CN1786752A - Photosensitive resin composition for color filter and method for mfg. LCD color filter by same - Google Patents
Photosensitive resin composition for color filter and method for mfg. LCD color filter by same Download PDFInfo
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- CN1786752A CN1786752A CNA2005101274813A CN200510127481A CN1786752A CN 1786752 A CN1786752 A CN 1786752A CN A2005101274813 A CNA2005101274813 A CN A2005101274813A CN 200510127481 A CN200510127481 A CN 200510127481A CN 1786752 A CN1786752 A CN 1786752A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
- B05D1/005—Spin coating
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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Abstract
To provide a photosensitive resin composition for a color filter which minimizes unnecessary parts occurring at the peripheral edge of a resist film spin-coated on a substrate in an LCD manufacturing process by a TFT and STN system, and which improves coating property and planarization. The photosensitive resin composition for a color filter contains one or more silicon-based surface additives selected from the group consisting of: polyalkylene oxide methylsilane polymers; polyether modified dimethylpolysiloxane polymer solutions; and polyether modified dimethylpolysiloxane polymers.
Description
Technical field
The present invention relates to color filter with photosensitive polymer combination and make the method for LCD color filter with this composition, especially relate to following color filter photosensitive polymer combination, it can will be rotated redundance (the limit glue of edge part (Edge part) generation that is coated on the etchant resist on the substrate in the LCD manufacturing process, Edge Bead:EB) minimized and the coating of etchant resist and homogenising all are improved, and relate to and utilize this composition to make transmission-type, the method of reflection-type or Semitransmissive (half-transparent type) LCD color filter.
Background technology
The method of in the past making LCD color filter has print process, strike, ink-jet (ink-jet) method, pigment dispersing method etc., recently pigment dispersing methods of using more, the pattern exquisiteness (Resolution) of this method, manufacture method are simple, so be applied to making the LCD of mobile phone, notebook computer, display, TV etc.
Recently, even, not only also aspect the exquisiteness of pattern requirement is being arranged, and require higher performance for the much pigment-dispersing type coloured compositions of advantage.That is, general pigment-dispersing type coloured composition is coated on the substrate, forms colour element by exposure imaging, suitable curing takes place in the pixel after exposure this moment, so can not be dissolved in developer solution.
This TFT-LCD operation is coating chromatic resist (R on glass substrate at first; G; B); expose successively and developing procedure; the residual problem of EB part that produced can take place in this TFT-LCD operation usually; this is because the equipment of the substrate through being coated with when mobile pollutes; the difficulty of when exposure process, accurately arranging; and behind developing procedure, can't develop fully and to be caused because of film is too thick; in order to address this problem; (limit glue is removed must to implement EBR; Edge Bead Remover) operation will be removed with thinning agent in the EB part that is rotated the edge part generation that is coated on the etchant resist on the substrate.
Yet, in STN method and TFT-LCD operation, save the method for EBR operation for the few process number of letter and favored recently.If save above-mentioned EBR treatment process; in the operation of making color filter, can save the EBR treatment process at least 3～4 times; so be not only that whole manufacturing process is simplified and saved manufacturing time; owing to do not use diluent composition required in the EBR treatment process, cut down expenses, protect the advantage of environment in addition.
In order to save this EBR treatment process, the unnecessary membrane portions minimized (width, thickness) that produces at the etchant resist edge part by with rotary coating the time, even do not implement the EBR operation especially, also can prevent the generation of unnecessary film in the time period at general developing procedure.In addition, the area of substrate has progressively the tendency to large scale development, and the coated film fault-layer-phenomenon when this just requires colored resist-coating drops to minimum and improves coating, so need improve colored resist composition.
Summary of the invention
But the EB of the photosensitive polymer combination of Shi Yonging was not only wide but also thick in the past, so there is the problem that the EBR operation just can't be removed EB portion fully of not implementing in general developing procedure.
In order to solve this problem in the past, the object of the present invention is to provide a kind of color filter photosensitive polymer combination, its improvement, changed rheological characteristics, on substrate during the rotary coating etchant resist, made the minimized and coating of the unnecessary EB portion of its edge part, homogeneity that raising all be arranged.
In addition, the manufacture method that the purpose of this invention is to provide a kind of LCD color filter, it has improved coating, will be minimized in the unnecessary EB portion that the etchant resist edge part of rotary coating on substrate produces, when making LCD color filter, can save the EBR operation, can reduce manufacturing cost in epoch-making property ground thus.
