CN1299317C - Electron gun possessing multilayer common lenses - Google Patents
Electron gun possessing multilayer common lenses Download PDFInfo
- Publication number
- CN1299317C CN1299317C CNB031007481A CN03100748A CN1299317C CN 1299317 C CN1299317 C CN 1299317C CN B031007481 A CNB031007481 A CN B031007481A CN 03100748 A CN03100748 A CN 03100748A CN 1299317 C CN1299317 C CN 1299317C
- Authority
- CN
- China
- Prior art keywords
- hole
- electron beam
- common
- grid
- lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Abstract
The present invention relates to an electron gun possessing a multilayer common lens, and provides a display component for improving the resolution and avoiding generating electron beam astigmatism. The present invention comprises a plurality of cathodes for generating a plurality of groups of electrons with energy, an electron beam forming area arranged between the cathodes and a display screen, and an electron lens area, wherein the electron lens area is positioned between the electron beam forming area and the display screen; the electron beam forming area and the cathodes are positioned in the same straight line position; the electron beam forming area comprises a first group of a plurality of electrodes arranged alternately, wherein each electrode is at least provided with more than one first electrode hole arranged linearly for the electrons with energy to penetrate for changing the electrons with energy into electron beams of increasing cross sections; the electron lens area comprises a second group of a plurality of electrodes arranged alternately, wherein each electrode is at least provided with more than two groups of common electrode holes arranged along a longitudinal axis for the electron beams to pass for forming a multilayer common lens.
Description
Technical field
The invention belongs to display components, the electron gun of the common lens of particularly a kind of tool multilayer.
Background technology
As shown in Figure 1, the known electron gun 1 that is used for color cathode ray tube (CRT), the electronics (electron) of its band energy is by negative electrode (cathode) 1K
R, 1K
G, 1K
BLaunch, and the electron beam forming area of directive electron gun 1 (Beam Forming Region), electron beam forming area system is made up of the control utmost point (control grid) 1G1, anode (screen grid) 1G2, burnt poly-grid 1G3 and grid 1G4.
Negative electrode in the cathode ray tube (cathode) 1K
R, 1K
G, 1K
BThe band energy electron that can produce is directive and pass and control utmost point hole 12a, 12b, 12c, 14a, 14b, 14c, 16a, 16b, the 16c that is arranged in a linear that offer on utmost point 1G1, anode 1G2, the focus mask 1G3 directly, and in electron beam forming area, form electron beam with less and rounded section.After treating that electron beam passes through electron beam forming area, will be by directive electronics convergent lens (focus lens), poly-lens (focus lens) can be distinguished into pre-convergent lens (pre-focus lens) that is formed by control utmost point 1G1 and anode 1G2 and the main convergent lens (main-focus lens) that is formed by poly-grid 1G3 of Jiao and grid 1G4, to make electron beam be assembled to the fluorescence coating 40 ' of cathode-ray tube displaying screen 42 ' respectively, form minimum convergent point.So, when electron beam with high-velocity scanning when the entire display screen curtain 42 ' of cathode-ray pipe is gone up, promptly produce the video image that desire is play on the display screen 42 '.
The electron gun of cathode ray tube is bigger along the size of its X-axis and Y-axis, and the video image resolution that is presented on the display screen 42 ' of cathode ray tube is better.Therefore, for many years, the design direction of high-res color cathode ray tube was paid attention to being transformed into the design of paying attention to common lens in the main lens design of electron beam out of the ordinary by the past, and its purpose is promptly in the effective dimensions that increases electron gun.Traditionally, when the main lens of design electron beam out of the ordinary, be to make each electron beam respectively by each self-defining lens space, and not with the shared lens space under it of other electron beam.During common lens, then is to make each electron beam not only can pass through each self-defining lens space respectively in design, also can with the shared lens space under it of other electron beam.
Be provided with another group for negative electrode 1K among the burnt poly-grid 1G3
R, 1K
G, 1K
B Utmost point hole 20a, 20b, 20c that the electron beam that produces passes through, burnt poly-grid 1G3 is provided with the common electron beam through hole (common beam passing aperture) 18 of chain form (chain linkshape) towards grid 1G4 one side, and grid 1G4 also is provided with the common electron beam through hole (common beam passing aperture) 22 of chain form (chain link shape) towards the side of the poly-grid 1G3 of Jiao, among the grid 1G4 and be provided with another group for negative electrode 1K
R, 1K
G, 1K
B Utmost point hole 24a, 24b, 24c that the electron beam that produces passes through.
