CN1587436A - Magnetron sputtering coating clamp and using method thereof - Google Patents
Magnetron sputtering coating clamp and using method thereof Download PDFInfo
- Publication number
- CN1587436A CN1587436A CN 200410067264 CN200410067264A CN1587436A CN 1587436 A CN1587436 A CN 1587436A CN 200410067264 CN200410067264 CN 200410067264 CN 200410067264 A CN200410067264 A CN 200410067264A CN 1587436 A CN1587436 A CN 1587436A
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- Prior art keywords
- range
- union lever
- sample disc
- revolution
- rete
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- 238000000034 method Methods 0.000 title claims abstract description 39
- 238000000576 coating method Methods 0.000 title claims abstract description 27
- 239000011248 coating agent Substances 0.000 title claims abstract description 25
- 238000001755 magnetron sputter deposition Methods 0.000 title abstract description 9
- 238000004544 sputter deposition Methods 0.000 claims description 33
- 238000013459 approach Methods 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 13
- 238000012360 testing method Methods 0.000 claims description 13
- 238000009826 distribution Methods 0.000 claims description 9
- 238000010521 absorption reaction Methods 0.000 claims description 6
- 239000012528 membrane Substances 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 4
- 230000007547 defect Effects 0.000 claims description 3
- 230000002950 deficient Effects 0.000 claims description 3
- 238000000280 densification Methods 0.000 claims description 3
- 239000010408 film Substances 0.000 description 32
- 238000002360 preparation method Methods 0.000 description 6
- 239000002245 particle Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000011179 visual inspection Methods 0.000 description 2
- XINQFOMFQFGGCQ-UHFFFAOYSA-L (2-dodecoxy-2-oxoethyl)-[6-[(2-dodecoxy-2-oxoethyl)-dimethylazaniumyl]hexyl]-dimethylazanium;dichloride Chemical compound [Cl-].[Cl-].CCCCCCCCCCCCOC(=O)C[N+](C)(C)CCCCCC[N+](C)(C)CC(=O)OCCCCCCCCCCCC XINQFOMFQFGGCQ-UHFFFAOYSA-L 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000012916 structural analysis Methods 0.000 description 1
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- Physical Vapour Deposition (AREA)
Abstract
A magnetron sputtering coating clamp and a using method thereof are provided, the magnetron sputtering coating clamp comprises a revolution clamp, the revolution clamp is provided with a circular through hole, a connecting rod is provided with an external thread, the lower end of the connecting rod is connected with a sample plate, the upper end of the connecting rod passes through the circular through hole of the revolution clamp, and two nuts matched with the external thread of the connecting rod are used for fixing the connecting rod on the revolution clamp. The target distance can be continuously adjusted by utilizing the clamp, and the film prepared by magnetron sputtering according to the method can effectively control the structural orientation of the film layer and improve the uniformity of the film layer.
Description
Technical field
The present invention is relevant with film preparation, particularly a kind of magnetically controlled sputtering coating clamp and using method thereof.The present invention is applicable to the control of film microstructure orientation, also is applicable to the raising membrane uniformity.
Background technology
The range that existing magnetron sputtering coating method adopts, promptly the vertical range from target material surface to substrate surface is a fixed value; Even range has the leeway of adjustment, also just after adjusting, be fixed on some values and reuse.For example: in the conventional magnetic control sputtering system, range generally is fixed on the some numerical value between the 50mm-100mm.
In fact, because the target that uses on coating equipment often will constantly be distinguished replacing according to processing requirement, and along with the progress of sputter procedure and the consumption degree of target change, the spatial distribution of sputtering atmosphere is changing, therefore the fixed range is unfavorable for realizing high performance film, particularly is difficult to satisfy structural requirement (as the structural approach growth) and uniformity requirement.
For the particularly control of structural approach of structure of film, the R﹠D work personnel solve by the means that change the selection of deposition process parameters or material at present; On the other hand, the improvement of membrane uniformity also usually is confined to the correction to baffle plate, the optimization of sample clamp rotating speed and the aspects such as power control of sputtering source.
