CN1707229A - Wavefront-measuring interferometer apparatus, and light beam measurement apparatus and method thereof - Google Patents
Wavefront-measuring interferometer apparatus, and light beam measurement apparatus and method thereof Download PDFInfo
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- CN1707229A CN1707229A CN 200510075905 CN200510075905A CN1707229A CN 1707229 A CN1707229 A CN 1707229A CN 200510075905 CN200510075905 CN 200510075905 CN 200510075905 A CN200510075905 A CN 200510075905A CN 1707229 A CN1707229 A CN 1707229A
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Abstract
The invention provides a wave front measuring interferometer unit provided with a compact optical system of simple constitution, and capable of regulating easily the optical system, and a light beam measuring instrument and method capable of measuring a wave front of a light beam and measuring a characteristic of a light beam spot. This light beam measuring instrument 10A is provided with a beam splitter 13 for splitting the light beam emitted from a light source part 11 into two beams, a semi-transparent reflection face 15a for reflecting one portion of the separated one light beam as a inspected light beam to a direction reverse to an incident direction, and a reflection type reference light generating means 23 for converting one portion of the transmitted light beam transmitted through the semi-transparent reflection face 15a into a wave front-faired reference light beam to be output. The wave front of the light beam, and the characteristic of the light beam spot are measured by such a manner.
Description
Technical field
The present invention relates to a kind of light beam as determination object is carried out the Wavefront-measuring interferometer device of Wavefront-measuring and carries out the Wavefront-measuring of light beam and the light beam measurement device and method of the various mensuration of the focal point of this light beam.
Background technology
Existing, known a kind of device (being also referred to as " beam profile measuring instrument "), be light beam point-like imaging and the formation point picture on shooting faces such as CCD that makes as determination object, its some shape of picture and size etc. or intensity distributions and center of gravity coordinate etc. are measured (below, these are generically and collectively referred to as " characteristic measurement of light beam spot ") (with reference to following patent documentation 1).
On the other hand, as the device of the Wavefront-measuring that carries out light beam, the Wavefront-measuring interferometer device of known a kind of optical system configurations that possesses Mach refractometer as shown in Figure 8.
In the Wavefront-measuring interferometer device shown in Figure 8, the light beam from light source portion 101 penetrates is separated into 2 light beams via optical splitter 102.One of these 2 light beams, via convergent lens 103 quilt convergences and to pin hole 104 incidents that are configured in its convergent point.The diameter of this pin hole 104 is littler than the diffraction critical value of convergent beam, penetrates the desirable spherical wave that has carried out the corrugated shaping from the inside side of pin hole 104.This spherical wave converts plane wave to collimation lens 105 incidents, thereafter, at right angles reflect via catoptron 106, as reference light to optical splitter 107 incidents.
By another light beam that above-mentioned optical splitter 102 separates, after catoptron 108 rectangular reflections, assembled via convergent lens 109, but be unworthy of needle holding hole at its convergent point.Therefore, do not carry out the corrugated shaping, promptly dispersed after the light beam that sees through convergent lens 109 is temporarily assembled and become directional light to collimation lens 110 incidents, thereafter as tested light to optical splitter 107 incidents.
Thereby said reference light and above-mentioned tested light are synthesized at optical splitter 107 and obtain interference light, and this interference light Jie is ingested by imaging len 111 and takes in the camera 112.According to take the interference fringe that camera 112 is taken by this, carry out the Wavefront-measuring of above-mentioned light beam.
Aforesaid pin hole possesses the function that forms desirable spherical wave, and the spherical wave that forms penetrates to the inside of pin hole side.Relative therewith, also known a kind of device (below, be called " reflection diffraction portion ") has and converts the part incident beam to desirable spherical wave, make it to incident direction reverse direction function of reflecting.This reflection diffraction portion, be also referred to as reflection-type pin hole etc., knownly on glass substrate, form (with reference to following patent documentation 2) small reflector space, form small reflector space at the tip of needle-like member or near the inside side configuration reflecting surface of common pin hole (with reference to following patent documentation 3) or the like.
Patent documentation 1: the spy opens the 2004-45327 communique
Patent documentation 2: the spy opens the 2000-97612 communique
Patent documentation 3: the spy opens clear 58-60950 communique
Aforesaid existing mach-zehnder type Wavefront-measuring interferometer device, have following feature: the configuration of optical elements such as optical splitter and reflective mirror is symmetrical, 2 light beams of being interfered pass through these optical elements symmetrically one by one on light path separately, thereby paired as if the optical characteristics of the optical element that makes balanced configuration, the aberration that then have separately etc. are difficult to measurement result is caused bad influence.Thereby mach-zehnder type Wavefront-measuring interferometer device is generally adopted as the high determinator of versatility in the Wavefront-measuring of light beam.
But, mach-zehnder type Wavefront-measuring interferometer device, the optic number of packages is many and regulator site is also many, thereby, exist optical system to regulate the very problem of difficulty.In addition, must make the light path of reference light and the light path of tested light spatially separate configuration, thereby the problem that also exists device to maximize.In addition, its formation is to make reference light and the tested light light path by separately, thus the problem that also exists be the influence vibrated easily and phase shifts mechanism difficulty etc. is set.
Summary of the invention
The present invention promptly produces in view of these things, and its 1st purpose is to provide a kind of high Wavefront-measuring interferometer device of practicality that constitutes simple and small-sized optical system and can carry out the optical system adjusting easily that has.
In addition, do not hear also till settled the present that a kind of determinator can implement the Wavefront-measuring of light beam and the characteristic measurement of light beam spot simultaneously.If can adopt 1 determinator to carry out 2 mensuration simultaneously, then have 2 measurement results of comparative analysis in real time or reduce lot of advantages such as cost of determination significantly.
The present invention promptly produces in view of these things, and its 2nd purpose is to provide the light beam measurement device and method of the characteristic measurement of a kind of Wavefront-measuring that can carry out light beam simultaneously and light beam spot.
In order to realize above-mentioned the 1st purpose, Wavefront-measuring interferometer device of the present invention is as following formation.Promptly, Wavefront-measuring interferometer device of the present invention, it is characterized in that: possess the part of making as the light beam of determination object as tested light beam to the semi-penetration face of incident direction reverse direction reflection, have the convergent lens of the transmitted beam that assemble to see through above-mentioned semi-penetration face and be configured in the small diffraction portion of the convergent point of this convergent lens, make the above-mentioned transmitted beam of part convert reference beam that has carried out the corrugated shaping and the reference light generating apparatus that this reference beam is penetrated to above-mentioned semi-penetration face to, and said reference light beam and above-mentioned tested light beam are synthesized the imaging portion that the interference light that forms is derived detection faces and form interference fringe on this detection faces via the incident of above-mentioned semi-penetration face; According to the above-mentioned interference striped that on above-mentioned detection faces, forms, carry out the Wavefront-measuring of above-mentioned light beam.
In addition, in the Wavefront-measuring interferometer device of the present invention, or possess and make above-mentioned semi-penetration face and said reference photogenerated device thereby at least one is moving the optical path regulator of regulating the optical range between them on the optical axis, or make the reference light generating apparatus maintain the different mutually a plurality of reflection diffraction portion of size, can select in them one to be configured in above-mentioned convergent point to constitute like this.
