CN1325970C - Multilayer plate for the fabrication of a display panel - Google Patents
Multilayer plate for the fabrication of a display panel Download PDFInfo
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- CN1325970C CN1325970C CNB028226941A CN02822694A CN1325970C CN 1325970 C CN1325970 C CN 1325970C CN B028226941 A CNB028226941 A CN B028226941A CN 02822694 A CN02822694 A CN 02822694A CN 1325970 C CN1325970 C CN 1325970C
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- layer
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- multilayer board
- film crystal
- protective seam
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/13363—Birefringent elements, e.g. for optical compensation
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133345—Insulating layers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/13356—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements
- G02F1/133565—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements inside the LC elements, i.e. between the cell substrates
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2413/00—Indexing scheme related to G02F1/13363, i.e. to birefringent elements, e.g. for optical compensation, characterised by the number, position, orientation or value of the compensation plates
- G02F2413/02—Number of plates being 2
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Polarising Elements (AREA)
Abstract
The herein invention pertains to devices for presenting information in particular elements of liquid crystal displays, and is aimed at creating a multilayer plate, which may be used in the manufacture of liquid crystal displays, as well as at devising a design of displays with internal polarizers. The technical result of the disclosed invention is the increase of reliability and decrease of thickness of the display, as well as lowering of the manufactuing costs, an increase of useful yield and lowering the number of manufactuing operations in the process of display assembly. Technical result is achieved by the fact that the multilayer plate comprises optically transparent substrate (6), protective layer (3), conducting layer, and also at least on elayer of anisotropic membranous crystal (2). Moreover, membranous crystal (2) is formed out of material, which contains aromatic rings and has Braggpe ak at 3.4 +/- 0.2 Augstrom (=0.34+0.02 nm) a long one of the optical axes. Besides that, the disclosed technical result is achieved by the fact that the display panel comprises optically transparent substrate (6), protective layer (3), system of electrodes (7), and also at least one layer of membranous crystal.
Description
Technical field
The present invention relates to the device of display message, be specifically related to liquid crystal (LC) display unit.
Background technology
Traditionally, LCD has smooth cuvette form, and it has two parallel flats, and optical transparency conductive material (for example, solid solution SnO is set on the surface within it
2And I
2O
3-the electrode system ITO) made.Planar surface with electrode applies one deck polyimide or other polymkeric substance usually, carries out particular processing then, near the planar surface and the specific even orientation that forms liquid crystal (LC) molecule in the liquid crystal layer volume at display.After the assembling cuvette, wherein filling liquid crystal is the liquid crystal layer of 5-20 μ m to form thickness.LC represents active medium, changes its optical property under electric field effects.The variation of recording optically character in the polarizer that intersects, polarizer adheres to the outer surface [L.K.Vistin.JVHO, 1983, vol.XXVII, ed.2, pp.141-148] of cuvette usually.
In the prior art, display board is to utilize to have the flat board of glass substrate and conductive layer to make.Glass plate should be very smooth and have bubble and other a optical defect.Relevant with the condition of work of display, people utilize the base substrate that various conductive layers are arranged.For the display that is operated under the transmission mode, conductive layer is transparent.For the display that is operated under the reflective-mode, the header board of display is to make with transparency conducting layer, and plate is to make with reflective conductive layer thereafter.[A.A.Groshef，V.B.Sergeev，Devices?for?presenting?information?based?onLC，“Energia”，L.1977]。The surface resistance of transparency conducting layer is to 10 at 10 ohm
2Between ohm, the transmission coefficient in the visible range is 0.7 to 0.9.The deposition process that utilization is known is made conductive layer.
