CN1312317C - Vacuum ionic film coater with gas ionic source arrangement - Google Patents
Vacuum ionic film coater with gas ionic source arrangement Download PDFInfo
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- CN1312317C CN1312317C CNB2004100971242A CN200410097124A CN1312317C CN 1312317 C CN1312317 C CN 1312317C CN B2004100971242 A CNB2004100971242 A CN B2004100971242A CN 200410097124 A CN200410097124 A CN 200410097124A CN 1312317 C CN1312317 C CN 1312317C
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Abstract
The present invention relates to a vacuum ion plating machine configured with a gas ion source, which belongs to the technical field of vacuum ion plating techniques. The vacuum ion plating machine at least comprises a vacuum chamber, a conducting work piece (rotating) frame, a gas ion source and a DC power supply or a pulse DC power supply, wherein the power supply is used for establishing negative bias voltage for the conducting work piece (rotating) frame respectively by three groups of switches and driving the gas ion source; each of the first and the second group of switches is composed of two simultaneous on-off switches, but the two switches can not be switched on or off simultaneously; the positive electrode of the power supply is connected with the anode of the gas ion source by one switch of the first group, and meanwhile, the positive electrode of the power supply is connected with the vacuum chamber by one switch of the second group; the negative electrode of the power supple is simultaneously connected with the conducting work piece (rotating) frame by the other switch of the first group and the other switch of the second group; the conducting work piece (rotating) frame and the vacuum chamber wall are respectively connected with both ends of the third group of switches. The present invention can give full play to the functions of the gas ion source and the power supply and reduce the equipment configuration cost.
Description
Technical field
The invention belongs to the vacuum ion membrane plating technical field, particularly the improvement of the vaccum ion coater of configuration gas ion source.
Background technology
In the development of vacuum ion plating Application of membrane, gas ion source receives increasing the concern and attention.Because gas ion source has directivity, in its zone of action, produce highdensity gaseous ion (plasma body), can be applied to following several aspect: (a) when gas ion source feeds rare gas element (as argon gas), can carry out high-intensity gaseous ion bombardment to workpiece surface and clean.This cleaning process concentrates in the partial zone of action, and is more a lot of greatly than the energy density of common argon ion aura bombardment; Compare with the bombardment of cathode arc metal ion, do not exist metallics to be stained with again and cover the side effect that workpiece surface pollutes.(b) when gas ion source feeds the carbon containing organic gas, can carry out gaseous ion plating diamond (DLC) rete separately, perhaps be coated with gold doping and belong to the DLC rete in conjunction with other metal evaporation sources such as controlled sputtering source.(c) when gas ion source feeds reactant gases (as oxygen or nitrogen), can carry out the gaseous ion bombardment reaction treatment (as oxidation or nitridation process) of workpiece surface.(d), when working together, just can carry out gas ion source and strengthen (assisting) reactive ion plated film with other metal evaporation sources such as controlled sputtering source when gas ion source feeding reactant gases (as oxygen or nitrogen).
The vaccum ion coater of at present conventional configuration gas ion source mainly comprises: vacuum chamber 1 and be arranged on wherein electrically conductive workpiece (commentariess on classics) frame 2, gas ion source 3, and the direct supply 4 of driving gas ion source 3 and be the direct supply 7 that electrically conductive workpiece (commentaries on classics) frame 2 is set up negative bias.The vaccum ion coater electrically connected method of conventional configuration gas ion source as shown in Figure 1.Among the figure, electrically conductive workpiece (commentaries on classics) frame 2 is connected on the negative pole in bias direct current source 7, and vacuum chamber 1 wall connects the positive pole of power supply 7; The negative electrode of gas ion source 3 and anode correspondence are connected on the negative pole and positive pole of power supply 4, and the negative electrode short circuit of ion source 3 is on vacuum chamber 1 wall.
During the 3 discharge work of direct supply 4 driving gas ion sources, direct supply 7 is set up negative bias simultaneously on electrically conductive workpiece (commentaries on classics) frame 2, and two power supplys are worked independently of each other.Strike sparks when electric arc appears in workpiece surface, workpiece bias power supply 7 can start arc extinguishing action (moment short-time switching-off power supply) immediately; The gaseous ion source current then is difficult to monitor spark phenomenon, often can not synchronization action, continue the output gaseous ion, and cause that the electric arc sparking is maintained on the workpiece, burn out workpiece surface.So use the ordinary method of two platform independent power supplys to exist the technical problem of the easy electric arc sparking of workpiece to be plated simultaneously.
