CN1293381A - Position phase type ultra-high-difinition long focal iris - Google Patents
Position phase type ultra-high-difinition long focal iris Download PDFInfo
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- CN1293381A CN1293381A CN 00127615 CN00127615A CN1293381A CN 1293381 A CN1293381 A CN 1293381A CN 00127615 CN00127615 CN 00127615 CN 00127615 A CN00127615 A CN 00127615A CN 1293381 A CN1293381 A CN 1293381A
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Abstract
A position-phase type iris with long focus depth and ultra-high difinition features that the concave ring and convex ring, which are concentric with iris, are made on a parallel plate made of transparent material. After light beam passes through the iris with concave and convex rings, a retardation between said light beam and the light beam passing through other position is half of wavelenglth, so axial peaks are cancelled to elongate focus depth by more than 3 times and radical edges are cancelled to increase difinition. It can be used in microelectronic processing, photoetching and scan microscopic focusing or imaging system.
Description
The present invention is a kind of phase-type super-resolution diaphragm that is used to prolong the focused beam depth of focus.It can be widely used in optical imaging system and light beam focusing system.
All wish to obtain littler focal beam spot in microelectronics processing, photoetching technique, scanning microtechnic and high density compact disc storage, this just requires shorter optical maser wavelength and the more focusing objective len of high-NA is arranged, because the halfwidth of focused beam can be expressed as
λ is the laser beam wavelength of incident in the formula, and NA is the numerical aperture of focusing objective len.Super resolution technology (being exactly the technology that exceeds diffraction limit) also is to be usually used in one of method of dwindling measuring point, it is by placing a diffraction type or refractive diaphragm in the collimated light path before focusing objective len, the amplitude or the position that change incident light distribute mutually, make to diminish through the Airy disk master spot on the focal plane after the lens focus.But along with the increase with the focusing objective len numerical aperture of reducing of the optical maser wavelength of using, the depth of focus of focused beam reduces rapidly because light beam after focusing on depth of focus and the pass of numerical aperture of objective and incident light wave length be:
This depth of focus is defined as the full duration when intensity is reduced to peak strength 80% vertically.The optical maser wavelength how digitizing is at present used with CD DVD is 0.65 micron, the numerical aperture of focusing objective len is 0.6, thereby its depth of focus is 1.8 microns, for DVD of future generation is that high-density digitalization is used CD HDVD more, it uses optical maser wavelength is 0.4～0.5 micron, the focusing objective len numerical aperture is 0.85, so its depth of focus has only 0.55～0.69 micron, what the servo-drive system of focusing was like this produced when being difficult to follow the tracks of the disc high-speed rotation beats.Depth of focus is too short also to be the difficult problem of microelectronics processing, photoetching technique and scanning microtechnic simultaneously.Though formerly also there is pair phase-type super-resolution diaphragm to carry out research in the technology (referring to [1] .Hideo ANDO, Phase-Shifting Apodizer of Three or MorePortions, Jpn.J.Appl.Phys.Vo1.31 pp.557-567,1992.[2] .Tasso R.M.Sales andG.Michael Morris, Diffractive superresolution elements, J.Opt.Soc.Am.A/V0l.14pp1637-1646,1997), thereby but do not utilize this class diaphragm axially to optimize to obtain the work of long depth of focus; What have has carried out studying (referring to [3] .J.Ojeda-Castaneda to prolonging depth of focus, P.Andres, and A.Diaz, Annular apodizers for low sensitivity to defocus and to spherical aberrration, Opt.Lett.Vol.11, No.8 pp487-489,1986.[4] .J.Ojeda-Casta
Eda, L.R.Berriel-Valdos, and E.Montes, Spatial filter for increasing the depth of focus, Opt.Lett.Vol.10, No.11, pp520-522,1985.), but owing to consequently distributing mutually from amplitude and the position that the intensity distributions of expection is derived required diaphragm, thereby distribution is very complicated mutually the amplitude of the diaphragm of asking and position, the very difficult making of such diaphragm, and owing to there is Modulation and Amplitude Modulation, its capacity usage ratio is lower.
The purpose of this invention is to provide a kind of pure phase-type super-resolution diaphragm simple in structure light beam after focusing on is carried out axially and radially optimizing, when obtaining super-resolution, make depth of focus prolong, the influence of system performance when reducing plug moral spherical aberration out of focus.