Usually, the matrix of display board is formed on each flat board.On each display board, make required electrode structure by means of mask etching.Electrode appears at the edge of glass, and ends at the pad that connects outside lead.The etched groove of independent display board is separated, and along these grooves display is bonded together then.In order between each display board, to form required gap, separate these display boards with dividing plate along its periphery.In heated plate, the display board after the assembling (or display panel matrix) is filled with the LC material under vacuum.This can reduce the viscosity of LC and fill the gap between each display board in the display better.Then, the display of matrix form is sealed each cuvette again by spaced-apart (cut and disconnection).The polarizer that protective seam protection and/or glass plate cover adheres to the outer surface of cuvette.
Showing run duration, be diffused into the liquid crystal layer from glass in order to prevent ion, utilize protective seam that conductive layer and glass are separated usually.Usually, this protective seam is the film of silicon dioxide or heavy metallic oxide, though also can utilize some polymkeric substance.Protective seam should be transparent in the workspace of spectrum, and its thickness and density should make reliable isolation between glass and the LC.
There is the whole bag of tricks can make protective finish: based on the physical method of material evaporation or sputter; or based on the chemical method of utilizing chemical reaction [N.P.Gvozdeva et al., PhysicalOptics, M. " Meshinostroenie "; 1991, pp.178-179].The most current current method is the evaporation in the vacuum.The essence of this method is the thermal evaporation of material under high vacuum.The steam that produces condenses upon the surface of substrate with form of film.This process is carried out very soon, from several seconds to a few minutes.
Other physical method is cathodic sputtering.This method is based on the ion bombarding cathode that utilizes high-energy low density gas, and the atom of cathode material is hit.The atom that hits from cathode surface rests on the substrate.During reaction cathodic sputtering, be full of in the operating room and activate gas (for example, oxygen), the film that can obtain having required chemical constitution.
For example, a kind of chemical method is to make the method for film from the solution of hydrolysis compound.Then, ethyl silicon solution is added on the base substrate that rotates in the hydro-extractor to make sull.
Patent US 5,358, and 739 describe the method for coated with silica, and it is to utilize the sylazane polymkeric substance to be added on the substrate and in oxide isolation to heat.The certain methods that also has other.
The polarizer of describing in document [WO 94/28073] can obtain from the liquid crystal solution of organic dyestuff.Polarizer according to this technology is to utilize a kind of known method to make on glass or polymer matrix film by the LC solution film of deposition dyestuff.The characteristics of this technology are, the orientation of dye molecule occurs in during the thin film deposition, and therefore, thin thermally-stabilised polarizing coating directly is formed on the substrate after drying.Utilize these polarizers can make the new construction of LCD, wherein polarizer can be formed directly on the madial wall and lateral wall of LC cuvette.As if inner polarizer position is more suitable, because it can improve the permanance and the reliability of display, and simplifies its design and reduces the process operation number of times.
Correspondingly choose mode of deposition and directed influence degree, can obtain comprising the dichroic polarizer of anisotropic films, crystal structure [PCT RU99/00400] is arranged to the film of small part.This color separation polarizer has height anisotropy and thermal stability.
In having the conventional display of internal polarizer, dichroic polarizer is formed on [RU 2139559] on the electrode system usually.For this reason, the special plane layer of coating on the electrode, it can promote the good adhesion of dichroic polarizer.This just can increase the number of times of lamination number in the display (its thickness) and process operation.In addition, in this case, only just can deposit dichroic polarizer after making electrode system, it reduces the dirigibility of manufacture process, in order that change the diversity of product.
Summary of the invention
The objective of the invention is to set up the multilayer board that can be used for the display manufacturing, and design has the display of internal polarizer.
Technical result of the present invention is to increase the display permanance and reduce display thickness, and reduces its manufacturing cost, improves the number of times of yield rate and minimizing manufacturing process.
The acquisition of technical result is based on multilayer board of the present invention.
According to an aspect of the present invention; a kind of multilayer board is provided here; it is characterized in that; comprise: optical transparency substrate, protective seam, conductive layer and at least one anisotropic films crystal layer; this multiple-plate material comprises aromatic ring and has along at least one optical axis, wavelength is the Bragg peak value of 3.4 ± 0.2 ; wherein at least one film crystal layer is between described substrate and described conductive layer; and separated by described protective seam between described film crystal layer and the described conductive layer, described protective seam is made by silicon dioxide.
