CN1614453A - Preparation of Yb-Gd-Ga doped garnet planar optical waveguide - Google Patents
Preparation of Yb-Gd-Ga doped garnet planar optical waveguide Download PDFInfo
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- CN1614453A CN1614453A CN 200410084638 CN200410084638A CN1614453A CN 1614453 A CN1614453 A CN 1614453A CN 200410084638 CN200410084638 CN 200410084638 CN 200410084638 A CN200410084638 A CN 200410084638A CN 1614453 A CN1614453 A CN 1614453A
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Abstract
A method for preparing planar optical waveguide of garnet doped with Yb-Gd-Ga applies pulse laser depositing method to fuse out surface layer molecule of Yb3+: GGG multicrystal target material and to generate Yb3+:GGG planar optical waveguide on heated pure YAG substrate. A Yb3+: GGG planar optical waveguide on the requirement in micron grade cand be growed up by utilizing the method.
Description
Technical field
The present invention relates to planar optical waveguide, particularly a kind of preparation method of Yb-Gd-Ga doped garnet planar optical waveguide relates to growth one deck Yb on pure YAG single crystalline substrate particularly
3+: the GGG monocrystal thin films, this is a kind of good planar optical waveguide material.Yb
3+: the GGG planar optical waveguide is excellent laser, photoelectric material, and prospect is widely used.
Background technology
Yb
3+Ion is the simplest active ions, and a ground state and an excited state are only arranged.Its advantage is:
1.Yb
3+The ionic absorption band can be coupled with the InGaAs laser diode pumping source in 0.9-1.1 mum wavelength scope, and absorbs bandwidth;
2. the quantum defective is low;
3. there are not excited state absorption and last conversion, the light conversion efficiency height;
4. fluorescence lifetime is long, helps energy storage.
Pulse laser sediment method has been obtained very big application at optoelectronic areas recently.The monocrystalline optical waveguide is compared with the body monocrystalline has little laser threshold and high gain.Because the GGG crystal has the refractive index (n more much higher than YAG
GGG=1.2377, n
YAG=1.2016) and little mismatch ratio (less than 2.9%), so be easy to make the optical waveguide of function admirable.But adopt the bulk Yb of prior art growth
3+: the GGG crystal, be applied to fields such as integrated optics, be processed into the micron dimension wafer, this is very difficult thing.
Summary of the invention
The technical problem to be solved in the present invention is to overcome the bulk Yb of technology growth formerly
3+: the GGG crystal is difficult to be processed into the problem of micron dimension wafer, and a kind of preparation method of Yb-Gd-Ga doped garnet planar optical waveguide is provided, to satisfy micro-optic field and growing laser technology and the needs of integrated optics.
The preparation method of Yb-Gd-Ga doped garnet planar optical waveguide of the present invention adopts the method for pulsed laser deposition (PLD:pulsed laser deposition), use the ArF excimer laser, scioptics with energy density optically focused after, the Yb in optical window shines device
3+: the GGG polycrystal target, the top layer molecule is melted steam, arrive film forming on the pure YAG substrate.
The used pulsed laser deposition of the present invention prepares Yb
3+: the device synoptic diagram of GGG planar optical waveguide is seen Fig. 1, with ArF excimer laser (optical maser wavelength is 193nm) scioptics optically focused, the Yb in optical window shines device
3+: the GGG polycrystal target, after target absorbs laser, owing to Electron Excitation becomes high temperature fused state, make the material surface tens nanometer be evaporated gasification, gasiform particulate is emitted with column and is spread, thus on the surperficial number centimeters of target suitable heated pure YAG substrate staggered relatively, adhere to, the accumulation deposit becomes Yb
3+: the GGG film.
