CN1306065C - Controllable microbial etching device - Google Patents
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- CN1306065C CN1306065C CNB2004100379442A CN200410037944A CN1306065C CN 1306065 C CN1306065 C CN 1306065C CN B2004100379442 A CNB2004100379442 A CN B2004100379442A CN 200410037944 A CN200410037944 A CN 200410037944A CN 1306065 C CN1306065 C CN 1306065C
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- Apparatus Associated With Microorganisms And Enzymes (AREA)
- ing And Chemical Polishing (AREA)
- Micro-Organisms Or Cultivation Processes Thereof (AREA)
Abstract
The invention relates to a controllable microorganism etching device which can manufacture a specific space structure by controlling a thermal field, a magnetic field, an electric field, an optical field, an oxygen and carbon dioxide concentration field and the like of a processing object and microorganisms attached to the processing object and by means of controllable biochemical reaction between the microorganisms and the processing object; the device controls the working time and space distribution of each unit in a micro-element array of heating micro-elements, electricity or optics and the like by a computer to obtain a controllable complex temperature field and various physical and chemical fields, so that microorganisms in a container realize different working temperatures or other physical and chemical field strengths, the biochemical reaction activity of the microorganisms is further adjusted, the reaction rate of the microorganisms and a processing object is changed, and a specific space microstructure is processed. The workpiece is processed in a multi-dimensional manner through the three-dimensional movement of the fixture; the structure size of the processed object can be from millimeter to nanometer according to different microorganism types and processing objects. The device is an integrated miniature controllable multifunctional biological micro-machining device.
Description
Technical Field
The present invention relates to a microbial etching apparatus, and more particularly, to a controllable microbial etching apparatus for manufacturing a specific spatial structure by finely controlling a thermal field, an electric field, a magnetic field, an optical field, or an oxygen or carbon dioxide concentration field of a processing object and microorganisms attached thereto.
Background
With the development of modern science and technology, people gradually turn their attention from macroscopic objects to phenomena occurring in small scale and their corresponding devices. Micro Electro mechanical system (MEMS-Micro Electro mechanical system) is receiving more and more attention, and various Micro/nano devices not only improve the quality of life of people, but also promote the development of scientific technology. However, as the scale is reduced, the processing difficulty is increased, and how to realize the processing of micro/nano-scale structures becomes an important problem. The current micromachining technology is mainly generated by combining the micromachining technology in the semiconductor Integrated Circuit (IC) manufacturing industry with the precision machining technology in the mechanical manufacturing industry, and is the basis and guarantee for the development of micro/nano mechanical electronic engineering. Nowadays, various micromachining techniques are mainly dependent on the development of microelectronic technologies, and the micromachining techniques and materials for processing MEMS devices are directly referred to from the IC industry, and various mature surface processing techniques can manufacture complex MEMS devices. However, the conventional micro-processing technology is generally expensive in processing cost, harsh in processing environment, complex in processing process and has a certain problem of environmental pollution.