Position phase type ultra-high-difinition long focal iris of the present invention comprises the parallel flat 202 that is made of transparent material, contains concave ring 201 or convex ring 201 with parallel flat 202 concentricity O on parallel flat 202.The degree of depth of concave ring 201 or convex ring 201
, λ is the wavelength of incident beam in the formula, n
1For constituting the refractive index of parallel flat (202) material, n
0Refractive index for air.The interior radius of circle b of concave ring 201 or convex ring 201 is 1 o'clock with respect to clear aperature normalization radius value, is 0≤b≤0.35, and exradius a is a=0.4+0.0932b+1.5973b
2, perhaps a=0.36+0.0842b+2.0787b
2
The transparent material of said formation parallel flat 202 is transparent organic materials, or quartzy, or glass material.
The present invention's structure from the above mentioned, as Fig. 2, shown in Figure 3, among the figure on the parallel flat 202 201 is concave ring, all be in the same plane beyond the concave ring 201, make that just on the throne going up mutually produces the π phasic difference by the light of concave ring 201 and the optical path difference that produces half wavelength by the light beyond the concave ring 201.The degree of depth of concave ring 201 by
Provide, wherein, λ is the wavelength of incident beam, n
1Be the refractive index of parallel flat 202 materials, n
0Refractive index for air.When the clear aperature radius of getting optical system was 1 for the normalization radius value, then the pass between radius of circle b and the exradius a was in the concave ring 201: a=0.4+0.0930b+1.5973b
2, 0≤b≤0.35 wherein, a, b are 1 o'clock for the value with respect to the clear aperature radius.When if incident beam is gaussian shaped profile, the waist radius of getting light beam is the logical light radius value 1 of 1 conduct, and then the result of You Huaing is: a=0.36+0.0842b+2.0787b
20≤b≤0.3 wherein, its dynamic process as shown in Figure 1, when light source 1 for collimated laser beam during through super-resolution diaphragm 2 of the present invention, light and light on light path the phase difference of half wavelength of process concave ring 201 by concave ring 201 parts with interior roundlet and concave ring 201 outer parts, just go up phase difference of pi mutually in space bit, that is to say that light beam is divided into three part light through diaphragm 2, this three parts light after lens 3 focus on vertically the implementation space peak value disappear mutually, so peak value originally becomes smoothly, thus the prolongation of realization depth of focus; Realize that radially its edge disappears mutually,, thereby realize the raising of resolution so that hot spot becomes is littler.The material of parallel flat 202 can be chosen transparent organic material, quartz or the glass material as PC and so on.In large-scale production, the making of this diaphragm can be adopted the way of mold pressing.Radially the error of Yun Xuing is ± 1%, and the error that the degree of depth h of convex ring 201 or concave ring 201 allows is ± 2%.If be used in the experiment, then can adopt the way of plated film, promptly in above-mentioned, plate the layer of transparent deielectric-coating between radius of circle b and the exradius a, make light produce the optical path difference of half wavelength by coating film area and coating film area not.But must calculate this moment to the coating film area and the transmissivity of coating film area not, be optimized focusing on the radial and axial light distribution in back again then, provides the b that optimized and the value of a.
For above-mentioned reasons, thus the present invention following advantage is arranged: realized the raising of resolution when 1) prolonging depth of focus; 2) the prolongation amount of depth of focus can realize by the value of suitably choosing b and a, and depth of focus prolongs multiple and is higher than three times; 3) diffraction efficiency height, 4) produce in a large number easily and duplicate; 5) can be applicable in other focusing or the imaging system, in microelectronics processing, photoetching technique and scanning microtechnic, have wide practical use.
Description of drawings:
Fig. 1 places the synoptic diagram of implementing light path for super-resolution diaphragm of the present invention.
Fig. 2 is the structural representation of super-resolution diaphragm of the present invention.
Fig. 3 is the concrete structure synoptic diagram of super-resolution diaphragm of the present invention; Wherein Fig. 3-1 is the A-A cut-open view of Fig. 3-2, and Fig. 3-2 is the front elevation of diaphragm.
Fig. 4 is for adding super-resolution diaphragm surface of intensity distribution on the axle when not adding the super-resolution diaphragm.
Fig. 5 represents the change curve of spot size with the out of focus distance.
Fig. 6 adds the forward and backward and hot spot pattern when having added out of focus behind the super-resolution diaphragm of super-resolution diaphragm.
