CN1708829A - Production method for exposure system, light source unit, exp0srue system, exposure method and adjustment method for exposure system - Google Patents

Abstract

A method of producing an exposure system which illuminates a mask by using an illuminating optical system including a condensing optical system to transfer the mask's pattern onto a photosensitive substrate, the method comprising the solid light source disposing step (S11) of disposing a plurality of solid light sources in the front-side focal point position of the condensing optical system or in a position optically conjugate to that position, and the adjusting steps (S12-S16) of setting the characteristics of the illuminating optical system, that have been set to a first condition suitable for a light source different from the plurality of solid light sources, to those in a second condition to be made suitable by disposing the solid light sources.

Description

The manufacture method of exposure device, the method for adjustment of light source cell, exposure device, exposure method and exposure device

Technical field

The invention relates to,, at desired, and form the manufacture method of the exposure device of precise pattern from the rayed of light source portion for semiconductor exposure device or crystal liquid substrate exposure device; Be used in the light source cell of exposure device; Exposure device with light source cell; Use the method for adjustment of the exposure method and the exposure device of this exposure device.

Background technology

Traditionally, semiconductor exposure device or crystal liquid substrate exposure device at desired, and form the light source of the projection aligner of precise pattern on substrate from the rayed of light source portion, and the ultraviolet light that its wavelength is about 360nm mainly is to use mercury vapor lamp etc.In the life-span of this mercury vapor lamp, because the chances are 500～1000 hours, the necessary periodic replacement of exposure device mercury vapor lamp causes the very big burden of user.Again, necessary high electric power to be guaranteeing high illumination, its follow heating also necessity countermeasure etc. is arranged, the problem that has a high operating cost with along with the former of long-time and deterioration thereby the danger of breaking.

For light-emitting diode,,, can realize significantly reducing operating cost because power saving, little caloric value are arranged compared with its luminous efficiency height of mercury vapor lamp.Again because the life-span is about 3000 hours, and the burden of replacing is little, not along with the former of long-time and deterioration thereby the danger of breaking.More in recently, UV-LED is developed, and it has the high light output rating of 100mw degree under wavelength 365nm.

The solid state light emitter of light-emitting diode etc. is used in the situation of projection aligner, though just like above-mentioned advantage, the projection aligner that the light source that uses traditional mercury vapor lamp etc. is arranged, viewpoint for all users, the cost of introducing new exposure device is not because low, can use existing exposure device during, do not have and be inclined to use new exposure device.

Therefore problem of the present invention is exactly, and for user's existing assets, the exposure device of the light source of use mercury vapor lamp etc. also can use solid state light emitter.

Summary of the invention

The manufacture method of exposure device of the present invention, the lamp optical system illumination one cover curtain that contains light-gathering optics for use, this is covered the manufacture method of the pattern transfer of curtain to the exposure device of photonasty substrate, its feature comprises the solid light source configuration step, with a plurality of solid light sources be configured in this light-gathering optics the focal position, front side or with the position of its optical conjugate, and set-up procedure, be configured to the characteristic of this lamp optical system of the 1st suitable state corresponding to the light source different with those solid light sources, by the configuration of those solid light sources, and set the characteristic of the 2nd suitable state for.

The manufacture method of exposure device of the present invention, this lamp optical system are included in the light integrator in the light path between those solid light sources and this light-gathering optics.

The manufacture method of exposure device of the present invention, use this lamp optical system illumination cover curtain, this is covered the manufacture method of the pattern transfer of curtain to the exposure device of photonasty substrate, its feature comprises the solid light source configuration step, with a plurality of solid light sources be configured in this lamp optical system fixed position, and set-up procedure, be configured to the characteristic of this lamp optical system of the 1st suitable state corresponding to the light source different with those solid light sources, by the configuration of those solid light sources, and set the characteristic of the 2nd suitable state for.

The manufacture method of exposure device of the present invention comprises, the light source different with those solid light sources, for example by light source that mercury vapor lamp constituted, get under the situation that changes solid light source into, by set-up procedure, be configured to the characteristic of this lamp optical system of the 1st suitable state corresponding to the light source different,, and set the characteristic of the 2nd suitable state for by the configuration of those solid light sources with those solid light sources.

Again, the manufacture method of exposure device of the present invention, this set-up procedure comprises the illumination unevenness set-up procedure of utilizing the illumination unevenness be adjusted at this cover curtain or this photonasty substrate, with the one at least of the heart set-up procedure far away of the heart far away that is adjusted at this cover act or this photonasty substrate to adjust.

The manufacture method of exposure device of the present invention can be made being adjusted at the illumination unevenness of cover curtain or this photonasty substrate, with the exposure device at the heart far away of this cover curtain or this photonasty substrate.

Again, the manufacture method of exposure device of the present invention, its feature comprises the angle of divergence set-up procedure of the angle of divergence of the one at least in a plurality of light beams that adjustment penetrates from those solid light sources by this set-up procedure, the step of the one at least of the luminous intensity distribution distribution set-up procedure that distributes with the luminous intensity distribution of adjusting the one at least in a plurality of light beams that penetrate from those solid light sources is to adjust.

The manufacture method of exposure device of the present invention can be made a plurality of angles of divergence that penetrate from those solid light sources to adjust, the exposure device that the luminous intensity distribution that penetrates from those solid light sources distributes.

Again, the manufacture method of exposure device of the present invention, this set-up procedure comprises: utilize a photocurrent versus light intensity set-up procedure of the photocurrent versus light intensity of adjusting this lamp optical system, with the ejaculation light set-up procedure of adjustment from the ejaculation light of those solid light sources.

Again, the manufacture method of exposure device of the present invention, this photocurrent versus light intensity set-up procedure wherein, utilize an illumination unevenness set-up procedure being adjusted at the illumination unevenness of this cover curtain or this photonasty substrate, with a heart set-up procedure far away with the heart far away that is adjusted at this cover act or this photonasty substrate at least one to adjust; And should penetrate the light set-up procedure, utilize to adjust an angle of divergence set-up procedure of the angle of divergence of the one at least in a plurality of light beams that penetrate from those solid light sources, the step of the one at least of a luminous intensity distribution distribution set-up procedure that distributes with the luminous intensity distribution of adjusting the one at least in a plurality of light beams that penetrate from those solid light sources is to adjust.

The manufacture method of exposure device of the present invention from a plurality of smooth angle of divergence that those solid light sources penetrate, with the adjustment that the luminous intensity distribution that penetrates from those solid light sources distributes, can be made exposure device.

Again, the manufacture method of exposure device of the present invention, its lamp optical system that contains a light-gathering optics for use is with the cover curtain that throws light on, with pattern transfer of this cover curtain to a photonasty substrate, the manufacture method of this exposure device comprises: a solid light source configuration step, with a plurality of solid light sources be configured in this light-gathering optics focal position, a front side or with a position of its optical conjugate; And a set-up procedure, be configured to the conditions of exposure of this exposure device of the 1st suitable state corresponding to the light source different with those solid light sources, by the configuration of those solid light sources, and set the conditions of exposure of the 2nd suitable state for.

Again, the manufacture method of exposure device of the present invention, it uses lamp optical system illumination one cover curtain will cover the pattern transfer of curtain to a photonasty substrate, the manufacture method of this exposure device, comprise: a solid light source configuration step, with a plurality of solid light sources be configured in this lamp optical system fixed position; And a set-up procedure, be configured to the conditions of exposure of this exposure device of the 1st suitable state corresponding to the light source different with those solid light sources, by the configuration of those solid light sources, and set the conditions of exposure of the 2nd suitable state for.

Again, the manufacture method of exposure device of the present invention, wherein this set-up procedure comprises that applying offset gives the step of controlling this light exposure control device.

Again, the manufacture method of exposure device of the present invention, wherein this set-up procedure comprises a photocurrent versus light intensity set-up procedure of the photocurrent versus light intensity of adjusting this lamp optical system, with at least one of adjustment from an ejaculation light set-up procedure of the ejaculation light of those solid light sources.

The manufacture method of exposure device of the present invention is not in the light source of a plurality of solid light sources, for example by light source that mercury vapor lamp constituted, it is got under the situation that changes solid light source into, utilize set-up procedure, light source is got the difference of the conditions of exposure that changes as offset, impose on control device, and the control exposure.

Again, the manufacture method of exposure device of the present invention, wherein those solid light sources comprise light emitting diode matrix.

Again, light source cell of the present invention, this light source cell detachable be installed in the lighting device, this light source cell comprises: a plurality of solid light source assortments become a solid light source array of array-like; And the light exit side that is configured in this solid light source array, optical element for array-like, wherein with respect to the light source different with this solid light source array, be configured to the characteristic of this lighting device of the 1st suitable state, configuration by those solid light sources, and set the characteristic of the 2nd suitable state for, contain the ejaculation light that the angle of divergence and luminous intensity distribution distribute to should lighting device providing.