In order to realize above-mentioned the 2nd purpose, Wavefront-measuring interferometer device of the present invention is as following formation.Promptly, Wavefront-measuring interferometer device of the present invention, it is a kind of can the Wavefront-measuring of the light beam that becomes determination object and the two light beam measurement device of measuring of characteristic measurement of this light beam spot being is characterized in that: possess Wavefront-measuring portion and dot characteristics determination part; Above-mentioned Wavefront-measuring portion, have with above-mentioned beam separation become to be used for the tested light beam of Wavefront-measuring and reference beam generate tested/reference beam tripping device with 2 light beams of light beam, to the generation of said reference light beam with light beam carry out the corrugated shaping convert to reference beam the reference light generating apparatus, make above-mentioned tested light beam and said reference light beam interfere and be imaged as the corrugated information that has supported this tested light beam interference fringe the interference fringe generating apparatus and be arranged on the 1st photodetector of the imaging surface of above-mentioned interference striped; Above-mentioned dot characteristics determination part, have with to above-mentioned tested/above-mentioned light beam before the incident of reference beam tripping device, through above-mentioned tested/above-mentioned tested light beam after the reference beam tripping device separates or carry out the corrugated shaping before part said reference light beam generate with light beam be separated into dot generation with the dot generation of light beam with beam splitting mean and the point that will be imaged as a picture with light beam through the above-mentioned dot generation that this dot generation separates with beam splitting mean as generating apparatus, be arranged on the 2nd photodetector of the imaging surface of above-mentioned some picture.
Above-mentioned tested/the reference beam tripping device, can form the above-mentioned light beam of the part of incident as above-mentioned tested light beam to incident direction reverse direction reflection, the remainder of this light beam is generated the semi-penetration face that sees through with light beam as the said reference light beam.
In addition, said reference light beam generating apparatus, have and assemble the said reference light beam and generate with the convergent lens of light beam and be configured in the small reflection diffraction portion of the convergent point of this convergent lens, can with via above-mentioned tested/the part said reference light beam of reference beam tripping device incident generates and carries out the corrugated shaping and convert the said reference light beam to light beam, and with this reference beam to above-mentioned tested/the reference beam tripping device penetrates.
In addition, light beam measurement device of the present invention, it is characterized in that: possessing the beam separation as determination object is the beam splitting mean of 2 light beams, will through the light beam of part in above-mentioned 2 light beams that above-mentioned beam splitting mean separates as tested light beam to the semi-penetration face of incident direction reverse direction reflection, have the convergent lens of the transmitted beam that assemble to see through above-mentioned semi-penetration face and be configured in the small reflection diffraction portion of the convergent point of this convergent lens, make the above-mentioned transmitted beam of part convert reference beam that has carried out the corrugated shaping and the reference light generating apparatus that this reference beam is penetrated to above-mentioned semi-penetration face to via the incident of above-mentioned semi-penetration face, said reference light beam and above-mentioned tested light beam are synthesized the 1st imaging portion that the interference light that forms is derived the 1st detection faces and form interference fringe on the 1st detection faces, and will look like to be formed on the 2nd imaging portion on 2 detection faces through the point of another light beam in above-mentioned 2 light beams that above-mentioned beam splitting mean separates; According to the above-mentioned interference striped that on above-mentioned the 1st detection faces, forms, carry out the Wavefront-measuring of above-mentioned light beam, simultaneously according to the above-mentioned some picture that on above-mentioned the 2nd detection faces, forms, carry out the characteristic measurement of light beam spot.
Above-mentioned so-called " small reflection diffraction portion ", be a kind of by optically focused (convergence) determine its size (be contemplated to be less than the diffraction critical value and constitute) in the diffraction critical value of the convergent beam of this reflection diffraction portion, have make this convergent beam to small part as having carried out the device of the spherical wave function of reflecting of corrugated shaping.As this reflection diffraction portion, can adopt various formations, and as concrete state, can list for example on substrate, form small reflector space, form small reflector space at the tip of needle-like member or near the inside side configuration reflecting surface of pin hole or the like.
Also have, the neighboring area of preferably this reflection diffraction portion, formation can suppress to be situated between and incide the shape of the above-mentioned transmitted beam of this neighboring area to above-mentioned convergent lens reflection by above-mentioned convergent lens.
In addition, in the light beam measurement device of the present invention, can be that above-mentioned interference light is situated between and is led above-mentioned the 1st detection faces by above-mentioned optical splitter and constitute like this, thereby or possess and make that at least one is moving the optical path regulator of regulating the optical range between them in above-mentioned semi-penetration face and the said reference photogenerated device on the optical axis.
In addition, also can be to possess the shade that cuts off light path between semi-penetration face and the reference light generating apparatus, perhaps its formation is to make above-mentioned reflection diffraction portion can move to the position that breaks away from light path, perhaps its formation is that the reference light generating apparatus maintains the mutually different a plurality of reflection diffraction portion of size, can select one in them to be configured in above-mentioned convergent point, or possesses the watt meter of the light intensity of the light beam that mensuration penetrates from above-mentioned light source portion.
In addition, also can possess resolve the above-mentioned interference striped obtain above-mentioned light beam the Wavefront-measuring result the 1st resolver and resolve characteristic measurement result's the 2nd resolver that above-mentioned point looks like to obtain the light beam spot of above-mentioned light beam.
In addition, light beam measurement method of the present invention, be a kind of light beam measurement method that can measure characteristic measurement both sides, it is characterized in that: comprise that interference fringe generator program, point are as generator program and the 1st analysis program and the 2nd analysis program as the Wavefront-measuring of the light beam of determination object and this light beam spot; The interference fringe generator program, be tested light beam and reference beam generation 2 light beams of light beam that above-mentioned beam separation become to be used for Wavefront-measuring, to the said reference light beam generate carry out the corrugated shaping and convert reference beam to light beam after, make above-mentioned tested light beam and said reference light beam interfere and be imaged as the interference fringe of the corrugated information that has supported this tested light beam; Point is as generator program, be with above-mentioned tested light beam and said reference light beam generate with light beam be separated into above-mentioned light beam before 2 light beams, above-mentioned tested light beam after separating or carry out the corrugated shaping before the part that generates with light beam of said reference light beam be separated into the dot generation light beam, above-mentioned some picture generation is imaged as a picture with light beam; The 1st analysis program is resolved the Wavefront-measuring result that the above-mentioned interference striped obtains above-mentioned light beam; The 2nd analysis program is resolved the characteristic measurement result that above-mentioned point looks like to obtain the light beam spot of above-mentioned light beam.
According to Wavefront-measuring interferometer of the present invention, bear in existing mach-zehnder type device independent function that 2 optical splitters bear separately, be about to that beam separation from light source portion becomes the function of reference light and tested light and by 1 semi-penetration face they synthetic functions, therefore, can make optical system constitute simple and the configuration miniaturization, in addition, also can carry out the adjusting of optical system easily.Therefore, can implement its Wavefront-measuring easily with respect to coherent lights such as laser, guarantee easily simultaneously device that practicality such as space is set is high.
In addition, according to light beam measurement device and method of the present invention, thereby can carry out the Wavefront-measuring of light beam and the characteristic measurement of light beam spot simultaneously owing to possess above-mentioned formation.