In order to achieve the above object, the invention provides a kind of color filter photosensitive polymer combination, it is characterized by: containing silicon is surface additive, and described silicon is that surface additive is to be selected from least a by in molecular group of polyoxyalkylene methyl-monosilane macromolecule, polyether-modified dimethyl polysiloxane Polymer Solution and the polyether-modified dimethyl polysiloxane high score.
In addition, the invention provides a kind of manufacture method of making LCD color filter, it is characterized by: contain above-mentioned color filter is coated on operation on the substrate with photosensitive polymer combination.
Color filter of the present invention improves rheological with photosensitive polymer combination and changes, so it is can be with the unnecessary EB part that produces at the etchant resist edge part of rotary coating on substrate minimized and make coating, homogeneity is improved, the method of using above-mentioned color filter to make LCD color filter with photosensitive polymer combination can improve coating, can the unnecessary EB part that produce at the etchant resist edge part of rotary coating on substrate is minimized, can omit the EBR operation when making LCD colour filter film, thereby reach the effect that epoch-making property ground reduces manufacturing cost.
Embodiment
Below the present invention is described in detail.
Color filter of the present invention is characterized as with photosensitive polymer combination: containing silicon is surface additive, and described silicon is that surface additive is to be selected from least a by in molecular group of polyoxyalkylene methyl-monosilane macromolecule, polyether-modified dimethyl polysiloxane Polymer Solution and the polyether-modified dimethyl polysiloxane high score.Described silicon is that surface additive can reduce by induced surface tension force when carrying out rotary coating on substrate, and the good wettability of substrate of maintenance and effect such as antifouling are arranged.Described silicon is 0.1 weight %～2 weight % that the content of surface additive preferably accounts for all compositions.When above-mentioned silicon is the discontented 0.1 weight % of the content of surface additive, whole substrate evenly is coated with; As surpassing 2 weight %, the frequency that takes place when then being coated with to pollute will raise.Preferred above-mentioned high molecular molecular weight is 1000～100000, more preferably 3000～10000.In addition, above-mentioned silicon is that surface additive is solvent-free form or uses phenoxetol/dimethylbenzene as solvent.
Color filter of the present invention is the composition that comprises following material with the preferred example of photosensitive polymer combination: Photoepolymerizationinitiater initiater, 5 pigment, 4 cross-linkable monomer, 3 that 1) alkali-soluble bonding agent, 2) has the two keys of at least two above alkene types))) above-mentioned silicon is surface additive, reaches 6) solvent.
Color filter of the present invention is with in the photosensitive polymer combination, above-mentioned 1) the alkali-soluble bonding agent preferably contains the alkene type monomer and the multipolymer that does not contain the alkene type monomer of acidic-group of acidic-group in the macromolecular chain.
The above-mentioned alkene type monomer that contains acidic-group has acrylic acid, methacrylic acid, furoate clothing, maleic acid, fumaric acid, vinyl acetic acid or these sour anhydride forms; 2-acryloxy ethyl phthalic monoester; 2-acryloxy propyl group phthalic monoester; And 2-acryloxy propyl group hexahydrophthalic acid ester etc., these can use separately also and mixing more than 2 kinds or 2 kinds wherein can be used.The above-mentioned content that contains the alkene type monomer of acidic-group preferably accounts for the 10 weight %～40 weight % of above-mentioned alkali-soluble bonding agent, more preferably 15 weight %～35 weight %.The above-mentioned alkene type monomer that contains acidic-group contain quantity not sufficient 10 weight % the time, the dissolubility of photosensitive polymer combination in alkaline-based developer has the tendency of decline, as surpassing 40 weight %, coming off and peeling off phenomenon of pattern then can be taken place when developing by alkaline-based developer.