Again, light source cell of the present invention, wherein this solid light source array and this optical element can be configured in the oval shape mirror and the light path between the light integrator in this lighting device that will assemble from the light of illuminator.

Light source cell of the present invention, Different Light with respect to the solid light source array of lighting device, for example, with respect to light source by mercury vapor lamp constituted, be configured to the characteristic of this lighting device of the 1st suitable state, by the configuration of those solid light sources, and set the characteristic of the 2nd suitable state for, can provide and contain the ejaculation light that the angle of divergence and luminous intensity distribution distribute.

Again, light source cell of the present invention comprises the adjusting device of the ejaculation light characteristic of this adjustment solid light source array.Light source cell of the present invention utilizes adjusting device to adjust the ejaculation light characteristic of solid light source array.

Again, light source cell of the present invention more comprises a plurality of optical fiber, and each incident end of those optical fiber is connected with those solid light sources.

Light source cell of the present invention can make the degree of freedom of configuration of solid light source big, and forms the assortment shape of the ejecting end of a plurality of optical fiber easily arbitrarily.

Again, light source cell of the present invention comprises: a plurality of solid light source assortments become a solid light source array of array-like, and the adjusting device of adjusting the ejaculation light characteristic of this solid light source array.

Again, light source cell of the present invention, wherein this adjusting device can be adjusted the angle of divergence of the light that penetrates from this solid light source array, the luminous intensity distribution of the light that penetrates from this solid light source array distributes, at the wherein one at least of the illumination inequality degree of plane of illumination and the heart far away.

Light source cell of the present invention, the luminous intensity distribution that can adjust the angle of divergence, the light of the light that penetrates from the solid light source array by adjusting device distribute, at the uneven illumination and the heart far away of plane of illumination.

Again, light source cell of the present invention more comprises a plurality of optical fiber, and each incident end of those optical fiber is connected with those solid light sources.

Light source cell of the present invention can make the degree of freedom of configuration of solid light source big, and forms the assortment shape of the ejecting end of a plurality of optical fiber easily arbitrarily.

Again, exposure method of the present invention is applicable to the exposure device that the manufacture method as exposure device of the present invention manufactures, and comprises the light of utilization from those solid light sources, with an illumination step of this cover curtain that throws light on; And will cover the transfer step of the pattern transfer of curtain to this photonasty substrate.

Again, exposure method of the present invention, wherein this transfer step comprises that use will cover the pattern image of curtain and project to the projection optical system of this photonasty substrate, with pattern transfer of this cover curtain step to this photonasty substrate.

Exposure method of the present invention, be configured to the characteristic of this lighting device of the 1st suitable state because of the light source that use is relative and a plurality of solid light sources are separate, configuration by those solid light sources, and set the exposure device of the characteristic of the 2nd suitable state for, the pattern of cover curtain can well be transferred to this photonasty substrate.

Again, exposure device of the present invention comprises: as light source cell of the present invention; And, utilize a lighting device that should cover curtain from the optical illumination of this light source cell for the pattern exposure that will cover curtain arrives the photonasty substrate.

Again, exposure device of the present invention comprises that more the graphic pattern projection with this cover curtain arrives the projection optical system of photonasty substrate.

Exposure device of the present invention, light source cell is with respect to lighting device, the light source different with solid light source, for example, because, be configured to the characteristic of this lighting device of the 1st suitable state with respect to by the light source that mercury vapor lamp constituted, configuration by those solid light sources, and set the characteristic of the 2nd suitable state for, and can provide and contain the ejaculation light that the angle of divergence and luminous intensity distribution distribute, therefore the pattern of cover curtain can well be transferred to this photonasty substrate.

Again, exposure method of the present invention is used in as exposure device of the present invention, and this exposure method comprises an illumination step, utilizes light from this light source cell with this cover curtain that throws light on, and a transfer step, and pattern transfer of this cover curtain is arrived this photonasty substrate.

Exposure method of the present invention, light source cell is with respect to lighting device, the light source different with solid light source, for example, because use, be configured to the characteristic of this lighting device of the 1st suitable state with respect to by the light source that mercury vapor lamp constituted, configuration by those solid light sources, and set the characteristic of the 2nd suitable state for, and the exposure device that contains the ejaculation light that the angle of divergence and luminous intensity distribution distribute can be provided, therefore the pattern of cover curtain can well be transferred to this photonasty substrate.

Again, the method of adjustment of exposure device of the present invention, be used in order to cover the pattern transfer of curtain to a photonasty substrate one, by the lamp optical system that includes light-gathering optics, utilization is from the light of the light supply apparatus method of adjustment with the exposure device of this cover curtain that throws light on, comprise a solid light source configuration step, with a plurality of solid light sources that replace this light supply apparatus be configured in this light-gathering optics the focal position, front side or with its optical conjugate position, an and set-up procedure, utilize the configuration of those solid light sources, to adjust the photocurrent versus light intensity of this lamp optical system.

The method of adjustment of exposure device of the present invention, though will replace a plurality of solid light sources of light supply apparatus be configured in this light-gathering optics focal position, a front side or with the position of its optical conjugate, utilize set-up procedure, as the photocurrent versus light intensity of the lamp optical system of exposure device, can be well maintained.

Again, the method of adjustment of exposure device of the present invention, in order to cover the pattern transfer of curtain to a photonasty substrate with one, by lamp optical system, utilization is from the light of the light supply apparatus method of adjustment with the exposure device of this cover curtain that throws light on, comprise: a solid light source configuration step is configured in a plurality of solid light sources that replace this light supply apparatus institute's allocation of this lamp optical system; And a set-up procedure, utilize the configuration of those solid light sources, to adjust the photocurrent versus light intensity of this lamp optical system.

The method of adjustment of exposure device of the present invention, though will replace institute's allocation that a plurality of solid light sources of this light supply apparatus are configured in this lamp optical system, can be well maintained as the photocurrent versus light intensity or the conditions of exposure of the lamp optical system of exposure device.

Again, exposure method of the present invention is used to utilize as the method for adjustment of exposure device of the present invention and the exposure method of controlled exposure device comprises an illumination step, by lamp optical system, utilizes from the light of those solid light sources to throw light on this cover act; And a transfer step, with pattern transfer of this cover curtain to this photonasty substrate.

Exposure method of the present invention, the photocurrent versus light intensity of lamp optical system, because suitably adjust a plurality of solid light sources that replace the electro-optical device configuration, the pattern of cover curtain can well be transferred to a photonasty substrate.

Again, the method for adjustment of exposure device of the present invention, the lamp optical system that is used to include light-gathering optics is covered the method for adjustment of the pattern transfer of curtain to the exposure device of a photonasty substrate with illumination cover curtain with this.This method comprises a solid light source configuration step, with a plurality of solid light sources be configured in this light-gathering optics the focal position, front side or with its optical conjugate position; And a set-up procedure, be configured to the conditions of exposure of this exposure device of the 1st suitable state corresponding to the light source different with those solid light sources, by the configuration of those solid light sources, and set the conditions of exposure of the 2nd suitable state for.

Again, the method of adjustment of a kind of exposure device of the present invention, be used for lamp optical system with illumination cover curtain, this is covered the method for adjustment of the pattern transfer of curtain to the exposure device of a photonasty substrate, comprise: a solid light source configuration step, with a plurality of solid light sources be configured in this lamp optical system fixed position; And a set-up procedure, be configured to the conditions of exposure of this exposure device of the 1st suitable state corresponding to the light source different with those solid light sources, by the configuration of those solid light sources, and set the conditions of exposure of the 2nd suitable state for.

As the manufacture method of exposure device of the present invention, comprise and apply offset and give the step be controlled at this light exposure control device in this set-up procedure again.

Again, as the method for adjustment of exposure device of the present invention, wherein this set-up procedure comprises a photocurrent versus light intensity set-up procedure of the photocurrent versus light intensity of adjusting this lamp optical system, with at least one of adjustment from an ejaculation light set-up procedure of the ejaculation light of those solid light sources.

Again, exposure device of the present invention is by as any manufacture method manufacturing in the claim 1～12.

Again, exposure device of the present invention, by as claim 25～26, any manufacture method manufacturing in 28～31.

Above-mentioned explanation only is the general introduction of technical solution of the present invention, for can clearer understanding technological means of the present invention, and can be implemented according to the content of specification, and for above-mentioned and other purposes, feature and advantage of the present invention can be become apparent, below especially exemplified by preferred embodiment, and conjunction with figs., be described in detail as follows.

Description of drawings

Figure 1 shows that projection aligner schematic diagram according to the first embodiment of the present invention.

Figure 2 shows that manufacture method flow chart according to the projection aligner of the first embodiment of the present invention.

