CN1787137A - Electrical contact heat material of copper-diamond with miero additive element silver - Google Patents

Electrical contact heat material of copper-diamond with miero additive element silver Download PDF

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Publication number
CN1787137A
CN1787137A CN 200510010555 CN200510010555A CN1787137A CN 1787137 A CN1787137 A CN 1787137A CN 200510010555 CN200510010555 CN 200510010555 CN 200510010555 A CN200510010555 A CN 200510010555A CN 1787137 A CN1787137 A CN 1787137A
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China
Prior art keywords
mas
copper
silver
electrical contact
diamond
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CN 200510010555
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Chinese (zh)
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CN100505125C (en
Inventor
倪树春
王英杰
石钢
郑启亨
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HARBIN DONGDAGAO NEW MATERIAL CO Ltd
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HARBIN DONGDAGAO NEW MATERIAL CO Ltd
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Priority to CNB2005100105555A priority Critical patent/CN100505125C/en
Publication of CN1787137A publication Critical patent/CN1787137A/en
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Abstract

The invention advances a Cu-diamond electric contact material added with trace element Ag, prepared by powder metallurgy, adding metal Ag in a copper base to improve the conductivity of the material, and adding in diamond in 0.001-1.5(mas)% average grain size 0.1-10 mum, to improve wearability and antiwelding property of the material. And the rest are the trace elements: Zr 0.001-1.5 (mas)%, Ce 0.001-1.5 (mas)%, Cr 0.001-1.5(mas)%, Al 0.001-1.5(mas)%, La 0.001-1.5(mas)%, Yi 0.001-1.5 (mas)%, and Cb 0.001-1.5(mas)%. The diamond has high strength, high hardness, high melting point and good wearability, therefore it effectively improves the electric wearability of the copper base, and combined with the trace elements, has low and stable contact resistance and high antiwelding property, arc burning resistance and longer electric service life. The invention is widely applied to home appliances, electronic apparatuses, relays, contactors, and other electric appliance products.

