CN1747108A - Plasma display device and production thereof - Google Patents
Plasma display device and production thereof Download PDFInfo
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- CN1747108A CN1747108A CN 200410066272 CN200410066272A CN1747108A CN 1747108 A CN1747108 A CN 1747108A CN 200410066272 CN200410066272 CN 200410066272 CN 200410066272 A CN200410066272 A CN 200410066272A CN 1747108 A CN1747108 A CN 1747108A
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Abstract
The plasma display is equipped with sustain electrode unit that is separately formed on the cells board for red, green and blue discharge. The sustain electrode includes clear electrode containing block-out material that can remove all frequency light wave except light wave of cells.
Description
(1) technical field
The invention relates to plasma display, in more detail, is exactly about improving color purity, reducing a kind of plasma display and the manufacture method thereof of working procedure.
(2) background technology
Its operation principle of plasma display (being designated hereinafter simply as PDP) is by He+Xe, Ne+Xe, or the 147nm ultraviolet ray that takes place during noble gas discharge such as He+Xe+Ne impels light-emitting phosphor, and then display image.This PDP not only can manufacture large-screen and slim, and along with its picture quality of exploitation of nearest technology has also significantly raising.
With reference to Fig. 1, existing plasma display comprises the lower basal plate 2 that data electrode is housed and the upper substrate 4 of keeping the electrode group is housed.
On the formed lower basal plate 2 of data electrode, lower dielectric layer 14 and decomposition discharge cell body spaced walls 18.Be coated with fluorophor 16 on the surface of lower dielectric layer 14 and spaced walls 18.Visible light takes place in the light that fluorophor 16 sends by the ultraviolet ray that takes place when the plasma discharge.Keep to have in the upper board 4 that the electrode group forms and sequentially form upper dielectric layer and protective layer.Upper dielectric layer 6 has the wall electric charge when plasma discharge.Protective layer 8 is protected when plasma discharge and is kept electrode group and upper dielectric layer, and improves the discharging efficiency of secondary electron.Xenon is mixed injection PDP discharge cell body with the neon that is reduction discharge voltage, stable discharging, but xenon is the orange visible light of 585nm according to discharge generation wavelength, thereby has reduced color purity and the contrast of PDP.
In order to solve top existing problem, identical as shown in Figure 2, proposition is equipped with the PDP scheme of coloured filter.
Redness shown in Figure 2, green and blue color color filter respectively with upper dielectric layer on redness, green, the electrode group of keeping of blue discharge cell body overlap to form.Can improve the color purity of corresponding discharge cell body according to this coloured filter.
If have a look PDP manufacture craft with this color filter, after the electrically conducting transparent material is provided with on the upper substrate 4, on upper substrate 4, form transparency electrode 10A.12A identical shown in Fig. 3 a with etching method according to photoetching (photo-lithography) method of utilizing the 1st shielding (mask).After being provided with conductive material in the upper substrate 4 that transparency electrode 10A.12A forms, on upper substrate 4, form bus electrode 10B.12B identical shown in Fig. 3 B with etching method according to the photoetching process of utilizing the 2nd shielding (mask).On upper substrate 4, be formed with and keep electrode group Y, Z.After this, keep on the upper substrate 4 of electrode group Y, Z-shaped one-tenth and be formed with upper dielectric layer 6.After on the upper substrate 4 that upper dielectric layer 6 forms red resin being set, on upper substrate 4, form red filter 20R identical shown in Fig. 3 C with etching method according to the photoetching process of utilizing the 3rd shielding (mask).After on the upper substrate that red filter forms green resin being set, on upper substrate 4, form green filters 20G identical shown in Fig. 3 D with etching method according to the photoetching process of utilizing the 4th shielding (mask).After on the upper substrate that green filters forms blue resins being set, on upper substrate 4, form blue filter 20B identical shown in Fig. 3 E with etching method according to the photoetching process of utilizing the 4th shielding (mask).After this, on redness, green, the formed upper substrate 4 of blue color filter, by adhering to megohmite insulant, identical formation protective layer 8 shown in Fig. 3 F.
Identical therewith, for formation has the preceding glass plate of the PDP of color filter in the past, foundation is five times mask program altogether, makes manufacture process comparatively complicated, and expense is also higher relatively.
