CN1536376A - Production method of colour filter - Google Patents
Production method of colour filter Download PDFInfo
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- CN1536376A CN1536376A CNA031103162A CN03110316A CN1536376A CN 1536376 A CN1536376 A CN 1536376A CN A031103162 A CNA031103162 A CN A031103162A CN 03110316 A CN03110316 A CN 03110316A CN 1536376 A CN1536376 A CN 1536376A
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Abstract
The invention provides a color filter sheet making method, placing a cover and a plated basal plate in vacuum film plating machine, where the cover is between the plated basal plate and target material and screen the part of not to be plated, plating the film on the naked part, when completing a film plating procedure, able to move the cover to the next positioning point to expose another part to be plated with film, and executing another film plating procedure.
Description
Technical field
The present invention relates to a kind of method for making of optical filtering, relate in particular to a kind of colorized optical filtering mirror method for making.
Background technology
The production method of colored filter is exactly the mode with lithographic process except with the glue bond at present, and versicolor optical filter is produced on the same substrate.
When using lithographic process to make to have as shown in Figure 1 the optical filter of blueness (B), green (G) and redness (R), its method for making is as described below, at first shown in Fig. 2 A, mode with rotary coating is coated first photoresistance 201 on the substrate 200 of colored filter, then carry out lithographic process, shown in Fig. 2 B, on substrate 200, expose desire and make blue color filter zone 203, shown in Fig. 2 C blue dielectric film 202 is plated on the substrate for another example, and removes first photoresist layer 201.
When carrying out the green color filter making, at first as shown in Figure 3A, mode with rotary coating is coated second photoresistance 301 on the substrate 200 and blue dielectric film 202 of colored filter, then carry out lithographic process, shown in Fig. 3 B, on substrate 200, expose desire and make green color filter zone 303, shown in Fig. 3 C green dielectric film 302 is plated on the substrate for another example, and removes second photoresist layer 301.
When carrying out the Red lightscreening plate making, at first shown in Fig. 4 A, mode with rotary coating is coated the 3rd photoresistance 401 on substrate 200, blue dielectric film 202 and the green dielectric film 302 of colored filter, then carry out lithographic process, shown in Fig. 4 B, on substrate 200, expose desire and make Red lightscreening plate zone 403, shown in Fig. 4 C red dielectric film 402 is plated on the substrate for another example, and remove the 3rd photoresist layer 401, promptly finish the optical filter of tool blueness, green and red three-primary colours and make.
The above-mentioned traditional color filter practice has following shortcoming, at first in manufacturing process, after plated film is finished each time, needs substrate is taken out in vacuum coating equipment, after photoresistance is removed, is returned in the vacuum coating equipment again, continues next plated film flow process.Yet, after substrate takes out in vacuum coating equipment, may be polluted, and pollute as if directly continuing next plated film flow process, pollutant can being brought in the vacuum tightness film machine by dust fall.On the other hand, above-mentioned making flow process need repeat to vacuumize, step such as vacuum breaker, intensification and cooling, can increase the processing procedure time, and lithographic process the alignment error that may form also can not be ignored.
Summary of the invention
Therefore, at above-mentioned shortcoming, fundamental purpose of the present invention is to propose a kind of colored filter method for making, and it need not use photoresistance, does not therefore need substrate is taken out in vacuum coating equipment, so that photoresistance is removed, can avoid dust fall to pollute.
Another object of the present invention is to provide a kind of colored filter method for making, transportable single shade replaces the required photoresistance of lithographic process, thus can eliminate lithographic process the alignment error that may form.
Another purpose of the present invention is to provide a kind of colored filter method for making, do not need because of repeat to vacuumize, steps such as vacuum breaker, intensification and cooling, and increase the processing procedure time.
According to colored filter method for making of the present invention, with shade with being placed vacuum coating equipment by plated substrate, and shade is between by plated substrate and target, and the part that substrate is not desired to be plated to blocked, and the rete of desire plating is plated on exposed part, after finishing a plated film program, removable shade is to next anchor point, expose another and need the plated film part, and carry out another plated film program.