Summary of the invention
The objective of the invention is the vaccum ion coater of existing configuration gas ion source is transformed, overcome the weak point of prior art, give full play to the function of gas ion source and power supply, reduce equipment configuration cost.
A kind of vaccum ion coater that disposes gas ion source that the present invention proposes comprises a vacuum chamber and cover electrically conductive workpiece (commentaries on classics) frame and gas ion source that is arranged on wherein at least, and a direct supply or a pulse dc power; It is characterized in that a described power supply is respectively described cover electrically conductive workpiece (commentaries on classics) frame by three groups of switches and sets up negative bias and drive a described gas ion source; First, second group in these three groups of switches is formed by two switches that open and close simultaneously, and the switch of first and second group must not open and close simultaneously, and the 3rd group of switch is a switch; The electrical connection of this vaccum ion coater is: the positive pole of described power supply first switch by first group links to each other with the anode of described gas ion source, and the positive pole of this power supply passes through second switch of second group simultaneously and links to each other with vacuum-chamber wall; The negative pole of this power supply second switch by first group simultaneously links to each other with electrically conductive workpiece (commentaries on classics) frame with first switch of second group; This electrically conductive workpiece (commentaries on classics) frame and vacuum-chamber wall are connected on respectively on the two ends of the 3rd group of switch.
This electrically conductive workpiece (commentaries on classics) frame and vacuum chamber can electrically insulated from one another.
Has an inlet mouth that feeds gas ion source inside by vacuum chamber outward in the said structure at least; In the air outlet that has a gas distribution in vacuum chamber on the gas ion source at least; Need in ion source, to feed at least a gas during ion source discharge work; Have at least one can connect electric negative electrode, this electrode and vacuum chamber can electrical isolations; Have at least one can connect electric anode and lead to outside the vacuum chamber this anode and vacuum chamber electrical isolation.
Above-mentioned direct supply has an output cathode at least; Has an output negative pole at least; Can carry out opening and closing; Can export output voltage between the positive and negative electrode, electric current or power at it.
Above-mentioned pulse dc power is on the basis of described direct supply output, the reverse unipolar pulse string that superposes, and the frequency of reverse impulse can be adjusted in the 5-150kHz scope or in described range of frequency; The crest voltage of reverse impulse is selected between the 105%-150% of forward dc voltage or can adjusts in described voltage range, the pulsewidth up PRT of reverse impulse 90% or in 0%-90% pulsewidth scope, can adjust.
Characteristics of the present invention and effect:
(a) adopt the gas ion source of electrically connected method of the present invention, direct supply or pulse dc power output rating are applied directly between the workpiece to be plated on gas ion source anode and electrically conductive workpiece (commentaries on classics) frame.This power supply can start the arc extinguishing action timely and effectively, both can avoid electric arc sparking damage on the workpiece, also can avoid gas ion source target body metal sputtering, pollutes coating process.Thoroughly solved the arc extinguishing Problem of Failure that occurs easily in the conventional usage of gas ion source.
(b) gaseous ion that is flown out by gas ion source is subjected to the attraction of the negative voltage on electrically conductive workpiece (commentaries on classics) the frame workpiece to be plated, directly obtains kinetic energy from the workpiece to be plated electric field, is similar to the aura argon ion bombardment process under the workpiece biasing.Advantage is that the zone of action of gas ion source is partial, and discharge power is generally also big a lot of than the bombardment of argon ion aura.Therefore, the gaseous ion of gas ion source bombardment cleanup action is stronger, more effective.
(c) negative electrode of gas ion source of the present invention and vacuum-chamber wall electrical isolation, its negative electrode is in floating potential during gas ion source discharge work, along with discharge working order and vacuum chamber environment respective change, but the operating voltage that its negative electrode and positive interpolar potential difference apply less than power supply 4 certainly.Less potential difference between the gas ion source anode and cathode makes that the possibility of arc-over reduces between anode and cathode, and the energy of sparking reduces, and then reduces or avoid the possibility of the sputter of gas ion source metal target body.
