CN1452202A - Bistable electromagnetic microdriver and mfg. method thereof - Google Patents
Bistable electromagnetic microdriver and mfg. method thereof Download PDFInfo
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Abstract
A bistable electromagnetic microdriver is structurally characterized by that a pair of permanent-magnet bases are symmetrically arranged on a soft-magnetic liner on base, a soft-magnetic torsional beams is arranged via soft-magnetic transition layer on said two bases to form a bridge structure, and a pair of soft-magnetic cantilevers are horizontally and symmetrically extended from the middle part of torsional beam to make their ends above the planar windings containing iron core on said liner. An air gap is between the end of cantilever and planar winding.
Description
Technical field:
The present invention relates to a kind of bistable electromagnetic type microdrive and preparation method thereof, be a kind of electromagnetic type micro driver and integrated manufacturing method thereof of realizing no power consumption attitude maintenance by winding electric magnetic effect realization displacement drive, by permanent magnet, relevant with the Switch device of Electromagnetic Drive, belong to automatic control or MEMS (micro electro mechanical system)
Technical field.
Background technology:
MEMS (micro electro mechanical system) and correlation technique thereof, push the size of light, mechanical, electrical function element to size level to some extent near microelectronic component, compound opportunity of their integrated manufacturings and function and possibility have been given, not only can significantly improve the effect and the competitiveness of existing product, but also might create brand-new version, thereby enjoying attention, development is rapidly.
Microdrive is the core of MEMS (micro electro mechanical system) (MEMS), the year ends 80, first electrostatic micro motor (microdrive) birth was created much of a stir, static driven is simple in structure with it, distinguishing features such as various informative and low-power consumption attitude maintenance have occupied the leading position that MEMS drives, fact proved after this, the development of MEMS technology is subjected to the influence of above-mentioned viewpoint deeply, most devices and system are based on static driven principle design and manufacturing, wherein part has obtained success, as digital micro-mirror array of DMD system etc., but great majority have been paid heavy cost for this reason, various antetype device developments obtain to be difficult to reach the practicability requirement after the initial success, slowly be difficult to enter the industrialization stage, reason in individual is not quite similar, but the deficiency of microdrive is considered to one of the main reasons, static driven voltage height wherein, little and the fragile structure that causes thus of actuating force, series of factors such as dielectric layer is charged become the obstacle that improves device lifetime, in addition based on electromagnetism and piezoelectricity, shape memory, hot gas is moving, electrostriction, the microdrive exploitation of drive principle such as magnetostriction is also not fully up to expectations, therefore, explore new driving mechanism and more effectively utilize above-mentioned various drive principle to remain one of key technology area that the MEMS technology realize to break through.
Electromagnetic Drive can be taken into account the requirement of displacement and two aspects of actuating force preferably, be subjected to extensively paying attention to and being furtherd investigate always, the electromagnetic type micro driver design of multiple different structure form successively has prototype hardware to come out, as electromagnetic type micro motor (Zhang Shoubai, Zhao Xiaolin, fourth Gui Fu etc., the research of electromagnetic type micro motor, functional material and device, 42 (1998), 73-77), electromagnetic type micro-cantilever actuator (Arai K.I., Micromagnetic actuators Robotica 14 pt 5 Sep-Oct 1996 Cambridge Univ Pressp477-481), electromagnetism microrelay (J.Williams et al, UV-LIGA fabrication ofelectromagnetic power micro-relays, Proceedings of the InternationalSymposium on Test and Measurement v 1 Jun 1-3 2,001 2001 p 1-9), Electromagnetic Drive glimmer switch (Toshiyoshi H.et al, Micro-mechanical fiber optic switchesbased on electromagnetic torsion mirrors LEOS Summer Topical Meeting Jul20-24 1,998 1998 IEEE p 23-24) or the like, they with static driven to compare driving force ratio with quasi-driver bigger, the displacement that can realize is also longer relatively, and driving voltage can significantly reduce, and can effectively improve the structural stability of micro element.Yet their power consumption all is significantly higher than the corresponding device of static driven, considers the characteristics of microdrive compact conformation, and high power consumption will cause the heat localization problem, and influence is bigger when microdrive occurs with array format.Analyze and find, compare with static driven, the power consumption height of electromagnetic type micro driver mainly is to keep the period in attitude.In order to address the above problem, people attempt to adopt the dexterous mechanism of no power consumption attitude maintenance in electromagnetic type micro driver, in the nineties, H.Ren etc. have proposed a kind of bistable state design (Design and fabrication of acurrent-pulse-excited bistable magnetic microactuator of planar structure, Sensors andActuators, A58 (1997) 259-264).On the soft magnetism winding both arms of plane distribution, the copper cash winding of manual coiling forms the double solenoid structure, double solenoid by soft magnetic material cantilever beam symmetry separately, cantilever beam one end communicates with soft magnetism both arms loop by precision machined permanent magnet, the other end can form dicyclo magnetic circuit arranged side by side by the breach in both arms loop.By means of the variation of solenoid energising direction, the magnetic flux that can regulate in the capable magnetic circuit of dicyclo distributes, thereby produces bias force on cantilever beam, impel it to a lateral bending song, form closed magnetic circuit, at this moment disconnect exciting current, can keep this state constant by means of the power of permanent magnet.Apply a rightabout pulse current, can discharge the cantilever beam that is held, and make it be partial to another loop fulcrum, closed another loop, the same outage attitude that realizes keeps.This design has realized bi-stable function, but overall structure comprises precision optical machinery and microfabrication, needs the manual processing and the assembling of more complicated, is more suitable for bigger monomer device, is difficult to realize integrated manufacturing.