Figure 3 shows that projection aligner schematic diagram according to the second embodiment of the present invention.

Figure 4 shows that manufacture method flow chart according to the projection aligner of the second embodiment of the present invention.

Figure 5 shows that projection aligner schematic diagram according to the third embodiment of the present invention.

Figure 6 shows that projection aligner schematic diagram according to the fourth embodiment of the present invention.

Fig. 7 A～Fig. 7 B is depicted as the key diagram according to light source cell of the present invention.

Figure 8 shows that key diagram according to light source cell of the present invention.

Fig. 9 A～Fig. 9 C is depicted as the key diagram according to light source cell of the present invention.

Figure 10 shows that flow chart according to microcomponent manufacture method of the present invention.

Figure 11 shows that flow chart according to microcomponent manufacture method of the present invention.

Figure 12 shows that structural representation according to optical fiber source of the present invention.

Figure 13 shows that structural representation according to another optical fiber source of the present invention.

Figure 14 A～Figure 14 C is depicted as according to the present invention, the schematic diagram of the light beam outer rim shape that penetrates from light source.

Figure 15 A～Figure 15 B is depicted as the schematic diagram from the shape of the ejecting end of optical fiber source according to the present invention.

Figure 16 shows that according to the present invention from the shape of the ejecting end of the optical fiber source schematic diagram similar to the shape of the member of fly's eye integrator.

Figure 17 shows that according to the present invention for optical fiber source, from the useful light of solid light source ejaculation, in order to introduce the condition stub schematic diagram of optical fiber.

Figure 18 shows that according to the present invention structural representation from the ejecting end of optical fiber source to the fly's eye integrator.

Figure 19 shows that one member shape schematic diagram according to fly's eye integrator of the present invention.

Figure 20 shows that the shape schematic diagram from the ejecting end of optical fiber source according to the present invention.

Shown in Figure 21 is schematic diagram according to its graphic of state of the statistical averageization of the output characteristic of each solid light source of the present invention.

Shown in Figure 22 is structural representation according to scanning exposure apparatus of the present invention.

Shown in Figure 23 is according to scanning exposure apparatus of the present invention, and design has the structural representation of 4 movable shields.

Shown in Figure 24 have the exposure device structural representation that prevents Charging system for possessing according to the present invention.

Embodiment

Reach technological means and the effect that predetermined goal of the invention is taked for further setting forth the present invention, below in conjunction with accompanying drawing and preferred embodiment, the manufacture method of the exposure device that foundation the present invention is proposed, its embodiment of the method for adjustment of light source cell, exposure device, exposure method and exposure device, structure, feature and effect thereof, describe in detail as after.

Below see also diagram, the embodiment of the invention is described.Figure 1 shows that projection aligner schematic diagram according to the first embodiment of the present invention.

Projection aligner as shown in Figure 1 has the light source 1 of representative by the light source that high-pressure mercury-vapor lamp became.This light source 1 becomes the light emitting diode matrix of array-like to be constituted by light-emitting diode (solid light source) assortment, is arranged on the 2nd focal position with oval shape mirror 2 of the reflecting surface that is become by the ellipse of revolution face.In the 2nd focal position of oval shape mirror 2, be with the optical conjugate position of the focal position, front side (light source side focal position) of light-gathering optics 7 described later.More, also can dispose the position of light source 1, near the optical conjugate position of the focal position, front side (light source side focal position) of light-gathering optics 7.Again, by the light-emitting diode that light source 1 is constituted, 1 has the above output rating of 10mW approximately, and its output wavelength is preferable below 450nm.

From the light beam of the light source 1 of the 2nd focal position that is configured in oval shape mirror 2, utilize aim at lens 3 and convert about directional light to after, from fly lens 4 incidents of light integrator.

Fly lens 4 is parallel to benchmark optical axis AX by its optical axis of a plurality of lens components that positive refracting power is arranged, and becomes in the tight assortment of direction in length and breadth.Constitute each lens component of fly lens 4, have and the similar rectangular-shaped section of shot shape (in other words on flat board, should form the shape of exposure area) that on the cover curtain, should form.Again, constitute the incident end face of each lens component of fly lens 4, form convex surface dome shape, with convex surface dome shape to ejecting end to the incident end.

Therefore, be incident in the light beam of fly lens 4, its corrugated is cut apart by individual lens component, forms a light source picture respectively at the rear side focus face of each lens component.Promptly be that the rear side focus face of fly lens 4 promptly is the secondary light source that is formed by the material surface light source that a plurality of light source pictures are become.From the light beam of the secondary light source of the rear side focus face that is formed on fly lens 4, from being configured in σ aperture 5 incidents nearby.σ aperture 5 is configured in the about optical conjugate of the entrance pupil face position with aftermentioned projection optical system PL, and the variable openings portion that wants scope in order to the illumination that limits secondary light source is arranged.σ aperture 5, by the variation in the opening of peristome footpath, the σ value of decision lighting condition (at the opening of the pupil face of projection optical system directly with respect to the relative aperture of the secondary light source picture on its pupil face) is to set desired value for.

By the light beam of σ aperture 5 from secondary light source, after the optically focused effect of the light-gathering optics 7 that is constituted by speculum 6 and via a plurality of lens 7a～7c, decide pattern with the institute that is formed on cover curtain M, the ground that overlaps is even to throw light on.See through the light beam of the pattern of cover curtain M,, on the dull and stereotyped P of photonasty substrate, form the picture of cover curtain pattern by projection optical system PL.

More, utilize the light source 1 that is made of these light-emitting diodes (solid light source), dull and stereotyped P (plane of illumination) obtains the above illumination of 50mW/cm**2.Again, utilize light source 1, at dull and stereotyped P (plane of illumination), can be suppressed at respect to the mean value (fiducial value) of uneven illumination degree positive and negative 10% in.At this, the uneven illumination degree I (%) of dull and stereotyped relatively P illumination fiducial value, its maximum Imax (W/ centimetre square) at the mean value of the illumination scanning direction of dull and stereotyped P (X-direction), at the minimum value Imin of the mean value of the illumination scanning direction of dull and stereotyped P (X-direction) (W/ centimetre square), it is represented with following mathematical expression:

I＝{(Imax-Imin)/(Imax+Imin)}×100(％)。

Again, at this projection aligner, light source 1, the output rating below specified output rating penetrates illumination light.Therefore, can prolong the life-span of solid light source.Then, in the plane of the optical axis orthogonal of projection optical system PL, the secondary light source by the dull and stereotyped P of drive controlling carries out burn-out or scan exposure, and in each exposure area of dull and stereotyped P, the pattern of cover curtain M is exposed one by one.

More, dull and stereotyped P is positioned on the dull and stereotyped platform PS, on dull and stereotyped platform PS, disposes illumination sensor 8.Again, in the light path between fly lens 4 and the speculum 6, dispose optical splitter 9, the light by optical splitter 9 reflections is incident in integration sensor 10.The detection signal of integration sensor 10 is to control part 11 outputs.Again, the detection signal of illumination sensor 8 is to control part 11 outputs.

At this, the relation of the detection signal of integration sensor 10 and the exposure illumination on dull and stereotyped P, high precision computation in advance, and by the memory body of memory in control part 11.Control part 11 is by can indirectly the supervision exposure illumination (mean value) of dull and stereotyped P and the member of its integrated value (mean value of integrating exposure) being made of the detection signal of integration sensor 10.This control part 11 from the light of light source 1, is calculated integrated value to the exposure illumination of dull and stereotyped P by integration sensor 10 in exposure.Control part 11 is calculated the integrated value of illumination one by one, and its corresponding result obtains the correct exposure amount at dull and stereotyped P, and the output rating of control light source 1.More, the testing result of the testing result of illumination sensor 8 and integration sensor 10 shows at display part.

Take second place, carry out explanation the making method of the projection aligner of Fig. 1.Figure 2 shows that manufacture method flow chart according to the projection aligner of the first embodiment of the present invention.

At first, will there be the mercury vapor lamp of the projection aligner of the light source that becomes by high-pressure mercury-vapor lamp to get except that (S10).Take second place, become the source that light emitting diode matrix constituted 1 of array-like, be arranged on the 2nd focal position (S11) of oval shape mirror 2 by light-emitting diode (solid light source) assortment.At this, the 2nd focus of oval shape mirror 2 be with the optical conjugate position of the focal position, front side of light-gathering optics 7.More, the position of configuration light source 1 also can be near the optical conjugate position of the focal position, front side of light-gathering optics 7.

Then, configuration compensates the value of its conditions of exposure difference by the light source that light emitting diode matrix constituted 1 of representative by the light source that high-pressure mercury-vapor lamp became, and is not shown in figure, is input to control part 11 (S12) by input part.This promptly corresponding to by the light source that high-pressure mercury-vapor lamp became, is set in the conditions of exposure of the exposure device of the 1st suitable state, for example, and time for exposure, exposure etc., corresponding light source 1 and suitably set the conditions of exposure of the 2nd state for.