When (d) direct supply of the present invention is used for gas ion source work, should on electrically conductive workpiece (commentaries on classics) frame, not apply negative bias; When gas ion source was not worked, this power supply was used in again on the workpiece to be plated of electrically conductive workpiece (commentaries on classics) frame and sets up negative bias.Therefore, a power supply has satisfied two aspect work fully, can not bring any inconvenience or restriction.Therefore, a configuration gas ion source vaccum ion coater just can be saved a direct supply or a pulse dc power, reduces equipment cost.
Description of drawings
Fig. 1 is the structure and the electrical connection synoptic diagram of the vaccum ion coater of existing configuration gas ion source.
Fig. 2 disposes the structure and the electrical connection synoptic diagram of the vaccum ion coater of gas ion source for the present invention.
Fig. 3 is embodiments of the invention 1 structure and is electrically connected synoptic diagram.
Fig. 4 is the pilot circuit figure of the embodiment of the invention 1.
Fig. 5 is embodiments of the invention 2 and embodiment 3 structures and is electrically connected synoptic diagram.
Fig. 6 is embodiments of the invention 4 structures and is electrically connected synoptic diagram.
Fig. 7 is embodiments of the invention 5 structures and is electrically connected synoptic diagram.
Embodiment
The vaccum ion coater of the configuration gas ion source that the present invention proposes reaches embodiment in conjunction with the accompanying drawings and further specifies as follows:
The vaccum ion coater of the configuration gas ion source that the present invention proposes as shown in Figure 2.Identical among Fig. 2 among parts shown in 1,2,3,4 and Fig. 1, institute's difference is:
(a) only keep a direct supply or a pulse dc power 4, the power supply 7 among Fig. 1 no longer needs;
(b) three groups of switches have been increased: 71,72,81,82 and 9.71 and 72 is a double-pole singlethrow switch, and two cuttves open and close simultaneously; Also can be two groups of independent contacts of a contactor.81 is identical with 71 and 72 with 82.9 is a single-pole single-throw switch (SPST), or one group of contact of a contactor.Switch 71 and 72 and switch 81 and 82 cannot start closure simultaneously, should set up hardware logic in addition they are locked mutually, to guarantee safety.Its electrical connection is: the positive pole of power supply 4 links to each other with the anode of gas ion source 3 by switch 71, and the positive pole of power supply 4 also links to each other with vacuum-chamber wall by switch 82 simultaneously; The negative pole of this power supply links to each other with electrically conductive workpiece (commentaries on classics) frame 2 with switch 81 by switch 72 simultaneously; The two ends of switch 9 then are connected on respectively on electrically conductive workpiece (commentaries on classics) frame 2 and vacuum chamber 1 wall.
Power Operating Process of the present invention is: when 71 and 72 closures, 81 and 82 disconnected, the positive pole of power supply 4 was connected on the anode of gas ion source 3, and the negative pole of power supply 4 is connected on electrically conductive workpiece (commentaries on classics) frame 2.At this moment direct supply 4 driving gas ion sources 3 produce gaseous ion, and these gaseous ions are subjected to direct supply 4 is set up electric field on electrically conductive workpiece (commentaries on classics) frame 2 attraction again, quicken to bombard on the workpiece to be plated.As the gaseous ion source current;
When 81 and 82 closures, during 71 and 72 disconnections, the positive pole of direct supply 4 is connected on vacuum chamber 1 wall, and the negative pole of direct supply 4 is connected on workpiece (commentaries on classics) frame 2.At this moment direct supply 4 is used for setting up negative bias on electrically conductive workpiece (commentaries on classics) frame 2.As the workpiece bias power supply;
Switch 9 is specifically designed to short circuit or disconnects vacuum chamber 1 wall and workpiece (commentaries on classics) frame 2.Have only when the work of direct supply 4 driving gas ion sources 3, switch 9 just can closed short circuit, also can not closedly open circuit.Other in any case, switch 9 all must be in not closed trip condition.Also should set up logical circuit switch 9 and switch 7 and 8 are locked mutually, levy safe in utilization with the guarantor;
The negative electrode of gas ion source and vacuum chamber 1 wall electrical isolation.When gas ion source discharge work, its negative electrode is in floating potential.