The film crystal material can comprise different ring.
Multiple-plate substrate can be made by glass, and protective seam can be made by silicon dioxide and/or heavy metallic oxide or polymkeric substance.Conductive layer is normally made by ITO.
Sometimes, the ITO layer can be deposited on metal gate (for example, by means of the mask sputter) upward to increase the electric conductivity of this layer.The total surface area of metal gate should be less than 10% of multilayer board total surface area.
Usually, film crystal is represented E type polarizer.Sometimes, film crystal can have the function of polarizer and phase shift layer simultaneously.
Sometimes, can conduct electricity to the protective seam of small part, for example, by the doping on its surface.
In order to prevent the damage in the transportation, preferably, also utilize thin polymer film coating multilayer board.
The acquisition of described technical result is based on display board of the present invention.
According to a further aspect in the invention; a kind of display board is provided here; it is characterized in that; comprise: optical transparency substrate, protective seam, electrode system and at least one film crystal layer; the material of this display board comprises aromatic ring and has along an optical axis, wavelength is the Bragg peak value of 3.4 ± 0.2 ; wherein at least one film crystal layer is between described substrate and described electrode system; and separated by described protective seam between described film crystal layer and the described electrode system, described protective seam is made by silicon dioxide.
The film crystal material can comprise different ring.
The substrate of display board can be made by glass.Protective seam can be made by silicon dioxide and/or heavy metallic oxide or polymkeric substance.Electrode system is normally made by ITO.
Metal gate can deposit in the display board of display above the ITO layer.So the total surface area of metal gate should be less than 10% of electrode total surface area.
Film crystal in the display is represented E type polarizer usually.
Sometimes, the film crystal in the display can make up the function of polarizer and phase shift layer.
Display board can also comprise bonding coat.
Comprise following main each layer according to multilayer board of the present invention: optical transparency substrate (normally soda-lime glass); The optical anisotropic layer of film crystal, it is to be made by the material that comprises aromatic ring, and to have along an optical axis, wavelength be the Bragg peak value of 3.4 ± 0.2 ; Protective seam, for example silicon dioxide layer; And conductive layer, it is ITO normally.
Optical anisotropic layer has the function of polarizer in display, perhaps, have the function of polarizer and phase shift layer simultaneously.This one deck is the crystalloid of part at least; It can provide the high-durability of its structure and desirable optical parametric.The initial selection of this layer of material is by the pi-conjugated key system that has exploitation in the aromatic ring and exists such as amine, and phenol, base such as ketone determines, they are in the planes of molecules and as the partially aromatic key system of these molecules.Molecule itself or their fragment have smooth structure.For example, they can be such organic materials, for example, indanthrone (vat blue 4), or bisbenzimidazole 1,4,5,8-naphthalene tetracarboxylic acid (urn red 14), or bisbenzimidazole 3,4,9, the 10-perylene tetracarboxylic acid, or quinacridone (pigment violet 1 9) etc., its derivant or its potpourri form stable lyotropic liquid crystal phase.
When this organic material dissolved in suitable solvent, consequently molecule was combined into the colloid system (lyotropic liquid crystal) of supramolecular complex, and it represents the power unit of colloid system.LC is the pre-order state of colloid system, in supramolecular complex aligning and removal of solvents process subsequently, produces anisotropic crystal film (in other words, thin crystal film) thus.