Meanwhile, the rapid development of the bioengineering technology provides the realization of the bionic micromachining and the bioengineering micromachiningAnd (4) technical support. In this trend, bioprocessing techniques are gradually attracting attention. In this regard, Thiobacillus ferrooxidans (T.f bacteria for short) belongs to the genus Thiobacillus, and is a gram-negative extremely acidophilic obligate inorganic vegetative bacterium: the biochemical reaction in the metabolism process of the thiobacillus ferrooxidans is utilized to carry out biological oxidation on the metal substrate, and some special microstructures can be realized. During the whole oxidation process, the bacteria can regenerate the consumed oxidant through metabolism and proliferate themselves, and the substance circulation ensures the continuation of the biological etching process. For example, bioerosion of ferrous metals is achieved by growing Fe using Thiobacillus ferrooxidans2+Is oxidized into Fe3+The product Fe with strong oxidizing property can provide energy for the product3+The metal material capable of performing reduction reaction is processed as a biological reagent for chemical etching. Wherein the biochemical process is established in the iron oxidation systemTraditionally, this has been achieved mainly by a 92kD outer membrane protein of Thiobacillus ferrooxidans, a ferricyanin (including thiobacillocin), many c and a1 type cytochromes and iron (II) oxidase. Fe3+The metal atoms are oxidized to achieve the purpose of etching. The overall reaction formula for bioprocessing copper is:
therefore, the etching processing method for copper and copper alloy can be realized by utilizing the strong oxidizing property of trivalent Fe ions generated in the autotrophic process of the thiobacillus ferrooxidans. However, the processes that have been carried out to date are either difficult to control in terms of their processing or are complex and expensive. In fact, based on the various biochemical reaction characteristics of microorganisms, sophisticated biological microfabrication techniques can be achieved with the aid of an engineered precisely controllable external field. It is known that, since the growth of microorganisms requires a certain temperature or other physical field environment, the activity of microorganisms changes under different temperature conditions. Therefore, the micro-scale heat transfer and fluid mechanics technology is used for controlling the local temperature field change, the orderly control of the temperature of the living environment of the microorganisms in the micro-scale range is achieved, and the controllable operation of the microorganism processing technology can be realized. This approach is expected to be a relatively inexpensive, rapid process. The invention aims to realize fine processing of a micro/nano structure under the condition of precisely controlling microorganisms in a temperature field and other various physical fields based on design.
Disclosure of Invention
The invention aims to: the controllable microbial etching device obtains controllable complex temperature field and various physical and chemical field distributions by controlling the working time and space distribution of each element in a heating micro-element array through a computer, so that microbes in a container are at different working temperatures or other field concentrations, and the reaction rate of the microbes and a processing object is regulated and controlled by utilizing the characteristic that the microbes have different biological activities at different temperatures and other physical fields, thereby realizing a specific space structure. The etching process has the characteristics of controllability, compact processing structure, simple and convenient operation, small environmental pollution and low material consumption, and can efficiently process various materials and three-dimensional microstructures.
The technical scheme of the invention is as follows:
the invention provides a controllable microbial etching device, as shown in figure 1, comprising:
a transparent acid-proof box body 2, a micro-processing control console 22 with pulleys 23, which is arranged on the inner bottom surface of the transparent acid-proof box body 2; a semiconductor refrigeration element array 21 is placed on the upper surface of the micro-machining control table 22;
a vertical movement fixing piece 16, a vertical movement telescopic piece 17, an array substrate 18 and a micro-heating or other physical and chemical field element array 19 which are sequentially connected with the upper top cover 7 of the transparent acid-proof box body 2 from top to bottom;
a workpiece 20 to be etched is placed on the upper surface of the semiconductor refrigerating element array 21, a microbial bacterial membrane is placed on the upper surface of the etched workpiece 20, and a thermal isolation gap of 10 micrometers to 1 millimeter is reserved between the microbial bacterial membrane and the micro-heating or other physical and chemical field element array 19;
a control power supply circuit 9 connected with a micro-heating or other physical and chemical field element array 19 passes through the micropores with the sealing materials 10 arranged on the upper top cover 7 to be connected with a data acquisition unit 11, and a water vapor pipeline (14) positioned in the transparent acid-resistant box body 2 passes through the micropores with the sealing materials 10 arranged on the upper top cover 7 to be connected with an oxygen cylinder, a carbon dioxide cylinder and a water source 15; the data acquisition unit 11 is connected with the computer 12;
a slide rail 3 is arranged on the inner bottom surface of the transparent acid-resistant box body 2, a pulley 23 arranged on the bottom surface of a micro-processing console (22) is in rolling fit with the slide rail 3, and a stepping motor 4 controls the pulley 23 to do two-dimensional rolling motion in the horizontal direction on the slide rail 3;
an electric, magnetic and optical field controller 5 is located within the transparent acid-resistant tank 2 and comprises electrodes consisting of metal plates for generating an electric field within the transparent acid-resistant tank2, permanent magnet sheets for generating a magnetic field within the transparent acid-resistant tank 2, and a laser source consisting of a movable semiconductor laser.