For making negative electrode 1K
R, 1K
G, 1K
BThe electron beam that produces by all passing through common electron beam through hole 18,22 smoothly, electron gun must strengthen along the size of its X-axis and Y-axis, or dilated diameter, the resolution of the video image that is presented to improve on the display screen 42 ', therefore, electron gun also must strengthen along the size of Z axle.Yet,,, reduced the resolution of video image with causing the electron beam that passes through to produce asymmetrical astigmatism (asymmetric astigmatism) phenomenon owing to strengthen the size of electron gun along the Z axle.Astigmatism can be by can be by horizontal focusing voltage (horizontal focus voltage) V
FHWith vertical focusing voltage (vertical focus voltage) V
FVBetween difference value definition, i.e. astigmatism value=V
FH-V
FV
Electron beam utmost point hole dimension on the grid level is all very little, is example with the control utmost point (control grid) 1G1 and anode (screen grid) 1G2, the generally only about 0.3mm to 0.8mm of the diameter in utmost point hole on it; And the electron beam utmost point Kong Ze that burnt poly-grid 1G3 is offered towards anode 1G2 part is bigger, its diameter is generally about 1mm to 2mm, go up the electron beam utmost point hole of being offered on the subsequent gate levels such as remainder and grid 1G4 as for the poly-grid 1G3 of Jiao, its diameter is then bigger, with the color cathode ray tube electron gun is example, and the electron beam utmost point bore dia of being offered on these subsequent gate is generally about between 4.5mm to 7.5mm.By the above as can be known, in the electron gun of color cathode ray tube, be positioned at main convergent lens and form the electron beam utmost point hole of being offered on the grid in district (main focus lens region), based on considering during common lens (common lens) on the design electron gun, more near display screen 42 ', its diameter is bigger.In addition, when electron beam by behind the electron beam forming area, will be because of wherein with impacting the space electric field that is produced mutually between the radial velocity of energy electron and each electronics, thus make the diameter of electron beam become big gradually along directive display screen 42 ' direction.
Traditionally, the electron beam utmost point hole size of being offered on each grid of electron gun all has identical aperture, and the identical reason in aperture system can supply axle (mandrel) to run through wherein, when waiting to assemble grid, can make the grid level can be accurately positioned on the same straight line.Therefore, when electron beam by electron beam forming area and its diameter when the direction of directive display screen 42 ' enlarges gradually, the convergence effect that each grid produced in the electron beam forming area (focusing effect), will be different because of its position, wherein heal near the grid of display screen 42 ', to become gradually because of the diameter of electron beam greatly, and electron beam will be produced stronger convergence effect.Otherwise, heal away from the grid of display screen 42 ', will be less because of the diameter of electron beam, only electron beam is produced more weak convergence effect, astigmatism (astigmatism) takes place through the electron beam behind deflection scanning yoke (deflection yoke) deviation in this more weak convergence effect military order on its focus point (deflected beam spot) size, and the increase of landing of beam or projection distance (electronic beam ' s landing orthrow distance), also will cause defocusing phenomenon (out-of-focus), at above-mentioned astigmatism and defocusing phenomenon, generally all be to see through the grid away from display screen 42 ' is applied bigger dynamic convergence voltage (dynamic focus voltage), so that above-mentioned astigmatism and defocusing phenomenon are revised, otherwise, the then necessary design condition that changes whole electron gun.
As Figure 10, shown in Figure 11, inboard equipotential line 32 expressions of the electron gun 1 of the known common lens of individual layer are applied to static electron focusing electric field on the electron beam (electrostatic focus field) by poly-grid 1G3 of Jiao and grid 1G4, equipotential line then can be with poly-grid 1G3 of Jiao and the upward metal inner surface variation of each utmost point hole 24a, 24b, 24c of grid 1G4, equipotential line density between burnt poly-grid 1G3 and grid 1G4 is the highest, so the intensity of static electron focusing electric field will be the strongest with poly-grid 1G3 of Jiao and grid 1G4.
Summary of the invention
The purpose of this invention is to provide a kind of resolution that improves video image, avoid producing the electron gun of the common lens of tool multilayer of electron beam astigmatism.
The present invention includes a plurality of generation multi-group energy electrons negative electrode, be arranged at electron beam forming area and electron lens area between negative electrode and the display screen; And make electron lens area between electron beam forming area and display screen; Electron beam forming area and a plurality of negative electrode are positioned at same linear position, and it comprises a plurality of spaced first group of electrode, and establishing at least on each electrode is arranged in a linear more than one passes first utmost point hole that is transformed into increase section formation electron beam for the band energy electron; Electron lens area comprises a plurality of spaced second group of electrode, is provided with more than two groups axle longitudinally on each electrode at least and arranges the common pole hole passed through for electron beam to form the common lens of multilayer.