In addition, constitute tested/reference beam device by the semi-penetration face, can constitute optical system and configuration miniaturization simply, the adjusting of optical system also can easily be carried out.
Description of drawings
Fig. 1 is the figure of an embodiment of expression Wavefront-measuring interferometer of the present invention.
Fig. 2 is the figure of the 1st embodiment of expression light beam measurement device of the present invention.
Fig. 3 is the figure of the 2nd embodiment of expression light beam measurement device of the present invention.
Fig. 4 is the figure that expression is used for the mensuration assembly of light transmission rate mensuration.
Fig. 5 is the figure of the variation of expression reflection diffraction portion.
Fig. 6 is the figure of other variation of expression reflection diffraction portion.
Fig. 7 is the figure of a variation again of expression reflection diffraction portion.
Fig. 8 is the summary pie graph of existing Wavefront-measuring interferometer device.
Among the figure, 10-Wavefront-measuring interferometer device; 10A, 10B-light beam measurement device; 11,101-light source portion; The 11a-light source body; The 11b-beam optical system; 13-optical splitter (beam splitting mean, dot generation beam splitting mean); 53,56,102,107-optical splitter; The 13a-parting plane; 15-semi-penetration plate (tested/the reference beam tripping device); 15a-semi-penetration face; 17,103,109-convergent lens; The 16-shadow shield; 19,19A～19F-reflection diffraction portion; 21,21A, 21B-substrate; 23-reference light generating apparatus; 25-imaging len (the 1st imaging len, interference fringe generating apparatus); 27-takes camera (the 1st takes camera); 27a-detection faces (the 1st detection faces, the 1st photodetector); 29-the 2nd imaging len; 31-the 2nd takes camera; 31a-the 2nd detection faces (the 2nd photodetector); The 33-computing machine; The 34-display device; The 35-input media; 36-interference fringe scanning adapter; The 37-carriage; The 38-piezoelectric element; 39,43-driver; The 41-electro-motor; The 44-turning axle; 45,104-pin hole; The 47-reflecting surface; 51,63-catoptron; The 52-watt meter; 52a-light detection faces; 54,57-calibration imaging len; 55, the 58-calibration is with taking camera; 55a, 58a-detection faces; 61-calibration light source; 62,105,110-collimation lens; 71-the 1st lens; 72-the 2nd lens; The 106-107-catoptron; The 111-imaging len; 112-takes camera.
Embodiment
Below, the embodiment about Wavefront-measuring interferometer device of the present invention is elaborated with reference to accompanying drawing.Fig. 1 is the summary pie graph of the Wavefront-measuring interferometer device of one embodiment of the present invention.
Wavefront-measuring interferometer device 10 shown in Figure 1 is the devices that the light beam that penetrates from light source portion 11 carried out Wavefront-measuring, and it possesses imaging len 25, the shooting camera 27 of below in optical splitter 13, semi-penetration plate 15, reference light generating apparatus 23 that is configured on the light path of light source portion 11 right-hand extension to figure and the figure that is configured in optical splitter 13.In addition, Wavefront-measuring interferometer device 10 possesses according to the computing machine 33 that carries out various parsings from the picture signal of taking camera 27 outputs, shows the display device 34 of the analysis result that produced by this computing machine 33 and image etc. and the input media 35 that is made of keyboard and mouse etc.Also have, in the present embodiment, by optical splitter 13, imaging len 25, the imaging of the present invention portion of taking that camera 27 constitutes.
In addition, in the present embodiment, above-mentioned light source portion 11, its formation be possess the light source body 11a that constitutes by Solid State Laser and semiconductor laser or gas laser etc., with (can using separately that these several appropriate combination such as optical beam expander, collimation lens, cylindrical lens form, the situation of also guaranteeing replacement and using separately) beam optical system 11b makes the light beam of single vertical pattern and many vertical patterns become directional light right-hand ejaculation in figure.Also have,, for example can adopt the constituting that to be situated between by the laser that solid state laser etc. constitutes by optical fiber output as light source body 11a.In addition, this light source portion 11 is loaded into as laser output device and uses in the various devices, is not the inscape of light beam measurement device 10.
Below, about the inscape detailed description of above-mentioned Wavefront-measuring interferometer device 10.Above-mentioned semi-penetration plate 15 is maintained at the interference fringe scanning adapter 36 as optical path regulator.This interference fringe scanning adapter 36, constitute by carriage 37 and piezoelectric element 38, utilize the driving of this piezoelectric element 38 and above-mentioned semi-penetration plate 15 is moved along optical axis direction, regulate the optical range between this semi-penetration plate 15 and the said reference generating apparatus 23.Also have, the driving of above-mentioned piezoelectric element 38 is situated between by driver 39 by computing machine 33 controls.
In addition, said reference photogenerated device 23 possesses the reflection diffraction portion 19 that parallel beam with left incident from figure is converged to 1 convergent lens 17 and is configured in the convergent point of this convergent lens 17.This reflection diffraction portion 19, its formation is for example to form by utilizing evaporation to be formed on metal films such as gold on the substrate 21, aluminium, chromium, the size of reflection diffraction portion 19 is less than the diffraction critical value of the convergent beam of incident.
Below, the effect of Wavefront-measuring interferometer device 10 when measuring is described.Segment beam from the right-hand ejaculation to figure of above-mentioned light source portion 11, Jie by above-mentioned optical splitter 13 towards semi-penetration plate 15, on the semi-penetration face 15a of this semi-penetration plate 15, be separated into to the tested light beam of incident direction reverse direction reflection with see through the transmitted beam of this semi-penetration plate 15 towards said reference photogenerated device 23, this transmitted beam is to above-mentioned convergent lens 17 incidents of above-mentioned reference light generating apparatus 23.
Incide the above-mentioned transmitted beam of this convergent lens 17, assemble, to above-mentioned reflection diffraction portion 19 incidents that are configured in its convergent point by this convergent lens 17.Incide the above-mentioned transmitted beam of part of above-mentioned reflection diffraction portion 19, be converted into the spherical wave that has carried out the corrugated shaping, to above-mentioned convergent lens 17 reflections in this reflection diffraction portion 19.This spherical wave is converted into plane wave at convergent lens 17, penetrates to above-mentioned semi-penetration plate 15 as reference beam.
This reference beam sees through semi-penetration plate 15, thereby at above-mentioned semi-penetration face 15a and the synthetic interference light that obtains of the above-mentioned detected light beam that is reflected.This interference light, Jie, is situated between and takes in above-mentioned shooting camera 27 by this imaging len 25 to above-mentioned imaging len 25 incidents by above-mentioned optical splitter 13.This takes camera 27, possesses the detection faces 27a that constitutes by for example solid-state imager such as CCD or CMOS, take the interference fringe that is situated between and on this detection faces 27a, forms by above-mentioned imaging len 25, the image information of the interference fringe of taking is imported into aforementioned calculation machine 33, carries out the Wavefront-measuring of above-mentioned light beam according to this image information.Also have, utilize above-mentioned interference strip-scanning adapter 36 to make above-mentioned semi-penetration face 15a in the optical axis direction fine motion, the optical path difference of said reference light beam and above-mentioned tested light beam is changed bit by bit, and so-called strip-scanning is taken, implemented to interference fringe measure, thereby can obtain more detailed Wavefront-measuring result.