Fig. 7 is the three-dimensional hot spot spread function figure that has added behind the super-resolution diaphragm.
Fig. 8 is the three-dimensional hot spot spread function of former optical system.
Embodiment:
We optimize axial light distribution at different b values, have provided the value of a series of b and a.Different b and the value of a be corresponding to different depth of focus prolongation amounts, provided a series of b, a, depth of focus by table 1 and table 2 and prolonged multiple, half-breadth than, secondary lobe intensity, the Si Teer ratio with respect to main spot.Table 1
More than be to be even distribution situation to incident light, i.e. the laser situation that expands bundle through high power, the waist radius of its light beam is much larger than the clear aperature of optical system; Expand under the bundle situation in low power, the waist radius that people often get light beam equals the radius of optical system clear aperature, choose the numerical aperture that can make full use of optical system like this, can improve the utilization factor of luminous energy again, following table be at Gaussian beam carry out the even distribution optimization of axial light intensity a series of values.Table 2
More than the meaning of each parameter in two tables be respectively:
B: ring radius in the concave ring of three band super-resolution diaphragms or the dome ring.
A: the concave ring or the convex ring exradius of three band super-resolution diaphragms.
Depth of focus prolongs multiple: add depth of focus length and the depth of focus length ratio that does not add diaphragm of the present invention behind the diaphragm of the present invention.
Halfwidth: light intensity is reduced to the full duration of peak strength one half on the focused beam plane with a tight waist.
Half-breadth ratio: the ratio that adds halfwidth and the halfwidth that does not add diaphragm of the present invention behind the diaphragm of the present invention.
Si Teer ratio: add on the focused beam face with a tight waist behind the diaphragm of the present invention the ratio of central peak intensity on the central peak intensity and the focused beam that does not add diaphragm of the present invention face with a tight waist, it has illustrated and has added that the light intensity at focused beam focus place decreases behind the diaphragm of the present invention.
The secondary lobe relative intensity: the ratio of the peak strength of focused beam first secondary lobe and the peak strength of main spot, it is one of index of weighing the focused beam quality, and the secondary lobe relative intensity is low more, and beam quality is good more.
As shown in Figure 1, 2.Choosing that the interior circle of super-resolution diaphragm 2 and exradius be respectively 0.27,0.54 (is with respect to the clear aperature radius) at 1 o'clock and it is applied in light source 1 light beam wavelength λ is 0.4 micron, condenser lens 3 numerical apertures are NA=0.85, when the clear aperature radius is 3.36 millimeters a optical system, the interior radius of circle of super-resolution diaphragm and exradius are respectively 0.907 millimeter and 1.814 millimeters, and the halfwidth of focused beam is by original D
0=0.235 micron is reduced to the D=0.188 micron, is original 0.8 times; Depth of focus length is by original L
0=0.55 micron extends to the L=1.72 micron, is original 3.1 times.Light distribution is more even on the axle, when on the optical head that is used for CD drive, reduced the CD drive servo difficulty of focusing, and reduced the focusing servo time; The material that constitutes the parallel flat 202 of super-resolution diaphragm 2 is a K9 glass, thickness d=2 millimeter (N=1/5, Δ N=1/10, Q=20``), the refractive index of K9 glass in wavelength X=0.4 micron is 1.5304, thereby 201 degree of depth of the concave ring on the diaphragm are the h=0.377 micron.Fig. 4 is that machine is simulated given numerical result figure as calculated to Fig. 8.Fig. 4 is the axial curve of light distribution that has added super-resolution diaphragm of the present invention front and back, situation when solid line 401 correspondences do not add the super-resolution diaphragm among the figure, dotted line 402 is corresponding to the situation that has added the super-resolution diaphragm, depth of focus has prolonged 3.1 times after having added the super-resolution diaphragm, and, in in a big way, light distribution is constant substantially on the axle.Fig. 5 represents the variation of the size of focal beam spot halfwidth with the out of focus distance, the ratio of the halfwidth that the given numerical value of Y-axis is actual halfwidth when not adding the super-resolution diaphragm among the figure, and it shows and has added behind the super-resolution diaphragm resolution with the variation of out of focus distance; As can be seen from Figure 5, halfwidth increases to some extent after the out of focus, but in focal depth range, hot spot halfwidth 0.9 times when not adding the super-resolution diaphragm, just in the resolution of focal depth range inner light beam than the resolution height of former optical system at the focus place.After Fig. 6 represents to add curve 601, back curve 602 before the super-resolution diaphragm and has added the super-resolution diaphragm when defocusing amount is 0.86 μ m 603 the radially curve of light distribution, as can be seen from the figure, after having added the super-resolution diaphragm, hot spot reduces 20%, but hot spot increases to some extent when out of focus distance is 0.86 μ m, but the hot spot when not adding the super-resolution diaphragm still is little by 10%.Fig. 7 is the three-dimensional point spread function figure that has added behind the super-resolution diaphragm, and Fig. 8 is the three-dimensional hot spot spread function figure when not adding the super-resolution diaphragm, and comparison diagram 7 and Fig. 8 are as can be seen, after having added the super-resolution diaphragm, axially light distribution is more even, and depth of focus has obtained prolongation, and hot spot radially is less.