Meichun Ruan is at up-to-date United States Patent (USP) (Meichun Ruan, Jun Shen, CharlesWheelers, Electronically latching micro-magnetic switches and method ofoperating same USP6496612, a kind of magnetic lock switch designs based on micro cantilever structure and planar coil driving has been proposed 2002/12/17), its operation principle is that the cantilever beam that soft magnetic material is made is magnetized in magnetic field, the moment of torsion that is produced has been formed the stable state of no power consumption by cantilever beam elasticity and detent mechanism constraint.The angle of regulating magnetic direction and cantilever beam can change torque direction, then just might form the stable state of two no power consumptions, corresponding respectively Switch device open and close two states.This design changes the realization bi-directional drive by means of the direction in energising magnetic field that planar coil produces.The main inventor of this patent serves as that the Microlab company that set up on the basis declares to have the magnetic lock technology (WWW.MICROLAB.net) of initiative with this technology, and is putting forth effort to develop corresponding Electromagnetic Drive micro switch product.But, the constant magnetic force that is used for the attitude maintenance in this design is not the electromagnetic force that common closed magnetic flux produces in the air gap place, but the moment of torsion that the soft magnetism cantilever beam is magnetized in magnetic field, electromagnetic action efficient is low, moment of torsion is directly proportional with the size of cantilever beam, can cause heavy moving parts to be difficult to reduce, the motion response speed is restricted.In addition, the back magnet structure that pastes formula also is unfavorable for integrated manufacturing.
Summary of the invention:
The objective of the invention is at the existing deficiency of aforementioned various designs, bistable electromagnetic type microdrive of a kind of magnetic circuit closure and preparation method thereof is provided, to give full play to the advantage of Electromagnetic Drive principle and integrated manufacturing, reduce the power consumption of Electromagnetic Drive, improve the feasibility of the integrated manufacturing of device, promote the application of electromagnetic type micro driver in the Switch micro element.
For realizing such purpose, microdrive of the present invention is to be distributed in the soft magnetism substrate on the matrix, and branch bilateral symmetry is provided with a pair of permanent magnet pedestal on it; Soft magnetism is turned round beam and is placed in by the soft magnetism transition zone and forms bridge architecture on the pair of base; One group of plane winding is set respectively on the both sides substrate of bridge; The both sides two-way horizontal of turning round the beam middle part stretches the soft magnetism cantilever beam, makes cantilever beam two correct the top that reaches the plane winding, and forms the air gap that can supply cantilever beam to move between cantilever beam and winding.In above-mentioned structure, permanent magnet by the contact effect of substrate with turn round that beam, cantilever beam and winding iron core etc. are common to constitute two magnetic loops in parallel, change by pulse current direction in the winding can be selected wherein one of air gap closure arbitrarily, realize that by permanent magnetism power the outage attitude keeps, and constitutes bistable state.The present invention can drive conductive contact with cantilever beam by the fully-integrated manufacturing of micromachining technology, and suitable integrated access signal line just can constitute mechanical type micro switch or microrelay.
Above-mentioned bistable electromagnetic type microdrive can adopt the fully-integrated manufacturing of micromachining technology: the soft magnetism substrate of at first making design on matrix by the mask plating method, on the position of design of Windings, process the plane winding of two groups of band iron cores then, on the design attitude of permanent magnet pedestal, make miniature permanent magnet by little electroforming process by non-silicon micromachining technology.The other end at permanent magnet is made the soft magnetic material cover layer with Micrometer-Nanometer Processing Technology, and on this basis by sacrificial layer technology and mask electrodeposition technology structure soft magnetism turn round beam, cantilever beam, with turn round beam, cantilever beam discharges and just can constitute a kind of electromagnetic type micro driver with bi-stable function.If, take this to get involved circuit and just can constitute micro-machinery switch or relay at the front end extension grafting conductive contact of cantilever beam.
