CN100377283C - Plasma display device and production thereof - Google Patents
Plasma display device and production thereof Download PDFInfo
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- CN100377283C CN100377283C CNB2004100662728A CN200410066272A CN100377283C CN 100377283 C CN100377283 C CN 100377283C CN B2004100662728 A CNB2004100662728 A CN B2004100662728A CN 200410066272 A CN200410066272 A CN 200410066272A CN 100377283 C CN100377283 C CN 100377283C
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Abstract
The present invention relates to a plasma display and the manufacturing method thereof. The plasma display of the present invention is provided with maintaining electrode groups formed on cell body boards, the cell body boards can respectively realize red discharge, green discharge and blue discharge. The maintaining electrode groups comprise transparent electrodes, and the transparent electrodes comprise breaking material which is waveband light except waveband light which presents the wavebands of corresponding cell bodies. The present invention can increase the color purity of a plasma display, and can decrease the manufacturing process of a plasma display.
Description
(1) technical field
The invention relates to plasma display, in more detail, is exactly about improving color purity, reducing a kind of plasma display and the manufacture method thereof of working procedure.
(2) background technology
Its operation principle of plasma display (being designated hereinafter simply as PDP) is by He+Xe, Ne+Xe, or the 147nm ultraviolet ray that takes place during noble gas discharge such as He+Xe+Ne impels light-emitting phosphor, and then display image.This PDP not only can manufacture large-screen and slim, and along with its picture quality of exploitation of nearest technology has also significantly raising.
With reference to Fig. 1, existing plasma display comprises the lower basal plate 2 that data electrode is housed and the upper substrate 4 of keeping the electrode group is housed.
On the formed lower basal plate 2 of data electrode, lower dielectric layer 14 and decomposition discharge cell body spaced walls 18.Be coated with fluorophor 16 on the surface of lower dielectric layer 14 and spaced walls 18.Visible light takes place in the light that fluorophor 16 sends by the ultraviolet ray that takes place when the plasma discharge.Keep to have in the upper board 4 that the electrode group forms and sequentially form upper dielectric layer and protective layer.Upper dielectric layer 6 has the wall electric charge when plasma discharge.Protective layer 8 is protected when plasma discharge and is kept electrode group and upper dielectric layer, and improves the discharging efficiency of secondary electron.Xenon is mixed injection PDP discharge cell body with the neon that is reduction discharge voltage, stable discharging, be the orange visible light of 585nm but xenon according to discharge wavelength takes place, thereby reduced color purity and the contrast of PDP.
In order to solve top existing problem, identical as shown in Figure 2, proposition is equipped with the PDP scheme of coloured filter.
Redness shown in Figure 2, green and blue color color filter respectively with upper dielectric layer on redness, green, the electrode group of keeping of blue discharge cell body overlap to form.Can improve the color purity of corresponding discharge cell body according to this coloured filter.
If have a look PDP manufacture craft with this color filter, after the electrically conducting transparent material is provided with on the upper substrate 4, on upper substrate 4, form transparency electrode 10A.12A identical shown in Fig. 3 a with etching method according to photoetching (photo-lithography) method of utilizing the 1st shielding (mask).After being provided with conductive materials in the upper substrate 4 that transparency electrode 10A.12A forms, on upper substrate 4, form bus electrode 10B.12B identical shown in Fig. 3 B with etching method according to the photoetching process of utilizing the 2nd shielding (mask).On upper substrate 4, be formed with and keep electrode group Y, Z.After this, keep on the upper substrate 4 of electrode group Y, Z-shaped one-tenth and be formed with upper dielectric layer 6.After on the upper substrate 4 that upper dielectric layer 6 forms red resin being set, on upper substrate 4, form red filter 20R identical shown in Fig. 3 C with etching method according to the photoetching process of utilizing the 3rd shielding (mask).After on the upper substrate that red filter forms green resin being set, on upper substrate 4, form green filters 20G identical shown in Fig. 3 D with etching method according to the photoetching process of utilizing the 4th shielding (mask).After on the upper substrate that green filters forms blue resins being set, on upper substrate 4, form blue filter 20B identical shown in Fig. 3 E with etching method according to the photoetching process of utilizing the 4th shielding (mask).After this, on redness, green, the formed upper substrate 4 of blue color filter, by adhering to megohmite insulant, identical formation protective layer 8 shown in Fig. 3 F.