Wherein:
Since the present invention includes a plurality of generation multi-group energy electrons negative electrode, be arranged at electron beam forming area and electron lens area between negative electrode and the display screen; And make electron lens area between electron beam forming area and display screen; Electron beam forming area and a plurality of negative electrode are positioned at same linear position, and it comprises a plurality of spaced first group of electrode, and establishing at least on each electrode is arranged in a linear more than one passes first utmost point hole that is transformed into increase section formation electron beam for the band energy electron; Electron lens area comprises a plurality of spaced second group of electrode, is provided with more than two groups axle longitudinally on each electrode at least and arranges the common pole hole passed through for electron beam to form the common lens of multilayer.On the electrode of distinguishing at least more than one interruption-like arrangement of axle longitudinally at electronics thoroughly, offer the common pole hole of axle arrangement longitudinally more than at least two groups, to form the common lens of multilayer, use the length that increases electron gun, and the effective diameter of increase electron gun main focusing lens, with under the situation that need not apply big dynamic convergence voltage, effectively improve the video image resolution, thereby astigmatism and defocusing phenomenon take place in the unlikely electron beam that makes on the display screen of cathode ray tube.Not only improve the resolution of video image, and avoid producing the electron beam astigmatism, thereby reach purpose of the present invention.
Description of drawings
Fig. 1, be known CRT electrom gun vertical structure schematic sectional view.
Fig. 2, be the embodiment of the invention one structural representation cutaway view.
Fig. 3, be the burnt poly-grid 2G3 structural representation stereogram of the embodiment of the invention one.
Fig. 4, be the embodiment of the invention one grid 2G4 structural representation stereogram.
Fig. 5, be the embodiment of the invention one control utmost point 2G1, anode 2G2, burnt poly-grid 2G3 and grid 2G4 decomposition texture schematic isometric.
Fig. 6, be the embodiment of the invention two structural representation cutaway views.
Fig. 7, be the embodiment of the invention two second grid 3G5 structural representation stereograms.
Fig. 8, be the embodiment of the invention 2 the 3rd grid 3G6 structural representation stereogram.
Fig. 9, be the embodiment of the invention two control utmost point 3G1, anode 3G2, burnt poly-grid 3G3, first grid 3G4, second grid 3G5, the 3rd grid 3G6 decomposition texture schematic isometric.
Figure 10, be burnt poly-grid 1G3 of known CRT electrom gun and grid 1G4 equipotential line distribution map.
Figure 11, be burnt poly-grid 1G 3 in A-A position and grid 1G4 equipotential line distribution map among Fig. 1.
Figure 12, be burnt poly-grid 2G3 of the present invention and grid 2G4 equipotential line distribution map.
Figure 13, be burnt poly-grid 2G3 in B-B position and grid 2G4 equipotential line distribution map among Fig. 2.
Embodiment
Embodiment one
As Fig. 2, Fig. 3, Fig. 4, shown in Figure 5, the electron gun 2 of the common lens of tool multilayer of the present invention is coaxial bipotential (Inline bipotential) electron gun, and it comprises the negative electrode 2K of a plurality of generation multi-group energy electrons
R, 2K
G, 2K
B, be arranged at negative electrode 2K
R, 2K
G, 2K
BAnd electron beam forming area between the display screen 42 and electron lens area; And make electron lens area between electron beam forming area and display screen 42; Electron beam forming area and a plurality of negative electrode are positioned at same linear position, and it comprises first group of electrode that a plurality of spaced control utmost point 2G1, anode 2G2 and part focus mask 2G3 constitute; Electron lens area comprises a plurality of second group of electrode that is spaced another part focus mask 2G3 and grid 2G4 formation, at least be provided with more than two groups axle longitudinally on each electrode and arrange the common pole hole passed through for electron beam to form the common lens of multilayer, so that dispose the common lens of multilayer (multi-layer commonlens) in the main focusing lens (main focus lens).
Three negative electrode 2K
R, 2K
G, 2K
BProduce the band energy electron of three groups of different colours respectively, and make its directive control utmost point (control grid) 2G1 and anode (screen grid) 2G2, and run through linearly corresponding utmost point hole 52a, 52b, 52c and 54a, 54b, the 54c that arranges on control utmost point 2G1 and the anode 2G2.
