CN1467283A - Stone blotch cleaning agent - Google Patents
Stone blotch cleaning agent Download PDFInfo
- Publication number
- CN1467283A CN1467283A CNA031179762A CN03117976A CN1467283A CN 1467283 A CN1467283 A CN 1467283A CN A031179762 A CNA031179762 A CN A031179762A CN 03117976 A CN03117976 A CN 03117976A CN 1467283 A CN1467283 A CN 1467283A
- Authority
- CN
- China
- Prior art keywords
- acid
- clean
- out system
- stone material
- hydrogen peroxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Detergent Compositions (AREA)
Abstract
A detergent for removing dirt spots from stone material contains the inorganic acid (1-40%) chosen from sulfuric acid, hydrochloric acid, nitric acid and phosphoric acid, and the H2O2 (5-30%). Its advantages are high detergency and low cost.
Description
Technical field
The present invention relates to the building materials clean-out system, specifically a kind of stone material stain clean-out system.
Background technology
(as the stain that forms behind the stone surface tongue green for a long time) can be at organic spot inner or surface formation black during appositional pattern stone material ore body forms or in the stone material use.When using as building materials with stone material, in particular as when having ornamental building materials,, and can not eliminate usually because stone material is because of there being above-mentioned flaw, influence the ornamental of stone material, only give it up, bring bigger waste thus.
Summary of the invention
The purpose of this invention is to provide a kind of stone material stain clean-out system that can effectively remove the organic spot of black in the stone material.
The objective of the invention is to be realized by following technical scheme: clean-out system of the present invention contains mineral acid 1~40%, hydrogen peroxide 5~30%, and surplus is a water.
Above-described mineral acid is sulfuric acid, hydrochloric acid, nitric acid, phosphoric acid etc.
Clean-out system of the present invention obtains through secular experiment repeatedly, has solved the problem that never overcomes in the prior art, can easily remove the black splotch on the stone material, has improved the decorative effect of stone material, has improved the utilization ratio of stone material.It is convenient for production, low cost of manufacture, and it is also convenient to use.
Embodiment
Deciding the ratio of acid and hydrogen peroxide and water, its compound method according to concrete stone material quality and spot situation is earlier with behind the sour dilute with water, adds the hydrogen peroxide preparation again.(in the preparation all by weight)
Embodiment 1:
Use 85% nitric acid, 27% hydrogen peroxide adds water and is mixed with nitric acid: hydrogen peroxide: the clean-out system double centner of water=18: 13: 69, by calculating: 21.18 kilogram of 85% nitric acid with after 30.67 kg water are mixed, is added 48.15 kilogram of 27% hydrogen peroxide again and mixes and promptly be made into clean-out system.
Embodiment 2:
Use 36% hydrochloric acid, 27% hydrogen peroxide adds water and is mixed with hydrochloric acid: hydrogen peroxide: the clean-out system double centner of water=9: 18: 73, by calculating: 25 kilogram of 27% hydrochloric acid with after 8.33 kg water are mixed, is added 66.67 kilogram of 27% hydrogen peroxide again and mixes and promptly be made into clean-out system.
Embodiment 3:
Use 20% sulfuric acid, 27% hydrogen peroxide adds water and is mixed with sulfuric acid: hydrogen peroxide: the clean-out system double centner of water=1: 5: 96, by calculating: 5 kilogram of 20% sulfuric acid with after 76.48 kg water are mixed, is added 18.52 kilogram of 27% hydrogen peroxide again and mixes and promptly be made into clean-out system.
Embodiment 4:
Use pure phosphoric acid, 50% hydrogen peroxide adds water and is mixed with phosphoric acid: hydrogen peroxide: the clean-out system double centner of water=40: 30: 30, and by calculating: 40 kg of pure phosphoric acid are mixed promptly being made into clean-out system with 60 kilogram of 50% hydrogen peroxide.
Claims (2)
1, a kind of stone material stain clean-out system is characterized in that clean-out system contains mineral acid 1~40%, hydrogen peroxide 5~30%.