Identical therewith, for formation has the preceding glass plate of the PDP of color filter in the past, foundation is five times mask program altogether, makes manufacture process comparatively complicated, and expense is also higher relatively.
(3) summary of the invention
To the objective of the invention is in order addressing the above problem, a kind of raising colour purity to be provided, reduce plasma display of production process and preparation method thereof.
For achieving the above object, according to plasma display of the present invention is to be equipped with to keep the electrode group on substrate, it is formed on realizes respectively on red, the green and blue discharge cell body plate, the described electrode group of keeping comprises transparency electrode again, transparency electrode also includes the blocking-up material, and the blocking-up material refers to the light of the wave band of the corresponding discharge cell body realization of blocking-up.
Transparency electrode is made of electrically conducting transparent material and blocking-up material.
Above said blocking-up material be under the situation of the light percent of pass that does not reduce the electrically conducting transparent material, to mix mutually with the electrically conducting transparent material.
Described blocking-up material is the material that the red discharge cell body of blocking-up is realized the wavelength light beyond the red wave band, is In, Sn, Fe, at least a among Mn and the Se.
Described blocking-up material is the material that the green discharge cell body of blocking-up is realized the wavelength light beyond the green wave band, is In, Sn, As, at least a among V and the U.
Described blocking-up material is the material that blocking-up blue discharge unit body is realized the wavelength light beyond the blue wave band, is In, Sn, Nd, Pr, Cr, at least a among Er and the Co.
Above saidly keep the electrode assembly and have the bus electrode that forms on the transparency electrode.
Above said plasma display also comprise: 2nd substrate relative with substrate position; On the 2nd substrate with keep the data electrode that the electrode group intersects and forms; Spaced walls between aforesaid substrate and the 2nd substrate.
In order to realize top purpose, comprise following several steps according to ion display manufacture method of the present invention: first step forms the 1st transparency electrode, comprise the 1st blocking-up material, red discharge cell body realizes that the wavelength light beyond the red wave band passes through on the blocking-up substrate; Second step forms the 2nd transparency electrode, comprises the 2nd blocking-up material, and green discharge cell body realizes that the wavelength light beyond the green wave band passes through on the blocking-up substrate; Third step forms the 3rd transparency electrode, comprises the 3rd blocking-up material, and the wavelength light beyond the discharge cell body realization blue wave band of blocking-up substrate blue is passed through; The 4th step is to form bus electrode and form to keep the electrode group on the substrate that has formed the 1st to the 3rd transparency electrode; The 5th step is to have formed dielectric layer having formed on the substrate of keeping the electrode group; The 6th step is to form protective layer on the substrate that has formed dielectric layer.Described the 1st to the 3rd blocking-up material is to mix mutually with the electrically conducting transparent material respectively under the situation of the light percent of pass that does not reduce the electrically conducting transparent material.
Above said transparency electrode be by the electrically conducting transparent material and the blocking-up material constitute.
Above said the 1st to the 3rd the blocking-up material be under the situation of the light percent of pass that does not reduce the electrically conducting transparent material, to mix mutually with the electrically conducting transparent material respectively.
Above said the 1st the blocking-up material be In at least, Sn, Fe, any one among Mn and the Se.
Above said the 2nd the blocking-up material be at least In, Sn, As, any one among V and the U.
Above said the 3rd the blocking-up material be at least In, Sn, Nd, Pr, Cr, any one among Er and the Co.
Except top described purpose, further feature of the present invention and characteristics with reference to institute's accompanying drawing by being described in detail to implementing example.