A kind of method for manufacturing colored filtering substrate provided by the invention, this colored filter comprise a substrate and a plurality of film at least, and this method comprises the following step at least:
(a) place this substrate and a shade in a vacuum coating equipment, wherein this shade exposes this substrate portion surface;
(b) use this shade to be the cover curtain, at this exposed substrate surface plating one thin layer;
(c) moving this shade makes this exposure of substrates go out the part surface of this desire plating thin layer; And
Repeat (b) to (c) step to having plated this colored filter multilayer film.
Described method for manufacturing colored filtering substrate, wherein this shade can Silicon Wafer as material.
Described method for manufacturing colored filtering substrate, but this shade clockwise rotation wherein moved.
Described method for manufacturing colored filtering substrate, but this shade inverse clock rotation wherein moved
Described manufacturing method of color filters is wherein plated the method that this thin layer can use sputter in this exposed substrate surface.
Described manufacturing method of color filters is wherein plated the method that this thin layer can use evaporation in this exposed substrate surface
Described manufacturing method of color filters, wherein this thin layer can be the logical or band of band and ends the optical lightscreening film.
Described manufacturing method of color filters, wherein this thin layer can be high pass or plate of low-pass optical light filter film.
Described manufacturing method of color filters, wherein this thin layer can be the antireflective optical anti-reflection film.
Described manufacturing method of color filters, wherein this shade cause this thin layer on this substrate by the peak width that shadow effect caused of this shade less than 0.3 millimeter.
Described manufacturing method of color filters, wherein this shade has openwork part and places on this substrate surface, and exposing this substrate portion surface, and the shape of this openwork part is relevant with the shape of optical filter.
By method of the present invention, can avoid tradition after plated film is finished each time, need substrate is taken out in vacuum coating equipment, the dust fall that may cause pollute, simultaneously method of the present invention need not repeat to vacuumize, steps such as vacuum breaker, intensification and cooling, therefore can shorten the processing procedure time, and not involve lithographic process, the situation that does not therefore have alignment error takes place.
Brief Description Of Drawings
Below in conjunction with accompanying drawing,, will make technical scheme of the present invention and beneficial effect apparent by detailed description to preferred embodiment of the present invention.
In the accompanying drawing,
Fig. 1 is the optical filter of tool blueness (B), green (G) and red (R);
Fig. 2 A to Fig. 2 C is depicted as the skeleton diagram that utilizes lithographic process to form blue color filter traditionally;
Fig. 3 A to Fig. 3 C is depicted as the skeleton diagram that utilizes lithographic process to form green color filter traditionally;
Fig. 4 A to Fig. 4 C is depicted as the skeleton diagram that utilizes lithographic process to form Red lightscreening plate traditionally;
Fig. 5 A is depicted as crucible, target, substrate and the shade summary installation drawing of coating machine used in the present invention;
Fig. 5 B is depicted as the part enlarged drawing between shade and colored filter substrate, and w is the width of the shadow effect that shade produced;
Fig. 6 A to Fig. 6 C is depicted as the The Outline Design figure of the present invention's first shade that preferred embodiment is used;
Fig. 6 D is depicted as the colored filter of the formed tool blueness of the present invention's first preferred embodiment (B), green (G) and red (R);
Fig. 7 A to Fig. 7 C is depicted as the The Outline Design figure of the present invention's second shade that preferred embodiment is used;
Fig. 7 D is depicted as the colored filter of the formed tool blueness of the present invention's second preferred embodiment (B), green (G) and red (R).
Embodiment
Do not limiting under spirit of the present invention and the range of application, below promptly with an embodiment, introduce enforcement of the present invention; Be familiar with the technician in this field, after understanding spirit of the present invention, when using colored filter method for making of the present invention in various optical filter is made.By method of the present invention, can avoid after plated film is finished each time, need substrate is taken out in vacuum coating equipment, the dust fall that may cause pollute, and avoid repeating to vacuumize, step such as vacuum breaker, intensification and cooling, therefore can reduce the processing procedure time, and not involve lithographic process, the situation that does not therefore have alignment error takes place.Application of the present invention is when the preferred embodiment that is not limited only to the following stated.
See also shown in Fig. 5 A, summary installation drawing for crucible, target, substrate and the shade of coating machine used in the present invention, the present invention replaces photoresistance with shade 501, shade 501 is put into vacuum coating equipment with colored filter substrate 500, wherein shade 501 is positioned at by 503 of plated substrate 500 and targets, and crucible 502 is in order to carrying target 503, and film 504 is the dielectric film that is plated, and wherein dielectric film can use the method for sputter or evaporation to form.