As mentioned above, Wavefront-measuring interferometer device 10 according to present embodiment, bear 2 independent functions that optical splitter is born separately in existing mach-zehnder type device by 1 semi-penetration face, be about to be divided into the function of reference light and tested light and the function that they are synthesized from the light beam of light source portion, therefore, can make optical system constitute simple and the configuration miniaturization, in addition, also can carry out the adjusting of optical system easily.Therefore, can implement its Wavefront-measuring easily with respect to the coherent lights such as laser that penetrate from above-mentioned light source portion 11, that guarantees device simultaneously easily is provided with space etc.
In addition, till settled the present, but in the Wavefront-measuring of many vertical patterns laser that interference distance is extremely lacked, if the optical path difference that can not regulate reference beam and 2 light beams of tested light beam accurately, then can not obtain the good interference fringe of contrast, therefore, the enforcement of being undertaken by the difficult existing Wavefront-measuring interferometer device of optical system adjusting is very difficult.Relative with it, in the above-mentioned Wavefront-measuring interferometer device 10, by the position of employing interference fringe scanning adapter 36 variation semi-penetration face 15a, thereby, can carry out the adjusting of the optical path difference of 2 light beams easily.Thereby the Wavefront-measuring of many vertical patterns laser also can be implemented accurately.
Also have, in the form shown in Figure 1, its formation is right side configuration semi-penetration plate 15 and a reference light generating apparatus 23 in the paper of optical splitter 13, make from light source portion 11 and to the light beam of optical splitter 13 incidents, see through the light beam of parting plane 13a towards semi-penetration face 15a, but also can adopt following formation, upside configuration semi-penetration plate 15 and reference light generating apparatus 23 in the paper of optical splitter 13, make from light source portion 11 to the light beam of optical splitter 13 incidents in the rectangular reflected beams of parting plane 13a towards semi-penetration face 15a.
＜light beam measurement device＜the 1st embodiment〉〉
Below, the embodiment about light beam measurement device of the present invention is elaborated with reference to accompanying drawing.Fig. 2 is the summary pie graph of the light beam measurement device of the 1st embodiment of the present invention.
Light beam measurement device 10A shown in Figure 2 is a kind of light beam measurement device that can measure the characteristic measurement both sides as the Wavefront-measuring of the light beam of determination object and this light beam spot, possesses Wavefront-measuring portion and dot characteristics determination part.
Wavefront-measuring portion, have the tested light beam that will become be used for Wavefront-measuring and reference beam from the beam separation that light source portion 11 penetrates generate tested/reference beam tripping device (15) with 2 light beams of light beam, to the reference beam generation with light beam carry out the corrugated shaping convert to the reference light generating apparatus (23) of reference beam, the corrugated information that makes tested light beam and reference beam interfere and be imaged as to have supported this tested light beam interference fringe interference fringe generating apparatus (25) and be arranged on the 1st photodetector (27a) of the imaging surface of interference fringe.
On the other hand, the dot characteristics determination part, have with the segment beam before tested/reference beam tripping device (15) incident be separated into dot generation with the dot generation of light beam with beam splitting mean (13) and the point that will be imaged as a picture with light beam through the dot generation that this dot generation separates with beam splitting mean (13) as generating apparatus (29) be arranged on the 2nd photodetector (31a) of the imaging surface of a picture.
More particularly, the 2nd imaging len the 29, the 2nd that light beam measurement device 10A, the 1st imaging len the 25, the 1st that has in the optical splitter 13 as beam splitting mean, the semi-penetration plate 15 as tested/reference beam tripping device, shadow shield 16, reference light generating apparatus 23 that is configured on the light path of light source portion 11 right-hand extension to figure and the figure that is configured in optical splitter 13 below take camera 27 and be configured in top among the figure of optical splitter 13 is taken camera 31.In addition, light beam measurement device 10A possesses according to the computing machine 33 that carries out various parsings from the 1st and the 2nd picture signal of taking camera 27,31, shows the display device 34 of the analysis result that produced by this computing machine 33 and image etc. and the input media 35 that is made of keyboard and mouse etc.Computing machine 33, possess resolve interference fringe obtain above-mentioned light beam the Wavefront-measuring result the 1st resolver and resolve characteristic measurement result's the 2nd resolver that the some picture obtains the light beam spot of above-mentioned light beam, be used as being stored in the program in the storer etc. and the operational loop of this program of execution etc.
Also have, in the present embodiment, take camera 27 by optical splitter the 13, the 1st imaging len the 25, the 1st and constitute the 1st imaging portion, take camera 31 by optical splitter the 13, the 2nd imaging len the 29, the 2nd and constitute the 2nd imaging portion.
In addition, in light beam measurement device 10A shown in Figure 2, about adopting common number, for fear of repeating that they are omitted detailed explanation, below only difference is elaborated with the common inscape of Wavefront-measuring interferometer device shown in Figure 1 10.
Above-mentioned light source 11 in the present embodiment, with the same formation that has shown in Figure 1, in addition, being loaded into as laser output device equally with above-mentioned Wavefront-measuring interferometer device 10 yet and using in the various devices, is not the inscape of light beam measurement device 10A.
Above-mentioned shadow shield 16 is formed by the shutter that can open and close etc., and its formation is when carrying out the adjusting of optical system, cuts off the light path between above-mentioned semi-penetration plate 15 and the said reference photogenerated device 23, and when measuring open this light path.Also have, the switching of this shadow shield 16 is undertaken by electro-motor 41, and the driving of this electro-motor 41 is situated between by driver 43 by computing machine 33 controls.
Below, the effect of light beam measurement device 10A when measuring is described.From the segment beam of above-mentioned light source portion 11 right-hand ejaculation to figure,, be separated into towards the light beam of above-mentioned semi-penetration plate 15 with towards 2 light beams of light beam (the some picture generates and uses light beam) of above-mentioned the 2nd imaging len 29 at the parting plane 13a of above-mentioned optical splitter 13.In 2 light beams towards a light beam of above-mentioned semi-penetration plate 15, at the semi-penetration face 15a of this semi-penetration plate 15, be separated into to the tested light beam of incident direction reverse direction reflection with see through the transmitted beam (reference beam generate use light beam) of this semi-penetration plate 15 towards said reference photogenerated device 23.Also have, above-mentioned shadow shield 16 is by open during mensuration, and above-mentioned transmitted beam can not cut off by this shadow shield 16 and to above-mentioned convergent lens 17 incidents of above-mentioned reference light generating apparatus 23.
Incide the above-mentioned transmitted beam of this convergent lens 17, assemble, to above-mentioned reflection diffraction portion 19 incidents that are configured in its convergent point by this convergent lens 17.Incide the above-mentioned transmitted beam of part of this reflection diffraction portion 19, be converted into the spherical wave that has carried out the corrugated shaping, to above-mentioned convergent lens 17 reflections in this reflection diffraction portion 19.This spherical wave is converted into plane wave at convergent lens 17, penetrates to above-mentioned semi-penetration plate 15 as reference beam.