The controllable microbial etching device can also comprise an adjustable stabilizing base 1, wherein the transparent acid-resistant box body 2 is horizontally placed on the adjustable stabilizing base 1, and the adjustable stabilizing base 1 controls the transparent acid-resistant box body 2 to enable the inner bottom surface of the adjustable stabilizing base to be in a horizontal position.
The microbial bacterial membrane is a microbial bacterial membrane grown by Thiobacillus ferrooxidans, but is not limited to the microbial bacterial membrane.
The micro-processing console 22, the micro-heating or other physical and chemical field element array 19 and the array substrate 18 thereof are coated with acid-resistant paint or made of acid-resistant materials.
The two-dimensional motion of the micro-machining console 22 in the horizontal direction and the up-and-down motion of the vertical motion telescopic part 17 are mutually matched to form a three-dimensional motion state, wherein the micro-machining console 22 makes longitudinal and transverse horizontal motion, and the vertical motion telescopic part 17 makes up-and-down motion in the vertical direction.
The micro-heating or other physical and chemical field element array 19 obtains the accurate space, time and single-point temperature distribution of the temperature field through time sequence control; or obtaining the spatial and temporal distribution of the electric field, the magnetic field, the optical field, the pH value and the oxygen concentration.
The computer 12 controls the heating of the micro-heating or micro-heating element arrays in other physicochemical field element arrays 19to achieve various timing heating matrices and spatial local arrays.
The geometric dimension of the transparent acid-proof box body 2 is in the range of 150mm multiplied by 100mm to 1500mm multiplied by 1000 mm.
The micro-machined console 22 has a planar geometry in the range of 100mm x 100mm to 1000mm x 1000 mm.
The array of micro-heating or other physicochemical field elements 19 may be a planar array, a curved array, or a three-dimensional array distributed over a three-dimensional irregular surface.
The controllable microbial etching device further comprises a workpiece clamp 13, and the workpiece 20 to be etched is fixed on the upper surface of the semiconductor refrigeration element array 21 through the workpiece clamp 13.
As can be seen from FIG. 1, the transparent acid-resistant container body 2 is made of an acid-resistant transparent material such as glass, etc., and the container body 2 is connected to the top cover 7 by a hinge 6, so that the container body 2 is transparent and thus facilitates observation of the processing. The top cover 7 is provided with a through hole of 2 x phi 10mm, and is filled with a sealing material 10 such as resin for sealing, and the control power supply circuit 9 and the water gas pipeline 14 pass through the two through holes to be connected into the box body, so that the environment in the box body can be accurately controlled in the processing process, and the external interference and pollution are reduced. A slide rail 3 is laid on the inner bottom surface of the box body 2, and the whole micro-processing operation platform is controlled to do planar two-dimensional motion through a stepping motor 4. As shown in fig. 2, a micro-machining console 22, a pulley 23, a microchannel-provided semi-semiconductor refrigeration element array 21 in whicha temperature sensor, a workpiece holder 13 for holding a workpiece 20 to be etched is mounted; when the semiconductor refrigerating element array 21 works, the generated cold energy can keep the temperature of the workpiece 20 to be etched in a temperature region suitable for low activity of processing microorganisms, and the temperature is accurately controlled by a temperature sensor in the semiconductor refrigerating element array 21. Heat generated by the semiconductor refrigeration array is dissipated through the micro-machined console 22. If necessary, the semiconductor refrigeration array can be cooled by introducing cold airflow or cold water into the micro-flow channel to obtain the required large amount of cold. Connected to the top cover 7 is a main device for precisely controlling the micro-machining process, and the micro-displacement of the array substrate 18 and the micro-heating or other physical and chemical field element array 19 in the vertical direction is fixed and controlled by the vertical motion fixing member 16 and the vertical motion expansion member 17, so as to finally realize the machining of the three-dimensional microstructure. The array substrate 18 is required to be made of a heat insulating material to prevent the micro-heating elements from thermally interfering with each other, and the micro/nano-scale channels are formed on the array substrate 18 to thermally isolate the micro-heating elements from each other, so that a precise heat distribution can be formed on a microbial film formed by processing microorganisms through the micro-heating element array, and thus, the activity and reaction rate of the microorganisms can be adjusted. In addition, the control power supply circuit 9 is connected with the data acquisition unit 11 and the computer 12, and provides programming control signals and power supplies for the stepping motor 4 of the micro-machining operation table, the semiconductor refrigeration element array 21 and the micro-heating or other physical and chemical fieldelement array 19; the water gas pipeline 14 is connected with an oxygen cylinder, a carbon dioxide cylinder 15 and a clean water source to provide the necessary gas and water source for the survival of the microorganisms. Finally, FIGS. 3-1 through 3-4 illustrate one time-coded operation of the micro-heating element array for computer control. In addition to controllable bioprocessing by ordered heating as described above, by individually or simultaneously selecting different arrays of electric, magnetic, and optical field control elements on the array substrate 18 or the bottom of the processing object, each of which can be in the micro/nano scale range, precise processing under multi-physical field control can be achieved.