Above-mentioned integrated bistable state design can realize that the outage attitude keeps, and significantly reduces the power consumption of Electromagnetic Drive when keeping the high-efficiency electromagnetic effect.
Description of drawings:
Fig. 1 is the structural representation of a kind of modular design of bistable electromagnetic type microdrive of the present invention.
Among Fig. 1,1 is cantilever beam, and 2 for turning round beam, and 3 is magnet, and 4 is the soft magnetism transition zone, and 5 is the permanent magnet pedestal, and 6 is matrix, and 7 is winding, and 8 is iron core, and 9 is the soft magnetism substrate, and 10 is the air gap between magnet 3 and the winding 7.
Fig. 2 is a series of intermediate structure side schematic views in the integrated course of processing of the present invention.
Among Fig. 2,1 is cantilever beam, and 2 for turning round beam, 3 is magnet, and 4 is the soft magnetism transition zone, and 5 is the permanent magnet pedestal, 6 is matrix, and 7 is winding, and 8 is iron core, 9 is the soft magnetism substrate, 21 for electroplating initial layers, and 22 are sacrifice property medium, and 23 for electroplating initial layers, 24 is mask lithography glue, and 25 is Cr/Cu or Ti/Cu initial layers.
Fig. 3 is the schematic diagram of a kind of planar design of soft magnetism substrate 9.
Among Fig. 3,31 is the soft magnetism substrate as magnetic channel, and 32 is as preventing the soft magnetism substrate that magnetic flux is dispersed.
Fig. 4 is an individual layer plane winding construction schematic diagram.
Fig. 4 (a) is the vertical view of individual layer plane winding construction, and Fig. 4 (b) is an end view.
Among Fig. 4,41 is the electrical conductor of winding, and 42 is dielectric, and 43/44 is the electric current introducing/exit of electrical conductor, and 45 for electroplating initial layers, and 46 is insulating cover, and 8 is the soft magnetism iron core of winding 7.
Fig. 5 is the typical structure design of cantilever beam.
Among Fig. 5,1 is cantilever beam, and 2 for turning round beam.The cross section of cantilever beam 1 is " ten " font among Fig. 5 (a), and the cross section of cantilever beam 1 then is " T " font among Fig. 5 (b).
Embodiment:
Further specify technical scheme of the present invention below in conjunction with accompanying drawing and concrete design implementation example.
Fig. 1 is a perspective view of representing a kind of modular design of major technique feature of the present invention, it is to be noted: the dimension scale of each several part might not optimization structure size according to the invention among the figure, only represents the mutual alignment relation of each several part.
With reference to shown in Figure 1, bistable microdrive of the present invention is to be distributed in the soft magnetism substrate 9 on the matrix 6, and bilateral symmetry is provided with a pair of permanent magnet pedestal 5 on it; Soft magnetism is turned round beam 2 and is placed on the pair of base 5 by soft magnetism transition zone 4 and forms bridge architecture; On the both sides soft magnetism substrate 9 of bridge one group of plane winding 7 is set respectively, wherein comprises iron core 8; The both sides two-way horizontal of turning round beam 2 middle parts stretches soft magnetism cantilever beam 1, and the cantilever beam two ends connect the top that magnet 3 just in time is in plane winding 7, and forms the air gap 10 that can supply cantilever beam to move between magnet 3 and iron core 8.
The material of above-mentioned each part of making introductions all round is below selected and design feature:
Matrix 6 can be selected according to the instructions for use of device, as the substrate of sheet glass, silicon chip, aluminium oxide ceramics or other any surfacing.For with the integrated needs of control circuit, silicon chip is to select preferably, but in some high-frequency element systems, the ceramic substrate of specific function more helps improving the performance of device, as aluminium oxide ceramics, BST pottery etc., in particular cases metal substrate also can use.Device thickness to substrate on the design principle does not have special requirement, and smooth substrate helps the enforcement of fine process.
Soft magnetism substrate 9 is mainly born the effect that compiles magnetic flux and set up transmission channel; with the high magnetic permeability soft magnetic material for well; wherein permalloy has practicality most; the permalloy film of electro-deposition particularly; not only internal stress is low; the magnetic permeability height, and can realize selective deposition easily by mask plating, at the subregion of matrix surface structure substrate and passage.Also can adopt the superior nano-magnetic thin-film material of soft magnet performance.The thickness of substrate can be peeked micron to tens of microns, is as the criterion can prevent effectively that magnetic flux from dispersing.
