CN1291814A - Low-adsorption hard film window and lens of CO2 laser - Google Patents
Low-adsorption hard film window and lens of CO2 laser Download PDFInfo
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- CN1291814A CN1291814A CN 00115991 CN00115991A CN1291814A CN 1291814 A CN1291814 A CN 1291814A CN 00115991 CN00115991 CN 00115991 CN 00115991 A CN00115991 A CN 00115991A CN 1291814 A CN1291814 A CN 1291814A
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Abstract
A low-absorption window and lens of CO2 laser is made up of low-absorption high-hardness film materials through combining them together. The low-refractivity yttrium fluoride is combined with high-refractivity ZnSe or GaAs or Ge and then coated on low-absorption substrate to obtain low-absorption hard film window and lends. Its advantages include low absorption, high destroy threshold, small distortion of light beam, long service life and no poision and radioactivity.
Description
The invention belongs to the laser application.
At present, CO
2One of key problem in laser and the application thereof is the useful life of how to improve the beam quality of laser and prolonging laser.And one of key that addresses this problem is how to obtain the outstanding laser window of quality, lens.Yet, because thin-film material and coating technique are more scattered and complicated, among also continually developing always, if film forming material and technology are poor, the absorption of film will be far longer than the absorption of substrate greater than 2 percent, had a strong impact on the total quality of window, lens; Worse film then can't be used at all.Because film generally is to be obtained by hocket bilayer or multicoating of two kinds of materials of high index of refraction and low-refraction in the high vacuum optical coating machine, so the key of film quality is to select the material of high-quality and carries out best combination of materials and adopt rational process for plating.The thin-film material combination that American I I-VI company adopts for many years always is the ZnSe (zinc selenide) of high index of refraction and the ThF4 (thorium fluoride) of low-refraction, window, the lens that this thin-film material combination of the said firm obtains have and absorb low and to the little characteristics of distortion that light beam produces, be widely used in CO
2Laser and use is combined as a kind of mantle, damage threshold and life-span and all is subjected to bigger restriction but its significant disadvantages is this thin-film material, and ThF4 is the safety that can have a strong impact on people in a kind of poisonous and active material, the use.Chinese invention patent (88 1 02096.6) " high power infrared laser hard film window and lens " has been announced the combination of the semiconductor dura mater material that has wherein adopted non-toxic and non-radioactive.But its absorptivity also is restricted.
The purpose of this invention is to provide the combination of the thin-film material of the low absorption of a class, high rigidity, and be sputtered on the low substrate that absorbs, make it to become low hard film window, the lens that absorb, be used for CO
2In laser and the application thereof.
In order to finish above-mentioned purpose, technical scheme of the present invention is: adopt to absorb the thin-film material of the yttrium fluoride low, that hardness is high as low-refraction, allow the ZnSe of itself and high index of refraction or GaAs or Ge form combination, being sputtered at becomes low hard film window, the lens that absorb on low ZnSe that absorbs or the GaAs substrate.Electron beam evaporation is adopted in the evaporation of the concrete process that is coated with yttrium fluoride, and the crucible material of evaporation usefulness is the metal Ta (tantalum) that metal M o (molybdenum) rather than data are introduced usually.Be coated with one two-sided all be the CO that is used on plane
2The main method of the GaAs full impregnated window (transmitance is greater than 98%) of laser is as follows: place vacuum coating equipment to treat to place with electron beam evaporation plating earlier behind all plated film conditions being possesseds the yttrium fluoride material of the low-refraction of Mo crucible the substrate that cleans up, then stop evaporation when the optical thickness of its evaporation reaches the 0.96-1.10 micrometer range; With the zinc selenide material of the mode evaporation high index of refraction of electron beam or resistance heating, when reaching the 0.96-1.10 micrometer range, the optical thickness of its evaporation also stops evaporation then; Like this, substrate surface (the plated film face of full impregnated window becomes the full impregnated face) has been coated with and has finished.Turn-over repeats above-mentioned coating process later on, and this biplane full impregnated window is just made and finished after the another side plated film is finished.
