CN1584496A - Platform and planeness measuring method - Google Patents
Platform and planeness measuring method Download PDFInfo
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- CN1584496A CN1584496A CNA2004100207427A CN200410020742A CN1584496A CN 1584496 A CN1584496 A CN 1584496A CN A2004100207427 A CNA2004100207427 A CN A2004100207427A CN 200410020742 A CN200410020742 A CN 200410020742A CN 1584496 A CN1584496 A CN 1584496A
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Abstract
A method for measuring planeness of large scale platform includes setting plane scanner on measured platform, placing three targets around micrometering collimation telescopic in parallel to connection line of stand bar, setting up reference face by adjusting stand bar height, adjusting micrometer drum wheel repeatedly to have telescope '+' line central with three targets accurately, placing target four at measured position and using optical micrometer to read out deviation of the position to the reference face.
Description
(1) technical field
The present invention relates to the measuring method of flatness, particularly use the measuring method of optics apparatus measures macrotype platform flatness.
(2) background technology
Platform is that work piece is rule by pattern size, centering or the reference field that is welded when also being the assembling of complete machine, parts, especially during modernized boats and ships are made this reference field set up extremely important, platform directly influences work piece, assembly precision and dress weldering quality, the high quality welding structural member is by the parts flatness ± 0.25mm of technological requirement dress postwelding, as the platform plane degree ± 0.15mm of reference field.
In the past, water bowl linker planometry is adopted in the detection of this type of platform plane degree, because air is difficult for emptying in the water bowl, error directly perceived just can reach 2-3mm, because operant level does not wait, and the precision of detection also respectively has difference, human factor can't overcome the influence of measuring accuracy again, above measuring method and high-quality shipbuilding require to differ greatly, and the measuring method of therefore being badly in need of a kind of advanced person replaces.
(3) summary of the invention
The technical problem to be solved in the present invention provides the method for the optical measurement flatness of a kind of suitable factory macrotype platform.
The technical scheme that adopts is:
The present invention measures according to optical principle, realizes by sweep optical square and following measuring method.
Sweep optical square is to be provided with micr-alignment telescope, replicated optics right angle head, optical micrometer and target successively along set light path.Replicated optics right angle head can make micr-alignment telescope optics sight line turnover 90 ° ± 1 " through optical micrometer to target, to scan reference field.But above-mentioned sweep optical square is provided with a sweep optical square erecting frame that has three legs of ABC of leveling, micr-alignment telescope is installed in the tube of sweep optical square erecting frame top, form an optical head by replicated optics right angle head and optical micrometer, optical head is installed on the bearing of sweep optical square erecting frame bottom can do 360 ° of rotations, optical micrometer can make micrometer sheet glass rotate around the central axis of self, thereby can carry out the measurement of micro-displacement, in order to read the deviation of measured point target to basic line of sight.Sweep optical square is provided with four identical targets, and the object tape of the different step striped of width is arranged on the target pattern, selects width of fringe according to measuring distance, and the target striped all is parallel to the target base, and highly identical.
Platform plane degree measuring method comprises the following steps:
1, sweep optical square is erected on the measured platform, target I, target II, target III place around micr-alignment telescope, and target I and target III are parallel to the line of leg AC, target II is parallel to the line of leg BC, optical head is turned to target I, and micr-alignment telescope accommodated on the target I, then by adjusting the adjustment screw of leg B, make the micr-alignment telescope cross curve I that tentatively aims at the mark go up the candy strip of object tape.
2, optical head is turned to target III, and check whether target III quite approaches the cross curve of micr-alignment telescope, if differ far away, then the microdrum of rotational plane scanner makes target III approach the cross curve of micr-alignment telescope.Repeat the 1st adjustment then to target I.
3, optical head is turned to target II, micr-alignment telescope is accommodated on the target II,, make micr-alignment telescope cross curve and target II centering by adjusting the adjustment screw of leg A.
4, rotate optical head, run-home I again, the adjustment screw of accurate adjustment leg B then makes the object tape and the micr-alignment telescope cross curve centering of selected width.
5, again optical head is turned to target III, micr-alignment telescope is accommodated on the target III, then the microdrum of rotational plane scanner.Make the cross curve centering of the object tape and the micr-alignment telescope of selected width, draw the current variable quantity of optical micrometer, then microdrum is recalled to half of its scale value that turns over again, readjust the adjustment screw of leg B at last, make target III accurately with the cross curve centering of micr-alignment telescope, it is to be noted especially here and before rotating microdrum, should note the original reading of optical micrometer.
6, run-home I and III repeatedly adjust the microdrum of sweep optical square and the adjustment screw of leg B, up to two targets all with the accurate centering of the cross curve of micr-alignment telescope till.Lock the adjustment screw of leg B then.