Then, carry out the adjustment (S13) of the angle of divergence of the light that penetrates by light source 1.In the adjustment of the angle of divergence of this light that penetrates by light source 1, can utilize the light that penetrates by light source 1 and be incident in the adjustment of aiming at lens 3 and carry out.For example, aim at lens 3 and constituted, and the lens utilization of a part is moved etc. in optical axis AX direction, can adjust the adjustment by the angle of divergence of light source 1 ejaculation light by a plurality of lens.Even a part of light-emitting diode that constitutes in a plurality of light-emitting diodes of light source 1 tilts, also can carry out the adjustment of the angle of divergence of the light that penetrates by light source 1 again.

More, be used as a plurality of light-emitting diodes that constitute light source 1,, also can carry out the adjustment of the angle of divergence of the light that penetrates by light source 1 even select its optimal angle of divergence in advance.Again, light-emitting face end configuration lens arra that also can light source 1, and adjust the angle of divergence of light by lens arra.

Then, carry out the adjustment (S14) that the luminous intensity distribution of the light that penetrated by light source 1 distributes.The adjustment that this is distributed by the luminous intensity distribution of the light of light source 1 ejaculation, configuration fly's eye array can be adjusted by the aberration of fly's eye array at the light-emitting face end of light source 1.Also can adjust by the arrangement angles filter at indivedual light-emitting face ends of a plurality of light-emitting diodes that constitute light source 1 again.More, even a part of light-emitting diode that constitutes among a plurality of light-emitting diodes of light source 1 tilts, also can carry out the adjustment of the light distribution characteristic of the light that penetrates by light source 1.

Then, cover the curtain or dull and stereotyped P on illumination unevenness adjustment (S15).The uneven degree adjustment of throwing light on is to carry out according to the illumination sensor 8 detected results that are configured on the dull and stereotyped P.The adjustment of this illumination unevenness comprises tilting uneven adjustment and the uneven adjustment of symmetrical centre.The uneven adjustment of tilting constitutes a part of lens of light-gathering optics 7, for example can be by with the relative optical axis AX skew of lens 7b, or make and carry out.Again, can be by will aiming at the relative optical axis AX skew of lens 3, or make and carry out.Again, the uneven adjustment of symmetrical centre, a part of lens of formation light-gathering optics 7 for example can and carry out the skew of the relative optical axis AX of lens 7b direction.

Then, cover the adjustment (S16) of the heart far away (telecentricity) on act M or the dull and stereotyped P.More, the adjustment of the heart far away is arranged on the position sensor (being not shown among the figure) of dull and stereotyped P bottom, according to being carried out to the image position testing result, optical axis direction in projection optical system is moved and carrying out.At this, the adjustment of the heart far away on cover curtain M or the dull and stereotyped P comprises the adjustment of the heart far away that tilts and the adjustment of the multiplying power heart far away.The tilt adjustment fly's eye unit of the heart far away promptly is that fly's eye array 4 and δ aperture 5 are one, can be by with respect to the moving of optical axis AX, or only be that δ aperture 5 carries out with respect to moving of optical axis AX.Can be undertaken by the light quantity distribution of controlling a plurality of light-emitting diodes that constitute light source 1 again.

Again, the adjustment of the multiplying power heart far away, the fly's eye unit promptly is that fly's eye array 4 and δ aperture 5 are one, moves by making at optical axis AX, or only is that δ aperture 5 carries out with respect to moving of optical axis AX.By carrying out above adjustment, has the manufacturing of the projection aligner of light source 1 for one-tenth.

In the manufacture method of this embodiment about projection aligner, the light source of the projection aligner of both having deposited, because use the lamp of metal gas or rare gas etc., it can be substituted by the tool long-life and the light-emitting diode of advantages such as low operating cost be arranged or laser diode etc., promptly so-called solid light source.Therefore, can be provided in the projection aligner of the light source of the danger that under the low operating cost is arranged the long-life and do not break.

Then, consult Fig. 3, Figure 3 shows that projection aligner schematic diagram according to the second embodiment of the present invention.In the explanation of second embodiment, the member identical with the projection aligner of first embodiment just uses the symbol identical with first embodiment with explanation.

By Fig. 3 is second embodiment, the structural representation of projection aligner.As the projection aligner shown in Figure 3, has the light source that becomes by high-pressure mercury-vapor lamp with light source 1 representative.This light source 1 is by arranging with array-like with light-emitting diode (solid light source) and constitute light emitting diode matrix, and is seated in the position that the focal position, front side of light-gathering optics 7 is determined.Again, the position of configuration light source 1 also can be near the focal position, front side of light-gathering optics 7.

From the emitted light beam of the light source 1 of the focal position, front side that is configured in light-gathering optics 7, be utilized the optically focused effect of the light-gathering optics 7 that a plurality of lens 7a～7c are constituted by speculum 6 after, overlap with the cover curtain M that is formed fixed to some extent pattern, and evenly illumination.Penetrated the light beam of the pattern of cover curtain M, and, had the dull and stereotyped P of photonasty substrate to go up the image that forms the pattern that covers curtain M by projection optical system PL.So, in the plane of the optical axis orthogonal of projection optical system PL in, dull and stereotyped P is by the drive controlling of two dimension, carrying out burn-out or scan exposure, expose one by one with the pattern of cover curtain M in each exposure area of dull and stereotyped P.

Again, dull and stereotyped P on a dull and stereotyped platform PS, on dull and stereotyped platform PS, is disposed illumination sensor 8 by mounting.In the light path between light source 1 and the speculum 6, dispose optical splitter 9 again.The light that utilizes optical splitter 9 to be reflected makes to be incident in integration sensor 10.By the detection signal of integration sensor 10, to control part 11 outputs.According to the conditions of exposure that is stored, corresponding light source 1 is exported control signal.Again, the result that detects who detects result and integration sensor 10 with illumination sensor 8 is presented on the display part 12.

Then, manufacture method to the projection aligner of this place 2 embodiment is described.Fig. 4 is the manufacture method flow chart as the projection aligner of the 1st embodiment.

At first, from the projection aligner of the light source that is become by high-pressure mercury-vapor lamp is arranged, light source, aligning lens, fly's eye array and the aperture of high-pressure mercury-vapor lamp are got except that (S20), then, by the light source that light emitting diode matrix constituted that the light-emitting diode assortment is become array, be configured in the focal position, front side (S21) of light-gathering optics 7.Again, the position of configuration light source 1 also can be near the focal position, front side of light-gathering optics 7.

Then, carry out adjustment (S23) to the angle of divergence of the emitted light of light source 1.The adjustment of the angle of divergence of the light that this light source 1 is emitted can make the adjustment that is incident in light-gathering optics 7 from light source 1 emitted light.Promptly be, constitute a part of lens among a plurality of lens 7a～7c of light-gathering optics 7, utilize, carry out from the angle of divergence adjustment of the emitted light of light source 1 the moving of optical axis AX direction.Even constitute a part of light-emitting diode inclination among individual light-emitting diode of light source 1, also can carry out from the angle of divergence adjustment of the emitted light of light source 1 again.

As a plurality of light-emitting diodes that constitute light source 1,, also can carry out from the angle of divergence adjustment of the emitted light of light source 1 even select the optimal angle of divergence in advance again.Also can dispose lens arra, and adjust the angle of divergence of light by lens arra at the light-emitting face end of light source 1 again.

Then, carry out the adjustment (S24) that the luminous intensity distribution to the emitted light of light source 1 distributes.The adjustment that distributes for the luminous intensity distribution from the emitted light of light source 1 at the light-emitting face end configuration lens of light source 1, makes lens arra that one aberration be arranged and adjusts and can utilize.For each light-emitting face end of a plurality of light-emitting diodes of constituting light source 1, adjust by the filter that disposes angle again.More, tilt, also can carry out adjustment the light distribution characteristic of the emitted light of light source 1 even constitute the light-emitting diode of a part of a plurality of light-emitting diodes of light source 1.

Then, cover the adjustment (S25) of the illumination inequality degree of act M or dull and stereotyped P.More, the adjustment of the uneven degree that throws light on is carried out according to the result that detects who is configured in the illumination sensor 8 on the dull and stereotyped P.The adjustment of this uneven degree that throws light on comprises the adjustment of the uneven degree that tilts and the adjustment of the uneven degree of center symmetry.The tilt adjustment of uneven degree, the filter that can tilt and carrying out by nearby configuration concentration at the light-emitting face end of light source 1.Again, constitute a part of lens of light-gathering optics 7, for example can lens 7b be moved, or make and carry out with respect to optical axis AX direction.Again, can change a plurality of light-emitting diodes that constitute light source 1 a part light-emitting diode direction and carry out.More, can be by light source 1 all being tilted and carrying out.

