CN1355063A - Process for preparing microporous film and its die pressing equipment - Google Patents
Process for preparing microporous film and its die pressing equipment Download PDFInfo
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- CN1355063A CN1355063A CN 00132532 CN00132532A CN1355063A CN 1355063 A CN1355063 A CN 1355063A CN 00132532 CN00132532 CN 00132532 CN 00132532 A CN00132532 A CN 00132532A CN 1355063 A CN1355063 A CN 1355063A
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Abstract
A process for prepairng microporous membrane includes such steps as generating conic pits on the solid probing material by physical, chemical, or mechanical method, and die pressing to directly from microporous membrane. Its advantages is smooth inner wall of microporous membrane.
Description
The present invention relates to a kind of preparation method and molding device thereof of microporous barrier, particularly relate to a kind of solid trace reproduction technology that adopts and carry out the technology that micropore is produced, belong to electric treatment technical field in the physics.
Existing nuclear pore membrane has shiploads of merchandise on the market at home and abroad, its preparation method is as follows: quicken charged particle on accelerator, make it have certain energy, beat then on plastic sheetings such as Merlon, charged particle produces the track damage on the cross section of polycarbonate film, after chemical etching, produce perforation, the energy of charged particle and particle kind should be selected according to the material and the thickness of nuclear pore membrane, that is to say that microporous membrane material sensitivity is high more, thickness is thin more, charged particle can be light more, energy can be low more, can produce puncture injury with it on the microporous barrier cross section and be as the criterion, then according to charged particle intensity and irradiation time decision, its micro-pore diameter size then obtains in conjunction with etching condition according to customer requirements the pore density on the microporous barrier in every square centimeter.Because nuclear pore membrane has many advantages than cellulose membrane, be used widely in various fields such as scientific research, medical science, biology, yet, aperture rough inner surface etc. low owing to apparatus expensive, complex process, the intensity of production nucleopore membranes is restricted.
The preparation method that the purpose of this invention is to provide a kind of microporous barrier, adopt solid trace reproduction technology, microelectronics electrical forming to make die work version with metal needle identical with micro-pore diameter with mould pressing technology, it is contained in produces micropore inner wall smooth, mechanical strength height and low-cost microporous barrier on the special molding device, thereby reach purpose of the present invention.
Below be to realize the object of the invention technical scheme:
A kind of microporous barrier preparation method is characterized in that this method may further comprise the steps:
1, the solid state track detector plate of material is placed on irradiation in the heavy charged particle pipeline, or the computer control power generator is ablated or with after the microelectronic technique etching, become through chemical etching, neutralization, cleaning, oven dry again and duplicate mother matrix;
2, make its deposition skim metal duplicating on the mother matrix, then after electroforming and become metal mother with coating process;
3, to above-mentioned metal mother after casting for twice and become the metal layout;
4, above-mentioned metal layout is installed on the layout head of layout machine, according to the mold pressing width layout material is carried out layout and become the mold pressing mother matrix;
5, become metal pattern to carrying out electroforming again after the vacuum coating of above-mentioned mold pressing mother matrix and press mother matrix;
6, above-mentioned metal mold pressing mother matrix is carried out casting for twice and become the die work version;
7, at the adiabatic medium of the surface of above-mentioned die work version spraying one deck, make it when mold pressing, not damage the microporous barrier surface;
8, above-mentioned die work version is contained in the molding device version and rolls on, roll temperature and pressure, can produce microporous barrier according to plastic film material decision version.
The essence of above-mentioned making microporous barrier is to ablate with heavy ion bombardment, computer controlled laser or ion beam, or on a kind of solid material, produce conical pit, cylindricality hole or rhombus hole with methods such as microelectronic techniques, and then on metallic plate, form the metal needle of different densities and diameter with duplication process such as chemical deposition, vacuum evaporation, sputter, electroforming, the version that then it is contained in molding device rolls on carries out mold pressing to plastic foil, can produce pore density and the micro-pore diameter microporous barrier consistent with the die work version.
