CN1458099A - Method for producing low water peak optic fiber prefabricated piece - Google Patents
Method for producing low water peak optic fiber prefabricated piece Download PDFInfo
- Publication number
- CN1458099A CN1458099A CN 03128870 CN03128870A CN1458099A CN 1458099 A CN1458099 A CN 1458099A CN 03128870 CN03128870 CN 03128870 CN 03128870 A CN03128870 A CN 03128870A CN 1458099 A CN1458099 A CN 1458099A
- Authority
- CN
- China
- Prior art keywords
- core rod
- gas
- sintering furnace
- optical fiber
- loose
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 38
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
- 239000000835 fiber Substances 0.000 title description 10
- 239000013307 optical fiber Substances 0.000 claims abstract description 84
- 238000005245 sintering Methods 0.000 claims abstract description 69
- 238000001035 drying Methods 0.000 claims abstract description 55
- 239000000460 chlorine Substances 0.000 claims abstract description 48
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 30
- 238000000034 method Methods 0.000 claims abstract description 25
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 15
- 239000011521 glass Substances 0.000 claims abstract description 14
- 239000005373 porous glass Substances 0.000 claims abstract description 13
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 12
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims abstract description 10
- 125000001309 chloro group Chemical group Cl* 0.000 claims abstract description 6
- 239000011248 coating agent Substances 0.000 claims abstract description 5
- 238000000576 coating method Methods 0.000 claims abstract description 5
- 239000007789 gas Substances 0.000 claims description 65
- XLYOFNOQVPJJNP-ZSJDYOACSA-N Heavy water Chemical compound [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 claims description 51
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 claims description 19
- 238000010926 purge Methods 0.000 claims description 16
- 229910052805 deuterium Inorganic materials 0.000 claims description 12
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 claims description 11
- 239000012159 carrier gas Substances 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 5
- 238000005253 cladding Methods 0.000 claims description 4
- 229910052734 helium Inorganic materials 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 2
- 238000007664 blowing Methods 0.000 claims 5
- 239000001307 helium Substances 0.000 claims 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims 1
- 238000003912 environmental pollution Methods 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 description 12
- 239000000843 powder Substances 0.000 description 9
- 238000007740 vapor deposition Methods 0.000 description 9
- 239000000126 substance Substances 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 239000002274 desiccant Substances 0.000 description 4
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium oxide Inorganic materials O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000004071 soot Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000012792 core layer Substances 0.000 description 2
- OSVXSBDYLRYLIG-UHFFFAOYSA-N dioxidochlorine(.) Chemical compound O=Cl=O OSVXSBDYLRYLIG-UHFFFAOYSA-N 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 239000004155 Chlorine dioxide Substances 0.000 description 1
- 229910006113 GeCl4 Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910006124 SOCl2 Inorganic materials 0.000 description 1
- 229910003910 SiCl4 Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 235000019398 chlorine dioxide Nutrition 0.000 description 1
- 239000000567 combustion gas Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- XLYOFNOQVPJJNP-DYCDLGHISA-N deuterium hydrogen oxide Chemical compound [2H]O XLYOFNOQVPJJNP-DYCDLGHISA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 229920006240 drawn fiber Polymers 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007496 glass forming Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- -1 hydrogen compound Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- TUJKJAMUKRIRHC-UHFFFAOYSA-N hydroxyl Chemical compound [OH] TUJKJAMUKRIRHC-UHFFFAOYSA-N 0.000 description 1
- 230000000155 isotopic effect Effects 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000003534 oscillatory effect Effects 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000005491 wire drawing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/22—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with deuterium
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Thermal Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Abstract
Description
1310nm | 1383nm | 1550nm | cut-off wavelength | Diameter of fiber |
0.369dB/km | 0.312dB/km | 0.239dB/km | 1300nm | 125μm |
1310nm | 1383nm | 1550nm | cut-off wavelength | Diameter of fiber |