The controllable microbial etching device has the following characteristics:
the controllable microbial etching device of the invention obtains controllable complex temperature field and various physical and chemical field distributions by controlling the working time and spatial distribution of each element in the micro-heating or other physical and chemical field element arrays through a computer, thereby leading the microbes in the container to be at different working temperatures or other field concentrations, regulating and controlling the reaction rate of the microbes with a workpiece to be etched by utilizing the characteristic that the microbes have different biological activities at different temperatures and other physical fields, and further realizing a specific spatial structure. The etching process has the characteristics of controllability, compact processing structure, simple and convenient operation, small environmental pollution and low material consumption, and can efficiently process various materials and three-dimensional microstructures.
Drawings
FIG. 1 isa schematic structural diagram of a controllable microbial etching apparatus according to the present invention;
FIG. 2 is a schematic diagram of a micro-machined stage and micro-heating element array;
FIG. 3 and FIGS. 3-1 to 3-4 are timing diagrams of the present invention for implementing a computer programmed control precision thermal field;
wherein: base 1 transparent acid-proof box 2 slide rail 3
Stepping motor 4 hinge 6 electric, magnetic and optical field controller 5
Pulley 23 of top cover 7 control power supply circuit 9
Sealing material 10 data collector 11 computer 12
Workpiece clamp 13 water gas pipeline 14 vertical motion fixing piece 16
Array substrate 18 to-be-etched workpiece 20 vertical movement telescopic part 17
Micro-processing control table 22 semiconductor refrigeration array element 21
Oxygen cylinder, carbon dioxide cylinder and water source 15 micro-heating or other physical chemical field element array 19
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and specific embodiments.
As shown in FIG. 1, the controllable microbial etching apparatus provided by the present invention comprises:
a transparent acid-proof box body 2, a micro-processing control console 22 with pulleys 23, which is arranged on the inner bottom surface of the transparent acid-proof box body 2; a semiconductor refrigerating element 21 is placed on the upper surface of the micro-machining control table 22;
a vertical movement fixing piece 16, a vertical movement telescopic piece 17, an array substrate 18 and a micro-heating or other physical and chemical field element array 19 which are sequentially connected with the upper top cover 7 of the transparent acid-proof box body 2 from top to bottom;
a workpiece 20 to be etched is placed on the upper surface of the semiconductor refrigerating element array 21, a microbial bacterial membrane is placed on the upper surface of the etched workpiece 20, and a thermal isolation gap of 10 micrometers to 1 millimeter is reserved between the microbial bacterial membrane and the micro-heating or other physical and chemical field element array 19;
a control power supply circuit 9 connected with a micro-heating or other physical and chemical field element array 19 passes through the micropores with the sealing materials 10 arranged on the upper top cover 7 to be connected with a data acquisition unit 11, and a water and gas pipeline 14 positioned in the transparent acid-resistant box body (2) passes through the micropores with the sealing materials 10 arranged on the upper top cover 7 to be connected with an oxygen cylinder, a carbon dioxide cylinder and a water source 15; the data acquisition unit 11 is connected with the computer 12;
a slide rail 3 is arranged on the inner bottom surface of the transparent acid-resistant box body 2, a pulley 23 arranged on the bottom surface of the micro-processing console 22 is in rolling fit with the slide rail 3, and the stepping motor 4 controls the pulley 23 to do two-dimensional rolling motion in the horizontal direction on the slide rail 3;
the electric, magnetic and optical field controller 5 is located inside the transparent acid-proof box 2 and comprises electrodes consisting of metal plates for generating an electric fieldinside the transparent acid-proof box 2, permanent magnet sheets for generating a magnetic field between the transparent acid-proof box 2, a laser source consisting of a movable semiconductor laser.