Focus mask 2G3 is provided with one group of utmost point hole 56a, 56b, 56c that is spaced apart from each other towards anode 2G2 one side, and contiguous center section part is arranged with one group of utmost point hole 60a, 60b, 60c that is spaced apart from each other in the focus mask 2G3; Utmost point hole 56a, 56b, 56c and utmost point hole 60a, 60b, 60c system are positioned at same linear position with each electron beam respectively, so that each electron beam can pass through utmost point hole 56a, 56b, 56c, 60a, 60b, 60c smoothly.
Anode 2G2 system and voltage source V
GBe connected; Focus mask 2G3 then with voltage source V
FBe connected, control utmost point 2G1, anode 2G2 and focus mask 2G3 promptly form electron beam forming area of the present invention (Beam Forming Region towards the part of anode 2G2; BFR).
As Fig. 3, shown in Figure 5, the side that focus mask 2G3 goes up away from anode 2G2 is provided with end wall (endwall) 57, offer the common electron beam first microscler through hole 58 on the end wall 57,63 of its inwalls (Innerwall) are set up with the first microscler through hole 58 and are positioned at the common electron beam second microscler through hole 59 on the same linear position.
The first microscler through hole 58 is by three the chain form through holes of circular holes through amplifying and occuring simultaneously and form mutually at interval, wherein each circular hole respectively with focus mask 2G3 in utmost point hole 60a, 60b, 60c be positioned at same linear position so that each electron beam can pass through smoothly; The size of the second microscler through hole 59 and shape are identical with the first microscler through hole 58.
As Fig. 4, shown in Figure 5, grid 2G4 system and voltage source V
ABe connected the common formation of the another part of focus mask 2G3 and grid 2G4 main focusing lens of the present invention; Grid 2G4 goes up proximity focusing grid 2G3 one side and is provided with end wall (end wall) 65, offer the common electron beam first microscler through hole 61 on the end wall 65,67 of its inwalls (Inner wall) are set up with the first microscler through hole 61 and are positioned at the common electron beam second microscler through hole 62 on the same linear position.
The first microscler through hole 61 is by three the chain form through holes of circular holes through amplifying and occuring simultaneously and form mutually at interval, wherein each circular hole respectively with focus mask 2G3 in utmost point hole 60a, 60b, 60c be positioned at same linear position so that each electron beam can pass through smoothly; The size of the second microscler through hole 62 and shape are identical with the first microscler through hole 61.The position that grid 2G4 goes up contiguous display screen 42 is provided with one group of utmost point hole 64a, 64b, 64c that is spaced apart from each other, utmost point hole 64a, 64b, 64c system respectively with first and second microscler through hole 61,62 on corresponding circular hole be positioned at same linear position so that each electron beam can pass through utmost point hole 64a, 64b, 64c smoothly.
As shown in Figure 12 and Figure 13, inboard equipotential line 66 expressions of the electron gun 2 of the common lens of tool multilayer of the present invention are applied to static electron focusing electric field on the electron beam (electrostatic focus field) by poly-grid 2G3 of Jiao and grid 2G4, outside equipotential line then can be with poly-grid 2G3 of Jiao and the upward metal inner surface variation of each utmost point hole 60a, 60b, 60c, 64a, 64b, 64c of grid 2G4, equipotential line density between burnt poly-grid 2G3 and grid 2G4 is the highest, so the intensity of static electron focusing electric field will be the strongest with poly-grid 2G3 of Jiao and grid 2G4; In addition, the length that is arranged at the common electron beam second microscler through hole 59 of burnt poly-grid 2G3 inwall 63 and is arranged at the common electron beam second microscler through hole 62 military order electron beam focusing ranges (focus field) of grid 2G4 inwall 67 increases along X-direction of the present invention.Compare Figure 10, Figure 11 and Figure 12, the difference of Figure 13 can be known discovery, the equipotential line that is formed by poly-grid 2G3 of Jiao and grid 2G4 on the electron gun 2 of the common lens of tool multilayer of the present invention is along the equipotential line length that is formed by poly-grid 1G3 of Jiao and grid 1G4 on the electron gun 1 of the more known common lens of individual layer of electron beam direct of travel, this phenomenon, not only has on the electron gun 2 that increases the common lens of tool multilayer of the present invention main focusing lens along the effect of its longitudinal extent, and can make poly-grid 2G3 of more close Jiao of equipotential line on the electron gun 1 of the more known common lens of individual layer of equipotential line and the inner wall surface of grid 2G4, so, the effective diameter of main focusing lens will effectively be increased.Static electron focusing scope along Z-direction also extends in the electron gun 2 of the common lens of tool multilayer of the present invention in addition, make XY plane, the electron gun 2 upper edge static electron focusing lens effective diameter of the common lens of tool multilayer of the present invention increase, make the astigmatism that is caused therefore obtain adequate compensation, payment, and make the present invention under the situation that need not to apply than big dynamic convergence voltage, effectively improve the resolution of video image.