See also shown in Fig. 5 B, part enlarged drawing for 500 of shade 501 and colored filter substrates, wherein 500 of shade 501 and colored filter substrates are separated by one apart from a, because this can cause film 504 to successively decrease at the film thickness of a certain peak width in edge zone of close shade 501 apart from a, this effect is called the shade shadow effect, the specification that its optical effect also can off-design because the film thickness of this peak width diminishes, so its size should be controlled, the peak width w that is caused by the shade shadow effect, be generally less than 0.3 millimeter (mm), the part that this shade 501 is not desired substrate 500 to be plated to is blocked, and the part of plated film that substrate 500 is desired come out, and dielectric film 504 is plated on the substrate 500.After finishing a plated film program, this shade 501 can move to next anchor point, another needs the part of plated film and expose substrate, and the part that will not desire plated film is blocked, to carry out the dielectric film plated film program of next color, above-mentioned plated film program can repeat to complete to the optical filter of all colours.Shade 501 wherein used in the present invention for example is with the shade of Silicon Wafer as material.
See also shown in Fig. 6 A to Fig. 6 C, be the The Outline Design figure of shade that preferred embodiment of the present invention is used.As shown in Figure 6A, shade 60 comprises openwork part 20 and hides part 10, wherein openwork part 20 is the parts that expose plated film that substrate is desired in coating process, and the required dielectric film layer of plated film can be plated on the substrate by openwork part 20, and hiding 10 of parts will not need the part of plated film to block.Because shade 60 of the present invention is the colored filters that are used for making tool blueness (B), green (G) and red (R), and the optical filter tool 30 degree angular zones of each color, therefore wantonly two adjacent openwork part 20 mutual angles are 90 degree.
If desire forms the colored filter of tool blueness (B), green (G) and red (R) shown in Fig. 6 D, the shade of Fig. 6 A can be used in the summary installation drawing of crucible, target, substrate and the shade of the coating machine shown in Fig. 5 A, wherein shade 501 uses the design of Fig. 6 A.When desiring to carry out the Red lightscreening plate making, the part that the openwork part 20 of shade 60 of the present invention can plate the substrate desire red dielectric film comes out, the zone of simultaneously desire being plated blue dielectric film and green dielectric film hides, and carry out the plated film program, so that red dielectric film (R) is formed on the substrate.Because shade 60 its wantonly two adjacent openwork parts 20 of the present invention press from both sides an angle of 90 degrees each other, therefore formed red dielectric film (region R shown in Fig. 6 D) also presss from both sides an angle of 90 degrees each other.
When desiring to carry out the green color filter making, shown in Fig. 6 B, the present invention can utilize a pivoting mechanism (not showing among the figure) with shade 60 clockwises rotation 30 degree angles, because the optical filter tool of each color 30 degree angular zones, openwork part 20 is come out the part of substrate desire plating green dielectric film, the zone of simultaneously desire being plated blue dielectric film and having finished red dielectric film plated film program hides and carries out green dielectric film plated film program, and (G) is formed on the substrate with green dielectric film.Because shade 60 its wantonly two adjacent openwork parts 20 of the present invention press from both sides an angle of 90 degrees each other, therefore formed green dielectric film (the regional G shown in Fig. 6 D) is also pressed from both sides an angle of 90 degrees each other.
When desiring to carry out the blue color filter making, shown in Fig. 6 C, the present invention can utilize above-mentioned pivoting mechanism with shade 60 clockwise rotation 30 degree angles once more, because the optical filter tool of each color 30 degree angular zones, therefore the part that can make openwork part 20 that the substrate desire is plated blue dielectric film comes out, the zone that to finish green dielectric film and red dielectric film plated film program simultaneously hides, and then carries out blue dielectric film plated film program, and (B) is formed on the substrate with blue dielectric film.Because shade 60 its wantonly two adjacent openwork parts 20 of the present invention press from both sides an angle of 90 degrees each other, therefore formed blue dielectric film (area B shown in Fig. 6 D) also presss from both sides an angle of 90 degrees each other.Shade design that it should be noted that this case is not limited in the figure shown in Fig. 6 A, and it can design according to required color filter patterns.