Under this range fixed situation, often because the limitation of existing method does not reach ideal structure and uniformity index.
Summary of the invention
The objective of the invention is in order to overcome above-mentioned the deficiencies in the prior art, for existing magnetron sputtering coating method provides a kind of magnetically controlled sputtering coating clamp and using method thereof, these anchor clamps can be adjusted range continuously, thereby can control the structural approach of rete effectively, or improve membrane uniformity significantly.
Technical solution of the present invention is as follows:
A kind of magnetically controlled sputtering coating clamp, comprise revolution anchor clamps, it is characterized in that these revolution anchor clamps are provided with a manhole, one union lever has outside screw, the lower end of this union lever connects a sample disc, the manhole of revolution anchor clamps is passed in the upper end of this union lever, has two nuts that match with the outside screw of union lever that union lever is fixed on the revolution anchor clamps again.
Utilize above-mentioned magnetically controlled sputtering coating clamp to improve the method for membrane structure orientation, comprise the following steps:
1. magnetically controlled sputtering coating clamp is installed, is adjusted two nuts sample disc lower surface to the vertical height of target upper surface is adjusted into the revolution anchor clamps to half of target vertical height;
2. be coated with film sample by typical process;
3. test the microtexture and the optical property of the rete that is coated with: loose as finding rete, compactness is poor, perhaps vacancy defect is more, perhaps the refractive index ratio ideal value is on the low side, and structural approach can not meet the demands, for the sputter energy cross low due to, regulate two nuts, union lever and sample disc are descended, promptly reduce range; As find the rete densification, even have the interstitial atom defective, perhaps absorption loss is big, and perhaps specific refractory power is higher, and structural approach can not meet the demands, then for the sputter energy too high due to, should regulate two nuts, union lever and sample disc are risen, promptly increase range, repeated for the 2. step then;
4. the structural approach when rete meets the demands, and illustrates that range is moderate;
5. load onto substrate to be plated in sample disc (3), carry out formal plated film.
Utilize above-mentioned magnetically controlled sputtering coating clamp to improve the method for uniformity of film, comprise the following steps:
1. magnetically controlled sputtering coating clamp is installed, is adjusted two nuts sample disc lower surface to the vertical height of target upper surface is adjusted into the revolution anchor clamps to half of target vertical height;
2. be coated with film sample by typical process;
3. test the thickness evenness of the rete that is coated with: as finding from revolution center along radius toward edge direction, thickness distribution is and increases progressively trend and distribute, be that the center is thin, the edge is thick, and homogeneity can not meet the demands, for range too small due to, then regulate two nuts, make union lever and sample disc) rise, promptly increase range; As finding the past edge direction from revolution center along radius, the thickness distribution trend that tapers off distributes, i.e. thick, the thin edge in center, and homogeneity can not meet the demands, for range excessive due to, should regulate two nuts union lever and sample disc are descended, promptly reduce range, repeated for the 2. step then;
4. when the homogeneity of rete meets the demands, illustrate that range is moderate;
5. load onto substrate to be plated in sample disc, carry out formal plated film.
Technique effect of the present invention:
Because use of the present invention, range is adjustable continuously, and according to concrete technology and index request, adopt relatively large range, avoid causing the structural approach or the homogeneity question of rete, obtain the film of special construction orientation or the rete of high uniformity owing to the reasons such as sputtering atmosphere variation that target is changed, processing condition change and target consumption causes.
Description of drawings
Fig. 1 is existing magnetically controlled sputtering coating clamp structural representation
Fig. 2 is a magnetically controlled sputtering coating clamp structural representation of the present invention
Among the figure: 1-target 2-revolution anchor clamps 21-manhole 3-sample disc 4-union lever 41,42-nut.
Embodiment
See also Fig. 2, Fig. 2 is a magnetically controlled sputtering coating clamp structural representation of the present invention, as seen from the figure, magnetically controlled sputtering coating clamp of the present invention, comprise revolution anchor clamps 2, it is characterized in that these revolution anchor clamps 2 are provided with a manhole 21, one union lever 4 has the outside screw (not shown), the lower end of this union lever 4 connects sample disc 3, the manhole 21 of revolution anchor clamps 2 is passed in the upper end of this union lever 4, has two nuts 41,42 that match with the outside screw of union lever 4 that union lever 4 is fixed on the revolution anchor clamps 2 again.