Effect of the present invention:
Same as described above, according to plasma display of the present invention and manufacture method thereof, the PDP transparency electrode realizes the blocking-up material of the percent of pass of the intrinsic wave band of color band of light in addition by including the corresponding discharge cell body of blocking-up, can improve the purity of plasma display color according to this blocking-up material, compared with prior art reduce the primary shielding program, and then can reduce manufacturing cost.
For further specifying above-mentioned purpose of the present invention, design feature and effect, the present invention is described in detail below with reference to accompanying drawing.
(4) description of drawings
Fig. 1 is the sectional view of the surface discharge type plasma display of AC driving mode;
Fig. 2 is the sectional view of preceding glass plate of the plasma display of existing outfit chromatic filter;
Fig. 3 a to 3f is the sectional drawing of the preceding glass board fabrication method of plasma display shown in Figure 2;
Fig. 4 is the cross-sectional view according to plasma display of the present invention;
Fig. 5 A to Fig. 5 E is the cross-sectional view of glass board fabrication method before the plasma display shown in Fig. 4 B;
Fig. 6 is the attachment device cross sectional representation of formation transparency electrode shown in Figure 4.
The symbol description of major part in the accompanying drawing:
2.4.32.34: substrate 6.14.36.44: dielectric layer
8.38: protective layer 16.46: luminescent coating
18.48: spaced walls
(5) embodiment
Below, we are described in detail plasma display of the present invention and manufacture method embodiment thereof with reference to Fig. 4 to Fig. 6.
With reference to Fig. 4, comprise preceding glass plate and back glass plate according to plasma display of the present invention.Before the glass plate comprise in the upper substrate 34 that order forms keep electrode group, upper dielectric layer and protective layer 38; Back glass plate is included in addressing electrode, lower dielectric layer, spaced walls and the luminescent coating that has order to form in the lower basal plate.Upper substrate 34 and lower basal plate 32 be arranged in parallel according to spaced walls.
Keep the electrode group and be by scan electrode and keep electrode and constitute.Scan electrode mainly provides the sweep signal and the signal of keeping that is used to keep discharge for scanning panel.Mainly provide and keep signal to keeping electrode.
Keep electrode group (Y, Z) comprise transparency electrode (40RA, 42RA, 40GA, 42GA, 40BA, 42BA) and bus electrode (40RB, 42RB, 40GB, 42GB, 40BB, 42BB).And transparency electrode is to be made of electrically conducting transparent material and blocking-up material, and the electrically conducting transparent material has the width of cloth of relative broad and occupies light percent of pass 90% or more, and the blocking-up material is blocked the light wavelength light in addition of the wave band that corresponding discharge cell body realizes and passed through.Here, and transparency electrode (40RA, 42RA, 40GA, 42GA, 40BA is 42BA) because so the big electric power of resistance can not transmit effectively.Thus, transparency electrode (40RA, 42RA, 40GA, 42GA, 40BA, 42BA) go up by conduct electricity good material and by the metallics that silver or copper constitute form bus electrode (40RB, 42RB, 40GB, 42GB, 40BB, 42BB).Compensation transparency electrode (40RA, 42RA, 40GA, 42GA, 40BA, resistance composition 42BA).
The transparency electrode (40RA, 42RA) that realizes red discharge cell body is made of electrically conducting transparent material and blocking-up material, and the blocking-up material is that the red discharge cell body of blocking-up realizes that the wavelength light beyond the red wave band passes through, for example, and the red about 650nm of intrinsic wave band.Blocking-up material in the transparency electrode of the discharge cell body that realization is red has In, Sn, Fe, Mn and Se etc.
The transparency electrode (40GA, 42GA) that realizes green discharge cell body is made of electrically conducting transparent material and blocking-up material, and the blocking-up material is that the green discharge cell body of blocking-up realizes that the wavelength light beyond the green wave band passes through, for example, and the green about 545nm of intrinsic wave band.Blocking-up material in the transparency electrode of the discharge cell body that realization is green has In, Sn, As, V and U etc.
