CN1107569C - Vacuum laser machining equipment - Google Patents
Vacuum laser machining equipment Download PDFInfo
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- CN1107569C CN1107569C CN 00105778 CN00105778A CN1107569C CN 1107569 C CN1107569 C CN 1107569C CN 00105778 CN00105778 CN 00105778 CN 00105778 A CN00105778 A CN 00105778A CN 1107569 C CN1107569 C CN 1107569C
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- 238000003754 machining Methods 0.000 title claims abstract description 10
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- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
The present invention relates to vacuum laser machining equipment. The present invention comprises a vacuum chamber and a machine case, wherein the vacuum chamber is arranged on a bracket of the machine case; a working table is arranged inside the vacuum chamber, the working table is connected with a motor arranged on the lower part of the bracket inside the machine case, and the machine case is arranged on a numerical control worktable; the top of the vacuum chamber is provided with a quartz glass window, and the side wall of the vacuum chamber is provided with a vacuum-pumping opening and a nozzle. The vacuum laser machining equipment can generate new quasi-crystal, amorphous, nanometer-crystal, etc. material on the surfaces of work pieces, and the material has favorable performance in the aspects of mechanics, thermology, electricity, chemistry, etc. The vacuum laser machining equipment can carry out laser vacuum heat processing, such as vacuum laser element diffusion infiltration processing, vacuum phase change hardening, etc. on the surface layers of the work pieces by using laser beams as a thermal source.
Description
The present invention relates to a cover vacuum laser machining equipment, belong to technical field of laser processing.
Since 1960's, first ruby laser came out, laser technology had almost all obtained important use and development at industry-by-industry as a new and high technology highly visible.Especially shown its special advantages in the industrial processes field, bored micropore etc. as laser high-speed cutting, laser deep penetration welding, laser.Utilize the rapid heating characteristic of laser beam to make top layer matrix metal or the instantaneous intensification of top coat-cool off even melt-solidify, thereby change the phase structure of top layer metal, improve the mechanics of skin-material with this, calorifics, chemistry, and even magnetics and electric property improve hardness, intensity, wear resistance, solidity to corrosion, the anti-oxidant and resistance to elevated temperatures of workpiece thus, thereby improve the quality of product widely, prolong exponentially product work-ing life and reduce cost.This kind is laser surface intensified with the thermal treatment process of laser as thermal source.At present; traditional laser surface intensified technique all carries out under atmospheric environment; the measure of taking for anti-oxidation only be with shielding gas (as rare gas elementes such as nitrogen or argon gas, helium) when laser beam acts on the metallic surface; the air in lasing district " is blown away ", and such effect is obviously very undesirable.Just Stimulated Light effect and obtain surface strengthening in the atmosphere of shielding gas and Air mixing gas of workpiece, for such as accurate crystalline substance, amorphous, nanocrystalline this class excellent property but metastable phase that need quick cooling can generate under high vacuum environment almost can't generate.For example; Zhong Minlin, Liu Wenjin etc., under atmospheric environment with nitrogen and argon gas as shielding gas, prepare the Fe-C-B-Si amorphous alloy with the method for laser rapid scanning; owing to the influence of skin-material oxidation, only obtain the amorphous alloy layer of 70 μ m in the middle layer.Consult: " Chinese laser " the 24th volume (A volume), in September, 1997 the 9th phase 847-852 page or leaf and in March, 1998 " metal heat treatmet journal " the 191st phase, 42-47 page or leaf.Simultaneously, Pinhero, P.J., Anderegg, J.W. etc. studies show that the oxygenizement in the process of setting is the obstacle of amorphous, accurate metastable phase formation such as brilliant, nanocrystalline.Consult: " investigation of materials periodical " the 14th phase the 8th volume 1999 annual 3185-3188 pages or leaves.
The objective of the invention is to design a kind of vacuum laser machining equipment, under high vacuum environment, utilize process meanses such as laser rapid scanning or laser evaporation deposition, in metal, nonmetal, semi-conductor and ceramic material surfaces, the amorphous that all is difficult to obtain with preparation conventional laser surface intensified technique and conventional vacuum oven heat treating method, type material such as accurate brilliant, nanocrystalline.
The vacuum laser machining equipment of the present invention's design, this laser processing device comprises the vacuum chamber that places on the cabinet stand, described vacuum chamber top has quartz window, sidewall has vacuum orifice and nozzle, inside is provided with worktable, place workpiece to be processed on the described worktable, laser beam sees through described quartz window and shines on the workpiece, described worktable links to each other with motor in the cabinet of support bottom, and by described electric motor driving rotation, described cabinet places on the numerical control table, NC table, radially drives whole device by this numerical control table, NC table.The top cover of described vacuum chamber is provided with the substrate clamp that is used to locate workpiece.