Utilize above-mentioned magnetically controlled sputtering coating clamp to improve the method for membrane structure orientation, it is characterized in that this method comprises the following steps:
1. magnetically controlled sputtering coating clamp is installed, is adjusted two nuts 41,42 sample disc 3 lower surfaces to the vertical height of target 1 upper surface is adjusted into revolution anchor clamps 2 to half of target 1 vertical height;
2. be coated with film sample by typical process;
3. test the microtexture and the optical property of the rete that is coated with: loose as finding rete, compactness is poor, perhaps vacancy defect is more, perhaps the refractive index ratio ideal value is on the low side, and structural approach can not meet the demands, for the sputter energy cross low due to, setting nut 41 and nut 42, union lever 4 and sample disc 3 are descended, promptly reduce range; As find the rete densification, even has an interstitial atom defective, perhaps absorption loss is big, perhaps specific refractory power is higher, and structural approach can not meet the demands, then for the sputter energy too high due to, answer setting nut 41 and nut 42, union lever 4 and sample disc 3 risen, promptly increase range, repeated for the 2. step then;
4. the structural approach when rete meets the demands, and illustrates that range is moderate;
5. load onto substrate to be plated in sample disc 3, carry out formal plated film.
Utilize above-mentioned magnetically controlled sputtering coating clamp to improve the method for uniformity of film, it is characterized in that this method comprises the following steps:
1. magnetically controlled sputtering coating clamp is installed, is adjusted two nuts 41,42 sample disc 3 lower surfaces to the vertical height of target 1 upper surface is adjusted into revolution anchor clamps 2 to half of target 1 vertical height;
2. be coated with film sample by typical process;
3. test the thickness evenness of the rete that is coated with: as finding from revolution center along radius toward edge direction, thickness distribution is and increases progressively trend and distribute, be that the center is thin, the edge is thick, and homogeneity can not meet the demands, for range too small due to, then setting nut 41 and nut 42 rise union lever 4 and sample disc 3, promptly increase range; As finding from revolution center along radius toward edge direction, the thickness distribution trend that tapers off distributes, it is thick, the thin edge in center, and homogeneity can not meet the demands, for range excessive due to, answer setting nut 41 and nut 42 that union lever 4 and sample disc 3 descended, promptly reduce range, repeated for the 2. step then;
4. the homogeneity when rete meets the demands, and illustrates that range is moderate;
5. load onto substrate to be plated in sample disc 3, carry out formal plated film.
The ZnO film of embodiment 1 preparation C axle height preferred orientation
In multiple Si (100), Si (111) substrates such as n type and p type, utilize magnetron sputtering technique, require to prepare the ZnO film of C axle height preferred orientation.The typical process condition: operating air pressure is 0.3Pa, and argon oxygen ratio is 1: 2, sputtering current 0.5A.
Implementation step is as follows:
Revolution anchor clamps 2 to target 1 upper surface distance be 200mm, and first half that range is adjusted into this distance is 100mm;
Prepare ZnO film by typical process, and test structure performance and optical property;
The film of finding preparation is opaque, and visual inspection is black, and the spectral absorption loss is too big, the preparation method who proposes by this patent think the sputtering particle energy excessive due to, increase range and to 120mm, continue by above-mentioned prepared film;
Visual inspection is transparent, but spectrum test finds to still have obvious absorption (glass is accompanied transmitance maximum value about 60% on the plating sheet), and structural analysis thinks and have more Zn interstitial atom, and the method that proposes by this patent is thought still need increase range;
Choose range 140mm, utilize above-mentioned technology refabrication and the test, during spectroscopic analysis on the substrate of glass transmitance maximum value reach more than 90%, illustrate that absorption loss is very little; Simultaneously with X-ray diffraction (XRD) testing film microtexture: find wide range scanning, all only show single (002) crystal face diffraction peak, illustrate that film is a C axle height preferred orientation at multiple suprabasil ZnO film from 3 °-90 ° (2 θ); Show that this range can prepare the ZnO film of C axle preferrel orientation.