The above-mentioned example that does not contain the alkene type monomer of acidic-group has: the isobutyl acrylate, tert-butyl group acrylate, lauryl acrylate, alkyl acrylate, the stearyl acrylate, the cyclohexyl acrylate, iso-bornyl acrylate, the benzyl acrylate, the 2-hydroxy acrylate, trimethoxy butylacrylic acid ester, the ethyl carbitol acrylate, benzene oxygen ethyl propylene acid esters, 4-hydroxybutyl acrylate, the phenoxy group polyethylene glycol acrylate, the 2-hydroxyethylmethacry,ate, hydroxyethyl styron acrylate, 2-hydroxypropyl acrylate, 2-acryloxy ethyl-2-hydroxypropyl phthalic ester, 2-hydroxyl-3-phenoxy propyl acrylate and their methyl acrylic ester; The acrylate of halide such as 3-fluoro ethyl acrylate, 4-fluoropropyl acrylate and their methyl acrylic ester; Triethyl silica ethyl acrylate etc. contains the acrylate of siloxy and their methyl acrylic ester; Styrene, 4-methoxy styrene etc. contain aromatic olefines etc., and these can use separately also and mixing more than 2 kinds or 2 kinds wherein can be used.
The above-mentioned content that does not contain the monomer of acidic-group preferably accounts for the 60 weight %～90 weight % of above-mentioned alkali-soluble bonding agent, more preferably 65 weight %～85 weight %.If the above-mentioned monomer that does not contain acidic-group contain quantity not sufficient 60 weight %, then during developing procedure and the cementability of substrate will descend, pattern is peeled off phenomenon and is become serious, the rectilinearity variation of the pattern that forms, as surpassing 90 weight %, dissolution velocity when then developing in alkaline-based developer reduces, and development time is elongated.
The content of above-mentioned alkali-soluble bonding agent preferably accounts for the 5 weight %～40 weight % of whole photosensitive polymer combinations.
In addition, in the photosensitive polymer combination of the present invention, 2) example with cross-linkable monomer of the two keys of at least 2 above alkene types has: 1,4-butanediol diacrylate, 1,3 butyleneglycol diacrylate, glycol diacrylate, tetramethylol methane tetraacrylate, triethylene glycol diacrylate, polyethyleneglycol diacrylate, sorbierite triacrylate, bisphenol a diacrylate derivant, TMPTA, dipentaerythritol diacrylate, dipentaerythritol acrylate and their methyl acrylic ester etc.Above-mentioned content with cross-linkable monomer of the two keys of at least 2 above alkene types preferably accounts for the 5 weight %～30 weight % of whole photosensitive polymer combinations, more preferably 5 weight %～20 weight %.Above-mentioned cross-linkable monomer contain quantity not sufficient 5 weight % the time, be difficult to form with the low pattern that causes of degree of cure of photoresist, as surpassing 30 weight %, not only can cause the viscosity (viscosity) of corrosion-resistant composition excessively to rise, also can cause the dissolution velocity in alkaline-based developer too fast, even cause in exposure portion, the corrosivity of the anti-developer solution of resist also significantly descends.
In addition, in the photosensitive polymer combination of the present invention, 3) no matter pigment is that organic pigment or inorganic pigment can use entirely, and the object lesson of this organic pigment has: the C.I. pigment yellow 83, C.I. pigment yellow 150, C.I. pigment yellow 13 8, C.I. pigment Yellow 12 8, C.I. pigment orange 43, C.I. paratonere 177, C.I. paratonere 202, C.I. paratonere 209, C.I. paratonere 254, C.I. paratonere 255, the C.I pigment Green 7, C.I. pigment green 36, C.I. pigment blue 15, C.I. pigment blue 15: 3, C.I. pigment blue 15: 4, C.I. pigment blue 15: 6, C.I. pigment Violet 23, C.I. pigment black 1, C.I. pigment black 7 etc.Inorganic pigment can be enumerated: titanium dioxide, titanium are black, carbon black etc.These pigment can use separately also and can use mixing more than 2 kinds or 2 kinds during color matching.The content of above-mentioned pigment preferably accounts for the 10 weight %～60 weight % of whole photosensitive polymer combinations.
In the photosensitive polymer combination of the present invention, 4) Photoepolymerizationinitiater initiater is for causing the compound of above-mentioned cross-linkable monomer polyreaction by the wavelength of visible light, ultraviolet ray, far infrared etc.As above-mentioned Photoepolymerizationinitiater initiater, can use at least a kind that is selected from the group of forming by compound in triazine class, acetophenone compounds, xanthone compounds, styrax compounds and glyoxaline compound.
Above-mentioned compound in triazine class object lesson has: 2,4-two (trichloromethyl)-6-to methoxy styryl-s-triazine, 2-to methoxy styryl-4,6-two (trichloromethyl)-s-triazine, 2,4-trichloromethyl-6-triazine, 2-(2-bromo-4-tolyl)-4,6-two (trichloromethyl)-s-triazine etc.But above-mentioned triazines initiating agent is fast to the reaction velocity of light, thus although sensitivity is fine, produces halid gas during exposure and can pollute equipment such as photomask, and the most intrinsic yellow of compound in triazine class, thereby cause brightness to descend.Therefore, the preferred not enough all 1 weight % of photosensitive polymer combination of the content of above-mentioned triazines initiating agent.