Again, the adjustment of the uneven degree of center symmetry, the nearby configuration concentration of light-emitting face end that can light source 1 distribute (center symmetry) filter and carry out.Again, constitute a part of lens of light-gathering optics 7, for example can will with respect to optical axis AX lens 7b be moved and carry out.More, can be with for revisal center symmetry uneven uneven amending plates or uneven revisal lens, be inserted near the cover curtain M, carry out in cover curtain M and optical conjugate position or the light path near it etc.

Then, cover the adjustment (S26) of the heart far away of act M or dull and stereotyped P.More, the adjustment of the heart far away is arranged on the position sensor (being not shown among the figure) of dull and stereotyped P bottom, according to being carried out to the image position testing result, optical axis direction in projection optical system is moved and carrying out.At this, the adjustment of the heart far away on cover curtain M or the dull and stereotyped P comprises the adjustment of the heart far away that tilts and the adjustment of the multiplying power heart far away.The adjustment of the multiplying power heart far away can make light source 1 move and carry out in optical axis AX direction.Again, constitute a part of lens of light-gathering optics 7, for example can lens 7b be moved and carry out with respect to optical axis AX direction.More, can be with for the heart amending plates far away of the revisal heart far away or heart revisal lens far away, be inserted near the cover curtain M, carry out in cover curtain M and optical conjugate position or the light path near it etc.

Again, the adjustment of the heart far away that tilts can make light source 1 move and carry out in optical axis AX vertical direction.Again, constitute the light emitting diode matrix of light source 1, can change its light intensity distributions and carry out.More, can be with for the heart amending plates far away of the revisal heart far away or heart revisal lens far away, be inserted near the cover curtain M, carry out in cover curtain M and optical conjugate position or the light path near it etc.By adjustment as above, can finish the manufacturing that possesses the projection aligner that light source 1 is arranged.

Manufacture method about the projection aligner of the 2nd embodiment, the light source of the projection aligner of both having deposited, because use the lamp of metal gas or rare gas etc., it can be substituted by the tool long-life and the light-emitting diode of advantages such as low operating cost be arranged or laser diode etc., promptly so-called solid light source.Therefore, can be provided in the projection aligner of the light source of the danger that under the low operating cost is arranged the long-life and do not break.Can get the light-gathering optics that removes the projection aligner of both having deposited again.Therefore, can provide projection aligner more closely.

More, in above-mentioned the 1st embodiment and the 2nd embodiment, the adjustment of the photocurrent versus light intensity of lamp optical system, though carried out applying offset for light exposure control, the adjustment of the light angle of divergence that penetrates from light source 1 is penetrated the adjustment that the luminous intensity distribution of light distributes, the adjustment of the illumination inequality degree on cover curtain M or the dull and stereotyped P from light source 1, and cover curtain M or dull and stereotyped heart adjustment far away of going up on the P, but also can utilize one at least wherein and carry out the adjustment of the photocurrent versus light intensity of lamp optical system.

Then, with reference to Fig. 5, carry out the explanation of the projection aligner of the present invention the 3rd embodiment.About the explanation of the 3rd embodiment, the member identical with the projection aligner of the 1st embodiment is to describe with the same-sign of the 1st embodiment use.

Figure 5 shows that projection aligner schematic diagram according to the third embodiment of the present invention.As the projection aligner of Fig. 5, possessing has representative by light source cell 20 that high-pressure mercury-vapor lamp constituted.This is that the 2nd focal position by the oval shape mirror 2 of the reflecting surface that has spheroid to become is depended in light source cell 20 positions.The 2nd focal position of this oval shape mirror 2, for the position of focal position, the front side conjugation of aftermentioned light-gathering optics 7.Again, the allocation position of light source cell 20, also can be light-gathering optics 7 focal position, front side conjugation the position near.About other points, then the projection aligner with the 1st embodiment is identical.

Take second place,, carry out the explanation of the projection aligner of the present invention the 4th embodiment with reference to Fig. 6.About the explanation of the 4th embodiment, the member identical with the projection aligner of the 1st embodiment is to describe with the same-sign of the 1st embodiment use.

Figure 6 shows that projection aligner schematic diagram according to the fourth embodiment of the present invention.As the projection aligner of Fig. 6, possessing has representative by light source cell 20 that high-pressure mercury-vapor lamp constituted.This is the focal position, front side that light-gathering optics 7 is depended in the position of light source cell 20.Again, the allocation position of light source cell 20, also can be light-gathering optics 7 the focal position, front side near.About other points, then the projection aligner with the 2nd embodiment is identical.

Possess in the light source cell 20 of the projection aligner of the 3rd embodiment and the 4th embodiment, shown in Fig. 7 A, the light emitting diode matrix of the light-emitting diode 20b of assortment array-like (solid light source array) and lenticule 20c on substrate 20a with positive multiplying power, assortment becomes the microlens array of array-like to constitute, and microlens array be configured in light emitting diode matrix light-emitting face near.The pass is at this light source cell 20, utilizes to have microlens array that positive multiplying power the is arranged opening number by the control light emitting diode matrix, and the angle of divergence of the light that penetrates from light-emitting diode 20b can be adjusted the video beam direction.

Again, light source cell 20, structure that also can be shown in Fig. 7 B.Light source cell 20 shown in the 7B figure, the light emitting diode matrix of the light-emitting diode 20b of assortment array-like (solid light source array) and lenticule 20d on substrate 20a with negative multiplying power, assortment becomes the microlens array of array-like to constitute, and microlens array be configured in light emitting diode matrix light-emitting face near.The pass is at this light source cell 20, utilizes to have microlens array that negative multiplying power the is arranged opening number by the control light emitting diode matrix, and the angle of divergence of the light that penetrates from light-emitting diode 20b can be readjusted the distribution diffusing direction.

Again, light source cell 20, structure that also can be as shown in Figure 8.Light source cell 20 shown in Figure 8, on substrate 20a the light emitting diode matrix of the light-emitting diode 20b of assortment array-like (solid light source array), uneven amending plates (CONCENTRATION DISTRIBUTION (symmetrical centre) filter and concentration diffuse cutting filter) 20e, and heart amending plates 20f far away constitute, and uneven amending plates 20e and heart amending plates 20f far away be configured in light emitting diode matrix light-emitting face near.Again, uneven amending plates and heart amending plates far away also can be replaced by uneven revisal lens and heart revisal lens far away respectively.Light source cell 20 shown in Figure 8, be provided with in light path mechanism by uneven amending plates 20e and heart amending plates 20f far away, utilization by uneven amending plates 20e and heart amending plates 20f far away, can be adjusted symmetrical inhomogeneous, the heart far away that tilts in inhomogeneous, the center of tilting, and the multiplying power heart far away in light path.

Again, the inclination inequality degree adjustment of lamp optical system shown in Fig. 9 A, can be undertaken by the inclination of light source cell 20.Again, the adjustment of the multiplying power heart far away of lamp optical system shown in Fig. 9 B, can be moved and carries out at optical axis direction by light source cell 20.Again, the inclination inequality degree adjustment of lamp optical system shown in Fig. 9 C, can be moved and carries out in the optical axis vertical direction by light source cell 20.The tilt adjustments of this light source cell 20, move, can utilize light source cell position adjusting mechanism (being not shown among the figure) and carry out toward optical axis direction or optical axis vertical direction.More, the adjustment of the inclination heart far away of lamp optical system can be undertaken by the light quantity of controlling a plurality of light-emitting diodes that constitute the solid light source array.

The exposure device of the various embodiments described above, cover curtain (illumination step) by lighting device with illumination, with the use projection optical system, with being formed on pattern exposure that the transfer printing of cover curtain uses, can make microcomponent (semiconductor element), image element, liquid crystal display cells, thin-film electro magnetic head etc. in photonasty substrate (step of exposure).Below, use the exposure device of embodiment, be used in wafer (flat board) as the photonasty substrate wait formation fixed circuit design, obtain semiconductor device manufacturing method as the semiconductor element of microcomponent, illustrate with reference to the flow chart of Figure 10.

At first, the step S301 of Figure 10, on one batch wafer, steaming degree one metal film.Then, step S302 is coated with photoresistance on the metal film on the one batch wafer.Afterwards, step S303 uses the exposure device of present embodiment, the pattern image on the cover curtain, and by projection optical system, each shooting area transfer printing that exposes in turn on the one batch wafer.Promptly be, cover curtain (illumination step) with illumination, and will cover the pattern transfer (step of exposure) to wafer of curtain by illumination optics device.