Yb of the present invention
3+: the preparation method's of GGG planar optical waveguide concrete technological process is as follows:
＜1〉with the twin polishing of cleaning or the pure YAG substrate and the Yb of single-sided polishing
3+: the GGG polycrystal target is sent in the chamber of pulsed laser deposition device;
＜2〉with being pumped into ultrahigh vacuum in the chamber, charge into oxygen atmosphere then;
＜3〉the YAG substrate is heated, be warming up to 500～900 ℃, ArF excimer laser scioptics focused light, the Yb in optical window shines the device chamber
3+: the GGG polycrystal target, the molten back film forming on pure YAG substrate of steaming of top layer molecule, slowly reduce to room temperature after, can obtain high-quality Yb
3+: the GGG film.
The present invention and technology growth Yb formerly
3+: GGG body monocrystalline is compared, and the pure YAG of high-quality that adopts czochralski method or Bridgman-Stockbarge method for growing grows the micron dimension Yb that suits the requirements as substrate on pure YAG substrate
3+: the GGG planar optical waveguide, overcome and adopted the problem of technology growth body monocrystalline processing difficulties formerly, saved material greatly.Suitable batch of the present invention is produced, and can satisfy the market demand of laser technology fast development, has good economic benefit.
Description of drawings
Fig. 1 is pulsed laser deposition (PLD) schematic representation of apparatus that the inventive method adopts.
Embodiment
Embodiment 1
With above-mentioned pulsed laser deposition (PLD) preparation Yb
3+: the device of GGG monocrystal thin films and concrete technological process:
＜1〉will clean and be of a size of 10 * 10mm
2, the pure YAG substrate and the Yb of twin polishing
3+: the GGG polycrystal target is sent into the pulsed laser deposition system;
＜2〉with being pumped into ultrahigh vacuum in the chamber, charge into oxygen atmosphere then;
＜3〉substrate is heated, is warming up to 600 ℃, with the ArF excimer laser scioptics of pulsewidth 25ns with 10J/cm
2Energy density optically focused, the Yb in optical window shines device
3+: the GGG polycrystal target, the molecule molten back film forming on pure YAG substrate of steaming in target top layer slowly can obtain high-quality Yb after the cooling
3+: the GGG film.
Embodiment 2
With above-mentioned pulsed laser deposition (PLD) preparation Yb
3+: the device of GGG monocrystal thin films and concrete technological process:
＜1〉will clean and be of a size of 10 * 10mm
2, the pure YAG substrate and the Yb of twin polishing
3+: the GGG polycrystal target is sent into the pulsed laser deposition system;
＜2〉with being pumped into ultrahigh vacuum in the chamber, charge into oxygen atmosphere then;
＜3〉substrate is heated, is warming up to 900 ℃, with the ArF excimer laser scioptics of pulsewidth 25ns with 10J/cm
2Energy density optically focused, the Yb in optical window shines device
3+: the GGG polycrystal target, the molecule molten back film forming on pure YAG substrate of steaming in target top layer slowly can obtain high-quality Yb after the cooling
3+: the GGG planar optical waveguide.
Embodiment 3
With above-mentioned pulsed laser deposition (PLD) preparation Yb
3+: the device of GGG monocrystal thin films and concrete technological process:
＜1〉will clean and be of a size of 10 * 10mm
2, the pure YAG substrate and the Yb of twin polishing
3+: the GGG polycrystal target is sent into the pulsed laser deposition system;
＜2〉with being pumped into ultrahigh vacuum in the chamber, charge into oxygen atmosphere then;
＜3〉substrate is heated, is warming up to 800 ℃, with the ArF excimer laser scioptics of pulsewidth 25ns with 10J/cm
2Energy density optically focused, the Yb in optical window shines device
3+: the GGG polycrystal target, the molecule molten back film forming on pure YAG substrate of steaming in target top layer slowly can obtain high-quality Yb after the cooling
3+: the GGG planar optical waveguide.
Embodiment 4
With above-mentioned pulsed laser deposition (PLD) preparation Yb
3+: the device of GGG monocrystal thin films and concrete technological process:
＜1〉will clean and be of a size of 10 * 10mm
2, the pure YAG substrate and the Yb of twin polishing
3+: the GGG polycrystal target is sent into the pulsed laser deposition system;
＜2〉with being pumped into ultrahigh vacuum in the chamber, charge into oxygen atmosphere then;
＜3〉substrate is heated, is warming up to 500 ℃, with the ArF excimer laser scioptics of pulsewidth 25ns with 10J/cm
2Energy density optically focused, the Yb in optical window shines device
3+: the GGG polycrystal target, the molecule molten back film forming on pure YAG substrate of steaming in target top layer slowly after the cooling, can obtain high-quality Yb
3+: the GGG planar optical waveguide.