This reference beam sees through semi-penetration plate 15, thereby at above-mentioned semi-penetration face 15a and the synthetic interference light that obtains of the above-mentioned detected light beam that is reflected.This interference light, Jie, is situated between and is taken the 1st detection faces 27a imaging in the camera 27 and take interference fringe the above-mentioned the 1st by the 1st imaging len 25 to 25 incidents of above-mentioned the 1st imaging len by above-mentioned optical splitter 13.The image information of the interference fringe of taking is imported into aforementioned calculation machine 33, carries out the Wavefront-measuring of above-mentioned light beam according to this image information.
On the other hand, the light beam that in 2 separated light beams of above-mentioned optical splitter 13, penetrates to above-mentioned the 2nd imaging len 29, Jie by the 2nd detection faces 31a of the 2nd imaging len 29 optically focused in above-mentioned the 2nd shooting camera 31 (for example, constitute by solid-state imagers such as CCD or CMOS), the some picture of the above-mentioned light beam of formation on the 2nd detection faces 31a.The 2nd takes camera 31, and its formation is to take the some picture that forms, and its image information is input to aforementioned calculation machine 33.And,, carry out the intensity distributions and the various characteristicses such as half range value, cross sectional shape and brightness dispersion of light beam spot and measure according to the image information that is input to the some picture in the computing machine 33.
Also have, the adjusting of the optical system of above-mentioned light beam measurement device 10A at first, is to carry out under the state that is cut off light path between above-mentioned semi-penetration plate 15 and the said reference photogenerated device 23 by above-mentioned shadow shield 16.At this state, be configured from above-mentioned light source portion 11 outgoing beams, take the adjusting of each optics on the light path of camera 31 and be configured in from above-mentioned light source portion 11 via above-mentioned optical splitter 13 to above-mentioned semi-penetration plate 15, be reflected again via optical splitter 13 to the above-mentioned the 1st adjusting of taking each optics on the light path of camera 27 at this semi-penetration face 15a via above-mentioned optical splitter 13, to the above-mentioned the 2nd.After these were regulated, above-mentioned shadow shield 16 was carried out the adjusting of said reference photogenerated device 23 by open.
As mentioned above, according to the light beam measurement device 10A of the 1st embodiment, can carry out the Wavefront-measuring of the light beam that penetrates from above-mentioned light source portion 11 and the characteristic measurement of light beam spot simultaneously.In addition, owing to adopt striking rope type optical system configurations, thereby constitute simply and small-sized, can also carry out the adjusting of optical system easily.
Also have, in the form shown in Figure 2, right side configuration semi-penetration plate 15, shadow shield 16 and reference light generating apparatus 23 in the figure of optical splitter 13, upside disposes the 2nd imaging len 29 and the 2nd and takes camera 31 in the figure of optical splitter 13, but also can exchange their allocation position, promptly dispose the 2nd imaging len 29 and the 2nd and take camera 31, at upside semi-penetration plate 15, shadow shield 16 and the reference light generating apparatus 23 of optical splitter 13 on the right side of optical splitter 13.
In addition, in the form shown in Figure 2, its formation is to be situated between from the interference light that semi-penetration plate 15 sides are returned to be directed to the 1st imaging len 25 by optical splitter 13, but also can adopt following formation, other optical splitters of configuration between optical splitter 13 and semi-penetration plate 15, interference light Jie who returns from semi-penetration plate 15 sides is directed to the 1st imaging len 25 by these other optical splitters.
In addition, in the form shown in Figure 2, possesses the shadow shield 16 that cuts off semi-penetration plate 15 and 23 light paths of reference light generating apparatus, so that carry out optical system when regulating, can be from reference light generating apparatus 23 to semi-penetration plate 15 Returning beams, but, replace and possess this shadow shield, can adopt and make reflection diffraction portion move (comprise and fascinating) formation to the position that breaks away from light path, by making reflection diffraction portion 19 move to the position that breaks away from light path, thereby, can be from reference light generating apparatus 23 to semi-penetration plate 15 Returning beams.As making reflection diffraction portion 19 move to the form of the position that breaks away from light path, have and make the outer form of reference light generating apparatus 23 all mobile light paths and only make reflection diffraction portion 19 move to the outer form of light path etc., and when reflection diffraction portion 19 being replaced with form shown in Figure 6 (situation aftermentioned in detail), by making its substrate 21A rotation, thereby can easily 19A～the 19D of reflection diffraction portion be moved to outside the light path.
＜light beam measurement device＜the 2nd embodiment〉〉
Below, describe about the 2nd embodiment of light beam measurement device of the present invention.Fig. 3 is the summary pie graph of the light beam measurement device 10B of the 2nd embodiment of the present invention.Also have, in light beam measurement device 10B shown in Figure 3, about adopting common number, for fear of repeating that they are omitted detailed explanation, below only difference is elaborated with the common inscape of light beam measurement device 10A shown in Figure 2.
Light beam measurement device 10B shown in Figure 3 except the inscape of light beam measurement device 10A shown in Figure 2, also possesses following inscape.Promptly, as shown in Figure 3, light beam measurement device 10B, be configured in the light path between light source portion 11 and the optical splitter 13 when being used to measure the light intensity of the light beam that penetrates from light source portion 11, it possesses makes this light beam with parallel beam state rectangular watt meter 52 of the light intensity of the light beam that comes out from this catoptron 51 of reflection and the catoptron 51 of deriving and mensuration in below in figure.This watt meter 52, its formation are to possess light detection faces 52a, measure the intensity that incides the light beam of this light detection faces 52a with almost parallel light beam state, and its mensuration information is exported to above-mentioned computing machine 33.Also have, can also on the light path between catoptron 51 and the watt meter 52, dispose optical beam expander, change size as required to the parallel beam diameter of watt meter 52 incidents.In addition, above-mentioned catoptron 51 just is configured on the light path when measuring the light intensity of light beam, avoids from light path when carrying out the characteristic measurement of the Wavefront-measuring of light beam and light beam spot in the time of usually.
In addition, light beam measurement device 10B, between light source portion 11 and optical splitter 13, possess the segment beam that will penetrate from light source portion 11 below at right angles reflection and the optical splitter 53 of deriving, the shooting camera 55 that is configured in the imaging len that is used to calibrate 54 on the light path of the light beam of deriving and is used to equally calibrate to figure via this optical splitter 53.Imaging len 54 with the detection faces 55a (for example, solid-state imagers such as CCD or CMOSs be made of) of above-mentioned beam condenser in above-mentioned shooting camera 55 of incident, forms the some picture of light beam on this detection faces 55a.Taking camera 55 its formations is to take the some picture that forms, and its image information is exported to above-mentioned computing machine 33.
Above-mentioned some picture via above-mentioned shooting camera 55 is taken is used in the inclination of the above-mentioned light source portion 11 of calibration etc.That is,, carry out the calibration adjustments of above-mentioned light source portion 11 according to the positional information of some picture on above-mentioned detection faces 55a that is input in the computing machine 33.
In addition, light beam measurement device 10B, between above-mentioned optical splitter 13 and above-mentioned semi-penetration plate 15, possessing will be from the segment beam of above-mentioned semi-penetration face 15a reflection below at right angles reflection and the optical splitter 56 of deriving, the shooting camera 58 that is configured in the imaging len that is used to calibrate 57 on the light path of the light beam of deriving via this optical splitter 53 and is used to equally calibrate to figure.Imaging len 57 with the detection faces 58a (for example, solid-state imagers such as CCD or CMOSs be made of) of above-mentioned beam condenser in above-mentioned shooting camera 58 of incident, forms the some picture of light beam on this detection faces 58a.Taking camera 58 its formations is to take the some picture that forms, and its image information is exported to above-mentioned computing machine 33.
