CN1602554A - Baking oven for photovoltaic devices - Google Patents
Baking oven for photovoltaic devices Download PDFInfo
- Publication number
- CN1602554A CN1602554A CN 02824624 CN02824624A CN1602554A CN 1602554 A CN1602554 A CN 1602554A CN 02824624 CN02824624 CN 02824624 CN 02824624 A CN02824624 A CN 02824624A CN 1602554 A CN1602554 A CN 1602554A
- Authority
- CN
- China
- Prior art keywords
- baking oven
- roller
- semi
- conducting material
- shell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Tunnel Furnaces (AREA)
- Photovoltaic Devices (AREA)
- Light Receiving Elements (AREA)
- Electric Stoves And Ranges (AREA)
Abstract
A baking oven is described, for photovoltaic devices starting from semiconductor material characterized in that the entrainment of the semiconductor material inside the oven is effected by means of a series of rolls made of a ceramic material, which rotate on their own axis.
Description
The present invention relates to a kind of baking oven that is used for the electrooptical device made by semi-conducting material, it is characterized in that: the conveying of the semi-conducting material in the baking oven is by being made by ceramic material, realizing around a series of rollers of himself axis rotation.
The known wafer from semiconducting material of different-thickness that can adopt is made electrooptical device (usually said solar cell).
Among multi-form processing, the manufacturing of these electrooptical devices comprises the various baking process of material, and their effect is that doped chemical or metallic contact are affixed on the semiconductor, and doped chemical is dispersed in solution or the silk screen slurry.
In order to realize these bake process, use continuous baking oven, promptly in this baking oven, fill material and process and be not subjected to any interference.
Semi-conducting material is introduced these baking ovens normally by using a chain to finish, and this chain is held and the process baking oven by two outside rollers of cover.
But above-mentioned device has many-sided shortcoming, wherein the most important thing is:
(1) chain is made by metal material usually, the pollution of metal impurities part in this semi-conducting material that can cause handling;
(2) temperature curve that bears of semi-conducting material depends on carrier chain.Carrier chain has a thermal inertia greater than the thermal inertia of semi-conducting material to be baked usually, therefore when moving, brings semi-conducting material sizable heat.(for example 10-20 ℃/S) normally essential for optimization process but is very difficult but will obtain this curve to the curve of strong variations.
Patent application EP 1010960 relates to a kind of baking oven that is used for electrooptical device, and it is based on the non-interaction of baking oven heating system and conveying system.Especially, the roller of being made by quartz is by the friction campaign of a chain or belt, rather than independently moving.
Implement this patent, obtain the baking curve by the lamp heating, this can cause stability problem and consequent homogeneity question; And when roller motion is not when carrying out separately, conveying is heterogeneous.In addition, it is very expensive selecting to be used for the quartzy roller semiconductor heating, that can see through radiation.
Nowadays we find, are possible by using a kind of baking oven to overcome above-mentioned shortcoming, wherein, by the conveying of ceramic roller, carry semi-conducting material through described baking oven, and described ceramic roller is by one and belt drive unit and around self axis rotation.
Use highly purified ceramic material to produce roller and significantly reduced metallic pollution.In addition, be fixed on the appropriate location in the baking oven and when motion is carried in self axis rotation, do not have temperature transmission influence when the roller of carrying semi-conducting material by these rollers.In this way, even can obtain very steep temperature profile.
Given this, one object of the present invention relates to a kind of baking oven that is used to prepare the electrooptical device of being made by semi-conducting material, comprising:
(a) shell that limits by bending or flat sidewall, a top, a bottom and the wing passage that allows roller to insert;
(b) motor, described motor makes the roller motion same period by one with belt transmission;
(c) device that is used to keep the temperature constant in the shell (a);
(d) insulation system of shell (a);
(e) gas extraction system of the gas that forms in the bake process.
Shell preferably make by ceramic material and shell in roller spacing each other be such, that is, make in the process of roller rotation that semi-conducting material is stayed in these rollers three at least.
Being used for making the ceramic material of baking oven selects from the material that minimum chemical action takes place for the silicon dioxide of sintering, quartz and other and silicon.
The semi-conducting material that can be used for preparing electrooptical device is that the silicon chip of 100-500 micron is selected from thickness, perhaps thickness be from several microns to 100 microns thin layers of semiconductor material (film) selection.
The heating of baking oven can realize according to known method, for example by using the heating of resistance or infrared lamp.
The temperature of oven interior is usually in 100 ℃ to 1200 ℃ scope.
With reference to Fig. 1, provide the explanation of an exemplary embodiments of the present invention.This embodiment is a limiting the scope of the invention for exemplary never should being considered as.