For soft magnetism substrate 9, continuous film shown in Figure 1 is its a kind of version, Fig. 3 has shown another kind of substrat structure form, wherein: linear structure 31 is soft magnetism substrates of bearing the magnetic channel function specially, box structure 32 is to reduce the soft magnetism substrate that magnetic flux is dispersed, and two parts have constituted a kind of new structure form of soft magnetism substrate.The advantage of this design be to turn round beam 2 and cantilever beam 1 under no longer include the soft magnetism substrate, will more help suppressing dispersing of magnetic flux on the beam.Also have different forms at different driver global designs in fact, assemble magnetic flux, construct passage and help the requirement of integrated manufacturing as long as can satisfy.
The plane winding 7 that contains iron core 8 comprises following fine structure (shown in Fig. 4 a) at least: plain conductor 41, electric current introducing/exit 43/44, dielectric 42, insulating cover 46 and iron core 8, wherein lead 41 grades can adopt satisfactory electrical conductivity metal preparations such as copper, gold, silver, dielectric 42 and 46 must coat whole leads 41 and two ends 43,44 thereof, forms the overall structure shown in Fig. 4 b.If adopt the mask plating method to prepare lead, then need be on the insulating barrier of realizing with substrate isolation deposition one deck plating seed layer 45 earlier, just otherwise the mask electro-deposition can't carry out.This Seed Layer is very thin usually, can be greater than 100 nanometers, as long as the Seed Layer outside at last lead being covered removes, the overall permanence of winding there are not much influences.
The overall space that the size of lead 41 is left for winding restricts, need try to achieve between around the number of turn and sectional area of wire and take into account, because lead 41 resistance values of mask electro-deposition are than higher, can not pursue umber of turn simply and do one's utmost to pursue the thin wire working ability, otherwise, the current load ability of winding 7 is too low, and driving voltage also can be higher, can't embody the low-voltage advantage of Electromagnetic Drive.But, it is normally useful to pursue limit working ability at thickness direction, help to alleviate the contradiction between the live width and the number of turn, mask plating technology based on thick glue degree of depth photoetching technique provides sizable development space for this reason, consider space availability ratio and reliability of technology, the thickness of individual layer lead 41 can be peeked micron to tens of microns according to the live width size, generally can be greater than 40 microns.
The number of turn and the sectional area of wire of single layer coil are subjected to space constraints, are difficult to sometimes satisfy than the large driving force demand, at this moment can constitute the lattice coil winding by the single layer winding stack, to reach the purpose that increases the number of turn.In fact, can realize as long as repeat said structure.
The iron core 8 of winding with directly link to each other with soft magnetism substrate 9, constituted the part of closed magnetic circuit, play the effect that the winding magnetic flux is dispersed that suppresses simultaneously, adopt the material preparation same, such as permalloy or other soft magnetic material with soft magnetism substrate 9.Consider from processing compatibility, adopt the permalloy of mask electro-deposition the most favourable here.The thickness of iron core 8 guarantees to exist at least small air gap 46 a little less than dielectric 42.The size of horizontal direction because of with the competition for space of winding, so can not be very big, generally get between the 5%-20% that iron core 8 floor spaces account for winding 7 total floor spaces.If iron core 8 areas are bigger, can also adopt subregion electroforming way, iron core 8 is divided into a series of littler unit to reduce eddy current loss, improve the high-frequency work characteristic.
The dielectric 42 of winding mainly is directly electrically contacting between coil-conductor and the substrate in the isolated winding (but allowing an end 43 of lead 41 to pass to energized mutually with iron core 8), also fill simultaneously the space between the lead 41, prevent that the accident between the coil adjacent wires 41 from linking up.The material that can use comprises various dielectrics such as polyimides, various photoresist, multiple organic substance, aluminium oxide etc.Dielectric 42 is thicker than winding conductor 41, guarantees all can effectively insulating up and down of winding wire.
Soft magnetic bodies 4 main effects are that the magnetic flux that reduces permanent magnet 5 is dispersed, the material selection is similar to soft magnetism substrate 9 with process choice, thickness does not have very strict requirement, can significantly suppress the permanent magnet magnetic flux disperses and gets final product, the thickness increase does not have tangible limiting factor, and this provides convenience for the height of suitably regulating the bearing base of turning round beam 2.