The object lesson of above-mentioned acetophenone compounds has: benzophenone, to (dimethylamino) benzophenone, 2,2-two chloro-4-metaphenoxy acetophenones, 4,4-two (diethylamino) benzophenone, 2,2-diethoxy acetophenone, 2,2-dibutoxy acetophenone, 2-hydroxy-2-methyl propiophenone, to tert-butyl group trichloroacetophenone etc.In addition, the object lesson of above-mentioned xanthone compounds has: xanthone, thioxanthones, 2-methyl thioxanthones, 2-isobutyl thioxanthones, 2-dodecyl thioxanthones, 2,4-dimethyl thioxanthones etc.The object lesson of above-mentioned styrax compounds has: compounds such as styrax, benzoin ethyl ether, benzoin methyl ether, benzoyl propyl ether, tert-butyl group benzoyl ether.The object lesson of glyoxaline compound has: 2, and 2-two-2-chlorphenyl-4,5,4,5-tetraphenyl-2-1,2-bisglyoxaline, 2,2-two (2,4,6-tricyano phenyl)-4,4,5,5-tetraphenyl-1, compounds such as 2-bisglyoxaline.
As required, above-mentioned Photoepolymerizationinitiater initiater can mix use with sensitizer (for example photosensitizing agent), curing accelerator etc.Its object lesson has: can use 4-dimethylamino benzophenone, isopropyl thioxanthone (dioxanetone), a methyl-benzoyl benzoic ether, 4-(aminomethyl phenyl sulfo-)-phenyl-phenylmethane, 2, compounds such as 4-diethyl thioxanthone, 2-clopenthixal ketone, benzophenone, EAQ.
The content of above-mentioned Photoepolymerizationinitiater initiater is preferably the 0.5 weight %～5 weight % of photosensitive polymer combination, more preferably 1 weight %～2 weight %.The content of above-mentioned Photoepolymerizationinitiater initiater such as less than 0.5 weight %, then sensitivity is low, cause being difficult to form normal pattern, and the rectilinearity of pattern is not good.In addition, surpass 5 weight % as the content of above-mentioned Photoepolymerizationinitiater initiater, then excessively sensitivity causes the pattern surface to produce embossing, is that sometimes dissolubility and the storage stability aspect in the solvent has problems.
Color filter of the present invention is with in the photosensitive polymer combination, 5) above-mentioned silicon be the surface additive definition as above.In addition, wherein can further comprise spreading agent that increases pigment-dispersing or the adjuvant that strengthens coating, these content of additive can be the 0.1 weight %～2 weight %s of whole color filter with photosensitive polymer combination.
Color filter of the present invention is with in the photosensitive polymer combination, described 6) solvent is selected according to dissolubility, pigment-dispersing, coating, specifically, preferred glycol monoethyl ether acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol methyl list ethyl ether acetate ester, diethylene glycol dimethyl ether, diethylene glycol ethylmethyl ether, cyclohexanone, 3-methoxy propyl acetoacetic ester, 3-ethoxy-propionic acid methyl esters, 3-ethoxyl ethyl propionate etc., these materials can use separately, also can two or more mix use.The content of described solvent is the surplus of removing mentioned component, is preferably the 20 weight %～70 weight % of whole photosensitive polymer combinations.
The invention provides the method for making LCD color filter, it is characterized by, comprise above-mentioned color filter is coated on operation on the substrate with photosensitive polymer combination, certainly, with above-mentioned color filter with photosensitive polymer combination on substrate before and after the coating process, can use used operation in the method for common manufacturing color filter.The manufacture method of LCD color filter of the present invention can strengthen coating, make in that the rotary coating unnecessary EB part that the etchant resist edge part produces on substrate is minimized, when making the liquid crystal display color filter, can omit the EBR operation, thereby can reduce manufacturing cost in epoch-making property ground.
Below the present invention is described in detail based on embodiment, but the present invention has more than and is limited to following embodiment.In the following embodiments, as not explaining in addition, percentage when mixing ratio all is benchmark with weight.