7, aim at and focus on target II, make cross curve and the accurate centering of target II of micr-alignment telescope, and lock the adjustment screw of leg A by the adjustment screw of adjusting leg A.
8, three targets are observed in aiming again, check the three whether all with the cross curve centering of micr-alignment telescope, if equal centerings, then also just foundation is well for reference field.
9, after reference field is set up, just can carry out the measurement of platform plane degree, be placed on target IV on the position that will measure this moment, reads the deviation of this position to reference plane with the optical micrometer of sweep optical square then.
10, set by step 9 on the position that needs are measured pointwise measure, the flatness of platform just can be measured like this, and survey is labeled on the measuring point distribution plan the deviation data of reference field, by finding out maximum deflection difference value and minimum deviation value on the distribution plan, draw flatness as calculated, that is:
Δ=maximum deflection difference value-minimum deviation value.
Above-mentioned object tape is a step striped that width is different, the step width of fringe is followed successively by 3.05mm, 1.25mm, 0.64mm, 0.31mm, 0.13mm, 0.05mm, select different in width for use according to the measuring distance distance, when measuring distance selects for use 3.05mm wide during greater than 30m, when measuring distance selects for use 0.05mm wide during less than 5m.
The meter full scale of above-mentioned optical micrometer is ± 1.4mm that when exceeding the optical micrometer measurement range when measuring, the step striped known width size on the available targets band compares measurement.
Above-mentioned target pattern subscript is marked with perpendicular to the arrow 10 from parameter, is convenient to differentiate the deviation of surveying and is higher or lower than reference field, prevents from measurement result is made explanation of error.
The magnetic pin is housed in the base of above-mentioned target, prevents that string is moving in the measuring process.
The present invention is fit to the measurement of planeness of the macrotype platform of factory, highly versatile, and measuring speed is fast, and the measuring accuracy height helps the raising of product quality.
(4) description of drawings
Fig. 1 is the arrangenent diagram of sweep optical square and target.
Fig. 2 is the sweep optical square instrumentation plan.
Fig. 3 is a sweep optical square light path synoptic diagram.
Fig. 4 is platform plane degree measured data figure.
(5) embodiment
The platform plane degree is measured, with sweep optical square and target such as Fig. 1 and Fig. 2 layout, sweep optical square erecting frame 1 be erected at survey on 16 * 6 meters the platform 6, sweep optical square erecting frame 1 is supported by three legs of ABC, wherein A and B leg are that height is adjustable, adjustable support leg is positioned on the both direction of square position, and three legs are placed on respectively on three magnetic cushion blocks 7.Micr-alignment telescope 2 inserts in the sweep optical square erecting frame 1 top tube, optical head 5 is installed on the bearing of sweep optical square erecting frame 1 bottom, can do 360 ° of rotations, reinstalling in the optical head 5 changes optics right angle head 3 and optical micrometer 4, adjust the repeatability of optical rack axis of rotation and micr-alignment telescope optics sight line, adjust the back in measuring process, micr-alignment telescope 2 in sweep optical square erecting frame 1 the position and the microdrum of micr-alignment telescope 2 no longer change.Target I, target II, target III place around micr-alignment telescope 2, and the candy strip of target I and target III is parallel to the line of leg AC, the candy strip of target II is parallel to the line of leg BC, after sweep optical square and target arrange, follows these steps to measure:
1, optical head 5 is turned to target I, and micr-alignment telescope 2 is accommodated on the target I, then by adjusting the adjustment screw of leg B, the width that micr-alignment telescope 2 cross curve are tentatively aimed at the mark on the I is on object tape 9 patterns of 0.64mm.
2, optical head 5 is turned to target III, and check whether target III quite approaches the cross curve of micr-alignment telescope 2, if differ far away, then the microdrum 8 of rotational plane scanner makes target III approach the cross curve of micr-alignment telescope 2.Repeat the 1st adjustment then to target I.
3, optical head 5 is turned to target II, micr-alignment telescope 2 is accommodated on the target II,, make micr-alignment telescope 2 cross curve and target II centering by adjusting the adjustment screw of leg A.
4, rotate optical head 5, run-home I again, the adjustment screw of accurate adjustment leg B then makes the object tape 9 and micr-alignment telescope 2 cross curve centerings of selected 0.64mm width.
5, again optical head is turned to target III, micr-alignment telescope 2 is accommodated on the target III, then the microdrum 8 of rotational plane scanner.Make the cross curve centering of object tape 9 with the micr-alignment telescope 2 of selected 0.64mm width, draw optical micrometer 4 current variable quantities, then microdrum 8 is recalled to half of its scale value that turns over again, readjust the adjustment screw of leg B at last, make target III accurately with the cross curve centering of micr-alignment telescope, it is to be noted especially here and before rotating microdrum 8, should note optical micrometer 4 original readings.