The controllable microbial etching device also comprises an adjustable stabilizing base 1, wherein the transparent acid-resistant box body 2 is horizontally placed on the adjustable stabilizing base 1, and the adjustable stabilizing base 1 controls the transparent acid-resistant box body 2 to enable the inner bottom surface of the adjustable stabilizing base to be in a horizontal position.
The microbial film is a microbial film or more kinds of microbial films grown by Thiobacillus ferrooxidans.
The micro-processing console 22, the micro-heating element array 19 and the substrate 18 thereof are coated with acid-resistant paint or made of acid-resistant materials.
The two-dimensional motion of the micro-machining workpiece table 22 in the horizontal direction and the up-and-down motion of the vertical motion telescopic part 17 are mutually matched to form a three-dimensional motion state, wherein the micro-machining workpiece table 22 horizontally moves in the longitudinal direction and the transverse direction, and the vertical motion telescopic part 17 vertically moves up and down.
The micro-heating or other physical and chemical field element array 19 obtains the precise spatial and temporal distribution of the switches of each heating element through time sequence control, thereby obtaining the precise spatial, temporal and single-point temperature distribution of the temperature field.
The computer 12 controls the heating of the micro-heating or other physicochemical field element arrays 19 to achieve various timing heating matrices and spatial local arrays.
The geometric dimension of the transparent acid-proof box body 2 is 150mm multiplied by 100mm to 1500mm multiplied by 1000 mm. The micro-machined console 22 has a planar geometry of 100mm x 100mm to 1000mm x 1000 mm.
The controllable microbial etching device further comprises a workpiece clamp 13, and the workpiece 20 to be etched is fixed on the upper surface of the semiconductor refrigeration element array 21 through the workpiece clamp 13.
As can be seen from FIG. 1, the transparent acid-proof box body 2 is made of an acid-proof transparent material such as glass, etc., and the box body 2 and the top cover 7 are connected by a hinge 6, and the transparent acid-proof box body 2 is transparent so as to facilitate observation of the processing. The top cover 7 is provided with a through hole of 2 x phi 10mm, and is filled with a sealing material 10 such as resin and the like for sealing, and the control and power supply line 9 and the air and water pipeline 14 pass through the two through holes to be connected into the box body, thereby ensuring that the environment in the box can be accurately controlled in the processing process so as to reduce the external interference and pollution. A slide rail 3 is laid on the inner bottom surface of the box body 2, and the whole micro-processing operation platform is controlled to do planar two-dimensional motion through a stepping motor 4. As shown in fig. 2, a micro-machining workpiece table 22, a pulley 23, a semiconductor refrigeration array 21 with micro-channels, in which a temperature sensor, a workpiece holder 13 for holding a workpiece 20 to be etched is installed; when the semiconductor refrigeration array 21 works, the generated cold energy can keep the temperature of the workpiece 20 to be etched in a temperature region suitable for low activity of processing microorganisms, and the temperature is accurately controlled by a temperature sensor in the semiconductor refrigeration array21. Heat generated by the semiconductor refrigeration array is dissipated through the micro-machined workpiece stage 22. If necessary, the semiconductor refrigeration array can be cooled by introducing cold airflow or cold water into the micro-flow channel to obtain the required large amount of cold. Connected to the top cover 7 is a main device for precisely controlling the micro-machining process, and micro-displacement of the substrate 18 and the micro-heating element array 19 in the vertical direction is fixed and controlled by the fixing member 16 and the vertical movement expansion member 17, so as to finally realize the machining of the three-dimensional microstructure. The substrate 18 is required to be made of a heat insulating material to prevent the micro-heating elements from thermally interfering with each other, and the micro/nano-scale channels are formed on the substrate 18 to thermally isolate the micro-heating elements from each other, so that the micro-heating elements can be arrayed on a microbial membrane formed by processing microorganisms to form an accurate heat distribution, thereby regulating the activity and reaction rate of the microorganisms. In addition, the control and power supply line 9 is connected with the data acquisition unit 11 and the computer 12, and provides a programming control signal and a power supply for the stepping motor 4, the semiconductor refrigeration array 21 and the micro-heating element array 19 of the micro-machining operation table; the gas and water pipelines 14 are connected with an oxygen cylinder, a carbon dioxide cylinder 15 and a clean water source to provide gas and water sources necessary for the survival of microorganisms. Finally, FIGS. 3-1 through 3-4 illustrate one time-coded operation of the micro-heating element array for computer control. In addition to controllable bioprocessing by ordered heating as described above, by individually or simultaneously selecting different arrays of electric, magnetic, and optical field control elements on thesubstrate 18 or the bottom of the processing object, each of which can be in the micro/nano scale range, precise processing under multi-physical field control can be achieved.