[embodiment 1]
1) alkali-soluble bonding agent, (the copolymerization ratio in 1-Methoxy-2-propyl acetate solution is 60/20/20 to the multipolymer of 25 weight % benzyl methacrylate/methacrylic acid/hydroxyethyl styron acrylate, solid component content is 35 weight %, and weight-average molecular weight is 30000 multipolymer); 2) has the cross-linkable monomer of the two keys of at least 2 above alkene types, 5 weight % dipentaerythritol acrylates; 3) pigment, C.I. paratonere 254 and C.I. pigment yellow 13 8 be totally 22 weight %; 4) Photoepolymerizationinitiater initiater, 1 weight %Irgacure369 (Ciba manufacturing), 0.5 weight %4,4-two (diethylamino) benzophenone and 0.5 weight %2,4-diethyl thioxanthone; 5) silicon is surface additive, and polyether-modified dimethyl polysiloxane Polymer Solution and polyoxyalkylene dimethylene polysiloxane macromolecule be totally 0.4 weight % (these two kinds of content of additive ratios are 1: 1); 6) solvent, the mixed solvent that the 1-Methoxy-2-propyl acetate of surplus and cyclohexanone mix at 3: 1.These materials are mixed and made into liquid color filter photosensitive polymer combination.
[embodiment 2]
Make with similarly to Example 1 composition and content, wherein, as 5) silicon is surface additive, uses the polyether-modified dimethyl polysiloxane Polymer Solution of 0.5 weight %.Be mixed and made into liquid color filter photosensitive polymer combination.
[embodiment 3]
Make with similarly to Example 1 composition and content, wherein, as 5) silicon is surface additive, uses 0.5 weight % polyoxyalkylene dimethylene polysiloxane macromolecule.Be mixed and made into liquid color filter photosensitive polymer combination.
[embodiment 4]
Make with similarly to Example 1 composition and content, wherein, as 5) silicon is surface additive, uses the polyether-modified dimethyl polysiloxane macromolecule of 0.2 weight %.Be mixed and made into liquid color filter photosensitive polymer combination.
[comparative example 1]
Make with similarly to Example 1 composition and content, wherein, replace 5) silicon is surface additive and to use 0.5 weight % fluorine be additive B YK-340 (BYK-Chemi manufacturings), the manufacturing photosensitive polymer combination.
[comparative example 2]
Make with similarly to Example 1 composition and content, wherein, replace 5) silicon is that surface additive uses 0.5 weight % acrylic ester additive B YK-354 (BYK-Chemi manufacturings), the manufacturing photosensitive polymer combination.
[coating relatively]
More above-mentioned silicon system and non-silicon are the kind of adjuvant and embodiment 1～4 that content changes, and the coating of comparative example 1 and 2.
Experimental technique: the photosensitive polymer combination of gained in the foregoing description 1～4 and comparative example 1 and 2 is dripped 0.8cc on glass substrate, after the speed rotary coating with 300rpm, prebake on 90 ℃ heating plate, make its drying, obtain coated film, measure the unnecessary EB portion's thickness and the width of rotary coating substrate edges.Measurement result is as shown in table 1 below.
[table 1]
| EB width (mm) | EB film thickness (um) | Coating | Pollution condition after the coating | |
| Embodiment 1 | 2.5～3.0 | 2.6 | ○ | Well (no stains) |
| Embodiment 2 | 3.3～3.7 | 3.3 | ○ | Well (no stains) |
| Embodiment 3 | 3.0～3.5 | 3.0 | ○ | Well (no stains) |
| Embodiment 4 | 2.7～3.2 | 3.4 | ○ | Well (no stains) |
| Comparative example 1 | 4.5～5.2 | 5.2 | △ | The part stains are arranged |
| Comparative example 2 | 5.5～6.0 | 4.6 | △ | The part stains are arranged |
As shown in above-mentioned table 1, embodiment 1～4 compares with comparative example 1 and 2, and the width and the thickness of the unnecessary film (EB) of coated substrates periphery reduce relatively.The result shows that films whole after the coating is almost pollution-free, in good condition.In contrast, under comparative example 1 and 2 the situation, the width of EB film and thickness are compared with embodiment 1, can be observed to have increased respectively more than 2 times, in addition, can see having the part coating to pollute during coating.This comparative example 1 and 2 resulting EB portions are thicker, are unfavorable for the removal fully of etchant resist in the general developing procedure.Therefore as can be known, compare with comparative example 1,2, the coating performance of embodiment 1～4 when rotary coating is better.
