CN1776029A - Electrolytic etching device for metal plate - Google Patents
Electrolytic etching device for metal plate Download PDFInfo
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- CN1776029A CN1776029A CN 200510044904 CN200510044904A CN1776029A CN 1776029 A CN1776029 A CN 1776029A CN 200510044904 CN200510044904 CN 200510044904 CN 200510044904 A CN200510044904 A CN 200510044904A CN 1776029 A CN1776029 A CN 1776029A
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- etching
- metal plate
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- metal sheet
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- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Abstract
An electrolytic etching device for metal plate, which contains a circular used electrolytic etching solution trough separated into two chambers by partition plate, one is closed and another is opened, both connected by transfer pump and pipe, anode and cathode positioning trough installed on upper and lower of the gap hole of partition plate, inserted with the anode of etched metal plate and auxiliary cathode of imitative metal plate, both electrodes are connected with the positive and negative pole of power supply. Said invention has advantages of low cost, high precision and etching speed.
Description
Technical field
The present invention relates to a kind of electrolytic etching device of metal sheet.
Background technology
Electrolytically etching is that metal works makes the unwanted metal generation of the workpiece surface anode dissolution course of processing of removal fast by adding anodic current in electrolytic solution.The basic procedure of electrolytically etching is: will treat that etched metalwork carries out conventional cleaning and oil removing and makes cleaning surfaces, and then at its surface-coated photoresist material, and according to processing pattern carry out the exposure of photoresist material, then develop and the post bake processing, put it into again in the electrolytically etching liquid and relative with auxiliary cathode, connect direct supply, by adding anodic current, make the metal anode of exposure be partly dissolved removal, after treating that electrolytic process finishes, glue with the surface removes with strong basicity or strongly acidic solution again, and last water cleans up and obtains etching and processing workpiece product.
Transfusion system that existing electrolytic etching device relates to and Controlling System are very complicated, and the size for the treatment of etched workpiece is restricted, and the processing electric current density of permission is low, causes electrolytically etching speed slow, the production cost height has limited it in industrial large-scale application.Recently (for example for solidity to corrosion height, easy blunt metal, Hastelloy) microfabrication requires very urgent, and traditional chemical milling is difficult to corrode fast this metalloid, therefore be exactly electrolytically etching for the best fine machining method of this metalloid, yet existing electrolytic etching method and device are owing to exist above defective, be difficult to satisfy industrial production requirement, the requirement that for this reason improves existing electrolytic etching device becomes very urgent.
Summary of the invention
The electrolytic etching device that the purpose of this invention is to provide a kind of metal sheet, it can solve the above-mentioned problems in the prior art.
A kind of electrolytic etching device of metal sheet, it is characterized in that having a dress electrolytically etching liquid (the circulation storage tank, this storage tank is divided into two Room by dividing plate, one Room is an open chamber, another chamber is an enclosed chamber, be communicated with by infusion pump and tubing between open chamber and the enclosed chamber, upper and lower anode locating slot and the negative electrode locating slot of nearby being equipped with respectively in the hole, slit on dividing plate top, insert respectively in this two groove and treat etching metal plate workpiece anode and profiling metal sheet auxiliary cathode, this two electrode is connected with the positive and negative electrode of direct supply respectively.
Advantage of the present invention is that device is simple and easy, low cost of manufacture, and the workpiece size is unrestricted, and electrolytically etching speed is fast, the precision height, tooling cost is low.
Description of drawings
Accompanying drawing 1 is the structural representation of the electrolytic etching device of metal sheet.
Embodiment
The circulation storage tank 1 that a dress electrolytically etching liquid 11 is housed of the present invention, this storage tank 1 is divided into two Room by dividing plate 9, one Room is an open chamber 3, another chamber is an enclosed chamber 2, be communicated with by infusion pump 7 and tubing 8 between open chamber 3 and the enclosed chamber 2, upper and lower anode locating slot 12 and the negative electrode locating slot 13 of nearby being equipped with respectively in the hole, slit 10 on dividing plate 9 tops, insert respectively in this two groove and treat etching metal plate workpiece anode 4 and profiling metal sheet auxiliary cathode 5, this two electrode is connected with the positive and negative electrode of direct supply 6 respectively.Electrolytically etching liquid 11 can be by the slit hole 10 of enclosed chamber 2 by dividing plate 9 tops through treating to flow to open chamber 3 between etching metal plate workpiece anode 4 and the profiling metal sheet auxiliary cathode 5.Start infusion pump 7, the electrolytically etching liquid 11 in the open chamber 3 can be got back to enclosed chamber 2 by tubing 8.Profiling metal sheet auxiliary cathode 5 has identical size and structure with treating etching metal plate workpiece anode 4, and profiling metal sheet 5 will carry out insulation shielding with the surface for the treatment of the corresponding part in etching metal plate 4 surperficial non-etching positions to be handled.Profiling metal sheet auxiliary cathode 5 with treat that the spacing of etching metal plate workpiece anode 4 is 1～20mm.
Embodiment 1:
Carry out to treat Hastelloy plate (the thick 0.6mm that electrolytically etching is processed before the etching, long 300mm, wide 200mm) mask process is carried out with the coating photoresist material in Biao Mian non-etching position, simultaneously identical 304 stainless steel plates of size are also done above-mentioned identical mask process, with device of the present invention the Hastelloy plate is carried out electrolytically etching processing then.