Claims (2)
1. position phase type ultra-high-difinition long focal iris comprises:
＜1〉by parallel flat (202) that transparent material constituted;
It is characterized in that:
＜2〉on parallel flat (202), contain concave ring (201) or convex ring (201) with parallel flat (202) concentricity (O);＜3〉degree of depth of concave ring (201) or convex ring (201)
λ is the wavelength of incident beam in the formula, n
1For constituting the refractive index of parallel flat (202) material, n
0Refractive index for air;
＜4〉the interior radius of circle b of concave ring (201) or convex ring (201) is 1 o'clock with respect to the clear aperature radius, is 0≤b≤0.35, and exradius a is a=0.4+0.0932b+1.5973b
2, perhaps a=0.36+0.0842b+2.0787b
2
2. position phase type ultra-high-difinition long focal iris according to claim 1, the transparent material that it is characterized in that said formation parallel flat (202) is transparent organic material, or quartzy, or glass material.
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| CN 00127615 CN1186674C (en) | 2000-11-30 | 2000-11-30 | Position phase type ultra-high-difinition long focal iris |
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| CN 00127615 CN1186674C (en) | 2000-11-30 | 2000-11-30 | Position phase type ultra-high-difinition long focal iris |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100383605C (en) * | 2004-09-21 | 2008-04-23 | 中国科学院上海光学精密机械研究所 | Phase type three dimension super resolution confocal system |
| CN101797666A (en) * | 2010-03-26 | 2010-08-11 | 中国科学院上海光学精密机械研究所 | Laser cutting head capable of extending focal depth |
| CN103317232A (en) * | 2013-06-07 | 2013-09-25 | 浙江台州九晨机械科技有限公司 | Phase modulation device for laser cutting system |
| TWI457607B (en) * | 2008-05-09 | 2014-10-21 | Samsung Electronics Co Ltd | Lens having extended depth of focus, method for designing the same, and optical system having the same |
| CN106526872A (en) * | 2016-12-13 | 2017-03-22 | 华中科技大学 | Transmission type laser beam shaping system |
| CN111505834A (en) * | 2020-03-06 | 2020-08-07 | Oppo广东移动通信有限公司 | Focusing device and focusing method |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101907780B (en) * | 2010-07-09 | 2012-06-06 | 浙江大学 | Method and device for realizing far field super-resolution focus |
-
2000
- 2000-11-30 CN CN 00127615 patent/CN1186674C/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100383605C (en) * | 2004-09-21 | 2008-04-23 | 中国科学院上海光学精密机械研究所 | Phase type three dimension super resolution confocal system |
| TWI457607B (en) * | 2008-05-09 | 2014-10-21 | Samsung Electronics Co Ltd | Lens having extended depth of focus, method for designing the same, and optical system having the same |
| CN101797666A (en) * | 2010-03-26 | 2010-08-11 | 中国科学院上海光学精密机械研究所 | Laser cutting head capable of extending focal depth |
| CN103317232A (en) * | 2013-06-07 | 2013-09-25 | 浙江台州九晨机械科技有限公司 | Phase modulation device for laser cutting system |
| CN106526872A (en) * | 2016-12-13 | 2017-03-22 | 华中科技大学 | Transmission type laser beam shaping system |
| CN106526872B (en) * | 2016-12-13 | 2022-09-20 | 华中科技大学 | Transmission-type laser beam shaping system |
| CN111505834A (en) * | 2020-03-06 | 2020-08-07 | Oppo广东移动通信有限公司 | Focusing device and focusing method |
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