Claims (11)
1, color filter photosensitive polymer combination, it is characterized by, containing silicon is surface additive, and described silicon is that surface additive is to be selected from least a by in molecular group of polyoxyalkylene methyl-monosilane macromolecule, polyether-modified dimethyl polysiloxane Polymer Solution and the polyether-modified dimethyl polysiloxane high score.
2, the color filter photosensitive polymer combination described in claim 1 is characterized by, and described silicon is that the content of surface additive is 0.1 weight %～2 weight %.
3, the color filter photosensitive polymer combination described in claim 1 is characterized by, and contains following material:
1) alkali-soluble bonding agent, 5 weight %～40 weight %;
2) has the cross-linkable monomer of the two keys of at least two above alkene types, 5 weight %～30 weight %;
3) pigment, 10 weight %～60 weight %;
4) Photoepolymerizationinitiater initiater, 0.5 weight %～5 weight %;
5) described silicon is surface additive, 0.1 weight %～2 weight %; And
6) solvent, surplus.
4, the color filter photosensitive polymer combination described in claim 3, it is characterized by described 1) the alkali-soluble bonding agent is the multipolymer of the alkene type monomer that does not contain acidic-group of the alkene type monomer that contains acidic-group of 10 weight %～40 weight % and 90 weight %～60 weight %.
5, the color filter photosensitive polymer combination described in claim 4, it is characterized by, the described alkene type monomer that contains acidic-group is to be selected from least a in the group of being made up of following substances: acrylic acid, methacrylic acid, furoate clothing, maleic acid, fumaric acid, vinyl acetic acid or these sour anhydride forms; 2-acrylyl oxy-ethyl phthalic monoester; 2-acryloyl-oxy propyl group phthalic monoester; And 2-acryloxy propyl group hexahydrophthalic acid ester.
6, color filter photosensitive polymer combination described in claim 4, it is characterized by, the described alkene type monomer that does not contain acidic-group is to be selected from least a in the group of being made up of following substances: the isobutyl acrylate, tert-butyl group acrylate, the dodecyl acrylate, alkyl acrylate, the stearyl acrylate, the cyclohexyl acrylate, iso-bornyl acrylate, the benzyl acrylate, the 2-hydroxy acrylate, trimethoxy butylacrylic acid ester, the ethyl carbitol acrylate, benzene oxygen ethyl propylene acid esters, 4-hydroxybutyl acrylate, the phenoxy group polyethylene glycol acrylate, the 2-hydroxyethylmethacry,ate, hydroxyethyl styron acrylate, 2-hydroxypropyl acrylate, 2-acrylyl oxy-ethyl-2-hydroxypropyl phthalic ester, 2-hydroxyl-3-phenoxy propyl acrylate and their methyl acrylic ester; The acrylate of halide and their methyl acrylic ester; And contain the acrylate of siloxy group and their methyl acrylic ester.
7, color filter photosensitive polymer combination described in claim 3, it is characterized by, described 2) cross-linkable monomer with the two keys of at least two alkene types is to be selected from least a in the group of being made up of following substances: 1, the 4-butanediol diacrylate, 1,3 butyleneglycol diacrylate, glycol diacrylate, tetramethylol methane tetraacrylate, triethylene glycol diacrylate, polyethyleneglycol diacrylate, the dipentaerythritol diacrylate, the sorbierite triacrylate, the bisphenol a diacrylate derivant, TMPTA, many acrylate of dipentaerythritol and their methyl acrylic ester.
8, the color filter photosensitive polymer combination described in claim 3 is characterized by, described 3) pigment is organic pigment or inorganic pigment.
9, the color filter photosensitive polymer combination described in claim 3, it is characterized by described 4) Photoepolymerizationinitiater initiater be selected from by compound in triazine class, acetophenone compounds, xanthone compounds, styrax compounds, and the group formed of glyoxaline compound at least a.
10, the color filter photosensitive polymer combination described in claim 3, it is characterized by described 5) solvent is to be selected from least a in the group of being made up of following substances: glycol monoethyl ether acetate, propylene glycol monomethyl ether, 1-Methoxy-2-propyl acetate, dihydroxypropane single-ether acetate, diethylene glycol dimethyl ether, diethylene glycol ethylmethyl ether, cyclohexanone, 3-methoxy propyl acetoacetic ester, 3-ethoxy-propionic acid methyl esters and 3-ethoxyl ethyl propionate.
