWCRZQGFQ-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 208000037656 Respiratory Sounds Diseases 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000003282 alkyl amino group Chemical group 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 150000002500 ions Chemical group 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- DFENKTCEEGOWLB-UHFFFAOYSA-N n,n-bis(methylamino)-2-methylidenepentanamide Chemical compound CCCC(=C)C(=O)N(NC)NC DFENKTCEEGOWLB-UHFFFAOYSA-N 0.000 description 1
- OVHHHVAVHBHXAK-UHFFFAOYSA-N n,n-diethylprop-2-enamide Chemical compound CCN(CC)C(=O)C=C OVHHHVAVHBHXAK-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000005385 peroxodisulfate group Chemical group 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- SRRKNRDXURUMPP-UHFFFAOYSA-N sodium disulfide Chemical compound [Na+].[Na+].[S-][S-] SRRKNRDXURUMPP-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000013517 stratification Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 210000001364 upper extremity Anatomy 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
- C25C1/12—Electrolytic production, recovery or refining of metals by electrolysis of solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C3/00—Electrolytic production, recovery or refining of metals by electrolysis of melts
- C25C3/06—Electrolytic production, recovery or refining of metals by electrolysis of melts of aluminium
- C25C3/18—Electrolytes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Laminated Bodies (AREA)
- Electrolytic Production Of Metals (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
PEG (mg/L) | Additive A (mg/L) | Additive B 1 (mg/L) | Rz (μm) | Normal temperature elongation (%) | Room temperature tensile strength (kgf/mm 2) | High temperature elongation (%) | High temperature tensile strength (kgf/mm 2) | |
Embodiment 1 | 20 | 50 | 100 | 0.98 | 11.0 | 34.8 | 15.0 | 20.9 |
Embodiment 2 | 0 | 50 | 100 | 0.75 | 9.7 | 37.0 | 16.2 | 20.8 |
Comparative example 1 | 20 | 0 | 0 | 5.5 | 9.85 | 35.2 | 12.3 | 19.8 |
Comparative example 2 | 20 | 0 | 100 | 5.8 | 0.8 | 13.2 | 1.5 | 14.3 |
Comparative example 3 | 20 | 50 | 0 | 5.1 | 0.2 | 10.6 | 2.9 | 12.6 |
PEG (mg/L) | Additive A (mg/L) | Additive B 2 (mg/L) | Rz (μm) | Normal temperature elongation (%) | Room temperature tensile strength (kgf/mm 2) | High temperature elongation (%) | High temperature tensile strength (kgf/mm 2) | |
Embodiment 3 | 20 | 50 | 100 | 0.88 | 10.5 | 36.2 | 15.8 | 20.5 |
Embodiment 4 | 0 | 50 | 100 | 0.91 | 9.5 | 35.5 | 15.7 | 20.7 |
Comparative example 4 | 20 | 0 | 100 | 5.4 | 0.5 | 9.9 | 3.2 | 13.2 |
PEG (mg/L) | Additive A (mg/L) | Additive B 3 (mg/L) | Rz (μm) | Normal temperature elongation (%) | Room temperature tensile strength (kgf/mm 2) | High temperature elongation (%) | High temperature tensile strength (kgf/mm 2) | |
Embodiment 5 | 20 | 50 | 100 | 0.82 | 10.0 | 35.2 | 16.0 | 20.8 |
Embodiment 6 | 0 | 50 | 100 | 0.82 | 10.8 | 35.4 | 15.8 | 20.6 |
Comparative example 5 | 20 | 0 | 100 | 5.3 | 0.6 | 11.4 | 2.6 | 12.8 |
Claims (5)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003202920 | 2003-07-29 | ||
JP202920/2003 | 2003-07-29 | ||
PCT/JP2004/008791 WO2005010239A1 (en) | 2003-07-29 | 2004-06-16 | Copper electrolytic solution containing polymer having dialkylamino group of specified structure and organic sulfur compound as additive and electrolytic copper foil produced therewith |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1806067A true CN1806067A (en) | 2006-07-19 |
CN1806067B CN1806067B (en) | 2010-06-16 |
Family
ID=34100616
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200480016822.3A Expired - Lifetime CN1806067B (en) | 2003-07-29 | 2004-06-16 | Copper electrolytic solution containing polymer having dialkylamino group of specified structure and organic sulfur compound as additive and electrolytic copper foil produced therewith |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP4255130B2 (en) |
KR (1) | KR100729061B1 (en) |
CN (1) | CN1806067B (en) |
TW (1) | TWI250226B (en) |
WO (1) | WO2005010239A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104854265A (en) * | 2012-11-26 | 2015-08-19 | 德国艾托特克公司 | Copper plating bath composition |