Claims (2)
1. the preparation method of a Yb-Gd-Ga doped garnet planar optical waveguide is characterized in that choosing Yb
3+: GGG polycrystal target, growth one deck Yb on pure YAG single crystalline substrate
3+: the GGG planar optical waveguide.
2. the preparation method of Yb-Gd-Ga doped garnet planar optical waveguide according to claim 1 is characterized in that comprising following concrete steps:
＜1〉with the twin polishing of cleaning or the pure YAG single crystalline substrate and the Yb of single-sided polishing
3+: the GGG polycrystal target is sent in the pulsed laser deposition device chamber;
＜2〉with being pumped into ultrahigh vacuum in the chamber, charge into oxygen atmosphere then;
＜3〉substrate is heated, be warming up to 500～900 ℃, ArF excimer laser scioptics optically focused, the Cr in optical window shines device
4+, Yb
3+: the GGG polycrystal target, target top layer molecule is molten steam after, film forming on pure YAG single crystalline substrate can obtain high-quality Yb after slowly reducing to room temperature
3+: the GGG planar optical waveguide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100846384A CN1308715C (en) | 2004-11-26 | 2004-11-26 | Preparation of Yb-Gd-Ga doped garnet planar optical waveguide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100846384A CN1308715C (en) | 2004-11-26 | 2004-11-26 | Preparation of Yb-Gd-Ga doped garnet planar optical waveguide |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1614453A true CN1614453A (en) | 2005-05-11 |
| CN1308715C CN1308715C (en) | 2007-04-04 |
Family
ID=34765936
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2004100846384A Expired - Fee Related CN1308715C (en) | 2004-11-26 | 2004-11-26 | Preparation of Yb-Gd-Ga doped garnet planar optical waveguide |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1807547B (en) * | 2006-01-27 | 2011-06-15 | 罗维鸿 | Fluorescent inorganic matter for solid light source |
| CN106887329A (en) * | 2017-02-09 | 2017-06-23 | 北京大学 | A kind of method that epitaxial growth has the yttrium iron garnet nano thin-film of perpendicular magnetic anisotropic |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5227204A (en) * | 1991-08-27 | 1993-07-13 | Northeastern University | Fabrication of ferrite films using laser deposition |
| US5320881A (en) * | 1991-08-27 | 1994-06-14 | Northeastern University | Fabrication of ferrite films using laser deposition |
| JP3112048B2 (en) * | 1992-12-01 | 2000-11-27 | 日本電信電話株式会社 | Manufacturing method of laminated garnet crystal optical waveguide |
| JP3155941B2 (en) * | 1997-08-22 | 2001-04-16 | 横浜電子精工株式会社 | Metal oxide ferroelectric compound thin film and method for producing the same |
| JP4136744B2 (en) * | 2003-03-24 | 2008-08-20 | 住友金属鉱山株式会社 | Reflective film |
-
2004
- 2004-11-26 CN CNB2004100846384A patent/CN1308715C/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1807547B (en) * | 2006-01-27 | 2011-06-15 | 罗维鸿 | Fluorescent inorganic matter for solid light source |
| CN106887329A (en) * | 2017-02-09 | 2017-06-23 | 北京大学 | A kind of method that epitaxial growth has the yttrium iron garnet nano thin-film of perpendicular magnetic anisotropic |
| CN106887329B (en) * | 2017-02-09 | 2019-05-21 | 北京大学 | A kind of method of epitaxial growth yttrium iron garnet nano thin-film |
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| Publication number | Publication date |
|---|---|
| CN1308715C (en) | 2007-04-04 |
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Granted publication date: 20070404 Termination date: 20111126 |