Embodiment two
As Fig. 6, Fig. 7, Fig. 8, shown in Figure 9, the electron gun 3 of the common lens of tool multilayer of the present invention is that four utmost points focus on (quadrupole focusing; QPF) electron gun, it comprises the negative electrode 3K of a plurality of generation multi-group energy electrons
R, 3K
G, 3K
B, be arranged at negative electrode 3K
R, 3K
G, 3K
BAnd electron beam forming area between the display screen 42 and electron lens area; And make electron lens area between electron beam forming area and display screen 42; Electron beam forming area and a plurality of negative electrode are positioned at same linear position, and it comprises first group of electrode that a plurality of spaced control utmost point 3G1, anode 3G2 and part focus mask 3G3 constitute; Electron lens area comprises a plurality of three groups of electrodes that are spaced another part focus mask 3G3, first grid 3G4, second grid 3G5, the 3rd grid 3G6 formation, at least be provided with more than two groups axle longitudinally on each electrode and arrange the common pole hole passed through for electron beam forming the common lens of multilayer, so that dispose the common lens of multilayer (multi-layer common lens) in pre-, the main focusing lens (main focus lens).
First grid 3G4 and focus mask 3G3 partly form prefocus lens (prefocus lens) towards first grid 3G4.
The common formation of the another part of second grid 3G5 and the 3rd grid 3G6 main focusing lens of the present invention;
Three negative electrode 3K
R, 3K
G, 3K
BProduce the band energy electron of three groups of different colours respectively, and make its directive control utmost point (control grid) 3G1 and anode (screen grid) 3G2, and run through linearly corresponding utmost point hole 72a, 72b, 72c and 74a, 74b, the 74c that arranges on control utmost point 3G1 and the anode 3G2.
Focus mask 3G3 is provided with one group of utmost point hole 76a, 76b, 76c that is spaced apart from each other towards anode 3G2 one side, and focus mask 3G3 is provided with one group of utmost point hole 78a, 78b, 78c that is spaced apart from each other towards first grid 3G4 one side; Utmost point hole 76a, 76b, 76c and utmost point hole 78a, 78b, 78c system are positioned at same linear position with each electron beam respectively, so that each electron beam can pass through utmost point hole 76a, 76b, 76c, 78a, 78b, 78c smoothly.
Anode 3G2 system and voltage source V
GBe connected; Control utmost point 3G1, anode 3G2 and focus mask 3G3 promptly form electron beam forming area of the present invention (Beam Forming Region towards the part of anode 3G2; BFR).
First grid 3G4 is provided with one group of utmost point hole 80a that is spaced apart from each other, 80b, 80c system is positioned at same linear position with electron beam respectively, so that each electron beam can pass through utmost point hole 80a, 80b, 80c smoothly.First grid 3G4 and focus mask 3G3 partly form prefocus lens (pre focus lens) towards first grid 3G4.
As Fig. 6, shown in Figure 8, second grid 3G5 and voltage source V
FBe connected, it is provided with utmost point hole 82a, 82b, the 82c of one group of each interval towards first grid 3G4 one side, contiguous center section part is arranged with one group of utmost point hole 84a, 84b, 84c that is spaced apart from each other in it, and make utmost point hole 82a, 82b, 82c, 84a, 84b, 84c be positioned at same linear position with control utmost point 3G1, anode 3G2, focus mask 3G3 and the last utmost point hole 72a of first grid 3G4,72b, 72c, 74a, 74b, 74c, 76a, 76b, 76c, 78a, 78b, 78c, 80a, 80b, 80c respectively, so that three negative electrode 3K
R, 3K
G, 3K
BThe electron beam that produces can pass through utmost point hole 72a, 72b, 72c, 74a, 74b, 74c, 76a, 76b, 76c, 78a, 78b, 78c, 80a, 80b, 80c, 82a, 82b, 82c smoothly.
The side that second grid 3G5 goes up away from first grid 3G4 is provided with end wall (end wall) 86, offer the common electron beam first microscler through hole 86 on the end wall 85,83 of the inwalls of its adjacent end wall 85 (Innerwall) are set up with the first microscler through hole 86 and are positioned at the common electron beam second microscler through hole 88 on the same linear position.
As shown in Figure 8, first and second microscler through hole 86,88 is by the chain form through hole of three interval circular holes through amplifying and occuring simultaneously and form mutually, wherein each circular hole respectively with second grid 3G5 in utmost point hole 84a, 84b, 84c be positioned at same linear position so that each electron beam can pass through smoothly.
