CN1295500C - 电吸附找矿方法 - Google Patents
电吸附找矿方法 Download PDFInfo
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Abstract
本发明公开了一种电吸附找金属矿和油气矿的方法。它是将采集的样品,放入电吸附仪器,加入助剂和吸收介质,然后在吸附仪器内插入电极通直流电进行电吸附,提取在后生地球化学作用下从深部矿体带运移到地表并被土壤所吸附的成矿元素和伴生元素,然后,对这些元素成分进行分析测试,通过计算机编制电吸附异常图,根据异常图结合异常模式进行综合判断,确定有矿体或无矿体的位置。这种找矿方法设备简单,成本低,工作效率高,探测深度大,干扰因素少,质量容易控制、找矿效果好等优点。
Description
(一)技术领域:
本发明涉及一种找矿方法,特别是适用于找金属矿和油气矿的电吸附找矿方法。
(二)背景技术:
目前,地质找金属矿和油气矿的方法,通常采用地电提取法,它是在找矿区的土壤上定采样点,在采样点设置电极,通220V高压电48小时,提取土壤中的元素信息,然后采样进行化验分析,根据化验分析的资料,再进行钻探找矿,这种找矿方法成本高,干扰因素多,准确率低。
(三)发明内容:
本发明的目的是要提供一种快速,成本低,工作效率高,探测深度大,干扰因素少,适于找金属矿和油气矿的电吸附找矿方法。
本发明是通过下列步骤实现的:
1、野外定位采样:
①采样点定位:找金属矿,利用罗盘和测绳定位,20米一个点距,误差精度要求小于0.5米。在矿化或者有利地段要加密布点。找油气矿采用GPS结合地形地质定位,误差精度要小于10米,普查采用1~3个点每平方公里,详查采用4~8个点每平方公里,高精度评价采用9~12个点每平方公里。
②采样深度和层位,野外采样方法与常规次生晕采样方法相同,在相同的景观条件下尽量采集同一深度的土壤样品,在不同的矿种和矿区采样深度可以是不同的:金属矿是0.5米左右,而油田是0.8米左右。采样层位,要求均采集同一层位的土壤,尽可能取相同的介质,避开污染,通常是采集土壤中的B层。
③样品加工:采集的土壤样品宜风干,压碎,不宜高温烘烤和研磨,土壤样品的粒度为80~120目,岩石样品为200目。
2、室内电吸附:
①称取样品:称取5~50克已加工好的样品,分别放入电吸附仪器中,该仪器是由一组电吸附容器组成,样品均匀分布在容器的底部;
②加入助剂:在各电吸附容器内加入有助于元素保持可溶状态的试剂,同一批样品应保持助剂的加入量相同;助剂为有机酸、有机碱或有机盐;
③加入吸附介质:将活性炭、树脂或硝化棉等具有吸附作用的介质,浸没在上述电吸附容器内已沉淀透明的试剂中;
④插入电极:在上述电吸附容器的试剂液中,插入电极,并使电极保持固定相同高度;
⑤接通电源进行电吸附:用10~15V的直流电接通已插入电吸附容器中的两个电极进行电吸附,最好使用脉冲直流电源,通电1~4小时后,将吸附体取出送分析测试;
⑥进行分析测试:将吸附体取出,经灰化后溶解,用原子吸收分析测试,并将测试数据直接存入计算机;
⑦编制电吸附异常图:将计算机的数据处理后,用MPGS或SURFER软件编制出电吸附异常图。
3、异常找矿:
根据异常图确定的位置结合异常模式进行综合分析,并选择有利地段进行钻探,就能发现矿体或矿化。
电吸附法找矿,是通过物理化学手段来发现后生地球化学异常的找矿方法,它是建立在异常元素地球化学理论和野外地电提取法理论基础之上的,其原理是:成矿元素和伴生元素是在后生地球化学作用下,从深部矿体带到地表后被土壤所吸收的那部分元素的含量,电吸附法就是提取直接反映深部矿体的成矿元素和伴生元素信息。因此本发明具有设备简单,成本低,速度快,探测深度大,干扰少,工作效率高,找矿效果好等优点。
(四)具体实施例:
本发明在我国康家湾铅锌金银矿、大厂锡矿、大红山铜矿等十多个已知矿床进行找矿效果试验,均得到了很好的验证效果。利用本发明在铜陵矿区进行找矿,并钻探。具体实施步骤如下:
按照20米的点距采集0.6米深处的B层土壤,加工成大于120目的样品18件,在室内将样品称取20克放入电吸附容器中,用PH值为4.5的氯苯溶液作助剂,用硝化泡塑作为吸附介质,插入铂电极,通电,进行4小时的电吸附后,将吸附体取出灰化溶解,用原子吸收测试,结果在这个区域测线的东部出现了异常,后在这些异常位置进行钻探,找到了矿体,矿化及矿体分布位置与异常反映位置完全吻合,说明电吸附方法找矿的有效性。
Claims (1)
1、一种电吸附找矿方法,包括野外定位、采样、室内样品电吸附,吸附体的分析测试和编制电吸附异常图,其特征是:
①在电吸附仪器中加入有助于元素保持可溶状态的试剂,同一批样品助剂加入量相同,助剂为氯苯溶液;
②加入的吸附介质为活性炭、树脂或硝化棉,吸附介质浸没在上述电吸附容器内已沉淀透明的试剂中;
③在电吸附的试剂液中插入电极,接通10-15V的脉冲直流电源,通电1~4小时,进行电吸附。
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Publication number | Priority date | Publication date | Assignee | Title |
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EP0555063A2 (en) * | 1992-02-03 | 1993-08-11 | Kokusai Denshin Denwa Kabushiki Kaisha | Optical waveform shaping device |
JPH09197449A (ja) * | 1996-01-18 | 1997-07-31 | Kokusai Denshin Denwa Co Ltd <Kdd> | 光パルス発生装置 |
JP2002271084A (ja) * | 2001-03-09 | 2002-09-20 | Yokohama Rubber Co Ltd:The | 電波吸収体の作製方法およびプログラム |
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Publication number | Priority date | Publication date | Assignee | Title |
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EP0555063A2 (en) * | 1992-02-03 | 1993-08-11 | Kokusai Denshin Denwa Kabushiki Kaisha | Optical waveform shaping device |
JPH09197449A (ja) * | 1996-01-18 | 1997-07-31 | Kokusai Denshin Denwa Co Ltd <Kdd> | 光パルス発生装置 |
JP2002271084A (ja) * | 2001-03-09 | 2002-09-20 | Yokohama Rubber Co Ltd:The | 電波吸収体の作製方法およびプログラム |
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