6, run-home I and III repeatedly adjust the micrometer runner 8 of sweep optical square and the adjustment screw of leg B, up to two targets all with the accurate centering of the cross curve of micr-alignment telescope 2 till.Lock the adjustment screw of leg B then.
7, aim at and focus on target II, make cross curve and the accurate centering of target II of micr-alignment telescope 2, and lock the adjustment screw of leg A by the adjustment screw of adjusting leg A.
8, three targets are observed in aiming again, check the three whether all with the cross curve centering of micr-alignment telescope 2, if equal centerings, then also just foundation is well for reference field.
9, after reference field is set up, just can carry out the measurement of platform plane degree, be placed on target IV on the position that will measure this moment, reads the deviation of this position to reference plane with the optical micrometer 4 of sweep optical square then.
10, set by step 9 on the position that needs are measured pointwise measure, the flatness of platform 6 just can be measured like this, and survey is labeled in measuring point distribution plan (see figure 4) to the deviation data of reference field, by finding out maximum deflection difference value and minimum deviation value on the distribution plan, draw flatness as calculated, that is:
Δ=maximum deflection difference value-minimum deviation value.
Δ＝0.14-(-0.14)＝0.28mm
Claims (5)
1, platform plane degree measuring method, its feature comprises the following steps:
A, sweep optical square is erected on the measured platform (6), target I, target II, target III place around micr-alignment telescope (2), and target I and target III are parallel to the line of leg AC, target II is parallel to the line of leg BC, optical head (5) is turned to target I, and micr-alignment telescope (2) accommodated on the target I, then by adjusting the adjustment screw of leg B, make micr-alignment telescope (2) the cross curve I that tentatively aims at the mark go up the candy strip of object tape (9);
B, optical head (5) is turned to target III, and check whether target III quite approaches the cross curve of micr-alignment telescope (2), if differ far away, the microdrum of rotational plane scanner (8) then, make target III approach the cross curve of micr-alignment telescope (2), and then optical head (5) turned to target I, repeat the described adjustment of A step to target I;
C, optical head (5) is turned to target II, micr-alignment telescope (2) is accommodated on the target II,, make micr-alignment telescope (2) cross curve and target II centering by adjusting the adjustment screw of leg A;
D, rotate optical head (5), run-home I again, the adjustment screw of accurate adjustment leg B then makes the object tape (9) and micr-alignment telescope (2) cross curve centering of selected width;
E, again optical head (5) is turned to target III, micr-alignment telescope (2) is accommodated on the target III, the microdrum of rotational plane scanner (8) then, make the cross curve centering of object tape (9) Yu the micr-alignment telescope (2) of selected width, draw the current variable quantity of optical micrometer (4), then microdrum (8) is recalled to half of its scale value that turns over again, readjust the adjustment screw of leg B at last, make target III accurately with the cross curve centering of micr-alignment telescope;
F, run-home I and III repeatedly adjust the micrometer runner (8) of sweep optical square and the adjustment screw of leg B, up to two targets all with the accurate centering of cross curve of micr-alignment telescope (2) till.Lock the adjustment screw of B leg then;
G, aiming are also focused on target II, make the cross curve and the accurate centering of target II of micr-alignment telescope (2) by the adjustment screw of adjusting leg A, and lock the adjustment screw of leg A;
H, three targets are observed in aiming again, check the three whether all with the cross curve centering of micr-alignment telescope (2), if equal centering has then been finished the foundation of reference field.
I, after reference field is set up, just can carry out the measurement of platform plane degree, at this moment target IV is placed on the position that will measure, use the optical micrometer (4) of sweep optical square to read the deviation of this position then to reference field;
J, I pointwise on the position that needs are measured is measured set by step, the flatness of platform (6) just can be measured like this, and survey is labeled on the measuring point distribution plan the deviation data of reference field, by finding out maximum deflection difference value and minimum deviation value on the distribution plan, draw flatness as calculated, that is:
Δ=maximum deflection difference value-minimum deviation value.
2, platform plane degree measuring method according to claim 1, it is characterized in that described target I, target II, target III, target IV structure is all identical, four targets are provided with same described object tape (9), object tape (9) is a step striped that width is different, the step striped is parallel to the target base, has same height, its step width of fringe is followed successively by 3.05mm, 1.25mm, 0.64mm, 0.31mm, 0.13mm, 0.05mm, select different in width for use according to the measuring distance distance, when measuring distance selects for use 3.05mm wide during greater than 30m, when measuring distance selects for use 0.05mm wide during less than 5m.