Above-mentioned some picture via above-mentioned shooting camera 58 is taken is used in the inclination of above-mentioned semi-penetration plate 15 of calibration and said reference photogenerated device 23 etc.That is,, carry out the calibration adjustments of above-mentioned semi-penetration plate 15 and said reference photogenerated device 23 according to the positional information of some picture on above-mentioned detection faces 58a that is input in the computing machine 33.
Also have, this calibration adjustments at first, is to carry out under the state that is cut off light path between above-mentioned semi-penetration plate 15 and the said reference photogenerated device 23 by above-mentioned shadow shield 16.At this state, carry out the calibration adjustments of above-mentioned semi-penetration plate 15, after this was regulated, above-mentioned shadow shield 16 was carried out the calibration adjustments of said reference photogenerated device 23 by open.
In addition, light beam measurement device 10B, top position in the figure of above-mentioned optical splitter 13 possesses calibration light source 61, collimation lens 62 and catoptron 63; Calibration is sent the calibration light beam with light source 61; Collimation lens 62 makes from this calibration parallel with light source 61 divergent beams of right-hand output to figure; Catoptron 63 is configured in when calibration aftermentioned parallel flat shape optical element on the light path between above-mentioned optical splitter 13 and above-mentioned the 2nd imaging len 29, the parallel beam at right angles reflection of below to figure that will send from above-mentioned collimation lens 62, derives to above-mentioned optical splitter 13 again.
Above-mentioned calibration is disposed above-mentioned parallel flat shape optical element (for example, glass cover and various optical filters etc. with light source 61 between above-mentioned light source portion 11 and above-mentioned optical splitter 53.Diagram is slightly) time, be used in the inclination of this optical element of adjusting etc.Promptly, during above-mentioned optical element of calibration adjustments etc., the above-mentioned catoptron 63 of configuration on the light path between above-mentioned optical splitter 13 and above-mentioned the 2nd imaging len 29, the calibration of sending with light source 61 from calibration is directed to above-mentioned optical splitter 13 with light beam Jie by above-mentioned collimation lens 62 and above-mentioned catoptron 63.Lead the calibration parallel beam of above-mentioned optical splitter 13, at the parting plane 13a of this optical splitter 13, its part left in figure at right angles is directed to above-mentioned optical element.
These calibrations of being led optical element are reflected in its part of this optical element with parallel beam, its partial reflection light beam is via the at right angles reflection of below in figure of above-mentioned optical splitter 53, form its some picture again via the detection faces 55a of above-mentioned imaging len 54 optically focused in above-mentioned shooting camera 55, and at this detection faces 55a.This some picture is taken by taking camera 55, and its image information is output to aforementioned calculation machine 33.And,, carry out the calibration adjustments of above-mentioned optical element according to the positional information of some picture on above-mentioned detection faces 55a that is input in the computing machine 33.
Also have, above-mentioned catoptron 51 and watt meter 52 also can be used in the light transmission rate and the light intensity of Jie by the light beam of this collector lens output of measuring the collector lens of stipulating (for example, optical pickup lens).Fig. 4 represents to be used to measure the mensuration assembly 70 of the transmitance of this optical pickup lens.
Mensuration assembly 70 shown in Figure 4, its formation are with as the 1st lens 71 that are used for the light pick-up of determination object with make from the figure left and incide the 1st lens 71 and the 2nd lens (light transmission rate is known) of the parallel beam assembling, disperse via the 1st lens 71 are keeping being spaced from each other predetermined distance.This measures assembly 70, when adopting the light transmission rate assay method (with reference to the special 2004-379449 of hope instructions, the special 2004-379450 of hope instructions) that proposes by this case applicant, measure the light transmission rate of the 1st lens 71 and being situated between, be configured on the light path between light source portion shown in Figure 3 11 and the catoptron 51 by the light intensity of the above-mentioned light beam of the 1st lens 71 outputs etc.
Promptly, under the state of configuration said determination assembly 70 on the light path between light source portion shown in Figure 3 11 and the catoptron 51, utilizing watt meter 52 to try to achieve from light source portion 11 is situated between by the maximum amount data of the light beam of measuring assembly 70 outputs, it with compare in the light quantity data that do not dispose the light beam of measuring under the state of measuring assembly 70 that sends from light source portion 11, computing, thereby, can try to achieve the light transmission rate of above-mentioned the 1st lens 71 and only be situated between by the light intensity (details is with reference to above-mentioned each instructions) of the above-mentioned light beam of the 1st lens 71 outputs.
In addition, under the light transmission rate of the 2nd lens is not known situation, except the above-mentioned the 1st and the 2nd lens 71,72, also in determined lens, add the 3rd lens, it is right to constitute 3 different lens by their 3 lens, right to these lens, try to achieve the maximum amount data in turn, the light transmission rate with each lens is carried out computing as the ternary simultaneous equations of unknown number, thereby the light transmission rate of trying to achieve each determined lens gets final product.
Also have, when measuring the light transmission rate etc. of the 1st lens 71, preferably replace shown in Figure 3 testedly with light source portion 11, the mensuration that employing can be exported the light beam with higher corrugated precision is with reference light source (diagram slightly).
As mentioned above, light beam measurement device 10B according to the 2nd embodiment, can carry out the Wavefront-measuring of the light beam that penetrates from above-mentioned light source portion 11 and the characteristic measurement of light beam spot simultaneously, the light intensity that can also carry out the light beam that penetrates from light source portion 11 is simultaneously measured and the mensuration such as light transmission rate of optical pickup lens etc.In addition, use optical system, therefore, can also carry out all adjustings of optical system easilier owing to possess calibration.
Also have, in the form shown in Figure 3, will be to the segment beam before semi-penetration plate 15 (tested/the reference beam tripping device) incident, be separated into the dot generation light beam via optical splitter 13 (beam splitting mean), and the tested light beam of part after will separating via semi-penetration plate 15 (tested/the reference beam tripping device), be separated into the dot generation light beam via optical splitter 56, perhaps also can between semi-penetration plate 15 and reference light generating apparatus 23, other optical splitters be set, will carry out the preceding part reference beam generation of corrugated shaping and be separated into the dot generation light beam with light beam.
＜light beam measurement method 〉
Below, describe about the light beam measurement method of one embodiment of the present invention.This light beam measurement method adopts above-mentioned light beam measurement device 10A or 10B to carry out.
Promptly, at first, will be as the light beam (from the light beam of light source portion 11 ejaculations) of determination object, being separated into the tested light beam and the reference beam that are used for Wavefront-measuring at semi-penetration face 15a generates with 2 light beams of light beam, via the separated reference beams of 23 pairs of reference light generating apparatus generate carry out the corrugated shaping and convert reference beam to light beam after, tested light beam and reference beam interfered and take the interference fringe (interference fringe generator program) that the 1st detection faces 27a in the camera 27 is imaged as the corrugated information that has supported this tested light beam the 1st
On the other hand, to be separated into tested light beam and reference beam via optical splitter 13 and generate and be separated into the dot generation light beam, and make the dot generation of separation be imaged as a picture (putting) as generator program with the 2nd detection faces 31a of light beam in the 2nd shooting camera 31 with the segment beam before 2 light beams of light beam.