0.351dB/km | 0.318dB/km | 0.203dB/km | 1284nm | 125μm |
1310nm | 1383nm | 1550nm | cut-off wavelength | Diameter of fiber |
0.382dB/km | 0.314dB/km | 0.245dB/km | 1310nm | 125μm |
1310nm | 1383nm | 1550nm | cut-off wavelength | Diameter of fiber |
0.341dB/km | 0.317dB/km | 0.225dB/km | 1281nm | 125μm |
1310nm | 1383nm | 1550nm | cut-off wavelength | Diameter of fiber |
0.364dB/km | 0.335dB/km | 0.214dB/km | 1308nm | 125μm |
1310nm | 1383nm | 1550nm | cutting blockStop wavelength | Diameter of fiber |
0.346dB/km | 0.317dB/km | 0.219dB/km | 1311nm | 125μm |
1310nm | 1383nm | 1550nm | cut-off wavelength | Diameter of fiber |
0.346dB/km | 0.317dB/km | 0.219dB/km | 1311nm | 125μm |
1310nm | 1383nm | 1550nm | cut-off wavelength | Diameter of fiber |
0.358dB/km | 0.32dB/km | 0.213dB/km | 1324nm | 125μm |
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 03128870 CN1234633C (en) | 2003-05-23 | 2003-05-23 | Method for producing low water peak optic fiber prefabricated piece |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 03128870 CN1234633C (en) | 2003-05-23 | 2003-05-23 | Method for producing low water peak optic fiber prefabricated piece |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1458099A true CN1458099A (en) | 2003-11-26 |
CN1234633C CN1234633C (en) | 2006-01-04 |
Family
ID=29430476
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 03128870 Expired - Lifetime CN1234633C (en) | 2003-05-23 | 2003-05-23 | Method for producing low water peak optic fiber prefabricated piece |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN1234633C (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100340508C (en) * | 2004-11-29 | 2007-10-03 | 长飞光纤光缆有限公司 | Method for manufacturing optical fiber unsensitive to hydrogen |
CN101912968A (en) * | 2010-08-20 | 2010-12-15 | 西北有色金属研究院 | Suspension sintering method of slender powder metallurgy tube/bar blank |
CN102149648A (en) * | 2008-09-09 | 2011-08-10 | 信越化学工业株式会社 | Process for producing optical-fiber base material |
CN112805252A (en) * | 2018-08-08 | 2021-05-14 | 康宁股份有限公司 | Method for manufacturing halogen-doped silica preform for optical fiber |
CN112939443A (en) * | 2021-01-29 | 2021-06-11 | 华南理工大学 | High borosilicate glass cladding cesium iodide single crystal core optical fiber and preparation method and application thereof |
-
2003
- 2003-05-23 CN CN 03128870 patent/CN1234633C/en not_active Expired - Lifetime
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100340508C (en) * | 2004-11-29 | 2007-10-03 | 长飞光纤光缆有限公司 | Method for manufacturing optical fiber unsensitive to hydrogen |
CN102149648A (en) * | 2008-09-09 | 2011-08-10 | 信越化学工业株式会社 | Process for producing optical-fiber base material |
CN101912968A (en) * | 2010-08-20 | 2010-12-15 | 西北有色金属研究院 | Suspension sintering method of slender powder metallurgy tube/bar blank |
CN112805252A (en) * | 2018-08-08 | 2021-05-14 | 康宁股份有限公司 | Method for manufacturing halogen-doped silica preform for optical fiber |
CN112805252B (en) * | 2018-08-08 | 2023-04-04 | 康宁股份有限公司 | Method for manufacturing halogen-doped silica preform for optical fiber |
CN112939443A (en) * | 2021-01-29 | 2021-06-11 | 华南理工大学 | High borosilicate glass cladding cesium iodide single crystal core optical fiber and preparation method and application thereof |
Also Published As
Publication number | Publication date |
---|---|
CN1234633C (en) | 2006-01-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: ZHEJIANG FUTONG OPTICAL FIBER TECHN CO., LTD. Free format text: FORMER OWNER: HANGZHOU FUTONG COMMUNICATION TECHNOLOGY CO., LTD. Effective date: 20060728 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20060728 Address after: 311422 Zhejiang province Fuyang Shoujiang Zhu Jia Patentee after: ZHEJIANG FUTONG OPTICAL FIBER TECHNOLOGY Co.,Ltd. Address before: 311422 Zhejiang city of Fuyang Province Silver Lake Development Zone Patentee before: HANGZHOU FUTONG COMMUNICATION TECHNOLOGY Co.,Ltd. |
|
ASS | Succession or assignment of patent right |
Owner name: FUTONG GROUP CO.,LTD. Free format text: FORMER OWNER: ZHEJIANG FUTONG OPTICAL FIBER TECHN CO., LTD. Effective date: 20070302 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20070302 Address after: 311400 Zhejiang city of Fuyang province Jinqiu road Fortis Science Park No. 1-8 Patentee after: Futong Group Co.,Ltd. Address before: 311422 Zhejiang province Fuyang Shoujiang Zhu Jia Patentee before: ZHEJIANG FUTONG OPTICAL FIBER TECHNOLOGY Co.,Ltd. |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20160401 Address after: 311422 Yinhe Development Zone, Fuyang District, Hangzhou, Zhejiang Patentee after: HANGZHOU FUTONG COMMUNICATION TECHNOLOGY Co.,Ltd. Address before: 311400, No. 1-8, Fortis Science Park, Golden Autumn Road, Zhejiang, Fuyang Patentee before: Futong Group Co.,Ltd. |
|
CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20060104 |