Fig. 1 illustrates a kind of baking oven, and this baking oven is made up of the roller of arranging in order (1) of some, and roller (1) is made by the silicon dioxide of sintering, and all rollers are because motor (16) is done the motion same period by one (13) and belt drive unit (11).Cover (6) and top (5) thereof is also made by the silicon dioxide of sintering, and it is by a series of resistance (3) heating.Thereby keep steady state value by electronic installation control temperature.Baking oven is equipped with a framework (9), and framework surrounds the insulation system (2) of cover, and has the removal device (18) of a processing smog.
(1) roller
(2) insulation system
(3) resistance
(4) resistor cartridge
(5) cover top
(6) cover (muffle)
(7) ball bearing
(8) bearing pedestal
(9) framework
(10) bracing strut
(11) cross(ed) belt
(12) belt pulley
(13) axle
(14) pinion
(15) chain
(16) engine
(17) crown
(18) blast pipe
The characteristic that the device that uses baking oven of the present invention to make does not have metallic pollution and is possessed of good qualities makes them can be used for for example manufacturing of electrooptical device.
One embodiment is provided below, the function of apparatus of the present invention is described better.
Embodiment 1
Make a kind of baking oven to be used to spreading inferior phosphorus type impurity, this baking oven has a conveying system, and roller that conveying system is arranged in order by 300, that made by the silicon dioxide of sintering is formed.All rollers since motor (16) do by one and belt drive unit (13,11) to move the same period.The cover of being made by the silicon dioxide of sintering (6) heats by a series of resistance (3).
Thereby keep steady state value by electronic installation control temperature.When selected one 900 ℃ set point, the variations in temperature of observation is less than 0.5 ℃.
Silicon chip is put into above-mentioned baking oven, and wherein a kind of inferior phosphorus dopant deposits on this silicon chip.This process continues about 20 minutes.
Resulting like this silicon chip has been realized the good diffusion of inferior phosphorus impurities, thereby can be used to produce high-quality photocell.
Claims (7)
1. baking oven that is used for the electrooptical device made by semi-conducting material is characterized in that: the conveying of the semi-conducting material in the baking oven is to realize that by roller a series of, that made by a kind of ceramic material described roller is around the axis rotation of himself.
2. the baking oven that is used for electrooptical device as claimed in claim 1 is characterized in that, comprising:
(a) shell that limits by bending or flat sidewall, a top, a bottom and the wing passage that allows described roller to insert;
(b) motor, described motor makes the roller motion same period by one with belt drive unit;
(c) device that is used to keep the temperature constant in the described shell (a);
(d) insulation system of shell (a);
(e) gas extraction system of the gas that forms in the bake process.
3. baking oven as claimed in claim 2 is characterized in that: described shell (a) is a cover of being made up of ceramic material.
4. baking oven as claimed in claim 1 is characterized in that: described ceramic material is selected from the silicon dioxide of sintering, quartz and other and the material rare chemical action of silicon.
5. baking oven as claimed in claim 1 is characterized in that: described roller spacing each other is such, that is, make on semi-conducting material described in described roller rotatablely moves is stayed in these described rollers at least three.
6. baking oven as claimed in claim 1 is characterized in that: heat by resistance or infrared lamp.
7. baking oven as claimed in claim 1, it is characterized in that: the semi-conducting material that can be used for preparing electrooptical device is that the silicon chip of 100-500 micron is selected from thickness, perhaps from the thickness selection to 100 microns the thin layers of semiconductor material (film) that is several microns.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ITMI20012628 ITMI20012628A1 (en) | 2001-12-13 | 2001-12-13 | BAKING OVEN FOR PHOTOVOLTAIC DEVICES |
| ITMI01A002628 | 2001-12-13 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1602554A true CN1602554A (en) | 2005-03-30 |
| CN100356589C CN100356589C (en) | 2007-12-19 |