And, in computing machine 33, resolve the Wavefront-measuring result (the 1st analysis program) that interference fringe obtains light beam, resolve the characteristic measurement result (the 2nd analysis program) that the some picture obtains the light beam spot of light beam simultaneously.
The change of＜form 〉
Light beam measurement device 10A shown in Figure 2 and light beam measurement device 10B shown in Figure 3, its configuration that is used to obtain the optical system of interference fringe is striking rope type, and also can replace the optical system configurations that striking rope type adopts Michaelson.At that time, feature when adopting striking rope type optical system configurations as mentioned above, the formation of optical system be simple and small-sized, regulate these features of optical system easily reduces, but can obtain the tested light beam of interference fringe and the light path of reference beam is set at mutually about equally with being used to, therefore, even but the advantage that has is a light beam as the Wavefront-measuring object also can measure when being the light beam of low interference capability.
In addition, catoptron 51 and the watt meter 52 of light beam measurement device 10B shown in Figure 3 is located on the Wavefront-measuring interferometer device 10 shown in Figure 1, thereby, this Wavefront-measuring interferometer device 10, the light intensity mensuration etc. that also can carry out light beam constitutes like this.At that time, also can on the light path between light source portion 11 and the optical splitter 13, can take out configuration catoptron 51 with putting into.Have, by adopting mensuration assembly 70 shown in Figure 4, thereby Wavefront-measuring interferometer device 10 shown in Figure 1 also can carry out the light transmission rate of optical pickup lens etc. and measure like this and constitute again.
In addition, also can do various changes to the form of reflection diffraction portion 19 general among Wavefront-measuring interferometer device 10 shown in Figure 1, Fig. 2 and light beam measurement device 10A, the 10B shown in Figure 3.
Below, the variation about the form of reflection diffraction portion 19 describes with reference to Fig. 5～Fig. 7.The 19E of reflection diffraction portion shown in Figure 5 is for example by utilizing evaporation etc. to constitute forming the metal film that forms on the curved substrate 21B such as sphere.In the device of this form, because substrate 21B forms the curved surface shape, thereby, can suppress to reflect to above-mentioned convergent lens, thereby seek to suppress the generation of noise light from disposing the convergent beam that the convergent lens of left (diagram is slightly) in the drawings incides on this substrate 21B.
19A～the 19D of reflection diffraction portion shown in Figure 6, for example by utilizing evaporation etc. to constitute forming the metal film that forms on the discoideus substrate 21A, the size of each 19A～19D of reflection diffraction portion is different mutually and constitute.In addition, substrate 21A is that the center can constitute rotatably along paper with turning axle 44.In the device of this form, corresponding with the NA that is configured in the convergent lens of side in face of the paper etc., can select a convergent point that is configured in this convergent lens among the 19A～19D of reflection diffraction portion.
The 19F of reflection diffraction portion shown in Figure 7 is made of pin hole 45 that forms less than the diffraction critical value of the convergent beam of incident and the reflecting surface 47 that is configured near the inside side of this pin hole 45.In the device of this form, even the relative position of pin hole 45 and reflecting surface 47 is offset along this reflecting surface 47, the function of corrugated shaping does not change yet.Thereby the advantage that has is: reflecting surface 47 take place damaged and when diminishing its function towards pin hole 45 parts, can relativity shift by pin hole 45 and reflecting surface 47, thus seek easy repair function.
Claims (17)
1. a Wavefront-measuring interferometer device is characterized in that,
Possess:
Semi-penetration face, its segment beam that will become determination object as tested light beam to reflecting with the incident direction reverse direction;
The reference light generating unit, it has the convergent lens of assembling the transmitted beam seen through above-mentioned semi-penetration face and is configured in the small diffraction portion of the convergent point of this convergent lens, will be converted to the reference beam that has carried out the corrugated shaping by the above-mentioned transmitted beam of part of above-mentioned semi-penetration face incident and this reference beam be penetrated to above-mentioned semi-penetration face again; And
Imaging portion, it is directed at said reference light beam and the synthetic interference light that obtains of above-mentioned tested light beam detection faces and forms interference fringe on this detection faces,
According to the above-mentioned interference striped that is formed on the above-mentioned detection faces, carry out the Wavefront-measuring of above-mentioned light beam.
2. Wavefront-measuring interferometer device according to claim 1, it is characterized in that: possess the light path adjusting portion, at least one moves on optical axis this light path adjusting portion in above-mentioned semi-penetration face and the said reference photogenerated portion by making, and regulates the optical range between these semi-penetration faces and reference light generating unit.
3. Wavefront-measuring interferometer device according to claim 1 is characterized in that: said reference photogenerated portion keeps the different mutually a plurality of reflection diffraction portion of size, can select one in these a plurality of reflection diffraction portions to be configured in above-mentioned convergent point.
4. Wavefront-measuring interferometer device according to claim 1 is characterized in that: the neighboring area of above-mentioned reflection diffraction portion is constituted as: can suppress to incide the shape of the above-mentioned transmitted beam of this neighboring area to above-mentioned convergent lens reflection via above-mentioned convergent lens.
5. light beam measurement device, it can the two be measured to the characteristic measurement of the Wavefront-measuring of the light beam that becomes determination object and this light beam spot, it is characterized in that: possess Wavefront-measuring portion and dot characteristics determination part;
Above-mentioned Wavefront-measuring portion has:
Tested/the reference beam separated part, it generates tested light beam and the reference beam that above-mentioned beam separation becomes to be used for Wavefront-measuring with 2 light beams of light beam,
The reference light generating unit, it generates the said reference light beam and carries out the corrugated shaping and convert reference beam to light beam,
The interference fringe generating unit, it makes above-mentioned tested light beam and said reference light beam interfere and make the interference fringe imaging of the corrugated information that has supported this tested light beam, and
The 1st photodetector, it is arranged on the imaging surface of above-mentioned interference striped;
Above-mentioned dot characteristics determination part has:
Dot generation light beam separated part, its will to above-mentioned tested/above-mentioned light beam before the incident of reference beam separated part, by above-mentioned tested/the reference beam separating part from after above-mentioned tested light beam or carry out the corrugated shaping before part said reference light beam generate and be separated into the dot generation light beam with light beam
The point as generating unit, its will by this dot generation with the light beam separating part from above-mentioned dot generation be imaged as a picture with light beam, and
The 2nd photodetector, it is arranged on the imaging surface of above-mentioned some picture.
6. light beam measurement device according to claim 5, it is characterized in that: above-mentioned tested/the reference beam separated part, be with the above-mentioned light beam of the part of incident as above-mentioned tested light beam to generate the semi-penetration face that the remainder of this light beam is seen through with light beam with incident direction reverse direction reflection and as the said reference light beam.
7. light beam measurement device according to claim 5, it is characterized in that: said reference photogenerated portion has and assembles the said reference light beam and generate with the convergent lens of light beam and be configured in the small reflection diffraction portion of the convergent point of this convergent lens, will by above-mentioned tested/the part said reference light beam of reference beam separated part incident generates and carries out the corrugated shaping and convert the said reference light beam to light beam, and with this reference beam to above-mentioned tested/the reference beam separated part penetrates.