Afterwards, step S304, after the photoresistance on the one batch wafer develops, step S305, on a collection of wafer, by serving as that the cover curtain carries out etching with the photoresistance pattern, the circuit design corresponding to the pattern of cover curtain is formed on each shooting area on each wafer.Afterwards, by formation of the circuit design that carries out last layout layer etc., the element of semiconductor etc. is manufactured.Above-mentioned semiconductor device manufacturing method has the semiconductor element of imperceptible circuit design, can obtain good productivity ratio.

Again, at the exposure device shown in Fig. 1, Fig. 3, Fig. 5, Fig. 6, by go up at dull and stereotyped (glass plate) form fixed pattern (circuit design or electrode pattern etc.), can obtain liquid crystal display cells as microcomponent.Below, consult Figure 11, the manufacture method as the liquid crystal display cells of microcomponent is described.

In Figure 11, pattern forms step S401, uses the exposure device of embodiment, will cover the pattern transfer sensitization of curtain in photonasty substrate (glass substrate of applied photoresistance etc.), to carry out so-called photolithographic processes.Mat is in this photolithography step, on the photonasty substrate, comprise a plurality of electrodes etc. fixed pattern be formed.Thereafter, the substrate that is exposed utilizes and to carry out developing manufacture process, etching step, remove processing procedure such as photoresistance, and the institute that is formed on substrate decide pattern, and follows the formation step S402 that arrives colored filter.

Then, the formation step S402 of colored filter, 3 points of corresponding red (R), green (G), blue (B) are one group, rectangular a plurality of assortments, or 3 strip optical filtering groups of red, green, blue, assortment are in a plurality of horizontal scan direction, to form colored filter.Then, after the formation step S402 of colored filter, carry out born of the same parents' combination step S403.Born of the same parents' combination step S403 uses to form the resultant substrate of deciding pattern to some extent of step S401 by pattern, with the liquid crystal panel (liquid crystal born of the same parents) that forms the resulting colored filter of step S402 etc. by colored filter, with it combination.Born of the same parents' combination step S403 for example, forms the resultant substrate of deciding pattern to some extent of step S401 by pattern, and injects liquid crystal by forming between the resulting colored filter of step S402 of colored filter, and makes liquid crystal panel (liquid crystal born of the same parents).

Again, in the various embodiments described above, as a plurality of solid light sources, for the solid light source wafer of a plurality of luminous points is arranged, its wafer assortment becomes a plurality of array-likes and becomes solid light source wafer array, more also can be used in kenel of a plurality of luminous points being made a substrate into etc.Again, the solid light source element can organic or inorganic.

Again, at each above-mentioned embodiment, as light source, the optical fiber source that also can use the optical conductor (optical fiber) by set a plurality of optical fiber of a plurality of solid light sources and corresponding each solid light source etc. to be made up.In this situation, the more variable more optical fiber source of the light source 1 of the 1st and the 2nd embodiment.Solid light source array (20a, 20b) in the light source cell 20 of the 3rd and the 4th embodiment can change to optical fiber source.

Figure 12 shows that the optical fiber 72 that solid light source 71 and corresponding solid light source 71 are set, by the optical fiber source 69 of a plurality of Shu Hecheng.The optical fiber source 69 that Figure 12 shows that from the light that solid light source 71 penetrates, is incident in the incident end of optical fiber 72, and from the exit end outgoing of optical fiber 72.Promptly be that each incident end of optical fiber 72 couples with solid light source 71 optics.Again, Figure 13 shows that lens (light-gathering optics) 73 and optical fiber 72 that solid light source 71, corresponding each solid light source 71 are set are by a plurality of bundle synthetic fibre-optical light sources 70.The optical fiber source 70 of Figure 13, the light from solid light source 71 penetrates is incident in lens 73, by the incident end that is incident in optical fiber 72 behind lens 73 optically focused, and is penetrated by the exit end of optical fiber 72.This promptly, each incident end of optical fiber 72 is with solid light source 71 optical coupled.

Optical fiber source 69 and optical fiber source 70 shown in Figure 13 as shown in figure 12, utilize and use the optical fiber 72 that the suitable opening number is arranged, be generally the light beam external form 75 (with reference to Figure 14 A) of the solid light source 71 of elliptical shape, can be formed by the external form 76 (with reference to Figure 14 B and Figure 14 C) of circle.

Again, by the synthetic arbitrary shape of ejecting end of a plurality of optical fiber, the shape of light source ejecting end (ejecting end configuration shape) can form optimal shape.For example, Figure 15 A is depicted as from the shape of the ejecting end of optical fiber source can be rectangle, also can form the shape that is depicted as Figure 15 B.Again, as shown in figure 16, the exit end of the optical fiber of optical fiber source 69,70, similar for the shape of one member 81 of pencil shape and fly's eye integrator 80, the shape of exit end part that form a plurality of optical fiber is very easy.

Then, Figure 17 shows that one solid light source 71 corresponding to the optical fiber source 70 of Figure 13 is provided with lens (light-gathering optics) 73 and optical fiber 72.The optical fiber source 70 of Figure 13, opening number (the sine (sin) of maximum shooting angle (half-angle) that in the angle of divergence of solid light source 71, has the light of maximum shooting angle, hereinafter referred to as opening number) be NA1, the maximum ψ of the size of the illuminating part of solid light source 71 (diameter), the sine (sin) of the angular range that optical fiber 72 may pass in and out (half-angle), just the opening number of optical fiber 72 is NA2, the core diameter D of the incident end of optical fiber 72, and it is satisfied with the condition of NA2 〉=ψ/D * NA1.By satisfying this condition, the light that penetrates from solid light source 71 does not have useless light, and can enter optical fiber 72, to keep from the light quantity of the light of solid light source 71 ejaculations, makes and can penetrate from optical fiber 72 exit ends.

Again, use the situation as the silica fiber of optical fiber, the maximum open of solid light source 71 is counted NA1, the maximum ψ of the size of illuminating part (diameter), and the core diameter D of the incident end of silica fiber 72, it is satisfied with the condition of 0.3 〉=ψ/D * NA1.By satisfying this condition, the light that penetrates from solid light source does not have useless light, and can enter silica fiber 72, to keep from the light quantity of the light of solid light source ejaculation, makes and can penetrate from optical fiber 72 exit ends.

Again, Figure 18 is the structure chart of fly's eye integrator 80 of the exit end of optical fiber source 69,70.Figure 19 is one a member 81 of fly's eye integrator 80, the shape of its incident end face.Figure 20 is the shape schematic diagram of the exit end 83 of optical fiber source 69,70.At this, a length of side of the incident end face of the member 81 of fly's eye integrator 80 is a, and another length of side is b.Shape by a plurality of optical fiber 72 synthetic exit ends of restrainting 83, the one length of side is A, another length of side is B, position between optical fiber 72 and the fly's eye integrator 80, the focal length of aiming at lens 82 is f1, the focal length of fly's eye integrator 80 is f2, and then the relation of A * f2/f1≤a and B * f2/f1≤b is set up.

Again, constituted (m is a natural number) under the situation at optical fiber source by the optical fiber source 69,70 that m organizes, the light output total amount of the light that the optical fiber of organizing from m 72 penetrates is W, the core diameter of the exit end of optical fiber 72 is d, and it wish to satisfy the condition of [m * { d (f2/f1) } * * 2 π/(4 * a * b)] * W 〉=30 (mW).By satisfying this condition, the filling rate of the light source picture of one of fly's eye integrator 80 member 81 can obtain practical illumination as exposure device for appropriate state relatively.Again, in this situation, the exit end of optical fiber 72, the shape of its bundle is wished for similar to the shape of the member 81 of fly's eye integrator 80.

Again, as shown in figure 12 optical fiber source 69 and optical fiber source 70 shown in Figure 13, the maximum of the time dependent light quantity of exit end of optical fiber 72 is Pmax, minimum value is Pmin, the average fluctuation width of cloth Δ P of the light quantity of the exit end of its optical fiber 72 utilizes Δ P=(Pmax-Pmin)/(Pmax+Pmin) calculate.At this, at the fluctuation width of cloth Δ W of the desired light quantity of incident end of fly's eye integrator 80, the quantity n of solid light source 71, and wish to satisfy the condition of n 〉=(Δ P/ Δ W) * * 2.

By satisfying this condition, inhomogeneous from the light output that the exit end of optical fiber source 69,70 penetrates, utilize the quantity n of solid light source 71 more to many and equalization, can provide the optical fiber source 69,70 of light stable output by the effect of equalization than (Δ P/ Δ W) * * 2.