The method that obtains thin crystal film from the colloid system with supramolecular complex may further comprise the steps:
This colloid of-deposition is tied on the substrate; Colloid system also should be thixotropic, and for this purpose, colloid system should and have certain dispersant concentration under certain temperature;
-by the alien influence of any kind, make the colloid in deposition back or the deposition be tied to the mobile state that reaches increase, thus the viscosity (this can pass through heating, realizations such as shearing deformation) of colloid system reduced; The required time in order can be proceeded or spend to alien influence during alignment procedures subsequently, and therefore, colloid can not be relaxed to the state with high viscosity during tying up to alignment procedures;
-to the external alignment influence of colloid system, can utilize mechanical means and any other method to finish; It is that the medium power unit obtains required orientation and forms such structure that the degree of described register effects should be enough to make colloid, and it is the basis of the following lattice of shaping layer;
The alignment area of-the layer that is shaped from the high viscosity state-transition become the original of colloid system or even more the high viscosity state be because initial external action; This carries out in such a manner, the disorientation of layer structure of can avoiding being shaped and avoid defective to be formed on being shaped the surface of layer;
-next step operation is dry (removing solvent), forms crystal structure in this process;
-last operation normally is transformed into the water-insoluble form from thin crystal film, by means of its surface of the solution-treated that contains divalence or trivalent metal.
The planes of molecules of making in the layer is parallel to each other, and these molecules formation three-dimensional crystals, is the molecule in the part layer at least.If optimize this manufacture method, then can obtain single crystalline layer.Optical axis in this thin crystal film is perpendicular to planes of molecules.On at least one direction, this thin crystal film has each anisotropy and high index of refraction of height.
In order to make the layer of required optical characteristics, can epoxy glue system (forming in the case, the supramolecular complex of combination).Each layer of making from colloidal solution mixture, absorptivity and refractive index can have various numerical value in the limit that primitive component is determined.Various colloids system is possible with the mixing of combination supramolecular complex that forms, and this is because a dimension coincidence of molecule in the above-mentioned organic compound (3.4).Molecule in the water-bearing zone has long dimension along a direction at least, and this is the aligning owing to supramolecular complex on the substrate.When solvent evaporation, preferably, molecule forms three-dimensional crystal structure.
The thickness in water-bearing zone on content by solid matter in the deposit solution and the substrate is implemented this Thickness Control.The Fabrication parameter of processing this film is the solution concentration of convenient control in process.Utilize X-ray photographs or optical means, can control the crystallization degree of this layer.
The prominent feature of film crystal is the thermal stability of height, and it is a particular importance in the display fabrication techniques in the present age.
Need utilize silicon dioxide layer protection anisotropic band, can exempt from damaging influence external in the manufacture process, prevent that particularly in the process of etching ITO, and when display moves it from contacting with LC with electrode.The method that utilization is known is made silicon dioxide layer: evaporates in the vacuum during heating, and cathodic sputtering, so-called " wet method " utilizes solution etc.Except silicon dioxide, protective seam can also comprise heavy metallic oxide.For example, be used for comprising solid matter (TiO up to 6% weight ratio according to the CERAMATE composition that solution is made protective seam
2, ZrO
2, SiO
2, Sb
2O
5).Usually be placed on the protective seam that baking is made according to solution under the high temperature.Because the high thermal stability of anisotropic band, it is possible finishing this operation in processing multilayer board process.It can stand up to 180 ℃ or in short-term up to 250 ℃ with higher temperature, and does not seriously change its optical characteristics.
In the limit of power of protective seam, we can also utilize various thermally-stabilised and chemical-resistant polymkeric substance.The thermal stability of each layer is necessary in the multilayer board, is heated to high temperature because several manufacturing processes (for example, making polyimide complanation and screed-coat at the top of electrode system) comprise.
Make conductive layer (ITO) by means of a method of knowing.
In addition, multilayer board can comprise additional exterior layer, protects multilayer board in transportation, and can remove these exterior layers in the process of making display.
This multilayer board representative is used to make the base substrate of display board, and has comprised the major function layer of demonstration.By reducing the number of times of manufacturing process, it can simplify the technology of making LCD.
Multiple-plate size is determined by making the display requirement.Usually, each multilayer board holds several display boards.The electrode system and the groove of the area configurations correspondence of each display board bond together display along these grooves on the multilayer board.By means of photoetch, methods such as laser ablation can be removed the conductive on the multilayer board corresponding region.