Turn round beam 2 carrying total movement structures, according to global design thought, the primary structure distortion that motion causes also occurs in to be turned round on the beam 2, it also switches for stable state provides part actuating force (distortion restoring force), it still is the part of closed magnetic circuit in parallel simultaneously, so, turn round the version that particular design must be made and be adopted to beam 2 by soft magnetic material.Consider that from the magnetic property aspect foundation that material is selected is similar to substrate 9, still, must take into account mechanical performance and little processing feasibility here simultaneously, particularly when its Mechanical Builds was very important, this point was even more important.The possible material of tool that can take into account above-mentioned requirements remains the soft magnetic material of electro-deposition, as permalloy etc.
The shape of turning round beam 2 is preferably anisotropic, turn round on the beam 2 because wish that most of deformation occurs in, rather than above the cantilever beam 1, so, its torsional rigidity can not be too big, but the weight of carrying cantilever beam 1 and magnet 3, and the impact of their high-speed motions, need it to have higher intensity, so the structure depth-width ratio of turning round beam 2 should be greater than 1 in vertical direction, as for its concrete numerical value of width, height and length, the relation that then has mutual restriction, it is long more to turn round beam 2 length, and the width of permission and height value are also big more.The global design thought of being showed with reference to figure 1, turning round the length of beam 2 can get between 100～1000 microns, corresponding thickness can be between 3～100 microns, and width can be between 1～50 micron, and definite numerical value will be determined according to design parameter combined process condition.Turn round beam 2 and can also get the version of other particular design to satisfy the requirement of system, such as tortuous beam etc. to its intensity anisotropy.
Cantilever beam 1 is distributed in the both sides of turning round beam 2 to the both direction horizontal stretching, in structure of the present invention, it and unlike cantilever beam be the main carrier that produces distortion and then cause moving like that, its effect is presented as more around turning round beam 2 makes circular motion, amplify the torsional deflection of turning round beam 2, and self can keep substantially original form constant.For this reason, need the intensity of cantilever beam apparently higher than turning round beam, so the physical dimension of cantilever beam 1 and shape are different from turns round beam 2.Yet, consider that from the response speed restraining factors of moving component the cantilever beam 1 of desired movement is too unheavy again, therefore, need carry out particular design to its structure, so that obtaining the high-intensity lower quality that has simultaneously.
Fig. 5 has showed two kinds of typical structural design examples, and wherein a kind of cross section of cantilever beam 1 is " ten " font, and another kind then is " T " font, and they can reduce the movement inertia of cantilever beam 1 to a certain extent and have high mechanical strength.Reach two kinds that the design of aforementioned effect and more than Fig. 5 are showed, any version that can reduce cantilever beam 1 movement inertia and strengthen its mechanical strength simultaneously all can adopt.
The length of cantilever beam 1 has a direct impact the displacement of microdrive, but does not have tangible restraining factors to limit its selection, and each 50～1000 microns of side arm length is proper, does not get rid of the longer possibility of special circumstances lower cantalever certainly.
Cantilever beam 1 also is simultaneously the part that stable state keeps magnetic circuit, the requirement on magnetism of material with turn round beam 2 basically identicals.
Magnet 3 links to each other with the outer end of cantilever beam 1, it is the extensional section of cantilever beam 1, participate in electromagnetic action directly and produce actuating force or attitude confining force, also be the part of closed magnetic circuit, the size of this section magnet mainly is that end face with winding iron core 8 is complementary than cantilever beam 1 purpose bigger than normal, to reduce the loss that magnetic flux is dispersed, if the size of cantilever beam 1 can be suitable with it, then can get the size the same with cantilever beam 1 fully, like this, magnet 3 is the extension of cantilever beam 1 just.
The bistable microdrive that possesses above-mentioned material and architectural feature can adopt the integrated manufacturing of micromachining technology of non-silicon materials, Fig. 2 has provided the profile of a series of intermediate structures in little course of processing, by these structural diagrams that shows process, it is as follows to set forth main manufacturing process of the present invention:
1. with reference to Fig. 2 a, adopt common process, at first deposit on the matrix 6 and electroplate initial layers 21, be coated with photoresist, through technologies such as photoetching, development, plating soft magnetic material such as permalloys, the back of removing photoresist constitutes the soft magnetism substrate 9 as magnetic channel, and this substrate also can adopt the dry method deposition process to prepare continuous film, realize graphically with mask chemical etching technology then, so just do not need to deposit in advance and electroplate initial layers 21.