Again, as shown in figure 12 optical fiber source 69 and optical fiber source 70 shown in Figure 13, the uneven situation of output characteristic of the wavelength of indivedual solid light sources 71, light quantity etc., by output characteristic different a plurality of solid light sources 71 as the use of the light source of optical fiber source, with the inhomogeneous equalization of output characteristic with the exit end of optical fiber source 69,70.The light that the exit end of optical fiber source 69,70 averages out more utilizes fly's eye integrator 80 to average out.Figure 21 is the inhomogeneous graphic that averages out of output characteristic of each solid light source 71.Have solid light source 71 equalizations of different output characteristic out of the ordinary, its diagram turns to AVE.So, the different a plurality of solid light sources 71 of output characteristic are combined under the use feelings row of optical fiber source 69,70, can obtain the illumination light of stable output by the equalization effect.

Again, exposure device is the situation of scanning exposure apparatus, and it is preferable having synchronous shield.The 22nd is depicted as the structural representation according to scanning exposure apparatus of the present invention.This exposure device, optical projection system when cover curtain platform and substrate platform move, has synchronous shield (movable shield mechanism) 90 with the pattern transfer of covering curtain to the scanning exposure apparatus on the dull and stereotyped P relatively.And other point has same structure with the exposure device of the 1st embodiment.

As shown in figure 22, near the cover curtain M, dispose fixing shield BL0 and movable shield mechanism 90.As shown in figure 23, this movable shield mechanism is become by 4 movable shield BL1, BL2, BL3, BL4.Determine the width of the opening AP of scan exposure direction by the edge of movable shield BL1, BL2.Determine the length of the opening AP of scan exposure direction by the edge of movable shield BL3, BL4 again.Again, limit the shape of opening AP, can be included in the circular image fields IF of projecting lens PL and decide with each edge of 4 movable shield BL1～BL4.

By the opening of fixing shield BL0 and the illumination light irradiation cover curtain M of the opening AP of movable shield mechanism 90.Finally, utilize the formed opening AP of each movable shield BL1～BL4 and fixing unique zone of overlapping of the opening of shield, the illumination of covering act M.The common exposure status that gets, fixedly the picture of the opening of shield is in the pattern plane imaging of cover curtain M, the periphery that covers the specific scan exposure zone of act M promptly is under the situation of the nearby exposure in zone of shading light part, utilize 4 movable shield BL1～BL4, can prevent the illumination light incident in the outside of shading light part.Promptly be when the scanning of cover curtain platform, to monitor from the relation of light beam with the relative position of cover curtain M of lamp optical system ejaculation.Monitor information according to this, when the exposure in the special scan exposure zone on cover curtain M begins or at the end, under the situation that nearby region decision begins to expose of shading light part, move movable shield BL1, the marginal position of BL2 is with the width of the opening AP of gated sweep exposure directions.So, can prevent that pattern etc. not is transferred to flat board.At this exposure device, about or nearby, movable shield mechanism can be set also in other positions with the position of cover curtain M conjugation again.

Again, exposure device also can be provided with and prevent Charging system.The 24th is depicted as and has the exposure device structural representation that prevents Charging system.Other points, then the exposure device with the 1st embodiment is identical.The pass is at this exposure device, and the framework 92 of accommodating light source is set respectively, and with the framework 93 of accommodating lamp optical system and projection optical system, framework 92 electrically connects with framework 93, but ground connection more.Promptly be that framework 92 keeps idiostatic with framework 93.Be respectively arranged with the power supply unit 94 and the power supply unit 95 of supplying with exposure device body electric power, its indivedual end ground connection of supplying with light source electric power again.Therefore, can prevent the static electrification of the body of the light source of exposure device and exposure device, and prevent the damage of the solid light source that causes by static.

At the replacement cover curtain of each above-mentioned embodiment, also can use the changeable pattern generation device should projected pattern to produce again.So the changeable pattern generation device generally can be divided into emissive type image display element and non-light emitting-type image display element.The emissive type image display element for example is cathode ray tube (CRT), inorganic light-emitting display, organic light emitting display (Organic Light Emitting Diode, OLED), light-emitting diode display, LD display, an ejaculation display (field emission display, FED), the plasma panel display (plasma diplay panel, PDP) etc.Again, non-light emitting-type image display element for example be spatial light modulation device (spatial light modulator is designated hereinafter simply as SLM), element, penetrating type spatial light modulation device with the state of space modulation light amplitude phase place or polarisation, with reflection-type spatial light modulation device.For penetrating type spatial light modulation device such as deformability micro-reflector element (DeformableMicro-mirror device DMD, or numerical digit micro-reflector element Digital is Micro-mirrordevice), reflection mirror array, reflection type liquid crystal display element, electrophoretic display device (EPD) (ElectroPhoretieDisplay), electronic paper (or e-inks), grating valve (Grating light valve) etc.

Close the manufacture method of exposure device of the present invention, the light source different with a plurality of solid light sources, for example by light source that mercury vapor lamp constituted, get under the situation that changes solid light source into, by set-up procedure, be configured to the characteristic of this lamp optical system of the 1st suitable state corresponding to the light source different,, and set the characteristic of the 2nd suitable state for by the configuration of those solid light sources with those solid light sources.Its method can be made the exposure device that comprises the lamp optical system with a plurality of solid light source appropriate characteristics.

Again, close light source cell of the present invention, for the lighting device light source different with the solid light source array, for example by light source that mercury vapor lamp constituted, be configured to the characteristic of the lighting device of the 1st suitable state, by the configuration of those solid light sources, and set the characteristic of the 2nd suitable state for, can provide to have the ejaculation light that the angle of divergence or luminous intensity distribution distribute.

Again, close exposure method of the present invention, for the light source different with a plurality of solid light sources, be configured to the characteristic of the lamp optical system of the 1st suitable state, because use configuration by those solid light sources, and set the exposure device of the characteristic of the 2nd suitable state for, the pattern of cover curtain can well be transferred on the photonasty substrate.

Again, close exposure device of the present invention, light source cell is for lighting device, with the different light source of a plurality of solid light source arrays, for example, be configured to the characteristic of the lighting device of the 1st suitable state, by the configuration of those solid light sources for by the light source that mercury vapor lamp constituted, and set the exposure device of the characteristic of the 2nd suitable state for, the pattern of cover curtain can well be transferred on the photonasty substrate.

Again, close the method for adjustment of exposure device of the present invention, be configured in the situation of institute's allocation of lamp optical system, can adjust the photocurrent versus light intensity of lamp optical system by set-up procedure for a plurality of solid light sources that replace light supply apparatus.

Industry applications

As above-mentioned, the manufacture method of exposure device of the present invention, be used to the light source list of this exposure device Unit, possess the exposure device of this light source cell, the exposure method that uses this exposure device and this exposure The method of adjustment of device is applicable to semiconductor element, image element, liquid crystal display cells, film The manufacturing of the first-class element of electromagnetism.

Claims (33)

1, a kind of manufacture method of exposure device, its lamp optical system that contains a light-gathering optics for use is with the cover curtain that throws light on, and to a photonasty substrate, the manufacture method of this exposure device comprises with this pattern transfer of covering curtain:

One solid light source configuration step, with a plurality of solid light sources be configured in this light-gathering optics focal position, a front side or with a position of its optical conjugate; And

One set-up procedure is configured to the characteristic of this lamp optical system of the 1st suitable state corresponding to the light source different with those solid light sources, by the configuration of those solid light sources, and sets the characteristic of the 2nd suitable state for.

2, the manufacture method of exposure device according to claim 1 is characterized in that wherein said lamp optical system is included in the light integrator in the light path between those solid light sources and this light-gathering optics.

3, a kind of manufacture method of exposure device, it uses lamp optical system illumination one cover curtain, and to a photonasty substrate, the manufacture method of this exposure device is characterized in that it comprises with this pattern transfer of covering curtain:

One solid light source configuration step, with a plurality of solid light sources be configured in this lamp optical system fixed position; And

One set-up procedure is configured to the characteristic of this lamp optical system of the 1st suitable state corresponding to the light source different with those solid light sources, by the configuration of those solid light sources, and sets the characteristic of the 2nd suitable state for.

4, according to the manufacture method of any described exposure device in the claim 1～3, it is characterized in that wherein said set-up procedure comprises: utilize an illumination unevenness set-up procedure being adjusted at the illumination unevenness of this cover curtain or this photonasty substrate, with a heart set-up procedure far away with the one at least of the heart far away that is adjusted at this cover act or this photonasty substrate to adjust.

5, according to the manufacture method of any described exposure device in the claim 1～3, it is characterized in that wherein said set-up procedure comprises: a angle of divergence set-up procedure that utilize to adjust the angle of divergence of the one at least in a plurality of light beams that penetrate from those solid light sources, the step of the one at least of a luminous intensity distribution distribution set-up procedure that distributes with the luminous intensity distribution of adjusting the one at least in a plurality of light beams that penetrate from those solid light sources is to adjust.

6, according to the manufacture method of any described exposure device in the claim 1～3, it is characterized in that wherein said set-up procedure comprises: utilize a photocurrent versus light intensity set-up procedure of the photocurrent versus light intensity of adjusting this lamp optical system, with the ejaculation light set-up procedure of adjustment from the ejaculation light of those solid light sources.