Family
ID=11448688
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB028246241A Expired - Fee Related CN100356589C (en) | 2001-12-13 | 2002-11-27 | Baking oven for photovoltaic devices |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP1454367A2 (en) |
| JP (1) | JP4511186B2 (en) |
| CN (1) | CN100356589C (en) |
| AU (1) | AU2002358050B2 (en) |
| IT (1) | ITMI20012628A1 (en) |
| WO (1) | WO2003054975A2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102272884A (en) * | 2008-12-03 | 2011-12-07 | Aci艾柯泰柯有限公司 | Hardening device for photovoltaic thin-film solar cells |
| WO2013071830A1 (en) * | 2011-11-16 | 2013-05-23 | Yang Guiling | Roller way type solar cell silicon wafer sintering furnace |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009019127A1 (en) * | 2009-04-29 | 2011-05-05 | Eisenmann Anlagenbau Gmbh & Co. Kg | Furnace for producing thin-film photovoltaic cells |
| DE102010016512A1 (en) | 2010-04-19 | 2011-10-20 | Roth & Rau Ag | Flow-through system e.g. diffusion furnace, for heat treatment of glass panes in glass industry, has planar glass substrates comprising transport layers arranged one above other in process chamber, where substrates are processed by chamber |
| DE102010016509A1 (en) | 2010-04-19 | 2011-10-20 | Roth & Rau Ag | Flowthrough system for processing substrate in atmosphere, has gas inlets and gas outlets arranged on line parallel to rollers, where one of gas outlets is fixed on channels at transport direction while other gas outlet is placed on chamber |
| DE202010013032U1 (en) * | 2010-12-01 | 2011-02-17 | Roth & Rau Ag | transport roller |
| DE202011110836U1 (en) | 2011-02-21 | 2016-09-02 | Ctf Solar Gmbh | Device for coating substrates |
| US8739728B2 (en) | 2011-04-07 | 2014-06-03 | Dynamic Micro Systems, Semiconductor Equipment Gmbh | Methods and apparatuses for roll-on coating |
| US8720370B2 (en) | 2011-04-07 | 2014-05-13 | Dynamic Micro System Semiconductor Equipment GmbH | Methods and apparatuses for roll-on coating |
| US8795785B2 (en) | 2011-04-07 | 2014-08-05 | Dynamic Micro System | Methods and apparatuses for roll-on coating |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2788957A (en) * | 1953-03-30 | 1957-04-16 | Drever Co | Refractory roller furnace conveyor system |
| US3867748A (en) * | 1974-03-07 | 1975-02-25 | Libbey Owens Ford Co | Supporting and driving frangible rollers |
| US4343395A (en) * | 1977-11-10 | 1982-08-10 | Holcroft & Co. | Roller hearth furnace |
| JPS6332295U (en) * | 1986-08-12 | 1988-03-02 | ||
| JPH0714353Y2 (en) * | 1988-07-08 | 1995-04-05 | 中外炉工業株式会社 | Roller hearth type heat treatment furnace |
| DE3826523A1 (en) * | 1988-08-04 | 1990-02-08 | Juergen Gerlach | HEAT TREATMENT DEVICE FOR CONTINUOUSLY MOVING MATERIAL |
| US5266027A (en) * | 1992-08-12 | 1993-11-30 | Ngk Insulators, Ltd. | Roller-hearth continuous furnace |
| JP2961295B2 (en) * | 1994-12-20 | 1999-10-12 | 光洋リンドバーグ株式会社 | Roller hearth furnace |
| JP3783366B2 (en) * | 1997-10-09 | 2006-06-07 | 松下電器産業株式会社 | Firing furnace |
| NL1010836C2 (en) * | 1998-12-17 | 2000-06-23 | O T B Engineering B V | Oven for manufacturing solar cells. |
| CN1107618C (en) * | 1999-09-03 | 2003-05-07 | 北新建材(集团)有限公司 | Automatic plate packing line |
-
2001
- 2001-12-13 IT ITMI20012628 patent/ITMI20012628A1/en unknown
-
2002
- 2002-11-27 CN CNB028246241A patent/CN100356589C/en not_active Expired - Fee Related
- 2002-11-27 JP JP2003555596A patent/JP4511186B2/en not_active Expired - Fee Related
- 2002-11-27 EP EP02791725A patent/EP1454367A2/en not_active Ceased
- 2002-11-27 WO PCT/EP2002/013372 patent/WO2003054975A2/en active Application Filing
- 2002-11-27 AU AU2002358050A patent/AU2002358050B2/en not_active Ceased
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102272884A (en) * | 2008-12-03 | 2011-12-07 | Aci艾柯泰柯有限公司 | Hardening device for photovoltaic thin-film solar cells |
| WO2013071830A1 (en) * | 2011-11-16 | 2013-05-23 | Yang Guiling | Roller way type solar cell silicon wafer sintering furnace |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005513406A (en) | 2005-05-12 |
| WO2003054975A3 (en) | 2004-01-08 |
| AU2002358050B2 (en) | 2007-10-11 |
| AU2002358050A1 (en) | 2003-07-09 |
| WO2003054975A2 (en) | 2003-07-03 |
| EP1454367A2 (en) | 2004-09-08 |
| ITMI20012628A1 (en) | 2003-06-13 |
| JP4511186B2 (en) | 2010-07-28 |
| CN100356589C (en) | 2007-12-19 |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20071219 Termination date: 20201127 |