Direct supply described in the present invention also can be replaced by a pulse dc power.Electricity wiring, control and using method and direct supply identical.
The present invention further specifies as follows in conjunction with five embodiment to concrete composition structure and working process again:
Embodiment 1:
The vaccum ion coater structure of the configuration gas ion source of present embodiment as shown in Figure 3.Vacuum chamber 1 is as shown in Figure 2 identical with electrically conductive workpiece (commentaries on classics) frame 2.Vacuum chamber 1 wall good earth (PE).The LISE574/102 type anode layer flow pattern rectangle gas ion source that gas ion source 3 selects for use Beijing general sufacing of pellet company limited to produce.Direct supply 4 is selected the pinnacle 10kW of U.S. AE PLC dc inverter for use.3 switches 71,72,81,82 and 9 among Fig. 2 are elected SC-N2 (35) the type alternating current contactor of 3 identical Japanese FUJI companies as, corresponding to KM1, and KM2 and KM3, all electric mode of connections are with shown in Figure 2 identical.
The pilot circuit of the dynamo-electric wiring of the plated film of present embodiment as shown in Figure 4.KM1 wherein, KM2 and KM3 represent the adhesive insulated wire bag of alternating current contactor.KM1:4, KM2:4 and KM3:4 then are a pair of normally closed subcontrol contact on the alternating current contactor, are used for KM1, and KM3 and KM2 lock mutually, and be safe in utilization to guarantee.ZJ1 then is the MY4NJ type intermediate relay of a Japanese Omron company, shows among Fig. 4 that its one group is often opened and normally closed contact.This control circuit needs 220vAC single phase alternating current (L1 is a phase line, and N is a zero line) to be used to drive alternating current contactor KM1, the adhesive of KM2 and KM3 or disconnection.Intermediate relay ZJ 1 can be by utilizing the line bag of 24vDC direct-current drive intermediate relay to control two kinds of working ordeies at a button with lock on the control panel: when (1) closes (release) state when ZJ1 is in, direct supply 4 is connected on electrically conductive workpiece (commentaries on classics) frame 2 and vacuum chamber 1 wall, for the workpiece to be plated on electrically conductive workpiece (commentaries on classics) frame 2 is set up negative bias; (2) when ZJ1 is in startup (adhesive) state, direct supply 4 is connected on gas ion source 3 and workpiece (commentaries on classics) frame 2, the 3 discharge work of driving gas ion source.
The magnetic field that gas ion source 3 produces permanent magnet 13 by magnetic conductive metal target body (being negative electrode) 15 accumulates in place, 6 slits, air outlet, constitutes transverse magnetic field 12; Direct supply 4 output voltages can be set up the electric field 11 of near normal ion source target surface near 6 slits, air outlet of gas ion source 3; Gas ion source 3 discharge work also need to continue to feed working gas to inlet mouth 5, and working gas is controlled 3 kinds of gas with various respectively by No. 3 mass flow controllers and mixed the back feeding.
In gas ion source 3 regular discharge work, under magnetic field, place, 6 slits, air outlet and effect of electric field, electronics can be bound near the anode surface, the fast and parallel motion (anode laminar flow) on the runway of anode surface of a large amount of electronics, ionization neutral gas particle forms highdensity plasma slab.Gaseous ion in the plasma body outwards quickens to fly out through target surface air outlet 6 under vertical electric field 11 effects, increases kinetic energy, forms the gaseous ion line.The mean kinetic energy of gas particle is decided by (a) gas ion source operating voltage; (b) vacuum degree in vacuum chamber; (c) gas air input; (d) locus of gaseous ion.
Sometimes the workpiece to be plated quantity on electrically conductive workpiece (commentaries on classics) frame 2 is few in the vacuum chamber 1, in workpiece rotates or moves, for a long time less, is unfavorable for gas ion source 3 discharge stabilities during the workpiece gas ion source zone of action in.For this reason, electrically conductive workpiece (commentaries on classics) frame 2 is passed through the closed short circuit of KM3 on vacuum chamber 1.When in the gas ion source zone of action workpiece to be plated being arranged, will mainly bombard on these workpiece from the ionization of gas of ion source 3; When not having workpiece to be plated in the effect zone, 3 of gas ion sources pass through vacuum chamber 1 wall and constitute discharge loop, guarantee gas ion source 3 discharge stabilities.Owing to adopt separate unit direct supply 4, no matter producing the electric arc sparking on the gas ion source 3 or on the workpiece to be plated, power supply can both start the arc extinguishing action timely and effectively, can avoid workpiece to damage, and also can avoid gas ion source target body metal sputtering.