304 stainless steel plates of during operation above-mentioned mask process being crossed and Hastelloy plate insert negative electrode locating slot 13 and anode locating slot 12 (poly-PTFE is made) respectively, 304 stainless steel plates treat that as profiling metal sheet auxiliary cathode 5 and the conduct of Hastelloy plate etching metal plate workpiece anode 4 usefulness cables connect with the negative pole and the positive pole of direct supply 6 respectively, the cathode and anode spacing is 5mm, and then (weight percent is 50%H with electrolytically etching liquid 11 again
2SO
4+ 20%H
3PO
4+ 30%H
2The solution of O) pack circulation into in the storage tank 1 (making) by the UPVC material, during use, the amount of the electrolytically etching liquid 11 in the enclosed chamber 2 should surpass the upper end in the hole, slit 10 of dividing plate 9, infusion pump 7 during work (poly-tetrafluoro corrosion resistant pump) is connected power supply, by tubing 8 solution in the open chamber 3 is transported to enclosed chamber 2, solution in the enclosed chamber 2 flows into cloudy by the hole, slit on the dividing plate 9 10 again, between the anode, and turn back in the open chamber 3, form the liquid level difference between two Room, at this moment can come the height of regulator solution potential difference by the flow that changes infusion pump 7, control electrolytically etching liquid 11 is at negative electrode 5, flow velocity between the anode 4, when flow velocity reaches 5 meter per seconds, (12V, 1000A), regulating outward current density is 1A/cm to connect direct supply 6
2, etching and processing begins to carry out, and at this moment a large amount of bubbles that produce on negative electrode 5, the anode 4 directly are drained in the atmosphere in open chamber 3.The result: after about 30 minutes, the corrosion of the Hastelloy plate expose portion of the thick 0.6mm that mask process is crossed is mashed wears, and its line footpath deviation is ± 0.05mm.
Embodiment 2:
Device of the present invention also can be used for the electropolishing processing of metal sheet.Get two 304 stainless steel plates, except not carrying out the mask process, other all adopts the process that is same as among the embodiment 1, and the electrolytically etching liquid 11 here also will change the stainless steel electrolytic polishing fluid into (weight percent is 50%H certainly
3PO
4+ 50%H
2SO
4Solution), flow velocity and cathode and anode spacing are constant, current density is 0.8A/cm
2The result: after about 10 minutes, electropolishing processing work 304 stainless steel plates are Ra0.08 μ m after becoming polishing by the preceding surface roughness Ra 1.25 μ m of processing.
It is worthy of note that the present invention is not limited to the manufacture field described in the embodiment, it has also comprised other electrochemical machining process that utilizes device of the present invention to carry out.
Claims (4)
1. the electrolytic etching device of a metal sheet, it is characterized in that having the circulation storage tank (1) of a dress electrolytically etching liquid (11), this storage tank (1) is divided into two Room by dividing plate (9), one Room is open chamber (3), another chamber is enclosed chamber (2), be communicated with by infusion pump (7) and tubing (8) between open chamber (3) and the enclosed chamber (2), on the hole, slit (10) on dividing plate (9) top, anode locating slot (12) and negative electrode locating slot (13) nearby are housed respectively down, insert respectively in this two groove and treat etching metal plate workpiece anode (4) and profiling metal sheet auxiliary cathode (5), this two electrode respectively with direct supply (6) just, negative pole is connected.
2. device according to claim 1 is characterized in that the described non-etching position on etching metal plate workpiece anode (4) surface for the treatment of carries out mask process with the coating photoresist material.
3. device according to claim 1, it is characterized in that described profiling metal sheet auxiliary cathode (5) has identical size and structure with treating etching metal plate workpiece anode (4), the profiling metal sheet will carry out insulation shielding with the surface for the treatment of the corresponding part in etching metal plate non-etching position, surface to be handled.
4. device according to claim 1 is characterized in that described profiling metal sheet auxiliary cathode (5) and treats that the spacing of etching metal plate workpiece anode (4) is 1～20mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200510044904A CN100575564C (en) | 2005-10-12 | 2005-10-12 | The electrolytic etching device of metal sheet |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200510044904A CN100575564C (en) | 2005-10-12 | 2005-10-12 | The electrolytic etching device of metal sheet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1776029A true CN1776029A (en) | 2006-05-24 |
| CN100575564C CN100575564C (en) | 2009-12-30 |
Family
ID=36765739
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200510044904A Expired - Fee Related CN100575564C (en) | 2005-10-12 | 2005-10-12 | The electrolytic etching device of metal sheet |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100575564C (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107398608A (en) * | 2017-07-18 | 2017-11-28 | 中国原子能科学研究院 | A kind of workpiece circumferential surface electrolytic etching device |
| CN111263996A (en) * | 2017-10-25 | 2020-06-09 | 杰富意钢铁株式会社 | Method for producing stainless steel sheet for separator of fuel cell |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4802961A (en) * | 1987-12-23 | 1989-02-07 | Woog Manfred J | Silver removal apparatus and method |
| US6328872B1 (en) * | 1999-04-03 | 2001-12-11 | Nutool, Inc. | Method and apparatus for plating and polishing a semiconductor substrate |
-
2005
- 2005-10-12 CN CN200510044904A patent/CN100575564C/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107398608A (en) * | 2017-07-18 | 2017-11-28 | 中国原子能科学研究院 | A kind of workpiece circumferential surface electrolytic etching device |
| CN107398608B (en) * | 2017-07-18 | 2019-04-19 | 中国原子能科学研究院 | A kind of workpiece circumferential surface electrolytic etching device |
| CN111263996A (en) * | 2017-10-25 | 2020-06-09 | 杰富意钢铁株式会社 | Method for producing stainless steel sheet for separator of fuel cell |
| US11618967B2 (en) | 2017-10-25 | 2023-04-04 | Jfe Steel Corporation | Production method for stainless steel sheet for fuel cell separators |
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| Publication number | Publication date |
|---|---|
| CN100575564C (en) | 2009-12-30 |
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Granted publication date: 20091230 Termination date: 20101012 |