Description

Copper-the copper-diamond electrical contact material of trace additives silver
Technical field
The present invention adopts powder metallurgic method to make a kind of electrical contact material.
Background technology
The demanding electric equipment products of electric property all propose higher requirement to the resistance fusion welding of electrical contact material, anti-electrical arc erosion performance, electric life and cost along with electrical equipment producer release cost is low.In the present disclosed patent family, one class is to be the main Ag-based electrical contact material that divides with silver, another kind of is to be the main Ag-based electrical contact material that divides with copper, with silver is that the main Ag-based electrical contact material electric property that divides is fine, but cost is very high, and be that the main Ag-based electrical contact material cost that divides is low with copper, though electric property can satisfy instructions for use, but still lower than Ag-based electrical contact material.
Technical scheme
The present invention seeks to disclose a kind of copper-copper-diamond electrical contact material that proposes trace additives silver.Adopting " copper-copper-diamond electrical contact material of trace additives silver " of powder metallurgic method preparation, is to have added trace meter silver in the copper matrix, has added 0.001~1.5 (mas) % simultaneously, and particle mean size is the bortz powder of 0.1~10 μ m.Trace meter silver has improved the electric conductivity of material, owing to diamond has high strength, high rigidity, high-melting-point and wear-resistant, combine with trace element to have low and stable contact resistance and high resistance fusion welding, anti-electrical arc erosion ability and higher electric life.Be widely used on the electric equipment products such as household electrical appliance, electronic instrument, relay, contactor, push-button switch and circuit breaker.
Its composition is to add bortz powder and trace element in the copper matrix.
Copper-the copper-diamond electrical contact material of a kind of trace additives silver of the present invention, its composition are to add trace meter silver, bortz powder in the copper matrix;
Its compositing formula is (following is weight ratio):
Bortz powder 0.001~1.5% (mas) %;
Silver 0.001~1.5 (mas) %;
Copper surplus.
The present invention adds other element in above-mentioned prescription.
Compositing formula 1 is (following is weight ratio):
Bortz powder 0.001~1.5% (mas) %;
Silver 0.001~1.5 (mas) %;
Zirconium 0.001~1.5 (mas) %;
Copper surplus.
Compositing formula 2 is (following is weight ratio):
Bortz powder 0.001~1.5% (mas) %;
Silver 0.001~1.5 (mas) %;
Cerium 0.001~1.5 (mas) %;
Copper surplus.
Compositing formula 3 is (following is weight ratio):
Bortz powder 0.001~1.5% (mas) %;
Silver 0.001~1.5 (mas) %;
Chromium 0.001~1.5 (mas) %;
Copper surplus.
Compositing formula 4 is (following is weight ratio):
Bortz powder 0.001~1.5% (mas) %;
Silver 0.001~1.5 (mas) %;
Aluminium 0.001~1.5 (mas) %;
Copper surplus.
Compositing formula 5 is (following is weight ratio):
Bortz powder 0.001~1.5% (mas) %;
Silver 0.001~1.5 (mas) %;
Lanthanum 0.001~1.5 (mas) %;
Copper surplus.
Compositing formula 6 is (following is weight ratio):
Bortz powder 0.001~1.5% (mas) %;
Silver 0.001~1.5 (mas) %;
Yttrium 0.001~1.5 (mas) %;
Copper surplus.
Compositing formula 7 is (following is weight ratio):
Bortz powder 0.001~1.5% (mas) %;
Silver 0.001~1.5 (mas) %;
Niobium 0.001~1.5 (mas) %;
Copper surplus.
Copper-the copper-diamond electrical contact material of a kind of trace additives silver of above-mentioned prescription, its manufacturing process is:
(1) in copper powder, adds argent, bortz powder and add other trace elements to mix powder then even;
(2) in inferior static pressure of the pressure of 10MPa~250MPa or punching block isotactic pressing;
(3) shaping block is in the vacuum degree less than 1000Pa, 800~900 ℃ of following sintering 1~3 hour;
(4) the sintering embryo is squeezed into section bar under 700~900 ℃;
(5) with section rolling or drawing processing;
(6) section bar is carried out machining by the contact size.
Technical implementation way
Embodiment one
Composition proportion (following is weight ratio)
Bortz powder 0.05 (mas) %
Silver 0.01 (mas) %,
Zirconium 0.005 (mas) %,
Copper surplus
Performance
Resistivity: 2.55 μ Ω .cm
Density: 8.65/cm3
Hardness: HB 50-65MPa
Embodiment two
Composition proportion (following is weight ratio)
Bortz powder 0.05 (mas) %
Silver 0.01 (mas) %,
Cerium 0.005 (mas) %,
Copper surplus
Performance
Resistivity: 2.45 μ Ω .cm
Density: 8.8g/cm3
Hardness: HB 75-85MPa
Embodiment three
Composition proportion (following is weight ratio)
Bortz powder 0.05 (mas) %
Silver 0.01 (mas) %,
Chromium 0.005 (mas) %,
Copper surplus
Performance
Resistivity: 2.65 μ Ω .cm
Density: 8.75g/cm3
Hardness: HB 78-88MPa
Embodiment four
Composition proportion (following is weight ratio)
Bortz powder 0.05 (mas) %
Silver 0.01 (mas) %,
Aluminium 0.01 (mas) %,
Copper surplus
Performance
Resistivity: 2.6 μ Ω .cm
Density: 8.75g/cm3
Hardness: HB 70-80MPa
Embodiment five
Composition proportion (following is weight ratio)
Bortz powder 0.05 (mas) %
Silver 0.01 (mas) %,
Lanthanum 0.01 (mas) %,
Copper surplus
Performance
Resistivity: 2.5 μ Ω .cm
Density: 8.75g/cm3
Hardness: HB 60-70MPa
Embodiment six
Composition proportion (following is weight ratio)
Bortz powder 0.05 (mas) %
Silver 0.01 (mas) %,
Yttrium 0.01 (mas) %,
Copper surplus
Performance
Resistivity: 2.42 μ Ω .cm
Density: 8.70g/cm3
Hardness: HB 60-70MPa
Embodiment seven
Composition proportion (following is weight ratio)
Bortz powder 0.05 (mas) %
Silver 0.01 (mas) %,
Niobium 0.01 (mas) %,
Copper surplus
Performance
Resistivity: 2.40 μ Ω .cm
Density: 8.70g/cm3
Hardness: HB 65-75MPa
Embodiment eight
Composition proportion (following is weight ratio)
Bortz powder 0.05 (mas) %
Silver 0.01 (mas) %,
Copper surplus
Performance
Resistivity: 2.20 μ Ω .cm
Density: 8.80g/cm3
Hardness: HB 68-78MPa