The transparency electrode (40BA, 42BA) that realizes blue discharge cell body is made of electrically conducting transparent material and blocking-up material, and the blocking-up material is that the wavelength light beyond the blue discharge cell body realization blue wave band of blocking-up is passed through, for example, and the blue about 480nm of intrinsic wave band.Blocking-up material in the transparency electrode of the discharge cell body that realization is blue has In, Sn, Nd, Pr, Cr, Er and Co etc.
Here, the blocking-up material mixes mutually with the electrically conducting transparent material under the situation of the light percent of pass that does not reduce the electrically conducting transparent material.
Upper dielectric layer 36 and lower dielectric layer 44 all have electric charge.
Data electrode (XR, XG, XB) with keep the staggered formation of electrode group (YR, XR, YG, ZG, YB, ZB), the data-signal of selecting the cell cube that shows is provided to data electrode (XR, XG, XB).
Spaced walls and data electrode (XR, XG, XB) form side by side, and the ultraviolet leakage that prevents to generate owing to discharge is in adjacent cell cube.
Identical therewith, realize the blocking-up material of the percent of pass of the intrinsic wave band of color band of light in addition according to PDP transparency electrode of the present invention by including the corresponding discharge cell body of blocking-up, improve colour purity, and improve contrast.
Fig. 5 a to Fig. 5 b is the cross-sectional view according to glass board fabrication method before the plasma display of the present invention.
As reference Fig. 5 a, on upper substrate 34, be formed with the 1st transparency electrode (40RA, 42RA) that realizes red discharge cell body.
The 1st transparency electrode (40RA, 42RA) is after the 1st blocking-up material of the percent of pass of band of light mixes beyond the red wave band of blocking-up on upper substrate 34 electrically conducting transparent material adheres to, by forming according to the photoetching process program of the 1st shielding and the electrically conducting transparent material of etching method.For example, the 1st blocking-up material is at least In, Sn, and Fe, a kind of among Mn and the Se, described blocking-up material is to mix mutually with the electrically conducting transparent material under the situation of the light percent of pass that does not reduce the electrically conducting transparent material.
As reference Fig. 5 B, on upper substrate 34, be formed with the 2nd transparency electrode that realizes green discharge cell body.
The 2nd transparency electrode (40RA, 42RA) is after the 1st blocking-up material of the percent of pass of band of light mixes beyond the green wave band of blocking-up on upper substrate 34 electrically conducting transparent material adheres to, by forming according to the photoetching process program of the 1st shielding and the electrically conducting transparent material of etching method.For example, the 1st blocking-up material is at least In, Sn, and As, a kind of among V and the U, described blocking-up material is to mix mutually with the electrically conducting transparent material under the situation of the light percent of pass that does not reduce the electrically conducting transparent material.
As reference Fig. 5 C, on upper substrate 34, be formed with the 3rd transparency electrode (40BA, 42BA) that realizes blue discharge cell body.
The 3rd transparency electrode (40RA, 42RA) is after the 1st blocking-up material of the percent of pass of band of light mixes beyond the blocking-up blue wave band on upper substrate 34 electrically conducting transparent material adheres to, by forming according to the photoetching process program of the 1st shielding and the electrically conducting transparent material of etching method.For example, the 1st blocking-up material is at least IIn, Sn, and Nd, Pr, Cr, a kind of among Er and the Co, described blocking-up material is to mix mutually with the electrically conducting transparent material under the situation of the light percent of pass that does not reduce the electrically conducting transparent material.
As reference Fig. 5 D, the 1st to the 3rd transparency electrode (40RA, 42RA, 40GA, 42GA, 40BA, 42BA) on the formed upper substrate 346, be formed with bus electrode (40RB, 42RB, 40GB, 42GB, 40BB, 42BB).
Bus electrode (40RB, 42RB, 40GB, 42GB, 40BB is 42BB) at the 1st to the 3rd transparency electrode (40RA, 42RA, 40GA, 42GA, 40BA 42BA) on the upper substrate 34 of Xing Chenging, utilizes the lithographic procedures of the 4th shielding and the metallics of etching program to form behind the adhesion metal material.For example, metallics generally is to be formed by chromium.