2. then prepare dielectric isolation layer 42 on soft magnetism substrate 9, insulating barrier can be used inorganic matter, photoresist or other organic substances, and as aluminium oxide, silica SU-8 glue or the like, thickness should be can guarantee that insulation effect is as the criterion.Which kind of insulating material that don't work all should be done graphical processing, for the window that connects the soft magnetism substrate is reserved in iron core 8 preparations of back.Adopt conventional mask plating technology on dielectric isolation layer, to make plane winding 7 (referring to Fig. 2 b) then.
Once more gluing and make that glue is thick and be slightly larger than before once, according to common process photoetching, development, electro-deposition and remove photoresist, be made into the iron core 8 of winding 7.
4. adopt selective chemical lithographic method or reverse sputtering lithographic method to remove the expose portion of the back initial layers 45 that removes photoresist, expose dielectric isolation layer, with between the winding adjacent wires of the same medium filling molding of separator and the space between winding and iron core, exceed the height of conductor 41 and iron core 8 up to place, slit dielectric layer again.
Above-mentioned composite structure surface is uneven everywhere, till being thinned to conductor 41 and iron core 8 and just having exposed with precise finiss technology leveling, and then prepare 1～2 micron insulating barrier 46, and, just can obtain the central microstructure shown in Fig. 2 c according to the dielectric outside the conventional method removal winding.
If desired, above-mentioned processing step 2-4 can be repeated and just the laminated construction winding can be prepared.
5. then adopt the little galvanoplastics processing of mask permanent magnet 5, just can obtain the central microstructure shown in Fig. 2 d after removing photoresist.
Micro-structural shown in Fig. 2 d is filled sacrifice property medium 22, and make the setting thickness of the minimum thickness of filler, be ground to the setting thickness of permanent magnet 5, obtain the smooth surface shown in Fig. 2 e, as the compound substrate that continues processing greater than permanent magnet 5.The selection of filled media 22 is very important, it must with the micro-structural compatibility that existed on the substrate, can machine the back in superstructure again simultaneously and be removed by the selectivity etching.The material that can select such as photoresist (positive glue, SU-8 glue), aluminium oxide, electrodepositing zinc etc., wherein the low stress sulfate zinc plating can better be taken into account many-sided requirement, can adopt, and treats to remove with the watery hydrochloric acid selective etch after superstructure is finished.
6. adopt common process on the surface of the compound substrate shown in Fig. 2 e, through sputtering seed layer 23, gluing, photoetching, development, the processing step of electroplating and remove photoresist etc., the soft magnetism transition zone 4 of preparation permanent magnet 5, the foundation that material is selected is with soft magnetism substrate 9, planar dimension is suitable with the permanent magnet cross section, thickness there is no strict demand, as long as can guarantee greater than several microns that magnetic flux does not have too much disperses, so, can suitably adjust the height of turning round beam 2 pedestals by by these reaction steps, (Fig. 2 f) makes it accurately to adhere to specification.
7. be coated with photoresist once more, adopt common process, through photoetching, development, the technology of electroplating and remove photoresist, beam 2 (Fig. 2 g) is turned round in preparation.Turn round the iron-nickel alloy that beam adopts electro-deposition, the length of beam, width are set when the designed mask plate, thickness is by the control of mask electro-deposition thickness, and by adjusting the size on the above-mentioned all directions, this technology can be processed the anisotropy micro-structural to satisfy turning round the specific (special) requirements of beam 2.
8. magnet 3 can be finished in the technical process of beam 2 is turned round in preparation together, as long as just can at corresponding position windowing when the designed mask plate; Also can adopt similar technology to prepare separately, be convenient to control air gap 10 height like this.The mask lithography glue 24 that keeps final step is so form the micro-structural shown in Fig. 2 h.
9. above-mentioned electro-deposition is turned round the structure (Fig. 2 h) of beam 2 and magnet 3 if top is smooth inadequately, can adopt precision cutting equipment rotary-cut levelling, and then sputtering sedimentation Cr/Cu or Ti/Cu initial layers 25, adopt conventional mask electro-deposition iron-nickel alloy soft magnetic ribbon membrane process to make cantilever beam 1 then, it is identical that beam 2 is turned round in technological process and the 7th step preparation, thickness will be turned round beam 2 and magnet 3 and connect (shown in Fig. 2 i) according to set point on the length direction.
10. adopt acetone and watery hydrochloric acid successively, in conjunction with ultrasonic agitation, each time of etching sacrifice property filled media and transition zone (plating initial layers) just can obtain the bistable electromagnetic shown in Fig. 2 j and drive the microdrive prototype structure.
The microdrive of above-mentioned design has one group of toroid that symmetry is in parallel, and they can not be closed simultaneously, but closure state can substitute mutually.Arbitrary magnetic circuit closure just forms the stable state that a no power consumption attitude keeps, and makes microdrive have bistable Electromagnetic Drive ability on this basis.