The density of protective seam and thickness should be sufficiently big, can prevent the damage of anisotropic films crystal in other similar approach processes of photoetch and etching conductive layer.
Paste in the groove of LC cuvette utilizing laser ablation method to make, when removing conductive layer, silicon dioxide layer of protection can with glass melting together.
After this, with polyimide layer and the coating of LC screed-coat, the function of polyimide layer is complanation to electrode system usually.The material that can utilize other is as complanation layer, specifically, and silicon dioxide.In this case, the material of this layer also has the function of insulator, can prevent electric discharge between electrodes.
In making display, after the matrix of front panel and rear panel, paste corresponding multilayer board, be filled into the cuvette made from liquid crystal.After finishing this operation, each LC display and matrix are separated.The LCD of making has internal polarizer.The design that this can simplify display reduces its thickness and increases the permanance of its operation.
Description of drawings
Following schematic view illustrating essence of the present invention:
Fig. 1 represents according to multilayer board synoptic diagram of the present invention;
Fig. 2 represents to have the LCD figure of internal polarizer.
Embodiment
Multilayer board (Fig. 1) in the example of embodiment comprising: optical transparency substrate 1, it is to be made and polarizer 2 by soda-lime glass, the film crystal that on behalf of 9.5% sulfonation indanthrone aqueous solution, it make.The thickness of polarizer is about 100nm.Silicon dioxide layer of protection 3 be deposited on polarizer above, and the conductive layer 4 of ITO be deposited on protective seam 3 above.In transportation, utilize thin polymer film 5 protection multilayer board usually.
The base substrate of display board is made in this multilayer board representative, and has had each major function layer of display.Fig. 2 represents to have a kind of display design scheme of internal polarizer.The small container that the display representative is flat and transparent; it is made of two parallel plates 6, makes following each layer within it on the surface in succession: polarizer layer 2, silicon dioxide layer of protection 3; by electrode system 7 and aramid layer 8 that optical transparency conductive material (ITO) is made, aramid layer 8 is screed-coats.After assembling, cuvette is full of liquid crystal 9, and is sealed, and for example, utilizes fluid sealant 10.
The display that design has internal polarizer can reduce the thickness of device and improve its operational reliability.In addition, the film crystal that uses in this display is an anisotropic band, and its optical property allows to make the device of high-contrast and wide viewing angle.
Claims (19)
1. multilayer board; it is characterized in that; comprise: optical transparency substrate, protective seam, conductive layer and at least one anisotropic films crystal layer; this multiple-plate material comprises aromatic ring and has along at least one optical axis, wavelength is the Bragg peak value of 3.4 ± 0.2 ; wherein at least one film crystal layer is between described substrate and described conductive layer; and separated by described protective seam between described film crystal layer and the described conductive layer, described protective seam is made by silicon dioxide.
2. multilayer board according to claim 1 is characterized in that the material of described film crystal comprises different ring.
According to claim 1 or 2 described multilayer board, it is characterized in that described substrate is made by glass.
4. multilayer board according to claim 1 and 2 is characterized in that described conductive layer is made by ITO.
5. multilayer board according to claim 4 is characterized in that, metal gate be deposited on the ITO layer above.
6. according to the multilayer board of claim 5, it is characterized in that the total surface area of described metal gate is less than 10% of described multilayer board total surface area.
7. multilayer board according to claim 1 and 2 is characterized in that, described film crystal is represented E type polarizer.
8. multilayer board according to claim 1 and 2 is characterized in that described film crystal is represented polarizer and phase shift layer simultaneously.
9. multilayer board according to claim 1 and 2 is characterized in that, described protective seam at least a portion is conducted electricity.
10. multilayer board according to claim 1 and 2 is characterized in that described multilayer board is the coat polymers film also.