As Fig. 7, shown in Figure 8, the 3rd grid 3G6 and and voltage source V
ABe connected the common formation of the another part of second grid 3G5 and the 3rd grid 3G6 main focusing lens of the present invention; The contiguous second grid 3G5 of the 3rd grid 3G6 one side is provided with end wall (end wall) 95, offer the common electron beam first microscler through hole 90 on the end wall 95,94 of its inwalls (Inner wall) are set up identical with first microscler through hole 90 size shape and are positioned at the common electron beam second microscler through hole 92 on the same linear position.
First and second microscler through hole 90,92 is by the chain form through hole of three interval circular holes through amplifying and occuring simultaneously and form mutually, wherein each circular hole respectively with second grid 3G5 in one group of utmost point hole 84a, 84b, 84c that is spaced apart from each other of stage casing part be positioned at same linear position so that each electron beam can pass through smoothly; The position of contiguous display screen 42 is provided with one group of utmost point hole 94a, 94b, 94c that is spaced apart from each other in the 3rd grid 3G6, utmost point hole 94a, 94b, 94c system respectively with first and second microscler through hole 90,92 on corresponding circular hole be positioned at same linear position, so that each electron beam can pass through utmost point hole 94a, 94b, 94c, the glass display screen 42 of directive cathode ray tube smoothly.
The institute the above, the present invention by in main focusing lens at least more than one along on the electrode of the interruption-like arrangement of longitudinal axis of the present invention, offer the common pole hole of axle arrangement longitudinally more than at least two groups, to form the common lens of multilayer, use the length that increases electron gun, and the effective diameter of increase electron gun main focusing lens, with under the situation that need not apply big dynamic convergence voltage, effectively improve the video image resolution, thereby astigmatism and defocusing phenomenon take place in the unlikely electron beam that makes on the display screen of cathode ray tube.
Claims (17)
1, the electron gun of the common lens of a kind of tool multilayer, it comprise the negative electrode of a plurality of generation multi-group energy electrons and be arranged at negative electrode and display screen between electron beam forming area; Electron beam forming area and a plurality of negative electrode are positioned at same linear position, and it comprises a plurality of spaced first group of electrode, and establishing at least on each electrode is arranged in a linear more than one passes first utmost point hole that is transformed into increase section formation electron beam for the band energy electron; It is characterized in that between described electron beam forming area and display screen, being provided with electron lens area; Electron lens area comprises a plurality of spaced second group of electrode, at least be provided with more than two groups axle longitudinally on each electrode and arrange the common pole hole passed through for electron beam forming the common lens of multilayer, and this common pole hole is common utmost point hole between each electron beam in every group.
2, the electron gun of the common lens of tool multilayer according to claim 1 is characterized in that on described a plurality of negative electrode, first group of each electrode of electrode of electron beam forming area that the common pole hole is positioned on the straight line to constitute coaxial bipotential electron gun on first utmost point hole and second group of each electrode of electrode of electron lens area.
3, the electron gun of the common lens of tool multilayer according to claim 1 and 2 is characterized in that described electron beam forming area is that the control utmost point, anode and focus mask are towards the anode part along the spaced a plurality of first group of electrode of display screen direction in regular turn.
4, the electron gun of the common lens of tool multilayer according to claim 3 is characterized in that the described control utmost point, anode and focus mask partly are respectively equipped with one group of utmost point hole that is spaced apart from each other towards anode; Contiguous center section part is arranged with that another group is spaced apart from each other and be positioned at the utmost point hole that same linear position passes through smoothly to make electron beam with negative electrode in the focus mask.
5, the electron gun of the common lens of tool multilayer according to claim 4, it is characterized in that described focus mask is provided with the end wall that offers the common electron beam first microscler through hole away from a side of anode, its inwall is set up with the first microscler through hole and is positioned at the common electron beam second microscler through hole on the same linear position.
6, the electron gun of the common lens of tool multilayer according to claim 5, it is characterized in that described first and second microscler through hole is that circular holes are through the chain form through hole that amplifies and mutual common factor forms at interval by three, wherein each circular hole is positioned at same linear position so that each electron beam passes through smoothly with negative electrode respectively.
7, the electron gun of the common lens of tool multilayer according to claim 1 and 2, the electron lens area that it is characterized in that the common lens of described formation multilayer have the main focusing lens that is made of in the face of another part of grid grid and focus mask; Grid proximity focusing grid one side is provided with the end wall that offers the common electron beam first microscler through hole, and its inwall is set up with the first microscler through hole and is positioned at the common electron beam second microscler through hole on the same linear position.