7, the manufacture method of exposure device according to claim 6 is characterized in that:

This photocurrent versus light intensity set-up procedure utilizes an illumination unevenness set-up procedure being adjusted at the illumination unevenness of this cover curtain or this photonasty substrate, with a heart set-up procedure far away with the one at least of the heart far away that is adjusted at this cover act or this photonasty substrate to adjust; And

This penetrates the light set-up procedure, utilize to adjust an angle of divergence set-up procedure of the angle of divergence of the one at least in a plurality of light beams that penetrate from those solid light sources, the step of the one at least of a luminous intensity distribution distribution set-up procedure that distributes with the luminous intensity distribution of adjusting the one at least in a plurality of light beams that penetrate from those solid light sources is to adjust.

8, a kind of manufacture method of exposure device, its lamp optical system that contains a light-gathering optics for use is with the cover curtain that throws light on, and to a photonasty substrate, the manufacture method of this exposure device comprises with this pattern transfer of covering curtain:

One solid light source configuration step, with a plurality of solid light sources be configured in this light-gathering optics focal position, a front side or with a position of its optical conjugate; And

One set-up procedure is configured to the conditions of exposure of this exposure device of the 1st suitable state corresponding to the light source different with those solid light sources, by the configuration of those solid light sources, and sets the conditions of exposure of the 2nd suitable state for.

9, a kind of manufacture method of exposure device, it uses the lamp optical system illumination one cover act pattern transfer that will cover curtain to a photonasty substrate, and the manufacture method of this exposure device is characterized in that it comprises:

One solid light source configuration step, with a plurality of solid light sources be configured in this lamp optical system fixed position; And

One set-up procedure is configured to the conditions of exposure of this exposure device of the 1st suitable state corresponding to the light source different with those solid light sources, by the configuration of those solid light sources, and sets the conditions of exposure of the 2nd suitable state for.

10, according to Claim 8 or the manufacture method of 9 described exposure devices, it is characterized in that wherein said set-up procedure comprises applies the step that offset is given this light exposure control device of control.

11, the manufacture method of any described exposure device in 10 according to Claim 8, it is characterized in that wherein said set-up procedure comprises a photocurrent versus light intensity set-up procedure of the photocurrent versus light intensity of adjusting this lamp optical system, with at least one of adjustment from an ejaculation light set-up procedure of the ejaculation light of those solid light sources.

12,, it is characterized in that more wherein said solid light source comprises light emitting diode matrix according to the manufacture method of any described exposure device in the claim 1 to 11.

13, a kind of light source cell, this light source cell detachable be installed in the lighting device, it is characterized in that it comprises:

A plurality of solid light source assortments become a solid light source array of array-like; And

Be configured in the light exit side of this solid light source array, optical element for array-like, wherein with respect to the light source different with this solid light source array, be configured to the characteristic of this lighting device of the 1st suitable state, configuration by those solid light sources, and set the characteristic of the 2nd suitable state for, contain the ejaculation light that the angle of divergence and luminous intensity distribution distribute to should lighting device providing.

14, light source cell according to claim 13, it is characterized in that wherein said solid light source array and this optical element, can be configured in the oval shape mirror and the light path between the light integrator in this lighting device that to assemble from the light of illuminator.

15, according to claim 13 or 14 described light source cells, it is characterized in that the adjusting device that it comprises the ejaculation light characteristic of this adjustment solid light source array.

16, according to any described light source cell in the claim 13 to 15, it is characterized in that it more comprises a plurality of optical fiber, each incident end of those optical fiber is connected with those solid light sources.

17, a kind of light source cell is characterized in that it comprises:

A plurality of solid light source assortments become a solid light source array of array-like; And

Adjust the adjusting device of the ejaculation light characteristic of this solid light source array.

18, light source cell according to claim 17 is characterized in that wherein said adjusting device can be adjusted the angle of divergence of the light that penetrates from this solid light source array, the luminous intensity distribution of the light that penetrates from this solid light source array distributes and at the wherein one at least of the illumination inequality degree of plane of illumination and the heart far away.

19, according to claim 17 or 18 described light source cells, it is characterized in that it more comprises a plurality of optical fiber, each incident end of those optical fiber is connected with those solid light sources.

20, a kind of exposure method is applicable to the exposure device that the manufacture method according to any described exposure device in the claim 1～12 manufactures, and it is characterized in that it comprises:

Utilization is from the light of those solid light sources, with an illumination step of this cover curtain that throws light on; And

The pattern transfer of this cover curtain is arrived a transfer step of this photonasty substrate.

21, exposure method according to claim 20 is characterized in that wherein said transfer step comprises that use will cover the pattern image of curtain and project to the projection optical system of this photonasty substrate, with pattern transfer of this cover curtain step to this photonasty substrate.

22, a kind of exposure device is characterized in that it comprises:

According to any described light source cell in the claim 13～19; And

For the pattern exposure that will cover curtain arrives the photonasty substrate, utilize a lighting device that should cover curtain from the optical illumination of this light source cell.

23, exposure device according to claim 22 is characterized in that it comprises that more the graphic pattern projection with this cover curtain arrives the projection optical system of photonasty substrate.

24, a kind of exposure method is used in according to claim 22 or 23 described exposure devices, and this exposure method comprises:

One illumination step is utilized from the light of this light source cell to throw light on this cover act; And

One transfer step arrives this photonasty substrate with this pattern transfer of covering curtain.

25, a kind of method of adjustment of exposure device, be used in order to cover the pattern transfer of curtain to a photonasty substrate one, by the lamp optical system that includes light-gathering optics, utilize from the light of light supply apparatus method of adjustment with the exposure device of this cover act of throwing light on, it is characterized in that it comprises:

One solid light source configuration step, with a plurality of solid light sources that replace this light supply apparatus be configured in this light-gathering optics the focal position, front side or with its optical conjugate position; And

One set-up procedure is utilized the configuration of those solid light sources, to adjust the photocurrent versus light intensity of this lamp optical system.

26, a kind of method of adjustment of exposure device, for the pattern transfer of a cover curtain to a photonasty substrate, by lamp optical system, utilize from the light of light supply apparatus method of adjustment with the exposure device of this cover act of throwing light on, it is characterized in that it comprises:

One solid light source configuration step is configured in a plurality of solid light sources that replace this light supply apparatus institute's allocation of this lamp optical system; And

One set-up procedure is utilized the configuration of those solid light sources, to adjust the photocurrent versus light intensity of this lamp optical system.

27, a kind of exposure method is used to utilize according to the method for adjustment of claim 25 or 26 described exposure devices and the exposure method of controlled exposure device is characterized in that it comprises:

One illumination step by lamp optical system, is utilized from the light of those solid light sources to throw light on this cover act; And

One transfer step arrives this photonasty substrate with this pattern transfer of covering curtain.

28, a kind of method of adjustment of exposure device, the lamp optical system that is used to include light-gathering optics is covered the method for adjustment of the pattern transfer of curtain to the exposure device of a photonasty substrate with illumination cover curtain with this, it is characterized in that it comprises:

One solid light source configuration step, with a plurality of solid light sources be configured in this light-gathering optics the focal position, front side or with its optical conjugate position; And

One set-up procedure is configured to the conditions of exposure of this exposure device of the 1st suitable state corresponding to the light source different with those solid light sources, by the configuration of those solid light sources, and sets the conditions of exposure of the 2nd suitable state for.

29, a kind of method of adjustment of exposure device is used for lamp optical system with illumination cover curtain, and this is covered the method for adjustment of the pattern transfer of curtain to the exposure device of a photonasty substrate, it is characterized in that it comprises:

One solid light source configuration step, with a plurality of solid light sources be configured in this lamp optical system fixed position; And

One set-up procedure is configured to the conditions of exposure of this exposure device of the 1st suitable state corresponding to the light source different with those solid light sources, by the configuration of those solid light sources, and sets the conditions of exposure of the 2nd suitable state for.

30,, it is characterized in that wherein said set-up procedure comprises to apply the step that offset is given this light exposure control device of control according to the method for adjustment of claim 28 or 29 described exposure devices.

31, according to the method for adjustment of any described exposure device in the claim 28 to 30, it is characterized in that wherein said set-up procedure comprises a photocurrent versus light intensity set-up procedure of the photocurrent versus light intensity of adjusting this lamp optical system, with at least one of adjustment from an ejaculation light set-up procedure of the ejaculation light of those solid light sources.

32, a kind of exposure device is characterized in that it comprises:

Exposure device according to the manufacture method manufacturing of any described exposure device in the claim 1～12.

33, a kind of exposure device is characterized in that it comprises:

According to claim 25～26, the exposure device of the method for adjustment manufacturing of any described exposure device in 28～32.

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