Above-mentioned solid state track detector material can be mica, CR39, Merlon, polyester etc.; But the heavy charged particle energy selects to make it to produce etch damage greater than microporous barrier thickness in solid state track detector.For example microporous barrier thickness is 10 μ m, and heavy charged particle should be the argon ion of energy greater than 150Mev; Its beam intensity multiply by the average pore density that irradiation time should equal the microporous barrier requirement; The chemical etching condition should be according to using material for detector and different, and for example Merlon should use 70 ℃ of 6.25NNaOH to come etching, and etching period meets the demands with the micro-pore diameter and the degree of depth and is as the criterion.
The device that is used for the mold pressing microporous barrier by version roll, keep off roll, pressurizer, heater, motor, compressor etc. form, wherein version is rolled by metal material and is made, retaining rolls by metal or plastic material to be made, for example polytetrafluoroethylene (PTFE) or other heat resistant plastices etc.; Heater is with electric heating oil heating back importing version to be rolled to make it be heated to predetermined temperature, temperature is 80 ℃-160 ℃, decide according to the heat-resisting situation of microporous barrier material, pressurizer links to each other with compressor, rolls and keep off pressure and the moving speed of version lift-over between rolling according to the requirement of die work version decision version.
Can bring following good effect after the invention process:
The first, use accelerator to produce version from using accelerator production microporous barrier to become, reduced of the dependence of microporous barrier production technology, thereby reduced working condition and cost significantly expensive device;
The second, because the change of manufacture craft makes microporous barrier pore density and aperture all more stable, the aperture inwall is Paint Gloss, has obviously improved the microporous barrier quality.
The 3rd, because mould pressing process is compared with etch process with former irradiation, its manufacturing speed differs greatly, thereby can increase substantially product yield.
The present invention has following accompanying drawing:
Fig. 1 is a microporous barrier mask-making technology schematic flow sheet
Fig. 2 is the molding device structural representation
Fig. 3 duplicates the mother matrix schematic diagram for ablating to make with power generator
Fig. 4 duplicates the mother matrix schematic diagram for utilizing microelectronic technique to make
The present invention is described in further detail below in conjunction with drawings and Examples:
According to the user microporous barrier thickness requirement is determined heavy charged particle kind and energy; According to micropore fenestra density is determined heavy charged particle beam intensity and irradiation time; According to the microporous barrier micro-pore diameter being required to determine etching period; Microporous barrier thickness is decided to be 10 μ m, pore density average out to 10 in this enforcement
5Individual/cm
2Micro-pore diameter average out to 6 μ m; Selecting thick is 1 millimeter CR39 plate 100cm
2, at middle 5 * 5cm
2Accept the argon ion radiation of 200Mev on the position, the control irradiation time makes its track density average out to 10
5Individual/cm
2Use 70 ℃ then, till when 6.25NNaOH etching makes the track bore dia reach average out to 6 μ m, become with oven dry after the washed with de-ionized water again with 1% aqueous solution of nitric acid neutralization and to duplicate mother matrix 1, put it in the vacuum coating equipment, plate one deck electrode with vacuum evaporation or sputtering method, put into the electrotyping bath electroforming then, electric weight is controlled at 20-60, its THICKNESS CONTROL is about 100 μ m, and become metal mother 2, to behind the electrotyping bath stiffened metal mother 2 be carried out casting for twice and become metal layout 3, it is installed on the layout head of commercially available layout machine, at one thick 1.5 millimeters, long 250 millimeters, carry out becoming after the layout mold pressing mother matrix 4 on the wide 200 millimeters polycarbonate plate, it is carried out vacuum coating or chemistry soaks and carries out electroforming again behind the silver and become metal pattern and press mother matrix 5, carry out casting for twice the back again and become die work version 6, plate the adiabatic medium of one deck in the metal needle gap of die work version 6 with RF sputtering method, as the silica dioxide medium film, the version that at last it is contained in the commercially available moulding press of repacking rolls on can produce the mold pressing microporous barrier.As shown in Figure 1.