Because gas ion source 3 negative electrodes 15 electricity suspend, gas ion source negative electrode and positive interpolar potential difference can still be affirmed the workpiece voltage less than gas ion source 3 along with ion source working order and vacuum chamber environment respective change.Generally between 80 to 200v.Less relatively potential difference makes that the possibility of arc-over reduces between gas ion source 3 anode and cathode, and the energy of sparking reduces, and then reduces or avoid the sputter of gas ion source metal target body.
When gas ion source 3 worked independently, operating voltage mainly was subjected to the influence of ion source in gas amount and environment vacuum tightness.Air input is big more, and vacuum tightness is low more, helps gas ion source 3 discharge working stabilities more, and the voltage trend reduces usually, and electric current increases.When other conditions were constant, gas ion source 3 discharging currents increased, the corresponding raising of voltage.Sparking voltage is too high, can cause the electric arc sparking to increase, and job stability descends.Because gas ion source 3 has adopted the electric mode of connection of suspension negative electrode, operating voltage and upper current limit are than the obvious improve of ordinary method.
Embodiment 2:
The structure of the vaccum ion coater of present embodiment configuration gas ion source and working process are as shown in Figure 5.Compare with configuration gas ion source vaccum ion coater shown in Figure 3, just increased LMI443/69 type rectangle controlled sputtering source 18 that a pair of Beijing red general sufacing company limited produces and 19 and drive their PEII10kW of U.S. AE PLC intermediate frequency power supply 17.Two output electrodes of intermediate frequency power supply 17 are connected on respectively on the cathode electrode of controlled sputtering source 18 and 19, are used to drive a pair of (two) controlled sputtering source 18 and 19.
Apply the positive voltage (550-750v) of several hectovolts when gas ion source 3 works independently on the anode, the plasma body that gas ion source 3 produces has high positive potential; The plasma body that produces when controlled sputtering source 18 and 19 works alone then presents low positive potential.When gas ion source 3 and controlled sputtering source 18 and 19 are worked simultaneously, the plasma body in two sources mixes (coupling), two plasma potentials further mutually, and then correspondingly reduce the work positive voltage of gas ion source 3 and the alternation average working voltage of controlled sputtering source 18 and 19.The degree that reduces of voltage is decided by the relative size of two provenance operating powers (electric current) separately.Ion source discharge power is big relatively, and ion source work positive voltage descends less, and magnetic control source voltage reduces some more, and vice versa.
Utilize this vacuum plating unit to carry out the reactive ion plated film, when the coating film area of the zone of action of gas ion source 3 and controlled sputtering source 18 and 19 converges, be called as and converge gas ion source enhancing magnetron sputtering reactive ion plated film, be called for short and converge gas from sputter reactive ion coating technique; When the coating film area of the zone of action of gas ion source 3 and controlled sputtering source 18 and 19 spatially separately the time, be called as the spatial isolation gas ion source and strengthen magnetron sputtering reactive ion plated film, be called for short the empty gas that divides from sputter reactive ion coating technique.This technology has obtained good effect in the application that is coated with high quality titanium nitride (TiN) rete.Gas ion source operating power and magnetron sputtering are approximately 1: 9 to the operating power ratio of target.Because the positive voltage on the ion source is applied directly on the workpiece to be plated, the voltage height directly has influence on the final quality of reactive ion plated film.
After the LMI443/69 type rectangle controlled sputtering source of present embodiment configuration increased to 2 covers or many covers, PEII 10kW intermediate frequency power supply also needed 1 or many of corresponding increase.So can improve the coating speed of vaccum ion coater, also can realize the application need of multilayer (nanometer) plated film.