This device is to utilize wavelength for the YAG laser of 1064nm silica glass to be had this advantage of good transmission characteristic.A rectangle silica glass window is carved at top at vacuum chamber, make YAG laser see through silica glass and shine directly into the workpiece surface that is under the vacuum environment, rotary table in the vacuum chamber is driven by direct-current machine can make high speed rotating, drive workpiece and make circumferential motion, thereby make laser beam obtain the tangential sweep velocity of a wide variation at workpiece surface.So that workpiece is had an effect with high-octane laser photon under the atmosphere of high vacuum or predetermined reactant gases.Can fix target anchor clamps more than on the rotary table, but fixing base anchor clamps on the vacuum chamber internal head cover.Substrate clamp and target anchor clamps all can be done big degree of freedom adjustment, thereby can make matrix be in the side and the front of target.Laser beam can vertical irradiation or oblique fire at a certain angle to parent phase metallic target surface, implement the preparation of laser evaporation deposition amorphous, accurate crystalline substance and nano-crystal film.Rotary table connects by the outer drive-motor of dynamic seal bearing housing and vacuum chamber.This device is as under the high vacuum environment metal material surface being shown the research equipment of implementing laser rapid scanning formation amorphous, accurate crystalline substance, nano-crystallization research, can be used for studying under the high vacuum environment, laser and material effects form thermodynamics, kinetics and the quantum mechanics mechanism of accurate crystalline substance, amorphous, metastable phase composition such as nanocrystalline.By the outer stepper-motor of computer control vacuum chamber, can be to being distributed in a plurality of parent phase metallic targets on the rotary table, press specified time alternately with high-power laser beam irradiation evaporation, thereby under the environment of high vacuum and even ultrahigh vacuum(HHV), deposition obtains the amorphous or the quasi-crystalline state alloy system of special component.Because this device can obtain very high laser scanning speed under high vacuum environment, actual piece surface is made the high vacuum LASER HEAT TREATMENT, can obtain 10
8The speed of cooling that K/s is above.Therefore, can generate accurate brilliant, amorphous and the good type materials of various aspects of performance such as mechanics, calorifics, electricity, chemistry such as nanocrystalline at workpiece surface, to give actual engineering component needed specific function.Also can draw the advantage of traditional vacuum furnace treatment reason, in vacuum or have under the ambiance of other shielding gas, with the instantaneous heating of the laser beam of high power density-cool off or melt-solidify top layer metal or other coatings.Utilize laser beam can carry out the expansion of vacuum laser element at workpiece surface with this and ooze vacuum laser thermal treatments such as processing (carburizing, nitriding, boronising etc.) and phase transition of vacuum sclerosis as thermal source.
Description of drawings:
Fig. 1 is that this device prepares amorphous/accurate crystalline substance/nano-crystal film schematic representation of apparatus as the vacuum laser rapid scanning.
Fig. 2 is that this device prepares amorphous/accurate crystalline substance/nano-crystal film schematic representation of apparatus as the vacuum laser hydatogenesis.
Fig. 3 is the structural representation of target anchor clamps among Fig. 2.
Introduce content of the present invention in detail below in conjunction with accompanying drawing.
Among Fig. 1 and Fig. 3, the 1st, laser beam, the 2nd, silica glass window, the 3rd, vacuum chamber, the 4th, workpiece, the 5th, direct-current machine, the 6th, worktable, the 7th, numerical control table, NC table, the 8th, photoelectric velocity measurement device, the 9th, nozzle, the 10th, stepper-motor, the 11st, substrate clamp, the 12nd, target anchor clamps, the 13rd, target position, the 14th, vacuum orifice, the 15th, support, the 16th, cabinet.
As shown in Figure 1, the vacuum laser machining equipment of the present invention's design comprises vacuum chamber 3 and cabinet 16, vacuum chamber 3 places on the support 15 of cabinet, be provided with worktable 6 in the vacuum chamber, the motor 5 in this worktable and the support 15 bottom cabinets 16 links to each other, and cabinet places on the numerical control table, NC table 7; The vacuum chamber top has quartz window 2, has vacuum orifice 14 and nozzle 9 on the vacuum chamber sidewall.On the top cover of above-mentioned vacuum chamber substrate clamp 11 can also be set.