On the other hand, plated film program of the present invention also can adopt the mode of rete stack, for instance, suppose that (its passband is 420nm～590nm to film 1, end band for 600nm～700nm) (passband is 420nm～490nm with film 2,608nm～700nm, (passband is 420nm～490nm for the stack of 500nm～600nm) can produce blue color filter to end band, end the optics effect of band for 500nm～700nm), in addition, film 2 (ends band and is 420nm～490nm with film 3, passband is that 500nm～700nm) stack can (end band and be 420nm～600nm by the generation Red lightscreening plate, passband is the optics effect of 610nm～700nm), and film 1 and film 3 stacks then can produce green color filter (passband is the optics effect of 520nm～590nm).Therefore, if desire forms the colored filter of tool blueness (B), green (G) and red (R) shown in Fig. 7 D, its shade design can be shown in Fig. 7 A, shade 70 comprises openwork part 71 and hides part 72, wherein openwork part 71 is the parts that expose plated film that substrate is desired in coating process, and the required target of plated film can see through openwork part 71 and be plated on the substrate, hiding 72 of parts will not need the part of plated film to block, be to adopt the mode of two retes stack to form optical filter in the present embodiment, therefore, openwork part 71 shared angles are 60 degree.Wherein shade 70, for example can be with the shade of Silicon Wafer as material.
Be used in coating machine summary installation drawing Fig. 5 A shown in as if the shade with Fig. 7 A this moment, and shade 501 uses the design of Fig. 7 A among the figure, and film 1 is plated on the substrate through openwork part 71.Then, shown in Fig. 7 B, the present invention can utilize above-mentioned pivoting mechanism with shade 70 clockwises rotation 30 degree angles, and film 2 is plated on the substrate through openwork part 71.Then, shown in Fig. 7 C, utilize above-mentioned pivoting mechanism once more, and film 3 is plated on the substrate through openwork part 71 shade 70 clockwises rotation 30 degree angles.
This moment, on colored filter base version, the rete that is plated on the zone 74 and 77 was film 1 and film 2 shown in Fig. 7 D, and therefore stack can produce the optics effect of blue color filter; The rete film 2 and the film 3 that are plated on the zone 75 and 78, therefore stack can produce the optics effect of Red lightscreening plate; The rete film 1 and the film 3 that are plated on the zone 73 and 76, therefore stack can produce the optics effect of green color filter, and forms the colored filter shown in Fig. 7 D.
By above-mentioned invention, can avoid traditionally after plated film is finished each time, need substrate is taken out in vacuum coating equipment, the dust fall that may cause pollute, simultaneously method of the present invention need not repeat to vacuumize, steps such as vacuum breaker, intensification and cooling, therefore can reduce the processing procedure time, and not involve lithographic process, the situation that does not therefore have alignment error takes place.
Be understandable that; for the person of ordinary skill of the art; can make various corresponding changes and distortion according to technical scheme of the present invention and technical conceive, and these all changes and distortion all should belong to the protection domain of accompanying Claim of the present invention.
Claims (11)
1, a kind of method for manufacturing colored filtering substrate, this colored filter comprise a substrate and a plurality of film at least, and this method comprises the following step at least:
(a) place this substrate and a shade in a vacuum coating equipment, wherein this shade exposes this substrate portion surface;
(b) use this shade to be the cover curtain, at this exposed substrate surface plating one thin layer;
(c) moving this shade makes this exposure of substrates go out the part surface of this desire plating thin layer; And
Repeat (b) to (c) step to having plated this colored filter multilayer film.
2, method for manufacturing colored filtering substrate according to claim 1, wherein this shade can Silicon Wafer as material.
3, method for manufacturing colored filtering substrate according to claim 1, but this shade clockwise rotation wherein moved.
4, method for manufacturing colored filtering substrate according to claim 1, but this shade inverse clock rotation wherein moved.
5, manufacturing method of color filters according to claim 1 is wherein plated the method that this thin layer can use sputter in this exposed substrate surface.
6, manufacturing method of color filters according to claim 1 is wherein plated the method that this thin layer can use evaporation in this exposed substrate surface
7, manufacturing method of color filters according to claim 1, wherein this thin layer can be the logical or band of band and ends the optical lightscreening film.