Identical shown in Fig. 5 E, by being formed with upper dielectric layer 36 and protective layer 38 on the upper substrate 34 of keeping electrode (forming) formation by transparency electrode and bus electrode.
Identical therewith, forms by 4 mask programs altogether according to the preceding glass plate of plasma display of the present invention, so with compared the mask program minimizing originally, also become more simple, and reduced required expense.
Fig. 6 is for adhering to the schematic diagram of the attachment device that is provided with according to transparency electrode of the present invention.
As reference Fig. 6, for the attachment device that adheres to according to transparency electrode of the present invention comprises: board device SP is included in the electrode assembly TP of the electrode (target) that adheres on the substrate.
Electrode (target) device TP is made of magnet 60, rear board 62 and electrode 68.Magnet 60 is the electron detachment that prevents to take place in the ion other parts to sputter equipment, and magnetic field gets the nod.Rear board 62 is fixed the attachment material electrode 68 that forms on the substrate 34 according to sputter.Electrode 68 is made of with the compounding substances that the blocking-up material mixes mutually with compounding substances or the indium tin oxide that the blocking-up material mixes indium tin material.
Substrate SP is made of the base plate 66 of substrate 34 that is attached with attachment material according to the sputter program and support substrate 34.
Electrode assembly TP is connected with anode with the negative electrode of power supply respectively with substrate.In occurrence frequency, as the approval DC power supply, by effect of electric field electronics takes place in electrode, electronics quickens to transmit to the two poles of the earth.At this moment, accelerated electron conflicts gas ionization with the inert gas that provides to chamber.The cation of inert gas conflicts with the electrode that comprises the blocking-up material that is connected with negative electrode mutually by effect of electric field, and electrode unit breaks away from electrode surface, adheres on upper substrate and comprises the electrically conducting transparent material of blocking material.
Those of ordinary skill in the art will be appreciated that, above embodiment is used for illustrating the present invention, and be not to be used as limitation of the invention, as long as in connotation scope of the present invention, all will drop in the scope of claims of the present invention variation, the modification of the above embodiment.
Claims (14)
1. a plasma display is equipped with on substrate and keeps the electrode group, and this is kept the electrode group and is formed on red, the green and blue discharge cell body plate of realization respectively, it is characterized in that:
The described electrode group fork of keeping comprises transparency electrode, and described transparency electrode also includes the blocking-up material, and described blocking-up material refers to the material that the wavelength light beyond the band of light of blocking corresponding discharge cell body realization is passed through.
2. plasma display as claimed in claim 1 is characterized in that:
Described transparency electrode is to be made of electrically conducting transparent material and blocking-up material.
3. plasma display as claimed in claim 1 is characterized in that:
Described blocking-up material is to mix mutually with the electrically conducting transparent material under the situation of the light percent of pass that does not reduce the electrically conducting transparent material.
4. plasma display as claimed in claim 1 is characterized in that:
Described blocking-up material is the material that the red discharge cell body of blocking-up is realized the wavelength light beyond the red wave band, is In, Sn, Fe, at least a among Mn and the Se.
5. plasma display as claimed in claim 1 is characterized in that:
Described blocking-up material is the material that the green discharge cell body of blocking-up is realized the wavelength light beyond the green wave band, is In, Sn, As, at least a among V and the U.
6. plasma display as claimed in claim 1 is characterized in that:
Described blocking-up material is the material that the blue discharge cell body of blocking-up is realized the wavelength light beyond the blue wave band, is In, Sn, Nd, Pr, Cr, at least a among Er and the Co.
7. plasma display as claimed in claim 1 is characterized in that:
Describedly keep the electrode assembly and have the bus electrode that forms on the transparency electrode.
8. plasma display as claimed in claim 1 is characterized in that described plasma display also is provided with:
Be provided with the 2nd substrate with described substrate relative position;
On described the 2nd substrate with keep the data electrode that the electrode group intersects and forms;
Spaced walls between described substrate and the 2nd substrate.