Introduce application example of the present invention below.
Device of the present invention is prepared amorphous/accurate crystalline substance/nano-crystalline thin film device as high vacuum laser rapid scanning
As shown in Figure 1, high-power laser beam [1] by the laser apparatus generation, the line focus set of lenses focuses on the back and shines directly on the interior workpiece [4] of vacuum chamber [3] through rectangle silica glass window [2], and driving rotary table [6] can be at 5--10000 rev/min velocity range internal rotation for drive-motor (using direct-current machine [5] when making the laser high-speed scan process).Drive workpiece [4] when making circumferential motion at rotary table [6], there is a tangential sweep velocity on fixed laser beam and workpiece [4] surface, and its size can be passed through to regulate the rotating speed of direct-current machine [5] at 5-10
5Stepless acquisition in the mm/s velocity range.So just realized the rapid scanning of laser beam at workpiece surface.Driving workpiece [4] at rotary table [6] turned in several milliseconds the time in lasing district, X-Y numerical control table, NC table driver module is accepted the pulse signal that computer sends, drive the distance (approximately 0.1mm) of X-Y numerical control table, NC table [7] to a spot diameter of right translation, thereby realize the overlap joint in laser scanning road, to obtain large-area lasing district.By the computer controlled laser power supply, thus the control laser output power.Change spot diameter by out of focus, thereby change the power density in lasing district.The sweep velocity of laser on workpiece [4] can obtain by the rotating speed that changes rotary table [6].Its concrete rotating speed can be obtained by photoelectric velocity measurement device [8].The computer output electric pulse is opened the magnetic valve that links to each other with nozzle [9] in the process of laser rapid scanning, and heat-eliminating medium (as liquid nitrogen, liquid helium etc.) is directly injected to the matrix side that workpiece [4] is gone up the lasing district by nozzle [9].More than the comprehensive change of four parameters (laser power, spot diameter, sweep velocity, heat-eliminating medium spray speed) can obtain suitable speed of cooling at workpiece surface.Thereby can form crystallite, amorphous, metastable phase such as nanocrystalline at substrate material surface.Also can apply the powdered alloy of one deck special component earlier with means such as PVD, CVD, vacuum thermosprays at substrate material surface, such as Al-Cu-Fe, Fe-B, Al-Mn etc., Laser Alloying Treatment by the low sweep velocity of control direct-current machine [5] driven at low speed rotary table [6] work makes full and uniformization of molten alloy composition.At last, make rotary table [6] high speed rotating, thereby obtain required tangential sweep velocity.With laser output power 4500W is example, when spot diameter focuses on 0.05mm, by formula F=4P/ π d
2(wherein F is a laser power density, and unit is W/cm
2, P is laser power W, d is spot diameter cm), power density can reach 10
6W/cm
2, workpiece and with the cooled with liquid nitrogen matrix, can get skin-material and obtain 10 under so high sweep velocity
10The speed of cooling that K/s is above, thus can form at material surface various aspects of performance such as mechanics, calorifics, electricity, magnetics and chemistry good, amorphous, accurate metastable state film such as brilliant and nanocrystalline.To satisfy the particular requirement in the engineering reality.
Device of the present invention is prepared amorphous/accurate crystalline substance/nano-crystalline thin film device as high vacuum laser evaporation deposition
As shown in Figure 2, the outer drive-motor of vacuum chamber is changed to stepper-motor [10] by direct-current machine [5].On the top cover of vacuum chamber [3], load onto substrate clamp [11].On rotary table [6], change target anchor clamps [12], four target position [13] are arranged on the anchor clamps, so can fix a plurality of parent phase metallic targets simultaneously.For example, will be on aluminum substrate depositing Al-Cu-Fe quasi-crystalline state alloy firm, to be fixed on the substrate clamp [11] through the aluminium sample of abundant polishing and clean earlier, more highly purified Al, Cu, Fe parent phase metallic target are separately fixed on three target position of target anchor clamps [12].Consider fusing point, saturated vapor pressure and the influence different of three kinds of metals to the specific absorption of laser, laser beam the action time on every kind of target ratio should in concrete technology, explore.By the control module of stepper-motor [10] is programmed in advance, make it to drive rotary table [6] in the vacuum chamber [3] by following rule: the parent phase metallic target is during through the laser beam zone of action, and stepper-motor [10] makes laser beam can have adequate time to act on target and makes it evaporation with speed drive rotary table [6] slowly; When a metallic target shifts out the lasing district, stepper-motor [10] fast driving rotary table [6] makes next metallic target move into the lasing district immediately, to realize fast quick change target.Promptly improve vaporization efficiency, save the laser resource again.In the moment of changing target, X-Y numerical control table, NC table [7] is accepted the pulse signal that computer sends, and makes whole device that a very little displacement radially be arranged.Thereby make laser beam on next metallic target, obtain new zone of action.In the evaporative process, can feed gas as carrier gas or reactant gases by nozzle [9].Whole evaporation process, vacuum pump are constantly taken gas away from bleeding point [14].Processing parameters such as control laser output power, target translational speed, flow rate of carrier gas and the speed of evacuation are adsorbed on matrix surface after the metallic vapor cooled and solidified that laser evaporation is produced, and form the thin-film material that will prepare.