Claims (9)

1. copper one copper-diamond electrical contact material of a trace additives silver, its composition are to add trace meter silver, bortz powder in the copper matrix;
Its compositing formula is (following is weight ratio):
Bortz powder 0.001~1.5% (mas) %;
Silver 0.001~1.5 (mas) %;
Copper surplus.
2. copper one copper-diamond electrical contact material of a kind of trace additives silver as claimed in claim 1, its compositing formula are (following is weight ratio):
Bortz powder 0.001~1.5% (mas) %;
Silver 0.001~1.5 (mas) %;
Zirconium 0.001~1.5 (mas) %;
Copper surplus.
3. copper one copper-diamond electrical contact material of a kind of trace additives silver as claimed in claim 1, its compositing formula are (following is weight ratio):
Bortz powder 0.001~1.5% (mas) %;
Silver 0.001~1.5 (mas) %;
Cerium 0.001~1.5 (mas) %;
Copper surplus.
4. copper one copper-diamond electrical contact material of a kind of trace additives silver as claimed in claim 1, its compositing formula are (following is weight ratio):
Bortz powder 0.001~1.5% (mas) %;
Silver 0.001~1.5 (mas) %;
Chromium 0.001~1.5 (mas) %;
Copper surplus.
5. copper one copper-diamond electrical contact material of a kind of trace additives silver as claimed in claim 1, its compositing formula are (following is weight ratio):
Bortz powder 0.001~1.5% (mas) %;
Silver 0.001~1.5 (mas) %;
Aluminium 0.001~1.5 (mas) %;
Copper surplus.
6. copper one copper-diamond electrical contact material of a kind of trace additives silver as claimed in claim 1, its compositing formula are (following is weight ratio):
Bortz powder 0.001~1.5% (mas) %;
Silver 0.001~1.5 (mas) %;
Lanthanum 0.001~1.5 (mas) %;
Copper surplus.
7. copper one copper-diamond electrical contact material of a kind of trace additives silver as claimed in claim 1, its compositing formula are (following is weight ratio):
Bortz powder 0.001~1.5% (mas) %;
Silver 0.001~1.5 (mas) %;
Yttrium 0.001~1.5 (mas) %;
Copper surplus.
8. copper one copper-diamond electrical contact material of a kind of trace additives silver as claimed in claim 1, its compositing formula are (following is weight ratio):
Bortz powder 0.001~1.5% (mas) %;
Silver 0.001~1.5 (mas) %;
Niobium 0.001~1.5 (mas) %;
Copper surplus.
9. copper-the copper-diamond electrical contact material of a kind of trace additives silver as claimed in claim 1, its manufacturing process is:
(1) in copper powder, adds argent, bortz powder and add other trace elements to mix powder then even;
(2) in inferior static pressure of the pressure of 10MPa~250MPa or punching block isotactic pressing;
(3) shaping block is in the vacuum degree less than 1000Pa, 800~900 ℃ of following sintering 1~3 hour;
(4) the sintering embryo is squeezed into section bar under 700~900 ℃;
(5) with section rolling or drawing processing;
(6) section bar is carried out machining by the contact size.
CNB2005100105555A 2005-11-18 2005-11-18 Silver doped copper-diamond electrical contact material Active CN100505125C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNB2005100105555A CN100505125C (en) 2005-11-18 2005-11-18 Silver doped copper-diamond electrical contact material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNB2005100105555A CN100505125C (en) 2005-11-18 2005-11-18 Silver doped copper-diamond electrical contact material

Publications (2)