One embodiment of the apparatus of the present invention is used as follows;
1. preparing processing materials including a cleaned workpiece 20 to be etched, a cultured microbial film, an oxygen and carbon dioxide gas cylinder and a water source 15, and compiling a micro-heating element array program for controlling a processing microstructure.
2. The device is cleaned, and as shown in fig. 1, the semiconductor refrigeration element 21 is opened, the temperature is kept at the environment with low microbial activity, the workpiece 20 is clamped on the micro-processing console 22, the bacterial membrane is attached to the micro-processing console 22, the top cover 7 is closed, and the processing device is installed and sealed.
3. Adjusting the stepping motor 4, controlling the micro-processing control platform 22 to move to a proper position, enabling the position of the workpiece 20 to be etched to correspond to the micro-heating or other physical and chemical field element array 19, then adjusting the vertical movement telescopic control part 17, and reducing the height of the micro-heating or other physical and chemical field element array 19 to be close to the microbial film and keeping a small distance such as 10 micrometers to 1 millimeter with the workpiece 20 to be etched, thereby ensuring thermal isolation.
4. The micro-heating or other physical and chemical field element array 19 is programmed by the computer 12 and the data collector 11, the encoding process is as follows, and the temperature field is detected to obtain a precisely controlled temperature field.
5. Fig. 3 shows an example of a simple 3 × 3 heating element matrix, illustrating a sequential coding method for controlling the micro-thermal element array. First, at time 0 shown in FIG. 3-1, the heating elements are all in the OFF state, and the binary control signals for the rows and columns are [000]respectively][000](ii) a At time 1 shown in fig. 3-2, the first row of heating elements is controlled to be activated, the other two rows are in an off state, and the binary control signals of the row (vertical direction in the figure) and the column (horizontal direction in the figure) are respectively 100][010](ii) a At time 2 shown in FIGS. 3-3, the second row of heating elements is controlled to be activated, and the binary control signals for the rows and columns are [010]respectively][100](ii) a At time 3 shown in FIGS. 3-4, the rows are in the OFF state, two rows and two columns, except for the third row of heating elementsThe control signals are respectively [ 001%][010]. In such a cycle, the rows are controlled by a timing signal and the heating elements on the rows are controlled by a coded process signal. Wherein the timing matrix isThe processing control matrix is
By the digital method, corresponding software can be programmed to realize computer-aided machining.