Embodiment 3:
The vaccum ion coater of present embodiment configuration gas ion source and unique difference of embodiment 2 are to adopt the pinnacle plus+10kW pulse direct current inverter of U.S. AE PLC to substitute original direct supply 4.For the pulse dc power that is applied on the gas ion source 3, its pulse-repetition is set at 100kHz, and pulse width is set at 2 microseconds, and promptly the direct current output duty cycle is 80%, can suppress the generation of electric arc sparking fast enough fully, for whole vaccum ion coater brings following more benefit:
1) because the plasma body that recurrent pulse is brought shakes, and gas ion source actuation threshold threshold voltage reduces, the also corresponding reduction of operating voltage (50 to 100v).Help improving discharge stability, improve working current and gas ionization efficient.
2) because " shutoff " operating voltage periodically, arc-over on gas ion source 3 and electrically conductive workpiece (commentaries on classics) frame 2 on the workpiece to be plated is all suppressed more effectively, both solve the problem of metal sputtering (pollution) on the gas ion source 3, and also avoided the sparking of workpiece to be plated surface to damage.Simultaneously, because power supply almost starts the arc extinguishing action, got rid of the possibility of vacuum work situation moment change, so the vacuum ion plating membrane process is more stable.
3) the plasma body concussion that produces of recurrent pulse also makes plasma sheath attenuate on the workpiece surface, the easier depths that enters into Workpiece structure of charged ion, thus improved the uniformity consistency of workpiece surface institute coatings significantly.
4) because pulse dc power can produce the pulse positive voltage, workpiece to be plated can periodically attract negatron, make its surperficial neutralisation, thereby avoid the workpiece surface positive charge excessively to assemble the problem that causes rete disruptive discharge sparking, also avoided positive charge accumulative workpiece surface to align the ionic repulsive interaction.For being coated with the bad deielectric-coating of electroconductibility, the perhaps oxide film of insulativity, and on the insulation workpiece, carry out ion film plating, above-mentioned pulse dc power characteristic has proved the critical effect of having brought into play.
Embodiment 4:
The structure of the vaccum ion coater of present embodiment configuration gas ion source and electric wiring are as shown in Figure 6.Compare with embodiment 1, present embodiment is that gas ion source 3 changes the primary source that 22, one direct supplys of Hall gas ion source 4 that have auxiliary filament 21 are used as this gas ion source into, and electrically connected method is identical with embodiment 1.A filament electrode of this gas ion source is connected on the negative electrode of gas ion source 22, outside the pass-out that together the insulate vacuum chamber 1.The output of Pei Zhi a desk lamp silk power supply 23 is connected on the other end electrode of the negative electrode (filament one end electrode) of gas ion source 22 and filament in addition.Cathode potential when filament potential will discharge work along with gas ion source 22 suspends together.
Gas ion source 22 can also have auxiliary grid, outside the gate electrode insulation pass-out vacuum chamber of this gas ion source.The output cathode of Pei Zhi a direct grid current power supply is connected on the negative electrode of gas ion source in addition, and its negative pole is connected on the gate electrode.Be used for the gaseous ion that gas ion source produces is pulled out.Cathode potential when at this moment the auxiliary grid current potential will discharge work along with gas ion source 22 suspends together.
Embodiment 5:
The structure of the vaccum ion coater of present embodiment configuration gas ion source and electric wiring are as shown in Figure 7.Compare with embodiment 2, present embodiment just changes the LMI443/69 type rectangle controlled sputtering source of configuration among the embodiment 2 into the RCAE1047 type cathode arc ionization source 25 of the general sufacing of 1 cover Beijing pellet company limited production and the CAE-150 type inversion direct current power supply 26 that Wei Dun company in Beijing produces.The negative pole of this power supply is connected on the negative electrode of cathode arc ionization source, and its positive pole is connected on vacuum chamber 1 wall.On the vaccum ion coater of a preparation gas ion source, configuration can also cofabrication above-mentioned controlled sputtering source and power supply more than a cathode arc source and driving power usually.Also can change various ion evaporations sources such as hollow cathode rifle crucible evaporation source, electron beam gun crucible evaporation source or hot arc crucible evaporation source into, and the corresponding driving power supply.Purpose is to give full play to the advantage of each metal evaporation sources, has complementary advantages the vacuum ion membrane plating effect that performance is best.