3, platform plane degree measuring method according to claim 1, the meter full scale that it is characterized in that described optical micrometer (4) is ± 1.4mm, when exceeding optical micrometer (4) measurement range when measuring, the step striped known width size on the available targets band (9) compares measurement.
4, platform plane degree measuring method according to claim 1 is characterized in that described target pattern subscript is marked with arrow (10), is convenient to differentiate the deviation of surveying and is higher or lower than reference field, prevents from measurement result is made explanation of error.
5, platform plane degree measuring method according to claim 1 is characterized in that in the base of described target the magnetic pin being housed, and prevents that string is moving in the measuring process.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100207427A CN1285884C (en) | 2004-06-14 | 2004-06-14 | Platform and planeness measuring method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100207427A CN1285884C (en) | 2004-06-14 | 2004-06-14 | Platform and planeness measuring method |
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| Publication Number | Publication Date |
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| CN1584496A true CN1584496A (en) | 2005-02-23 |
| CN1285884C CN1285884C (en) | 2006-11-22 |
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| Application Number | Title | Priority Date | Filing Date |
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| CNB2004100207427A Expired - Fee Related CN1285884C (en) | 2004-06-14 | 2004-06-14 | Platform and planeness measuring method |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102607383A (en) * | 2011-12-15 | 2012-07-25 | 上海卫星工程研究所 | High-precision flatness measurement bridge plate device |
| CN101648655B (en) * | 2009-07-20 | 2012-12-05 | 上海振华重工集团（南通）有限公司 | Manufacturing method of inner arm support of ship loader |
| CN103307999A (en) * | 2013-06-14 | 2013-09-18 | 河海大学 | Three-dimensional laser scanning control rack and field operation scanning and point cloud registration method for same |
| CN104713476A (en) * | 2013-12-13 | 2015-06-17 | 华为终端有限公司 | Coplanarity testing method and device |
| CN108225191A (en) * | 2017-12-29 | 2018-06-29 | 中车石家庄车辆有限公司 | Cross-braced device measures control method and device |
| CN109870132A (en) * | 2017-12-04 | 2019-06-11 | 深圳市盛世智能装备有限公司 | It is a kind of for the measurement of planeness when altimetric compensation method |
| CN117249784A (en) * | 2023-11-17 | 2023-12-19 | 成都万唐科技有限责任公司 | Workpiece surface smoothness and flatness detection device |
-
2004
- 2004-06-14 CN CNB2004100207427A patent/CN1285884C/en not_active Expired - Fee Related
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101648655B (en) * | 2009-07-20 | 2012-12-05 | 上海振华重工集团（南通）有限公司 | Manufacturing method of inner arm support of ship loader |
| CN102607383A (en) * | 2011-12-15 | 2012-07-25 | 上海卫星工程研究所 | High-precision flatness measurement bridge plate device |
| CN102607383B (en) * | 2011-12-15 | 2014-06-25 | 上海卫星装备研究所 | High-precision flatness measurement bridge plate device |
| CN103307999A (en) * | 2013-06-14 | 2013-09-18 | 河海大学 | Three-dimensional laser scanning control rack and field operation scanning and point cloud registration method for same |
| CN103307999B (en) * | 2013-06-14 | 2016-01-13 | 河海大学 | A kind of 3 D laser scanning control cage and field operation thereof scan and point cloud registration method |
| CN104713476A (en) * | 2013-12-13 | 2015-06-17 | 华为终端有限公司 | Coplanarity testing method and device |
| CN109870132A (en) * | 2017-12-04 | 2019-06-11 | 深圳市盛世智能装备有限公司 | It is a kind of for the measurement of planeness when altimetric compensation method |
| CN108225191A (en) * | 2017-12-29 | 2018-06-29 | 中车石家庄车辆有限公司 | Cross-braced device measures control method and device |
| CN117249784A (en) * | 2023-11-17 | 2023-12-19 | 成都万唐科技有限责任公司 | Workpiece surface smoothness and flatness detection device |
| CN117249784B (en) * | 2023-11-17 | 2024-01-26 | 成都万唐科技有限责任公司 | Workpiece surface smoothness and flatness detection device |
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| Publication number | Publication date |
|---|---|
| CN1285884C (en) | 2006-11-22 |
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| C14 | Grant of patent or utility model | ||
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Owner name: BOHAI SHIPYARD GROUP CO., LTD. Free format text: FORMER OWNER: BOHAI SHIP HEAVY INDUSTRY CO LTD. Effective date: 20100830 |
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Effective date of registration: 20100830 Address after: 125000 Huludao City, Liaoning province Longgang District Jinhu Road No. 132 Patentee after: Bohai Shipyard Group Co., Ltd. Address before: 125000 Huludao City, Liaoning province Longgang District Jinhu Road No. 132 Patentee before: Bohai Ship Heavy Industry Co., Ltd. |
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