8, the electron gun of the common lens of tool multilayer according to claim 7, it is characterized in that first and second microscler through hole is that circular holes are through the chain form through hole that amplifies and mutual common factor forms at interval by three on the described grid, wherein each circular hole is positioned at same linear position so that each electron beam passes through smoothly respectively with negative electrode.
9, the electron gun of the common lens of tool multilayer according to claim 8, the position that it is characterized in that on the described grid contiguous display screen be provided with one group be spaced apart from each other respectively with first and second microscler through hole on corresponding circular hole be positioned at the utmost point hole of same linear position.
10, the electron gun of the common lens of tool multilayer according to claim 1 is characterized in that on described a plurality of negative electrode, first group of each electrode of electrode of electron beam forming area that the common pole hole is positioned on the straight line to constitute four utmost point focused electron rifles on first utmost point hole and second group of each electrode of electrode of electron lens area.
11, the electron gun of the common lens of tool multilayer according to claim 10 is characterized in that described electron beam forming area is that the control utmost point, anode and focus mask are towards the anode part along the spaced a plurality of first group of electrode of display screen direction in regular turn.
12, the electron gun of the common lens of tool multilayer according to claim 11 is characterized in that the described control utmost point, anode and focus mask partly are respectively equipped with one group of utmost point hole that is spaced apart from each other towards anode; Contiguous center section part is arranged with that another group is spaced apart from each other and be positioned at the utmost point hole that same linear position passes through smoothly to make electron beam with negative electrode in the focus mask.
13, the electron gun of the common lens of tool multilayer according to claim 12, the electron lens area that it is characterized in that the common lens of described formation multilayer have the prefocus lens that is made of in the face of another part of grid first grid and focus mask.
14, the electron gun of the common lens of tool multilayer according to claim 13 is characterized in that the adjacent second grid that is provided with of first grid of described formation prefocus lens; Second grid is provided with one group of each interval and negative electrode is positioned at the utmost point hole that same linear position passes through smoothly to make electron beam towards first grid one side; Contiguous center section part is arranged with one group of utmost point hole that is spaced apart from each other in it; Side away from first grid on the second grid is provided with the end wall that offers the common electron beam first microscler through hole, and the inwall of its adjacent end wall is set up with the first microscler through hole and is positioned at the common electron beam second microscler through hole on the same linear position.
15, the electron gun of the common lens of tool multilayer according to claim 14, it is characterized in that described first and second microscler through hole is that circular holes are through the chain form through hole that amplifies and mutual common factor forms at interval by three, wherein each circular hole is positioned at same linear position so that each electron beam passes through smoothly with negative electrode respectively.
16, the electron gun of the common lens of tool multilayer according to claim 14 is characterized in that another part of described second grid is provided with the 3rd grid that it constitutes main focusing lens; Contiguous second grid one side of the 3rd grid is provided with the end wall that offers the common electron beam first microscler through hole, and its inwall is set up identical with the first microscler through hole size shape and is positioned at the common electron beam second microscler through hole on the same linear position.
17, the electron gun of the common lens of tool multilayer according to claim 16, it is characterized in that described first and second microscler through hole is that circular holes are through the chain form through hole that amplifies and mutual common factor forms at interval by three, wherein each circular hole is positioned at same linear position so that each electron beam passes through smoothly with negative electrode respectively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB031007481A CN1299317C (en) | 2003-01-21 | 2003-01-21 | Electron gun possessing multilayer common lenses |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB031007481A CN1299317C (en) | 2003-01-21 | 2003-01-21 | Electron gun possessing multilayer common lenses |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1519885A CN1519885A (en) | 2004-08-11 |
