CN1300549C - Grating measuring method in image sensor for subdividing resolution into Nano level - Google Patents
Grating measuring method in image sensor for subdividing resolution into Nano level Download PDFInfo
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- CN1300549C CN1300549C CNB2005100503694A CN200510050369A CN1300549C CN 1300549 C CN1300549 C CN 1300549C CN B2005100503694 A CNB2005100503694 A CN B2005100503694A CN 200510050369 A CN200510050369 A CN 200510050369A CN 1300549 C CN1300549 C CN 1300549C
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Abstract
The present invention discloses a grating measuring method for an image sensor to subdivide resolution into nanometer level. Light information of grating movement is amplified by an optical microscopic system and is received by a planar array image sensor on an objective image plane so as to obtain a clear grating stripe image on a display screen of a computer connected with the image sensor; a scanning center is selected, and then, the scanning center is scanned, interpreted and subdivided along a column or a line in which the scanning center is positioned; the stripe images in different positions and with different time interval are compared to obtain a displacement volume which is outputted in real-time by a computer; adopting the planar array image sensor to receive and subdivide the optical information gives rein to the characteristics of high resolution capability of the image sensor with two-dimensional pixel and serial outputting electrical signals according to time sequence so that the measurement of the present invention has the resolution in nanometer grade. The result can be outputted in real-time by a computer and the software thereof. The direct reading mode of the image sensor simplifies traditional methods of photoelectric conversion, electronics subdivision and processing a circuit; the configuration of the image sensor is free from the limit of working distance of a grating pair so as to realize wide range coarse reading and nanometer resolution fine reading in a full scale grating length.
Description
Technical field
The present invention relates to Technology of Precision Measurement, particularly a kind of grating measuring method in image sensor for subdividing resolution into Nano level.
Background technology
Grating measuring technology is used in technical position measurement of precision engineering and the control widely in scientific research.Optical grating measuring system has sender and reception and electronic processing two parts, is made up of light source, metrological grating pair, photoelectricity reception, preposition amplification, interpolation, counting and controlled device etc. usually.Because it is numerous and diverse that its constitutes, to physical construction, opto-electronic conversion, electronics is very high with the circuit engineering requirement, cost is expensive; And common resolution is only in micron dimension.For resolution is improved, the effort on the hardware that system forms of passing through is up to now promoted the use of thereby cause the sharp increase of the increase of technical difficulty and manufacturing cost to hinder it again.
Patent retrieval shows, only publication number is " atomic raster measuring method with 0.01 nanometer resolution " of CN1189607A, the metrological grating principle is combined with scanning probe microscopy, some samples is obtained the atomic crystal table images with scan-probe on diverse location, as calculated machine handle formed two width of cloth atomic raster images, two atomic raster images of comparison variation, be measurement result.Realize the measurement of subatomic resolution.
Summary of the invention
The object of the invention is conventional metered dose grating measuring principle is expanded, and adopts photoelectronic imaging component side array image sensor (CMOS) to receive and segmentation, thereby realizes a kind of nanometer scale measuring method.
The technical solution used in the present invention is that its step is as follows:
1) with lighting source illuminated scale grating, the scale grating moves the optical information that is produced and is amplified by optical microscope system;
2) the photoelectronic imaging component side array image sensor of being placed as the place, plane by the object lens of optical microscope system receives, the image of grating fringe clearly that amplifies on the computer display that obtains to connect with photoelectronic imaging component side array image sensor;
3) choose scanning center, realize interpretation and segmentation along scanning center's column or line scanning;
4) diverse location or different time grating fringe image are at interval compared, can obtain displacement, export by computer real-time.
Described grating fringe image with diverse location or different time interval compares, and is about to computing machine and utilizes scanning center that image is made binary conversion treatment, obtains positional information value d
1Little mobile scale grating, repeating step 3), obtain positional information value d
2Computing machine is exported little shift position variation delta d=d
1-d
2
Dispose the scale grating of big reading index symbol, have the accurate indicating value of nanometer scale when can obtain on the full raster length wide range coarse reading.
Compare with background technology, the useful effect that the present invention has is: it expands traditional metrological grating measuring principle, adopts novel photoelectronic imaging component side array image sensor to receive and segmentation, realizes reaching the measurement of nanometer scale resolution.Owing to given full play to imageing sensor two dimension pixel capable of high resolution and the output of serial chronologically electric signal, can export the result easily in real time with computing machine and software thereof.Simultaneously, the imageing sensor direct access mode is simplified opto-electronic conversion in the traditional raster measuring method, electronics segmentation and treatment circuit technical application; On mechanical realization, avoid the restriction of optical grating pair operating distance, give to debug to bring convenience.Thereby simplied system structure reduces production costs, and enlarges range of application.In addition, this method can realize wide range coarse reading and nanometer resolution intensive reading number on the full scale grating length easily.
Measuring method of the present invention, simplify metrological grating measuring system structure, given full play to photoelectronic imaging component side array image sensor two-dimensional pixel high resolution capacity and serial chronologically output electric signal characteristics, used a computer and software can be exported the result easily in real time; And can realize the reading of nanometer scale precision on the scale grating overall length range.
Description of drawings
Fig. 1 is the measuring system synoptic diagram;
Among Fig. 1: the 1-lighting source; 2-scale grating; The 3-optical microscope system; 4-photoelectronic imaging component side array image sensor; 5-grating fringe image; The 6-computing machine.
Fig. 2 utilizes the Principle of sub-division figure of photoelectronic imaging component side array image sensor pixel for benchmark;
Among Fig. 2: the a-frontier point; The b-frontier point; C-scanning center.
Embodiment
The present invention is further illustrated below by drawings and Examples.