(3) summary of the invention
To the objective of the invention is in order addressing the above problem, a kind of raising colour purity to be provided, reduce plasma display of production process and preparation method thereof.
For achieving the above object, according to plasma display of the present invention is to be equipped with to keep the electrode group, it is formed on realizes respectively on red, the green and blue discharge cell body plate, the described electrode group of keeping comprises transparency electrode again, transparency electrode also includes the blocking-up material, and the blocking-up material refers to remove and embodies respective fine cell space wave band band of light in addition.
Transparency electrode is made of electrically conducting transparent material and blocking-up material.
Above said blocking-up material account for the degree of transparency electrode about 5%.
The material of blocking-up material band of light except the red wave band of realizing red discharge cell body can be at least In, Sn, Fe, among Mn and the Se any one.
The material of blocking-up material band of light except the green wave band of realizing green discharge cell body can be at least In, Sn, As, among V and the U any one.
The material of blocking-up material band of light except the blue wave band of realizing blue discharge cell body can be at least In, Sn, Nd, Pr, Cr, among Er and the Co any one.
Above saidly keep the electrode assembly and have the bus electrode that forms on the transparency electrode.
Above said plasma display also comprise: 2nd substrate relative with top substrate position; On the 2nd substrate with keep the data electrode that the electrode group intersects and forms; Spaced walls between aforesaid substrate and the 2nd substrate.
In order to realize top purpose, comprise following several steps according to draft display manufacture method of the present invention: first step forms the 1st transparency electrode, comprises the 1st blocking-up material, is the light except that realizing red wave band on the blocking-up substrate; Second step forms the 2nd transparency electrode, comprises the 2nd blocking-up material, is the light except that realizing green wave band on the blocking-up substrate; Third step forms the 3rd transparency electrode, comprises the 3rd blocking-up material, is the light except that realizing blue wave band on the blocking-up substrate; The 4th step is to form bus electrode and form to keep the electrode group on the substrate that the 1st to the 3rd transparency electrode forms; The 5th step is to form dielectric layer on the substrate of keeping the formation of electrode group; The 6th step is to form protective layer on the substrate that forms of dielectric layer.
Above said transparency electrode be by the transparent conductivity material and the blocking-up material constitute.
Above said the 1st to the 3rd the blocking-up material account for about 5% of transparency electrode.
Above said the 1st the blocking-up material be In at least, Sn, Fe, among Mn and the Se any one.
Above said the 2nd the blocking-up material be at least In, Sn, As, among V and the U any one.
Above said the 3rd the blocking-up material be at least In, Sn, Nd, Pr, Cr, among Er and the Co any one.
Except top described purpose, further feature of the present invention and characteristics with reference to institute's accompanying drawing by being described in detail to implementing example.
Effect of the present invention:
Same as described above, according to plasma display of the present invention and manufacture method thereof, the PDP transparency electrode realizes the blocking-up material of the percent of pass of the intrinsic wave band of color band of light in addition by including the corresponding discharge cell body of blocking-up, can improve the purity of plasma display color according to this blocking-up material, compared with prior art reduce the primary shielding program, and then can reduce manufacturing cost.
For further specifying above-mentioned purpose of the present invention, design feature and effect, the present invention is described in detail below with reference to accompanying drawing.
(4) description of drawings
Fig. 1 is the sectional view of the surface discharge type plasma display of AC driving mode;
Fig. 2 is the sectional view of preceding glass plate of the plasma display of existing outfit chromatic filter;
Fig. 3 a to 3f is the sectional drawing of the preceding glass board fabrication method of plasma display shown in Figure 2;
Fig. 4 is the cross-sectional view according to plasma display of the present invention;
Fig. 5 A to Fig. 5 E is the cross-sectional view of glass board fabrication method before the plasma display shown in Fig. 4 B.
Fig. 6 is the attachment device cross sectional representation of formation transparency electrode shown in Figure 4.
The symbol description of major part in the accompanying drawing:
2.4.32.34: substrate 6.14.36.44: dielectric layer
8.38: protective layer 16.46: luminescent coating
18.48: spaced walls
(5) embodiment
Below, we are described in detail plasma display of the present invention and manufacture method embodiment thereof with reference to Fig. 4 to Fig. 6.