In summary, the controllable microbial etching apparatus of the present invention comprises: the device comprises a base 1, a box body 2, a micro-processing control table 22 and a horizontal control mechanism thereof (a stepping motor 4, a slide rail 3 and a pulley 22), a working bacterial film, a semiconductor refrigeration element array 21, a workpiece clamp 13, a micro-heating or other physical and chemical field element array 19, a control power circuit 9 and a water-gas pipeline 14; electrodes consisting of metal plates for generating an electric field therein, permanent magnet sheets for generating a magnetic field therebetween, a light source (optional 5) consisting of a movable semiconductor laser, a temperature sensor, a data collector 11, a computer 12, a power supply, etc. The electric field and magnetic field can be regulated by changing the relative position of electrodes or magnetic poles by means of slideway on the equipment, the refrigeration can be implemented by means of semiconductor refrigerator and micro/nano-grade heat-exchange channel, and the controlled local and ordered heating can be implemented by means of electric heating element array under the control of computer, so that it can obtain several complicated field distribution modes. The geometric dimension of the transparent acid-proof box body 2 can be between 150mm multiplied by 100mm to 1500mm multiplied by 1000mm, and the embodiment is 150mm multiplied by 100 mm. The micro-machined console 22 has a planar geometry of 100mm × 100mm to 1000mm × 1000mm, and the micro-machined console 22 of the present embodiment has a geometry of 100mm × 100 mm. The micro-heating or other physical and chemical field element array 19 is integrated on the array substrate 18, and is programmed and controlled by a circuit, a controller and a computer, the heating micro-elements are thermally shielded by opening micro/nano-scale channels, and a polymer film for protection is attached to the surface; forming a mycoderm by cultured strains which are specifically processed with a certain material and attaching the mycoderm on the heating element microarray; a workpiece to be processed is clamped by the workpiece clamp and close to the mycoderm and keeps in contact with the mycoderm; the workpiece fixture is integrally processed with a semiconductor refrigerator and a heat exchange micro-channel, and the whole workpiece and fixture assembly is controlled by a clamping control console to realize three-dimensional space motion; the outside of the processing chamber is provided with electric, magnetic and light environments through electrodes, magnetic poles and a semiconductor laser; microchannels on the substrate provide the necessary oxygen and carbon dioxide for the microorganisms. All the devices are connected with a power supply through current leads, and the whole processing process is controlled in a centralized manner through a sensor, a controller and a computer.
Claims (11)
1. A controllable microbial etching apparatus, comprising:
the micro-processing control platform (22) is arranged on the inner bottom surface of the transparent acid-proof box body (2) and is provided with a pulley (23); a semiconductor refrigeration element array (21) is placed on the upper surface of the micro-machining control table (22);
a vertical movement fixing piece (16), a vertical movement telescopic piece (17), an array substrate (18) and a micro-heating or other physical and chemical field element array (19) which are sequentially connected with an upper top cover (7) of the transparent acid-proof box body (2) from top to bottom; the micro-heating or other physical and chemical field element array (19) is arranged on the lower surface of the array substrate (18);
a workpiece (20) to be etched is placed on the upper surface of the semiconductor refrigerating element array (21), a microbial film is placed on the upper surface of the workpiece (20) to be etched, and a thermal isolation gap of 10 micrometers to 1 millimeter is reserved between the microbial film and the micro-heating or other physical and chemical field element array (19);
a control power supply circuit (9) connected with a micro-heating or other physical and chemical field element array (19) passes through micropores with sealing materials (10) arranged on an upper top cover (7) to be connected with a data collector (11), anda water-gas pipeline (14) positioned in the transparent acid-resistant box body (2) passes through micropores with sealing materials (10) arranged on the upper top cover (7) to be connected with an oxygen cylinder, a carbon dioxide cylinder and a water source (15); the data acquisition unit (11) is connected with a computer (12);
a sliding rail (3) is arranged on the inner bottom surface of the transparent acid-resistant box body (2), a pulley (23) arranged on the bottom surface of the micro-machining control console (22) is matched with the sliding rail (3) in a rolling manner, and the stepping electrode (4) controls the pulley (23) to do two-dimensional rolling motion in the horizontal direction on the sliding rail (3);
an electric, magnetic and optical field controller (5) is located inside the transparent acid-resistant box body (2) and comprises electrodes consisting of metal plates for generating an electric field inside the transparent acid-resistant box body (2), permanent magnet sheets for generating a magnetic field inside the transparent acid-resistant box body (2) and a laser light source consisting of a movable semiconductor laser.
2. The apparatus according to claim 1, further comprising an adjustable stabilizer (1), said transparent acid-resistant tank (2) being horizontally disposed thereon, said adjustable stabilizer (1) controlling said transparent acid-resistant tank (2) to have its inner bottom surface in a horizontal position.