The ZnS unitary film of embodiment 2 preparation high uniformity
Utilize magnetron sputtering technique, require the ZnS unitary film of preparation high uniformity.Typical process: operating air pressure: 0.5-1.5Pa, sputtering current 0.3A.Concrete implementation step is as follows:
Revolution anchor clamps 2 to target 1 upper surface distance be 200mm, and first half that range is adjusted into this distance is 100mm;
Prepare the ZnS film by typical process, and test analysis sample thickness homogeneity;
The test position thickness of finding close revolution center is thin, the edge is thicker, and homogeneity error can not meet the demands greater than ± 3%, and the method that provides by this patent should increase range;
Choose range 120mm, again by above-mentioned prepared film and test thickness evenness; Find homogeneity error approaching ± 1%, meet the demands substantially, but still be that the center thin edges is thick;
The method that provides by this patent continues to increase range slightly to 125mm; In Φ 130mm diameter range, obtain best uniformity index 0.3% (being that thickness error is less than ± 0.3%).
The experiment proved that advantage of the present invention is as follows:
1, range is adjustable continuously, can carry out the sputter preparation of multiclass high performance thin film, as short-wave long light-emitting material film, magnetic recording thin film, diamond like carbon film or the like;
2, except that CONTROL PROCESS condition (as sputtering power, vacuum pressure), increased a kind of simple and easy to do, scientific and effective means, promptly pass through the effective control of the continuous adjustment realization of range to rete microtexture, particularly structural approach; What this method directly changed is that sputtering particle arrives the energy of substrate surface from target material surface, thereby can control the film process of sputtering particle at substrate surface, comprises its thermodynamic process and chemical reaction process;
3, the adjusting by range has changed the spatial distribution of sputtering particle atmosphere when arriving substrate, has realized inhomogeneity continuous controllable;
4, since the present invention general adopt bigger range (＞100mm), the spatial distribution of the sputtering particle when the arriving substrate surface existing situation more less than range is more even; And can add the function of sample rotation easily, the homogeneity of rete can improve greatly with respect to the equipment of existing fixed target distance;
5, not only effective for magnetron sputtering, the film of structural performance or homogeneity improve to(for) other physical vapor deposition or process for chemical vapor deposition of materials with via also have reference value.
Claims (3)
1, a kind of magnetically controlled sputtering coating clamp, comprise revolution anchor clamps (2), it is characterized in that these revolution anchor clamps (2) are provided with a manhole (21), one union lever (4) has outside screw, the lower end of this union lever (4) connects sample disc (3), the manhole (21) of revolution anchor clamps (2) is passed in the upper end of this union lever (4), has two nuts (41,42) that match with the outside screw of union lever (4) that union lever (4) is fixed on the revolution anchor clamps (2) again.
2, utilize the described magnetically controlled sputtering coating clamp of claim 1 to improve the method for membrane structure orientation, it is characterized in that this method comprises the following steps:
1. magnetically controlled sputtering coating clamp is installed, is adjusted two nuts (41,42) sample disc (3) lower surface to the vertical height of target (1) upper surface is adjusted into revolution anchor clamps (2) to half of target (1) vertical height;
2. be coated with film sample by typical process;
3. test the microtexture and the optical property of the rete that is coated with: loose as finding rete, compactness is poor, perhaps vacancy defect is more, perhaps the refractive index ratio ideal value is on the low side, and structural approach can not meet the demands, for the sputter energy cross low due to, setting nut (41) and nut (42), union lever (4) and sample disc (3) are descended, promptly reduce range; As find the rete densification, even has an interstitial atom defective, perhaps absorption loss is big, perhaps specific refractory power is higher, and structural approach can not meet the demands, then for the sputter energy too high due to, answer setting nut (41) and nut (42), union lever (4) and sample disc (3) are risen, promptly increase range, repeated for the 2. step then;
4. the structural approach when rete meets the demands, and illustrates that range is moderate;
5. load onto substrate to be plated in sample disc (3), carry out formal plated film.