The device that is used for the mold pressing microporous barrier rolls 7 by version, retaining rolls 8, pressurizer 9, heater 10, motor 11, compressor 12 compositions such as grade, wherein version is rolled 7 and is made by metal material, retaining rolls 8 and is made by metal or plastic material, make by polytetrafluoroethylmaterial material in the present embodiment, heater 10 is made of heating wire and oil guide pipe 16, rolling 7 by pump driving deep fat importing version makes its temperature reach normal value, heat-resisting situation according to the microporous membrane material that is molded, be generally 80 ℃-160 ℃, concrete numerical value is by the experiment decision, the effect of compressor 12 provides pressurization power, by pressurizer 9 make version roll 7 roll 8 with retaining between by pressurizeing, make the metal pinprick on the die work version 6 wear microporous barrier 13 and become micropore, make whole molding device running by motor 11, unreeling wheel 14 is constantly emitted, after mold pressing, constantly pack up by winding wheel 15, and continuously produce microporous barrier 13, as shown in Figure 2.
Embodiment 2
Present embodiment has illustrated that appliance computer 18 control power generators are ablated out and has duplicated the situation of mother matrix 1.
As shown in Figure 3, power generator 17 is the various devices that can ablate such as laser instrument or ion beam generator on solid dielectric.Under computer control, making laser instrument or ion beam focus on the back earlier ablates a bit on polycarbonate plate, driving X, Y movable stand again makes X, Y move a step-length respectively, ablate a bit again, progressively on polycarbonate plate, ablate into the conical pit of predetermined area, also can directly form conical pit with Mechanical Method, duplicate mother matrix 1 and become, other are with embodiment 1.
Embodiment 3
Present embodiment has illustrated that using microelectronic technique makes the situation of duplicating mother matrix 1.
As shown in Figure 4, make mask version 19 with microelectronic technique earlier, it can have the open-work of certain area for having the film of certain viscosity on it.It is bonded at polycarbonate plate carries out etching, can directly on Merlon, produce identical taper hole and distribute and become and duplicate mother matrix 1; Also can directly carry out uv-exposure after directly coating photoresists 20 on the polycarbonate plate, the washing back forms open-work etching more then, and porose place forms conical pit and becomes copied line version 1, and all the other are with embodiment 1.
Claims (9)
1, a kind of preparation method of microporous barrier, this method is to select a kind of solid trace duplication process or the power generator that computerizeds control to ablate or make with microelectronic technique to produce damage on the solid dielectric, form metal mold pressing working version after electroforming the direct mold pressing of microporous membrane material is generated micropore, this method may further comprise the steps:
1., the solid state track detector plate of material is placed on irradiation in the heavy charged particle pipeline, or ablate or with after the microelectronic technique etching with computer (18) control power generator (17), become through chemical etching, neutralization, cleaning, oven dry again and duplicate mother matrix (1);
2., upward with coating process and make its deposition skim metal duplicating mother matrix (1), then after electroforming and become metal mother (2);
3., to above-mentioned metal mother (2) after casting for twice and become metal layout (3);
4., above-mentioned metal layout (3) is installed on the layout head of layout machine, according to the mold pressing width layout material is carried out layout and become mold pressing mother matrix (4);
5., become metal pattern to carrying out electroforming again after above-mentioned mold pressing mother matrix (4) vacuum coating and press mother matrix (5);
6., above-mentioned metal mold pressing mother matrix (5) is carried out casting for twice and become die work version (6);
7., at the adiabatic medium (23) of the surface of above-mentioned die work version (5) spraying skim; Make it when mold pressing, not damage microporous barrier (13) surface;
8., above-mentioned die work version (6) be contained in the molding device version roll on (7), roll temperature and pressure according to plastic film material decision version, can produce microporous barrier.