In addition, this device also can be used as the vacuum laser processing and the thermal treatment unit of micron, nano level machinery.
Claims (2)
1, a kind of vacuum laser machining equipment, it is characterized in that, this laser processing device comprises the vacuum chamber that places on the cabinet stand, described vacuum chamber top has quartz window, sidewall has vacuum orifice and nozzle, inside is provided with worktable, place workpiece to be processed on the described worktable, laser beam sees through described quartz window and shines on the workpiece, described worktable links to each other with motor in the cabinet of support bottom, and by described electric motor driving rotation, described cabinet places on the numerical control table, NC table, radially drives whole device by this numerical control table, NC table.
2, processing unit (plant) as claimed in claim 1 is characterized in that, the top cover of wherein said vacuum chamber is provided with and is used for the localized substrate clamp of workpiece.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 00105778 CN1107569C (en) | 2000-04-07 | 2000-04-07 | Vacuum laser machining equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 00105778 CN1107569C (en) | 2000-04-07 | 2000-04-07 | Vacuum laser machining equipment |
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| Publication Number | Publication Date |
|---|---|
| CN1270872A CN1270872A (en) | 2000-10-25 |
| CN1107569C true CN1107569C (en) | 2003-05-07 |
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| CN 00105778 Expired - Fee Related CN1107569C (en) | 2000-04-07 | 2000-04-07 | Vacuum laser machining equipment |
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Cited By (1)
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| CN100342828C (en) * | 2005-09-22 | 2007-10-17 | 何申戌 | Final surface treating method of electrode for extracorporeal stone breaking via hydroelectrical impact |
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| US7608308B2 (en) * | 2006-04-17 | 2009-10-27 | Imra America, Inc. | P-type semiconductor zinc oxide films process for preparation thereof, and pulsed laser deposition method using transparent substrates |
| CN102157347B (en) * | 2010-12-27 | 2013-01-30 | 清华大学 | High-yield laser heat treatment device and method |
| CN102169810B (en) * | 2010-12-27 | 2013-07-03 | 清华大学 | Laser processing apparatus using vacuum cavity and processing method thereof |
| CN102513702A (en) * | 2012-01-05 | 2012-06-27 | 哈尔滨工业大学 | Vacuum laser welding equipment and method |
| CN103323568B (en) * | 2013-06-26 | 2015-01-07 | 哈尔滨工业大学 | Material smelting and welding experimental apparatus under ground microgravity and methods for smelting and welding material under microgravity based on device |
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| CN104942451B (en) * | 2015-07-03 | 2016-07-13 | 厦门大学 | The vacuum laser cutter sweep of a kind of porous metal material and method |
| CN105355579A (en) * | 2015-12-11 | 2016-02-24 | 清华大学 | Non-enclosed argon protection workpiece stage |
| CN107671464A (en) * | 2017-11-14 | 2018-02-09 | 德阳东汽电站机械制造有限公司 | A kind of industrially pure titanium welding argon gas protection cabin |
| CN109518013B (en) * | 2018-11-30 | 2022-02-08 | 中国工程物理研究院材料研究所 | Method for remelting and purifying metal uranium surface by pulse laser and purification layer prepared by method |
| CN110779634B (en) * | 2019-10-29 | 2021-08-10 | 江苏科技大学 | Controllable and fast-switching laser ablation molten metal bath temperature measuring device and using method |
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2000
- 2000-04-07 CN CN 00105778 patent/CN1107569C/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100342828C (en) * | 2005-09-22 | 2007-10-17 | 何申戌 | Final surface treating method of electrode for extracorporeal stone breaking via hydroelectrical impact |
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| CN1270872A (en) | 2000-10-25 |
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