3, utilize the described magnetically controlled sputtering coating clamp of claim 1 to improve the method for uniformity of film, it is characterized in that this method comprises the following steps:
1. magnetically controlled sputtering coating clamp is installed, is adjusted two nuts (41,42) sample disc (3) lower surface to the vertical height of target (1) upper surface is adjusted into revolution anchor clamps (2) to half of target (1) vertical height;
2. be coated with film sample by typical process;
3. test the thickness evenness of the rete that is coated with: as finding from revolution center along radius toward edge direction, thickness distribution is and increases progressively trend and distribute, be that the center is thin, the edge is thick, and homogeneity can not meet the demands, for range too small due to, then setting nut (41) and nut (42) rise union lever (4) and sample disc (3), promptly increase range; As finding from revolution center along radius toward edge direction, the thickness distribution trend that tapers off distributes, it is thick, the thin edge in center, and homogeneity can not meet the demands, for range excessive due to, answer setting nut (41) and nut (42) that union lever (4) and sample disc (3) are descended, promptly reduce range, repeated for the 2. step then;
4. the homogeneity when rete meets the demands, and illustrates that range is moderate;
5. load onto substrate to be plated in sample disc (3), carry out formal plated film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200410067264 CN1279209C (en) | 2004-10-19 | 2004-10-19 | Magnetron sputtering coating clamp and using method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200410067264 CN1279209C (en) | 2004-10-19 | 2004-10-19 | Magnetron sputtering coating clamp and using method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1587436A true CN1587436A (en) | 2005-03-02 |
| CN1279209C CN1279209C (en) | 2006-10-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200410067264 Expired - Fee Related CN1279209C (en) | 2004-10-19 | 2004-10-19 | Magnetron sputtering coating clamp and using method thereof |
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| Country | Link |
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| CN (1) | CN1279209C (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011091651A1 (en) * | 2010-01-29 | 2011-08-04 | 东莞宏威数码机械有限公司 | Precision positioning sputtering apparatus and positioning method thereof |
| CN110144563A (en) * | 2019-06-27 | 2019-08-20 | 浙江工业大学 | A kind of automatic lifting target platform suitable for magnetic control sputtering device |
| CN110747442A (en) * | 2019-09-10 | 2020-02-04 | 天津大学 | Rotating device for coating film on outer surface of hollow cylindrical plated part |
| CN112030128A (en) * | 2020-08-21 | 2020-12-04 | 中国科学院西安光学精密机械研究所 | A coating anchor clamps for Sagnac type interferometer subassembly |
-
2004
- 2004-10-19 CN CN 200410067264 patent/CN1279209C/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011091651A1 (en) * | 2010-01-29 | 2011-08-04 | 东莞宏威数码机械有限公司 | Precision positioning sputtering apparatus and positioning method thereof |
| CN110144563A (en) * | 2019-06-27 | 2019-08-20 | 浙江工业大学 | A kind of automatic lifting target platform suitable for magnetic control sputtering device |
| CN110747442A (en) * | 2019-09-10 | 2020-02-04 | 天津大学 | Rotating device for coating film on outer surface of hollow cylindrical plated part |
| CN112030128A (en) * | 2020-08-21 | 2020-12-04 | 中国科学院西安光学精密机械研究所 | A coating anchor clamps for Sagnac type interferometer subassembly |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1279209C (en) | 2006-10-11 |
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Assignee: Weidali Industry (Shenzhen) Co. Ltd. Assignor: Shanghai Optical Precision Machinery Inst., Chinese Academy of Sciences Contract record no.: 2010440020153 Denomination of invention: Magnetically controlled sputtering coating clamp and its using method Granted publication date: 20061011 License type: Exclusive License Open date: 20050302 Record date: 20100902 |
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| CF01 | Termination of patent right due to non-payment of annual fee | ||
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Granted publication date: 20061011 Termination date: 20161019 |