2, preparation method as claimed in claim 1, wherein the 1. described mother matrix (1) that duplicates of step is mica, CR39, Merlon, polyester etc.;
3, preparation method as claimed in claim 1 is characterized in that described thickness and the microporous barrier thickness that duplicates mother matrix (1) should follow following principle: according to microporous barrier thickness L determine to duplicate mother matrix (1) thickness (be generally＞10L); The kind of heavy charged particle and the selection of energy should make its duplicate mother matrix (1) but in the etching tracks damage of generation＞1.5L;
4, preparation method as claimed in claim 1, wherein the 7. described adiabatic medium of step (22) is polytetrafluoroethylene (PTFE), silica or other high-temperature resistance plastice etc.;
5, preparation method as claimed in claim 1, wherein 1. described mother matrix (1) the available computers control power generator that duplicates of step is ablated on the solid scutum and is formed, and power generator can be laser instrument, ion beam generator etc.;
6, preparation method as claimed in claim 1, wherein step is 1. described duplicates the also available microelectronic technique of mother matrix (1) or Mechanical Method is made;
7, a kind of molding device of realizing above-mentioned preparation method, by the version that die work version (6) is housed roll (7), the retaining that rolls (7) moulded plastic film with version rolls (8), can change version rolls (7) with retaining and roll the pressurizer (9) of pressure between (8) and give the power-producing compressor of pressurizer (9) (12), rolls the heater (10) of (7) temperature adjustment and oil guide pipe (16) thereof, the unreeling wheel (14) of supply plastic foil, the winding wheel (15) of reception plastic foil to version, and provides the motor (11) of whole device rotatory force to form;
8, device as claimed in claim 7, wherein said version roll (7) and are metal material, and retaining rolls (8) and made by polytetrafluoroethylene (PTFE) or temperature-resistant material;
9, device as claimed in claim 7, wherein said die work version (6) and version roll between (7) that bonding or high-temp glue is bonded with the high temperature Double-face gummed paper.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 00132532 CN1132666C (en) | 2000-11-27 | 2000-11-27 | Process for preparing microporous film and its die pressing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 00132532 CN1132666C (en) | 2000-11-27 | 2000-11-27 | Process for preparing microporous film and its die pressing equipment |
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| CN1355063A true CN1355063A (en) | 2002-06-26 |
| CN1132666C CN1132666C (en) | 2003-12-31 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN 00132532 Expired - Fee Related CN1132666C (en) | 2000-11-27 | 2000-11-27 | Process for preparing microporous film and its die pressing equipment |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103083958A (en) * | 2011-11-08 | 2013-05-08 | 刘子渊 | Liquid filter |
| CN104201094A (en) * | 2014-08-28 | 2014-12-10 | 李忠海 | Heavy-ion micro-porous membrane etching device |
| CN112987077A (en) * | 2021-03-22 | 2021-06-18 | 中国科学院近代物理研究所 | Low-energy ion beam detection and ion beam current strength self-balancing interlocking control system |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100391547C (en) * | 2005-12-08 | 2008-06-04 | 长春吉原生物科技有限公司 | Nuclear pore membrane composite medical dressing |
-
2000
- 2000-11-27 CN CN 00132532 patent/CN1132666C/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103083958A (en) * | 2011-11-08 | 2013-05-08 | 刘子渊 | Liquid filter |
| CN104201094A (en) * | 2014-08-28 | 2014-12-10 | 李忠海 | Heavy-ion micro-porous membrane etching device |
| CN104201094B (en) * | 2014-08-28 | 2017-02-01 | 李忠海 | Heavy-ion micro-porous membrane etching device |
| CN112987077A (en) * | 2021-03-22 | 2021-06-18 | 中国科学院近代物理研究所 | Low-energy ion beam detection and ion beam current strength self-balancing interlocking control system |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1132666C (en) | 2003-12-31 |
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