8. light beam measurement device is characterized in that possessing:
Beam separation portion, its beam separation that will become determination object becomes 2 light beams,
The semi-penetration face, its will through above-mentioned beam separation part from above-mentioned 2 light beams in one of light beam a part as tested light beam to the reflection of incident direction reverse direction,
The reference light generating unit, it has the convergent lens of assembling the transmitted beam seen through above-mentioned semi-penetration face and is configured in the small reflection diffraction portion of the convergent point of this convergent lens, the reference beam that the above-mentioned transmitted beam of part by the incident of above-mentioned semi-penetration face is converted to carried out the corrugated shaping, and this reference beam is penetrated to above-mentioned semi-penetration face
The 1st imaging portion, it is directed at said reference light beam and the synthetic interference light that obtains of above-mentioned tested light beam the 1st detection faces and forms interference fringe on the 1st detection faces, and
The 2nd imaging portion, its will through above-mentioned beam separation part from above-mentioned 2 light beams in the point of another light beam look like to be formed on the 2nd detection faces;
According to the above-mentioned interference striped that on above-mentioned the 1st detection faces, forms, carry out the Wavefront-measuring of above-mentioned light beam, simultaneously according to the above-mentioned some picture that on above-mentioned the 2nd detection faces, forms, carry out the characteristic measurement of light beam spot.
9. light beam measurement device according to claim 8 is characterized in that: above-mentioned interference light is situated between and is led above-mentioned the 1st detection faces by above-mentioned beam separation portion.
10. light beam measurement device according to claim 8, it is characterized in that: possess the light path adjusting portion, this light path adjusting portion moves on optical axis by making in above-mentioned semi-penetration face and the said reference photogenerated portion at least one, thereby regulates the optical range between these semi-penetration faces and the reference light generating unit.
11. light beam measurement device according to claim 8 is characterized in that: said reference photogenerated portion keeps the different mutually a plurality of reflection diffraction portion of size, can select one in these a plurality of reflection diffraction portions to be configured in above-mentioned convergent point.
12. light beam measurement device according to claim 8 is characterized in that: possess the light shielding part that cuts off light path between above-mentioned semi-penetration face and the said reference photogenerated portion.
13. light beam measurement device according to claim 8 is characterized in that: can make above-mentioned reflection diffraction portion move to the position that breaks away from light path on the formation.
14. light beam measurement device according to claim 8 is characterized in that: the neighboring area of above-mentioned reflection diffraction portion is constituted as: can suppress to incide the shape of the above-mentioned transmitted beam of this neighboring area to above-mentioned convergent lens reflection via above-mentioned convergent lens.
15. light beam measurement device according to claim 5 is characterized in that: the watt meter that also possesses the light intensity of measuring above-mentioned light beam.
16. light beam measurement device according to claim 5 is characterized in that: also possess resolve the above-mentioned interference striped obtain above-mentioned light beam the Wavefront-measuring result the 1st analysis unit and resolve characteristic measurement result's the 2nd analysis unit that above-mentioned point looks like to obtain the light beam spot of above-mentioned light beam.
17. a light beam measurement method, it is can the two the light beam measurement method measured of characteristic measurement as Wavefront-measuring and this light beam spot of the light beam of determination object be is characterized in that: carry out following program:
The interference fringe generator program, the tested light beam and the reference beam that above-mentioned beam separation are become to be used for Wavefront-measuring generate with 2 light beams of light beam, to the said reference light beam generate carry out the corrugated shaping and convert reference beam to light beam after, above-mentioned tested light beam and said reference light beam are interfered and imaging has supported the interference fringe of the corrugated information of this tested light beam;
Point is as generator program, above-mentioned tested light beam and said reference light beam generate with the above-mentioned light beam before 2 light beams of light beam with being separated into, above-mentioned tested light beam after separating or carry out the corrugated shaping before part said reference light beam generate with light beam as a picture generation beam separation, above-mentioned some picture generation is imaged as a picture with light beam;
The 1st analysis program is resolved the Wavefront-measuring result that the above-mentioned interference striped obtains above-mentioned light beam;
The 2nd analysis program is resolved the characteristic measurement result that above-mentioned point looks like to obtain the light beam spot of above-mentioned light beam.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004168966 | 2004-06-07 | ||
| JP2004168965A JP4853938B2 (en) | 2004-06-07 | 2004-06-07 | Interferometer device for wavefront measurement |
| JP2004168965 | 2004-06-07 | ||
| JP2005128344 | 2005-04-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1707229A true CN1707229A (en) | 2005-12-14 |
| CN100451580C CN100451580C (en) | 2009-01-14 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2005100759056A Expired - Fee Related CN100451580C (en) | 2004-06-07 | 2005-06-03 | Wavefront-measuring interferometer apparatus, and light beam measurement apparatus and method thereof |
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| Country | Link |
|---|---|
| JP (1) | JP4853938B2 (en) |
| CN (1) | CN100451580C (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100538291C (en) * | 2007-01-25 | 2009-09-09 | 中国科学院合肥物质科学研究院 | Transmission type wavelength meter for ordered hole array and measuring method thereof |
| CN102118658A (en) * | 2009-12-31 | 2011-07-06 | 华为技术有限公司 | Method and device for port identification of light splitter |
| CN108627318A (en) * | 2012-03-23 | 2018-10-09 | 卡尔蔡司Smt有限责任公司 | Measure the measuring system of the image quality of EUV camera lenses |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009069041A (en) | 2007-09-14 | 2009-04-02 | Fujinon Corp | Wavefront measuring device for optical pickup apparatus |
| CN102607454A (en) * | 2011-02-24 | 2012-07-25 | 南京理工大学 | Optical freeform surface interference detection system |
| JP6395582B2 (en) * | 2014-12-08 | 2018-09-26 | 浜松ホトニクス株式会社 | Phase singularity evaluation method and phase singularity evaluation apparatus |
| CN115597483B (en) * | 2022-09-30 | 2024-02-06 | 南京理工大学 | Interferometer beam expansion collimation device |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2169141A1 (en) * | 1995-04-07 | 1996-10-08 | Ivan Prikryl | Interferometer having a micromirror |
| JP2003042731A (en) * | 2001-08-01 | 2003-02-13 | Canon Inc | Apparatus and method for measurement of shape |
-
2004
- 2004-06-07 JP JP2004168965A patent/JP4853938B2/en not_active Expired - Fee Related
-
2005
- 2005-06-03 CN CNB2005100759056A patent/CN100451580C/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100538291C (en) * | 2007-01-25 | 2009-09-09 | 中国科学院合肥物质科学研究院 | Transmission type wavelength meter for ordered hole array and measuring method thereof |
| CN102118658A (en) * | 2009-12-31 | 2011-07-06 | 华为技术有限公司 | Method and device for port identification of light splitter |
| CN108627318A (en) * | 2012-03-23 | 2018-10-09 | 卡尔蔡司Smt有限责任公司 | Measure the measuring system of the image quality of EUV camera lenses |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005345441A (en) | 2005-12-15 |
| JP4853938B2 (en) | 2012-01-11 |
| CN100451580C (en) | 2009-01-14 |
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