8, manufacturing method of color filters according to claim 1, wherein this thin layer can be high pass or plate of low-pass optical light filter film.
9, manufacturing method of color filters according to claim 1, wherein this thin layer can be the antireflective optical anti-reflection film.
10, manufacturing method of color filters according to claim 1, wherein this shade cause this thin layer on this substrate by the peak width that shadow effect caused of this shade less than 0.3 millimeter.
11, manufacturing method of color filters according to claim 1, wherein this shade has openwork part and places on this substrate surface, and exposing this substrate portion surface, and the shape of this openwork part is relevant with the shape of optical filter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA031103162A CN1536376A (en) | 2003-04-04 | 2003-04-04 | Production method of colour filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA031103162A CN1536376A (en) | 2003-04-04 | 2003-04-04 | Production method of colour filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1536376A true CN1536376A (en) | 2004-10-13 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA031103162A Pending CN1536376A (en) | 2003-04-04 | 2003-04-04 | Production method of colour filter |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100415927C (en) * | 2004-10-29 | 2008-09-03 | 精碟科技股份有限公司 | Fliming clamp mask and its filming apparatus |
| CN101676752B (en) * | 2008-09-16 | 2011-07-27 | 北京京东方光电科技有限公司 | Manufacturing method of color filter |
| CN102360094A (en) * | 2011-10-10 | 2012-02-22 | 孔令华 | Filtering thin film, filtering thin film device and manufacture method thereof |
| CN102025361B (en) * | 2009-09-14 | 2012-11-14 | 柏腾科技股份有限公司 | Method for combining capacitive button electrode on metal film preventing electromagnetic interference |
| CN106375741A (en) * | 2016-10-11 | 2017-02-01 | 中国人民解放军陆军军官学院 | Night vision true color image acquisition method based on filtering of image intensifier |
| CN107305313A (en) * | 2016-04-19 | 2017-10-31 | 台达电子工业股份有限公司 | Fluorometer arrangement |
| CN108007936A (en) * | 2017-12-19 | 2018-05-08 | 苏州精濑光电有限公司 | The support platform and detection device of a kind of metal cover |
| US10688527B2 (en) | 2011-09-22 | 2020-06-23 | Delta Electronics, Inc. | Phosphor device comprising plural phosphor agents for converting waveband light into plural color lights with different wavelength peaks |
-
2003
- 2003-04-04 CN CNA031103162A patent/CN1536376A/en active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100415927C (en) * | 2004-10-29 | 2008-09-03 | 精碟科技股份有限公司 | Fliming clamp mask and its filming apparatus |
| CN101676752B (en) * | 2008-09-16 | 2011-07-27 | 北京京东方光电科技有限公司 | Manufacturing method of color filter |
| CN102025361B (en) * | 2009-09-14 | 2012-11-14 | 柏腾科技股份有限公司 | Method for combining capacitive button electrode on metal film preventing electromagnetic interference |
| US10688527B2 (en) | 2011-09-22 | 2020-06-23 | Delta Electronics, Inc. | Phosphor device comprising plural phosphor agents for converting waveband light into plural color lights with different wavelength peaks |
| US10758937B2 (en) | 2011-09-22 | 2020-09-01 | Delta Electronics, Inc. | Phosphor device comprising plural phosphor agents for converting waveband light into plural color lights |
| CN102360094A (en) * | 2011-10-10 | 2012-02-22 | 孔令华 | Filtering thin film, filtering thin film device and manufacture method thereof |
| CN107305313A (en) * | 2016-04-19 | 2017-10-31 | 台达电子工业股份有限公司 | Fluorometer arrangement |
| CN106375741A (en) * | 2016-10-11 | 2017-02-01 | 中国人民解放军陆军军官学院 | Night vision true color image acquisition method based on filtering of image intensifier |
| CN108007936A (en) * | 2017-12-19 | 2018-05-08 | 苏州精濑光电有限公司 | The support platform and detection device of a kind of metal cover |
| CN108007936B (en) * | 2017-12-19 | 2024-04-16 | 苏州精濑光电有限公司 | Supporting platform and detection device for metal shade |
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