| CN1299317C true CN1299317C (en) | 2007-02-07 |
Family
ID=34281294
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB031007481A Expired - Fee Related CN1299317C (en) | 2003-01-21 | 2003-01-21 | Electron gun possessing multilayer common lenses |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1299317C (en) |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN87100733A (en) * | 1986-02-19 | 1987-11-18 | 株式会社日立制作所 | Electron gun for color picture tube |
| JPH06275212A (en) * | 1993-03-11 | 1994-09-30 | Samsung Display Devices Co Ltd | Electron gun for cathode-ray tube |
| CN1114465A (en) * | 1994-06-30 | 1996-01-03 | 中华映管股份有限公司 | Colour kinescope electron gun with hollow chain-shaped mainlens and unidirectional extension hole circular symmetric auxiliary lens |
| CN1153993A (en) * | 1995-12-30 | 1997-07-09 | 三星电管株式会社 | Electron gun for color cathode ray tube |
| CN1166691A (en) * | 1996-03-22 | 1997-12-03 | Lg电子株式会社 | Dynamic 4 polar electrode system in pre-focusing electrode in electron gun for color cathode ray tube |
| US5814929A (en) * | 1994-09-14 | 1998-09-29 | Lg Electronics Inc. | Electron gun with quadrupole electrode structure |
| TW347145U (en) * | 1994-07-15 | 1998-12-01 | Chunghwa Picture Tubes Ltd | Deflection apparatus for electronic gun of common main lens used for color tube |
| CN1243331A (en) * | 1998-07-27 | 2000-02-02 | 东芝株式会社 | Colour cathode-ray tube |
| CN1290023A (en) * | 1999-09-22 | 2001-04-04 | 株式会社日立制作所 | Color cathode ray tube |
| CN1344008A (en) * | 2000-09-08 | 2002-04-10 | 株式会社日立制作所 | Color CRT having multiple electrostatic four-electrode lens |
-
2003
- 2003-01-21 CN CNB031007481A patent/CN1299317C/en not_active Expired - Fee Related
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN87100733A (en) * | 1986-02-19 | 1987-11-18 | 株式会社日立制作所 | Electron gun for color picture tube |
| JPH06275212A (en) * | 1993-03-11 | 1994-09-30 | Samsung Display Devices Co Ltd | Electron gun for cathode-ray tube |
| CN1114465A (en) * | 1994-06-30 | 1996-01-03 | 中华映管股份有限公司 | Colour kinescope electron gun with hollow chain-shaped mainlens and unidirectional extension hole circular symmetric auxiliary lens |
| TW347145U (en) * | 1994-07-15 | 1998-12-01 | Chunghwa Picture Tubes Ltd | Deflection apparatus for electronic gun of common main lens used for color tube |
| US5814929A (en) * | 1994-09-14 | 1998-09-29 | Lg Electronics Inc. | Electron gun with quadrupole electrode structure |
| CN1153993A (en) * | 1995-12-30 | 1997-07-09 | 三星电管株式会社 | Electron gun for color cathode ray tube |
| CN1166691A (en) * | 1996-03-22 | 1997-12-03 | Lg电子株式会社 | Dynamic 4 polar electrode system in pre-focusing electrode in electron gun for color cathode ray tube |
| CN1243331A (en) * | 1998-07-27 | 2000-02-02 | 东芝株式会社 | Colour cathode-ray tube |
| CN1290023A (en) * | 1999-09-22 | 2001-04-04 | 株式会社日立制作所 | Color cathode ray tube |
| CN1344008A (en) * | 2000-09-08 | 2002-04-10 | 株式会社日立制作所 | Color CRT having multiple electrostatic four-electrode lens |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1519885A (en) | 2004-08-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1134814C (en) | Color cathode ray tube having a low dynamic focus voltage | |
| CN1050439C (en) | Color braun tube apparatus | |
| CN1045842C (en) | In-line type electron gun assembly including electrode units having electron beam passage holes of different sized for forming an electrostatic lens | |
| JPS63105440A (en) | Electron gun for color cathode-ray tube | |
| CN1106953A (en) | Color picture tube with reduced dynamic focus voltage | |
| JP2569027B2 (en) | Electron gun for color picture tube | |
| JPH03233838A (en) | Electron gun and cathode-ray tube | |
| CN1299317C (en) | Electron gun possessing multilayer common lenses | |
| CN1058103C (en) | Color cathode ray tube having improved focus | |
| CN1259755A (en) | Dynamic focusing electron gun of color cathode-ray tube | |
| CN1157753C (en) | Electron gun for color cathode ray tubes | |
| JPH05251014A (en) | Electron gun for color picture tube | |
| CN1130302A (en) | Colour display system by using quadrupole lens | |
| CN1165069C (en) | Cathode-ray tube device | |
| CN1084927C (en) | Electronic gun for color cathode ray tube | |
| JPH05325825A (en) | Electron gun for color cathode-ray tube | |
| CN100339930C (en) | Colour kinescope | |
| CN1207751C (en) | Electron gun for CRT | |
| US6750601B2 (en) | Electron gun for color cathode ray tube | |
| CN1296960C (en) | In-line electron gun and colour kinescope utilizing it | |
| CN1165948C (en) | Cathode ray tube equipment | |
| CN1269176C (en) | Color cathode-ray tube | |
| KR100237082B1 (en) | Hollow chain link main lens design for color cathode ray tube | |
| KR100319087B1 (en) | Electron gun for color cathode ray tube | |
| CN1507001A (en) | CRT electron gun with gradually reduced electron beam hole size |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20070207 Termination date: 20110121 |