As shown in Figure 1, measuring method of the present invention is as follows:
1) with lighting source 1 illuminated scale grating 2, scale grating 2 moves the optical information that is produced and is amplified by optical microscope system 3;
2) the photoelectronic imaging component side array image sensor of being placed as the place, plane by the object lens of optical microscope system 34 receives, the image of grating fringe clearly 5 that amplifies on computing machine 6 display screens that obtain to connect with photoelectronic imaging component side array image sensor 4;
3) choose scanning center, realize interpretation and segmentation along scanning center's column or line scanning;
Concrete grammar is that grating fringe image of choosing to tilt as shown in Figure 2 through opto-electronic conversion one-tenth 5 and the scanning datum line intersection point that is generated by computing machine 6 are the c of scanning center, simultaneously can on the vertical direction that grating fringe image 5 moves, obtain the grating fringe image in a grating cycle, grating fringe edge of image and the crossing frontier point a of scanning datum line
1And b
1, a
1And b
1The numerical value that is characterized is designated as primary importance value of information d
1Little mobile grating causes its grating fringe image to take place to move in the same way, as shown in phantom in Figure 2, can obtain and scan the frontier point a that datum line intersects equally
2And b
2, a
2And b
2The numerical value that is characterized is designated as second place value of information d
2
4) diverse location or different time grating fringe image are at interval compared, can obtain displacement, export by computer real-time.Be position variation delta d=d
1-d
2
Described grating fringe image 5 with diverse location or different time interval compares, and is about to computing machine 6 and utilizes scanning center that image is made binary conversion treatment, obtains positional information value d
1Little mobile scale grating (2), repeating step 3), obtain positional information value d
2The little shift position variation delta d=d of computing machine 6 outputs
2-d
2
Whole flow process can be generalized into:
Stripe pattern enters → binaryzation → obtain a
1, b
1→ mobile grating → stripe pattern enters → binaryzation → obtain a
2, b
2→ d
1, d
2→ Δ d=d
1-d
2
Dispose the scale grating of big reading index symbol, have the accurate indicating value of nanometer scale when can obtain on the full raster length wide range coarse reading.
Claims (3)
1, a kind of grating measuring method in image sensor for subdividing resolution into Nano level is characterized in that:
1) with lighting source (1) illuminated scale grating (2), scale grating (2) moves the optical information that is produced and is amplified by optical microscope system (3);
2) the photoelectronic imaging component side array image sensor of being placed as the place, plane by the object lens of optical microscope system (3) (4) receives, the image of grating fringe clearly (5) that amplifies on computing machine (6) display screen that obtains to connect with photoelectronic imaging component side array image sensor (4);
3) choose scanning center, realize interpretation and segmentation along scanning center's column or line scanning;
4) diverse location or different time grating fringe image (5) are at interval compared, can obtain displacement, by computing machine (6) output in real time.
2, a kind of grating measuring method in image sensor for subdividing resolution into Nano level according to claim 1, it is characterized in that: described grating fringe image (5) with diverse location or different time interval compares, be about to computing machine (6) and utilize scanning center that image is made binary conversion treatment, obtain positional information value d
1Little mobile scale grating (2), repeating step 3), obtain positional information value d
2The little shift position variation delta d=d of computing machine (6) output
1-d
2
3, a kind of grating measuring method in image sensor for subdividing resolution into Nano level according to claim 1, it is characterized in that: dispose the scale grating of big reading index symbol, have the accurate indicating value of nanometer scale when can obtain on the full raster length wide range coarse reading.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100503694A CN1300549C (en) | 2005-05-20 | 2005-05-20 | Grating measuring method in image sensor for subdividing resolution into Nano level |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100503694A CN1300549C (en) | 2005-05-20 | 2005-05-20 | Grating measuring method in image sensor for subdividing resolution into Nano level |
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| Publication Number | Publication Date |
|---|---|
| CN1696607A CN1696607A (en) | 2005-11-16 |
| CN1300549C true CN1300549C (en) | 2007-02-14 |
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Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101571377B (en) * | 2009-06-15 | 2011-09-28 | 成都千嘉科技有限公司 | Absolute coding raster phase subdivision method based on charge coupling device |
| CN107388975B (en) * | 2017-09-04 | 2020-02-18 | 上海理工大学 | Method for correcting length error |
| CN107388972B (en) * | 2017-09-04 | 2020-04-03 | 上海理工大学 | Correcting unit of trace displacement error |
| CN108196091B (en) * | 2018-03-30 | 2024-01-26 | 南京邮电大学 | Photoelectric acceleration sensor based on CMOS |
| CN114754681A (en) * | 2022-03-07 | 2022-07-15 | 上海微钠光电科技有限公司 | Nano displacement measuring device and method based on optical imaging sensing |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1189607A (en) * | 1997-01-26 | 1998-08-05 | 中国科学技术大学 | Atomic raster measuring method having 0.01 namometer resolution ratio |
| US6559937B2 (en) * | 1999-12-03 | 2003-05-06 | Sony Corporation | Inspection apparatus and method |
| CN1483995A (en) * | 2002-08-07 | 2004-03-24 | Լ����˹���Ǻ�����ʿ�ɷ�����˾ | Interferential position measuring device |
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2005
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1189607A (en) * | 1997-01-26 | 1998-08-05 | 中国科学技术大学 | Atomic raster measuring method having 0.01 namometer resolution ratio |
| US6559937B2 (en) * | 1999-12-03 | 2003-05-06 | Sony Corporation | Inspection apparatus and method |
| CN1483995A (en) * | 2002-08-07 | 2004-03-24 | Լ����˹���Ǻ�����ʿ�ɷ�����˾ | Interferential position measuring device |
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| CN1696607A (en) | 2005-11-16 |
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