Publication Number Publication Date
CN1787137A true CN1787137A (en) 2006-06-14
CN100505125C CN100505125C (en) 2009-06-24

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100421246C (en) * 2006-11-03 2008-09-24 宁波康强电子股份有限公司 Bonded copper wire and preparing method thereof
CN100428460C (en) * 2006-11-03 2008-10-22 宁波康强电子股份有限公司 Bonded copper wire and preparing method thereof
CN100437857C (en) * 2006-11-24 2008-11-26 林羽锦 Machining technique of silver/copper double composite strip material
CN101197215B (en) * 2008-01-02 2010-08-04 陕西艺林实业有限责任公司 Nano diamond doped silver based contact material processing method
CN101139515B (en) * 2007-05-18 2010-08-18 中南大学 High heat-conductive diamond-copper composite encapsulating material and method for making same
CN101070461B (en) * 2007-05-18 2011-04-20 中南大学 Super-high heat-conductive diamond-copper composite package material and production method
CN102136376A (en) * 2011-03-18 2011-07-27 孔琦琪 Novel functional contact of low-voltage electrical appliance
CN104505136A (en) * 2014-12-22 2015-04-08 乐清市长虹电工合金材料有限公司 Ceramic-shaped niobium copper hard special copper-based alloy electrical contact and preparation method thereof

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100421246C (en) * 2006-11-03 2008-09-24 宁波康强电子股份有限公司 Bonded copper wire and preparing method thereof
CN100428460C (en) * 2006-11-03 2008-10-22 宁波康强电子股份有限公司 Bonded copper wire and preparing method thereof
CN100437857C (en) * 2006-11-24 2008-11-26 林羽锦 Machining technique of silver/copper double composite strip material
CN101139515B (en) * 2007-05-18 2010-08-18 中南大学 High heat-conductive diamond-copper composite encapsulating material and method for making same
CN101070461B (en) * 2007-05-18 2011-04-20 中南大学 Super-high heat-conductive diamond-copper composite package material and production method
CN101197215B (en) * 2008-01-02 2010-08-04 陕西艺林实业有限责任公司 Nano diamond doped silver based contact material processing method
CN102136376A (en) * 2011-03-18 2011-07-27 孔琦琪 Novel functional contact of low-voltage electrical appliance
CN104505136A (en) * 2014-12-22 2015-04-08 乐清市长虹电工合金材料有限公司 Ceramic-shaped niobium copper hard special copper-based alloy electrical contact and preparation method thereof

Also Published As

Publication number Publication date
CN100505125C (en) 2009-06-24

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ASS Succession or assignment of patent right

Owner name: NI SHUCHUN; APPLICANT

Free format text: FORMER OWNER: HARBIN DONGDA HIGH NEW MATERIAL CO., LTD.

Effective date: 20080620

C41 Transfer of patent application or patent right or utility model
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Effective date of registration: 20080620

Address after: Heilongjiang Province, Harbin City, the Yellow River Road No. 136 champs Lai Court building C room 503 post encoding: 150090

Applicant after: Ni tree spring

Co-applicant after: Wang Yingjie

Address before: Postal code 8, Dalian Road, cottage Economic Development Zone, Heilongjiang, Harbin: 150060

Applicant before: Harbin Dongdagao New Material Co.,Ltd.

C14 Grant of patent or utility model
GR01 Patent grant
EE01 Entry into force of recordation of patent licensing contract

Assignee: Harbin Dongdagao New Material Co.,Ltd.

Assignor: Wang Yingjie|Ni Shuchun

Contract record no.: 2011230000249

Denomination of invention: Silver doped copper-diamond electrical contact material

Granted publication date: 20090624

License type: Exclusive License

Open date: 20060614

Record date: 20110906

C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20160106

Address after: 150060 No. 8 Dalian Road, cottage Development Zone, Harbin, Heilongjiang

Patentee after: Harbin Dongdagao New Material Co.,Ltd.

Address before: 150090 Heilongjiang Province, Harbin city the Yellow River Road No. 136 champs Lai Court building C room 503

Patentee before: Ni Shuchun

Patentee before: Wang Yingjie