3. A controllable microbial etching apparatus as claimed in claim 1, wherein the microbial film is a microbial film grown by thiobacillus ferrooxidans.
4. A controllable microbial etching apparatus as claimed in claim 1, wherein the micro-machining console (22), the array of micro-heating or other physical-chemical field elements (19) and their substrate (18) are coated with an acid-resistant coating or made of an acid-resistant material.
5. The apparatus of claim 1, wherein the two-dimensional motion of the micro-machining console (22) in the horizontal direction and the up-and-down motion of the vertical motion telescopic member (17) are coordinated to form a three-dimensional motion state, wherein the micro-machining console (22) performs the horizontal motion in the longitudinal direction and the transverse direction, and the vertical motion telescopic member (17) performs the up-and-down motion in the vertical direction.
6. A controllable microbial etching apparatus as claimed in claim 1, wherein the array of micro-heating or other physical-chemical field elements (19) is controlled in time sequence to obtain a precise spatial, temporal and single point temperature distribution of the temperature field; or obtaining the spatial and temporal distribution of the electric field, the magnetic field, the optical field, the pH value and the oxygen concentration.
7. A controllable microbial etching apparatus as claimed in claim 1, wherein said computer (12) controls the heating of the array of micro-heating elements in the array of micro-heating or other physicochemical field elements (19) to achieve various timing heating matrices and spatial matrices.
8. A controllable microbial etching apparatus as claimed in claim 1, wherein said transparent acid-resistant enclosure (2) has a geometric dimension in the range of 150mm x 100mm to 1500mm x 1000 mm.
9. A controllable microbial etching apparatus as claimed in claim 1, wherein the micro-machining console (22) has a planar geometry in the range of 100mm x 100mm to 1000mm x 1000 mm.
10. A controllable microbial etching apparatus as claimed in claim 1, wherein said array of micro-heating or other physical-chemical field elements (19) is a planar array, a curved array or a three-dimensional array distributed over three-dimensional irregularities.
11. The apparatus of claim 1, further comprising a workpiece holder (13), wherein said workpiece (20) to be etched is held by said workpiece holder (13) on an upper surface of said array of semiconductor cooling elements (21).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100379442A CN1306065C (en) | 2004-05-14 | 2004-05-14 | Controllable microbial etching device |
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| Application Number | Priority Date | Filing Date | Title |
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| CNB2004100379442A CN1306065C (en) | 2004-05-14 | 2004-05-14 | Controllable microbial etching device |
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| CN1306065C true CN1306065C (en) | 2007-03-21 |
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| CNB2004100379442A Expired - Fee Related CN1306065C (en) | 2004-05-14 | 2004-05-14 | Controllable microbial etching device |
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| DE102009019443A1 (en) * | 2009-04-29 | 2010-12-16 | Siemens Aktiengesellschaft | Kinematic approximation algorithm with ruled surface |
| CN106367757B (en) * | 2016-10-12 | 2018-11-30 | 孙健春 | A kind of directional etching membrane module and its application method |
| CN113161261B (en) * | 2020-12-08 | 2022-10-18 | 广东绿展科技有限公司 | Biological etching equipment and biological etching method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6316779B2 (en) * | 1981-07-17 | 1988-04-11 | Fujitsu Ltd | |
| CN1088272A (en) * | 1992-11-09 | 1994-06-22 | 国际商业机器公司 | The new device and the method for accurate etching and removal film |
| JP2007222432A (en) * | 2006-02-24 | 2007-09-06 | Fumutoshi Kadoya | Photograph-holder with magnet |
-
2004
- 2004-05-14 CN CNB2004100379442A patent/CN1306065C/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6316779B2 (en) * | 1981-07-17 | 1988-04-11 | Fujitsu Ltd | |
| CN1088272A (en) * | 1992-11-09 | 1994-06-22 | 国际商业机器公司 | The new device and the method for accurate etching and removal film |
| JP2007222432A (en) * | 2006-02-24 | 2007-09-06 | Fumutoshi Kadoya | Photograph-holder with magnet |
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