Superiority of the present invention be this window, lens have absorb low, damage threshold is high, distortion that light beam is produced is little, the life-span long and the characteristics of non-toxic and non-radioactive.Can be widely used in CO
2During laser or its are used.
Accompanying drawing provided by the invention is the full impregnated laser window structural representation that yttrium fluoride and zinc selenide combination of materials are coated with.
Among the figure, its GaAs substrate (1) two sides is coated with yttrium fluoride thin layer (2) and zinc selenide film layer (3) respectively, and its optical thickness is the 0.96-1.10 millimeter.
Introduce one embodiment of the present of invention below.Be coated with one two-sided all be the 5 kilowatts of CO that are used on plane
2The transmitance of laser is that the main technique of 48% GaAs window (part sees through window) is as follows: place vacuum coating equipment to treat behind all plated film conditions being possesseds earlier ZnSe material with the mode evaporation high index of refraction of electron beam or resistance heating the substrate that cleans up, stop the evaporation of this ground floor when the optical thickness of its evaporation reaches 2.65 (ERROR CONTROL is in ± 5%) micron; Place the yttrium fluoride material of the low-refraction of Mo crucible again with electron beam evaporation plating, when the optical thickness of its evaporation reaches 2.65 (ERROR CONTROL is in ± 5%) micron, then stop the evaporation of this second layer; With the ZnSe material of the mode evaporation high index of refraction of electron beam or resistance heating, when reaching 2.65 (ERROR CONTROL is in ± 5%) micron, the optical thickness of its evaporation stops this evaporation of the 3rd layer then; Like this, substrate surface (being called reflecting surface) has been coated with and has finished.After the turn-over according to foregoing technology plating full impregnated face, full impregnated face plated film is finished after this biplane transmitance be 48% part see through window just making finish.
Claims (3)
1. one kind is used for CO
2The low-adsorption hard film window of laser, lens, it is characterized by described window, lens adopt have lowly absorb, the yttrium fluoride of high rigidity is as the thin-film material of low-refraction, allow the ZnSe of itself and high index of refraction or GaAs or Ge form combination, be sputtered on the low substrate that absorbs.
2. the CO that is used for according to claim 1
2The crucible material that the low-adsorption hard film window of laser, lens, the Coating Materials yttrium fluoride that it is characterized by window, lens adopt during with electronics card evaporation is a metal molybdenum.
3, the CO that is used for according to claim 1
2The low-adsorption hard film window of laser, lens, its feature are plated on on-chip yttrium fluoride and zinc selenide film material respectively, and electron beam evaporation plating thickness is 0.96-1.10 microns.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 00115991 CN1291814A (en) | 2000-08-31 | 2000-08-31 | Low-adsorption hard film window and lens of CO2 laser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 00115991 CN1291814A (en) | 2000-08-31 | 2000-08-31 | Low-adsorption hard film window and lens of CO2 laser |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1291814A true CN1291814A (en) | 2001-04-18 |
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ID=4585423
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 00115991 Pending CN1291814A (en) | 2000-08-31 | 2000-08-31 | Low-adsorption hard film window and lens of CO2 laser |
Country Status (1)
| Country | Link |
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| CN (1) | CN1291814A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103616649A (en) * | 2013-12-02 | 2014-03-05 | 暨南大学 | Magnetic field sensor sensitivity tuning method based on fiber bragg grating laser |
| CN109991691A (en) * | 2019-04-15 | 2019-07-09 | 南京波长光电科技股份有限公司 | Three wave band of laser anti-reflection films of one kind and preparation method thereof |
-
2000
- 2000-08-31 CN CN 00115991 patent/CN1291814A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103616649A (en) * | 2013-12-02 | 2014-03-05 | 暨南大学 | Magnetic field sensor sensitivity tuning method based on fiber bragg grating laser |
| CN109991691A (en) * | 2019-04-15 | 2019-07-09 | 南京波长光电科技股份有限公司 | Three wave band of laser anti-reflection films of one kind and preparation method thereof |
| CN109991691B (en) * | 2019-04-15 | 2024-01-05 | 南京波长光电科技股份有限公司 | Three-band laser antireflection film and preparation method thereof |
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