11. display board; it is characterized in that; comprise: optical transparency substrate, protective seam, electrode system and at least one film crystal layer; the material of this display board comprises aromatic ring and has along an optical axis, wavelength is the Bragg peak value of 3.4 ± 0.2 ; wherein at least one film crystal layer is between described substrate and described electrode system; and separated by described protective seam between described film crystal layer and the described electrode system, described protective seam is made by silicon dioxide.
12. the display board according to claim 11 is characterized in that, the material of described film crystal comprises different ring.
13., it is characterized in that described substrate is made by glass according to claim 11 or 12 described display boards.
14., it is characterized in that described conductive layer is made by ITO according to claim 11 or 12 described display boards.
15. display board according to claim 14 is characterized in that, metal gate be deposited on the ITO layer above.
16. display board according to claim 15 is characterized in that, the total surface area of described metal gate is less than 10% of the electrode total surface area.
17., it is characterized in that described film crystal is represented E type polarizer according to claim 11 or 12 described display boards.
18., it is characterized in that described film crystal is represented polarizer and phase shift layer simultaneously according to claim 11 or 12 described display boards.
19., it is characterized in that described display board also comprises bonding coat according to claim 11 or 11 described display boards.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| RU2001126491/28A RU2226293C2 (en) | 2001-10-02 | 2001-10-02 | Display panel and multilayer plate for its manufacture |
| RU2001126491 | 2001-10-02 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1585910A CN1585910A (en) | 2005-02-23 |
| CN1325970C true CN1325970C (en) | 2007-07-11 |
Family
ID=20253416
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB028226941A Expired - Fee Related CN1325970C (en) | 2001-10-02 | 2002-10-01 | Multilayer plate for the fabrication of a display panel |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP1449023A1 (en) |
| JP (1) | JP2005530185A (en) |
| KR (1) | KR20040047882A (en) |
| CN (1) | CN1325970C (en) |
| RU (1) | RU2226293C2 (en) |
| WO (1) | WO2003029883A1 (en) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7317499B2 (en) * | 2002-08-22 | 2008-01-08 | Nitto Denko Corporation | Multilayer plate and display panel with anisotropic crystal film and conducting protective layer |
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| US6203950B1 (en) * | 1991-02-25 | 2001-03-20 | Shinto Chemitron Co. Ltd. | Method for manufacturing a color filter |
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| US5315129A (en) * | 1990-08-20 | 1994-05-24 | University Of Southern California | Organic optoelectronic devices and methods |
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2001
- 2001-10-02 RU RU2001126491/28A patent/RU2226293C2/en not_active IP Right Cessation
-
2002
- 2002-10-01 WO PCT/US2002/031512 patent/WO2003029883A1/en active Application Filing
- 2002-10-01 JP JP2003533038A patent/JP2005530185A/en active Pending
- 2002-10-01 CN CNB028226941A patent/CN1325970C/en not_active Expired - Fee Related
- 2002-10-01 EP EP02800453A patent/EP1449023A1/en not_active Withdrawn
- 2002-10-01 KR KR10-2004-7004819A patent/KR20040047882A/en not_active Application Discontinuation
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| US6203950B1 (en) * | 1991-02-25 | 2001-03-20 | Shinto Chemitron Co. Ltd. | Method for manufacturing a color filter |
| CN1177119A (en) * | 1996-07-19 | 1998-03-25 | 株式会社理光 | Polymer film liquid crystal display device |
| CN1251176A (en) * | 1997-12-16 | 2000-04-19 | “尼奥匹克”俄罗斯联邦全国科技中心 | Polariser and liquid crystal display element |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005530185A (en) | 2005-10-06 |
| RU2226293C2 (en) | 2004-03-27 |
| WO2003029883A1 (en) | 2003-04-10 |
| EP1449023A1 (en) | 2004-08-25 |
| CN1585910A (en) | 2005-02-23 |
| KR20040047882A (en) | 2004-06-05 |
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