With reference to Fig. 4, comprise preceding glass plate and back glass plate according to plasma display of the present invention.Before the glass plate comprise in the upper substrate 34 that order forms keep electrode group, upper dielectric layer and protective layer 38; Back glass plate is included in addressing electrode, lower dielectric layer, spaced walls and the luminescent coating that has order to form in the lower basal plate.Upper substrate 34 and lower basal plate 32 be arranged in parallel according to spaced walls.
Keep the electrode group and be by scan electrode and keep electrode and constitute.Scan electrode mainly provides the sweep signal and the signal of keeping that is used to keep discharge for scanning panel.Mainly provide and keep signal to keeping electrode.
Keep electrode group (Y, Z) comprise transparency electrode (40RA, 42RA, 40GA, 42GA, 40BA, 42BA) and bus electrode (40RB, 42RB, 40GB, 42GB, 40BB, 42BB).And transparency electrode is to be made of electrically conducting transparent material and blocking-up material, and the electrically conducting transparent material has the width of cloth of relative broad and occupies light percent of pass 90% or more, and the blocking-up material is blocked the light of the wave band of corresponding discharge cell body realization.Here, and transparency electrode (40RA, 42RA, 40GA, 42GA, 40BA is 42BA) because so the big electric power of resistance can not transmit effectively.Thus, transparency electrode (40RA, 42RA, 40GA, 42GA, 40BA, 42BA) go up by good conductivity material and by the metallics that silver or copper constitute form bus electrode (40RB, 42RB, 40GB, 42GB, 40BB, 42BB).Compensation transparency electrode (40RA, 42RA, 40GA, 42GA, 40BA, resistance composition 42BA).
The transparency electrode (40RA, 42RA) that realizes red discharge cell body is made of transparent conductivity material and blocking-up material, and the blocking-up material is to cut off to remove In Sn, the percent of pass of the wavelength light beyond the Fe, red intrinsic wave bands such as Mn and Se.For example, the Hong Se about 650nm of intrinsic wave band.
The transparency electrode (40GA, 42GA) that realizes green discharge cell body is made of transparent conductivity material and blocking-up material, and the blocking-up material is to cut off to remove In Sn, the percent of pass of the wavelength light beyond the As, green intrinsic wave bands such as V and U.For example, the Lv Se about 545nm of intrinsic wave band.
The transparency electrode (40BA, 42BA) that realizes blue discharge cell body is made of transparent conductivity material and blocking-up material, and the blocking-up material is to cut off to remove In Sn, Nd, Pr, the percent of pass of the wavelength light beyond the Cr, blue intrinsic wave bands such as Er and Co.For example, the Lan Se about 480nm of intrinsic wave band.
Here, the blocking-up material mixes mutually with the electrically conducting transparent material under the situation that does not reduce transparent conductivity material percent of pass, and for example, the blocking-up material accounts for the degree of whole clearing electrode about 5% to be mixed.
Upper dielectric layer 36 and lower dielectric layer 44 all have electric charge.
Data electrode (XR, XG, XB) with keep the staggered formation of electrode group (YR, XR, YG, ZG, YB, ZB), the data-signal of selecting the cell body that shows is provided to data electrode (XR, XG, XB).
Spaced walls and data electrode (XR, XG, XB) form side by side, and the ultraviolet leakage that prevents to generate owing to discharge is in adjacent cell body.
Identical therewith, realize the blocking-up material of the percent of pass of the intrinsic wave band of color band of light in addition according to PDP transparency electrode of the present invention by including the corresponding discharge cell body of blocking-up, improve colour purity, and improve contrast.
Fig. 5 a to Fig. 5 b is the cross-sectional view according to glass board fabrication method before the plasma display of the present invention.
As reference Fig. 5 a, on upper substrate 34, be formed with the 1st transparency electrode (40RA, 42RA) that realizes red discharge cell body.
The 1st transparency electrode (40RA, 42RA) is to cut off on upper substrate 34 after transparent conductivity material that the 1st blocking-up material of the percent of pass of band of light beyond the red wave band mixes adheres to, by forming according to the photoetching process program of the 1st shielding and the transparent conductivity material of etching method.For example, the 1st blocking-up material is at least In, Sn, and Fe, one among Mn and the Se accounts for 5% of electrically conducting transparent material and mixes.