Claims (5)
1, a kind of vaccum ion coater that disposes gas ion source comprises a vacuum chamber and a cover electrically conductive workpiece pivoted frame and gas ion source that is arranged on wherein at least, and a direct supply or a pulse dc power; It is characterized in that a described power supply is respectively a described cover electrically conductive workpiece pivoted frame by three groups of switches and sets up negative bias and drive a described gas ion source; First, second group in these three groups of switches is formed by two switches that open and close simultaneously, and the switch of first and second group must not open and close simultaneously, and the 3rd group of switch is a switch; The electrical connection of this vaccum ion coater is: the positive pole of described power supply first switch by first group links to each other with the anode of described gas ion source, and the positive pole of this power supply passes through second switch of second group simultaneously and links to each other with vacuum-chamber wall; The negative pole of this power supply second switch by first group simultaneously links to each other with the electrically conductive workpiece pivoted frame with first switch of second group; This electrically conductive workpiece pivoted frame and vacuum-chamber wall are connected on respectively on the two ends of the 3rd group of switch.
2, vaccum ion coater as claimed in claim 1 is characterized in that, described electrically conductive workpiece pivoted frame and vacuum chamber electrically insulated from one another.
3, vaccum ion coater as claimed in claim 1 is characterized in that, has an inlet mouth that is fed gas ion source inside by vacuum chamber outward at least; In the air outlet that has a gas distribution in vacuum chamber on the gas ion source at least; Need in ion source, to feed at least a gas during ion source discharge work; Have at least one can connect electric negative electrode, this electrode and vacuum chamber electrical isolation; Have at least one can connect electric anode and lead to outside the vacuum chamber this anode and vacuum chamber electrical isolation.
4, vaccum ion coater as claimed in claim 1 is characterized in that, described direct supply has an output cathode at least; Has an output negative pole at least; Output voltage, electric current or power between this output positive and negative electrode.
5, vaccum ion coater as claimed in claim 1, it is characterized in that, described pulse dc power is on the basis of described direct supply output, the reverse unipolar pulse string that superposes, and the frequency of this reverse impulse is adjusted in 5-150 kHz scope or in this range of frequency; The crest voltage of reverse impulse is selected between the 105%-150% of forward dc voltage or adjusts in this voltage range, the pulsewidth up PRT of reverse impulse 90% or in the pulsewidth scope of 0%-90%, adjust.
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| CN102127755B (en) * | 2011-02-17 | 2014-04-30 | 中国科学技术大学 | Direct current glow plasma device and preparation method of diamond chip |
| CN102634764A (en) * | 2012-04-01 | 2012-08-15 | 上海仟纳真空镀膜科技有限公司 | Multifunctional PVD (physical vapor deposition) film plating machine |
| CN103252629A (en) * | 2013-04-11 | 2013-08-21 | 苏州瑞森硬质合金有限公司 | High-strength hard alloy processing tool |
| CN104962873A (en) * | 2015-07-17 | 2015-10-07 | 广东工业大学 | Method for preparing polycrystalline aluminum oxide hard coating |
| CN105200377A (en) * | 2015-09-16 | 2015-12-30 | 北京丹鹏表面技术研究中心 | Ion plating machine, gas ion etching and cleaning method and auxiliary deposition method |
| CN110453191B (en) * | 2019-08-28 | 2024-05-17 | 佛山市佛欣真空技术有限公司 | Conductive system of vacuum coating machine and vacuum coating machine |
| CN115233179B (en) * | 2022-07-30 | 2024-04-26 | 常州夸克涂层科技有限公司 | Filament ion source control method and device of vacuum coating equipment |
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| US6733590B1 (en) * | 1999-05-03 | 2004-05-11 | Seagate Technology Llc. | Method and apparatus for multilayer deposition utilizing a common beam source |
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| US20030024807A1 (en) * | 2001-03-16 | 2003-02-06 | 4Wave, Inc. | System and method for performing thin film deposition or chemical treatment using an energetic flux of neutral reactive molecular fragments, atoms or radicals |
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Effective date of registration: 20220822 Address after: 102200 b807, building 8, No. 97, Changping Road, Shahe Town, Changping District, Beijing (Changping Demonstration Park) Patentee after: Beijing Danpu Surface Technology Co.,Ltd. Address before: 100096 Haidian District Xisanqi Beijing East Road Building Coating Factory Hospital Patentee before: BEIJING DNP SURFACE TECHNOLOGY INSTITUTE |