2, stone material stain clean-out system according to claim 1 is characterized in that described mineral acid is sulfuric acid, hydrochloric acid, nitric acid, phosphoric acid.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 03117976 CN1238484C (en) | 2003-05-27 | 2003-05-27 | Stone blotch cleaning agent |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 03117976 CN1238484C (en) | 2003-05-27 | 2003-05-27 | Stone blotch cleaning agent |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1467283A true CN1467283A (en) | 2004-01-14 |
CN1238484C CN1238484C (en) | 2006-01-25 |
Family
ID=34152728
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 03117976 Expired - Fee Related CN1238484C (en) | 2003-05-27 | 2003-05-27 | Stone blotch cleaning agent |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN1238484C (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010126456A1 (en) * | 2009-04-27 | 2010-11-04 | Elkay Kimyasal Maddeler Sanayi Ticaret Anonim Sirketi | Method for cleaning metal oxides formed on natural stones |
CN102041194A (en) * | 2010-12-30 | 2011-05-04 | 山东建筑大学 | Granite rust cleaning liquid containing high-efficiency adhesive and preparation method thereof |
CN102191142A (en) * | 2011-04-13 | 2011-09-21 | 浙江大学 | Surface yellow spot cleaning agent for neutral stones and stone cultural relics and preparation method thereof |
CN104446649A (en) * | 2014-12-03 | 2015-03-25 | 中昊晨光化工研究院有限公司 | Stone treatment agent |
CN110951550A (en) * | 2019-11-27 | 2020-04-03 | 烟台奥亚石材应用技术有限公司 | Stone color spot removing method and stone color spot remover |
-
2003
- 2003-05-27 CN CN 03117976 patent/CN1238484C/en not_active Expired - Fee Related
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010126456A1 (en) * | 2009-04-27 | 2010-11-04 | Elkay Kimyasal Maddeler Sanayi Ticaret Anonim Sirketi | Method for cleaning metal oxides formed on natural stones |
CN102041194A (en) * | 2010-12-30 | 2011-05-04 | 山东建筑大学 | Granite rust cleaning liquid containing high-efficiency adhesive and preparation method thereof |
CN102191142A (en) * | 2011-04-13 | 2011-09-21 | 浙江大学 | Surface yellow spot cleaning agent for neutral stones and stone cultural relics and preparation method thereof |
CN102191142B (en) * | 2011-04-13 | 2012-09-19 | 浙江大学 | Surface yellow spot cleaning agent for neutral stones and stone cultural relics and preparation method thereof |
CN104446649A (en) * | 2014-12-03 | 2015-03-25 | 中昊晨光化工研究院有限公司 | Stone treatment agent |
CN104446649B (en) * | 2014-12-03 | 2016-07-06 | 中昊晨光化工研究院有限公司 | A kind of stone material inorganic agent |
CN110951550A (en) * | 2019-11-27 | 2020-04-03 | 烟台奥亚石材应用技术有限公司 | Stone color spot removing method and stone color spot remover |
Also Published As
Publication number | Publication date |
---|---|
CN1238484C (en) | 2006-01-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW200608469A (en) | Lithographic mask and manufacturing method threof | |
TW200801168A (en) | Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing method, kit for chemical mechanical polishing, and kit for preparing aqueous dispersion for chemical mechanical polishing | |
AU2002361061A1 (en) | Method for the production of surfactant granulates containing builders | |
ZA200410000B (en) | Method for producing C13-alcohol mixtures | |
CA2466622A1 (en) | Plant growth media and processes for production thereof and compositions for use therein | |
TW200616074A (en) | Cleaning process for semiconductor substrates | |
CN101974785A (en) | Cleaning method of policrystalline silicon raw material | |
JP4246782B2 (en) | Manufacturing method of siliceous fertilizer | |
TW200617147A (en) | Highly selective silicon oxide etching compositions | |
CN1238484C (en) | Stone blotch cleaning agent | |
CN112251758A (en) | Automobile part cleaning agent | |
EP1525044B8 (en) | Method of purifying air, apparatus for purifying air and building provided with this apparatus | |
CN105624682A (en) | Novel low-temperature polishing agent | |
CN107857242A (en) | A kind of method for improving the water-soluble rate of fertilizer grade MAP | |
CN101050096A (en) | Method for fabricating bricks free from burning from waste residue containing vitreous body of silicon, aluminum and chemical gypsum | |
ATE316567T1 (en) | SURFACTANT GRANULES AND METHOD FOR PRODUCING SURFACTANT GRANULES | |
CN201801602U (en) | Stainless steel plate pickling device | |
MY117550A (en) | Production of anionic surfactant granules by in situ neutralisation | |
CN105732876B (en) | Suppression frost reinforcing agent for cement floor tile and preparation method thereof | |
WO2006125113A3 (en) | A process to produce an enriched composition | |
JP2001213653A (en) | Mortar composition, method of repairing waterway using it and waterway structure | |
CN105060566A (en) | Treating method for steel pickling waste water | |
EP1767513A4 (en) | Method for producing 2-adamantanol and 2-adamantanone | |
MY152191A (en) | Production of anionic surfactant granules by in situ neutralisation | |
CN1295040A (en) | Iron eliminating method for quartzite |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20060125 Termination date: 20100527 |