TWI649455B (en) * | 2013-09-11 | 2019-02-01 | 古河電氣工業股份有限公司 | Electrolytic copper foil, flexible circuit board and battery |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5329715B2 (en) | 2010-11-15 | 2013-10-30 | Jx日鉱日石金属株式会社 | Electrolytic copper foil |
KR102377286B1 (en) | 2017-03-23 | 2022-03-21 | 에스케이넥실리스 주식회사 | Electrodeposited copper foil, current collectors for negative electrode of lithium-ion secondary batteries and lithium-ion secondary batteries |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57114685A (en) * | 1981-01-07 | 1982-07-16 | Kuraray Co Ltd | Brightener for plating bath |
JP3313277B2 (en) * | 1995-09-22 | 2002-08-12 | 古河サーキットフォイル株式会社 | Electrodeposited copper foil for fine pattern and its manufacturing method |
US5863410A (en) * | 1997-06-23 | 1999-01-26 | Circuit Foil Usa, Inc. | Process for the manufacture of high quality very low profile copper foil and copper foil produced thereby |
JP3506411B2 (en) * | 1997-12-29 | 2004-03-15 | 日本表面化学株式会社 | Zinc plating method |
LU90532B1 (en) * | 2000-02-24 | 2001-08-27 | Circuit Foil Luxembourg Trading Sarl | Comosite copper foil and manufacturing method thereof |
KR100389061B1 (en) * | 2002-11-14 | 2003-06-25 | 일진소재산업주식회사 | Electrolytic copper foil and process producing the same |
JP4083171B2 (en) * | 2002-12-25 | 2008-04-30 | 日鉱金属株式会社 | Copper electrolyte containing quaternary amine compound polymer having specific skeleton and organic sulfur compound as additive, and electrolytic copper foil produced thereby |
-
2004
- 2004-06-16 JP JP2005511980A patent/JP4255130B2/en not_active Expired - Lifetime
- 2004-06-16 CN CN200480016822.3A patent/CN1806067B/en not_active Expired - Lifetime
- 2004-06-16 KR KR1020067000706A patent/KR100729061B1/en active IP Right Grant
- 2004-06-16 WO PCT/JP2004/008791 patent/WO2005010239A1/en active Application Filing
- 2004-06-21 TW TW93117890A patent/TWI250226B/en active
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104854265A (en) * | 2012-11-26 | 2015-08-19 | 德国艾托特克公司 | Copper plating bath composition |
US9551080B2 (en) | 2012-11-26 | 2017-01-24 | Atotech Deutschland Gmbh | Copper plating bath composition |
CN104854265B (en) * | 2012-11-26 | 2017-08-08 | 德国艾托特克公司 | Electroless copper bath composition |
TWI649455B (en) * | 2013-09-11 | 2019-02-01 | 古河電氣工業股份有限公司 | Electrolytic copper foil, flexible circuit board and battery |
Also Published As
Publication number | Publication date |
---|---|
KR20060026963A (en) | 2006-03-24 |
WO2005010239A1 (en) | 2005-02-03 |
TWI250226B (en) | 2006-03-01 |
JP4255130B2 (en) | 2009-04-15 |
KR100729061B1 (en) | 2007-06-14 |
CN1806067B (en) | 2010-06-16 |
TW200506097A (en) | 2005-02-16 |
JPWO2005010239A1 (en) | 2006-09-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: NIPPON MINING HOLDINGS INC. Free format text: FORMER OWNER: NIPPON MINING + METALS CO., LTD. Effective date: 20140512 |
|
C41 | Transfer of patent application or patent right or utility model | ||
C56 | Change in the name or address of the patentee |
Owner name: JX NIPPON MINING + METALS CORPORATION Free format text: FORMER NAME: NIPPON MINING HOLDINGS INC. |
|
CP01 | Change in the name or title of a patent holder |
Address after: Tokyo, Japan Patentee after: JX Nippon Mining & Metals Corp. Address before: Tokyo, Japan Patentee before: Nippon Mining Holdings Inc. |
|
TR01 | Transfer of patent right |
Effective date of registration: 20140512 Address after: Tokyo, Japan Patentee after: Nippon Mining Holdings Inc. Address before: Tokyo, Japan Patentee before: Nippon Mining & Metals Co.,Ltd. |
|
CP01 | Change in the name or title of a patent holder |
Address after: Tokyo, Japan Patentee after: JX NIPPON MINING & METALS Corp. Address before: Tokyo, Japan Patentee before: JX Nippon Mining & Metals Corp. |
|
CP01 | Change in the name or title of a patent holder | ||
CP02 | Change in the address of a patent holder |
Address after: No.4, 10-fan, erdingmu, huzhimen, Tokyo, Japan Patentee after: JX NIPPON MINING & METALS Corp. Address before: Tokyo, Japan Patentee before: JX NIPPON MINING & METALS Corp. |
|
CP02 | Change in the address of a patent holder |