As reference Fig. 5 B, on upper substrate 34, be formed with the 2nd transparency electrode that realizes green discharge cell body.
The 2nd transparency electrode (40RA, 42RA) is to cut off on upper substrate 34 after transparent conductivity material that the 1st blocking-up material of the percent of pass of band of light beyond the green wave band mixes adheres to, by forming according to the photoetching process program of the 1st shielding and the transparent conductivity material of etching method.For example, the 1st blocking-up material is at least In, Sn, and As, one among V and the U accounts for 5% of electrically conducting transparent material and mixes.
As reference Fig. 5 C, on upper substrate 34, be formed with the 3rd transparency electrode (40BA, 42BA) that realizes blue discharge cell body.
The 3rd transparency electrode (40RA, 42RA) is to cut off on upper substrate 34 after transparent conductivity material that the 1st blocking-up material of the percent of pass of band of light beyond the blue wave band mixes adheres to, by forming according to the photoetching process program of the 1st shielding and the transparent conductivity material of etching method.For example, the 1st blocking-up material is at least IIn, Sn, and Nd, Pr, Cr, one among Er and the Co accounts for 5% of electrically conducting transparent material and mixes.
As reference Fig. 5 D, the 1st to the 3rd transparency electrode (40RA, 42RA, 40GA, 42GA, 40BA, 42BA) on the formed upper substrate 346, be formed with bus electrode (40RB, 42RB, 40GB, 42GB, 40BB, 42BB).
Bus electrode (40RB, 42RB, 40GB, 42GB, 40BB is 42BB) at the 1st to the 3rd transparency electrode (40RA, 42RA, 40GA, 42GA, 40BA 42BA) on the upper substrate 34 of Xing Chenging, utilizes the lithographic procedures of the 4th shielding and the metallics of etching program to form behind the adhesion metal material.For example, metallics generally is to be formed by chromium.
Identical shown in Fig. 5 E, by being formed with upper dielectric layer 36 and protective layer 38 on the upper substrate 34 of keeping electrode (forming) formation by transparency electrode and bus electrode.
Identical therewith, forms by 4 mask programs altogether according to the preceding glass plate of plasma display of the present invention, so with compared the mask program minimizing originally, also become more simple, and reduced required expense.
Fig. 6 is for adhering to the schematic diagram of the attachment device that is provided with according to transparency electrode of the present invention.
As reference Fig. 6, for the attachment device that adheres to according to transparency electrode of the present invention comprises: board device SP is included in the electrode assembly TP of the electrode (target) that adheres on the substrate.
Electrode (target) device TP is made of magnet 60, rear board 62 and electrode 68.Magnet 60 is the electron detachment that prevents to take place in the ion other parts to sputter equipment, and magnetic field gets the nod.Rear board 62 is fixed the attachment material electrode 68 that forms on the substrate 34 according to sputter.Electrode 68 is made of with the compounding substances that the blocking-up material mixes mutually with compounding substances or the indium tin oxide that the blocking-up material mixes indium tin material.
Substrate SP is made of the base plate 66 of substrate 34 that is attached with attachment material according to the sputter program and support substrate 34.
Electrode assembly TP is connected with anode with the negative electrode of power supply respectively with substrate.In occurrence frequency, as the approval DC power supply, by effect of electric field electronics takes place in electrode, electronics quickens to transmit to the two poles of the earth.At this moment, accelerated electron conflicts gas ionization with the inert gas that provides to chamber.The cation of inert gas conflicts with the electrode that comprises the blocking-up material that is connected with negative electrode mutually by effect of electric field, and electrode unit breaks away from electrode surface, adheres on upper substrate and comprises the transparent conductivity material of blocking material.
Those of ordinary skill in the art will be appreciated that, above embodiment is used for illustrating the present invention, and be not to be used as limitation of the invention, as long as in connotation scope of the present invention, all will drop in the scope of claims of the present invention variation, the modification of the above embodiment.
Claims (14)
1, a kind of plasma display, what form on existing red, the green and blue discharge cell body plate of structure respectively keeps the electrode group, it is characterized in that:
The described electrode group of keeping comprises transparency electrode again, and described transparency electrode also includes the blocking-up material, and described blocking-up material refers to remove and embodies respective fine cell space wave band band of light in addition.