At the initial state that does not have impressed current to pass through, turn round beam 2 and keep initial condition, the magnet 3 that the cantilever beam 1 of both sides holds up does not contact with winding, the magnetic flux that permanent magnet 5 produces is divided into two parts naturally, form the loop that both sides all have air gap to exist by two magnetic circuits respectively, it is identical to turn round the gravitation that beam 2 both sides cantilever beams 1 two ends are subjected to, and keeps original attitude.At this moment give the winding energising of the plane in two loops, the magnetic field that allows them produce increases a loop magnetic flux, and the magnetic flux in another loop reduces, then the stressed increase of a side of cantilever beam 1, and the stressed minimizing of opposite side, cantilever beam 1 tilts to a direction.This restoring force that be turned round beam 2 by a part of meeting of the actuating force that produced by force unbalance is offset, but, as long as winding 7 electric currents are enough big, the magnet of cantilever beam 1 end just can make air gap 10 in this side loop up substantially through enough displacements, reach the locating point position that contacts with the surface of the dielectric 42 of winding 7, form and be close to closed magnetic circuit.At this moment disconnect winding 7 electric currents again, because these side magnetic air gap 10 magnetic resistance disappear substantially, the magnetic flux major part that permanent magnet produced will form the loop via this close passage, so, as long as reasonable in design, have enough trying hard to keep and hold this positioning states, a stable state of said system that Here it is.Make cantilever beam 1 leave present stable state, as long as while making current in two windings 7, make the sense of current opposite with preceding once electrification direction, will in the magnetic circuit of closure, produce the effect that weakens permanent magnet 5 magnetic flux that produces like this, the electromagnetic attraction at these magnetic air gap 10 places just can reduce, on the contrary, magnetic flux in another magnetic circuit can increase because of the stack of permanent magnet 5 with the magnetic flux of inducting, thereby gravitation increases, that disappears, and this is long, add the restoring force acting in conjunction of turning round beam 2, stable state originally just might be broken, and cantilever beam 1 can tilt to another direction, and forms the no power consumption stable state of another symmetry equally, finished displacement simultaneously in the process that the end of cantilever beam 1 realizes switching between stable state, so just constituted bistable electro magnetic driven device of the present invention.
Microdrive of the present invention only needs the simple signal processing circuit that inserts just can constitute switch or relay.
Claims (10)
1, a kind of bistable electromagnetic type microdrive, it is characterized in that to be distributed in the soft magnetism substrate (9) on the matrix (6), bilateral symmetry is provided with a pair of permanent magnet pedestal (5) on it, soft magnetism is turned round beam (2) and is placed in upward formation bridge architecture of pedestal (5) by soft magnetism transition zone (4), one group of plane winding (7) that comprises iron core (8) is set respectively on the both sides substrate (9) of bridge, the both sides two-way horizontal of turning round beam (2) middle part stretches soft magnetism cantilever beam (1), the magnet (3) that the cantilever beam two ends connect just in time is in the top of plane winding (7), and forms the air gap (10) that can supply cantilever beam to move between magnet (3) and iron core (8).
2, as the said bistable electromagnetic type of claim 1 microdrive, it is characterized in that the iron core (8) of winding directly links to each other with soft magnetism substrate (9), constitute the part of closed magnetic circuit, iron core (8) floor space accounts for the 5%-20% of the total floor space of winding (7).
3,, it is characterized in that the cross section of cantilever beam (1) is " ten " font or " T " font as the said bistable electromagnetic type of claim 1 microdrive.
4,, it is characterized in that turning round the structure depth-width ratio of beam (2) greater than 1 as the said bistable electromagnetic type of claim 1 microdrive.
5,, it is characterized in that turning round the version that beam (2) can also adopt tortuous beam as the said bistable electromagnetic type of claim 1 microdrive.
6, as the said bistable electromagnetic type of claim 1 microdrive, it is characterized in that magnet (3) links to each other with the outer end of cantilever beam (1), be the extensional section or the extension of cantilever beam (1).
7,, it is characterized in that the box structure (32) that soft magnetism substrate (9) is dispersed by the linear structure of bearing the magnetic channel function (31) and reduction magnetic flux combines as the said bistable electromagnetic type of claim 1 microdrive.
8,, it is characterized in that plane winding (7) is single layer structure or laminated structure as the said bistable electromagnetic type of claim 1 microdrive.