11, the manufacture method of LCD color filter is characterized by, and comprises to be coated on operation on the substrate with photosensitive polymer combination as any described color filter in the claim 1 to 10.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020040102654A KR101119818B1 (en) | 2004-12-07 | 2004-12-07 | Photoresist composition for colour filter and preparation method of liquid crystal display colour filter using the same |
| KR1020040102654 | 2004-12-07 |
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| Publication Number | Publication Date |
|---|---|
| CN1786752A true CN1786752A (en) | 2006-06-14 |
| CN100445778C CN100445778C (en) | 2008-12-24 |
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| CNB2005101274813A Expired - Fee Related CN100445778C (en) | 2004-12-07 | 2005-12-07 | Photosensitive resin composition for color filter and method for mfg. LCD color filter by same |
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| Country | Link |
|---|---|
| JP (1) | JP2006163415A (en) |
| KR (1) | KR101119818B1 (en) |
| CN (1) | CN100445778C (en) |
| TW (1) | TWI397772B (en) |
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| CN103309161A (en) * | 2012-03-16 | 2013-09-18 | 奇美实业股份有限公司 | Photosensitive resin composition and application thereof |
| CN105301916A (en) * | 2015-11-16 | 2016-02-03 | 北京中科紫鑫科技有限责任公司 | Method for forming photoresist pattern |
| CN105301901A (en) * | 2015-11-16 | 2016-02-03 | 北京中科紫鑫科技有限责任公司 | Preparation method of positive photoresist composition |
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| JP3225033B2 (en) * | 1989-03-20 | 2001-11-05 | 富士通株式会社 | Optical disk information writing control method and device |
| JPH08309251A (en) * | 1995-05-22 | 1996-11-26 | Hitachi Chem Co Ltd | Production of extremely thin photosensitive film |
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| JP4210455B2 (en) * | 2002-02-15 | 2009-01-21 | 富士フイルム株式会社 | Photocurable coloring composition and color filter |
| JP2004038142A (en) * | 2002-03-03 | 2004-02-05 | Shipley Co Llc | Method for preparing polysiloxane and photoresist composition comprising same |
| JP3860806B2 (en) * | 2002-12-19 | 2006-12-20 | Ｊｓｒ株式会社 | Method for forming colored layer for color filter |
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| TW593582B (en) * | 2002-12-31 | 2004-06-21 | Ind Tech Res Inst | Photo-curable pigment-type ink-jet ink composition and applications thereof |
| CN1220114C (en) * | 2003-09-27 | 2005-09-21 | 奇美实业股份有限公司 | Light-sensitive resin composition for colour filter film |
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2004
- 2004-12-07 KR KR1020040102654A patent/KR101119818B1/en active IP Right Grant
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2005
- 2005-11-28 TW TW094141689A patent/TWI397772B/en not_active IP Right Cessation
- 2005-12-07 CN CNB2005101274813A patent/CN100445778C/en not_active Expired - Fee Related
- 2005-12-07 JP JP2005352942A patent/JP2006163415A/en active Pending
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| CN101178541B (en) * | 2006-10-31 | 2012-04-25 | 三洋化成工业株式会社 | Photosensitive resin composition |
| CN101319092B (en) * | 2007-06-07 | 2013-01-09 | 株式会社东进世美肯 | Light-shielding water-soluble resin composition |
| CN103309161A (en) * | 2012-03-16 | 2013-09-18 | 奇美实业股份有限公司 | Photosensitive resin composition and application thereof |
| CN103309161B (en) * | 2012-03-16 | 2015-12-02 | 奇美实业股份有限公司 | Photosensitive resin composition and application thereof |
| CN105301916A (en) * | 2015-11-16 | 2016-02-03 | 北京中科紫鑫科技有限责任公司 | Method for forming photoresist pattern |
| CN105301901A (en) * | 2015-11-16 | 2016-02-03 | 北京中科紫鑫科技有限责任公司 | Preparation method of positive photoresist composition |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20060063475A (en) | 2006-06-12 |
| JP2006163415A (en) | 2006-06-22 |
| CN100445778C (en) | 2008-12-24 |
| KR101119818B1 (en) | 2012-03-06 |
| TW200628988A (en) | 2006-08-16 |
| TWI397772B (en) | 2013-06-01 |
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