2, plasma display as claimed in claim 1 is characterized in that:
Described transparency electrode is to be made of electrically conducting transparent material and blocking-up material.
3, plasma display as claimed in claim 1 is characterized in that:
Described blocking-up material accounts for the degree of transparency electrode about 5%.
4, plasma display as claimed in claim 1 is characterized in that:
The material of described blocking-up material band of light except realizing the red wave band of red discharge cell body can be at least In, Sn, Fe, among Mn and the Se any one.
5, plasma display as claimed in claim 1 is characterized in that:
The material of described blocking-up material light of wave band except the green wave band of realizing green discharge cell body can be at least In, Sn, As, among V and the U any one.
6, plasma display as claimed in claim 1 is characterized in that:
The material of described blocking-up material light of wave band except the blue wave band of realizing blue discharge cell body can be at least In, Sn, Nd, Pr, Cr, among Er and the Co any one.
7, plasma display as claimed in claim 1 is characterized in that:
Describedly keep the electrode assembly and have the bus electrode that forms on the transparency electrode.
8, plasma display as claimed in claim 1 is characterized in that described plasma display also is provided with:
The 2nd substrate with described substrate relative position;
On described the 2nd substrate with keep the data electrode that the electrode group intersects and forms;
Spaced walls between described substrate and the 2nd substrate.
9, a kind of manufacture method of plasma display as claimed in claim 1 is characterized in that comprising following several steps:
First step forms the 1st transparency electrode, comprises the 1st blocking-up material, is the light except that realizing red wave band on the blocking-up substrate;
Second step forms the 2nd transparency electrode, and the 2nd blocking-up material of returning evil for good is the light except that realizing green wave band on the blocking-up substrate;
Third step forms the 3rd transparency electrode, and the 3rd blocking-up material of returning evil for good is the light except that realizing blue wave band on the blocking-up substrate;
The 4th step is to form bus electrode and form to keep the electrode group on the substrate that the 1st to the 3rd transparency electrode forms;
The 5th step is to form dielectric layer on the substrate of keeping the formation of electrode group;
The 6th step is to form protective layer on the substrate that forms of dielectric layer.
10, plasma display manufacture method as claimed in claim 9 is characterized in that:
Described transparency electrode is to be made of transparent conductivity material and blocking-up material.
11, plasma display manufacture method as claimed in claim 9 is characterized in that:
Described the 1st to the 3rd blocking-up material accounts for about 5% of transparency electrode.
12, plasma display manufacture method as claimed in claim 9 is characterized in that:
Described the 1st the blocking-up material be In at least, Sn, Fe, among Mn and the Se any one.
13, plasma display manufacture method as claimed in claim 9 is characterized in that:
Described the 2nd the blocking-up material is at least In, Sn, As, among V and the U any one.
14, plasma display manufacture method as claimed in claim 9 is characterized in that:
Described the 3rd the blocking-up material is at least In, Sn, Nd, Pr, Cr, among Er and the Co any one.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100662728A CN100377283C (en) | 2004-09-10 | 2004-09-10 | Plasma display device and production thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100662728A CN100377283C (en) | 2004-09-10 | 2004-09-10 | Plasma display device and production thereof |
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| Publication Number | Publication Date |
|---|---|
| CN1747108A true CN1747108A (en) | 2006-03-15 |
| CN100377283C CN100377283C (en) | 2008-03-26 |
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| Application Number | Title | Priority Date | Filing Date |
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| CNB2004100662728A Expired - Fee Related CN100377283C (en) | 2004-09-10 | 2004-09-10 | Plasma display device and production thereof |
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Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3147644B2 (en) * | 1994-03-04 | 2001-03-19 | 三菱マテリアル株式会社 | Composition for forming transparent conductive film and transparent conductive film |
| CN1230857C (en) * | 1999-12-21 | 2005-12-07 | 松下电器产业株式会社 | Plasma display panel and method for production thereof |
| KR100399787B1 (en) * | 2001-05-04 | 2003-09-29 | 삼성에스디아이 주식회사 | Plate and preparing method the same, plasma display panel having the plate |
| KR100495487B1 (en) * | 2002-12-06 | 2005-06-16 | 엘지마이크론 주식회사 | Rear panel for plasma display panel |
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| CN100377283C (en) | 2008-03-26 |
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