9. the manufacture method of a plasma display as claimed in claim 1 is characterized in that comprising following several steps:
First step forms the 1st transparency electrode, comprises the 1st blocking-up material, and red discharge cell body realizes that the wavelength light beyond the red wave band passes through on the blocking-up substrate;
Second step forms the 2nd transparency electrode, comprises the 2nd blocking-up material, and green discharge cell body realizes that the wavelength light beyond the green wave band passes through on the blocking-up substrate;
Third step forms the 3rd transparency electrode, comprises the 3rd blocking-up material, and the wavelength light beyond the discharge cell body realization blue wave band of blocking-up substrate blue is passed through;
The 4th step is to form bus electrode and form to keep the electrode group on the substrate that has formed the 1st to the 3rd transparency electrode;
The 5th step is to have formed dielectric layer having formed on the substrate of keeping the electrode group;
The 6th step is to form protective layer on the substrate that has formed dielectric layer.
10. plasma display manufacture method as claimed in claim 9 is characterized in that:
Described transparency electrode is to be made of electrically conducting transparent material and blocking-up material.
11. plasma display manufacture method as claimed in claim 9 is characterized in that:
Described the 1st to the 3rd blocking-up material is to mix mutually with the electrically conducting transparent material respectively under the situation of the light percent of pass that does not reduce the electrically conducting transparent material.
12. plasma display manufacture method as claimed in claim 9 is characterized in that:
Described the 1st blocking-up material is In at least, Sn, Fe, any one among Mn and the Se.
13. plasma display manufacture method as claimed in claim 9 is characterized in that:
Described the 2nd blocking-up material is at least In, Sn, As, any one among V and the U.
14. plasma display manufacture method as claimed in claim 9 is characterized in that:
Described the 3rd blocking-up material is at least In, Sn, Nd, Pr, Cr, any one among Er and the Co.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100662728A CN100377283C (en) | 2004-09-10 | 2004-09-10 | Plasma display device and production thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100662728A CN100377283C (en) | 2004-09-10 | 2004-09-10 | Plasma display device and production thereof |
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| Publication Number | Publication Date |
|---|---|
| CN1747108A CN1747108A (en) | 2006-03-15 |
| CN100377283C true CN100377283C (en) | 2008-03-26 |
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| Application Number | Title | Priority Date | Filing Date |
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| CNB2004100662728A Expired - Fee Related CN100377283C (en) | 2004-09-10 | 2004-09-10 | Plasma display device and production thereof |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07242842A (en) * | 1994-03-04 | 1995-09-19 | Mitsubishi Materials Corp | Composition for forming transparent electrically-conductive film and transparent electrically-conductive film |
| CN1347564A (en) * | 1999-12-21 | 2002-05-01 | 松下电器产业株式会社 | Plasma display panel and method for production thereof |
| CN1384523A (en) * | 2001-05-04 | 2002-12-11 | 三星Sdi株式会社 | Plate for plasma display screen and its making process and display screen with the plate |
| WO2004053914A1 (en) * | 2002-12-06 | 2004-06-24 | Lg Micron Ltd. | Rear plate for plasma display panel |
-
2004
- 2004-09-10 CN CNB2004100662728A patent/CN100377283C/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07242842A (en) * | 1994-03-04 | 1995-09-19 | Mitsubishi Materials Corp | Composition for forming transparent electrically-conductive film and transparent electrically-conductive film |
| CN1347564A (en) * | 1999-12-21 | 2002-05-01 | 松下电器产业株式会社 | Plasma display panel and method for production thereof |
| CN1384523A (en) * | 2001-05-04 | 2002-12-11 | 三星Sdi株式会社 | Plate for plasma display screen and its making process and display screen with the plate |
| WO2004053914A1 (en) * | 2002-12-06 | 2004-06-24 | Lg Micron Ltd. | Rear plate for plasma display panel |
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| CN1747108A (en) | 2006-03-15 |
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