9, a kind of preparation method of bistable electromagnetic type microdrive, it is characterized in that upward at first processing the soft magnetism substrate (9) of design by the mask plating method at matrix (6), on the soft magnetism substrate, process the plane winding (7) of two groups of ribbon cores (8) then by non-silicon micromachining technology, make miniature permanent magnet (5) by integrated manufacturing technology again, the bottom of permanent magnet (5) places on the soft magnetism substrate, top makes soft magnetic material cover layer (4) with Micrometer-Nanometer Processing Technology, and turn round beam (2) by sacrificial layer technology and mask electrodeposition technology structure soft magnetism on this basis, cantilever beam (1) and front end magnet (3) thereof will be turned round the release of beam (2) cantilever beam (1) and front end magnet (3) and just constitute a kind of electromagnetic type micro driver with bi-stable function.
10,, it is characterized in that iron core (8) adopts the processing of subregion electroforming way as the preparation method of the said bistable electromagnetic type of claim 9 microdrive.
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| CN 03116583 CN1207744C (en) | 2003-04-24 | 2003-04-24 | Bistable electromagnetic microdriver and mfg. method thereof |
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| CN 03116583 CN1207744C (en) | 2003-04-24 | 2003-04-24 | Bistable electromagnetic microdriver and mfg. method thereof |
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| CN1452202A true CN1452202A (en) | 2003-10-29 |
| CN1207744C CN1207744C (en) | 2005-06-22 |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN100414651C (en) * | 2005-05-19 | 2008-08-27 | 上海交通大学 | Integral permanent-magnet bistable micro electromagnet driver |
| CN100424801C (en) * | 2005-06-09 | 2008-10-08 | 厦门宏发电声有限公司 | Polarized relay with high sensitivity |
| CN100429732C (en) * | 2005-06-09 | 2008-10-29 | 厦门宏发电声有限公司 | Armature-setting reliable and replacement convenient polarized relay with double-acting air gap |
| CN100456411C (en) * | 2007-02-01 | 2009-01-28 | 上海交通大学 | Magnetic bistable micromachine relay with convenience to integrated manufacture |
| CN102790547A (en) * | 2012-07-18 | 2012-11-21 | 天津大学 | Bistable and double cantilever beam piezoelectric power generating device |
| CN103133580A (en) * | 2013-02-27 | 2013-06-05 | 大连理工大学 | Variable-thickness plate based multi-stable variant structure |
| CN107659208A (en) * | 2017-10-19 | 2018-02-02 | 西安交通大学 | Two-dimensional linear moving-iron type micro-angular displacement electromagnetic activation device and its start method |
| CN111474633A (en) * | 2020-05-26 | 2020-07-31 | 上海工程技术大学 | Electromagnetic double-reflector MEMS optical switch |
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- 2003-04-24 CN CN 03116583 patent/CN1207744C/en not_active Expired - Fee Related
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100414651C (en) * | 2005-05-19 | 2008-08-27 | 上海交通大学 | Integral permanent-magnet bistable micro electromagnet driver |
| CN100424801C (en) * | 2005-06-09 | 2008-10-08 | 厦门宏发电声有限公司 | Polarized relay with high sensitivity |
| CN100429732C (en) * | 2005-06-09 | 2008-10-29 | 厦门宏发电声有限公司 | Armature-setting reliable and replacement convenient polarized relay with double-acting air gap |
| CN100456411C (en) * | 2007-02-01 | 2009-01-28 | 上海交通大学 | Magnetic bistable micromachine relay with convenience to integrated manufacture |
| CN102790547A (en) * | 2012-07-18 | 2012-11-21 | 天津大学 | Bistable and double cantilever beam piezoelectric power generating device |
| CN102790547B (en) * | 2012-07-18 | 2015-08-05 | 天津大学 | Bistable state double cantilever beam piezoelectric generating device |
| CN103133580A (en) * | 2013-02-27 | 2013-06-05 | 大连理工大学 | Variable-thickness plate based multi-stable variant structure |
| CN103133580B (en) * | 2013-02-27 | 2014-12-31 | 大连理工大学 | Variable-thickness plate based multi-stable variant structure |
| CN107659208A (en) * | 2017-10-19 | 2018-02-02 | 西安交通大学 | Two-dimensional linear moving-iron type micro-angular displacement electromagnetic activation device and its start method |
| CN111474633A (en) * | 2020-05-26 | 2020-07-31 | 上海工程技术大学 | Electromagnetic double-reflector MEMS optical switch |
| CN111474633B (en) * | 2020-05-26 | 2022-06-03 | 上海工程技术大学 | Electromagnetic double-reflector MEMS optical switch |
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| CN1207744C (en) | 2005-06-22 |
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